Nakanishi et al., 2007 - Google Patents
Giant elasticity of photopolymer nanowiresNakanishi et al., 2007
View PDF- Document ID
- 15646330620564628827
- Author
- Nakanishi S
- Shoji S
- Kawata S
- Sun H
- Publication year
- Publication venue
- Applied Physics Letters
External Links
Snippet
Giant elasticity, reflected by a shear modulus three order smaller than seen in the bulk of the same materials, is found in polymer nanowires, which are prepared by two-photon polymerization into a shape of spring: geometry capable to magnify mechanical …
- 239000002070 nanowire 0 title abstract description 24
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B6/00—Light guides
- G02B6/10—Light guides of the optical waveguide type
- G02B6/12—Light guides of the optical waveguide type of the integrated circuit kind
- G02B6/122—Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- G02B6/00—Light guides
- G02B6/10—Light guides of the optical waveguide type
- G02B6/107—Subwavelength-diameter waveguides, e.g. nanowires
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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