Nothing Special   »   [go: up one dir, main page]

Nicaise et al., 2015 - Google Patents

Self-assembly of block copolymers by graphoepitaxy

Nicaise et al., 2015

Document ID
8983582614895558791
Author
Nicaise S
Tavakkoli K
Berggren K
Publication year
Publication venue
Directed Self-assembly of Block Co-polymers for Nano-manufacturing

External Links

Snippet

In the fabrication of a desired block copolymer (BCP) nanostructure for a particular application, a key challenge is the control of the BCP microdomain assembly. Graphoepitaxy is a solution to this challenge. Graphoepitaxy provides multifaceted mechanisms to order …
Continue reading at www.sciencedirect.com (other versions)

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y40/00—Manufacture or treatment of nano-structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y10/00—Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Similar Documents

Publication Publication Date Title
Schift Nanoimprint lithography: 2D or not 2D? A review
Ji et al. Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
Lane et al. Directed self-assembly and pattern transfer of five nanometer block copolymer lamellae
Acikgoz et al. Polymers in conventional and alternative lithography for the fabrication of nanostructures
Luo et al. Directed block copolymer thin film self-assembly: emerging trends in nanopattern fabrication
Pease et al. Lithography and other patterning techniques for future electronics
Zhou Nanoimprint lithography: an enabling process for nanofabrication
Peroz et al. Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices
KR20110013163A (en) Self-assembled nano-lithographic imprint masks
CN105705997B (en) Method for generating guide template for directed self-assembly
Huang et al. A review of the scalable nano-manufacturing technology for flexible devices
Kim et al. Graphoepitaxy of Block‐Copolymer Self‐Assembly Integrated with Single‐Step ZnO Nanoimprinting
Ferrarese Lupi et al. Hierarchical order in dewetted block copolymer thin films on chemically patterned surfaces
Deng et al. Micropatterning of block copolymer solutions
Mohamed 2.16 Nanoimprint Lithography for Nanomanufacturing
Nicaise et al. Self-assembly of block copolymers by graphoepitaxy
Kim et al. Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfaces
Ye et al. UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer
US9168679B2 (en) Programmable soft lithography: solvent-assisted nanoscale embossing
JP2005159358A (en) Nano imprint lithographing method and substrate
Lee et al. Strain-dependent nanowrinkle confinement of block copolymers
Cummins et al. Self-assembled nanofeatures in complex three-dimensional topographies via nanoimprint and block copolymer lithography methods
Alkaisi et al. Multilevel nanoimprint lithography
Tiginyanu et al. Nanoimprint lithography (NIL) and related techniques for electronics applications
KR101369736B1 (en) Manufacturing method of mold for nanolens array and manufacturing method of nanolens array using mold manufactured by the same