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Extract from the Register of European Patents

EP About this file: EP0990059

EP0990059 - LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION PROCESS FOR FORMING BISMUTH-CONTAINING CERAMIC THIN FILMS USEFUL IN FERROELECTRIC MEMORY DEVICES [Right-click to bookmark this link]
Status	No opposition filed within time limit Status updated on 08.08.2008 Database last updated on 21.10.2024
Most recent event Tooltip	28.08.2009	Change - representative	published on 30.09.2009 [2009/40]
Applicant(s)	For all designated states ADVANCED TECHNOLOGY MATERIALS, INC. 7 Commerce Drive Danbury, CT 06810 / US
	For all designated states Infineon Technologies AG St.-Martin-Strasse 53 81669 München / DE
	[2007/40]
Former [2005/26]	For all designated states ADVANCED TECHNOLOGY MATERIALS, INC. 7 Commerce Drive Danbury, CT 06810 / US
	For all designated states Infineon Technologies AG St.-Martin-Strasse 53 81669 München / DE
Former [2000/14]	For all designated states ADVANCED TECHNOLOGY MATERIALS, INC. 7 Commerce Drive Danbury, CT 06810 / US
	For all designated states SIEMENS AKTIENGESELLSCHAFT St Martin Strasse 76 81541 München / DE
Inventor(s)	01 / HINTERMAIER, Frank, S. Lipowskystrasse 19 D-81373 Munich / DE
	02 / DEHM, Christine Oefelestrasse 14 D-81543 Munich / DE
	03 / HOENLEIN, Wolfgang Parkstrasse 8a D-82008 Unterhaching / DE
	04 / VAN BUSKIRK, Peter, C. 18 Poverty Hollow Road Newtown, CT 06470 / US
	05 / ROEDER, Jeffrey, F. 4 Longmeadow Hill Road Brookfield, CT 06804 / US
	06 / HENDRIX, Bryan, C. Apartment 409, 79 Park Avenue Danbury, CT 06810 / US
	07 / BAUM, Thomas, H. 2 Handol Lane New Fairfield, CT 06812 / US
	08 / DESROCHERS, Debra, A. 756 Federal Road Brookfield, CT 06804 / US
	[2007/40]
Former [2000/14]	01 / HINTERMAIER, Frank, S. Lipowskystrasse 19 D-81373 Munich / DE
	02 / DEHM, Christine Oefelestra 14 D-81543 Munich / DE
	03 / HOENLEIN, Wolfgang Parkstrasse 8a D-82008 Untorhaching / DE
	04 / VAN BUSKIRK, Peter, C. 18 Poverty Hollow Road Newtown, CT 06470 / US
	05 / ROEDER, Jeffrey, F. 4 Longmeadow Hill Road Brookfield, CT 06804 / US
	06 / HENDRIX, Bryan, C. Apartment 409, 79 Park Avenue Danbury, CT 06810 / US
	07 / BAUM, Thomas, H. 2 Handol Lane New Fairfield, CT 06812 / US
	08 / DESROCHERS, Debra, A. 756 Federal Road Brookfield, CT 06804 / US
Representative(s)	Castell, Klaus Patentanwaltskanzlei Liermann-Castell Oberstraße 135 52349 Düren / DE
	[N/P]
Former [2009/40]	Castell, Klaus Patentanwaltskanzlei Liermann - Castell Gutenbergstrasse 12 52349 Düren / DE
Former [2000/14]	Castell, Klaus, Dr. Gutenbergstrasse 12 52349 Düren / DE
Application number, filing date	98934193.8	26.06.1998
	[2000/14]
	WO1998US13470
Priority number, date	US19970050081P	26.06.1997 Original published format: US 50081 P
	US19970975087	20.11.1997 Original published format: US 975087
	[2000/14]
Filing language	EN
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO9900530
	Date:	07.01.1999
	Language:	EN
	[1999/01]
	Type:	A1 Application with search report
	No.:	EP0990059
	Date:	05.04.2000
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 07.01.1999 takes the place of the publication of the European patent application.
	[2000/14]
	Type:	B1 Patent specification
	No.:	EP0990059
	Date:	03.10.2007
	Language:	EN
	[2007/40]
Search report(s)	International search report - published on:	US	07.01.1999
	(Supplementary) European search report - dispatched on:	EP	15.09.2000
Classification	IPC:	C23C16/00, B32B9/00, C23C16/40, C23C16/56	[2000/44]
	CPC:	C23C16/40 (EP,US); C23C16/00 (KR); H01L21/02197 (EP,KR,US); C23C16/56 (EP,US); H01L21/02205 (EP,KR,US); H01L21/02271 (EP,KR,US); (+) H01L21/31691 (US) (-)
	Former IPC [2000/14]	C23C16/00, B32B9/00
Designated contracting states	BE, DE, FR, GB, IT [2000/14]
Title	German:	NIEDRIG TEMPERATUR CVD-VERFAHREN ZUR HERSTELLUNG VON WISMUTH ENTHALTENDEN DÜNNEN KERAMIK-SCHICHTEN ZUR VERWENDUNG IN FERROELEKTRISCHEN SPEICHERANORDNUNGEN	[2000/14]
	English:	LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION PROCESS FOR FORMING BISMUTH-CONTAINING CERAMIC THIN FILMS USEFUL IN FERROELECTRIC MEMORY DEVICES	[2000/14]
	French:	PROCEDE DE DEPOT CHIMIQUE EN PHASE VAPEUR BASSE TEMPERATURE SERVANT A FORMER DE MINCES FILMS DE CERAMIQUE CONTENANT DU BISMUTH UTILES DANS DES DISPOSITIFS A MEMOIRES FERROELECTRIQUES	[2000/14]
Entry into regional phase	24.12.1999	National basic fee paid
	24.12.1999	Search fee paid
	24.12.1999	Designation fee(s) paid
	24.12.1999	Examination fee paid
Examination procedure	21.01.1999	Request for preliminary examination filed International Preliminary Examining Authority: US
	23.12.1999	Request for accelerated examination filed
	24.12.1999	Examination requested [2000/14]
	29.11.2000	Despatch of a communication from the examining division (Time limit: M04)
	29.11.2000	Decision about request for accelerated examination - accepted: Yes
	14.02.2001	Reply to a communication from the examining division
	15.03.2001	Despatch of a communication from the examining division (Time limit: M04)
	27.06.2001	Reply to a communication from the examining division
	17.07.2001	Despatch of a communication from the examining division (Time limit: M04)
	21.11.2001	Reply to a communication from the examining division
	27.12.2001	Despatch of a communication from the examining division (Time limit: M04)
	09.04.2002	Reply to a communication from the examining division
	18.06.2002	Despatch of a communication from the examining division (Time limit: M04)
	20.09.2002	Reply to a communication from the examining division
	12.05.2003	Despatch of communication that the application is refused, reason: substantive examination {1}
	23.02.2005	Communication of intention to grant the patent
	24.05.2005	Fee for grant paid
	24.05.2005	Fee for publishing/printing paid
Appeal following examination	14.07.2003	Appeal received No. T0935/03
	21.07.2003	Statement of grounds filed
	06.05.2004	Invitation to file observations in an appeal (Time limit: M03) [2004/19]
	07.07.2004	Date of receipt of observations in an appeal [2004/28]
	15.09.2004	Result of appeal procedure: continuation of examination procedure
Opposition(s)	04.07.2008	No opposition filed within time limit [2008/37]
Fees paid	Renewal fee
	16.06.2000	Renewal fee patent year 03
	11.06.2001	Renewal fee patent year 04
	27.06.2002	Renewal fee patent year 05
	17.06.2003	Renewal fee patent year 06
	30.06.2004	Renewal fee patent year 07
	30.06.2005	Renewal fee patent year 08
	02.01.2007	Renewal fee patent year 09
	28.06.2007	Renewal fee patent year 10
	Penalty fee
	Additional fee for renewal fee
	30.06.2006	09 M06 Fee paid on 02.01.2007
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]US4975299 (MIR JOSE M [US], et al);
		[A]US5431957 (GARDINER ROBIN A [US], et al);
	International search	[X]US5478610 (DESU SESHU B [US], et al);
		[A]US5519566 (PERINO STANLEY [US], et al);
		[A]US5648114 (PAZ DE ARAUJO CARLOS A [US], et al)

The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.

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