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WO2015014179A1 - Capacitive mems acceleration sensor - Google Patents

Capacitive mems acceleration sensor Download PDF

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Publication number
WO2015014179A1
WO2015014179A1 PCT/CN2014/080645 CN2014080645W WO2015014179A1 WO 2015014179 A1 WO2015014179 A1 WO 2015014179A1 CN 2014080645 W CN2014080645 W CN 2014080645W WO 2015014179 A1 WO2015014179 A1 WO 2015014179A1
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WO
WIPO (PCT)
Prior art keywords
axis acceleration
substrate
spring
circuit substrate
acceleration sensing
Prior art date
Application number
PCT/CN2014/080645
Other languages
French (fr)
Chinese (zh)
Inventor
陈学峰
钟利强
杨小平
Original Assignee
苏州固锝电子股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 苏州固锝电子股份有限公司 filed Critical 苏州固锝电子股份有限公司
Publication of WO2015014179A1 publication Critical patent/WO2015014179A1/en

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/18Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration in two or more dimensions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0822Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
    • G01P2015/0825Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
    • G01P2015/0831Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type having the pivot axis between the longitudinal ends of the mass, e.g. see-saw configuration

Definitions

  • the present invention relates to the field of acceleration sensor technologies, and in particular, to a capacitive MEMS acceleration sensor. Background technique
  • MEMS accelerometers have attracted much attention due to their small size, light weight, low cost, and high reliability, especially in the aerospace and weapon science fields where the size, quality and reliability of devices are very high. Great application prospects.
  • the research of accelerometers has developed rapidly in recent years, and various range and range of high-range accelerometers have been reported.
  • the acceleration sensor has high requirements for high overload capability and natural frequency.
  • the anti-high overload capability can withstand hundreds of thousands of range impact loads, and the natural frequency requirements are up to tens of kHz or even hundreds of kHz. Therefore, in applications, MEMS high-range accelerometers often suffer from structural failure due to poor resistance to high overload.
  • the packaging of MEMS high-range accelerometers is particularly important.
  • the existing sensor packaging technology generally suffers from the problem of poor high overload resistance, low natural frequency, and poor package reliability, that is, the MEMS high-range acceleration sensor packaged by the existing sensor packaging technology encounters a harsh application environment. Problems such as cracking of the shell, depression of the cover, peeling of the chip from the shell substrate, and breakage of the lead often occur. Based on this, it is necessary to invent a capacitive MEMS accelerometer to ensure the reliability of the acceleration sensor in application.
  • a capacitive MEMS acceleration sensor comprising a MEMS acceleration chip, a signal processing chip and a substrate for filtering an interference signal and processing the sensing signal
  • the MEMS acceleration chip The micro-mechanical system is composed of a cover body, a micro-mechanical system and a circuit substrate for generating an induced signal, and the micro-mechanical system is composed of an X-axis acceleration sensing region, a Y-axis acceleration sensing region, and a Z-axis acceleration sensing region for sensing an external Z-axis motion.
  • the cover body and the peripheral edge of the circuit substrate are bonded by a sealant layer to form a sealed cavity.
  • the micromechanical system is located in the sealed cavity and on the upper surface of the circuit substrate, and the height of the sealed cavity is 45 ⁇ 55 ⁇ m ;
  • the X-axis acceleration sensing region includes an X-direction " ⁇ "-shaped moving piece having two through holes, two X-direction moving electrodes, and two X-direction fixed electrodes, and the first spring and the second spring are respectively mounted to the X side.
  • the other ends of the first spring and the second spring are respectively mounted on the circuit substrate, and the two X-direction moving electrodes are respectively located in the X-direction " ⁇ "-shaped moving piece 2 through holes and movable together with the X-direction " ⁇ "-shaped moving piece, the X-direction fixed electrode and the X-direction moving electrode are disposed face to face and directly below the X-direction moving electrode;
  • the cymbal acceleration sensing region includes a ⁇ """ moving piece having two through holes, two slanting moving electrodes, and two slanting fixed electrodes, and the third spring and the fourth spring are respectively mounted to the ⁇
  • the other ends of the upper and lower ends of the " ⁇ " shaped moving piece are respectively mounted on the circuit substrate, and the two moving moving electrodes are respectively located in the through holes of the " ⁇ " shaped moving piece And movable along with the " ⁇ "-shaped moving piece, the facing fixed electrode and the moving moving electrode are disposed face to face and directly below the moving moving electrode;
  • the shape moving piece, the third spring and the fourth spring are arranged in a direction perpendicular to the X-direction moving electrode, the first spring and the second spring in the X-axis acceleration sensing area;
  • the ⁇ -axis acceleration sensing area includes the mass bar and the a support shaft for supporting a center of the mass bar, wherein the two ends of the mass strip are respectively provided with a ⁇ -axis
  • the lower surface of the circuit substrate is bonded to the upper surface portion of the signal processing chip through the first insulating adhesive layer, and the lower surface of the signal processing chip is bonded to the substrate partial region through the second insulating adhesive layer, the circuit substrate and the substrate
  • Each of the upper surfaces respectively has a plurality of chip soldering points and a plurality of substrate soldering points on both sides of the distributed substrate.
  • the upper surface of the signal processing chip has a plurality of signal input soldering points and signal output soldering points respectively, and the signal output soldering points are respectively outputted.
  • the first metal wire is connected between the solder joint of the chip and the signal input soldering point, and the second metal wire is distributed across the two sides. Between the signal output solder joint and the substrate solder joint.
  • the solution of the above technical solution is further improved as follows: 1.
  • the upper and lower ends of the X-direction "H"-shaped motion piece are respectively provided with a first bump, and the first bump is located between the two first limiting portions of the circuit substrate.
  • the Y-direction "H"-shaped motion piece is provided with a second bump on the upper and lower ends, and the second bump is located between the two second limit portions of the circuit substrate. .
  • the height of the sealed cavity is 50 ⁇ m.
  • the X-axis acceleration sensing area and the ⁇ -axis acceleration sensing area are located in a row, and the ⁇ -axis acceleration sensing area is disposed in parallel with the X-axis acceleration sensing area and the ⁇ -axis acceleration sensing area.
  • the substrate solder joint opens the upper surface of the circuit substrate and is located on the side of the cover.
  • the present invention has the following advantages and effects compared with the prior art:
  • the capacitive MEMS accelerometer of the present invention the lower surface of the circuit substrate is bonded to the upper surface portion of the signal processing chip through the first insulating adhesive layer, and the lower surface of the signal processing chip passes through the second insulating adhesive layer and the substrate portion
  • the surface bonding, the upper surface of the circuit substrate and the substrate respectively have a plurality of chip soldering points and a plurality of substrate soldering points on both side edges of the distributed substrate
  • the signal processing chip has a plurality of signal input soldering points and signals respectively on the upper surface of the signal processing chip Outputting a soldering point, the signal output soldering point is located in the second insulating adhesive layer and distributed on both edge regions of the signal processing chip, and the first metal line is connected between the solder joint of the chip and the signal input soldering point, and is distributed
  • the second metal wires on both sides are connected between the signal output soldering point and the substrate soldering point, and the package reliability is high.
  • the welding of the insulating rubber layer effectively reduces the stress damage of the external force on the chip, and the position layout of the soldering point is designed. It is possible to perform wire bonding in a very small package space. The first is to make the wire of the wire shorter and the cost is lower. Gel threading technology to solve high level of diversity is not stable arc wire line problems and improve the feasibility of mass production.
  • the capacitive MEMS accelerometer of the present invention has a first bump on the upper and lower ends of the X-direction "H"-shaped moving piece, and the first bump is located at two first limits of the circuit substrate. Between the parts, the Y-direction "H"-shaped moving piece is provided with a second bump at the upper and lower ends, and the second protrusion is located between the two second limiting portions of the circuit substrate, thereby effectively preventing production Under the action of acceleration, the internal structure damage of the X-axis and Y-axis acceleration sensing areas is avoided.
  • the capacitive MEMS acceleration sensor of the present invention includes a mass strip and a support shaft for supporting the center of the mass strip, and the Z-axis sensing electrode is disposed directly below both ends of the mass strip A limit stop is arranged directly above the two ends of the mass bar, which can effectively protect the mechanical damage of the internal structure, and at the same time greatly improve the sensitivity of the induction.
  • the capacitive MEMS acceleration sensor of the present invention has an X-axis acceleration sensing area and a Y-axis acceleration sensing area in a row, and the z-axis acceleration sensing area is arranged in parallel with the X-axis acceleration sensing area and the Y-axis acceleration sensing area. Effectively reducing the position of the sensing area in the chip circuit, which is more advantageous in terms of cost and package feasibility.
  • the substrate soldering point opens the upper surface of the circuit substrate and is located on the side of the cover body, which is beneficial to the chip arrangement and Reduce the difficulty of cutting and threading during the packaging process.
  • FIG. 1 is a schematic structural view of a capacitive MEMS acceleration sensor according to the present invention.
  • Figure 2 is a schematic left side view of Figure 1;
  • Figure 3 is a bottom plan view of Figure 1;
  • FIG. 4 is a schematic structural view of a MEMS acceleration chip according to the present invention.
  • Figure 5 is a schematic structural view of a micromechanical system of the present invention.
  • FIG. 6 is a schematic structural view of an X-axis acceleration sensing area in an acceleration sensor according to the present invention.
  • FIG. 7 is a partial structural schematic view of an X-axis acceleration sensing area of the present invention.
  • FIG. 8 is a schematic structural view of a Y-axis acceleration sensing area in an acceleration sensor according to the present invention.
  • FIG. 9 is a schematic structural view of a Z-axis acceleration sensing area in an acceleration sensor according to the present invention.
  • Figure 10 is a bottom plan view of Figure 9;
  • a capacitive MEMS acceleration sensor comprising a MEMS acceleration chip 1, a signal processing chip 2 for filtering an interference signal and processing an induced signal, and a substrate 3, the MEMS acceleration chip 1 being covered by a cover 4, a micromechanical system 5 And a circuit substrate 6 for generating an inductive signal, the micromechanical system 5 being composed of an X-axis acceleration sensing region 7, a Y-axis acceleration sensing region 8, and a Z-axis acceleration sensing region 9 for sensing an external Z-axis motion,
  • the cover 4 and the peripheral edge of the circuit substrate 6 are bonded by a sealant layer 10 to form a sealed cavity 11.
  • the micromechanical system 5 is located in the sealed cavity 11 and on the upper surface of the circuit substrate 6, the height of the sealed cavity 11. 45 ⁇ 55 ⁇ ⁇ ;
  • the X-axis acceleration sensing region 7 includes an X-direction " ⁇ "-shaped moving piece 71 having two through holes, two X-direction moving electrodes 72, and two X-direction fixed electrodes 73, a first spring 74 and a second spring 75.
  • the respective ends are respectively mounted to the left and right ends of the X-direction " ⁇ "-shaped moving piece 71, and the other ends of the first spring 74 and the second spring 75 are respectively mounted on the circuit substrate 6, and the two X-direction moving electrodes are respectively mounted.
  • the X-direction moving electrode 72 are respectively located in the two through holes of the X-direction " ⁇ "-shaped moving piece 71 and are movable along with the X-direction " ⁇ "-shaped moving piece 71, and the X-direction fixed electrode 73 and the X-direction moving electrode 72 are disposed face to face. And it is directly below the X-direction moving electrode 72;
  • the cymbal acceleration sensing region 8 includes a ⁇ "" shaped moving piece 81 having two through holes, two slanting moving electrodes 82, and two slanting fixed electrodes 83, a third spring 84 and a fourth spring 85.
  • One end of each of the third spring 84 and the fourth spring 85 is respectively mounted on the circuit substrate 6, and the other end is respectively mounted on the upper and lower ends of the " ⁇ "-shaped moving piece 81.
  • the two Y-direction moving electrodes 82 are respectively located in the through holes of the " ⁇ "-shaped moving piece 81 and can move with the " ⁇ "-shaped moving piece 81, and move toward the fixed electrode 83 and the tilting movement.
  • the electrodes 82 are disposed face to face and are directly below the moving moving electrode 82; the direction of the " ⁇ " shaped moving piece 81, the third spring 84 and the fourth spring 85 in the x-axis acceleration sensing area 8 and the X-axis acceleration
  • the X-direction moving electrode 72, the first spring 74 and the second spring 75 in the sensing area 7 are arranged in a vertical direction;
  • the ⁇ -axis acceleration sensing area 9 includes a mass bar 24 and a support shaft 25 for supporting the center of the mass bar 24,
  • the first end of the mass bar 24 is provided with a cymbal sensing electrode 26, and a limit stop 27 is disposed above the two ends of the mass bar 24;
  • the lower surface of the circuit substrate 6 is bonded to the upper surface portion of the signal processing chip 2 through the first insulating adhesive layer 12, and the lower surface of the signal processing chip 2 is bonded to the partial region of the substrate 3 through the second insulating adhesive layer 13.
  • the upper surface of the circuit substrate 6 and the substrate 3 respectively have a plurality of chip soldering points 14 and a plurality of substrate soldering points 15 on both side edges of the distributed substrate 3.
  • the signal processing chip 2 has a plurality of signal input soldering on the upper surface thereof.
  • the signal output solder joint 17 is located in the second insulating adhesive layer 13 and distributed on both edge regions of the signal processing chip 2, and the first metal line 18 is connected across the chip solder joint 14 Between the signal input pads 16 and the second metal lines 19 distributed on both sides are bridged between the signal output pads 17 and the substrate pads 15.
  • the upper and lower ends of the X-direction " ⁇ "-shaped moving piece 71 are respectively provided with a first bump 20, and the first bump 20 is located between the two first limiting portions 21 of the circuit substrate 6.
  • the upper and lower ends of the " ⁇ "-shaped moving piece 81 are provided with second bumps 22, and the second bumps 22 are located between the two second limiting portions 23 of the circuit substrate 6.
  • the above sealed chamber 11 has a height of 50 ⁇ m.
  • the X-axis acceleration sensing area 7 and the Y-axis acceleration sensing area 8 are located in a row, and the Z-axis acceleration sensing area
  • the substrate soldering point 15 is formed on the upper surface of the circuit substrate 6 and on the side of the cover 4; the through hole is square.

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  • General Physics & Mathematics (AREA)
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Abstract

A capacitive MEMS acceleration sensor comprising an MEMS acceleration chip (1), a signal processing chip (2) and a substrate (3). The MEMS acceleration chip (1) comprises a cover body (4), a micromechanical system (5) and a circuit substrate (6), the micromechanical system (5) is composed of an X-axis acceleration induction area (7), a Y-axis acceleration induction area (8) and a Z-axis acceleration induction area (9); the Y-axis acceleration induction area (8) comprises a Y-direction 'H'-shaped moving sheet (81) with two through holes, two Y-direction moving electrodes (82) and two Y-direction fixed electrodes (83); the Z-axis acceleration induction area (9) comprises a mass block (24) and a supporting shaft (25) for supporting the center of the mass block (24); the lower surface of the circuit substrate (6) is bonded with a partial area on the upper surface of the signal processing chip (2) through a first insulation adhesive layer (12); the upper surface of the circuit substrate (6) is provided with a plurality of chip welding points (14), the upper surface of the substrate (3) is provided with a plurality of substrate welding points (15) which are distributed in the edge areas on the two sides of the substrate (3), and the upper surface of the signal processing chip (2) is provided with signal input welding points (16) and signal output welding points (17) respectively. The capacitive MEMS acceleration sensor improves the reliability of a device and effectively reduces stress damage to the chips by an external force.

Description

电容式 MEMS加速度传感器  Capacitive MEMS accelerometer
技术领域 Technical field
[0001] 本发明涉及加速度传感器技术领域, 具体涉及一种电容式 MEMS加速度传感器。 背景技术  [0001] The present invention relates to the field of acceleration sensor technologies, and in particular, to a capacitive MEMS acceleration sensor. Background technique
[0002] 微机电系统加速度传感器由于体积小、 质量轻、 成本低、 可靠性高等优点而备受关 注, 尤其在对器件的体积、 质量及可靠性有很高要求的航空航天及兵器科学领域有很大的 应用前景。 加速度传感器的研究近年来发展迅速, 各种性能、 量程的高量程加速度传感器 己经相继报道。 但是加速度传感器对抗高过载能力和固有频率要求很高, 通常情况下抗高 过载能力要求可以承受几十万个量程冲击载荷,固有频率要求高达几十 kHz,甚至上百 kHz。 因此, 在应用中 MEMS高量程加速度传感器常常由于抗高过载能力较差而导致结构失效。 为保证 MEMS高量程加速度传感器在应用时的可靠性, MEMS高量程加速度传感器的封装 就显得尤为重要。 实践表明, 现有传感器封装技术普遍存在抗高过载能力差、 固有频率低、 以及封装可靠性差的问题, 即采用现有传感器封装技术封装后的 MEMS高量程加速度传感 器在遇到恶劣的应用环境时, 常出现管壳破裂、 盖板凹陷、 芯片从管壳基板上脱落、 引线 断裂等问题。 基于此, 有必要发明一种电容式 MEMS加速度传感器, 以保证加速度传感器 在应用时的可靠性。  [0002] MEMS accelerometers have attracted much attention due to their small size, light weight, low cost, and high reliability, especially in the aerospace and weapon science fields where the size, quality and reliability of devices are very high. Great application prospects. The research of accelerometers has developed rapidly in recent years, and various range and range of high-range accelerometers have been reported. However, the acceleration sensor has high requirements for high overload capability and natural frequency. Generally, the anti-high overload capability can withstand hundreds of thousands of range impact loads, and the natural frequency requirements are up to tens of kHz or even hundreds of kHz. Therefore, in applications, MEMS high-range accelerometers often suffer from structural failure due to poor resistance to high overload. In order to ensure the reliability of MEMS high-range accelerometers in application, the packaging of MEMS high-range accelerometers is particularly important. Practice shows that the existing sensor packaging technology generally suffers from the problem of poor high overload resistance, low natural frequency, and poor package reliability, that is, the MEMS high-range acceleration sensor packaged by the existing sensor packaging technology encounters a harsh application environment. Problems such as cracking of the shell, depression of the cover, peeling of the chip from the shell substrate, and breakage of the lead often occur. Based on this, it is necessary to invent a capacitive MEMS accelerometer to ensure the reliability of the acceleration sensor in application.
发明内容 Summary of the invention
[0003] 本发明目的是提供一种电容式 MEMS加速度传感器, 此 MEMS加速度传感器提高 了器件的可靠性且有效减少外力对芯片的应力损伤。  [0003] It is an object of the present invention to provide a capacitive MEMS accelerometer that improves the reliability of the device and effectively reduces stress damage to the chip by external forces.
[0004] 为达到上述目的, 本发明采用的技术方案是: 一种电容式 MEMS加速度传感器, 包 括 MEMS 加速度芯片、 用于过滤干扰信号并处理感应信号的信号处理芯片和基板, 所述 MEMS加速度芯片由盖体、 微机械系统和用于产生感应信号的电路基片, 该微机械系统由 X轴加速度感应区、 Y轴加速度感应区和用于感应外界 Z轴运动的 Z轴加速度感应区组成, 所述盖体与电路基片四周边缘通过密封胶层粘接从而形成一密封腔, 所述微机械系统位于 密封腔内且在电路基片上表面, 该密封腔的高度为 45~55 μ ιη; [0004] In order to achieve the above object, the technical solution adopted by the present invention is: A capacitive MEMS acceleration sensor, comprising a MEMS acceleration chip, a signal processing chip and a substrate for filtering an interference signal and processing the sensing signal, the MEMS acceleration chip The micro-mechanical system is composed of a cover body, a micro-mechanical system and a circuit substrate for generating an induced signal, and the micro-mechanical system is composed of an X-axis acceleration sensing region, a Y-axis acceleration sensing region, and a Z-axis acceleration sensing region for sensing an external Z-axis motion. The cover body and the peripheral edge of the circuit substrate are bonded by a sealant layer to form a sealed cavity. The micromechanical system is located in the sealed cavity and on the upper surface of the circuit substrate, and the height of the sealed cavity is 45~55 μm ;
所述 X轴加速度感应区包括具有 2个通孔的 X向 "Η"形运动片、 2个 X向运动电极和 2 个 X向固定电极, 第一弹簧和第二弹簧各自一端分别安装到 X向 " Η"形运动片的左、 右 端, 第一弹簧和第二弹簧各自另一端分别安装到所述电路基片上, 2个所述 X向运动电极 分别位于 X向 "Η"形运动片的 2个通孔内并可随该 X向 "Η"形运动片一起运动, 所述 X 向固定电极与 X向运动电极面对面设置且其在 X向运动电极的正下方; The X-axis acceleration sensing region includes an X-direction "Η"-shaped moving piece having two through holes, two X-direction moving electrodes, and two X-direction fixed electrodes, and the first spring and the second spring are respectively mounted to the X side. To the left and right ends of the "Η" shaped moving piece, the other ends of the first spring and the second spring are respectively mounted on the circuit substrate, and the two X-direction moving electrodes are respectively located in the X-direction "Η"-shaped moving piece 2 through holes and movable together with the X-direction "Η"-shaped moving piece, the X-direction fixed electrode and the X-direction moving electrode are disposed face to face and directly below the X-direction moving electrode;
所述 Υ轴加速度感应区包括具有 2个通孔的 Υ向 "Η"形运动片、 2个 Υ向运动电极和 2 个 Υ向固定电极, 第三弹簧和第四弹簧各自一端分别安装到 Υ向 " Η"形运动片上、 下端, 第三弹簧和第四弹簧各自另一端分别安装到所述电路基片上, 2个所述 Υ向运动电极分别 位于 Υ向 "Η"形运动片的通孔内并可随该 Υ向 "Η"形运动片一起运动, Υ向固定电极与 Υ向运动电极面对面设置且其在 Υ向运动电极的正下方;所述 Υ轴加速度感应区中 Υ向" Η" 形运动片、 第三弹簧和第四弹簧排列方向与 X轴加速度感应区中 X向运动电极、 第一弹簧 和第二弹簧排列方向垂直; 所述 ζ轴加速度感应区包括质量条块和用于支撑质量条块中心 的支撑轴, 所述质量条块两端正下方均设有 ζ轴感应电极, 所述质量条块两端正上方均设 有限位挡块; The cymbal acceleration sensing region includes a Η""" moving piece having two through holes, two slanting moving electrodes, and two slanting fixed electrodes, and the third spring and the fourth spring are respectively mounted to the Υ The other ends of the upper and lower ends of the "Η" shaped moving piece are respectively mounted on the circuit substrate, and the two moving moving electrodes are respectively located in the through holes of the "Η" shaped moving piece And movable along with the "Η"-shaped moving piece, the facing fixed electrode and the moving moving electrode are disposed face to face and directly below the moving moving electrode; The shape moving piece, the third spring and the fourth spring are arranged in a direction perpendicular to the X-direction moving electrode, the first spring and the second spring in the X-axis acceleration sensing area; the ζ-axis acceleration sensing area includes the mass bar and the a support shaft for supporting a center of the mass bar, wherein the two ends of the mass strip are respectively provided with a 感应-axis sensing electrode, and the limit bar is respectively disposed above the two ends of the mass bar;
所述电路基片下表面通过第一绝缘胶粘层与信号处理芯片上表面部分区域粘接, 此信号处 理芯片下表面通过第二绝缘胶粘层与基板部分区域粘接, 电路基片和基板各自上表面分别 开有若干个芯片焊接点和若干个分布基板两侧边缘区的基板焊接点, 信号处理芯片上表面 分别开有若干个信号输入焊接点和信号输出焊接点, 此信号输出焊接点位于第二绝缘胶粘 层内并分布在信号处理芯片两侧边缘区, 第一金属线跨接于所述芯片焊接点和信号输入焊 接点之间, 分布于两侧的第二金属线跨接于所述信号输出焊接点和基板焊接点之间。 The lower surface of the circuit substrate is bonded to the upper surface portion of the signal processing chip through the first insulating adhesive layer, and the lower surface of the signal processing chip is bonded to the substrate partial region through the second insulating adhesive layer, the circuit substrate and the substrate Each of the upper surfaces respectively has a plurality of chip soldering points and a plurality of substrate soldering points on both sides of the distributed substrate. The upper surface of the signal processing chip has a plurality of signal input soldering points and signal output soldering points respectively, and the signal output soldering points are respectively outputted. Located in the second insulating adhesive layer and distributed in the edge regions of the signal processing chip, the first metal wire is connected between the solder joint of the chip and the signal input soldering point, and the second metal wire is distributed across the two sides. Between the signal output solder joint and the substrate solder joint.
[0005] 上述技术方案中进一步改进的方案如下: 1. 上述方案中, 所述 X向 "H"形运动片上、 下端均设有第一凸块, 该第一凸块位于所述 电路基片的 2个第一限位部之间。 [0005] The solution of the above technical solution is further improved as follows: 1. In the above solution, the upper and lower ends of the X-direction "H"-shaped motion piece are respectively provided with a first bump, and the first bump is located between the two first limiting portions of the circuit substrate.
[0006] 2. 上述方案中, 所述 Y向 "H"形运动片上、 下端均设有第二凸块, 该第二凸块位 于所述电路基片的 2个第二限位部之间。  [0006] 2. In the above solution, the Y-direction "H"-shaped motion piece is provided with a second bump on the upper and lower ends, and the second bump is located between the two second limit portions of the circuit substrate. .
[0007] 3. 上述方案中, 所述密封腔的高度为 50 μ ιη。  [0007] 3. In the above solution, the height of the sealed cavity is 50 μm.
[0008] 4. 上述方案中, 所述 X轴加速度感应区和 Υ轴加速度感应区位于一排, 所述 Ζ轴加 速度感应区与 X轴加速度感应区和 Υ轴加速度感应区平行设置。  [0008] 4. In the above solution, the X-axis acceleration sensing area and the Υ-axis acceleration sensing area are located in a row, and the 加-axis acceleration sensing area is disposed in parallel with the X-axis acceleration sensing area and the Υ-axis acceleration sensing area.
[0009] 5. 上述方案中, 所述基板焊接点开设电路基片上表面且位于盖体一侧。  [0009] 5. In the above solution, the substrate solder joint opens the upper surface of the circuit substrate and is located on the side of the cover.
[0010] 6. 上述方案中, 所述通孔为方形。  [0010] 6. In the above solution, the through hole is square.
[0011] 由于上述技术方案运用, 本发明与现有技术相比具有下列优点和效果:  [0011] Due to the above technical solutions, the present invention has the following advantages and effects compared with the prior art:
1. 本发明电容式 MEMS加速度传感器,其电路基片下表面通过第一绝缘胶粘层与信号处理 芯片上表面部分区域粘接, 此信号处理芯片下表面通过第二绝缘胶粘层与基板部分区域粘 接, 电路基片和基板各自上表面分别开有若干个芯片焊接点和若干个分布基板两侧边缘区 的基板焊接点, 信号处理芯片上表面分别开有若干个信号输入焊接点和信号输出焊接点, 此信号输出焊接点位于第二绝缘胶粘层内并分布在信号处理芯片两侧边缘区, 第一金属线 跨接于所述芯片焊接点和信号输入焊接点之间, 分布于两侧的第二金属线跨接于所述信号 输出焊接点和基板焊接点之间, 封装可靠性高, 通过绝缘胶层的焊接有效减少外力对芯片 的应力损伤, 焊接点的位置排布设计能够在极小的封装空间中进行连线的焊接, 第一使连 线的金线越短成本越低, 其次采用绝缘胶中穿线的工艺能解决高台阶差异性的打线线弧不 稳的问题, 提高产品量产的可行性。  1. The capacitive MEMS accelerometer of the present invention, the lower surface of the circuit substrate is bonded to the upper surface portion of the signal processing chip through the first insulating adhesive layer, and the lower surface of the signal processing chip passes through the second insulating adhesive layer and the substrate portion The surface bonding, the upper surface of the circuit substrate and the substrate respectively have a plurality of chip soldering points and a plurality of substrate soldering points on both side edges of the distributed substrate, and the signal processing chip has a plurality of signal input soldering points and signals respectively on the upper surface of the signal processing chip Outputting a soldering point, the signal output soldering point is located in the second insulating adhesive layer and distributed on both edge regions of the signal processing chip, and the first metal line is connected between the solder joint of the chip and the signal input soldering point, and is distributed The second metal wires on both sides are connected between the signal output soldering point and the substrate soldering point, and the package reliability is high. The welding of the insulating rubber layer effectively reduces the stress damage of the external force on the chip, and the position layout of the soldering point is designed. It is possible to perform wire bonding in a very small package space. The first is to make the wire of the wire shorter and the cost is lower. Gel threading technology to solve high level of diversity is not stable arc wire line problems and improve the feasibility of mass production.
[0012] 2. 本发明电容式 MEMS加速度传感器, 其 X向 "H"形运动片上、 下端均设有第一 凸块, 该第一凸块位于所述电路基片的 2个第一限位部之间, Y向 "H"形运动片上、 下 端均设有第二凸块, 该第二凸块位于所述电路基片的 2个第二限位部之间, 有效的防止产 品在加速度的作用下避免 X轴、 Y轴加速度感应区内部结构损坏。 [0012] 2. The capacitive MEMS accelerometer of the present invention has a first bump on the upper and lower ends of the X-direction "H"-shaped moving piece, and the first bump is located at two first limits of the circuit substrate. Between the parts, the Y-direction "H"-shaped moving piece is provided with a second bump at the upper and lower ends, and the second protrusion is located between the two second limiting portions of the circuit substrate, thereby effectively preventing production Under the action of acceleration, the internal structure damage of the X-axis and Y-axis acceleration sensing areas is avoided.
[0013] 3. 本发明电容式 MEMS加速度传感器,其 Z轴加速度感应区包括质量条块和用于支 撑质量条块中心的支撑轴, 所述质量条块两端正下方均设有 Z轴感应电极, 所述质量条块 两端正上方均设有限位挡块, 能有效防护内部结构的机械性损毁, 同时对于感应的灵敏性 方面有很大的提高。  [0013] 3. The capacitive MEMS acceleration sensor of the present invention, the Z-axis acceleration sensing region includes a mass strip and a support shaft for supporting the center of the mass strip, and the Z-axis sensing electrode is disposed directly below both ends of the mass strip A limit stop is arranged directly above the two ends of the mass bar, which can effectively protect the mechanical damage of the internal structure, and at the same time greatly improve the sensitivity of the induction.
[0014] 4. 本发明电容式 MEMS加速度传感器, 其 X轴加速度感应区和 Y轴加速度感应区 位于一排, 所述 z轴加速度感应区与 X轴加速度感应区和 Y轴加速度感应区平行设置, 有 效的减少感应区在芯片电路中所占的位置, 在成本和封装的可行性方面更有优势; 其次, 基板焊接点开设电路基片上表面且位于盖体一侧, 有利于芯片排布以及降低封装过程中切 割和打线的难度。  [0014] 4. The capacitive MEMS acceleration sensor of the present invention has an X-axis acceleration sensing area and a Y-axis acceleration sensing area in a row, and the z-axis acceleration sensing area is arranged in parallel with the X-axis acceleration sensing area and the Y-axis acceleration sensing area. Effectively reducing the position of the sensing area in the chip circuit, which is more advantageous in terms of cost and package feasibility. Secondly, the substrate soldering point opens the upper surface of the circuit substrate and is located on the side of the cover body, which is beneficial to the chip arrangement and Reduce the difficulty of cutting and threading during the packaging process.
附图说明 DRAWINGS
[0015] 图 1为本发明电容式 MEMS加速度传感器结构示意图;  1 is a schematic structural view of a capacitive MEMS acceleration sensor according to the present invention;
图 2为附图 1的左视结构示意图; Figure 2 is a schematic left side view of Figure 1;
图 3为附图 1的仰视结构示意图; Figure 3 is a bottom plan view of Figure 1;
图 4为本发明 MEMS加速度芯片结构示意图; 4 is a schematic structural view of a MEMS acceleration chip according to the present invention;
图 5为本发明微机械系统结构示意图; Figure 5 is a schematic structural view of a micromechanical system of the present invention;
图 6为本发明加速度传感器中 X轴加速度感应区结构示意图; 6 is a schematic structural view of an X-axis acceleration sensing area in an acceleration sensor according to the present invention;
图 7为本发明 X轴加速度感应区局部结构示意图; 7 is a partial structural schematic view of an X-axis acceleration sensing area of the present invention;
图 8为本发明加速度传感器中 Y轴加速度感应区结构示意图; 8 is a schematic structural view of a Y-axis acceleration sensing area in an acceleration sensor according to the present invention;
图 9为本发明加速度传感器中 Z轴加速度感应区结构示意图; 9 is a schematic structural view of a Z-axis acceleration sensing area in an acceleration sensor according to the present invention;
图 10为附图 9的仰视结构示意图。 Figure 10 is a bottom plan view of Figure 9;
以上附图中: 1、 MEMS加速度芯片; 2、 信号处理芯片; 3、 基板; 4、 盖体; 5、 微机械 系统; 6、 电路基片; 7、 X轴加速度感应区; 71、 X向 "H"形运动片; 72、 X向运动电极; 73、 X向固定电极; 74、 第一弹簧; 75、 第二弹簧; 8、 Y轴加速度感应区; 81、 Y向 "H" 形运动片; 82、 Y向运动电极; 83、 Y向固定电极; 84、 第三弹簧; 85、 第四弹簧; 9、 Z 轴加速度感应区; 10、 密封胶层; 11、 密封腔; 12、 第一绝缘胶粘层; 13、 第二绝缘胶粘 层; 14、 芯片焊接点; 15、 基板焊接点; 16、 信号输入焊接点; 17、 信号输出焊接点; 18、 第一金属线; 19、 第二金属线; 20、 第一凸块; 21、 第一限位部; 22、 第二凸块; 23、 第 二限位部; 24、 质量条块; 25、 支撑轴; 26、 Z轴感应电极; 27、 限位挡块。 In the above drawings: 1. MEMS acceleration chip; 2. Signal processing chip; 3. Substrate; 4. Cover; 5. Micro-mechanical system; 6. Circuit substrate; 7. X-axis acceleration sensing area; "H" shaped moving piece; 72, X-direction moving electrode; 73, X-direction fixed electrode; 74, first spring; 75, second spring; 8, Y-axis acceleration sensing area; 81, Y-direction "H"-shaped moving piece; 82, Y-direction moving electrode; 83, Y-direction fixed 84; third spring; 85, fourth spring; 9, Z-axis acceleration sensing area; 10, sealant layer; 11, sealing cavity; 12, first insulating adhesive layer; 13, second insulating adhesive layer 14, chip solder joints; 15, substrate solder joints; 16, signal input solder joints; 17, signal output solder joints; 18, the first metal line; 19, the second metal line; 20, the first bump; The first limiting portion; 22, the second convex portion; 23, the second limiting portion; 24, the mass bar; 25, the supporting shaft; 26, the Z-axis sensing electrode; 27, the limiting block.
具体实施方式 detailed description
[0016] 下面结合实施例对本发明作进一步描述:  [0016] The present invention will be further described below in conjunction with the embodiments:
实施例: 一种电容式 MEMS加速度传感器, 包括 MEMS加速度芯片 1、 用于过滤干扰信号 并处理感应信号的信号处理芯片 2和基板 3, 所述 MEMS加速度芯片 1 由盖体 4、 微机械 系统 5和用于产生感应信号的电路基片 6, 该微机械系统 5由 X轴加速度感应区 7、 Y轴加 速度感应区 8和用于感应外界 Z轴运动的 Z轴加速度感应区 9组成, 所述盖体 4与电路基 片 6四周边缘通过密封胶层 10粘接从而形成一密封腔 11, 所述微机械系统 5位于密封腔 11内且在电路基片 6上表面, 该密封腔 11的高度为 45~55 μ ιη; Embodiments: A capacitive MEMS acceleration sensor comprising a MEMS acceleration chip 1, a signal processing chip 2 for filtering an interference signal and processing an induced signal, and a substrate 3, the MEMS acceleration chip 1 being covered by a cover 4, a micromechanical system 5 And a circuit substrate 6 for generating an inductive signal, the micromechanical system 5 being composed of an X-axis acceleration sensing region 7, a Y-axis acceleration sensing region 8, and a Z-axis acceleration sensing region 9 for sensing an external Z-axis motion, The cover 4 and the peripheral edge of the circuit substrate 6 are bonded by a sealant layer 10 to form a sealed cavity 11. The micromechanical system 5 is located in the sealed cavity 11 and on the upper surface of the circuit substrate 6, the height of the sealed cavity 11. 45~55 μ ιη ;
所述 X轴加速度感应区 7包括具有 2个通孔的 X向 "Η"形运动片 71、 2个 X向运动电极 72和 2个 X向固定电极 73, 第一弹簧 74和第二弹簧 75各自一端分别安装到 X向 "Η"形 运动片 71的左、 右端, 第一弹簧 74和第二弹簧 75各自另一端分别安装到所述电路基片 6 上, 2个所述 X向运动电极 72分别位于 X向 "Η"形运动片 71的 2个通孔内并可随该 X 向 "Η"形运动片 71—起运动, 所述 X向固定电极 73与 X向运动电极 72面对面设置且其 在 X向运动电极 72的正下方; The X-axis acceleration sensing region 7 includes an X-direction "Η"-shaped moving piece 71 having two through holes, two X-direction moving electrodes 72, and two X-direction fixed electrodes 73, a first spring 74 and a second spring 75. The respective ends are respectively mounted to the left and right ends of the X-direction "Η"-shaped moving piece 71, and the other ends of the first spring 74 and the second spring 75 are respectively mounted on the circuit substrate 6, and the two X-direction moving electrodes are respectively mounted. 72 are respectively located in the two through holes of the X-direction "Η"-shaped moving piece 71 and are movable along with the X-direction "Η"-shaped moving piece 71, and the X-direction fixed electrode 73 and the X-direction moving electrode 72 are disposed face to face. And it is directly below the X-direction moving electrode 72;
所述 Υ轴加速度感应区 8包括具有 2个通孔的 Υ向 "Η"形运动片 81、 2个 Υ向运动电极 82和 2个 Υ向固定电极 83, 第三弹簧 84和第四弹簧 85各自一端分别安装到 Υ向 "Η"形 运动片 81上、下端,第三弹簧 84和第四弹簧 85各自另一端分别安装到所述电路基片 6上, 2个所述 Y向运动电极 82分别位于 Υ向 "Η"形运动片 81的通孔内并可随该 Υ向 "Η"形 运动片 81—起运动, Υ向固定电极 83与 Υ向运动电极 82面对面设置且其在 Υ向运动电 极 82的正下方; 所述 Υ轴加速度感应区 8中 Υ向 " Η"形运动片 81、 第三弹簧 84和第四 弹簧 85排列方向与 X轴加速度感应区 7中 X向运动电极 72、 第一弹簧 74和第二弹簧 75 排列方向垂直; 所述 Ζ轴加速度感应区 9包括质量条块 24和用于支撑质量条块 24中心的 支撑轴 25, 所述质量条块 24两端正下方均设有 Ζ轴感应电极 26, 所述质量条块 24两端正 上方均设有限位挡块 27; The cymbal acceleration sensing region 8 includes a Η"" shaped moving piece 81 having two through holes, two slanting moving electrodes 82, and two slanting fixed electrodes 83, a third spring 84 and a fourth spring 85. One end of each of the third spring 84 and the fourth spring 85 is respectively mounted on the circuit substrate 6, and the other end is respectively mounted on the upper and lower ends of the "Η"-shaped moving piece 81, The two Y-direction moving electrodes 82 are respectively located in the through holes of the "Η"-shaped moving piece 81 and can move with the "Η"-shaped moving piece 81, and move toward the fixed electrode 83 and the tilting movement. The electrodes 82 are disposed face to face and are directly below the moving moving electrode 82; the direction of the "Η" shaped moving piece 81, the third spring 84 and the fourth spring 85 in the x-axis acceleration sensing area 8 and the X-axis acceleration The X-direction moving electrode 72, the first spring 74 and the second spring 75 in the sensing area 7 are arranged in a vertical direction; the Ζ-axis acceleration sensing area 9 includes a mass bar 24 and a support shaft 25 for supporting the center of the mass bar 24, The first end of the mass bar 24 is provided with a cymbal sensing electrode 26, and a limit stop 27 is disposed above the two ends of the mass bar 24;
所述电路基片 6下表面通过第一绝缘胶粘层 12与信号处理芯片 2上表面部分区域粘接, 此 信号处理芯片 2下表面通过第二绝缘胶粘层 13与基板 3部分区域粘接, 电路基片 6和基板 3各自上表面分别开有若干个芯片焊接点 14和若干个分布基板 3两侧边缘区的基板焊接点 15, 信号处理芯片 2上表面分别开有若干个信号输入焊接点 16和信号输出焊接点 17, 此信 号输出焊接点 17位于第二绝缘胶粘层 13 内并分布在信号处理芯片 2两侧边缘区, 第一金 属线 18跨接于所述芯片焊接点 14和信号输入焊接点 16之间,分布于两侧的第二金属线 19 跨接于所述信号输出焊接点 17和基板焊接点 15之间。 The lower surface of the circuit substrate 6 is bonded to the upper surface portion of the signal processing chip 2 through the first insulating adhesive layer 12, and the lower surface of the signal processing chip 2 is bonded to the partial region of the substrate 3 through the second insulating adhesive layer 13. The upper surface of the circuit substrate 6 and the substrate 3 respectively have a plurality of chip soldering points 14 and a plurality of substrate soldering points 15 on both side edges of the distributed substrate 3. The signal processing chip 2 has a plurality of signal input soldering on the upper surface thereof. Point 16 and signal output solder joint 17, the signal output solder joint 17 is located in the second insulating adhesive layer 13 and distributed on both edge regions of the signal processing chip 2, and the first metal line 18 is connected across the chip solder joint 14 Between the signal input pads 16 and the second metal lines 19 distributed on both sides are bridged between the signal output pads 17 and the substrate pads 15.
[0017] 上述 X向 "Η"形运动片 71上、 下端均设有第一凸块 20, 该第一凸块 20位于所述 电路基片 6的 2个第一限位部 21之间。  [0017] The upper and lower ends of the X-direction "Η"-shaped moving piece 71 are respectively provided with a first bump 20, and the first bump 20 is located between the two first limiting portions 21 of the circuit substrate 6.
[0018] 上述 Υ向 "Η"形运动片 81上、 下端均设有第二凸块 22, 该第二凸块 22位于所述 电路基片 6的 2个第二限位部 23之间。  [0018] The upper and lower ends of the "Η"-shaped moving piece 81 are provided with second bumps 22, and the second bumps 22 are located between the two second limiting portions 23 of the circuit substrate 6.
[0019] 上述密封腔 11的高度为 50 μ m。 [0019] The above sealed chamber 11 has a height of 50 μm.
[0020] 上述 X轴加速度感应区 7和 Y轴加速度感应区 8位于一排,所述 Z轴加速度感应区 [0020] The X-axis acceleration sensing area 7 and the Y-axis acceleration sensing area 8 are located in a row, and the Z-axis acceleration sensing area
9与 X轴加速度感应区 7和 Y轴加速度感应区 8平行设置。 9 is set in parallel with the X-axis acceleration sensing zone 7 and the Y-axis acceleration sensing zone 8.
[0021] 上述基板焊接点 15开设电路基片 6上表面且位于盖体 4一侧; 上述通孔为方形。  [0021] The substrate soldering point 15 is formed on the upper surface of the circuit substrate 6 and on the side of the cover 4; the through hole is square.
[0022] 上述实施例只为说明本发明的技术构思及特点, 其目的在于让熟悉此项技术的人士 能够了解本发明的内容并据以实施, 并不能以此限制本发明的保护范围。 凡根据本发明精 神实质所作的等效变化或修饰, 都应涵盖在本发明的保护范围之内。 [0022] The above embodiments are only for explaining the technical idea and features of the present invention, and the purpose thereof is to enable those skilled in the art. The contents of the present invention can be understood and implemented, and the scope of the present invention is not limited thereby. Equivalent variations or modifications made in accordance with the spirit of the invention are intended to be included within the scope of the invention.

Claims

权 利 要 求 书 Claim
1. 一种电容式 MEMS加速度传感器, 其特征在于: 包括 MEMS加速度芯片 (1)、 用于 过滤干扰信号并处理感应信号的信号处理芯片(2)和基板(3), 所述 MEMS加速度芯片 (1) 由盖体(4)、 微机械系统 (5)和用于产生感应信号的电路基片 (6), 该微机械系统 (5) 由 X轴加速度感应区 (7)、 Y轴加速度感应区 (8) 和用于感应外界 Z轴运动的 Z 轴加速度感应区 (9)组成, 所述盖体(4)与电路基片 (6) 四周边缘通过密封胶层 (10) 粘接从而形成一密封腔(11),所述微机械系统(5)位于密封腔(11)内且在电路基片(6) 上表面, 该密封腔 (11) 的高度为 45~55μιη; A capacitive MEMS acceleration sensor, comprising: a MEMS acceleration chip (1), a signal processing chip (2) for filtering an interference signal and processing an induced signal, and a substrate (3), the MEMS acceleration chip ( 1) by the cover body (4), the micromechanical system (5) and the circuit substrate (6) for generating an induced signal, the micromechanical system (5) is induced by the X-axis acceleration sensing region (7), Y-axis acceleration The region (8) is composed of a Z-axis acceleration sensing region (9) for sensing the external Z-axis motion, and the cover body (4) is bonded to the peripheral edge of the circuit substrate (6) through the sealant layer (10) to form a sealed chamber (11), the micromechanical system (5) located in the seal chamber (11) and the upper surface of the circuit substrate (6), the height of the sealing chamber (11) is 45 ~ 55μιη;
所述 X轴加速度感应区 (7) 包括具有 2个通孔的 X向 "Η"形运动片 (71)、 2个 X向 运动电极 (72) 和 2个 X向固定电极 (73), 第一弹簧 (74) 和第二弹簧 (75) 各自一端 分别安装到 X向 "Η"形运动片 (71) 的左、 右端, 第一弹簧 (74)和第二弹簧 (75) 各 自另一端分别安装到所述电路基片 (6) 上, 2个所述 X向运动电极 (72) 分别位于 X向 "Η"形运动片 (71) 的 2个通孔内并可随该 X向 "Η"形运动片 (71) —起运动, 所述 X向固定电极 (73) 与 X向运动电极 (72) 面对面设置且其在 X向运动电极 (72) 的正 下方; The X-axis acceleration sensing region (7) includes an X-direction "Η" shaped moving piece (71) having two through holes, two X-direction moving electrodes (72), and two X-direction fixed electrodes (73), One end of each of a spring (74) and a second spring (75) is respectively mounted to the left and right ends of the X-direction "Η"-shaped moving piece (71), and the other ends of the first spring (74) and the second spring (75) are respectively Mounted on the circuit substrate (6), two of the X-direction moving electrodes (72) are respectively located in two through holes of the X-direction "Η"-shaped moving piece (71) and can follow the X-direction "Η" a "moving motion piece (71) - a movement, the X-direction fixed electrode (73) being disposed face-to-face with the X-direction moving electrode (72) and being directly below the X-direction moving electrode (72);
所述 Υ轴加速度感应区 (8) 包括具有 2个通孔的 Υ向 "Η"形运动片 (81)、 2个 Υ向 运动电极 (82) 和 2个 Υ向固定电极 (83), 第三弹簧 (84) 和第四弹簧 (85) 各自一端 分别安装到 Υ向 "Η"形运动片 (81) 上、 下端, 第三弹簧 (84)和第四弹簧 (85) 各自 另一端分别安装到所述电路基片(6)上, 2个所述 Υ向运动电极(82)分别位于 Υ向 "Η" 形运动片(81)的通孔内并可随该 Υ向" Η"形运动片(81)—起运动, Υ向固定电极(83) 与 Υ向运动电极 (82)面对面设置且其在 Υ向运动电极 (82) 的正下方; 所述 Υ轴加速 度感应区 (8) 中 Υ向 "Η"形运动片 (81)、 第三弹簧 (84)和第四弹簧 (85)排列方向 与 X轴加速度感应区 (7) 中 X向运动电极 (72)、 第一弹簧 (74) 和第二弹簧 (75) 排 列方向垂直; 所述 Ζ轴加速度感应区 (9)包括质量条块(24)和用于支撑质量条块(24) 中心的支撑轴 (25), 所述质量条块 (24) 两端正下方均设有 Ζ轴感应电极 (26), 所述 质量条块 (24) 两端正上方均设有限位挡块 (27); The cymbal acceleration sensing region (8) includes a Η"" shaped moving piece (81) having two through holes, two slanting moving electrodes (82), and two slanting fixed electrodes (83), One end of each of the three springs (84) and the fourth spring (85) is respectively mounted on the upper and lower ends of the "Η"-shaped moving piece (81), and the other ends of the third spring (84) and the fourth spring (85) are respectively mounted. On the circuit substrate (6), two of the moving moving electrodes (82) are respectively located in the through holes of the "Η" shaped moving piece (81) and can move with the "Η" shape. a piece (81)-moving, the slanting fixed electrode (83) is disposed face-to-face with the slanting moving electrode (82) and is directly below the slanting moving electrode (82); the yaw axis acceleration sensing area (8) The direction of the "Η" shaped moving piece (81), the third spring (84) and the fourth spring (85) and the X-direction moving electrode (72) in the X-axis acceleration sensing area (7), the first spring (74) ) is perpendicular to the arrangement direction of the second spring (75); the yoke acceleration sensing region (9) includes a mass bar (24) and a support mass bar (2) 4) a support shaft (25) of the center, a shaft sensing electrode (26) is disposed directly below the two ends of the mass bar (24), and a limit stop is arranged directly above the two ends of the mass bar (24) 27);
所述电路基片 (6)下表面通过第一绝缘胶粘层 (12)与信号处理芯片 (2)上表面部分区 域粘接, 此信号处理芯片 (2)下表面通过第二绝缘胶粘层 (13)与基板(3)部分区域粘 接, 电路基片 (6)和基板(3)各自上表面分别开有若干个芯片焊接点 (14)和若干个分 布基板 (3) 两侧边缘区的基板焊接点 (15), 信号处理芯片 (2) 上表面分别开有若干个 信号输入焊接点 (16) 和信号输出焊接点 (17), 此信号输出焊接点 (17) 位于第二绝缘 胶粘层 (13 ) 内并分布在信号处理芯片 (2) 两侧边缘区, 第一金属线 (18) 跨接于所述 芯片焊接点 (14)和信号输入焊接点 (16)之间, 分布于两侧的第二金属线 (19)跨接于 所述信号输出焊接点 (17) 和基板焊接点 (15 ) 之间。 The lower surface of the circuit substrate (6) is bonded to the upper surface portion of the signal processing chip (2) through the first insulating adhesive layer (12), and the lower surface of the signal processing chip (2) passes through the second insulating adhesive layer. (13) bonding to a partial region of the substrate (3), the upper surface of each of the circuit substrate (6) and the substrate (3) is respectively provided with a plurality of chip soldering points (14) and a plurality of distributed substrates (3) The substrate soldering point (15), the signal processing chip (2) has a plurality of signal input soldering points (16) and a signal output soldering point (17) on the upper surface, and the signal output soldering point (17) is located in the second insulating layer The adhesive layer (13) is disposed on both side edge regions of the signal processing chip (2), and the first metal wire (18) is bridged between the chip soldering point (14) and the signal input soldering point (16). A second metal line (19) distributed on both sides is bridged between the signal output pad (17) and the substrate pad (15).
2. 根据权利要求 1所述的电容式 MEMS加速度传感器, 其特征在于: 所述 X向 " H"形 运动片 (71 ) 上、 下端均设有第一凸块 (20), 该第一凸块 (20) 位于所述电路基片 (6) 的 2个第一限位部 (21 ) 之间。  The capacitive MEMS accelerometer according to claim 1, wherein: the X-direction "H"-shaped moving piece (71) is provided with a first protrusion (20) at the upper and lower ends, the first protrusion The block (20) is located between the two first limiting portions (21) of the circuit substrate (6).
3. 根据权利要求 1所述的电容式 MEMS加速度传感器, 其特征在于: 所述 Y向 " H"形 运动片 (81 ) 上、 下端均设有第二凸块 (22), 该第二凸块 (22) 位于所述电路基片 (6) 的 2个第二限位部 (23 ) 之间。  The capacitive MEMS accelerometer according to claim 1, wherein: the Y-direction "H"-shaped moving piece (81) is provided with a second bump (22) at the upper and lower ends, the second convex The block (22) is located between the two second limiting portions (23) of the circuit substrate (6).
4. 根据权利要求 1所述的电容式 MEMS加速度传感器, 其特征在于: 所述密封腔 (11 ) 的高度为 50 μ ιη。  The capacitive MEMS accelerometer according to claim 1, wherein the sealing chamber (11) has a height of 50 μm.
5. 根据权利要求 1所述的电容式 MEMS加速度传感器, 其特征在于: 所述 X轴加速度 感应区 (7) 和 Y轴加速度感应区 (8) 位于一排, 所述 Z轴加速度感应区 (9) 与 X轴 加速度感应区 (7) 和 Y轴加速度感应区 (8) 平行设置。  The capacitive MEMS acceleration sensor according to claim 1, wherein: the X-axis acceleration sensing area (7) and the Y-axis acceleration sensing area (8) are located in a row, and the Z-axis acceleration sensing area ( 9) Set in parallel with the X-axis acceleration sensing area (7) and the Y-axis acceleration sensing area (8).
6. 根据权利要求 1所述的电容式 MEMS加速度传感器,其特征在于:所述基板焊接点( 15 ) 开设电路基片 (6) 上表面且位于盖体 (4) 一侧。  The capacitive MEMS accelerometer according to claim 1, characterized in that the substrate soldering point (15) is provided on the upper surface of the circuit substrate (6) and on the side of the cover (4).
7. 根据权利要求 1所述的电容式 MEMS加速度传感器, 其特征在于: 所述通孔为方形。  7. The capacitive MEMS accelerometer according to claim 1, wherein: the through hole is square.
PCT/CN2014/080645 2013-07-30 2014-06-24 Capacitive mems acceleration sensor WO2015014179A1 (en)

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