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"Characterisation and passivation of interface defects in (1 0 ..."

Paul K. Hurley et al. (2007)

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DOI: 10.1016/J.MICROREL.2006.09.030

access: closed

type: Journal Article

metadata version: 2020-11-13

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Paul K. Hurley, Karim Cherkaoui, S. McDonnell, G. Hughes, A. W. Groenland:
Characterisation and passivation of interface defects in (1 0 0)-Si/SiO₂/HfO₂/TiN gate stacks. Microelectron. Reliab. 47(8): 1195-1201 (2007)

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