Ganske et al., 2011 - Google Patents
Sputtered platinum–iridium layers as electrode material for functional electrostimulationGanske et al., 2011
View PDF- Document ID
- 4475490906245014402
- Author
- Ganske G
- Slavcheva E
- Van Ooyen A
- Mokwa W
- Schnakenberg U
- Publication year
- Publication venue
- Thin Solid Films
External Links
Snippet
In this study co-sputtered layers of platinum–iridium (PtIr) are investigated as stimulation electrode material. The effects of different sputter parameters on the morphology and the electrochemical behavior are examined. It is shown that films sputtered at the lowest incident …
- -1 platinum-iridium 0 title abstract description 21
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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