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Heat treatment effects on the surface
morphology and optical properties
of ZnO nanostructures
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Phys. Status Solidi C 7, No. 9, 2286–2289 (2010) / DOI 10.1002/pssc.200983722
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current topics in solid state physics
M. Zainizan Sahdan*,1,3, M. Hafiz Mamat1, M. Salina1, Zuraida Khusaimi2, Uzer M. Noor1,
and Mohamad Rusop1
1
Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam, Selangor, Malaysia
Faculty of Applied Sciences, Universiti Teknologi MARA, 40450 Shah Alam, Selangor, Malaysia
3
Faculty of Electrical and Electronics Engineering, Universiti Tun Hussein onn Malaysia, 86400 Batu Pahat, Johor, Malaysia
2
Received 4 June 2009, accepted 29 April 2010
Published online 14 June 2010
Keywords ZnO, CVD, nanocrystals, surface morphology, structure, annealing, photoluminescence
* Corresponding author: e-mail zainizno@gmail.com, Phone: +6019 727 6903, Fax: +607 453 6060
Zinc oxide (ZnO) nanostructures have received broad attention due to its wide applications especially for thin-film solar
cells and transistors. In this paper, we report the effects of
heat treatment on the structural and optical properties of ZnO
nanostructures. Zinc oxide nanostructures were synthesized
using thermal chemical vapour deposition (CVD) method on
glass substrate. The surface morphologies which were observed by scanning electron microscope (SEM) show that
ZnO nanostructures change its shape and size when the annealing temperature increases from 400oC to 600oC. Structural measurement using X-ray diffraction (XRD) has shown
that ZnO nanostructures have the highest crystallinity and
smallest crystallite size (20 nm) when annealed at 550 oC.
Furthermore, the samples were optically characterized using
Photoluminescence (PL) spectrometer. The PL spectra indicate that ZnO nanostructures have the highest peak at UV
wavelength when annealed at 550 oC. The mechanism of the
PL properties of ZnO nanostructures is also discussed. We
conclude that ZnO nanostructures deposited using thermal
CVD have the optimum structural and PL properties when
annealed at 550 oC.
© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
1 Introduction The reducing of size in electronic devices has produced self-assembled micro and nanostructured materials for commercial applications. There is
also significant academic research interest in nano-systems
as their properties are remarkably different from their bulk
materials due to quantum confinement effect [1,2]. In
quantum confinement theory, 1-dimensional confinement
such as rods and wires increase carrier transport in light
harvesting cells [3,4]. Therefore, much attention has been
paid recently to the nanostructured materials such as zinc
oxide (ZnO) and gallium nitrate (GaN) due to their ability
to exhibit near ultra-violet emission. ZnO is an n-type
semiconductor which has wide bandgap energy (~3.37 eV)
and large exciton binding energy (~60 meV) [5,6]. Nanostructures and heterostructures made of ZnO have already
been used as a transparent conductor in solar cells, varistors and sensors [7,8]. Recently, ZnO nanostructures have
draw attentions for possible applications in optoelectronic
devices such as nanostructured solar cells, ultra sensitive
optical fiber sensors and UV laser diodes [9-11]. ZnO
nanostructures are required to have high crystalline quality
for most applications. Thermal annealing is a widely used
technique to improve the crystal quality, which affect the
structural, optical and electrical properties by reducing defects in material [1,12]. Therefore, understanding the effects of heat treatment on the structural and optical properties of ZnO nanostructures is of interest for various technologies employing this material.
ZnO nanostructures can be prepared using various
deposition techniques including spray pyrolysis, r.f. magnetron sputtering, pulse laser deposition, sol-gel and
chemical vapour deposition (CVD) [13-15]. Among these
techniques, CVD is a promising technique for its simple
process flow, produce high conductivity films with fewer
defects and at low cost. A gas blocker was introduced by
the author in previous research to synthesis ZnO nanostructures [16]. Samples produced using this technique was
annealed at different temperature ranging from 450 oC to
600 oC. The effects of heat treatment on the surface morphology of ZnO nanostructures was studied using field
© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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Phys. Status Solidi C 7, No. 9 (2010)
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emission scanning electron microscope (Zeiss Supra-Ultra)
and the structural property was measured using X-ray diffraction (D8 Advance Bruker). The photoluminescence
(PL) and transmittance properties were measured using PL
(Horiba Jobin Vyon) and UltraViolet-Visible-Near Infra
Red (Lambda 750), respectively. In this paper, we focus our
discussion on the optical properties of ZnO nanostructures.
a
2 Experimental setup The experimental setup to
prepare ZnO nanostructures using thermal CVD by introducing gas blocker is shown in Fig. 1. The equipment consists of two thermal furnaces, temperature controller, horizontal alumina tube, and gas inlet and outlet.
b
Figure 1 The schematic diagram of thermal CVD system.
Glass substrate was cleaned using acetone and sonicated
for 10 minutes. 4 samples were prepared and sputtered
with gold target (6 nm) using d.c. sputter coater. The sample was placed in the thermal furnace 2. The precursor was
prepared using ZnO nanopowder mixed with graphite using same ratio (1:1). It was then placed in the thermal furnace 1 attached with a gas blocker. The parameters for the
deposition process are adjusted and shows in Table 1. The
deposition process is carried out for 1 hour. After that, the
sample was cooled down at room temperature. The samples were annealed at different temperature ranging from
450 oC to 600 oC. After the annealing process was done,
samples were characterized to study the effects of annealing temperature on the surface morphology, structural and
optical properties of ZnO nanostructures.
c
Table 1 The parameters for ZnO nanostructures deposition.
Parameter
Value
Temperature (T1)
Temperature (T2)
Ar gas flow rate
1000 oC
400 oC
1 litre/min
3 Results and discussion Figure 2 shows the surface morphology of ZnO nanostructures when annealed at
different temperature. In Fig. 2(a), a worm-like ZnO
nanostructure was synthesized when 450 oC was used as
the annealing temperature. The diameter of the structure is
approximately 72 nm (inset). Figure 2(b) shows the ZnO
forms many grains on the substrate when annealed at 500
o
C. The grain size is approximately 200 nm. In Fig. 2(c),
ZnO needles were formed with diameter size
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d
Figure 2 The SEM images of ZnO nanostructures annealed at
different temperature, inset is the diameter of the structure; (a)
450 oC; (b) 500 oC; (c) 550 oC; (d) 600 oC.
© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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M. Z. Sahdan et al.: On the surface morphology and optical properties of ZnO nanostructures
of approximately 14 nm when annealed at 550 oC. In Fig.
2(d), a nearly similar structure as 2(c) was grown on the
sample when it was annealed at 600 oC. However, the needles formed are shorter than in Fig. 2(c). By observing the
surface morphology, we found that the annealing temperature has significant effects on the growth of the ZnO
nanostructures. However, the growth pattern is not uniform.
Figure 3 shows the structural property of ZnO nanostructures after annealing at different temperature using Xray diffraction (XRD). We focused on the (002) plane
since this direction has effective ionic charges between the
alternating Zn and O layers [17]. Stronger preferable orientation on (002) plane will increase the Hall mobility and
therefore is suitable for optoelectronic applications [18].
The crystallite size (D) is determined using Scherrer formula using FWHM (full width half modulation) [21].
D = 0.9.λ/ (FWHM).Cos θ
(1)
Using formula Eq. (1) where λ is the X-ray wavelength
(0.154 nm) and θ is the Brag diffraction angle, the calculated crystallite size is summarized in Table 2.
Table 2 The crystallite of ZnO nanostructures at (002) plane.
Temperature (oC)
450
500
550
600
FWHM
0.273
0.302
0.424
0.396
Crystallite size (nm)
31
28
20
21
We found that, as the annealing temperature increased
from 450 oC to 550 oC, the crystallite size also increased.
However, when the annealing temperature was increased
to 600 oC, the crystallite size was decreased. We suppose
that, for the structural growth of ZnO nanostructures, the
optimum annealing temperature is at 550 oC.
Figure 3 The (002) peaks of ZnO nanostructures annealed at different temperature; (a) 450 oC; (b) 500 oC; (c) 550 oC; (d) 600 oC.
In Fig. 3, the (002) peak for the sample annealed at 450oC
is diffracted at 34.5o. The diffraction angle for the sample
annealed at 500 oC is 34.56o (shifted to right). However,
the intensity of the peak is slightly decreased. When the
sample was annealed at 550 oC, the intensity of (002)
peaks has increased sharply and the diffraction angle is at
34.6o (shifted to right). Further increased on the annealing
temperature to 600 oC has results on the decreasing of
(002) peak intensity and also the diffraction angle has
shifted to left at 34.57o. Referring to JCPDS card No. 361451, we found that as we increased the annealing temperature, the residual stress of the ZnO nanostructures also
increased [19]. This stress is due to the thermal expansion
coefficient (α) between ZnO (α = 7 x 10-6.C-1) and gold
catalyst (α = 14 x 10-6.C-1) [20]. We supposed that due to
large different in the thermal expansion coefficient, as the
annealing temperature increased, the residual stress also
increased and shifting the diffraction angle to right.
© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Figure 4 shows the photoluminescence (PL) spectra of ZnO nanostructures when annealed at different temperatures. As can be seen from the figure, each spectrum
has sharp peak at UV region and broad peak at indigo and
green-yellow regions. The PL spectrum centred at about
3.31 eV and 2.14 eV. The PL emission at indigo region is
difficult to determine the centre point since it has many
small peaks. Observation from PL spectra, we found that at
the visible wavelength, as the crystallite size of ZnO decreased, the PL intensity will increase. However, at UV
wavelength, although the crystallite size for annealing
temperature at 500 oC is bigger (28 nm) than the 600 oC
(21 nm), the PL intensity at UV emission for 500 oC is
higher than 600 oC. We suggest that shape of the ZnO
nanostructures also affect its optical properties as being reported by Buhro et al. [22]. As for the mechanism, the
emission of ZnO nanostructures has been studied using
full-potential liner muffin-tin orbital method. Peng has calculated the energy defect level and the result is shown in
Fig. 5 [21].
The ultraviolet emission of ZnO (~3.31 eV) which is
nearly the value of bandgap energy (3.37 eV) is due to the
radiative recombination between electron and holes [22].
We supposed that, the blue-green emission (2.9, 2.8, 2.7
eV) is due to the electron transition from conduction band
to the oxygen interstitial (Oi) which is the acceptor defect
in intrinsic ZnO. The yellow-green emission is due to the
electron transition from oxygen vacancy (Vo) which is the
donor defect in intrinsic ZnO to the top level of the valence
band. From the PL emission, the optimum annealing temperature is 550 oC.
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Acknowledgements The authors would like to thank Universiti Tun Hussein Onn Malaysia and Ministry of Higher Education Malaysia for the financial support.
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