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Dupuie et al., 1991 - Google Patents

Hot filament enhanced chemical vapor deposition of AlN thin films

Dupuie et al., 1991

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Document ID
4025534111924171841
Author
Dupuie J
Gulari E
Publication year
Publication venue
Applied physics letters

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Hot filament enhanced chemical vapor deposition of aluminum nitride thin films from trimethylaluminum and ammonia has been investigated for deposition temperatures ranging from 584 to 732 K. The use of a hot filament resulted in an approximate two orders of …
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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