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Under-the-Cell Routing to Improve Manufacturability

Published: 10 May 2017 Publication History

Abstract

The progressive miniaturization of technology and the unequal scalability of the BEOL and FEOL layers aggravate the routing congestion problem and have a negative impact on manufacturability. Standard cells are designed in a way that they can be treated as black boxes during physical design. However, this abstraction often prevents an efficient use of its internal free resources.
>This paper proposes an effective approach for using internal routing resources without sacrificing modularity. By using cell generation tools for regular layouts, libraries are enriched with cell instances that have lateral pins and allow under-the-cell connections between adjacent cells, thus reducing pin count, via count and routing congestion.
An approach to generate cells with regular layouts and lateral pins is proposed. Additionally, algorithms to maximize the impact of under-the-cell routing are presented. The proposed techniques are integrated in an industrial design flow. Experimental results show a significant reduction of design rule check violations with negligible impact on timing.

References

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itc99 Benchmark Homepage. www.cad.polito.it/downloads/tools/itc99.html.
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Nangate 45nm Open Cell Library. www.nangate.com/?page_id=2325.
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Synopsys IC Compiler Homepage. www.synopsys.com/Tools/Implementation/PhysicalImplementation/Pages/ICCompiler.aspx.
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J. Cortadella, J. Petit, S. Gómez, and F. Moll. A Boolean Rule-Based Approach for Manufacturability-Aware Cell Routing. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 33(3):409--422, Mar. 2014.
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D. Pan, B. Yu, and J.-R. Gao. Design for Manufacturing With Emerging Nanolithography. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 32(10):1453--1472, Oct. 2013.
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P. Saxena, R. S. Shelar, and S. S. Sapatnekar. Routing Congestion in VLSI Circuits - Estimation and Optimization. Series on Integrated Circuits and Systems. Springer, 2007.
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X. Xu, B. Cline, G. Yeric, B. Yu, and D. Pan. Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout Co-Optimization. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 34(5):699--712, May 2015.
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X. Xu, B. Yu, J.-R. Gao, C.-L. Hsu, and D. Pan. PARR: Pin access planning and regular routing for self-aligned double patterning. In 2015 52nd ACM/EDAC/IEEE Design Automation Conference (DAC), pages 1--6, June 2015.
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H. Zhang, M. Wong, and K.-Y. Chao. On process-aware 1-D standard cell design. In Design Automation Conference (ASP-DAC), 2010 15th Asia and South Pacific, pages 838--842, Jan. 2010.

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cover image ACM Conferences
GLSVLSI '17: Proceedings of the Great Lakes Symposium on VLSI 2017
May 2017
516 pages
ISBN:9781450349727
DOI:10.1145/3060403
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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Association for Computing Machinery

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Published: 10 May 2017

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Author Tags

  1. eda
  2. physical synthesis
  3. placement
  4. vlsi
  5. wire routing

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GLSVLSI '17
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GLSVLSI '17: Great Lakes Symposium on VLSI 2017
May 10 - 12, 2017
Alberta, Banff, Canada

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GLSVLSI '17 Paper Acceptance Rate 48 of 197 submissions, 24%;
Overall Acceptance Rate 312 of 1,156 submissions, 27%

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