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"Positive Bias Instability in ZnO TFTs with Al2O3 Gate Dielectric."

Pavel Bolshakov et al. (2019)

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DOI: 10.1109/IRPS.2019.8720547

access: closed

type: Conference or Workshop Paper

metadata version: 2019-10-19

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  dblp key:
  - conf/irps/BolshakovRQY19
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  - https://dblp.org/rec/conf/irps/BolshakovRQY19
Pavel Bolshakov, Rodolfo A. Rodriguez-Davila, Manuel Quevedo-Lopez, Chadwin D. Young:
Positive Bias Instability in ZnO TFTs with Al2O3 Gate Dielectric. IRPS 2019: 1-5

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