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Keraudy et al., 2019 - Google Patents

Bipolar HiPIMS for tailoring ion energies in thin film deposition

Keraudy et al., 2019

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Document ID
11530877979987796783
Author
Keraudy J
Viloan R
Raadu M
Brenning N
Lundin D
Helmersson U
Publication year
Publication venue
Surface and Coatings Technology

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Snippet

The effects of a positive pulse following a high-power impulse magnetron sputtering (HiPIMS) pulse are studied using energy-resolved mass spectrometry. This includes exploring the influence of a 200 μs long positive voltage pulse (U rev= 10–150 V) following a …
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    • H01J37/34—Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering
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    • H01J37/3405—Magnetron sputtering
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