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    Cem 419 Exp 1

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    Nilesh Barange
    This document provides instructions for an introduction laboratory on ellipsometry. The objectives are to become familiar with the ellipsometer and software, calibrate the angle of reflection, and make measurements on a silicon/silicon dioxide system to investigate refractive index variation with wavelength. Experiments include initializing and calibrating the ellipsometer using a silicon wafer standard, calibrating the incident angle, measuring optical constants of silicon dioxide, and measuring optical constants of gold slides before and after piranha cleaning.

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    Cem 419 Exp 1

    Uploaded by

    Nilesh Barange
    18 views3 pages
    This document provides instructions for an introduction laboratory on ellipsometry. The objectives are to become familiar with the ellipsometer and software, calibrate the angle of reflection, and make measurements on a silicon/silicon dioxide system to investigate refractive index variation with wavelength. Experiments include initializing and calibrating the ellipsometer using a silicon wafer standard, calibrating the incident angle, measuring optical constants of silicon dioxide, and measuring optical constants of gold slides before and after piranha cleaning.

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    This document provides instructions for an introduction laboratory on ellipsometry. The objectives are to become familiar with the ellipsometer and software, calibrate the angle of reflection, and make measurements on a silicon/silicon dioxide system to investigate refractive index variation with wavelength. Experiments include initializing and calibrating the ellipsometer using a silicon wafer standard, calibrating the incident angle, measuring optical constants of silicon dioxide, and measuring optical constants of gold slides before and after piranha cleaning.

    Copyright:

    Attribution Non-Commercial (BY-NC)
    Download as PDF, TXT or read online from Scribd
    Download as pdf or txt
    18 views3 pages

    Cem 419 Exp 1

    Uploaded by

    Nilesh Barange
    This document provides instructions for an introduction laboratory on ellipsometry. The objectives are to become familiar with the ellipsometer and software, calibrate the angle of reflection, and make measurements on a silicon/silicon dioxide system to investigate refractive index variation with wavelength. Experiments include initializing and calibrating the ellipsometer using a silicon wafer standard, calibrating the incident angle, measuring optical constants of silicon dioxide, and measuring optical constants of gold slides before and after piranha cleaning.

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    of 3

    Introduction to Ellipsometry

    Laboratory 1
    Objectives: During this laboratory, you will become familiar with the ellipsometer as
    well as with the ellipsometry software. You will also learn how to calibrate the angle of
    reflection and make measurements on a model Si/SiO2 system. Using this system, you
    will investigate how refractive index varies with wavelength.

    Experiments: In this lab, you will begin to make measurements and calculations using
    the J. A. Woollam M-44 ellipsometer. The software uses the Fresnel equations along
    with the theory of multiple reflections to calculate parameters such as refractive index,
    thickness, and absorption coefficient. You can also use the ellipsometry software to
    calculate delta (∆) and psi (Ψ) from a given model. The calculation of these quantities
    has been covered to a large extent in the short course on ellipsometry.

    Here is how to get started.

    1. Power up. The computer and ellipsometer electronics should be off during this
    procedure. Lighting the Xenon lamp requires a lot of power and can damage
    sensitive equipment. Turn on the power supply to the lamp and then ignite the lamp.
    Once the lamp is on, turn on the ellipsometer electronics and the computer.

    Note that the ellipsometer works as described in the short course. Light from the Xenon
    lamp is collimated with the optical fiber and then reflected from the sample at a fixed
    angle. The detector contains a diffraction grating and a diode-array detector so that 44
    wavelengths of light can be analyzed simultaneously. The ellipsometer also contains a
    rotating polarizer. The intensity of the light is recorded as the polarizer rotates and then
    the mathematics described in the short course are used to extract ∆ and Ψ.

    2. Initialization and Calibration. Carefully place the silicon wafer standard on the
    sample stage and start the WVASE program. Go to the hardware pull down menu
    and select initialize. During initialization, software looks for the instrument
    configuration, the rotating analyzer is brought up to speed and data acquisition is
    synchronized with the rotating analyzer. Next, in the hardware menu, select align.
    The ellipsometer contains a 4-quadrant detector. To insure that the sample is flat, the
    signal to each of the quadrants should be identical. Adjust the tilt of the sample stage
    so that the red cross is in the center of the cross-hairs as viewed through the eyepiece.
    This alignment step can be completed only under the condition that the sample is flat.
    Now go to the hardware menu and select calibrate. This calibration is necessary to
    determine the exact positions of the input and analyzer polarizers and the relative
    attenuation of the ac signal relative to the DC signal. (See the short course on
    ellipsometry for details and an explanation of the specific parameters.)
    3. Calibration of the incident angle. Although the ellipsometer is built to precise
    standards and the angle of incidence should be 75.0°, to know this angle precisely
    requires calibration. We do this with the standard silicon wafer included with the
    instrument. The wafer consists of a well defined SiO2 layer on Si. As you might
    guess, this is probably the best-characterized ellipsometric system because of its
    relevance to electronics. First we need to set up Si/SiO2 as our model system.

    a. Go to the model window and select adlayer. Select the file named si-jell.mat. You
    just said that the bottom layer of your sample is silicon. Make sure that you are not
    fitting any optical parameters in this file and that the thickness is on the mm scale.
    We are assuming that the literature values of n and k for silicon are accurate.
    b. Select adlayer again and select the file sio2.mat. Now you have told the software that
    your system consists of a layer of SiO2 on Si. In the model window, select the SiO2
    layer and put in 250 Å for the thickness. Check the fit box by thickness. Do not fit
    the optical constants. This indicates that, after we make a measurement, we will fit
    the data to this Si/SiO2 model using the thickness of SiO2 as the adjustable parameter.
    c. Now go to the hardware/experimental_data/angles and click the 'Fit' box. This says
    that along with thickness, you will use the angle of incidence to fit the data.
    d. In the hardware window, go to experimental data and click “acquire single scan”.
    This gathers your ellipsometric data.
    e. In the fit window, select fit/normal fit. You should now see the thickness of the
    Si/SiO2 film along with the angle of incidence. The ∆ and Ψ data were fitted by
    varying the angle of incidence along with the film thickness. If the film thickness
    isn't around 250 Å, something is not right.
    f. Repeat the process to see how precisely you can determine the angle of incidence.
    Try a few positions on the wafer.
    g. Make this the angle of incidence for future experiments.

    What you just did was to assume that the literature optical constants for Si and SiO2 are
    correct. Then you could fit both the angle of incidence and the thickness of your sample.
    You can make this determination at 44 wavelengths so it should be quite precise. Look at
    the graph window to see how good the fit was.

    Measurement of the Optical Constants of SiO2

    1. Now that you know a little bit about the ellipsometer, you can start fitting optical
    constants. Go ahead and make some measurements of the thickness and optical
    constants of SiO2. Print out the optical constants and return them with your lab
    report. You do this by going to the model and deciding to fit n for the SiO2. Just fit
    refractive index, n, and thickness. The extinction coefficient, k, should be zero for
    this transparent film. Make sure that you are not fitting the angle.

    2. Refresh the optical constants of SiO2 by reloading the layer. Go to the model window
    and delete the SiO2 layer. Then add it again. Use the thickness that you previously
    measured, but don't fit it again. This time, fit the n and k values of the base Si layer.
    How close are the values to the literature values in the original file.
    Measurements on Gold Slides

    A gold film is a simpler system to work with than a monolayer-coated slide. The reason
    for this is that there is no surface film (at least in principle).

    1. Rinse a gold slide with EtOH and dry it with N2. Measure its optical constants.
    Write down the values at 633 nm. Next, clean the slide in piranha solution for 30
    seconds. Rinse copiously with millipore water. Prepare 100 mL of the piranha
    solution by mixing H2O2 with H2SO4 in a 1:3 ratio. Use extreme care
    when working with piranha solution. You must wear a
    lab coat or apron, gloves and a face shield. Mount the substrate
    in a plastic hemostat being careful to grab only a corner. Next measure the optical
    constants. Write down the values at 633 nm. Also note the ∆ and Ψ values.

    SAVE THESE SUBSTRATES IN SCINTILLATION VIALS FOR LABORATORY 2

    In your report, describe the reasons for the differences between the sample before
    and after piranha cleaning.

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