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Sandip Halder
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2020 – today
- 2024
- [i17]Ying-Lin Chen, Jacob Deforce, Vic De Ridder, Bappaditya Dey, Víctor Blanco, Sandip Halder, Philippe Leray:
Towards Improved Semiconductor Defect Inspection for high-NA EUVL based on SEMI-SuperYOLO-NAS. CoRR abs/2404.05862 (2024) - [i16]Bappaditya Dey, Vic De Ridder, Víctor Blanco, Sandip Halder, Bartel Van Waeyenberge:
Addressing Class Imbalance and Data Limitations in Advanced Node Semiconductor Defect Inspection: A Generative Approach for SEM Images. CoRR abs/2407.10348 (2024) - [i15]Amit Prasad, Bappaditya Dey, Victor Blanco, Sandip Halder:
An Evaluation of Continual Learning for Advanced Node Semiconductor Defect Inspection. CoRR abs/2407.12724 (2024) - [i14]Bappaditya Dey, Matthias Monden, Víctor Blanco, Sandip Halder, Stefan De Gendt:
Advancing SEM Based Nano-Scale Defect Analysis in Semiconductor Manufacturing for Advanced IC Nodes. CoRR abs/2409.04310 (2024) - 2023
- [i13]Enrique Dehaerne, Bappaditya Dey, Sandip Halder, Stefan De Gendt:
Optimizing YOLOv7 for Semiconductor Defect Detection. CoRR abs/2302.09565 (2023) - [i12]MinJin Hwang, Bappaditya Dey, Enrique Dehaerne, Sandip Halder, Young-han Shin:
SEMI-PointRend: Improved Semiconductor Wafer Defect Classification and Segmentation as Rendering. CoRR abs/2302.09569 (2023) - [i11]Enrique Dehaerne, Bappaditya Dey, Sandip Halder, Stefan De Gendt:
A Deep Learning Framework for Verilog Autocompletion Towards Design and Verification Automation. CoRR abs/2304.13840 (2023) - [i10]Vic De Ridder, Bappaditya Dey, Sandip Halder, Bartel Van Waeyenberge:
SEMI-DiffusionInst: A Diffusion Model Based Approach for Semiconductor Defect Classification and Segmentation. CoRR abs/2307.08693 (2023) - [i9]Enrique Dehaerne, Bappaditya Dey, Hossein Esfandiar, Lander Verstraete, Hyo Seon Suh, Sandip Halder, Stefan De Gendt:
YOLOv8 for Defect Inspection of Hexagonal Directed Self-Assembly Patterns: A Data-Centric Approach. CoRR abs/2307.15516 (2023) - [i8]Vic De Ridder, Bappaditya Dey, Enrique Dehaerne, Sandip Halder, Stefan De Gendt, Bartel Van Waeyenberge:
SEMI-CenterNet: A Machine Learning Facilitated Approach for Semiconductor Defect Inspection. CoRR abs/2308.07180 (2023) - [i7]Thibault Lechien
, Enrique Dehaerne, Bappaditya Dey, Víctor Blanco, Sandip Halder, Stefan De Gendt:
Automated Semiconductor Defect Inspection in Scanning Electron Microscope Images: a Systematic Review. CoRR abs/2308.08376 (2023) - [i6]Sara Sacchi, Bappaditya Dey, Iacopo Mochi, Sandip Halder, Philippe Leray:
Deep learning denoiser assisted roughness measurements extraction from thin resists with low Signal-to-Noise Ratio(SNR) SEM images: analysis with SMILE. CoRR abs/2310.14815 (2023) - [i5]Enrique Dehaerne, Bappaditya Dey, Sandip Halder, Stefan De Gendt:
Benchmarking Feature Extractors for Reinforcement Learning-Based Semiconductor Defect Localization. CoRR abs/2311.11145 (2023) - [i4]Vic De Ridder, Bappaditya Dey, Víctor Blanco, Sandip Halder, Bartel Van Waeyenberge:
Improved Defect Detection and Classification Method for Advanced IC Nodes by Using Slicing Aided Hyper Inference with Refinement Strategy. CoRR abs/2311.11439 (2023) - [i3]Bappaditya Dey, Anh Tuan Ngo, Sara Sacchi, Víctor Blanco, Philippe Leray, Sandip Halder:
Applying Machine Learning Models on Metrology Data for Predicting Device Electrical Performance. CoRR abs/2312.09462 (2023) - 2022
- [j1]Enrique Dehaerne
Code Generation Using Machine Learning: A Systematic Review. IEEE Access 10: 82434-82455 (2022) - [c3]Enrique Dehaerne
A Comparative Study of Deep-Learning Object Detectors for Semiconductor Defect Detection. ICECS 2022 2022: 1-2 - [i2]Bappaditya Dey, Dipam Goswami, Sandip Halder, Kasem Khalil, Philippe Leray, Magdy A. Bayoumi:
Deep Learning-Based Defect Classification and Detection in SEM Images. CoRR abs/2206.13505 (2022) - [i1]Bappaditya Dey, Enrique Dehaerne, Kasem Khalil, Sandip Halder, Philippe Leray, Magdy A. Bayoumi:
Deep Learning based Defect classification and detection in SEM images: A Mask R-CNN approach. CoRR abs/2211.02185 (2022) - 2020
- [c2]Imen Chakroun, Thomas J. Ashby, Sayantan Das, Sandip Halder, Roel Wuyts, Wilfried Verachtert:
Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection. ICPRAM 2020: 273-279
2010 – 2019
- 2011
- [c1]Sandip Halder
In-line metrology and inspection for process control during 3D stacking of IC's. 3DIC 2011: 1-4
Coauthor Index
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last updated on 2024-10-10 21:10 CEST by the dblp team
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