@ eScan® Series ‘HOME -Proauets @Scan® Sores
Description
Scan series of e-beam inspection systems is designed for
vanced wafer manutectuters. With the acvent of eScan®.
orocty eacoine in advancee fate beng recaltrated oScan® F
fers tact old ennancoment wth the smatest e-beam mepeztion|
xol se, nignestsonctvty to DOI, and nan-resokton imaging for -
Inspeeaon. Crystal clear on-o0lreviow magec oectvoly reduce
‘no ume to recut cys by oumunsting moet roviow SEM.
requirements. eScan® 220% e-beam inspecton system caplures
‘ny physical defect and VC (Votage Convast)dafacs th Hl oscan®sones
patented resoluton enhancement
econ gun. eScan® 320:p's LeaphScan™ technology with LFOV (Lage Field of View) and WWDS { Whe Wafer
Die Sampling ) provides effectively Rexbity for process monitoring. eScan® 400sp with continuous scan e-beam
inspection system provides most cos fective solution nih balanced sensiviy end throughput for advanced memory
and logic abs
‘oScan® 500:
‘eScari500 tne next genettion model fr the cutentTagship models eScar"320 and eScan®400, Faced win te
continuing minituration demands of he manuracturng processes ofthe semiconductor customers, the image
resolution of he eScari"500is enhanced by mare than 20% compared othe eScar320_Al the same ima, # bundles
4 mor flexible "LeapNScan™" scanning system wth he Continuous Scan system
‘Value Propostio
+ AN EBI system with longest fe ime for advanced abs.
‘+ An EB! system withthe highest sens to DOI (defect of intrest) signature detection
“+ An EB! system wth the most retabe data andthe highest datactfcation matting,
“+ AN EB! eystom ofoang to manos! connéonce ovel on advanced covice analy.
+ ANEBL system with Hits unique advanced charge control capabity,
+ The ellanager™ ADC system wih the mast advanced defect binning gorithm.
‘Applications
‘Scarfs capable of ganarating detect baselne for both physica and eiectical defects. eScans main
applications incuce - Front-end of ine at Sade, HKMG and FinFET, Mid-end of ine a contact ACI and WCMP; and
ack-and ofine at Via ACI and CU-CUP, ee.