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Chen et al., 2005 - Google Patents

Design of superjunction power MOSFET devices using the gradient oxide-bypassed structure

Chen et al., 2005

Document ID
556624623462666046
Author
Chen Y
Liang Y
Samudra G
Publication year
Publication venue
2005 International Conference on Power Electronics and Drives Systems

External Links

Snippet

Superjunction (SJ) and other concepts have been proposed to overcome ideal silicon MOSFET limit and to lower the on-state resistance without sacrificing the breakdown rating. The gradient oxide-bypassed structure (GOB) is one such novel structure, in which a slanted …
Continue reading at ieeexplore.ieee.org (other versions)

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    • H01L29/66Types of semiconductor device; Multistep manufacturing processes therefor
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    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802Vertical DMOS transistors, i.e. VDMOS transistors
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    • H01L29/76Unipolar devices, e.g. field effect transistors
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    • H01L29/778Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
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    • H01L29/0607Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
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    • H01L29/063Reduced surface field [RESURF] pn-junction structures
    • H01L29/0634Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
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    • H01L29/66409Unipolar field-effect transistors
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    • H01L29/42312Gate electrodes for field effect devices
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    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
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