Klopovskiy et al., 1999 - Google Patents
Heterogeneous quenching of O2 (1g) molecules in H2: O2 mixturesKlopovskiy et al., 1999
View PDF- Document ID
- 86592722652110087
- Author
- Klopovskiy K
- Lopaev D
- Popov N
- Rakhimov A
- Rakhimova T
- Publication year
- Publication venue
- Journal of Physics D: Applied Physics
External Links
Snippet
Abstract Quenching of O 2 (1 g) molecules both in the gas phase and on a reactor surface has been investigated in binary mixtures of hydrogen and oxygen by using the fast-flow quartz reactor and infrared emission spectroscopy. Rate constants of the O 2 (1 g) …
- 238000010791 quenching 0 title abstract description 87
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Ghimire et al. | The effect of the gap distance between an atmospheric-pressure plasma jet nozzle and liquid surface on OH and N2 species concentrations | |
Pagnon et al. | On the use of actinometry to measure the dissociation in O2 DC glow discharges: determination of the wall recombination probability | |
Belostotsky et al. | Negative ion destruction by O (3P) atoms and O2 (a 1Δg) molecules in an oxygen plasma | |
Nagai et al. | Measurement of oxygen atom density employing vacuum ultraviolet absorption spectroscopy with microdischarge hollow cathode lamp | |
Lavrov et al. | On the spectroscopic detection of neutral species in a low-pressure plasma containing boron and hydrogen | |
Klopovskiy et al. | Heterogeneous quenching of O2 (1g) molecules in H2: O2 mixtures | |
Rügner et al. | Insight into the Reaction Scheme of Si O 2 Film Deposition at Atmospheric Pressure | |
Kregar et al. | Interaction of argon, hydrogen and oxygen plasma early afterglow with polyvinyl chloride (PVC) materials | |
Es-Sebbar et al. | Characterization of an N2 flowing microwave post-discharge by OES spectroscopy and determination of absolute ground-state nitrogen atom densities by TALIF | |
Curley et al. | Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements | |
Zaplotnik et al. | Atomic oxygen and hydrogen loss coefficient on functionalized polyethylene terephthalate, polystyrene, and polytetrafluoroethylene polymers | |
Sahu et al. | Nitrogen radical and plasma diagnostics in dual frequency hybrid plasmas to investigate N2/SiH4 PECVD process | |
Lefevre et al. | Modeling of nitrogen atom recombination on Pyrex: Influence of the vibrationally excited N 2 molecules on the loss probability of N | |
Clark et al. | An investigation of the vacuum UV spectra of inductivity coupled RF plasmas excited in inert gases as a function of some of the operating parameters | |
Majstorović et al. | The analysis of nitrogen rotational and vibrational bands in a helium microhollow gas discharge | |
Arkhipenko et al. | Influence of the nitrogen–helium mixture ratio on parameters of a self-sustained normal dc atmospheric pressure glow discharge | |
Bark et al. | Slipping surface discharge as a source of hard UV radiation | |
Rakhimova et al. | Recombination of O and H atoms on the surface of nanoporous dielectrics | |
Wang et al. | Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor | |
Hummernbrum et al. | Laser-induced fluorescence measurements on the C2 Sigma+-X2IIr transition of the CH radical produced by a microwave excited process plasma | |
Schröter et al. | The role of argon metastables in an inductively coupled plasma for treatment of PET | |
Rawlins et al. | Characteristics of O (I) and N (I) resonance line broadening in low pressure helium discharge lamps | |
Konstantinov et al. | Film growth and mechanism of LICVD of chromium films from Cr (CO) 6 at 248 nm | |
Yamada et al. | Nonequilibrium characteristics in the rotational temperature of CO excited states in microwave discharge CO2 plasma | |
Nielsen | Rate constants for the gas-phase reactions of OH radicals with CH3CHF2 and CHC12CF3 over the temperature range 295–388 K |