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"Development and Characterization of High Temperature Plasma Nitridation ..."

Xiaoxu Kang et al. (2021)

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DOI: 10.1109/ASICON52560.2021.9620365

access: closed

type: Conference or Workshop Paper

metadata version: 2021-12-06

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  - conf/asicon/KangZCDZWZLGNW21
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  - https://dblp.org/rec/conf/asicon/KangZCDZWZLGNW21
Xiaoxu Kang, Xiaolan Zhong, Zhangfa Chen, Zhengkai Dao, Qiang Zhang, Hao Wan, Yamin Zhou, Ming Li, Yingjia Guo, Ran Nie, Tao Wu:
Development and Characterization of High Temperature Plasma Nitridation Process for Advanced CMOS Technology Application. ASICON 2021: 1-3

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