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"Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency ..."

Gowtham Peringattu Kalarikkal, Rohit Goel, Hitesh Shrimali (2021)

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DOI: 10.1109/ICECS53924.2021.9665465

access: closed

type: Conference or Workshop Paper

metadata version: 2022-01-14

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Gowtham Peringattu Kalarikkal, Rohit Goel, Hitesh Shrimali:
Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency Spread. ICECS 2021: 1-6

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