100, the system is under the ohmic control. In the range 1 < j0/jL ≤ 100
there is the mixed ohmic-diffusion control. The pure diffusion control
appears in the range 0.1 < j0/jL £ 1. For j0/jL £ 0.1, the system is
activation controlled at the low overpotentials. The proposed diagnostic
criteria were verified by comparison of the simulated curves with
experimentally recorded ones and by morphological analysis of deposits
obtained in the different types of metal electrodeposition process control." />