Nothing Special   »   [go: up one dir, main page]

Sinha et al., 1964 - Google Patents

Bombardment of Tungsten with 20‐keV Helium Atoms in a Field Ion Microscope

Sinha et al., 1964

Document ID
8073628234625230421
Author
Sinha M
Müller E
Publication year
Publication venue
Journal of Applied Physics

External Links

Snippet

Fast He atoms are shot into one side of the tungsten emitter tip of a field ion microscope, and the resulting damage to the surface, consisting of vacancies, interstitials, and their clusters, is observed in atomic resolution. About one‐half of the number of atoms calculated to have …
Continue reading at pubs.aip.org (other versions)

Classifications

    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a micro-scale
    • H01J2237/3174—Etching microareas
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H—ELECTRICITY
    • H01—BASIC ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields

Similar Documents

Publication Publication Date Title
Sinha et al. Bombardment of Tungsten with 20‐keV Helium Atoms in a Field Ion Microscope
Wehner Sputtering by ion bombardment
Müller Field ionization and field ion microscopy
Müller et al. Field ionization of gases at a metal surface and the resolution of the field ion microscope
Magnuson et al. Electron ejection from metals due to 1-to 10-keV noble gas ion bombardment. I. Polycrystalline materials
Nassisi et al. Physics of the expanding plasma ejected from a small spot illumined by an ultraviolet pulsed laser
Bhuyan et al. Analysis of nitrogen ion beam produced in dense plasma focus device using Faraday Cup
Taban et al. Ultracold electron source for single-shot diffraction studies
Lai et al. The relationship between electron and ion induced secondary electron imaging: A review with new experimental observations
Vance Auger electron emission from clean and carbon-contaminated Mo
Chou Ion‐induced secondary‐electron emission from MgO films
Walls et al. Field-ion microscope observations of helium ion bombardment damage in tungsten
Duspayev et al. Electric field analysis in a cold-ion source using Stark spectroscopy of Rydberg atoms
Fominski et al. Laser plasma ion implantation and deposition of platinum for SiC-based hydrogen detector fabrication
Sørensen Experimental set-up for irradiation of solid H2 and D2 with charged particles of keV energies
Beilis et al. Cathode spot jets. Velocity and ion current
MacDonald et al. Low‐Energy‐Ion‐Bombardment Damage in Germanium
Sozer et al. Quantum efficiency measurements of photocathode candidates for back-lighted thyratrons
Nefedtsev et al. Peculiarities of the short-pulse dielectric strength of vacuum insulation
Etcheverry et al. A simple model of a glow discharge electron beam for materials processing
Chernyshova et al. Deposition of nanolayers by means of dense plasma focus
Forman Secondary-electron-emission properties of conducting surfaces with application to multistage depressed collectors for microwave amplifiers
Fakhfakh et al. A new method for charge trapping measurement during electron beam irradiation: application to glass containing alkali ions and single-crystalline quartz
Graser et al. Optical radiation from He particles scattered at a monocrystalline surface at grazing incidence
Mascali et al. Langmuir probe characterization of laser generated plasmas