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Ross et al., 2010 - Google Patents

Templated self-assembly of Si-containing block copolymers for nanoscale device fabrication

Ross et al., 2010

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Document ID
1342820852224042682
Author
Ross C
Jung Y
Chuang V
Son J
Gotrik K
Mickiewicz R
Yang J
Chang J
Berggren K
Gwyther J
Manners I
Publication year
Publication venue
Alternative Lithographic Technologies II

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Snippet

Block copolymers have been proposed for self-assembled nanolithography because they can spontaneously form well-ordered nanoscale periodic patterns of lines or dots in a rapid, low-cost process. By templating the selfassembly, patterns of increasing complexity can be …
Continue reading at dspace.mit.edu (PDF) (other versions)

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICRO-STRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICRO-STRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing micro-systems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing micro-systems without movable or flexible elements

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