Nothing Special   »   [go: up one dir, main page]

Humphries Jr et al., 1986 - Google Patents

Grid‐controlled extraction of pulsed ion beams

Humphries Jr et al., 1986

Document ID
8748031165695153552
Author
Humphries Jr S
Burkhart C
Coffey S
Cooper G
Len L
Savage M
Woodall D
Rutkowski H
Oona H
Shurter R
Publication year
Publication venue
Journal of applied physics

External Links

Snippet

Experimental results are presented on a method for extracting well‐focused ion beams from plasma sources with time‐varying properties. An electrostatic grid was used to stop the flow of plasma electrons so that only ions entered the extraction gap. In this case, ion flow in the …
Continue reading at pubs.aip.org (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08Ion sources; Ion guns
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/08Ion sources
    • H01J2237/0802Field ionization sources
    • H01J2237/0807Gas field ion sources [GFIS]
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/24Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H01J37/243Beam current control or regulation circuits
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometer or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometer or separator tubes
    • H01J49/02Details
    • H01J49/022Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/08Ion sources; Ion guns using arc discharge
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32917Plasma diagnostics
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/16Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometer or separator tubes
    • H01J49/02Details
    • H01J49/025Detectors specially adapted to particle spectrometers
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometer or separator tubes
    • H01J49/26Mass spectrometers or separator tubes
    • H01J49/34Dynamic spectrometers
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects

Similar Documents

Publication Publication Date Title
Ehlers Design considerations for high-intensity negative ion sources
Brown et al. Multiply stripped ion generation in the metal vapor vacuum arc
Anderson et al. Ion Source for the Production of Multiply Charged Heavy Ions
Humphries Jr et al. Grid‐controlled extraction of pulsed ion beams
Doria et al. A study of the parameters of particles ejected from a laser plasma
Koval et al. Broad beam electron sources with plasma cathodes
Gushenets et al. Electrostatic plasma lens focusing of an intense electron beam in an electron source with a vacuum arc plasma cathode
Paoloni et al. Some observations of the effect of magnetic field and arc current on the vacuum arc ion charge state distribution
Holmes et al. Post-arc current mechanism in vacuum interrupters
Anders et al. High ion charge states in a high‐current, short‐pulse, vacuum arc ion source
Nikolaev et al. Charge-state distribution of ions in a vacuum arc discharge plasma in a high magnetic field
Humphries Jr et al. Sources of multiply charged ions for heavy‐ion fusion
Lee et al. Production of low energy spread ion beams with multicusp sources
Angot et al. Charge breeding time investigations of electron cyclotron resonance charge breeders
Laan et al. The multi-avalanche nature of streamer formation in inhomogeneous fields
Bayless Plasma‐cathode electron gun
US4939425A (en) Four-electrode ion source
Vahrenkamp et al. A 100-mA Low-Emittance Ion Source for Ion-Beam Fusion
Anders et al. The kinetic energy of carbon ions in vacuum arc plasmas: A comparison of measuring techniques
Metel et al. A high-current plasma emitter of electrons based on a glow discharge with a multirod electrostatic trap
Frolova et al. Distributions of ions in a plasma flow of vacuum arc with zirconium deuteride cathode
Clark Recent progress in heavy ion sources
Frolova et al. Multiply charged ion source based on high current short pulse vacuum arc
Bennett High Charge State Heavy Ion Sources
Ozur et al. Formation of narrow low-energy high-intensity electron beams