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"Selective etching of HfN gate electrode for HfN/HfSiON gate stack in-situ ..."

Takahiro Sano, Shun'ichiro Ohmi (2011)

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DOI: 10.1587/ELEX.8.1492

access: open

type: Journal Article

metadata version: 2021-02-12

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  dblp key:
  - journals/ieiceee/SanoO11
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  - https://dblp.org/rec/journals/ieiceee/SanoO11
Takahiro Sano, Shun'ichiro Ohmi:
Selective etching of HfN gate electrode for HfN/HfSiON gate stack in-situ formations. IEICE Electron. Express 8(18): 1492-1497 (2011)

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