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Integration of Advanced Source and Drain Extension Process Using Carbon/Fluorine Co-Implants and Spike Anneal in 65nm PMOS Devices / Li, C I ; Wang, H Y ; Chien, C C ; Chain, M ; Yang, C L ; Tzou, S F ; Graoui, H ; Foad, M ; Ting, Richard
2006 - Published in : AIP Conf. Proc.: 866 (2006) , pp. 46-49 External link: Published version from AIP
In : 16th International Conference on Ion Implantation Technology, Marseilles, France, 11 - 16 Jun 2006, pp.46-49

Deactivation of low energy Boron Implants into Pre-amorphised Si after Non-Melt Laser Annealing with Multiple Scans / Sharp, J A ; Cowern, N E B ; Webb, R P ; Giubertoni, D ; Gennaro, S ; Bersani, M ; Foad, M ; Kirkby, K J
2006 - Published in : AIP Conf. Proc.: 866 (2006) , pp. 33-36 External link: Published version from AIP
In : 16th International Conference on Ion Implantation Technology, Marseilles, France, 11 - 16 Jun 2006, pp.33-36

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1	Foad, Majeed

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