Nothing Special   »   [go: up one dir, main page]

Khaletskaya et al., 2014 - Google Patents

Self‐directed localization of ZIF‐8 thin film formation by conversion of ZnO nanolayers

Khaletskaya et al., 2014

View PDF
Document ID
6778443045957090914
Author
Khaletskaya K
Turner S
Tu M
Wannapaiboon S
Schneemann A
Meyer R
Ludwig A
Van Tendeloo G
Fischer R
Publication year
Publication venue
Advanced Functional Materials

External Links

Snippet

Control of localized metal–organic framework (MOF) thin film formation is a challenge. Zeolitic imidazolate frameworks (ZIFs) are an important sub‐class of MOFs based on transition metals and imidazolate linkers. Continuous coatings of intergrown ZIF crystals …
Continue reading at www.academia.edu (PDF) (other versions)

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material

Similar Documents

Publication Publication Date Title
Khaletskaya et al. Self‐directed localization of ZIF‐8 thin film formation by conversion of ZnO nanolayers
Zhang et al. A simple and scalable method for preparing low-defect ZIF-8 tubular membranes
Cruz et al. Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
Xie et al. Deposition of chemically modified α-Al 2 O 3 particles for high performance ZIF-8 membrane on a macroporous tube
He et al. Electrophoretic nuclei assembly for crystallization of high‐performance membranes on unmodified supports
Lee et al. High‐flux zeolitic imidazolate framework membranes for propylene/propane separation by postsynthetic linker exchange
Guerrero et al. HKUST-1 membranes on porous supports using secondary growth
Huang et al. Growth of a ZIF-8 membrane on the inner-surface of a ceramic hollow fiber via cycling precursors
Su et al. Vapor-phase processing of metal–organic frameworks
Lin Metal organic framework membranes for separation applications
US10639593B2 (en) Methods to enhance separation performance of metal-organic framework membranes
Melgar et al. Zeolitic imidazolate framework membranes for gas separation: A review of synthesis methods and gas separation performance
Stassen et al. Solvent-free synthesis of supported ZIF-8 films and patterns through transformation of deposited zinc oxide precursors
Liu et al. Multi variant surface mounted metal–organic frameworks
Han et al. Solvent-free vacuum growth of oriented HKUST-1 thin films
Wee et al. Submicrometer‐sized ZIF‐71 filled organophilic membranes for improved bioethanol recovery: mechanistic insights by Monte Carlo simulation and FTIR spectroscopy
Lausund et al. All-gas-phase synthesis of amino-functionalized UiO-66 thin films
Ameloot et al. Patterned film growth of metal–organic frameworks based on galvanic displacement
Pu et al. Growing ZIF‐8 Seeds on Charged COF Substrates toward Efficient Propylene‐Propane Separation Membranes
Lee et al. Zeolitic imidazolate framework ZIF-8 films by ZnO to ZIF-8 conversion and their usage as seed layers for propylene-selective ZIF-8 membranes
Hao et al. Synthesis of high-performance polycrystalline metal–organic framework membranes at room temperature in a few minutes
Chen et al. Large‐Area Crystalline Zeolitic Imidazolate Framework Thin Films
Lo et al. Pseudopolymorphic seeding for the rational synthesis of hybrid membranes with a zeolitic imidazolate framework for enhanced molecular separation performance
Wannapaiboon et al. Liquid Phase Heteroepitaxial Growth of Moisture‐Tolerant MOF‐5 Isotype Thin Films and Assessment of the Sorption Properties by Quartz Crystal Microbalance
Bétard et al. Assessing the adsorption selectivity of linker functionalized, moisture-stable metal–organic framework thin films by means of an environment-controlled quartz crystal microbalance