WO2015166999A1 - 発光体及び放射線検出器 - Google Patents
発光体及び放射線検出器 Download PDFInfo
- Publication number
- WO2015166999A1 WO2015166999A1 PCT/JP2015/063032 JP2015063032W WO2015166999A1 WO 2015166999 A1 WO2015166999 A1 WO 2015166999A1 JP 2015063032 W JP2015063032 W JP 2015063032W WO 2015166999 A1 WO2015166999 A1 WO 2015166999A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- garnet
- added
- ppm
- light emitter
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 48
- 239000002223 garnet Substances 0.000 claims abstract description 63
- 150000001768 cations Chemical class 0.000 claims abstract description 33
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 22
- 229910052765 Lutetium Inorganic materials 0.000 claims abstract description 21
- 229910052688 Gadolinium Inorganic materials 0.000 claims abstract description 16
- 229910052777 Praseodymium Inorganic materials 0.000 claims abstract description 16
- 229910052771 Terbium Inorganic materials 0.000 claims abstract description 16
- 229910052769 Ytterbium Inorganic materials 0.000 claims abstract description 16
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 16
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 15
- 229910052706 scandium Inorganic materials 0.000 claims abstract description 6
- 239000013078 crystal Substances 0.000 claims description 116
- 238000000034 method Methods 0.000 claims description 65
- 238000002834 transmittance Methods 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 22
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 20
- 239000012298 atmosphere Substances 0.000 claims description 15
- 239000002994 raw material Substances 0.000 claims description 15
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000000137 annealing Methods 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 11
- 239000001301 oxygen Substances 0.000 claims description 11
- 229910052760 oxygen Inorganic materials 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 7
- 229910052744 lithium Inorganic materials 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- 239000012780 transparent material Substances 0.000 claims 2
- 238000004020 luminiscence type Methods 0.000 abstract 2
- 230000000052 comparative effect Effects 0.000 description 41
- 239000000203 mixture Substances 0.000 description 39
- 239000007789 gas Substances 0.000 description 16
- 238000010521 absorption reaction Methods 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 13
- 229910052782 aluminium Inorganic materials 0.000 description 11
- 238000005498 polishing Methods 0.000 description 10
- 238000005245 sintering Methods 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 7
- 230000005251 gamma ray Effects 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 239000000155 melt Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000004809 Teflon Substances 0.000 description 5
- 229920006362 Teflon® Polymers 0.000 description 5
- 239000012300 argon atmosphere Substances 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 5
- 235000011007 phosphoric acid Nutrition 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 238000000691 measurement method Methods 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 description 3
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 235000019219 chocolate Nutrition 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 238000001513 hot isostatic pressing Methods 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 229910052702 rhenium Inorganic materials 0.000 description 3
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 239000010948 rhodium Substances 0.000 description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 238000003325 tomography Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000005231 Edge Defined Film Fed Growth Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000002059 diagnostic imaging Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052701 rubidium Inorganic materials 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000002603 single-photon emission computed tomography Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 230000005250 beta ray Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000007716 flux method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- -1 orthophosphoric acid Chemical compound 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/7766—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals containing two or more rare earth metals
- C09K11/7774—Aluminates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/54—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing zinc or cadmium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/55—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing beryllium, magnesium, alkali metals or alkaline earth metals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/62—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/28—Complex oxides with formula A3Me5O12 wherein A is a rare earth metal and Me is Fe, Ga, Sc, Cr, Co or Al, e.g. garnets
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2012—Measuring radiation intensity with scintillation detectors using stimulable phosphors, e.g. stimulable phosphor sheets
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/202—Measuring radiation intensity with scintillation detectors the detector being a crystal
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T3/00—Measuring neutron radiation
- G01T3/06—Measuring neutron radiation with scintillation detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/085—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors the device being sensitive to very short wavelength, e.g. X-ray, Gamma-rays
Definitions
- the present invention absorbs radiation such as gamma rays, X-rays, ⁇ rays, ⁇ rays, neutron rays and high energy photons and emits light containing cerium as an activator for rapidly converting to photons with lower energy. About the body.
- the present invention also relates to a photon detector or a radiation detector using the light emitter.
- Light emitters such as scintillators are used in photon detectors or radiation detectors that detect gamma rays, X-rays, ⁇ -rays, ⁇ -rays, neutron rays, etc., which detectors are positron emission nuclide tomography (PET) devices, It is widely applied to medical imaging devices such as X-ray CT, various radiation measuring devices for high energy physics, and resource exploration devices.
- PET positron emission nuclide tomography
- positron emission nuclide tomography PET
- a relatively high-energy gamma ray (annihilation gamma ray: 511 eV) is detected by coincidence counting, so a scintillation detector with high sensitivity and high-speed response is used. It has been.
- the detector characteristics are required to have high counting rate characteristics and high temporal resolution for removing accidental coincidence noise.
- TOF-PET Time ⁇ offlight type PET
- TOF-PET Time ⁇ offlight type PET
- a high-speed response is required, and it is important that the scintillator used in the radiation detector has a short fluorescence lifetime.
- scintillators suitable for these radiation detectors have high density and high atomic number (high photoelectric absorption ratio) in terms of detection efficiency, high light-emission requirements, and high light energy. Therefore, it is desired that the crystal has a short fluorescence lifetime (fluorescence decay time) or a highly transparent crystal.
- fluorescence lifetime fluorescence decay time
- price is also an important selection factor.
- a scintillator having a garnet structure As a preferable scintillator applied to various radiation detectors, there is a scintillator having a garnet structure.
- a Ce-added (Gd, Y, Lu) 3 (Al, Ga) 5 O 12 crystal that is a scintillator having a garnet structure using light emission from the 4f5d level of Ce 3+ has been reported (for example, a patent Reference 1 or non-patent reference 1).
- Ce addition (Gd, Y, Lu) 3 (Al, Ga) 5 O 12 it has been confirmed that the scintillator characteristics such as density, light emission amount, and fluorescence lifetime change depending on the crystal composition.
- Gd 3 Al 2 Ga 3 O 12 scintillator has characteristics of density 6.7g / cm 3 , light emission amount 45000photon / MeV, and self-radiation is sufficiently small, so it is not limited to application to PET device, Applications to medical imaging devices such as X-ray CT, various radiation measuring devices for high energy physics, and environmental radiation measuring devices are advancing. On the other hand, the scintillator has a problem that the fluorescence lifetime is as long as about 90 ns.
- the conventional scintillator having a Ce-added garnet structure has a problem that the fluorescence lifetime is long, the transparency is low, and the light emission amount is small.
- the present invention has been made in view of such problems, and an object of the present invention is to provide a light emitter that has a short fluorescence lifetime, a high transparency, and a large light emission amount, and a radiation detector using the light emitter. And thereby, it is suitable for a light emitter for a radiation detector such as gamma rays, X-rays, ⁇ rays, neutron rays, and provides a light emitter having a short fluorescence decay time and a high emission intensity, and a radiation detector using the light emitter. can do.
- a radiation detector such as gamma rays, X-rays, ⁇ rays, neutron rays
- the present invention has the following configurations. That is, the light emitter such as the scintillator or phosphor according to the first aspect of the present invention has the general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 (where 0.0001 ⁇ x ⁇ 0.3, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ ⁇ 0.5, M is one or more selected from Al, Lu, Ga, Sc, and RE is one or two selected from La, Pr, Gd, Tb, Yb, Y, Lu
- the garnet phosphor is obtained by co-adding at least one monovalent or divalent cation at a molar ratio of 7000 ppm or less with respect to the total cation. It is characterized by including.
- the light emitter according to the second aspect of the present invention has a general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 (where 0.0001 ⁇ x ⁇ 0.3, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ ⁇ 0.5, M Is one or more selected from Al, Lu, Ga and Sc, and RE is one or more selected from La, Pr, Gd, Tb, Yb, Y and Lu)
- a garnet luminescent material in which Li is co-added at a molar ratio of 7000 ppm or less with respect to all cations is included in the luminescent material having a garnet structure.
- the light emitter according to the second aspect of the present invention has the general formula Ce x RE 3-x Al 5 + y O 12 + 3y / 2 (where 0.0001 ⁇ x ⁇ 0.3, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ ⁇ 0.5, and RE is one or more selected from Y and Lu), and a garnet in which Mg is co-added at a molar ratio of 7000 ppm or less with respect to all cations. It may be a light emitter characterized by including a light emitter.
- the light emitter according to the second aspect of the present invention has a general formula Ce x Gd 3-x (Ga z Al 1-z ) 5 + y O 12 + 3y / 2 (where 0.0001 ⁇ x ⁇ 0.3, 0 ⁇ y ⁇ 0.5 or 0 ⁇ Y ⁇ ⁇ 0.5, 0.49 ⁇ z ⁇ 0.7), and a garnet phosphor in which Li or Mg is co-added at a molar ratio of 7000 ppm or less with respect to all cations.
- the light-emitting body characterized by including may be sufficient.
- the phosphor according to the second aspect of the present invention is obtained by heat-treating a raw material at 1000 ° C. or more, has a light emission amount of 20000 photon / MeV or more, has a time resolution of 300 ps or less, and has a phosphorescence component of 0.5% or less. Yes, it may be made of a transparent body having a diffuse transmittance of 80% or more.
- the raw material is a compound containing Ce, RE (eg, Gd), and M (eg, Ga, Al).
- a light emitter such as a scintillator or a phosphor according to the third aspect of the present invention has a general formula Gd 3-xz Ce x RE z M 5 O 12 (where 0.0001 ⁇ x ⁇ 0.1, 0 ⁇ z ⁇ 3, M is one or more selected from Al, Lu, Ga, and Sc, and RE is one or more selected from La, Pr, Tb, Yb, Y, and Lu).
- a garnet phosphor in which at least one monovalent or divalent cation is co-added at a molar ratio of 7000 ppm or less with respect to the total cation. .
- a light emitter is a light emitter having a garnet structure using light emission from the 4f5d level of Ce 3+ , and has a general formula Gd 3-xz Ce x RE z M 5 + y O 12 + 3y / 2 (However, 0.0001 ⁇ x ⁇ 0.1, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ 0.5, 0 ⁇ z ⁇ 3, M is one or more selected from Al, Lu, Ga, Sc, And RE is one or more selected from La, Pr, Tb, Yb, Y, and Lu), and at least one monovalent or divalent luminescent material having a garnet structure.
- a luminescent material characterized in that it contains a garnet luminescent material in which the cation is co-added at a molar ratio of 7000 ppm or less with respect to the total cation.
- the co-added divalent cation is preferably at least one selected from Mg and Ca, and most preferably Mg.
- the light emitter according to the third aspect of the present invention may be a transparent body obtained by heat-treating the raw material at 1000 ° C. or higher and having a light emission amount of 40000 photon / MeV or higher and a time resolution of 240 ps or lower.
- the raw material is a compound containing Gd, Ce, M (eg, Al, Ga), and a monovalent or divalent cation, and optionally also RE.
- the phosphors according to the first to third aspects of the present invention may have a fluorescence wavelength of 200 to 600 nm emitted when excited by radiation such as gamma rays or high energy photons.
- the light emitters using light emission from the Ce 3+ 4f5d level include monovalent alkali metal ions such as Li, Na, K, Rb and Cs, and Be, By co-adding at least one selected from divalent alkaline earth metal ions such as Mg, Ca, Sr, and Ba at a molar ratio of 7000 ppm or less with respect to the total cation, the phosphor without co-addition can be obtained.
- the fluorescence decay time and emission rise time are shortened by 5% or more, and the emission intensity is increased by 5% or more. Therefore, the sampling time for fluorescence measurement can be shortened, and the high time resolution, that is, the sampling interval. Reduction can be expected. When high time resolution is realized, the number of samplings per unit time can be increased. Further, the energy resolution is improved by increasing the emission intensity. Also, radiation resistance is improved.
- the cerium activated phosphors according to the first to third aspects of the present invention include Li and Mg, monovalent alkali metal ions such as Li, Na, K, Rb, and Cs, and 2 such as Be, Mg, Ca, Sr, and Ba. At least one selected from valent alkaline earth metal ions in a molar ratio of 1 ppm to 7000 ppm, preferably 5 ppm to 6000 ppm, more preferably 10 ppm to 5000 ppm, based on the total cation. It is desirable to contain it in a molar ratio of 20 ppm to 400 ppm.
- the light emitters according to the first to third aspects of the present invention desirably have high transparency from the viewpoint of requiring high light emission amount, high time resolution, and high energy resolution.
- it has a diffuse transmittance of 70% or more per cm at the emission wavelength, more preferably a diffuse transmittance of 85% or more per cm, and even more preferably 95% or more per cm.
- the light emitters according to the first to third aspects of the present invention can improve the time resolution by co-adding monovalent or divalent cations such as Li and Mg.
- monovalent or divalent cations such as Li and Mg.
- the size is ⁇ 3 ⁇ 3 mm
- a time resolution of 240 ps or less is obtained with the light emitter according to the second invention
- 300 ps or less is obtained with the light emitter according to the third invention. It is done.
- the light emission amount correlates with the integrated value of the voltage pulse signal.
- the light emission amount increases as the light emission intensity increases, and the light emission amount decreases as the light emission rise time and the fluorescence lifetime become shorter.
- LYSO is an existing PET scintillator, preferably 24000 photon / MeV or more, More preferably, it is 30000 photon / MeV or more, and still more preferably 40000 photon / MeV or more.
- the scintillator crystal composed of the light emitters according to the first to third aspects of the present invention having such short-lived light emission is used as a scintillator for fast response radiation detection for TOF-PET, PET, SPECT, and CT. It is expected to be used, and is expected to be applied to various radiation measuring devices for high energy physics and environmental radiation measuring instruments.
- the light emitter according to the present invention including the light emitters according to the first to fourth aspects of the present invention can be used as a starting material in the manufacturing method, and a general oxide material can be used as a scintillator crystal.
- a high-purity raw material of 99.99% or higher (4N or higher).
- these starting materials are weighed and mixed so as to have a target composition at the time of melt formation. Further, these raw materials are particularly preferably those containing as little impurities as possible (for example, 1 ppm or less) other than the target composition.
- the manufacturing method of the light emitters according to the first to fourth aspects of the present invention it is preferable to grow crystals in an inert gas (eg, Ar, N 2 , He, etc.) atmosphere.
- a mixed gas of an inert gas (for example, Ar, N 2 , He, etc.) and oxygen gas, carbon dioxide gas, or carbon monoxide gas may be used.
- the partial pressure of oxygen is preferably 2% or less for the purpose of preventing oxidation of the crucible.
- oxygen gas carbon dioxide gas, carbon monoxide gas, inert gas (eg, Ar, N 2 , He, etc.), and inert gas (eg, Ar, N) 2 , He, etc.) and oxygen gas, carbon dioxide gas, and carbon monoxide gas
- inert gas eg, Ar, N 2 , He, etc.
- inert gas eg, Ar, N 2 , He, etc.
- inert gas eg, Ar, N 2 , He, etc.
- oxygen gas, carbon dioxide gas, and carbon monoxide gas can be used.
- the oxygen partial pressure is not limited to 2%, and any mixture ratio from 0% to 100% may be used.
- the light emitters according to the first to fourth aspects of the present invention are preferably manufactured by heat treatment at a temperature of 1000 ° C. or higher.
- the micro pull-down method which is a melt growth method in which heat treatment is performed at or above the melting point of the light emitter.
- it is manufactured by liquid phase methods such as the chocolate ski method (pull-up method), Bridgman method, zone melting method (zone melt method), or edge-limited thin film supply crystal growth (EFG method), or heat treatment at 1000 ° C. or higher.
- Flux method and solution method such as top seeded solution growth (TSSG) method, atmosphere sintering method, reaction sintering method, sintering method such as hot isostatic pressing method etc. It is.
- the chocolate ski method or the Bridgman method is preferable in order to obtain a large crystal.
- a sintering method such as an atmosphere sintering method, a reaction sintering method, a hot isostatic pressing method or the like, it is more preferable to perform heat treatment at a temperature of 1300 ° C. or higher and a melting point or lower.
- crucible / afterheater used in these heat treatments those made of platinum, iridium, rhodium, rhenium, tungsten, molybdenum or alloys thereof can be used.
- a condensing heater and a resistance heater can be used for heating.
- the phosphor according to the fifth aspect of the present invention contains oxygen after manufacturing the phosphor according to the first to fourth aspects of the present invention for the purpose of shortening the fluorescence lifetime and reducing the long-lived fluorescence lifetime component.
- the annealing is desirably performed at a temperature range of 1000 ° C. or more for 8 hours or more.
- annealing for 12 hours or more in a temperature range of 1300 ° C. or more more preferably annealing for 12 hours or more in a temperature range of 1500 ° C. or more, and still more preferably annealing for 24 hours or more in a temperature range of 1600 ° C. or more. It is desirable to do.
- mirror polishing by mechanical polishing is required to improve the light emission intensity, light emission amount, time resolution, and energy resolution of the light emitter.
- the mechanical polishing method is complicated by a plurality of processes such as a rough polishing process and a mirror polishing process.
- polishing a plurality of surfaces of a polyhedron it is generally necessary to polish one surface at a time, which is uneconomical.
- it has been generally difficult to polish a complex surface that is not flat. Therefore, the light emitters according to the present invention including the light emitters according to the first to fifth aspects of the present invention are manufactured by the above manufacturing method for the purpose of increasing the light emission intensity and the light emission amount and improving the time resolution.
- the surface has etch pits by dipping in an etching solution containing phosphoric acid such as orthophosphoric acid, and has a non-glossy surface having a normal incidence reflectance of 8% or less.
- the vertical reflectance is preferably greater than 0 and 7% or less, more preferably the vertical reflectance is greater than 0 and 5% or less, and further preferably the vertical reflectance is 0.05 or more and 2% or less.
- the etching solution may be used by mixing orthophosphoric acid with at least one of sulfuric acid, hydrochloric acid, or nitric acid.
- the etchant is preferably heated to 100 ° C. or higher.
- the light emitters according to the first to fifth aspects of the present invention are preferably single crystals.
- a radiation detector according to the present invention includes a light emitter that emits light by absorbing radiation such as ⁇ -rays, X-rays, ⁇ -rays, and neutron rays and high-energy photons, and a light receiver that detects light emitted from the light emitter.
- a detector, wherein the light emitter is a light emitter according to the first to fifth aspects of the present invention.
- a light emitter that has a short fluorescence lifetime, a high transparency, and a large light emission amount, and a radiation detector using the light emitter.
- a light emitter for radiation detectors such as gamma rays, X-rays, ⁇ rays, and neutron rays, a light emitter having high radiation resistance, a short fluorescence decay time and a high light emission intensity, and the light emitter.
- a radiation detector can be provided.
- the light emitter according to the embodiment of the present invention has a general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 (where 0.0001 ⁇ x ⁇ 0.3, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ ⁇ 0.5, where M is Al And one or more selected from Lu, Ga, and Sc, and RE is one or more selected from La, Pr, Gd, Tb, Yb, Y, and Lu)
- a garnet phosphor in which at least one or more monovalent or divalent cations are co-added at a molar ratio of 7000 ppm or less with respect to the total cations is included for a phosphor having a garnet structure.
- the light emitter according to the embodiment of the present invention has a short fluorescence decay time, a short light emission rise time, a large light emission intensity, a high radiation resistance, a high light emission amount, and a small phosphorescence component.
- the light emitter according to the first embodiment of the present invention is a light emitter having a garnet structure using light emission from the 4f5d level of Ce 3+ , and has the general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 (where 0.0001 ⁇ x ⁇ 0.3, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ ⁇ 0.5, M is one or two selected from Al, Lu, Ga, Sc) And an RE having a garnet structure represented by the formula (1) or more, and RE is one or more selected from La, Pr, Gd, Tb, Yb, Y, and Lu). It contains a garnet phosphor co-doped with a molar ratio of 7000 ppm or less with respect to ions.
- the light emitter according to the second embodiment of the present invention is a light emitter having a garnet structure using light emission from the 4f5d level of Ce 3+ , and has the general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 (However, 0.0001 ⁇ x ⁇ 0.3, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ ⁇ 0.5, M is one or more selected from Al, Lu, Ga, Sc, and RE is La, Pr, 1 type or 2 types or more selected from Gd, Tb, Yb, Y, and Lu).
- the light emitter according to the third embodiment of the present invention is a light emitter having a garnet structure using light emission from the 4f5d level of Ce 3+ , and has a general formula Gd 3-xz Ce x RE z M 5 O 12 (however, 0.0001 ⁇ x ⁇ 0.1, 0 ⁇ z ⁇ 3, M is one or more selected from Al, Lu, Ga, Sc, and RE is La, Pr, Tb, Yb, Y , And at least one monovalent or divalent cation with respect to the total cation of 7000 ppm. It contains a garnet phosphor co-added in the following molar ratio.
- the light emitter according to the fourth embodiment of the present invention is a light emitter having a garnet structure using light emission from the 4f5d level of Ce 3+ , and has a general formula Gd 3-xz Ce x RE z M 5 + y O 12 + 3y / 2 (where 0.0001 ⁇ x ⁇ 0.1, 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ 0.5, 0 ⁇ z ⁇ 3, M is one or two selected from Al, Lu, Ga, Sc) And at least one kind of monovalent light-emitting substance having a garnet structure represented by RE or more, and RE is one or more selected from La, Pr, Tb, Yb, Y, and Lu). Or the garnet light-emitting body which co-added the bivalent cation with the molar ratio of 7000 ppm or less with respect to all the cations is included.
- the light emitter according to the embodiment of the present invention is manufactured by, for example, a single crystal manufacturing method using a micro pulling method.
- a micro pulling-down method will be shown as a method for manufacturing a light emitter according to an embodiment of the present invention, but the method is not limited to this.
- the micro pulling method is performed using an atmosphere control type micro pulling apparatus using high frequency induction heating.
- the micro-pulling device includes a crucible, a seed holder that holds the seed that is brought into contact with the melt flowing out from the pores provided at the bottom of the crucible, a moving mechanism that moves the seed holder downward, and a moving speed of the moving mechanism It consists of a single crystal manufacturing apparatus equipped with a control device and induction heating means for heating the crucible. According to such a single crystal manufacturing apparatus, a single crystal can be produced by forming a solid-liquid interface immediately below the crucible and moving the seed crystal downward.
- the crucible is made of carbon, platinum, iridium, rhodium, rhenium, tungsten, molybdenum or an alloy thereof, and a heating element made of carbon, platinum, iridium, rhodium, rhenium, tungsten, molybdenum or an alloy thereof on the outer periphery of the crucible bottom.
- the after heater which is is arrange
- the crucible and after-heater can control the temperature and distribution of the solid-liquid boundary region of the melt drawn from the pores provided at the bottom of the crucible by adjusting the output of the induction heating means. It is possible.
- the material of the chamber is SUS, and the window material is quartz.
- the micro pull-down device is equipped with a rotary pump to enable atmosphere control, and the degree of vacuum can be reduced to 1 ⁇ 10 ⁇ 3 Torr or less before gas replacement.
- Ar, N 2 , H 2 , O 2 gas, and the like can be introduced into the chamber at a flow rate precisely adjusted by an accompanying gas flow meter.
- the raw materials weighed and mixed so as to have the target composition at the time of melt formation are put into a crucible, the inside of the furnace is evacuated to a high vacuum, and then Ar gas or a mixed gas of Ar gas and O 2 gas is introduced into the furnace By introducing into the furnace, the inside of the furnace is made an inert gas atmosphere or a low oxygen partial pressure atmosphere, and by gradually applying high frequency power to the induction heating means, the crucible is heated to completely melt the raw material in the crucible.
- a raw material consists of a high purity raw material of 99.99% or more (4N or more), and a thing with few impurities other than the target composition as much as possible (for example, 1 ppm or less) is preferable.
- the seed crystal After melting the raw material, the seed crystal is gradually raised at a predetermined speed, and its tip is brought into contact with the pores at the lower end of the crucible so as to be sufficiently adapted. Thereafter, the crystal is grown by lowering the pulling shaft of the seed holder while adjusting the melt temperature.
- a seed crystal that is equivalent to the crystal growth target or that is similar in structure and composition, but is not limited thereto.
- the crystal growth is completed when all of the prepared raw materials are crystallized and the melt is gone.
- the radiation detector according to the embodiment of the present invention is configured by combining the light emitter and the light receiver according to the embodiment of the present invention made of a scintillator crystal.
- the radiation detector according to the embodiment of the present invention can also be used as a radiation detector of a radiation inspection apparatus.
- Examples of such a radiation inspection apparatus include a resource exploration detector, a high energy physics detector, an environmental radioactivity detector, a gamma camera, and a medical image processing apparatus.
- Examples of medical image processing apparatuses are suitable for applications such as positron emission nuclide tomography (PET), X-ray CT, and SPECT.
- PET positron emission nuclide tomography
- X-ray CT X-ray CT
- SPECT positron emission nuclide tomography
- two-dimensional type PET, three-dimensional type PET, time-of-flight (TOF) type PET, and depth detection (DOI) type PET are preferable. Further, these may be used in combination.
- the radiation detector according to the embodiment of the present invention has a position detection type photomultiplier tube (PS-PMT), a silicon photomultiplier (Si-PM) photodiode (PD), or an avalanche photodiode (PD) as a light receiver.
- PS-PMT position detection type photomultiplier tube
- Si-PM silicon photomultiplier
- PD avalanche photodiode
- APD avalanche photodiode
- Ce or a monovalent or bivalent cation to be co-added is specified as either a concentration in the crystal or a concentration in the melt (preparation).
- concentration at the time of preparation was about 1 to 100 with respect to the concentration 1 in the crystal.
- the time resolution is measured as follows. First, the transparent illuminant of each example was processed and polished to a size of ⁇ 3 ⁇ 3 mm, and the two illuminants were respectively applied to two Si-PMs arranged facing each other at a distance of about 5 cm, respectively. Adhere using the Teflon (registered trademark) tape. Next, a 22 Na gamma ray source is installed at the center of two scintillator single crystals (light emitters), and a 511 keV gamma ray emitted simultaneously from the 22 Na gamma ray source by approximately 180 ° by ⁇ -ray decay is applied to each light emitter. Irradiate. The time resolution is measured by measuring the fluorescence of each illuminant by gamma ray irradiation by a coincidence measurement method using a digital oscilloscope.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm.
- the diffuse transmittance at 520 nm was 91% per 1 cm.
- the single crystal had a diameter of about 3 mm and a length of about 15 mm, and was yellow and transparent. Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 480 nm. The diffuse transmittance at 480 nm was 90% per 1 cm.
- the single crystal had a diameter of about 3 mm and a length of about 15 mm, and was yellow and transparent. Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 480 nm. The diffuse transmittance at 480 nm was 90% per 1 cm.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent. Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm. The diffuse transmittance at 520 nm was 92% per cm.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent. Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm. The diffuse transmittance at 520 nm was 91% per 1 cm.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm.
- the diffuse transmittance at 520 nm was 91% per 1 cm.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm.
- the diffuse transmittance at 520 nm was 90% per cm.
- Example 1 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 300 ppm of Li was annealed in an argon atmosphere containing 3% of oxygen at a temperature range of 1700 ° C. for 24 hours. .
- Example 6 Gd 2.985 Ce 0.015 Ga 3.15 Al 2.1 O 12.375 of Example 6 was annealed in an argon atmosphere containing 3% oxygen at a temperature range of 1700 ° C. for 24 hours.
- Example 2 Lu 2.985 Ce 0.015 Al 5 O 12 co-added with 300 ppm of Li was annealed in the air at a temperature range of 1200 ° C. for 24 hours.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 480 nm.
- the diffuse transmittance at 480 nm was 90% per 1 cm.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 480 nm.
- the diffuse transmittance at 480 nm was 91% per cm.
- a garnet-type scintillator single crystal having a composition of Lu 2.985 Ce 0.015 Al 4.8 O 11.7 to which 300 ppm of Mg was co-added was prepared by a micro- pulling- down method.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 480 nm.
- the diffuse transmittance at 480 nm was 90% per 1 cm.
- the micro-pulling-down method to prepare the garnet scintillator single crystal of composition Y 2.985 Ce 0.015 Al 4.8 O 11.7 was added 300ppm both the Mg.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 480 nm.
- the diffuse transmittance at 480 nm was 91% per cm.
- Table 1 shows the evaluation results of emission intensity, emission rise time, fluorescence lifetime, and time resolution of the crystals obtained in Examples 1 to 14 and Comparative Examples 1 to 5.
- the scintillator single crystals of the example and the comparative example were processed and polished to a size of ⁇ 3 ⁇ 1 mm, and then adhered to a photomultiplier tube using an optical adhesive, and the upper surface was coated with Teflon (registered trademark) tape. It was covered and irradiated with 137 Cs gamma rays and evaluated by analyzing the photoelectric absorption peak of the obtained energy spectrum.
- FIG. 1 shows Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 1500 ppm of Li in Example 1, and the scintillator single crystal of Comparative Example 1 with the same composition and not co-added with Li Is processed and polished to ⁇ 3 x 1 mm size, then adhered to a photomultiplier tube using an optical adhesive, the upper surface is covered with Teflon (registered trademark) tape, and irradiated with 137 Cs gamma rays. Voltage pulse signal. The obtained voltage pulse signal was analyzed, and the emission intensity, the emission rise time, and the fluorescence lifetime were evaluated. As shown in FIG.
- Example 1 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 1500 ppm of Li and two scintillator single crystals of Comparative Example 1 with the same composition and not co-added with Mg were used.
- the time resolution was measured by the above coincidence measurement method.
- Table 1 by adding 1500 ppm of Li, the time resolution was improved with respect to the crystals not co-added, and the time resolution was accelerated from 400 ps (Comparative Example 1) to 210 ps (Example 1). .
- Examples 6 and 7 in which the value of y is 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ 0.5 in the general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 and Gd 2 of Comparative Example 1 .985 Ce 0.015 Ga 3 Al 2 O 12 (y 0) was irradiated with X-rays under the conditions of CuK ⁇ , 40 mA and 40 mV, and the maximum emission intensity and the emission intensity after 1 ms were compared to obtain phosphorescence. When the content of the component was measured, the phosphorescent component decreased from 1.8% (Comparative Example 1) to 0.2% (Example 6) and 0.2% (Example 7).
- Example 1 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 1500 ppm of Li, and the scintillator single crystal of Comparative Example 1 with the same composition but not co-added with Li 3 ⁇
- X-ray generated under conditions of CuK ⁇ corresponding to 600 Gy, 40 mA, 40 mV was irradiated, and the rate of increase in absorption coefficient at 520 nm before and after X-ray irradiation was measured.
- the increase rate of the absorption coefficient of the crystal without the crystal was 50%
- the increase rate of the absorption coefficient of the crystal to which 1500 ppm of Li was added Example 1 was 1.0%. It was confirmed that radiation resistance was improved by co-adding Li.
- Example 7 In the general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 , it was confirmed that the radiation resistance was improved by taking the value of y satisfying 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ 0.5. .
- Examples 12 and 14 in which the value of y is 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ 0.5 in the general formula Ce x RE 3-x M 5 + y O 12 + 3y / 2 , and Mg is co-added, and Y 2.985 Ce 0.015 Al 5 O 12 (y 0) scintillator single crystal of Comparative Example 4 was processed and polished into a ⁇ 3 ⁇ 1 mm size, and then CuK ⁇ corresponding to 600 Gy, 40 mA, 40 mV.
- Example 9 and Example 10 where annealing was performed in an atmosphere containing oxygen, the emission intensity increased compared to before annealing (Example 6 and Example 2 respectively). It was confirmed that the emission rise time and the fluorescence lifetime were shortened, and that the long-lived fluorescence lifetime component was reduced.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm.
- the diffuse transmittance at 520 nm was 91% per 1 cm.
- the micro-pulling-down method to prepare the garnet scintillator single crystal of the composition of Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 to the Ca were each added 300,1500,3000ppm both.
- the obtained single crystal had a diameter of about 3 mm and a length of about 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm.
- the diffuse transmittance at 520 nm was 91% per 1 cm.
- the resulting single crystal had a diameter of about 3 mm and a length of about 15 mm and was transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm.
- the diffuse transmittance at 520 nm was 90% per 1 cm.
- the micro-pulling-down method to prepare the garnet scintillator single crystal of the composition of Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 was added 300ppm both the Na.
- the obtained single crystal had a diameter of about 3 mm and a length of about 15 mm, and was yellow and transparent.
- Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm.
- the diffuse transmittance at 520 nm was 92% per cm.
- the micro-pulling-down method to prepare the garnet scintillator single crystal of the composition of Lu 2.885 Gd 0.1 Ce 0.015 Al 5 O 12 was added Mg respectively 300,1500,3000ppm both.
- the single crystal had a diameter of about 3 mm and a length of about 15 mm, and was yellow and transparent. Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 480 nm.
- the diffuse transmittance at 480 nm was 89% per cm.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent. Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm. The diffuse transmittance at 520 nm was 92% per cm.
- This single crystal had a diameter of 3 mm and a length of 15 mm, and was yellow and transparent. Light emission from the 4f5d level of Ce 3+ was confirmed at a wavelength near 520 nm. The diffuse transmittance at 520 nm was 91% per 1 cm.
- Example 15 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 300 ppm of Mg was annealed in an argon atmosphere containing 3% of oxygen at a temperature range of 1600 ° C. for 24 hours. .
- Example 19 Lu 2.885 Gd 0.1 Ce 0.015 Al 5 O 12 co-added with 300 ppm of Mg was annealed in the atmosphere at 1200 ° C. for 24 hours.
- Example 15 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 300 ppm of Mg was annealed in an argon atmosphere containing 3% of hydrogen in a temperature range of 1000 ° C. for 24 hours. It was.
- Table 2 shows the evaluation results of the emission intensity, emission amount, emission rise time, fluorescence lifetime, and time resolution of the crystals obtained in Examples 15 to 23 and Comparative Examples 6 to 9.
- the scintillator single crystals of the example and the comparative example were processed and polished to a size of ⁇ 3 ⁇ 1 mm, and then adhered to a photomultiplier tube using an optical adhesive, and the upper surface was coated with Teflon (registered trademark) tape. It was covered and irradiated with 137 Cs gamma rays and evaluated by analyzing the photoelectric absorption peak of the obtained energy spectrum.
- FIG. 2 shows Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 1500 ppm of Mg in Example 15 and the scintillator single crystal of Comparative Example 6 with the same composition and not co-added with Mg Is processed and polished to ⁇ 3 x 1 mm size, then adhered to a photomultiplier tube using an optical adhesive, the upper surface is covered with Teflon (registered trademark) tape, and irradiated with 137 Cs gamma rays. Voltage pulse signal. The obtained voltage pulse signal was analyzed, and the emission intensity, the emission rise time, and the fluorescence lifetime were evaluated. As shown in FIG.
- Example 15 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 1500 ppm of Mg and two scintillator single crystals of Comparative Example 6 with the same composition and not co-added with Mg were used.
- the time resolution was measured by the above coincidence measurement method.
- Table 2 by adding 1500 ppm of Mg, the time resolution was improved with respect to crystals not co-added, and the time resolution was shortened from 400 ps (Comparative Example 6) to 170 ps (Example 15). .
- Example 20 in the general formula Gd 3 ⁇ x ⁇ z Ce x RE z M 5 + y O 12 + 3y / 2 , the value of y satisfies 0 ⁇ y ⁇ 0.5 or 0 ⁇ y ⁇ 0.5.
- Example 22 and 23 annealed in an oxygen-containing atmosphere, the emission intensity increased compared to before annealing (Examples 15 and 19 respectively), and the emission rise time and fluorescence lifetime were increased. It was confirmed that the fluorescence lifetime component was reduced and the long-lived fluorescence lifetime component was reduced.
- Example 15 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 300 ppm of Mg was cut into a size of ⁇ 3 ⁇ 3 mm 3 using a diamond outer peripheral cutting machine, and mechanical polishing was used. Mirror polishing was performed.
- Example 15 Gd 2.985 Ce 0.015 Ga 3 Al 2 O 12 co-added with 300 ppm of Mg was cut into a size of ⁇ 3 ⁇ 3 mm 3 using a diamond outer peripheral cutting machine.
- Table 3 shows the results of measuring the scintillator performance of the crystals of Example 24, Comparative Example 10 and Comparative Example 11 and evaluating the light emission intensity ratio, light emission amount, time resolution, and normal incidence reflectance.
- the etched single crystal (Example 24) can have scintillator characteristics equivalent to or better than the single crystal obtained by the conventional machining method (Comparative Examples 10 and 11). confirmed.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Luminescent Compositions (AREA)
- Measurement Of Radiation (AREA)
Abstract
Description
すなわち、第1の本発明に係るシンチレータ、蛍光体等の発光体は、一般式CexRE3-xM5+yO12+3y/2(ただし、0.0001≦x≦0.3、0≦y≦0.5あるいは0≦y≦-0.5、MはAl、Lu、Ga、Scから選ばれた1種又は2種以上、及びREはLa、Pr、Gd、Tb、Yb、Y、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有する発光体に対し、少なくとも1種類以上の1価または2価の陽イオンを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含むことを特徴とする。
本発明に係る放射線検出器は、γ線、X線、α線、中性子線といった放射線や高エネルギーフォトンを吸収して発光する発光体と、前記発光体の発光を検出する受光器とを有する放射線検出器であって、前記発光体は、第1乃至第5の本発明に係る発光体であることを特徴とする。
本発明の実施の形態の発光体は、一般式CexRE3-xM5+yO12+3y/2(ただし、0.0001≦x≦0.3、0≦y≦0.5あるいは0≦y≦-0.5、MはAl、Lu、Ga、Scから選ばれた1種又は2種以上、及びREはLa、Pr、Gd、Tb、Yb、Y、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有する発光体に対し、少なくとも1種類以上の1価または2価の陽イオンを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含んでいる。
マイクロ引下げ法により、共添加しないGd2.985Ce0.015Ga3Al2O12の組成のガーネット型シンチレータ単結晶を作製した。得られた単結晶は、約3mmの直径および約15mmの長さを有し、黄色透明であった。Ce3+の4f5d準位からの発光が、520nm付近の波長に確認された。520nmでの拡散透過率は、1cmあたり92%であった。
マイクロ引下げ法により、Liをそれぞれ20000ppm共添加したGd2.985Ce0.015Ga3Al2O12の組成のガーネット型シンチレータ単結晶を作製した。得られた単結晶は、約3mmの直径および約15mmの長さを有し、黄色透明であった。Ce3+の4f5d準位からの発光が、520nm付近の波長に確認された。520nmでの拡散透過率は、1cmあたり70%であった。共添加しない比較例1の結晶に比べ、発光強度が40%低下した。
マイクロ引下げ法により、共添加しないLu2.985Ce0.015Al5O12の組成のガーネット型シンチレータ単結晶を作製した。この単結晶は、約3mmの直径および約15mmの長さを有し、黄色透明であった。Ce3+の4f5d準位からの発光が、480nm付近の波長に確認された。480nmでの拡散透過率は、1cmあたり90%であった。
マイクロ引下げ法により、共添加しないY2.985Ce0.015Al5O12の組成のガーネット型シンチレータ単結晶を作製した。この単結晶は、約3mmの直径および約15mmの長さを有し、黄色透明であった。Ce3+の4f5d準位からの発光が、480nm付近の波長に確認された。480nmでの拡散透過率は、1cmあたり90%であった。
実施例4の、Liを300ppm共添加したGd2.985Ce0.015Ga3.15Al2.1O12.375を、水素を3%含むアルゴン雰囲気中で、1000℃の温度域で、48時間アニールを行った。
マイクロ引下げ法により、共添加しないGd2.985Ce0.015Ga3Al2O12の組成のガーネット型シンチレータ単結晶を作製した。得られた単結晶は、約3mmの直径および約15mmの長さを有し、黄色透明であった。Ce3+の4f5d準位からの発光が、520nm付近の波長に確認された。520nmでの拡散透過率は1cmあたり92%であった。
マイクロ引下げ法により、Caをそれぞれ7500ppm共添加したGd2.985Ce0.015Ga3Al2O12の組成のガーネット型シンチレータ単結晶を作製した。得られた単結晶は、約3mmの直径および約15mmの長さを有し、黄色透明であった。Ce3+の4f5d準位からの発光が、520nm付近の波長に確認された。520nmでの拡散透過率は1cmあたり92%であった。共添加しない比較例1の結晶に比べ、発光強度が40%低下した。
マイクロ引下げ法により、共添加しないLu2.885Gd0.1Ce0.015Al5O12の組成のガーネット型シンチレータ単結晶を作製した。この単結晶は、約3mmの直径および約15mmの長さを有し、黄色透明であった。Ce3+の4f5d準位からの発光が、480nm付近の波長に確認された。480nmでの拡散透過率は1cmあたり90%であった。
実施例15のうち、Mgを300ppm共添加したGd2.985Ce0.015Ga3Al2O12を、水素を3%含むアルゴン雰囲気中で、1000℃の温度域で、24時間アニールを行った。
実施例15のうち、Mgを300ppm共添加したGd2.985Ce0.015Ga3Al2O12を、ダイヤモンド外周歯切断機を用いてφ3×3mm3のサイズに切断し、機械研磨法による鏡面研磨を行った。
実施例15のうち、Mgを300ppm共添加したGd2.985Ce0.015Ga3Al2O12を、ダイヤモンド外周歯切断機を用いてφ3×3mm3のサイズに切断した。
Claims (14)
- 一般式CexRE3-xM5+yO12+3y/2(ただし、0.0001≦x≦0.3、0≦y≦0.5あるいは0≦y≦-0.5、MはAl、Lu、Ga、Scから選ばれた1種又は2種以上、及びREはLa、Pr、Gd、Tb、Yb、Y、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有する発光体に対し、少なくとも1種類以上の1価または2価の陽イオンを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含むことを特徴とする発光体。
- 一般式CexRE3-xM5+yO12+3y/2(ただし、0.0001≦x≦0.3、0≦y≦0.5あるいは0≦y≦-0.5、MはAl、Lu、Ga、Scから選ばれた1種又は2種以上、及びREはLa、Pr、Gd、Tb、Yb、Y、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有する発光体に対し、Liを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含むことを特徴とする発光体。
- 一般式CexRE3-xAl5+yO12+3y/2(ただし、0.0001≦x≦0.3、0<y≦0.5あるいは0<y≦-0.5、及びREはY、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有する発光体に対し、Mgを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含むことを特徴とする発光体。
- 一般式CexGd3-x(GazAl1-z)5+yO12+3y/2(ただし、0.0001≦x≦0.3、0<y≦0.5あるいは0<y≦-0.5、0.49≦z≦0.7である)で表されるガーネット構造を有する発光体に対し、LiあるいはMgを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含むことを特徴とする発光体。
- 原料を1000℃以上で熱処理することで得られ、20000photon/MeV以上の発光量かつ300ps以下の時間分解能を有し、燐光成分が0.5%以下であり、拡散透過率80%以上の透明体から成ることを特徴とする請求項1乃至4のいずれか1項に記載の発光体。
- 一般式Gd3-x-zCexREzM5O12(ただし、0.0001≦x≦0.1、0≦z<3、MはAl、Lu、Ga、Scから選ばれた1種又は2種以上、及びREはLa、Pr、Tb、Yb、Y、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有する発光体に対し、少なくとも1種類以上の1価または2価の陽イオンを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含むことを特徴とする発光体。
- 一般式Gd3-x-zCexREzM5+yO12+3y/2(ただし、0.0001≦x≦0.1、0<y<0.5あるいは0<y<-0.5、0≦z<3、MはAl、Lu、Ga、Scから選ばれた1種又は2種以上、及びREはLa、Pr、Tb、Yb、Y、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有する発光体に対し、少なくとも1種類以上の1価または2価の陽イオンを、全陽イオンに対し、7000ppm以下のモル比で共添加したガーネット発光体を含むことを特徴とする発光体。
- 前記陽イオンとして、Mgを共添加したことを特徴とする請求項6または7記載の発光体。
- 原料を1000℃以上で熱処理することで得られ、40000photon/MeV以上の発光量かつ240ps以下の時間分解能を有する透明体から成ることを特徴とする請求項6乃至8のいずれか1項に記載の発光体。
- 一般式CexRE3-xM5+yO12+3y/2(ただし、0.0001≦x≦0.3、0<y≦0.5あるいは0<y≦-0.5、MはAl、Lu、Ga、Scから選ばれた1種又は2種以上、及びREはLa、Pr、Gd、Tb、Yb、Y、Luから選ばれた1種または2種以上である)で表されるガーネット構造を有することを特徴とする発光体。
- 請求項1乃至10のいずれか1項に記載の発光体を製造後、酸素を含む雰囲気中または不活性ガス雰囲気中で、1000℃以上でアニールを行うことにより製造されることを特徴とする発光体。
- リン酸を含むエッチング液に浸すことによるエッチング処理によって、表面にエッチピットを有し、かつ垂直入射反射率8.5%以下の光沢性のない表面を有することを特徴とする請求項1乃至11のいずれか1項に記載の発光体。
- 単結晶であることを特徴とする請求項1乃至12のいずれか1項に記載の発光体。
- γ線、X線、α線、中性子線といった放射線や高エネルギーフォトンを吸収して発光する発光体と、前記発光体の発光を検出する受光器とを有する放射線検出器であって、
前記発光体は、請求項1乃至13のいずれか1項に記載の発光体であることを特徴とする放射線検出器。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/305,563 US10174247B2 (en) | 2014-05-01 | 2015-04-30 | Illuminant and radiation detector |
RU2016146155A RU2670919C9 (ru) | 2014-05-01 | 2015-04-30 | Люминофор и детектор излучения |
CN201580022146.9A CN106459758A (zh) | 2014-05-01 | 2015-04-30 | 发光体及辐射探测器 |
JP2016516414A JP6630879B2 (ja) | 2014-05-01 | 2015-04-30 | 発光体及び放射線検出器 |
EP15785582.6A EP3138891B1 (en) | 2014-05-01 | 2015-04-30 | Illuminant and radiation detector |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-094377 | 2014-05-01 | ||
JP2014094377 | 2014-05-01 | ||
JP2014-225932 | 2014-11-06 | ||
JP2014225932 | 2014-11-06 | ||
JP2015079858 | 2015-04-09 | ||
JP2015-079858 | 2015-04-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015166999A1 true WO2015166999A1 (ja) | 2015-11-05 |
Family
ID=54358721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2015/063032 WO2015166999A1 (ja) | 2014-05-01 | 2015-04-30 | 発光体及び放射線検出器 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10174247B2 (ja) |
EP (1) | EP3138891B1 (ja) |
JP (1) | JP6630879B2 (ja) |
CN (1) | CN106459758A (ja) |
RU (1) | RU2670919C9 (ja) |
WO (1) | WO2015166999A1 (ja) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017105993A (ja) * | 2015-12-01 | 2017-06-15 | シーメンス メディカル ソリューションズ ユーエスエー インコーポレイテッドSiemens Medical Solutions USA,Inc. | ガドリニウム−ガリウム ガーネット シンチレータにおけるガリウム含有量を制御する方法 |
WO2017175763A1 (ja) * | 2016-04-06 | 2017-10-12 | 株式会社 東芝 | シンチレータアレイ |
JP2019515856A (ja) * | 2016-03-08 | 2019-06-13 | ローレンス リバモア ナショナル セキュリティー, エルエルシー | 陽電子放出断層撮影のための透明セラミックガーネットシンチレーター検出器 |
WO2019181618A1 (ja) * | 2018-03-23 | 2019-09-26 | Tdk株式会社 | 蛍光体および光源装置 |
KR20200020668A (ko) * | 2018-02-07 | 2020-02-26 | 유니버시티 오브 테네시 리서치 파운데이션 | 단가 이온으로 코도핑된 가넷 신틸레이터 |
JP2020090629A (ja) * | 2018-12-06 | 2020-06-11 | パナソニックIpマネジメント株式会社 | 蛍光体およびそれを使用した半導体発光装置 |
JP2021046462A (ja) * | 2019-09-17 | 2021-03-25 | 株式会社東芝 | 放射線検出材料及び放射線検出装置 |
JP2021059686A (ja) * | 2019-10-09 | 2021-04-15 | パナソニックIpマネジメント株式会社 | 蛍光体およびそれを使用した半導体発光装置 |
JP2021172669A (ja) * | 2020-04-17 | 2021-11-01 | パナソニックIpマネジメント株式会社 | 蛍光体およびそれを使用した発光装置 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112014000521B4 (de) | 2013-01-23 | 2023-05-11 | University Of Tennessee Research Foundation | Vorrichtung umfassend einen szintillator vom granat-typ und einen photodetektor sowie verfahren umfassend die verwendung dieser vorrichtung |
DE102017008868A1 (de) * | 2017-09-21 | 2019-03-21 | Giesecke+Devrient Currency Technology Gmbh | Optischer Speicherleuchtstoff, Verfahren zum Prüfen eines Echtheitsmerkmals, Vorrichtung zum Durchführen eines Verfahrens, Echtheitsmerkmal und Wertdokument |
CN109686798B (zh) * | 2018-12-24 | 2021-02-02 | 电子科技大学 | 一种应用于中远红外光电探测的磁性铁氧体/Bi复合薄膜 |
US11326099B2 (en) * | 2019-10-30 | 2022-05-10 | GE Precision Healthcare LLC | Ceramic scintillator based on cubic garnet compositions for positron emission tomography (PET) |
CN111908910B (zh) * | 2020-08-18 | 2022-04-22 | 新沂市锡沂高新材料产业技术研究院有限公司 | 一种暖白光照明用高显指透明陶瓷及其制备方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6454092A (en) * | 1987-06-08 | 1989-03-01 | Gen Electric | Solid scintillator and its treatment |
JPH0741760A (ja) * | 1993-07-30 | 1995-02-10 | Hitachi Metals Ltd | セラミックスシンチレータ材料 |
JPH09110600A (ja) * | 1995-10-11 | 1997-04-28 | Hitachi Chem Co Ltd | 希土類珪酸塩単結晶の加工方法及びシンチレータ |
JPH10293180A (ja) * | 1997-04-21 | 1998-11-04 | Hitachi Chem Co Ltd | シンチレ−タ及びその製造法 |
JP2006321974A (ja) * | 2005-04-18 | 2006-11-30 | Mitsubishi Chemicals Corp | 蛍光体、及びそれを用いた発光装置、並びに画像表示装置、照明装置 |
JP2007515527A (ja) * | 2003-12-22 | 2007-06-14 | パテント−トロイハント−ゲゼルシヤフト フユール エレクトリツシエ グリユーラムペン ミツト ベシユレンクテル ハフツング | 蛍光体及びかかる蛍光体を有する光源 |
JP2013028667A (ja) * | 2011-07-27 | 2013-02-07 | Panasonic Corp | イットリウムアルミニウムガーネットタイプの蛍光体とこれを用いた発光装置 |
WO2013025713A1 (en) * | 2011-08-16 | 2013-02-21 | Nitto Denko Corporation | Phosphor compositions and methods of making the same |
JP2013043960A (ja) * | 2011-08-26 | 2013-03-04 | Furukawa Co Ltd | シンチレータ用ガーネット型結晶およびこれを用いる放射線検出器 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6045721A (en) * | 1997-12-23 | 2000-04-04 | Patent-Treuhand-Gesellschaft Fur Elekrische Gluhlampen Mbh | Barium magnesium aluminate phosphor |
KR20030078122A (ko) * | 2002-03-28 | 2003-10-08 | 대주전자재료 주식회사 | 리튬을 포함하는 야그계 황색형광체 및 이의 제조방법 |
KR101267284B1 (ko) | 2004-10-15 | 2013-08-07 | 미쓰비시 가가꾸 가부시키가이샤 | 형광체, 및 그것을 사용한 발광 장치, 그리고 화상 표시장치, 조명 장치 |
CN101084290B (zh) | 2004-12-21 | 2012-07-18 | 日立金属株式会社 | 荧光材料以及其制造方法,使用荧光材料的放射线检测器,与x射线ct装置 |
CN1733865A (zh) * | 2005-09-02 | 2006-02-15 | 中国科学院上海光学精密机械研究所 | 石榴石型黄光荧光材料Y3Al5O12:Ce,Li的制备方法 |
JP4993284B2 (ja) * | 2007-03-23 | 2012-08-08 | 国立大学法人東北大学 | シンチレータ用単結晶の製造方法およびシンチレータ用単結晶 |
US8999281B2 (en) * | 2007-06-01 | 2015-04-07 | Hitachi Chemical Company, Ltd. | Scintillator single crystal, heat treatment method for production of scintillator single crystal, and method for production of scintillator single crystal |
CN101503622A (zh) * | 2009-03-17 | 2009-08-12 | 罗维鸿 | 白光二极管、增效转光粉、荧光粉及荧光粉的制备方法 |
KR101423249B1 (ko) | 2009-07-28 | 2014-07-24 | 드미트리 유리예비치 소코로프 | 고체 백색 광원들을 위한 무기 발광물질 |
CN101962547B (zh) * | 2010-10-19 | 2013-05-29 | 四川大学 | 一种白光led用黄色荧光粉及其制备方法 |
JP5952746B2 (ja) | 2011-01-31 | 2016-07-13 | 古河機械金属株式会社 | シンチレータ用ガーネット型単結晶、及びこれを用いた放射線検出器 |
CN102220131A (zh) | 2011-04-02 | 2011-10-19 | 重庆文理学院 | 一种白光led用球形、增红荧光粉及其制备方法 |
RU2506301C2 (ru) * | 2012-04-11 | 2014-02-10 | Анатолий Васильевич Вишняков | Люминесцирующий материал для твердотельных источников белого света |
US9145517B2 (en) * | 2012-04-17 | 2015-09-29 | General Electric Company | Rare earth garnet scintillator and method of making same |
US20140134437A1 (en) * | 2012-11-12 | 2014-05-15 | Mikhail Alexandrovich Arkhipov | Single crystal luminophor material for white light-emitting diodes |
-
2015
- 2015-04-30 EP EP15785582.6A patent/EP3138891B1/en active Active
- 2015-04-30 US US15/305,563 patent/US10174247B2/en active Active
- 2015-04-30 JP JP2016516414A patent/JP6630879B2/ja active Active
- 2015-04-30 RU RU2016146155A patent/RU2670919C9/ru active
- 2015-04-30 WO PCT/JP2015/063032 patent/WO2015166999A1/ja active Application Filing
- 2015-04-30 CN CN201580022146.9A patent/CN106459758A/zh active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6454092A (en) * | 1987-06-08 | 1989-03-01 | Gen Electric | Solid scintillator and its treatment |
JPH0741760A (ja) * | 1993-07-30 | 1995-02-10 | Hitachi Metals Ltd | セラミックスシンチレータ材料 |
JPH09110600A (ja) * | 1995-10-11 | 1997-04-28 | Hitachi Chem Co Ltd | 希土類珪酸塩単結晶の加工方法及びシンチレータ |
JPH10293180A (ja) * | 1997-04-21 | 1998-11-04 | Hitachi Chem Co Ltd | シンチレ−タ及びその製造法 |
JP2007515527A (ja) * | 2003-12-22 | 2007-06-14 | パテント−トロイハント−ゲゼルシヤフト フユール エレクトリツシエ グリユーラムペン ミツト ベシユレンクテル ハフツング | 蛍光体及びかかる蛍光体を有する光源 |
JP2006321974A (ja) * | 2005-04-18 | 2006-11-30 | Mitsubishi Chemicals Corp | 蛍光体、及びそれを用いた発光装置、並びに画像表示装置、照明装置 |
JP2013028667A (ja) * | 2011-07-27 | 2013-02-07 | Panasonic Corp | イットリウムアルミニウムガーネットタイプの蛍光体とこれを用いた発光装置 |
WO2013025713A1 (en) * | 2011-08-16 | 2013-02-21 | Nitto Denko Corporation | Phosphor compositions and methods of making the same |
JP2013043960A (ja) * | 2011-08-26 | 2013-03-04 | Furukawa Co Ltd | シンチレータ用ガーネット型結晶およびこれを用いる放射線検出器 |
Non-Patent Citations (1)
Title |
---|
See also references of EP3138891A4 * |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017105993A (ja) * | 2015-12-01 | 2017-06-15 | シーメンス メディカル ソリューションズ ユーエスエー インコーポレイテッドSiemens Medical Solutions USA,Inc. | ガドリニウム−ガリウム ガーネット シンチレータにおけるガリウム含有量を制御する方法 |
JP2021176962A (ja) * | 2016-03-08 | 2021-11-11 | ローレンス・リバモア・ナショナル・セキュリティー・エルエルシー | 陽電子放出断層撮影のための透明セラミックガーネットシンチレーター検出器 |
JP2019515856A (ja) * | 2016-03-08 | 2019-06-13 | ローレンス リバモア ナショナル セキュリティー, エルエルシー | 陽電子放出断層撮影のための透明セラミックガーネットシンチレーター検出器 |
JP7269994B2 (ja) | 2016-03-08 | 2023-05-09 | ローレンス・リバモア・ナショナル・セキュリティー・エルエルシー | 陽電子放出断層撮影のための透明セラミックガーネットシンチレーター検出器 |
WO2017175763A1 (ja) * | 2016-04-06 | 2017-10-12 | 株式会社 東芝 | シンチレータアレイ |
JPWO2017175763A1 (ja) * | 2016-04-06 | 2019-02-14 | 株式会社東芝 | シンチレータアレイ |
KR20200020668A (ko) * | 2018-02-07 | 2020-02-26 | 유니버시티 오브 테네시 리서치 파운데이션 | 단가 이온으로 코도핑된 가넷 신틸레이터 |
JP2020527611A (ja) * | 2018-02-07 | 2020-09-10 | ユニバーシティ オブ テネシー リサーチ ファウンデーション | 一価イオンが共ドープされたガーネットシンチレータ |
KR102409343B1 (ko) * | 2018-02-07 | 2022-06-14 | 유니버시티 오브 테네시 리서치 파운데이션 | 단가 이온으로 코도핑된 가넷 신틸레이터 |
US11230667B2 (en) | 2018-02-07 | 2022-01-25 | University Of Tennessee Research Foundation | Garnet scintillator co-doped with monovalent ion |
WO2019181618A1 (ja) * | 2018-03-23 | 2019-09-26 | Tdk株式会社 | 蛍光体および光源装置 |
JPWO2019181618A1 (ja) * | 2018-03-23 | 2021-03-25 | Tdk株式会社 | 蛍光体および光源装置 |
US11634630B2 (en) | 2018-03-23 | 2023-04-25 | Tdk Corporation | Phosphor and light source device |
JP2020090629A (ja) * | 2018-12-06 | 2020-06-11 | パナソニックIpマネジメント株式会社 | 蛍光体およびそれを使用した半導体発光装置 |
JP2021046462A (ja) * | 2019-09-17 | 2021-03-25 | 株式会社東芝 | 放射線検出材料及び放射線検出装置 |
JP2021059686A (ja) * | 2019-10-09 | 2021-04-15 | パナソニックIpマネジメント株式会社 | 蛍光体およびそれを使用した半導体発光装置 |
JP2021172669A (ja) * | 2020-04-17 | 2021-11-01 | パナソニックIpマネジメント株式会社 | 蛍光体およびそれを使用した発光装置 |
JP7345141B2 (ja) | 2020-04-17 | 2023-09-15 | パナソニックIpマネジメント株式会社 | 蛍光体およびそれを使用した発光装置 |
Also Published As
Publication number | Publication date |
---|---|
EP3138891B1 (en) | 2019-06-26 |
JP6630879B2 (ja) | 2020-01-15 |
JPWO2015166999A1 (ja) | 2017-04-20 |
US20170044433A1 (en) | 2017-02-16 |
EP3138891A4 (en) | 2017-04-12 |
RU2016146155A3 (ja) | 2018-06-01 |
RU2016146155A (ru) | 2018-06-01 |
RU2670919C2 (ru) | 2018-10-25 |
EP3138891A1 (en) | 2017-03-08 |
RU2670919C9 (ru) | 2018-12-12 |
US10174247B2 (en) | 2019-01-08 |
CN106459758A (zh) | 2017-02-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6630879B2 (ja) | 発光体及び放射線検出器 | |
JP5389328B2 (ja) | Prを含むシンチレータ用単結晶及びその製造方法並びに放射線検出器及び検査装置 | |
JP5952746B2 (ja) | シンチレータ用ガーネット型単結晶、及びこれを用いた放射線検出器 | |
JP4393511B2 (ja) | 希土類フッ化物固溶体材料(多結晶及び/又は単結晶)、及びその製造方法並びに放射線検出器及び検査装置 | |
US6437336B1 (en) | Scintillator crystals and their applications and manufacturing process | |
JP5674385B2 (ja) | シンチレータ用ガーネット型結晶およびこれを用いる放射線検出器 | |
JP2012180399A (ja) | シンチレータ用ガーネット型結晶、及び、これを用いる放射線検出器 | |
JP5548629B2 (ja) | シンチレータ用ガーネット型結晶およびこれを用いる放射線検出器 | |
JP2020527611A (ja) | 一価イオンが共ドープされたガーネットシンチレータ | |
JP2013002882A (ja) | 放射線検出器 | |
JP4702767B2 (ja) | 放射線検出用Lu3Al5O12結晶材料の製造方法及び放射線検出用(ZxLu1−x)3Al5O12結晶材料の製造方法 | |
JP6078223B2 (ja) | シンチレータ用ガーネット型単結晶およびこれを用いる放射線検出器 | |
JP2017036160A (ja) | 結晶材料、結晶製造法、放射線検出器、非破壊検査装置、および撮像装置 | |
JP6188024B2 (ja) | 発光体及び放射線検出器 | |
WO2019168169A1 (ja) | 蛍光体 | |
WO2012137738A1 (ja) | シンチレーター、放射線検出装置および放射線検出方法 | |
JP2007045869A (ja) | 低吸湿性ハロゲン置換フッ化物シンチレータ材料、及び放射線検出器及び検査装置 | |
JP2013043960A (ja) | シンチレータ用ガーネット型結晶およびこれを用いる放射線検出器 | |
JP2006233185A (ja) | 放射線検出用金属ハロゲン化物及びその製造方法並びにシンチレータ及び放射線検出器 | |
JP2013040274A (ja) | シンチレータ用ガーネット型結晶およびこれを用いる放射線検出器 | |
JP2017132689A (ja) | 結晶材料、結晶製造方法、放射線検出器、非破壊検査装置および撮像装置 | |
KR20180052974A (ko) | 섬광체 및 이의 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 15785582 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2016516414 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 15305563 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
REEP | Request for entry into the european phase |
Ref document number: 2015785582 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2015785582 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref document number: 2016146155 Country of ref document: RU Kind code of ref document: A |