research-article

Constrained pattern assignment for standard cell based triple patterning lithography

Authors:

Martin D. F. WongAuthors Info & Claims

ICCAD '13: Proceedings of the International Conference on Computer-Aided Design

Pages 178 - 185

Published: 18 November 2013 Publication History

Abstract

Triple patterning lithography (TPL) has been recognized as one of the most promising candidates for 14/10nm technology node. Apart from obtaining legal TPL decompositions, various concerns have been raised by the designers, among them consistently assigning the same pattern for the same type of standard cells and balancing the usage of the three masks are two most critical ones. In this paper, a hybrid approach (SAT followed by a sliding-window approach) is proposed targeting at these two problems. To assign the same pattern for the same type of standard cell, we pre-color the boundary polygons of each type of cell by solving a small SAT problem. Following that we propose a sliding-window based approach to compute a locally balanced decomposition. Our algorithm guarantees to find a feasible solution if one exists. Experimental results verify that the problem can be solved very efficiently with the proposed algorithm. Superior locally balanced decompositions are achieved compared with the previous approach in [19].

References

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Digital Library

Cited By

Zhang YLuk WYang YZhou HYan CPan DZeng X(2015)Layout Decomposition with Pairwise Coloring and Adaptive Multi-Start for Triple Patterning LithographyACM Transactions on Design Automation of Electronic Systems10.1145/276490421:1(1-25)Online publication date: 2-Dec-2015
https://dl.acm.org/doi/10.1145/2764904
Pan DLiebmann LYu BXu XLin Y(2015)Pushing multiple patterning in sub-10nmProceedings of the 52nd Annual Design Automation Conference10.1145/2744769.2747940(1-6)Online publication date: 7-Jun-2015
https://dl.acm.org/doi/10.1145/2744769.2747940
Lin TChu CDavoodi AYoung E(2015)TPL-Aware Displacement-driven Detailed Placement Refinement with Coloring ConstraintsProceedings of the 2015 Symposium on International Symposium on Physical Design10.1145/2717764.2717770(75-80)Online publication date: 29-Mar-2015
https://dl.acm.org/doi/10.1145/2717764.2717770
Show More Cited By

Index Terms

Constrained pattern assignment for standard cell based triple patterning lithography
1. Applied computing
  1. Arts and humanities
    1. Architecture (buildings)
      1. Computer-aided design
  2. Physical sciences and engineering
    1. Engineering
      1. Computer-aided design
2. Hardware

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Information & Contributors

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Published In

cover image ACM Conferences

ICCAD '13: Proceedings of the International Conference on Computer-Aided Design

November 2013

871 pages

ISBN:9781479910694

General Chair:
Jörg Henkel
Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany

Sponsors

SIGDA: ACM Special Interest Group on Design Automation
IEEE CEDA

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IEEE Press

Publication History

Published: 18 November 2013

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ICCAD'13

Sponsor:

SIGDA

ICCAD'13: The International Conference on Computer-Aided Design

November 18 - 21, 2013

California, San Jose

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ICCAD '13 Paper Acceptance Rate 92 of 354 submissions, 26%;

Overall Acceptance Rate 457 of 1,762 submissions, 26%

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Citations

Cited By

Zhang YLuk WYang YZhou HYan CPan DZeng X(2015)Layout Decomposition with Pairwise Coloring and Adaptive Multi-Start for Triple Patterning LithographyACM Transactions on Design Automation of Electronic Systems10.1145/276490421:1(1-25)Online publication date: 2-Dec-2015
https://dl.acm.org/doi/10.1145/2764904
Pan DLiebmann LYu BXu XLin Y(2015)Pushing multiple patterning in sub-10nmProceedings of the 52nd Annual Design Automation Conference10.1145/2744769.2747940(1-6)Online publication date: 7-Jun-2015
https://dl.acm.org/doi/10.1145/2744769.2747940
Lin TChu CDavoodi AYoung E(2015)TPL-Aware Displacement-driven Detailed Placement Refinement with Coloring ConstraintsProceedings of the 2015 Symposium on International Symposium on Physical Design10.1145/2717764.2717770(75-80)Online publication date: 29-Mar-2015
https://dl.acm.org/doi/10.1145/2717764.2717770
Tian HDu YZhang HXiao ZWong MChang Y(2014)Triple patterning aware detailed placement with constrained pattern assignmentProceedings of the 2014 IEEE/ACM International Conference on Computer-Aided Design10.5555/2691365.2691392(116-123)Online publication date: 3-Nov-2014
https://dl.acm.org/doi/10.5555/2691365.2691392
Kuang JChow WYoung EChang Y(2014)Triple patterning lithography aware optimization for standard cell based designProceedings of the 2014 IEEE/ACM International Conference on Computer-Aided Design10.5555/2691365.2691391(108-115)Online publication date: 3-Nov-2014
https://dl.acm.org/doi/10.5555/2691365.2691391
Yu BPan D(2014)Layout Decomposition for Quadruple Patterning Lithography and BeyondProceedings of the 51st Annual Design Automation Conference10.1145/2593069.2593152(1-6)Online publication date: 1-Jun-2014
https://dl.acm.org/doi/10.1145/2593069.2593152
Du YGuo DWong MYi HWong HZhang HMa QHenkel J(2013)Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell libraryProceedings of the International Conference on Computer-Aided Design10.5555/2561828.2561866(186-193)Online publication date: 18-Nov-2013
https://dl.acm.org/doi/10.5555/2561828.2561866

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