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WO2014112816A1 - Cathode roller assembly and plating apparatus - Google Patents

Cathode roller assembly and plating apparatus Download PDF

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Publication number
WO2014112816A1
WO2014112816A1 PCT/KR2014/000493 KR2014000493W WO2014112816A1 WO 2014112816 A1 WO2014112816 A1 WO 2014112816A1 KR 2014000493 W KR2014000493 W KR 2014000493W WO 2014112816 A1 WO2014112816 A1 WO 2014112816A1
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WO
WIPO (PCT)
Prior art keywords
roller
plated material
hardness
cathode
rolling member
Prior art date
Application number
PCT/KR2014/000493
Other languages
French (fr)
Korean (ko)
Inventor
정광춘
온웅구
한영구
Original Assignee
주식회사 잉크테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 잉크테크 filed Critical 주식회사 잉크테크
Priority to CN201490000514.0U priority Critical patent/CN205133768U/en
Publication of WO2014112816A1 publication Critical patent/WO2014112816A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0657Conducting rolls
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10Electrodes, e.g. composition, counter electrode
    • C25D17/12Shape or form
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0621In horizontal cells

Definitions

  • It relates to a cathode roller assembly and a plating apparatus.
  • Various electronic devices and / or components such as a printed circuit board, a lead frame, and an LED element, use a plating method to form conductive patterns.
  • a cathode roller to which a cathode power source is applied is used.
  • the surface of the cathode roller is electrically conductive, the surface hardness of the metal is provided with a certain level or more. Therefore, the cathode roller is likely to cause a bad contact with the surface of the plated material when the surface of the plated material is bent.
  • the first cathode in which the base films 510 having the first conductive pattern 521 to the third conductive pattern 523 having different lengths are continuously arranged is provided.
  • the first plating patterns 521 are first contacted with the first cathode roller 101 to form a first plating layer 531.
  • a second plating layer 532 is formed and the first plating layer 531 becomes thicker ( c).
  • the first conductive patterns 521, the second conductive patterns 522, and the third conductive pattern 523 are in contact with the third cathode roller 103 to form a third plating layer 533, and the first plating layer. 531 and the second plating layer 532 become thicker.
  • thickness variation of the first plating layer 531 to the third plating layer 533 may occur, which may cause a bad contact between the conductive patterns and the cathode rollers.
  • the plating layer is to be locally formed on a part of the plated material, such as plating, surface bending occurs due to the conductive patterns formed on the surface of the plated material, so that an environment sufficient for the above-described contact failure may be provided. Can be.
  • an object according to an aspect of the present invention is to ensure that the contact with the plated material is made uniform, and that the thickness variation of the plating layer can be minimized To provide an assembly and a plating apparatus.
  • At least the surface is provided to rotate with a first hardness and at least the outer surface is provided with an electrical conductivity and is in contact with one surface of the plated material, and at least the surface is smaller than the first hardness
  • a second hardness having a second hardness, disposed to face the first roller so that the plated material passes between the first roller, and being provided to rotate in engagement with the first roller, the second plate being in contact with the other surface of the plated material It provides a cathode roller assembly comprising a roller.
  • the angle between the virtual line connecting the rotation axis of the first roller and the rotation axis of the second roller and the advancing direction of the plated material may be at right angles.
  • the second roller may be provided to be located ahead of the first roller with respect to the traveling direction of the plated material.
  • the radius of the second roller may be larger than the radius of the first roller.
  • the second roller may be provided with a flexible material at least on the outside.
  • the second roller may include a first rolling member and a second rolling member positioned outside the first rolling member and having the second hardness.
  • the second roller may be provided with at least an outer electrically insulating material.
  • At least the surface is provided to rotate with a first hardness and at least the outer surface is provided with an electrical conductivity and the first roller in contact with one surface of the plated material, and at least the surface is greater than the first hardness
  • a second second hardness having a small second hardness and disposed to face the first roller so that the plated material passes between the first roller and the first roller, the second roller being rotated in engagement with the first roller and being in contact with the other surface of the plated material.
  • a plating apparatus including a two roller and a power unit electrically connected to the first roller and applying a cathode power to the first roller is provided.
  • the angle between the virtual line connecting the rotation axis of the first roller and the rotation axis of the second roller and the advancing direction of the plated material may be at right angles.
  • the second roller may be provided to be located ahead of the first roller with respect to the traveling direction of the plated material.
  • the radius of the second roller may be larger than the radius of the first roller.
  • the second roller may be provided with a flexible material at least on the outside.
  • the second roller may include a first rolling member and a second rolling member positioned outside the first rolling member and having the second hardness.
  • the second roller may be provided with at least an outer electrically insulating material.
  • it may further include a drive unit connected to the second roller to rotate the second roller.
  • 1 is a view schematically showing a problem of the conventional plating method.
  • FIG. 2 is a configuration diagram schematically showing a part of a plating apparatus according to an embodiment of the present invention.
  • FIG. 3 is a cross-sectional view showing another embodiment of the second roller.
  • FIG. 4 is a cross-sectional view illustrating in more detail a state in which the first roller and the second roller are in contact with the plated material.
  • FIG. 5 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
  • FIG. 6 is a configuration diagram schematically showing a plating apparatus according to another embodiment of the present invention.
  • FIG. 7 is a configuration diagram schematically showing a plating apparatus according to another embodiment of the present invention.
  • FIG. 8 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
  • FIG. 9 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
  • FIG. 10 is a partial cross-sectional view showing a state when plating is performed according to an embodiment of the present invention.
  • FIG. 11 is a sectional view showing another example of the plated material.
  • FIG. 12 is a cross-sectional view showing still another example of the plated material.
  • FIG. 2 is a configuration diagram schematically showing a part of a plating apparatus according to an embodiment of the present invention.
  • the plating apparatus of the embodiment shown in FIG. 2 comprises a cathode roller assembly 1 comprising a first roller 11 and a second roller 12.
  • the first roller 11 and the second roller 12 are disposed opposite and adjacent to each other so that the plated material 5 passes therebetween.
  • the first roller 11 and the second roller 12 may be engaged with each other to rotate.
  • the first roller 11 is provided so that at least its surface rotates with a first hardness.
  • the first roller 11 may be formed of a metal since at least an outer surface thereof is provided to have electrical conductivity.
  • the entire first roller 11 is not necessarily formed of metal, but the body may be formed of a plastic material and only the surface of the body may have electrical conductivity.
  • the first roller 11 may be electrically connected to the power unit 3, and the power unit 3 may apply cathode power to the first roller 11.
  • the first roller 11 is in contact with the surface of one side of the plated material 5 to form a contact with the surface of one side of the plated material 5.
  • the second roller 12 has a second hardness whose surface is smaller than the first hardness.
  • the second roller 12 is in contact with the other surface of the plated material (5).
  • the other side surface of the to-be-plated material 5 becomes the surface opposite to the surface which the 1st roller 11 contact
  • the surface of the second roller 12 has a hardness that is smaller than that of the first roller 11, the curved surface of one side of the plated material 5 forming a contact with the first roller 11 is present.
  • the contact point of the 1st roller 11 and the to-be-plated material 5 can be made uniform. Detailed description thereof will be described later.
  • a drive unit 4 may be further connected to the second roller 12, which may drive the second roller 12 in rotation. Accordingly, the progress of the plated material 5 may be promoted by the rotation of the second roller 12.
  • the present invention is not limited thereto, and the first roller 11 and / or the second roller 12 may be freely rotatable without a separate driving means to rotate in accordance with the progress of the plated material 5. .
  • the caustic line connecting the rotating shaft of the first roller 11 and the rotating shaft of the second roller 12 may be perpendicular to the advancing direction of the plated material 5. Accordingly, contact failures at the contacts of the plated material 5 and the first roller 11 can be further reduced.
  • the radius R2 of the second roller 12 may be equal to or larger than the radius R1 of the first roller 11.
  • the radius R2 of the second roller 12 is greater than or equal to the radius R1 of the first roller 11, the effect of improving contact failure between the plated material 5 and the first roller 11 may be further improved.
  • the second roller 12 may be formed even when the surface of the plated material 5 is curved as described later. Is equal to or larger than the radius R1 of the first roller 11 so that the degree of bending of the surface of the plated material 5 can be sufficiently absorbed by the at least surface of the second roller 12. can do.
  • the second roller 12 may be formed of a flexible material at least outside. Accordingly, as described above, at least the surface of the second roller 12 can sufficiently absorb the degree of bending of the surface of the plated material 5.
  • the second roller 12 may be provided with at least the outer side of the electrically insulating material. Since the surface on which the plated material 5 is plated becomes a surface in contact with the first roller 11, the second roller 12 in contact with the back surface has electrical insulation so that the second roller 12 It is possible to prevent the first roller 11 from becoming an obstacle to the electrolytic plating.
  • At least the outer side of the second roller 12 may be formed of a polymer-based material, but is not limited thereto, and may be formed of a flexible material that can absorb shocks such as rubber.
  • the second roller 12 may be entirely formed of a single material, but is not necessarily limited thereto. As shown in FIG. 3, the second roller 12 may be formed of the first rolling member 121 and the first rolling member 121. It may include a second rolling member 122 located outside. In this case, the second rolling member 122 may be formed of a material having a second hardness.
  • the second roller 12 ′ has a first rolling member 121 connected at both ends thereof to the shaft 120, and is positioned outside the first rolling member 121 and has the above-described second rigidity.
  • the second rolling member 122 is provided with a flexible material.
  • the first rolling member 121 extends in the axial direction X and may be provided on a hollow pipe.
  • the first rolling member 121 may be provided with a metal or hard plastic material, and the shaft 120 is coupled to both ends.
  • the shaft 120 may be integrally formed with the first rolling member 121.
  • the second rolling member 122 extends in the axial direction X to cover the surface of the first rolling member 121.
  • the second rolling member 122 may be formed of the polymer-based material described above, and may be formed of a rubber material or a soft plastic material.
  • the thickness t2 of the second rolling member 122 is formed to be thicker than the thickness t1 of the first rolling member 121 so that the above-described surface curvature of the plated material 5 may be applied to the second rolling member 122. It can be absorbed.
  • the plated material 5 includes a base member 51 in the form of a film, and a plurality of pads 52 formed on the surface thereof.
  • the plating layer is formed at the contact between the pad 52 and the first roller 11.
  • the base member 51 may be a polymer film such as a polyimide film, and the pad 52 may be formed of an electrically conductive metal, and may be formed by printing or the like.
  • the first roller 11 is in contact with the pad 52, the second roller 12 is preferably located on the opposite side of the pad (52).
  • FIG. 5 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
  • the second roller 12 has a first roller 11 with respect to the advancing direction of the plated material 5. It may be provided to be located in front of the). The rotation of the second roller 12 may take the form of pressing the plated material 5 in the direction of the first roller 11, and thus the contact between the first roller 11 and the plated material 5. Defects can be prevented. 5 may also have a second roller 12 ′ as shown in FIG. 2.
  • the cathode roller assembly 1 (1 ′) can be applied to an electrolytic plating apparatus.
  • FIG. 6 is a configuration diagram schematically showing an example of such a plating apparatus.
  • At least one cathode roller assembly 1 is located in the plating bath 6 in which the plating liquid is accommodated, and the anode plate 21 is positioned so as to face the cathode roller assembly 1.
  • the plated material transfer unit 7 for transferring the plated material 5 is located inside and / or outside the plating bath 6.
  • the plated material conveying unit 7 includes a plurality of support rollers 71 for supporting the plated material 5.
  • the support rollers 71 are provided at least at positions where the traveling direction of the plated material 5 is changed to allow the plated material 5 to pass through the plating bath 6.
  • At least one cathode roller assembly 1 is disposed in the plating bath 6, and the cathode roller assembly 1 includes a first roller 11 and a second roller 12 adjacent to each other. Description of each of the first roller 11 and the second roller 12 is the same as the above-described embodiment.
  • the plurality of first rollers 11 and the second rollers 12 are each provided, and the plurality of first rollers 11 are all in the same direction and have a plurality of second rollers. 12 are all located in the same direction.
  • FIG. 6 although the power unit connected to the first roller 11 and the driving unit connected to the second roller 12 are omitted, the structures of FIGS. 1 to 5 may be applied.
  • An anode plate 21 may be located in the plating bath 6 so as to face the cathode roller assembly 1.
  • An anode power supply unit (not shown) is electrically connected to the anode plate 21 so that anode power is applied.
  • the plating apparatus as described above, it is possible to prevent a contact failure and to form a uniform plating layer on one surface of the plated material (5).
  • the cathode roller assembly 1 ′ shown in FIG. 5 may also be applied.
  • FIG. 7 is a configuration diagram schematically showing another example of the plating apparatus of the present invention.
  • the plated material 5 crosses the first roller 11 and the second roller 12 in the plating bath 6.
  • the plurality of second rollers 12 are alternately positioned at the top and the bottom with respect to each of the first rollers 11.
  • the anode plate 21 is also disposed on both the top and bottom of the cathode roller assembly (1).
  • the power unit connected to the first roller 11 and the driving unit connected to the second roller 12 are omitted, but the structures of FIGS. 1 to 3 may be applied.
  • the cathode roller assembly 1 ′ shown in FIG. 5 may also be applied.
  • cathode roller assembly 1 (1 ′) as shown in FIGS. 1 and 5 may also be applied to a spot plating apparatus.
  • FIG. 8 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
  • the embodiment shown in FIG. 8 further includes a plating liquid injection unit 22 adjacent to the first roller 11 in addition to the embodiment shown in FIG. 1.
  • the plating liquid injection unit 22 injects a plating liquid containing anode ions to a contact point between the plated material 5 and the first roller 11 and / or an adjacent portion thereof. This allows local plating to proceed.
  • only one cathode roller assembly 1 is provided, but is not limited thereto, and a plurality of cathode roller assemblies 1 and / or a plating liquid injection unit 22 may be provided. to be.
  • FIG. 9 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
  • a plurality of first rollers 11 are arranged in a circle to rotate the circle, and a plurality of second rollers 12 are disposed on at least a portion of the circle.
  • the plurality of second rollers 12 may be arranged to form a semi-circle on an outer side of the circle of the first roller 11.
  • a support roller 71 is disposed outside the second roller 12 to support the transfer of the plated material 5.
  • the plated material is disposed to pass between the circle of the first roller 11 and the semi-circle of the second roller 12 to perform a plating process. In the case of such a plating apparatus, the plating efficiency can be further increased in a relatively narrow space.
  • FIG. 10 shows a state when plating is performed according to the cathode assembly of the embodiment shown in FIGS. 1 and 5.
  • the plated material 5 includes a base member 51 in the form of a film and a plurality of pads 52 formed on the surface thereof.
  • the first roller 11 is brought into contact with another pad 52 ′ where the plating layer of the plated material 5, in which the plating layer 53 is already formed on some pads 52, is not formed.
  • the back surface of the base member 51 is supported by the second roller 12 having a hardness smaller than that of the first roller 11, that is, made of a flexible material.
  • Contact failure between the pad 52 'and the first roller 11 is no longer generated. This is possible because the second roller 12 can sufficiently absorb the bending of the surface of the plated material 5, that is, the surface of the plated material 5 toward the first roller 11.
  • the above effects may be useful when the plating layers are formed in the pads 52 and 52 ′ in a different order, but are not necessarily limited thereto.
  • pads 52 having the same thickness are formed on the base member 51, and plating layers 53a, 53b, 53c, and 53d having different thicknesses are formed on the pads 52. ) May also be applied to the plated material 5 '.
  • the pads 52a, 52b, 52c, and 52d having different thicknesses may be applied to the base member 51.
  • the plated material 5 ′′ shown in FIG. 12 may be applied not only to the spot plating described above but also to the case where a plating layer is simultaneously formed on all of the pads 52a, 52b, 52c, and 52d. Since the thicknesses of the pads 52a, 52b, 52c, and 52d vary, the second roller 12 absorbs the thickness variation sufficiently, so that the pads 52a, 52b, 52c, and 52d. ) Can make good contact with the first roller (11).
  • 10 to 12 illustrate only the case where the plated layer is formed on one surface of the plated material 5, but the same may be applied to the case where the plated layer is formed on both surfaces of the plated material 5.
  • Embodiments of the present invention can be applied to various electronic products.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The present invention relates to a cathode roller assembly and a plating apparatus, the cathode roller assembly comprising: a first roller for coming into contact with one surface of an object to be plated, the first roller being disposed so as to rotate with a surface hardness of at least first hardness and having at least the outer surface which is electrically conductive; and a second roller for coming into contact with the other surface of the object to be plated, the second roller having a surface hardness of second hardness which is lower than the first hardness, and disposed facing the first roller so that the object to be plated passes through therebetween and so as to rotate by engaging with the first roller.

Description

캐소드 롤러 조립체 및 도금 장치Cathode roller assembly and plating apparatus
캐소드 롤러 조립체 및 도금 장치에 관한 것이다.It relates to a cathode roller assembly and a plating apparatus.
인쇄회로기판, 리드 프레임 및 LED 소자 등 각종 전자 장치 및/또는 부품에서는 도금 방법을 사용하여 도전성 패턴 형성한다.Various electronic devices and / or components, such as a printed circuit board, a lead frame, and an LED element, use a plating method to form conductive patterns.
이러한 도금 방법에서는 캐소드 전원이 인가되는 캐소드 롤러가 사용된다. 이러한 캐소드 롤러의 표면은 전기 전도성을 띠고, 표면 경도가 일정 수준 이상으로 높은 금속으로 구비되어 있다. 따라서 캐소드 롤러는 피도금재의 표면에 굴곡이 있을 경우 피도금재의 표면과 접점 불량을 일으키기 쉽다.In this plating method, a cathode roller to which a cathode power source is applied is used. The surface of the cathode roller is electrically conductive, the surface hardness of the metal is provided with a certain level or more. Therefore, the cathode roller is likely to cause a bad contact with the surface of the plated material when the surface of the plated material is bent.
예컨대, 도 1의 (a)에서 볼 수 있듯이, 서로 다른 길이를 갖는 제1도전 패턴(521) 내지 제3도전 패턴(523)을 갖는 베이스 필름(510)이, 연속하여 배치되어 있는 제1캐소드 롤러(101) 내지 제3캐소드 롤러(103)를 통과하면서 도금이 진행되는 경우, 제1도전 패턴들(521)이 제1캐소드 롤러(101)와 먼저 접촉하면서 제1도금층(531)이 형성된다(b). 다음으로 제1도전 패턴들(521) 및 제2도전 패턴들(522)이 제2캐소드 롤러(102)와 접촉하면서 제2도금층(532)이 형성되고 제1도금층(531)은 더욱 두꺼워진다(c). 이 후 제1도전 패턴들(521), 제2도전 패턴들(522) 및 제3도전 패턴(523)이 제3캐소드 롤러(103)와 접촉하면서 제3도금층(533)이 형성되고 제1도금층(531) 및 제2도금층(532)은 더욱 두꺼워진다.For example, as shown in FIG. 1A, the first cathode in which the base films 510 having the first conductive pattern 521 to the third conductive pattern 523 having different lengths are continuously arranged is provided. When plating proceeds while passing through the rollers 101 to the third cathode roller 103, the first plating patterns 521 are first contacted with the first cathode roller 101 to form a first plating layer 531. (b). Next, as the first conductive patterns 521 and the second conductive patterns 522 contact the second cathode roller 102, a second plating layer 532 is formed and the first plating layer 531 becomes thicker ( c). Thereafter, the first conductive patterns 521, the second conductive patterns 522, and the third conductive pattern 523 are in contact with the third cathode roller 103 to form a third plating layer 533, and the first plating layer. 531 and the second plating layer 532 become thicker.
이처럼 도금이 진행됨에 따라 제1도금층(531) 내지 제3도금층(533)의 두께 편차가 발생하여 도전 패턴들과 캐소드 롤러들 사이의 접점 불량을 일으킬 소지가 높다.이러한 문제는 특히, 스팟(spot) 도금과 같이 피도금재의 일부분에 국부적으로 도금층을 형성시켜야 하는 경우에는 피도금재의 표면에 형성되어 있는 도전 패턴들에 의해 표면 굴곡이 발생되기 때문에 전술한 접점 불량이 발생되기에 충분한 환경이 마련될 수 있다.As the plating progresses as described above, thickness variation of the first plating layer 531 to the third plating layer 533 may occur, which may cause a bad contact between the conductive patterns and the cathode rollers. In the case where the plating layer is to be locally formed on a part of the plated material, such as plating, surface bending occurs due to the conductive patterns formed on the surface of the plated material, so that an environment sufficient for the above-described contact failure may be provided. Can be.
종래기술의 문제 및/또는 한계를 극복하기 위한 것으로, 본 발명의 일 측면에 따른 목적은 피도금재와의 접점이 균일하게 이뤄지도록 하고, 도금층의 두께 편차가 최소화될 수 있도록 할 수 있는 캐소드 롤러 조립체 및 도금 장치를 제공하기 위한 것이다.In order to overcome the problems and / or limitations of the prior art, an object according to an aspect of the present invention is to ensure that the contact with the plated material is made uniform, and that the thickness variation of the plating layer can be minimized To provide an assembly and a plating apparatus.
본 발명의 일 측면에 따르면, 적어도 표면이 제1경도를 갖고 회전하도록 구비되며 적어도 외면이 전기 전도성을 갖도록 구비되고 피도금재의 일면과 접촉되는 제1롤러와, 적어도 표면이 상기 제1경도보다 작은 제2경도를 갖고, 상기 제1롤러와의 사이로 상기 피도금재가 통과되도록 상기 제1롤러와 대향되게 배치되며, 상기 제1롤러와 맞물려 회전하도록 구비되고, 상기 피도금재의 타면과 접촉되는 제2롤러를 포함하는 캐소드 롤러 조립체를 제공한다.According to one aspect of the invention, at least the surface is provided to rotate with a first hardness and at least the outer surface is provided with an electrical conductivity and is in contact with one surface of the plated material, and at least the surface is smaller than the first hardness A second hardness having a second hardness, disposed to face the first roller so that the plated material passes between the first roller, and being provided to rotate in engagement with the first roller, the second plate being in contact with the other surface of the plated material It provides a cathode roller assembly comprising a roller.
본 발명의 다른 특징에 의하면, 상기 제1롤러의 회전축과 상기 제2롤러의 회전축을 연결한 가상선과 상기 피도금재의 진행 방향과 이루는 각이 직각일 수 있다.According to another feature of the invention, the angle between the virtual line connecting the rotation axis of the first roller and the rotation axis of the second roller and the advancing direction of the plated material may be at right angles.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는 상기 피도금재의 진행 방향에 대하여 상기 제1롤러보다 전방에 위치하도록 구비될 수 있다.According to another feature of the invention, the second roller may be provided to be located ahead of the first roller with respect to the traveling direction of the plated material.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러의 반경은 상기 제1롤러의 반경보다 클 수 있다.According to another feature of the invention, the radius of the second roller may be larger than the radius of the first roller.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는 적어도 외측이 유연한 재질로 구비될 수 있다.According to another feature of the invention, the second roller may be provided with a flexible material at least on the outside.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는, 제1롤링 부재와, 상기 제1롤링 부재 외측에 위치하고 상기 제2경도를 갖는 제2롤링부재를 포함할 수 있다.According to another feature of the present invention, the second roller may include a first rolling member and a second rolling member positioned outside the first rolling member and having the second hardness.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는 적어도 외측이 전기 절연성 재질로 구비될 수 있다.According to another feature of the invention, the second roller may be provided with at least an outer electrically insulating material.
본 발명의 다른 일 측면에 따르면, 적어도 표면이 제1경도를 갖고 회전하도록 구비되며 적어도 외면이 전기 전도성을 갖도록 구비되고 피도금재의 일면과 접촉되는 제1롤러와, 적어도 표면이 상기 제1경도보다 작은 제2경도를 갖고, 상기 제1롤러와의 사이로 상기 피도금재가 통과되도록 상기 제1롤러와 대향되게 배치되며, 상기 제1롤러와 맞물려 회전하도록 구비되고, 상기 피도금재의 타면과 접촉되는 제2롤러와, 상기 제1롤러에 전기적으로 연결되고 상기 제1롤러에 캐소드 전원을 인가하는 전원 유닛을 포함하는 도금 장치가 제공된다.According to another aspect of the invention, at least the surface is provided to rotate with a first hardness and at least the outer surface is provided with an electrical conductivity and the first roller in contact with one surface of the plated material, and at least the surface is greater than the first hardness A second second hardness having a small second hardness and disposed to face the first roller so that the plated material passes between the first roller and the first roller, the second roller being rotated in engagement with the first roller and being in contact with the other surface of the plated material. A plating apparatus including a two roller and a power unit electrically connected to the first roller and applying a cathode power to the first roller is provided.
본 발명의 다른 특징에 의하면, 상기 제1롤러의 회전축과 상기 제2롤러의 회전축을 연결한 가상선과 상기 피도금재의 진행 방향과 이루는 각이 직각일 수 있다.According to another feature of the invention, the angle between the virtual line connecting the rotation axis of the first roller and the rotation axis of the second roller and the advancing direction of the plated material may be at right angles.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는 상기 피도금재의 진행 방향에 대하여 상기 제1롤러보다 전방에 위치하도록 구비될 수 있다.According to another feature of the invention, the second roller may be provided to be located ahead of the first roller with respect to the traveling direction of the plated material.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러의 반경은 상기 제1롤러의 반경보다 클 수 있다.According to another feature of the invention, the radius of the second roller may be larger than the radius of the first roller.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는 적어도 외측이 유연한 재질로 구비될 수 있다.According to another feature of the invention, the second roller may be provided with a flexible material at least on the outside.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는, 제1롤링 부재와, 상기 제1롤링 부재 외측에 위치하고 상기 제2경도를 갖는 제2롤링부재를 포함할 수 있다.According to another feature of the present invention, the second roller may include a first rolling member and a second rolling member positioned outside the first rolling member and having the second hardness.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러는 적어도 외측이 전기 절연성 재질로 구비될 수 있다.According to another feature of the invention, the second roller may be provided with at least an outer electrically insulating material.
본 발명의 또 다른 특징에 의하면, 상기 제2롤러를 회전시키도록 상기 제2롤러에 연결된 구동 유닛을 더 포함할 수 있다.According to another feature of the invention, it may further include a drive unit connected to the second roller to rotate the second roller.
캐소드 롤러와 피도금재와의 접점 불량을 줄일 수 있다.Contact failure between the cathode roller and the plated material can be reduced.
스팟 도금에 유용할 수 있다.It may be useful for spot plating.
도 1은 종래 도금 방법의 문제를 개략적으로 도시한 도면이다.1 is a view schematically showing a problem of the conventional plating method.
도 2는 본 발명의 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다.2 is a configuration diagram schematically showing a part of a plating apparatus according to an embodiment of the present invention.
도 3은 제2롤러의 다른 일 실시예를 도시한 단면도이다.3 is a cross-sectional view showing another embodiment of the second roller.
도 4는 제1롤러와 제2롤러의 피도금재와의 접한 상태를 보다 구체적으로 도시한 단면도이다.4 is a cross-sectional view illustrating in more detail a state in which the first roller and the second roller are in contact with the plated material.
도 5는 본 발명의 다른 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다.5 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
도 6은 본 발명의 또 다른 일 실시예에 따른 도금 장치를 개략적으로 도시한 구성도이다.6 is a configuration diagram schematically showing a plating apparatus according to another embodiment of the present invention.
도 7은 본 발명의 또 다른 일 실시예에 따른 도금 장치를 개략적으로 도시한 구성도이다.7 is a configuration diagram schematically showing a plating apparatus according to another embodiment of the present invention.
도 8은 본 발명의 또 다른 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다.8 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
도 9는 본 발명의 또 다른 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다.9 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
도 10은 본 발명의 실시예에 따라 도금이 행해질 때의 상태를 도시한 일부 단면도이다.10 is a partial cross-sectional view showing a state when plating is performed according to an embodiment of the present invention.
도 11은 피도금재의 다른 일 예를 도시한 단면도이다.11 is a sectional view showing another example of the plated material.
도 12는 피도금재의 또 다른 일 예를 도시한 단면도이다.12 is a cross-sectional view showing still another example of the plated material.
이하, 첨부된 도면을 참조로 본 발명의 실시예들에 대하여 보다 상세히 설명한다. Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 2는 본 발명의 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다. 도 2에 도시된 실시예의 도금 장치는 제1롤러(11) 및 제2롤러(12)를 포함하는 캐소드 롤러 조립체(1)를 포함한다.2 is a configuration diagram schematically showing a part of a plating apparatus according to an embodiment of the present invention. The plating apparatus of the embodiment shown in FIG. 2 comprises a cathode roller assembly 1 comprising a first roller 11 and a second roller 12.
상기 제1롤러(11)와 제2롤러(12)는 그 사이로 피도금재(5)가 통과되도록 서로 대향되고 인접하게 배치된다. 상기 제1롤러(11)와 제2롤러(12)는 서로 맞물려 회전할 수 있다. The first roller 11 and the second roller 12 are disposed opposite and adjacent to each other so that the plated material 5 passes therebetween. The first roller 11 and the second roller 12 may be engaged with each other to rotate.
상기 제1롤러(11)는 적어도 그 표면이 제1경도를 갖고 회전하도록 구비된다. 상기 제1롤러(11)는 적어도 외면이 전기 전도성을 갖도록 구비되므로, 금속으로 형성될 수 있다. 상기 제1롤러(11) 전체가 반드시 금속으로 형성되어야 하는 것은 아니고, 본체가 플라스틱 재질로 형성되고 본체의 표면만이 전기 전도성을 갖도록 할 수 있다. The first roller 11 is provided so that at least its surface rotates with a first hardness. The first roller 11 may be formed of a metal since at least an outer surface thereof is provided to have electrical conductivity. The entire first roller 11 is not necessarily formed of metal, but the body may be formed of a plastic material and only the surface of the body may have electrical conductivity.
상기 제1롤러(11)는 전원 유닛(3)에 전기적으로 연결되고, 상기 전원 유닛(3)은 상기 제1롤러(11)에 캐소드 전원을 인가될 수 있다. The first roller 11 may be electrically connected to the power unit 3, and the power unit 3 may apply cathode power to the first roller 11.
상기 제1롤러(11)는 피도금재(5)의 일측 표면에 접하여, 피도금재(5)의 일측 표면과 접점을 형성하게 된다.The first roller 11 is in contact with the surface of one side of the plated material 5 to form a contact with the surface of one side of the plated material 5.
상기 제2롤러(12)는 적어도 표면이 상기 제1경도보다 작은 제2경도를 갖는다. 상기 제2롤러(12)는 상기 피도금재(5)의 타측 표면에 접한다. 상기 피도금재(5)의 타측 표면은 제1롤러(11)가 접하는 표면의 반대측 면이 된다.The second roller 12 has a second hardness whose surface is smaller than the first hardness. The second roller 12 is in contact with the other surface of the plated material (5). The other side surface of the to-be-plated material 5 becomes the surface opposite to the surface which the 1st roller 11 contact | connects.
이렇게 제2롤러(12)의 표면이 제1롤러(11)의 표면보다 작은 경도를 갖도록 함으로써 제1롤러(11)와 접점을 형성하게 되는 피도금재(5)의 일측 표면에 굴곡이 있는 경우에도, 제1롤러(11)와 피도금재(5)와의 접점이 균일하게 형성되도록 할 수 있다. 이에 대한 상세한 설명은 후술한다.When the surface of the second roller 12 has a hardness that is smaller than that of the first roller 11, the curved surface of one side of the plated material 5 forming a contact with the first roller 11 is present. In addition, the contact point of the 1st roller 11 and the to-be-plated material 5 can be made uniform. Detailed description thereof will be described later.
상기 제2롤러(12)에는 구동 유닛(4)이 더 연결될 수 있는 데, 이 구동 유닛(4)은 제2롤러(12)를 회전 구동시킬 수 있다. 이에 따라 제2롤러(12)의 회전에 의해 피도금재(5)의 진행이 촉진될 수 있다. 그러나 반드시 이에 한정되는 것은 아니고, 제1롤러(11) 및/또는 제2롤러(12)는 별도의 구동 수단 없이 자유 회전 가능하게 구비되어 피도금재(5)의 진행에 맞추어 회전하도록 할 수 있다.A drive unit 4 may be further connected to the second roller 12, which may drive the second roller 12 in rotation. Accordingly, the progress of the plated material 5 may be promoted by the rotation of the second roller 12. However, the present invention is not limited thereto, and the first roller 11 and / or the second roller 12 may be freely rotatable without a separate driving means to rotate in accordance with the progress of the plated material 5. .
상기와 같은 롤러 조립체(1)에서 제1롤러(11)의 회전축과 제2롤러(12)의 회전축을 연결한 가성선은 상기 피도금재(5)의 진행 방향과 직각을 이룰 수 있다. 이에 따라 피도금재(5)와 제1롤러(11)의 접점에서 접점 불량을 더욱 줄일 수 있다.In the roller assembly 1 as described above, the caustic line connecting the rotating shaft of the first roller 11 and the rotating shaft of the second roller 12 may be perpendicular to the advancing direction of the plated material 5. Accordingly, contact failures at the contacts of the plated material 5 and the first roller 11 can be further reduced.
상기 제2롤러(12)의 반경(R2)은 제1롤러(11)의 반경(R1)과 같거나 크도록 할 수 있다. 제2롤러(12)의 반경(R2)이 제1롤러(11)의 반경(R1) 이상일 경우 피도금재(5)와 제1롤러(11)의 접점 불량 개선 효과를 더욱 높일 수 있다. 제2롤러(12)의 적어도 표면 경도가 제1롤러(11)의 적어도 표면 경도보다 작기 때문에 후술하는 바와 같이 피도금재(5)의 표면에 굴곡이 있는 경우에라도, 상기 제2롤러(12)의 반경(R2)을 제1롤러(11)의 반경(R1)과 같거나 크게 함으로써 상기 피도금재(5) 표면의 굴곡의 정도를 제2롤러(12)의 적어도 표면이 충분히 흡수할 수 있도록 할 수 있다.The radius R2 of the second roller 12 may be equal to or larger than the radius R1 of the first roller 11. When the radius R2 of the second roller 12 is greater than or equal to the radius R1 of the first roller 11, the effect of improving contact failure between the plated material 5 and the first roller 11 may be further improved. Since at least the surface hardness of the second roller 12 is smaller than at least the surface hardness of the first roller 11, the second roller 12 may be formed even when the surface of the plated material 5 is curved as described later. Is equal to or larger than the radius R1 of the first roller 11 so that the degree of bending of the surface of the plated material 5 can be sufficiently absorbed by the at least surface of the second roller 12. can do.
상기 제2롤러(12)는 적어도 외측이 유연한 재질로 형성될 수 있다. 이에 따라 전술한 바와 같이 상기 피도금재(5) 표면의 굴곡의 정도를 제2롤러(12)의 적어도 표면이 충분히 흡수할 수 있도록 할 수 있다. The second roller 12 may be formed of a flexible material at least outside. Accordingly, as described above, at least the surface of the second roller 12 can sufficiently absorb the degree of bending of the surface of the plated material 5.
또한 상기 제2롤러(12)는 적어도 외측이 전기 절연성 재질로 구비될 수 있다. 상기 피도금재(5)에 도금이 이뤄지는 표면은 상기 제1롤러(11)와 접하는 면이 되므로, 그 배면에 접하는 제2롤러(12)는 전기 절연성을 갖도록 하여 상기 제2롤러(12)가 제1롤러(11)에 의한 전해 도금에 대한 방해 요소가 되지 않도록 할 수 있다.In addition, the second roller 12 may be provided with at least the outer side of the electrically insulating material. Since the surface on which the plated material 5 is plated becomes a surface in contact with the first roller 11, the second roller 12 in contact with the back surface has electrical insulation so that the second roller 12 It is possible to prevent the first roller 11 from becoming an obstacle to the electrolytic plating.
이를 위해 상기 제2롤러(12)의 적어도 외측은 폴리머 계열의 물질로 형성될 수 있는 데, 반드시 이에 한정되는 것은 아니고 고무와 같이 충격을 흡수할 수 있는 유연한 재질로 형성될 수 있다.To this end, at least the outer side of the second roller 12 may be formed of a polymer-based material, but is not limited thereto, and may be formed of a flexible material that can absorb shocks such as rubber.
상기 제2롤러(12)는 전체가 단일 소재로 형성될 수 있는 데, 반드시 이에 한정되는 것은 아니고, 도 3에서 볼 수 있듯이, 제1롤링 부재(121)와 상기 제1롤링 부재(121)의 외측에 위치하는 제2롤링 부재(122)를 포함할 수 있다. 이 때, 상기 제2롤링 부재(122)가 제2경도를 갖는 물질로 형성될 수 있다.The second roller 12 may be entirely formed of a single material, but is not necessarily limited thereto. As shown in FIG. 3, the second roller 12 may be formed of the first rolling member 121 and the first rolling member 121. It may include a second rolling member 122 located outside. In this case, the second rolling member 122 may be formed of a material having a second hardness.
도 3에서 볼 수 있는 제2롤러(12')는, 양단이 축(120)과 연결된 제1롤링 부재(121)와, 상기 제1롤링 부재(121) 외측에 위치하고 전술한 제2강성을 갖는 유연한 재질로 구비된 제2롤링 부재(122)를 포함한다.As shown in FIG. 3, the second roller 12 ′ has a first rolling member 121 connected at both ends thereof to the shaft 120, and is positioned outside the first rolling member 121 and has the above-described second rigidity. The second rolling member 122 is provided with a flexible material.
상기 제1롤링 부재(121)는 축 방향(X)으로 연장되어 있고, 중공의 파이프 상으로 구비될 수 있다. 상기 제1롤링 부재(121)는 금속 또는 경질 플라스틱재로 구비될 수 있는 데, 양단에 축(120)이 결합된다. 상기 축(120)은 상기 제1롤링 부재(121)와 일체로 형성될 수 있다.The first rolling member 121 extends in the axial direction X and may be provided on a hollow pipe. The first rolling member 121 may be provided with a metal or hard plastic material, and the shaft 120 is coupled to both ends. The shaft 120 may be integrally formed with the first rolling member 121.
상기 제2롤링 부재(122)는 축 방향(X)으로 연장되어 상기 제1롤링 부재(121)의 표면을 덮도록 구비된다. 상기 제2롤링 부재(122)는 전술한 폴리머 계열의 물질로 형성될 수 있는 데, 고무재나 연질 플라스틱재로 구비될 수 있다.The second rolling member 122 extends in the axial direction X to cover the surface of the first rolling member 121. The second rolling member 122 may be formed of the polymer-based material described above, and may be formed of a rubber material or a soft plastic material.
상기 제2롤링 부재(122)의 두께(t2)는 제1롤링 부재(121)의 두께(t1)보다 두껍게 형성함으로써 전술한 피도금재(5)의 표면 굴곡을 제2롤링 부재(122)가 흡수할 수 있도록 할 수 있다.The thickness t2 of the second rolling member 122 is formed to be thicker than the thickness t1 of the first rolling member 121 so that the above-described surface curvature of the plated material 5 may be applied to the second rolling member 122. It can be absorbed.
도 4에서 볼 수 있듯이, 상기 피도금재(5)는 필름 형태의 베이스 부재(51)와, 그 표면에 형성된 복수의 패드(52)를 포함한다. 이 패드(52)와 제1롤러(11)와의 접점에서 도금층이 형성된다. 상기 베이스 부재(51)는 폴리 이미드 필름과 같은 폴리머 필름일 수 있고, 상기 패드(52)는 전기 전도성 금속으로 형성될 수 있는 데, 프린팅 등의 방법으로 형성될 수 있다. 이 때, 상기 제1롤러(11)는 패드(52)에 접하며, 상기 제2롤러(12)는 패드(52)의 반대편에 위치하는 것이 바람직하다.As can be seen in Figure 4, the plated material 5 includes a base member 51 in the form of a film, and a plurality of pads 52 formed on the surface thereof. The plating layer is formed at the contact between the pad 52 and the first roller 11. The base member 51 may be a polymer film such as a polyimide film, and the pad 52 may be formed of an electrically conductive metal, and may be formed by printing or the like. At this time, the first roller 11 is in contact with the pad 52, the second roller 12 is preferably located on the opposite side of the pad (52).
도 5는 본 발명의 다른 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다.5 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
도 5에 도시된 실시예의 캐소드 롤러 조립체(1')는, 도 1에 도시된 실시예와 달리, 상기 제2롤러(12)가 피도금재(5)의 진행 방향에 대하여 제1롤러(11)보다 전방에 위치하도록 구비될 수 있다. 제2롤러(12)의 회전이 피도금재(5)를 제1롤러(11)의 방향으로 압박하는 형태를 띨 수 있고, 이에 따라 제1롤러(11)와 피도금재(5)와의 접점 불량을 방지할 수 있다. 도 5에 도시된 실시예도 도 2에 도시된 바와 같은 제2롤러(12')를 구비할 수 있음은 물론이다.In the cathode roller assembly 1 ′ of the embodiment shown in FIG. 5, unlike the embodiment shown in FIG. 1, the second roller 12 has a first roller 11 with respect to the advancing direction of the plated material 5. It may be provided to be located in front of the). The rotation of the second roller 12 may take the form of pressing the plated material 5 in the direction of the first roller 11, and thus the contact between the first roller 11 and the plated material 5. Defects can be prevented. 5 may also have a second roller 12 ′ as shown in FIG. 2.
도 1 및 도 5에 도시된 실시예에서 캐소드 롤러 조립체(1)(1')는 전해 도금 장치에 적용될 수 있다. In the embodiment shown in FIGS. 1 and 5, the cathode roller assembly 1 (1 ′) can be applied to an electrolytic plating apparatus.
도 6은 이러한 도금 장치의 일 예를 개략적으로 도시한 구성도이다.6 is a configuration diagram schematically showing an example of such a plating apparatus.
도 6을 참조하면, 도금액이 수용된 도금조(6) 내에 적어도 하나 이상의 캐소드 롤러 조립체(1)가 위치하고, 상기 캐소드 롤러 조립체(1)에 대향되도록 애노드 플레이트(21)가 위치한다.Referring to FIG. 6, at least one cathode roller assembly 1 is located in the plating bath 6 in which the plating liquid is accommodated, and the anode plate 21 is positioned so as to face the cathode roller assembly 1.
상기 도금조(6)의 내부 및/또는 외부에는 피도금재(5)를 이송하는 피도금재 이송부(7)가 위치한다. 상기 피도금재 이송부(7)는 상기 피도금재(5)를 지지하는 복수의 지지 롤러(71)를 포함한다. 상기 지지 롤러(71)들은 적어도 상기 피도금재(5)의 진행 방향이 바뀌는 위치에 구비되어 상기 피도금재(5)가 상기 도금조(6)를 통과하도록 한다.The plated material transfer unit 7 for transferring the plated material 5 is located inside and / or outside the plating bath 6. The plated material conveying unit 7 includes a plurality of support rollers 71 for supporting the plated material 5. The support rollers 71 are provided at least at positions where the traveling direction of the plated material 5 is changed to allow the plated material 5 to pass through the plating bath 6.
상기 도금조(6) 내부에는 적어도 하나 이상의 캐소드 롤러 조립체(1)가 배치되며, 이 캐소드 롤러 조립체(1)는 서로 인접한 제1롤러(11) 및 제2롤러(12)를 포함한다. 상기 제1롤러(11) 및 제2롤러(12) 각각에 대한 설명은 전술한 실시예와 같다.At least one cathode roller assembly 1 is disposed in the plating bath 6, and the cathode roller assembly 1 includes a first roller 11 and a second roller 12 adjacent to each other. Description of each of the first roller 11 and the second roller 12 is the same as the above-described embodiment.
도 6에 도시된 실시예에 따르면, 상기 제1롤러(11)와 제2롤러(12)는 각각 복수 개 구비되고, 복수 개의 제1롤러(11)들은 모두 동일한 방향에, 복수 개의 제2롤러(12)들은 모두 동일한 방향에 위치한다.According to the embodiment shown in FIG. 6, the plurality of first rollers 11 and the second rollers 12 are each provided, and the plurality of first rollers 11 are all in the same direction and have a plurality of second rollers. 12 are all located in the same direction.
도 6에는 제1롤러(11)에 연결되는 전원 유닛 및 제2롤러(12)에 연결되는 구동 유닛의 도시는 생략하였으나, 도 1 내지 도 5의 구조가 적용될 수 있을 것임은 물론이다.In FIG. 6, although the power unit connected to the first roller 11 and the driving unit connected to the second roller 12 are omitted, the structures of FIGS. 1 to 5 may be applied.
상기 도금조(6) 내에는 캐소드 롤러 조립체(1)에 대향되도록 애노드 플레이트(21)가 위치할 수 있다. 상기 애노드 플레이트(21)에는 애노드 전원 유닛(미도시)이 전기적으로 연결되어 애노드 전원이 인가되도록 한다.An anode plate 21 may be located in the plating bath 6 so as to face the cathode roller assembly 1. An anode power supply unit (not shown) is electrically connected to the anode plate 21 so that anode power is applied.
상기와 같은 도금 장치에 따르면, 피도금재(5)의 일면에 접점 불량을 방지하고 균일한 도금층을 형성할 수 있다.According to the plating apparatus as described above, it is possible to prevent a contact failure and to form a uniform plating layer on one surface of the plated material (5).
도 6에 도시된 실시예에서는 도 5에 도시된 캐소드 롤러 조립체(1')도 적용될 수 있음은 물론이다.In the embodiment shown in FIG. 6, the cathode roller assembly 1 ′ shown in FIG. 5 may also be applied.
도 7은 본 발명의 도금 장치의 다른 일 예를 개략적으로 도시한 구성도이다.7 is a configuration diagram schematically showing another example of the plating apparatus of the present invention.
도 7을 참조하면, 상기 도금조(6) 내에서 피도금재(5)가 제1롤러(11)와 제2롤러(12)를 서로 엇갈리게 지나게 된다. 이를 위해, 상기 복수 개의 제2롤러(12)를 상기 각각의 제1롤러(11)에 대해 상부와 하부에 교대로 위치하도록 한다. 그리고 애노드 플레이트(21)도 캐소드 롤러 조립체(1)의 상부와 하부에 모두 배치시킨다. 도 5에는 제1롤러(11)에 연결되는 전원 유닛 및 제2롤러(12)에 연결되는 구동 유닛의 도시는 생략하였으나, 도 1 내지 도 3의 구조가 적용될 수 있을 것임은 물론이다.Referring to FIG. 7, the plated material 5 crosses the first roller 11 and the second roller 12 in the plating bath 6. To this end, the plurality of second rollers 12 are alternately positioned at the top and the bottom with respect to each of the first rollers 11. And the anode plate 21 is also disposed on both the top and bottom of the cathode roller assembly (1). In FIG. 5, the power unit connected to the first roller 11 and the driving unit connected to the second roller 12 are omitted, but the structures of FIGS. 1 to 3 may be applied.
상기와 같은 도금 장치에 따르면, 피도금재(5)의 양면에 접점 불량을 방지하고 균일한 도금층을 형성할 수 있다.According to the plating apparatus as described above, it is possible to prevent a defective contact and to form a uniform plating layer on both surfaces of the plated material (5).
도 7에 도시된 실시예에서는 도 5에 도시된 캐소드 롤러 조립체(1')도 적용될 수 있음은 물론이다.In the embodiment shown in FIG. 7, the cathode roller assembly 1 ′ shown in FIG. 5 may also be applied.
한편, 도 1 및 도 5에 도시된 바와 같은 상기 캐소드 롤러 조립체(1)(1')는 스팟(spot) 도금 장치에도 적용될 수 있다.Meanwhile, the cathode roller assembly 1 (1 ′) as shown in FIGS. 1 and 5 may also be applied to a spot plating apparatus.
도 8은 본 발명의 또 다른 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다.8 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
도 8에 도시된 실시예는 도 1에 도시된 실시예에 더하여 상기 제1롤러(11)에 인접하여 도금액 분사 유닛(22)을 더 포함한다. 상기 도금액 분사 유닛(22)은 애노드 이온이 포함된 도금액을 상기 피도금재(5)와 제1롤러(11)와의 접점 및/또는 그 인접부위에 분사한다. 이에 따라 국부적인 도금이 진행되도록 할 수 있다. 도 8에 도시된 실시예에서 캐소드 롤러 조립체(1)가 하나만 구비되어 있으나, 반드시 이에 한정되는 것은 아니고, 캐소드 롤러 조립체(1) 및/또는 도금액 분사 유닛(22)이 복수개 구비될 수 있음은 물론이다.The embodiment shown in FIG. 8 further includes a plating liquid injection unit 22 adjacent to the first roller 11 in addition to the embodiment shown in FIG. 1. The plating liquid injection unit 22 injects a plating liquid containing anode ions to a contact point between the plated material 5 and the first roller 11 and / or an adjacent portion thereof. This allows local plating to proceed. In the embodiment shown in FIG. 8, only one cathode roller assembly 1 is provided, but is not limited thereto, and a plurality of cathode roller assemblies 1 and / or a plating liquid injection unit 22 may be provided. to be.
도 9는 본 발명의 또 다른 일 실시예에 따른 도금 장치의 일 부분을 개략적으로 도시한 구성도이다.9 is a configuration diagram schematically showing a part of a plating apparatus according to another embodiment of the present invention.
도 9를 참조하면, 복수의 제1롤러(11)가 원형으로 배치되어 이 원이 회전하도록 구비되고, 상기 원의 적어도 일부에 복수의 제2롤러(12)가 배치된다. 상기 복수의 제2롤러(12)는 도 9에서 볼 수 있듯이 상기 제1롤러(11)의 원 외측에 반원을 이루도록 대향되게 배치될 수 있다. 제2롤러(12) 외곽으로는 지지 롤러(71)가 배치되어 피도금재(5)의 이송을 지지한다. 상기 피도금재는 제1롤러(11)의 원과 제2롤러(12)의 반원 사이를 지나도록 배치되어 도금 공정을 수행한다. 이러한 도금 장치의 경우 비교적 좁은 공간 내에서 도금 효율을 더욱 높일 수 있다.Referring to FIG. 9, a plurality of first rollers 11 are arranged in a circle to rotate the circle, and a plurality of second rollers 12 are disposed on at least a portion of the circle. As shown in FIG. 9, the plurality of second rollers 12 may be arranged to form a semi-circle on an outer side of the circle of the first roller 11. A support roller 71 is disposed outside the second roller 12 to support the transfer of the plated material 5. The plated material is disposed to pass between the circle of the first roller 11 and the semi-circle of the second roller 12 to perform a plating process. In the case of such a plating apparatus, the plating efficiency can be further increased in a relatively narrow space.
도 10은 도 1 및 도 5에 도시된 실시예의 캐소드 조립체에 따라 도금이 행해질 때의 상태를 도시한 것이다.FIG. 10 shows a state when plating is performed according to the cathode assembly of the embodiment shown in FIGS. 1 and 5.
전술한 바와 같이 상기 피도금재(5)는 필름 형태의 베이스 부재(51)와, 그 표면에 형성된 복수의 패드(52)를 포함한다. As described above, the plated material 5 includes a base member 51 in the form of a film and a plurality of pads 52 formed on the surface thereof.
도 10에서 볼 수 있듯이 이미 일부 패드(52)에 도금층(53)이 형성되어 있는 피도금재(5)의 도금층이 형성되지 않은 다른 패드(52')를 제1롤러(11)와 접하도록 함으로써 이 패드(52')에 도금층을 형성하고자 할 때에, 베이스 부재(51)의 배면을 제1롤러(11)보다 작은 경도를 갖는, 즉, 유연성 재질로 형성된 제2롤러(12)가 지지하므로, 패드(52')와 제1롤러(11)와의 접점 불량이 발생되지 않게 된다. 이는 제2롤러(12)가 피도금재(5) 표면, 즉, 피도금재(5)의 제1롤러(11)를 향한 표면의 굴곡을 충분히 흡수할 수 있기 때문에 가능하게 된다.As shown in FIG. 10, the first roller 11 is brought into contact with another pad 52 ′ where the plating layer of the plated material 5, in which the plating layer 53 is already formed on some pads 52, is not formed. When the plating layer is to be formed on the pad 52 ', the back surface of the base member 51 is supported by the second roller 12 having a hardness smaller than that of the first roller 11, that is, made of a flexible material. Contact failure between the pad 52 'and the first roller 11 is no longer generated. This is possible because the second roller 12 can sufficiently absorb the bending of the surface of the plated material 5, that is, the surface of the plated material 5 toward the first roller 11.
상기와 같은 효과는 도 10에서 볼 수 있듯이 각 패드(52)(52')에 도금층이 형성되는 순서가 상이할 때에도 유용할 수 있으나, 반드시 이에 한정되는 것은 아니다.As shown in FIG. 10, the above effects may be useful when the plating layers are formed in the pads 52 and 52 ′ in a different order, but are not necessarily limited thereto.
도 11에서 볼 수 있듯이, 베이스 부재(51)에 동일한 두께의 패드들(52)이 형성되어 있고, 이 패드들(52)에 서로 다른 두께의 도금층들(53a)(53b)(53c)(53d)이 형성되는 피도금재(5')에도 적용될 수 있다.As shown in FIG. 11, pads 52 having the same thickness are formed on the base member 51, and plating layers 53a, 53b, 53c, and 53d having different thicknesses are formed on the pads 52. ) May also be applied to the plated material 5 '.
또한, 도 12에서 볼 수 있듯이 베이스 부재(51)에 서로 다른 두께의 패드들(52a)(52b)(52c)(52d)이 형성된 경우에도 적용될 수 있다. 특히 도 12에 도시된 피도금재(5")는 전술한 스팟 도금이 아니라, 전체 패드들(52a)(52b)(52c)(52d)에 동시에 도금층을 형성하는 경우에도 적용될 수 있다. 이 경우에도 패드들(52a)(52b)(52c)(52d)의 두께에 편차가 있기 때문에 이 두께 편차를 제2롤러(12)가 충분히 흡수하여 상기 패드들(52a)(52b)(52c)(52d)이 모두 제1롤러(11)와 양호한 접점을 이룰 수 있도록 할 수 있다. In addition, as shown in FIG. 12, the pads 52a, 52b, 52c, and 52d having different thicknesses may be applied to the base member 51. In particular, the plated material 5 ″ shown in FIG. 12 may be applied not only to the spot plating described above but also to the case where a plating layer is simultaneously formed on all of the pads 52a, 52b, 52c, and 52d. Since the thicknesses of the pads 52a, 52b, 52c, and 52d vary, the second roller 12 absorbs the thickness variation sufficiently, so that the pads 52a, 52b, 52c, and 52d. ) Can make good contact with the first roller (11).
도 10 내지 도 12에는 피도금재(5)의 일면에 도금층이 형성되는 경우만을 도시하였으나, 피도금재(5)의 양면에 도금층이 형성되는 경우에도 동일하게 적용될 수 있음은 물론이다.10 to 12 illustrate only the case where the plated layer is formed on one surface of the plated material 5, but the same may be applied to the case where the plated layer is formed on both surfaces of the plated material 5.
본 발명은 첨부된 도면에 도시된 일 실시예를 참고로 설명되었으나 이는 예시적인 것에 불과하며, 당해 기술분야에서 통상의 지식을 가진 자라면 이로부터 다양한 변형 및 균등한 타 실시예가 가능하다는 점을 이해할 수 있을 것이다. 따라서 본 발명의 진정한 보호 범위는 첨부된 청구 범위에 의해서만 정해져야 할 것이다.Although the present invention has been described with reference to one embodiment shown in the accompanying drawings, this is merely exemplary, and it will be understood by those skilled in the art that various modifications and equivalent other embodiments are possible. Could be. Therefore, the true scope of protection of the present invention should be defined only by the appended claims.
본 발명의 실시예들은 각종 전자 제품 등에 적용될 수 있다.Embodiments of the present invention can be applied to various electronic products.

Claims (15)

  1. 적어도 표면이 제1경도를 갖고 회전하도록 구비되며 적어도 외면이 전기 전도성을 갖도록 구비되고 피도금재의 일면과 접촉되는 제1롤러; 및A first roller provided with at least a surface having a first hardness to rotate and having at least an outer surface electrically conductive and in contact with one surface of the plated material; And
    적어도 표면이 상기 제1경도보다 작은 제2경도를 갖고, 상기 제1롤러와의 사이로 상기 피도금재가 통과되도록 상기 제1롤러와 대향되게 배치되며, 상기 제1롤러와 맞물려 회전하도록 구비되고, 상기 피도금재의 타면과 접촉되는 제2롤러;를 포함하는 캐소드 롤러 조립체.At least a surface having a second hardness less than the first hardness, disposed to face the first roller so that the plated material passes through the first roller, and is provided to rotate in engagement with the first roller; And a second roller in contact with the other surface of the plated material.
  2. 제1항에 있어서,The method of claim 1,
    상기 제1롤러의 회전축과 상기 제2롤러의 회전축을 연결한 가상선과 상기 피도금재의 진행 방향과 이루는 각이 직각인 캐소드 롤러 조립체.A cathode roller assembly having a right angle between the virtual line connecting the rotating shaft of the first roller and the rotating shaft of the second roller and the traveling direction of the plated material.
  3. 제1항에 있어서,The method of claim 1,
    상기 제2롤러는 상기 피도금재의 진행 방향에 대하여 상기 제1롤러보다 전방에 위치하도록 구비된 캐소드 롤러 조립체.The second roller is a cathode roller assembly provided to be located ahead of the first roller with respect to the traveling direction of the plated material.
  4. 제1항 내지 제3항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 3,
    상기 제2롤러의 반경은 상기 제1롤러의 반경보다 큰 캐소드 롤러 조립체.And the radius of the second roller is greater than the radius of the first roller.
  5. 제1항 내지 제3항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 3,
    상기 제2롤러는 적어도 외측이 유연한 재질로 구비된 캐소드 롤러 조립체.The second roller is a cathode roller assembly provided with at least an outer flexible material.
  6. 제1항 내지 제3항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 3,
    상기 제2롤러는, 제1롤링 부재와, 상기 제1롤링 부재 외측에 위치하고 상기 제2경도를 갖는 제2롤링부재를 포함하는 캐소드 롤러 조립체.And the second roller comprises a first rolling member and a second rolling member positioned outside the first rolling member and having the second hardness.
  7. 제1항 내지 제3항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 3,
    상기 제2롤러는 적어도 외측이 전기 절연성 재질로 구비된 캐소드 롤러 조립체.The second roller is a cathode roller assembly provided with at least an outer side of the electrically insulating material.
  8. 적어도 표면이 제1경도를 갖고 회전하도록 구비되며 적어도 외면이 전기 전도성을 갖도록 구비되고 피도금재의 일면과 접촉되는 제1롤러; A first roller provided with at least a surface having a first hardness to rotate and having at least an outer surface electrically conductive and in contact with one surface of the plated material;
    적어도 표면이 상기 제1경도보다 작은 제2경도를 갖고, 상기 제1롤러와의 사이로 상기 피도금재가 통과되도록 상기 제1롤러와 대향되게 배치되며, 상기 제1롤러와 맞물려 회전하도록 구비되고, 상기 피도금재의 타면과 접촉되는 제2롤러; 및At least a surface having a second hardness less than the first hardness, disposed to face the first roller so as to pass the plated material between the first roller, and provided to rotate in engagement with the first roller; A second roller in contact with the other surface of the plated material; And
    상기 제1롤러에 전기적으로 연결되고 상기 제1롤러에 캐소드 전원을 인가하는 전원 유닛;을 포함하는 도금 장치.And a power supply unit electrically connected to the first roller and configured to apply cathode power to the first roller.
  9. 제8항에 있어서,The method of claim 8,
    상기 제1롤러의 회전축과 상기 제2롤러의 회전축을 연결한 가상선과 상기 피도금재의 진행 방향과 이루는 각이 직각인 도금 장치.The plating apparatus of claim 1, wherein an imaginary line connecting the rotary shaft of the first roller and the rotary shaft of the second roller and the traveling direction of the plated material are perpendicular to each other.
  10. 제8항에 있어서,The method of claim 8,
    상기 제2롤러는 상기 피도금재의 진행 방향에 대하여 상기 제1롤러보다 전방에 위치하도록 구비된 도금 장치.The second roller is a plating apparatus provided to be located ahead of the first roller with respect to the traveling direction of the plated material.
  11. 제8항 내지 제10항 중 어느 한 항에 있어서,The method according to any one of claims 8 to 10,
    상기 제2롤러의 반경은 상기 제1롤러의 반경보다 큰 도금 장치.Plating apparatus of the second roller is larger than the radius of the first roller.
  12. 제8항 내지 제10항 중 어느 한 항에 있어서,The method according to any one of claims 8 to 10,
    상기 제2롤러는 적어도 외측이 유연한 재질로 구비된 도금 장치.The second roller is a plating apparatus provided with at least an outer flexible material.
  13. 제8항 내지 제10항 중 어느 한 항에 있어서,The method according to any one of claims 8 to 10,
    상기 제2롤러는, 제1롤링 부재와, 상기 제1롤링 부재 외측에 위치하고 상기 제2경도를 갖는 제2롤링부재를 포함하는 도금 장치.And the second roller comprises a first rolling member and a second rolling member positioned outside the first rolling member and having the second hardness.
  14. 제8항 내지 제10항 중 어느 한 항에 있어서,The method according to any one of claims 8 to 10,
    상기 제2롤러는 적어도 외측이 전기 절연성 재질로 구비된 도금 장치.The second roller is a plating apparatus provided with at least an outer side of the electrically insulating material.
  15. 제8항 내지 제10항 중 어느 한 항에 있어서,The method according to any one of claims 8 to 10,
    상기 제2롤러를 회전시키도록 상기 제2롤러에 연결된 구동 유닛을 더 포함하는 도금 장치.And a driving unit connected to the second roller to rotate the second roller.
PCT/KR2014/000493 2013-01-16 2014-01-16 Cathode roller assembly and plating apparatus WO2014112816A1 (en)

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CN104928738B (en) * 2015-05-21 2017-04-19 中国科学院山西煤炭化学研究所 Continuous metal electroplating method and device for carbon fiber tows
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5096559A (en) * 1989-07-12 1992-03-17 Mitsubishi Denki Kabushiki Kaisha Cathode roller mechanism
KR20060022240A (en) * 2003-05-15 2006-03-09 게부르. 쉬미트 게엠베하 운트 코. Device for treating objects, in particular for plating printed circuit boards
JP2007016316A (en) * 2005-07-08 2007-01-25 Hoellmueller Maschinenbau Gmbh Apparatus and process for electrolytically treating of foils from roller to roller
JP2008248337A (en) * 2007-03-30 2008-10-16 Fujifilm Corp Energization processing apparatus and manufacturing apparatus for film with plated film
JP2008255482A (en) * 2007-03-13 2008-10-23 Mitsubishi Materials Corp Power feed mechanism

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4805195B2 (en) 2007-03-13 2011-11-02 富士フイルム株式会社 Bearing body, liquid draining device, and apparatus for producing film with plating film

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5096559A (en) * 1989-07-12 1992-03-17 Mitsubishi Denki Kabushiki Kaisha Cathode roller mechanism
KR20060022240A (en) * 2003-05-15 2006-03-09 게부르. 쉬미트 게엠베하 운트 코. Device for treating objects, in particular for plating printed circuit boards
JP2007016316A (en) * 2005-07-08 2007-01-25 Hoellmueller Maschinenbau Gmbh Apparatus and process for electrolytically treating of foils from roller to roller
JP2008255482A (en) * 2007-03-13 2008-10-23 Mitsubishi Materials Corp Power feed mechanism
JP2008248337A (en) * 2007-03-30 2008-10-16 Fujifilm Corp Energization processing apparatus and manufacturing apparatus for film with plated film

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