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Glass frit bonding: an universal technology for wafer level encapsulation and packaging

Published: 01 December 2005 Publication History

Abstract

This paper reports on glass frit wafer bonding, which is a universally usable technology for wafer level encapsulation and packaging. After explaining the principle and the process flow of glass frit bonding, experimental results are shown. Glass frit bonding technology enables bonding of surface materials commonly used in MEMS technology. It allows hermetic sealing and a high process yield. Metal lead throughs at the bond interface are possible, because of the planarizing glass interlayer. Examples of surface micromachined sensors demonstrate the potential of glass---frit bonding.

References

[1]
MEMS and Sensor Materials 11---036 Sealing glass (2002) Specification FERRO Electronic Materials Santa Babara, Ca, Rev. 1200
[2]
HVG Fortbildungskurs (1995) Fügen von Glas. Verlag der Deutschen Glastechnischen Gesellschaft Frankfurt Main 1995 ISBN 3-921089-14-X
[3]
Zinke A (1961) Technologie der Glasverschmelzungen. Technisch-physikalische Monographien Band 12, Leipzig 1996 Akademische Verlagsgesellschaft Geest und Portig K.-G
[4]
Knechtel R, Heller J, Wiemer M, Frömel J (2003) "Silicon wafer bonding for encapsulating surface micromechanical systems using intermediate glass layers. In: Semiconductor wafer bonding VII, science, technology and applications, proceedings of the 203rd meeting ECS, Paris
[5]
Knechtel R (2003) Wafer level encapsulation of surface micromechanical sensors demands and solution. In: Proceedings of the micro system technologies, München

Cited By

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  • (2016)Evaluation of the bond quality of laser-joined sapphire wafers using a fresnoite-glass sealantMicrosystem Technologies10.1007/s00542-015-2459-x22:1(207-214)Online publication date: 1-Jan-2016
  • (2015)Non-destructive wafer-level bond defect identification by scanning acoustic microscopyMicrosystem Technologies10.5555/2792903.279292621:7(1385-1394)Online publication date: 1-Jul-2015
  • (2015)Wafer level vacuum packaging of micro-mirrors with buried signal linesMicrosystem Technologies10.1007/s00542-015-2433-721:5(1021-1028)Online publication date: 1-May-2015
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  1. Glass frit bonding: an universal technology for wafer level encapsulation and packaging

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    Information

    Published In

    cover image Microsystem Technologies
    Microsystem Technologies  Volume 12, Issue 1-2
    December 2005
    185 pages
    ISSN:0946-7076
    EISSN:1432-1858
    Issue’s Table of Contents

    Publisher

    Springer-Verlag

    Berlin, Heidelberg

    Publication History

    Published: 01 December 2005

    Author Tags

    1. Glass frit
    2. Surface micro machining
    3. Wafer bonding

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    View all
    • (2016)Evaluation of the bond quality of laser-joined sapphire wafers using a fresnoite-glass sealantMicrosystem Technologies10.1007/s00542-015-2459-x22:1(207-214)Online publication date: 1-Jan-2016
    • (2015)Non-destructive wafer-level bond defect identification by scanning acoustic microscopyMicrosystem Technologies10.5555/2792903.279292621:7(1385-1394)Online publication date: 1-Jul-2015
    • (2015)Wafer level vacuum packaging of micro-mirrors with buried signal linesMicrosystem Technologies10.1007/s00542-015-2433-721:5(1021-1028)Online publication date: 1-May-2015
    • (2012)Numerical investigation on a laser based localised joining with a glass frit intermediate layerMicrosystem Technologies10.5555/3111523.311176618:1(87-95)Online publication date: 1-Jan-2012
    • (2011)A hybrid capacitive pressure and temperature sensor fabricated by adhesive bonding technique for harsh environment of kraft pulp digestersMicrosystem Technologies10.5555/3112038.311234817:1(149-160)Online publication date: 1-Jan-2011

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