[PDF][PDF] Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors
G Murdoch, A Milenin, C Delvaux, P Ong… - 17th Opto-Electronics …, 2012 - biblio.ugent.be
G Murdoch, A Milenin, C Delvaux, P Ong, S Pathak, D Vermeulen, G Sterckx, G Winroth…
17th Opto-Electronics and Communications Conference (OECC-2012), 2012•biblio.ugent.beWe report on Si photonics devices fabricated on 300mm SOI substrates using 193-
immersion lithography. Record lowloss of 0.7 dB/cm with low phase-errors is obtained for
450-nm wide wire waveguides. We also demonstrate subwavelength grating fiber couplers
with 42% coupling efficiency.
immersion lithography. Record lowloss of 0.7 dB/cm with low phase-errors is obtained for
450-nm wide wire waveguides. We also demonstrate subwavelength grating fiber couplers
with 42% coupling efficiency.
We report on Si photonics devices fabricated on 300mm SOI substrates using 193-immersion lithography. Record lowloss of 0.7 dB/cm with low phase-errors is obtained for 450-nm wide wire waveguides. We also demonstrate subwavelength grating fiber couplers with 42% coupling efficiency.
biblio.ugent.be