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Beckloff et al., 1999 - Google Patents

Process‐Structure‐Reflectance Correlations for TiB2 Films Prepared by Chemical Vapor Deposition

Beckloff et al., 1999

Document ID
10108772389599692092
Author
Beckloff B
Lackey W
Publication year
Publication venue
Journal of the American Ceramic Society

External Links

Snippet

The process‐structure‐reflectance interrelationships for TiB2 films prepared by CVD were determined using statistically designed experiments. A hot wall CVD reactor employing graphite substrates and the TiCl4+ BCl3+ H2 reagent system were used at pressures of 2.7 …
Continue reading at ceramics.onlinelibrary.wiley.com (other versions)

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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
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    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
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