WO2014041994A1 - 硬化性樹脂組成物 - Google Patents
硬化性樹脂組成物 Download PDFInfo
- Publication number
- WO2014041994A1 WO2014041994A1 PCT/JP2013/072667 JP2013072667W WO2014041994A1 WO 2014041994 A1 WO2014041994 A1 WO 2014041994A1 JP 2013072667 W JP2013072667 W JP 2013072667W WO 2014041994 A1 WO2014041994 A1 WO 2014041994A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- organopolysiloxane
- groups
- sio
- curable resin
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 24
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 140
- 125000003118 aryl group Chemical group 0.000 claims abstract description 46
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 20
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 17
- 238000006459 hydrosilylation reaction Methods 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims description 44
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 239000003054 catalyst Substances 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 229910004283 SiO 4 Inorganic materials 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000007809 chemical reaction catalyst Substances 0.000 abstract description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 51
- 125000004432 carbon atom Chemical group C* 0.000 description 29
- 239000000047 product Substances 0.000 description 29
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 18
- 229910052710 silicon Inorganic materials 0.000 description 16
- 238000012360 testing method Methods 0.000 description 16
- 125000000962 organic group Chemical group 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- -1 polysiloxane Polymers 0.000 description 13
- 239000010703 silicon Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 8
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 8
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 8
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 8
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 8
- 125000005372 silanol group Chemical group 0.000 description 8
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 8
- 125000003944 tolyl group Chemical group 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- 125000005023 xylyl group Chemical group 0.000 description 7
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000018044 dehydration Effects 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 229910000077 silane Inorganic materials 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 4
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 3
- YGHUUVGIRWMJGE-UHFFFAOYSA-N chlorodimethylsilane Chemical compound C[SiH](C)Cl YGHUUVGIRWMJGE-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000006038 hexenyl group Chemical group 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 3
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 3
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 2
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- LTFTWJYRQNTCHI-UHFFFAOYSA-N hex-1-yn-3-ol Chemical compound CCCC(O)C#C LTFTWJYRQNTCHI-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000012265 solid product Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- GRGVQLWQXHFRHO-AATRIKPKSA-N (e)-3-methylpent-3-en-1-yne Chemical compound C\C=C(/C)C#C GRGVQLWQXHFRHO-AATRIKPKSA-N 0.000 description 1
- CLFYLNSQRWCJAY-AATRIKPKSA-N (e)-hex-3-en-1-yne Chemical compound CC\C=C\C#C CLFYLNSQRWCJAY-AATRIKPKSA-N 0.000 description 1
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical group C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 1
- BJPGHILWNPIMKU-UHFFFAOYSA-N 2,4,6,8-tetrakis(hex-1-enyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound CCCCC=C[Si]1(C)O[Si](C)(C=CCCCC)O[Si](C)(C=CCCCC)O[Si](C)(C=CCCCC)O1 BJPGHILWNPIMKU-UHFFFAOYSA-N 0.000 description 1
- ZPQAUEDTKNBRNG-UHFFFAOYSA-N 2-methylprop-2-enoylsilicon Chemical compound CC(=C)C([Si])=O ZPQAUEDTKNBRNG-UHFFFAOYSA-N 0.000 description 1
- MQSZOZMNAJHVML-UHFFFAOYSA-N 3-phenylbut-1-yn-1-ol Chemical compound OC#CC(C)C1=CC=CC=C1 MQSZOZMNAJHVML-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- NOKSMMGULAYSTD-UHFFFAOYSA-N [SiH4].N=C=O Chemical compound [SiH4].N=C=O NOKSMMGULAYSTD-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- DSVRVHYFPPQFTI-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane;platinum Chemical compound [Pt].C[Si](C)(C)O[Si](C)(C=C)C=C DSVRVHYFPPQFTI-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- ODADONMDNZJQMW-UHFFFAOYSA-N diethoxy-ethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](CC)(OCC)CCCOCC1CO1 ODADONMDNZJQMW-UHFFFAOYSA-N 0.000 description 1
- SLQTWNAJXFHMHM-UHFFFAOYSA-N dimethoxy-methyl-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](C)(OC)OC)CCC2OC21 SLQTWNAJXFHMHM-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- SGWBNWKEYPVBDG-UHFFFAOYSA-N ethenyl-tris(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](OC(C)(C)C#C)(OC(C)(C)C#C)C=C SGWBNWKEYPVBDG-UHFFFAOYSA-N 0.000 description 1
- SBVCEDLIWDSBGE-UHFFFAOYSA-N iminosilane Chemical compound [SiH2]=N SBVCEDLIWDSBGE-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000012056 semi-solid material Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/296—Organo-silicon compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
Definitions
- the present invention relates to a curable resin composition.
- a curable resin composition containing a silicone resin is known, and is used as, for example, a composition for optical semiconductor sealing.
- a curable resin composition containing a silicone resin is known, and is used as, for example, a composition for optical semiconductor sealing.
- (A) a branched chain having at least 3 alkenyl groups in one molecule and at least 30 mol% of all silicon-bonded organic groups is an aryl group”.
- Organopolysiloxane (B) linear organopolysiloxane having both ends of the molecular chain blocked with diorganohydrogensiloxy groups and having an aryl group, (C) at least 3 diorganohydrogens in one molecule
- a curable organopolysiloxane composition comprising a branched organopolysiloxane having a siloxy group and at least 15 mol% of all silicon-bonded organic groups being an aryl group, and (D) a catalyst for hydrosilylation reaction. Is described.
- the present invention has been made in view of the above points, and an object thereof is to provide a curable resin composition having excellent adhesion.
- the present inventors have excellent adhesion of a cured product by setting the polymerization degree of a linear organopolysiloxane having a silicon atom-bonded hydrogen atom to a specific value. As a result, the present invention has been completed.
- the present invention provides the following (I) to (VI).
- C hydrosilylation catalyst
- a curable resin composition having excellent adhesion can be provided.
- the curable resin composition of the present invention (hereinafter also referred to as “the composition of the present invention”) has at least two silicon-bonded hydrogen atoms and at least one aryl group in one molecule, and A linear organopolysiloxane (A) having a degree of polymerization of more than 10, a branched organopolysiloxane (B) having at least three alkenyl groups and at least one aryl group in one molecule, and hydrosilyl A curable resin composition containing a catalyst for chemical reaction (C).
- B branched organopolysiloxane
- C hydrosilyl
- each component contained in the composition of the present invention will be described in detail.
- Linear organopolysiloxane (A)> The linear organopolysiloxane (A) has at least two silicon-bonded hydrogen atoms and at least one aryl group in one molecule, and has a degree of polymerization exceeding 10. Siloxane.
- the linear organopolysiloxane (A) undergoes an addition reaction (hydrosilylation reaction) with an alkenyl group of the branched organopolysiloxane (B) described later. At this time, since the linear organopolysiloxane (A) has at least two silicon-bonded hydrogen atoms (Si—H), it functions as a crosslinking agent between the branched organopolysiloxanes (B). Can do.
- the composition of this invention is excellent in the adhesiveness of hardened
- the degree of polymerization of the linear organopolysiloxane (A) is preferably more than 30 and more than 30 and less than 1,000 because the adhesion of the cured product is more excellent and the workability is also improved. More preferably, it is more than 30 and 500 or less.
- the degree of polymerization of the linear organopolysiloxane is equal to the number of silicon atoms in the linear organopolysiloxane minus the number of two silicon atoms at both ends.
- the degree of polymerization is a value indicated by n in the formula (1).
- the polymerization degree of the linear organopolysiloxane (G) represented by the formula (16) described later is a value indicated by k in the formula (16).
- the linear organopolysiloxane (A) has at least one aryl group because it has a small attenuation due to light refraction, reflection, scattering, etc. of the resulting cured product, and is a silicon atom-bonded all organic material. It is preferred that at least 30 mole percent of the groups are aryl groups, and more preferred that at least 40 mole percent is an aryl group. Examples of the aryl group include aryl groups having 6 to 18 carbon atoms such as a phenyl group, a tolyl group, and a xylyl group, and a phenyl group is preferable.
- Examples of the group bonded to the silicon atom in the linear organopolysiloxane (A) include a substituted or unsubstituted monovalent hydrocarbon group having no aliphatic unsaturated group, specifically, For example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, various pentyl groups, various hexyl groups, various octyl groups, various decyl groups, An alkyl group having 1 to 18 carbon atoms such as cyclopentyl group and cyclohexyl group; an aryl group having 6 to 18 carbon atoms such as phenyl group, tolyl group and xylyl group; an aralkyl group having 7 to 18 carbon atoms such as benzyl group and phenethyl group; A halogenated alkyl group having 1
- Such a linear organopolysiloxane (A) is preferably a linear organopolysiloxane having both ends of a molecular chain blocked with diorganohydrogensiloxy groups.
- the organopolysiloxane represented is mentioned. HR 1 2 SiO (R 1 2 SiO) n SiR 1 2 H (1)
- each R 1 is independently a substituted or unsubstituted monovalent hydrocarbon group having no aliphatic unsaturated bond.
- the monovalent hydrocarbon group for R 1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, various pentyl groups, and various types.
- Alkyl groups having 1 to 18 carbon atoms such as hexyl group, various octyl groups, various decyl groups, cyclopentyl groups, and cyclohexyl groups; aryl groups having 6 to 18 carbon atoms such as phenyl groups, tolyl groups, and xylyl groups; benzyl groups and phenethyl groups Aralkyl groups having 7 to 18 carbon atoms such as a group; halogenated alkyl groups having 1 to 18 carbon atoms such as a 3-chloropropyl group and 3,3,3-trifluoropropyl group; It is preferably an alkyl group of 1 to 18, more preferably a methyl group (hereinafter sometimes referred to as “Me”).
- R 1 is an aryl group, preferably at least 30 mol% is an aryl group, and more preferably at least 40 mol% is an aryl group.
- the aryl group is an aryl group having 6 to 18 carbon atoms, and is preferably a phenyl group (hereinafter sometimes referred to as “Ph”).
- n is a positive number with an average value of more than 10, a positive number of more than 30 is preferable, a positive number of more than 30 and 1,000 or less is more preferable, and a positive number of more than 30 and 500 or less is more preferable.
- n is a positive number of 10 or less, the adhesion of the cured product is inferior, but when n is in the above range, the adhesion of the cured product is excellent.
- the weight average molecular weight (Mw) of the linear organopolysiloxane (A) is preferably 500 to 1,000,000, and more preferably 1,000 to 150,000, because toughness is generated in the cured product.
- a weight average molecular weight shall be the weight average molecular weight of polystyrene conversion by the gel permeation chromatography (GPC) which uses chloroform as a solvent.
- the viscosity of the linear organopolysiloxane (A) at 25 ° C. is preferably 20 to 1,000,000 mPa ⁇ s, and more preferably 200 to 100,000 mPa ⁇ s. In the present invention, the viscosity is measured at 25 ° C. in accordance with 4.1 (Brookfield rotary viscometer) of JIS K7117-1.
- the production method of the linear organopolysiloxane (A) is not particularly limited.
- the above-mentioned linear organopolysiloxane (a2) is reacted with water (H 2 O) as a by-product, and optionally dehydrating and condensing silanol groups remaining by the reaction.
- H 2 O water
- a method for obtaining A) as a main product is mentioned.
- the reaction is traced by 1 H-NMR to confirm the disappearance of the peak derived from the silanol group of the organopolysiloxane (a1) or the appearance of the peak derived from a component other than the component used in the reaction.
- the reaction can be completed as a reaction product containing the linear organopolysiloxane (A) as a main product and a by-product.
- organopolysiloxane (a1) used in the above reaction examples include organopolysiloxanes represented by the following formula (2).
- examples of the disiloxane (a2) include those represented by the following formula (3).
- the disiloxane represented is mentioned. HO (R 1 2 SiO) m H (2) HR 1 2 SiOSiR 1 2 H (3)
- R 1 has the same meaning as R 1 described above.
- m is a positive number below n mentioned above.
- a part of the silanol groups organopolysiloxane (a1) has the formula (2), and sealed with -SiR 1 2 H derived from the disiloxane (a2) of the formula (3), the remaining It is polymerized by condensing the silanol group.
- the degree of polymerization of the linear organopolysiloxane (A) depends on the charged amount of disiloxane (a2).
- the blending ratio of each component in the above reaction is preferably such that the disiloxane (a2) is 0.001 to 0.2 mol with respect to 10 mol of silanol groups in the organopolysiloxane (a1).
- the above reaction is preferably carried out by stirring.
- heating is preferably performed in a temperature range of 50 to 65 ° C.
- the stirring time is preferably, for example, 1 to 5 hours.
- the branched organopolysiloxane (B) is a branched organopolysiloxane having at least three alkenyl groups and at least one aryl group in one molecule.
- the alkenyl group include alkenyl groups having 2 to 18 carbon atoms such as a vinyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, and an octenyl group, and a vinyl group (hereinafter referred to as “Vi”). Is preferred).
- the alkenyl group in one molecule is preferably 2 to 12% by mass, and more preferably 3 to 10% by mass.
- the branched organopolysiloxane (B) has at least one aryl group, and at least 30 mol% of the silicon-bonded total organic groups are preferably aryl groups, and at least 40 mol% More preferably, it is an aryl group.
- the aryl group include aryl groups having 6 to 18 carbon atoms such as a phenyl group, a tolyl group, and a xylyl group, and a phenyl group is preferable. This reduces attenuation due to light refraction, reflection, scattering, etc. of the cured product obtained, and is excellent in compatibility with linear organopolysiloxane (A) having the same aryl group, and turbidity is suppressed. Excellent transparency of cured product.
- Examples of the group bonded to the other silicon atom in the branched organopolysiloxane (B) include substituted or unsubstituted monovalent hydrocarbon groups excluding alkenyl groups and aryl groups, specifically, For example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, various pentyl groups, various hexyl groups, various octyl groups, various decyl groups, An alkyl group having 1 to 18 carbon atoms such as cyclopentyl group and cyclohexyl group; an aralkyl group having 7 to 18 carbon atoms such as benzyl group and phenethyl group; a 3-chloropropyl group, a 3,3,3-trifluoropropyl group, etc.
- alkenyl groups and aryl groups specifically
- halogenated alkyl groups having 1 to 18 carbon atoms; and other small groups include silicon atom-bonded hydroxyl groups and silicon atom-bonded groups. It may have a Kokishi group.
- alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group.
- Such a branched organopolysiloxane (B) is preferably an organopolysiloxane represented by the following average unit formula (4).
- each R 3 is independently a substituted or unsubstituted monovalent hydrocarbon group.
- the monovalent hydrocarbon group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, various pentyl groups, and various hexyl groups.
- Alkyl groups having 1 to 18 carbon atoms such as various octyl groups, various decyl groups, cyclopentyl groups, and cyclohexyl groups; and those having 2 to 18 carbon atoms such as vinyl groups, allyl groups, butenyl groups, pentenyl groups, hexenyl groups, and octenyl groups.
- At least 3 of R 3 in one molecule is an alkenyl group, and the amount of R 3 that is an alkenyl group is preferably 2 to 12% by mass, and more preferably 3 to 10% by mass.
- at least one of R 3 is an aryl group, and at least 30 mol% of all R 3 is preferably an aryl group, and at least 40 mol% is more preferably an aryl group.
- X 1 is a hydrogen atom or an alkyl group.
- alkyl group examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, various pentyl groups, various hexyl groups, and various octyl groups.
- Groups, various decyl groups, cyclopentyl groups, cyclohexyl groups and the like, and alkyl groups having 1 to 18 carbon atoms, and a methyl group is preferable.
- a is a positive number
- b is 0 or a positive number
- c is 0 or a positive number
- d is 0 or a positive number
- e is 0 or a positive number
- B / a is a number in the range 0-10
- c / a is a number in the range 0-5
- d / (a + b + c + d) is a number in the range 0-0.3
- e / (a + b + c + d) is a number in the range of 0 to 0.4.
- the weight average molecular weight (Mw) of the branched organopolysiloxane (B) is preferably 1,000 to 300,000, and more preferably 1,000 to 100,000. Note that the branched organopolysiloxane (B) is a very viscous semi-solid product or solid product, and it is difficult to measure the viscosity.
- the content of the branched chain organopolysiloxane (B) is such that the linear organopolysiloxane (A) having a silicon atom-bonded hydrogen atom (the composition of the present invention is also an organopolysiloxane having a silicon atom-bonded hydrogen atom).
- the organopolysiloxane is also included. The same shall apply hereinafter and a branched organopolysiloxane (B).
- the molar ratio with the alkenyl group (hereinafter also referred to as “Si—H / Si—Vi molar ratio” for convenience) is preferably an amount satisfying 0.5 to 5.0, preferably 0.1 to 2.
- the amount satisfying 0 is more preferable, and the amount satisfying 0.5 to 1.5 is more preferable.
- the Si—H / Si—Vi molar ratio is within this range, the curability of the composition of the present invention is excellent and the adhesiveness of the cured product is also excellent.
- the hydrosilylation catalyst (C) contained in the composition of the present invention is used in combination with the linear organopolysiloxane (A) to add to the alkenyl group of the branched organopolysiloxane (B) (hydrosilylation). It functions as a catalyst that promotes the reaction.
- a conventionally known catalyst can be used, and examples thereof include a platinum-based catalyst, a rhodium-based catalyst, a palladium-based catalyst, and the like, and a platinum-based catalyst is preferable.
- platinum catalyst examples include chloroplatinic acid, chloroplatinic acid-olefin complex, chloroplatinic acid-divinyltetramethyldisiloxane complex, chloroplatinic acid-alcohol coordination compound, platinum diketone complex, platinum divinyltetramethyldi A siloxane complex etc. are mentioned, These may be used individually by 1 type and may use 2 or more types together.
- the content of the hydrosilylation reaction catalyst (C) is a catalytic amount, but from the reason that the curability of the composition of the present invention is excellent, the above-described linear organopolysiloxane (A) and branched organopolysiloxane are described above.
- the amount is preferably 0.00001 to 0.1 parts by weight, more preferably 0.0001 to 0.01 parts by weight, based on 100 parts by weight of the total amount of siloxane (B).
- the composition of the present invention preferably contains a low-viscosity organopolysiloxane (D) having a viscosity at 25 ° C. of 50,000 mPa ⁇ s or less.
- a low-viscosity organopolysiloxane (D) having a viscosity at 25 ° C. of 50,000 mPa ⁇ s or less.
- the viscosity of the low-viscosity organopolysiloxane (D) at 25 ° C. is preferably 1,000 to 30,000 mPa ⁇ s for the reason that the adhesion of the cured product is further improved.
- the low-viscosity organopolysiloxane (D) is not particularly limited as long as the viscosity at 25 ° C. is an organopolysiloxane having a viscosity of 50,000 mPa ⁇ s or less, but a branched organo having at least 3 alkenyl groups in one molecule. Polysiloxane is preferred.
- organopolysiloxane (D) examples include organopolysiloxanes represented by the following average unit formula (5).
- each R 4 is independently a substituted or unsubstituted monovalent hydrocarbon group.
- the monovalent hydrocarbon group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, various pentyl groups, and various hexyl groups.
- Alkyl groups having 1 to 18 carbon atoms such as various octyl groups, various decyl groups, cyclopentyl groups, and cyclohexyl groups; and those having 2 to 18 carbon atoms such as vinyl groups, allyl groups, butenyl groups, pentenyl groups, hexenyl groups, and octenyl groups.
- X 2 is a hydrogen atom or an alkyl group.
- alkyl group examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, various pentyl groups, various hexyl groups, and various octyl groups.
- Groups, various decyl groups, cyclopentyl groups, cyclohexyl groups and the like, and alkyl groups having 1 to 18 carbon atoms, and a methyl group is preferable.
- f is a positive number
- g is 0 or a positive number
- h is 0 or a positive number
- i is 0 or a positive number
- j is 0 or a positive number
- G / f is a number in the range of 0 to 10
- h / f is a number in the range of 0 to 0.5
- i / (f + g + h + i) is a number in the range of 0 to 0.3.
- j / (f + g + h + i) is a number in the range of 0 to 0.4.
- the weight average molecular weight (Mw) of the low viscosity organopolysiloxane (D) is preferably 500 to 50,000, more preferably 1,000 to 30,000. Further, the content of the low-viscosity organopolysiloxane (D) is not particularly limited, but for example, with respect to a total of 100 parts by mass of the above-mentioned linear organopolysiloxane (A) and branched organopolysiloxane (B). The amount is preferably 5 to 50 parts by mass, and more preferably 10 to 30 parts by mass.
- the composition of the present invention may further contain a curing retarder (E).
- the curing retarder (E) is a component for adjusting the curing rate and working life of the composition of the present invention.
- the curing retarder (E) is a component for adjusting the curing rate and working life of the composition of the present invention.
- 3-methyl-1-butyn-3-ol, 3,5-dimethyl- Alcohol derivatives having a carbon-carbon triple bond such as 1-hexyn-3-ol, phenylbutynol, 1-ethynyl-1-cyclohexanol; 3-methyl-3-penten-1-yne, 3,5-dimethyl- Enyne compounds such as 3-hexen-1-yne; low molecular weight siloxanes containing alkenyl groups such as tetramethyltetravinylcyclotetrasiloxane and tetramethyltetrahexenylcyclotetrasiloxane; methyl-tris
- the content of the curing retarder (E) is appropriately selected according to the method of using the composition of the present invention, and for example, the above-described linear organopolysiloxane (A) and branched organopolysiloxane (
- the total content of B) is preferably 0.00001 to 0.1 parts by mass, more preferably 0.0001 to 0.01 parts by mass.
- the composition of the present invention may further contain an adhesion promoter (F).
- adhesion-imparting agent (F) include a silane coupling agent.
- Specific examples of the silane coupling agent include amino silane, vinyl silane, epoxy silane, methacryl silane, isocyanate silane, imino silane, reaction products thereof, and the like.
- the compound etc. which are obtained by reaction with polyisocyanate are mentioned, It is preferable that it is an epoxy silane.
- the epoxy silane is not particularly limited as long as it is a compound having an epoxy group and an alkoxysilyl group.
- ⁇ -glycidoxypropylmethyldimethoxysilane ⁇ -glycidoxypropylethyldiethoxysilane, ⁇ -glycid Dialkoxyepoxysilanes such as xylpropylmethyldiethoxysilane and ⁇ - (3,4 epoxycyclohexyl) ethylmethyldimethoxysilane; ⁇ -glycidoxypropyltrimethoxysilane, ⁇ - (3,4 epoxycyclohexyl) ethyltrimethoxysilane And the like, and the like.
- the adhesion-imparting agent (F) may be, for example, a dehydration condensate of the above epoxy silane, for example, ⁇ -glycidoxypropyltrimethoxysilane, phenyltrimethoxysilane, and 1,3-divinyl-1,
- a dehydration condensate of the above epoxy silane for example, ⁇ -glycidoxypropyltrimethoxysilane, phenyltrimethoxysilane, and 1,3-divinyl-1
- An epoxysilane dehydration condensate obtained by dehydration condensation with 1,3,3-tetramethyldisiloxane can be mentioned.
- the content of the adhesion-imparting agent (F) is not particularly limited, but is 0.5 to 10 with respect to a total of 100 parts by mass of the linear organopolysiloxane (A) and the branched organopolysiloxane (B) described above.
- the amount is preferably part by mass, more preferably 1 to 5 parts by mass.
- composition of the present invention may further contain a linear organopolysiloxane (G) represented by the following formula (16).
- each R 2 is independently an alkyl group, an aryl group, a hydroxy group (—OH), or an alkoxy group, and at least one of R 2 is an aryl group.
- the alkyl group for R 2 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, various pentyl groups, various hexyl groups, Examples thereof include alkyl groups having 1 to 18 carbon atoms such as various octyl groups, various decyl groups, cyclopentyl groups, and cyclohexyl groups, and methyl groups are preferable.
- Examples of the aryl group for R 2 include aryl groups having 6 to 18 carbon atoms such as a phenyl group, a tolyl group, and a xylyl group, and a phenyl group is preferable.
- Examples of the alkoxy group for R 2 include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, and a methoxy group is preferable.
- k is an average positive number of 1 to 5, and a positive number of 1 to 3 is preferable.
- the composition of the present invention can improve the bending properties by containing a linear organopolysiloxane (G) having a polymerization degree of 1 to 5. This is considered to be because the structure of the composition of the present invention does not become too dense.
- G linear organopolysiloxane
- an organopolysiloxane represented by the following formula (17) is preferable because the bending properties can be further improved.
- k has the same meaning as k described above.
- the content of the linear organopolysiloxane (G) is not particularly limited, and it is preferable that the “Si—H / Si—Vi molar ratio” is within the above range.
- the manufacturing method of the composition of this invention is not specifically limited, For example, the method of manufacturing by mixing the essential component mentioned above and an arbitrary component is mentioned. Further, the method for obtaining a cured product by curing the composition of the present invention is not particularly limited, and examples thereof include a method of heating the composition of the present invention at 80 to 200 ° C. for 10 minutes to 720 minutes.
- composition of the present invention is, for example, in the field of display materials, optical recording medium materials, optical equipment materials, optical component materials, optical fiber materials, optical / electronic functional organic materials, semiconductor integrated circuit peripheral materials, etc. It can be used as a primer, a sealing material, etc.
- the composition of the present invention can be suitably used as a composition for encapsulating an optical semiconductor because it has excellent adhesion and its cured product exhibits good transparency and high refractive index.
- the optical semiconductor to which the composition of the present invention can be applied is not particularly limited, and examples thereof include a light emitting diode (LED), an organic electroluminescent element (organic EL), a laser diode, and an LED array.
- LED light emitting diode
- organic EL organic electroluminescent element
- laser diode a laser diode
- LED array As a method for using the composition of the present invention as an optical semiconductor sealing composition, for example, the composition of the present invention is applied to an optical semiconductor, and the optical semiconductor to which the composition of the present invention is applied is heated. The method of hardening the composition of invention is mentioned.
- the method for applying and curing the composition of the present invention is not particularly limited, and examples thereof include a method using a dispenser, a potting method, screen printing, transfer molding, and injection
- Linear organopolysiloxane A2 A linear organopolysiloxane A2 represented by the following formula (8) was obtained in the same manner as above except that the amount of 1,1,3,3-tetramethyldisiloxane was changed to 1.5 g. . HMe 2 SiO (MePhSiO) 60 SiMe 2 H (8)
- Linear organopolysiloxane A3 represented by the following formula (9) was obtained in the same manner as above except that the amount of 1,1,3,3-tetramethyldisiloxane was changed to 3 g. HMe 2 SiO (MePhSiO) 26 SiMe 2 H (9)
- Linear organopolysiloxane G1 (Linear organopolysiloxane G1) Into a flask equipped with a stirrer and a reflux condenser, 100 g of dichlorodiphenylsilane and 107 g of chlorodimethylsilane (HMe 2 SiCl) were added, and 30 g of water was added dropwise over 1 hour while stirring. After completion of the addition, the mixture was heated at 50 ° C. for 5 hours. Refluxed. After cooling to room temperature, toluene was added, mixed and allowed to stand, the lower layer (aqueous layer) was separated, and the toluene solution layer was washed with water three times. The remaining toluene solution layer was concentrated under reduced pressure to obtain a linear organopolysiloxane G1 represented by the following formula (10). HMe 2 SiO (Ph 2 SiO) SiMe 2 H (10)
- Linear organopolysiloxane G2 Linear organopolysiloxane G2
- dichlorodiphenylsilane 53.5 g of chlorodimethylsilane were added, and 30 g of water was added dropwise over 1 hour with stirring. After completion of the addition, the mixture was heated to reflux at 50 ° C. for 5 hours. After cooling to room temperature, toluene was added, mixed and allowed to stand, the lower layer (aqueous layer) was separated, and the toluene solution layer was washed with water three times. The remaining toluene solution layer was concentrated under reduced pressure to obtain a linear organopolysiloxane G2 represented by the following formula (18). HMe 2 SiO (Ph 2 SiO) 2 SiMe 2 H (18)
- Linear organopolysiloxane G3 A linear organopolysiloxane G3 represented by the following formula (19) was obtained in the same manner as in the production of the linear organopolysiloxane G1 or G2 except that the amount of chlorodimethylsilane was changed.
- Linear organopolysiloxane Y1 Linear organopolysiloxane Y1
- a linear organopolysiloxane having a silanol group represented by the following formula (13) 60 g of 1,3-divinyltetramethyldisiloxane and 0.1 g of trifluoromethanesulfonic acid.
- the mixture was stirred and heated at 70 ° C. for 2 hours, toluene was added, the toluene layer was washed three times with water, and concentrated under reduced pressure to obtain a linear organopolysiloxane Y1 represented by the following formula (14). It was. HO (Ph 2 SiO) 5 (Me 2 SiO) 5 H (13) ViMe 2 SiO (Ph 2 SiO) 5 (Me 2 SiO) 5 SiViMe 2 (14)
- the obtained cured product was measured for transmittance (unit:%) at a wavelength of 400 nm using an ultraviolet / visible (UV-Vis) absorption spectrum measuring apparatus (manufactured by Shimadzu Corporation) in accordance with JIS K 0115: 2004.
- the measurement results are shown in Table 1 below. If the transmittance value is 80% or more, it can be evaluated as having excellent “transparency”.
- ⁇ CF> The prepared composition was bonded to an adherend (aluminum alloy plate, A1050P, manufactured by Partec Co., Ltd.) with an adhesion area of 12.5 mm ⁇ 25 mm, and then cured by heating at 150 ° C. for 2 hours, and tested. Got the body. Using the obtained test body, a tensile test was performed in accordance with JIS K6850: 1999, and the ratio (unit:%) of the cohesive failure (CF) area to the adhesion area was measured. The results are shown in Table 1 below. The closer the value of CF is to 100, the better the adhesion.
- Linear organopolysiloxane A1 as described above (content of silicon-bonded hydrogen atoms: 0.01% by mass, content of phenyl groups in all silicon-bonded organic groups: 50 mol%, Mw: 15, 000, viscosity: 10,000 mPa ⁇ s)
- Linear organopolysiloxane A2 as described above (content of silicon atom-bonded hydrogen atoms: 0.02% by mass, phenyl group content in all silicon atom-bonded organic groups: 49 mol%, Mw: 5, 000, viscosity: 3,000 mPa ⁇ s)
- Linear organopolysiloxane A3 as described above (content of silicon atom-bonded hydrogen atoms: 0.05 mass%, content of phenyl groups in all silicon atom-bonded organic groups: 48 mol%, Mw: 2, 800, viscosity: 1,200 mPa ⁇ s)
- Linear organopolysiloxane G1 as described above (content of silicon-bonded hydrogen atoms: 0.60 mass%, content of phenyl groups in all silicon-bonded organic groups: 33 mol%)
- Linear organopolysiloxane G2 As described above (content of silicon-bonded hydrogen atoms: 0.40 mass%, content of phenyl groups in all silicon-bonded organic groups: 50 mol%)
- -Linear organopolysiloxane G3 as described above (content of silicon-bonded hydrogen atoms: 0.35 mass%, content of phenyl groups in all silicon-bonded organic groups: 52 mol%)
- Branched organopolysiloxane X1 as described above (content of silicon atom-bonded hydrogen atoms: 0.38% by mass, content of phenyl groups in all silicon atom-bonded organic groups: 60 mol%, Mw: 4, 000, viscosity: 1,200 mPa ⁇ s)
- Branched organopolysiloxane B1 As described above (vinyl group content: 4.0% by mass, phenyl group content in all silicon atom-bonded organic groups: 60 mol%, Mw: 1,500, viscosity : Viscosity could not be measured with very viscous semi-solid material)
- Linear organopolysiloxane Y1 as described above (vinyl group content: 4.5% by mass, phenyl group content in all silicon-bonded organic groups: 50 mol%, Mw: 900, viscosity: 200 mPa ⁇ S)
- Catalyst for hydrosilylation reaction C1 Platinum divinyltetramethyldisiloxane complex (trade name: 3% Pt-VTS-VTS, manufactured by N.E. Chemcat)
- Low-viscosity organopolysiloxane D1 Organopolysiloxane represented by the following average unit formula (15) (vinyl group content: 8.8% by mass, phenyl group content in silicon-bonded total organic groups: 36 (Mol%, Mw: 1,100, viscosity: 15,000 mPa ⁇ s) (PhSiO 3/2 ) 0.63 (ViMe 2 SiO 1/2 ) 0.37 (15)
- Curing retarder E1 3-methyl-1-butyn-3-ol (manufactured by Tokyo Chemical Industry Co., Ltd.)
- Adhesion imparting agent F1 ⁇ -glycidoxypropyltrimethoxysilane (KBM-403 manufactured by Shin-Etsu Chemical Co., Ltd.), phenyltrimethoxysilane (KBM-103 manufactured by Shin-Etsu Chemical Co., Ltd.), and 1,3-divinyl-1 Epoxysilane dehydration condensate obtained by dehydration condensation with 1,1,3,3-tetramethyldisiloxane
- Comparative Example 1 containing no Si—H-based linear organopolysiloxanes A1 to A3 was inferior in adhesion from the results of CF and peeling evaluation. Further, even in the case of the Si—H-based linear organopolysiloxane, Comparative Example 2 containing only the linear organopolysiloxane G1 having a polymerization degree of 1 also showed poor adhesion. .
- Examples 1 to 8 containing Si—H-based linear organopolysiloxanes A1 to A3 were all excellent in adhesion. Further, when Examples 3 to 5 are compared, Examples 4 and 5 containing low-viscosity organopolysiloxane D1 have better results of moisture reflow test 2 compared to Example 3 not containing this, It was found that the adhesiveness was more excellent. In addition, it was found that Examples 3 to 6 and 8 containing linear organopolysiloxanes G1 to G3 were excellent in folding physical properties.
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Silicon Polymers (AREA)
Abstract
Description
例えば、特許文献1の[請求項1]には、「(A)一分子中、少なくとも3個のアルケニル基を有し、ケイ素原子結合全有機基の少なくとも30モル%はアリール基である分岐鎖状オルガノポリシロキサン、(B)分子鎖両末端がジオルガノハイドロジェンシロキシ基で封鎖され、アリール基を有する直鎖状オルガノポリシロキサン…、(C)一分子中、少なくとも3個のジオルガノハイドロジェンシロキシ基を有し、ケイ素原子結合全有機基の少なくとも15モル%はアリール基である分岐鎖状オルガノポリシロキサン…、及び(D)ヒドロシリル化反応用触媒…から少なくともなる硬化性オルガノポリシロキサン組成物」が記載されている。
本発明者らが、特許文献1に開示されている「硬化性オルガノポリシロキサン組成物」について検討したところ、硬化物の密着性が不十分であることが分かった。
(I)1分子中に、少なくとも2個のケイ素原子結合水素原子および少なくとも1個のアリール基を有し、かつ、重合度が10超である直鎖状オルガノポリシロキサン(A)と、1分子中に、少なくとも3個のアルケニル基および少なくとも1個のアリール基を有する分岐鎖状オルガノポリシロキサン(B)と、ヒドロシリル化反応用触媒(C)と、を含有する硬化性樹脂組成物。
(II)上記直鎖状オルガノポリシロキサン(A)の重合度が30超である、上記(I)に記載の硬化性樹脂組成物。
(III)上記分岐鎖状オルガノポリシロキサン(B)が、後述する平均単位式(4)で表されるオルガノポリシロキサンである、上記(I)または(II)に記載の硬化性樹脂組成物。
(IV)さらに、25℃における粘度が50,000mPa・s以下である低粘度オルガノポリシロキサン(D)を含有する、上記(I)~(III)のいずれかに記載の硬化性樹脂組成物。
(V)さらに、後述する式(16)で表される直鎖状オルガノポリシロキサン(G)を含有する、上記(I)~(IV)のいずれかに記載の硬化性樹脂組成物。
(VI)光半導体素子封止用組成物である、上記(I)~(V)のいずれかに記載の硬化性樹脂組成物。
以下、本発明の組成物が含有する各成分について詳細に説明する。
直鎖状オルガノポリシロキサン(A)は、1分子中に、少なくとも2個のケイ素原子結合水素原子および少なくとも1個のアリール基を有し、かつ、重合度が10超である直鎖状オルガノポリシロキサンである。
硬化物の密着性がより優れ、かつ、作業性も良好になるという理由から、直鎖状オルガノポリシロキサン(A)の重合度は、30超であるのが好ましく、30超1,000以下であるのがより好ましく、30超500以下であるのがさらに好ましい。
例えば、直鎖状オルガノポリシロキサン(A)が後述する式(1)で表されるオルガノポリシロキサンである場合、その重合度は、式(1)中のnが示す値である。
また、後述する式(16)で表される直鎖状オルガノポリシロキサン(G)の重合度は、式(16)中のkが示す値である。
このアリール基としては、例えば、フェニル基、トリル基、キシリル基などの炭素数6~18のアリール基が挙げられ、フェニル基であるのが好ましい。
HR1 2SiO(R1 2SiO)nSiR1 2H ・・・(1)
なお、R1の少なくとも1個はアリール基であり、少なくとも30モル%はアリール基であるのが好ましく、少なくとも40モル%がアリール基であるのがより好ましい。アリール基は、炭素数6~18のアリール基であり、フェニル基(以下、「Ph」で示すことがある)であるのが好ましい。
なお、本発明において、重量平均分子量とは、クロロホルムを溶媒とするゲル・パーミエーション・クロマトグラフィー(GPC)によるポリスチレン換算の重量平均分子量であるものとする。
また、直鎖状オルガノポリシロキサン(A)の25℃における粘度は、20~1,000,000mPa・sが好ましく、200~100,000mPa・sがより好ましい。
なお、本発明において、粘度とは、JIS K7117-1の4.1(ブルックフィールド形回転粘度計)に準拠し、25℃において測定されたものとする。
直鎖状オルガノポリシロキサン(A)の製造方法としては、特に限定されないが、例えば、1分子中に2個以上のシラノール基を有するオルガノポリシロキサン(a1)と、ケイ素原子に結合した水素原子を有するジシロキサン(a2)とを反応させて、副生成物として水(H2O)を与え、任意で当該反応により残ったシラノール基を脱水縮合することにより、上述した直鎖状オルガノポリシロキサン(A)を主生成物として得る方法が挙げられる。
HO(R1 2SiO)mH ・・・(2)
HR1 2SiOSiR1 2H ・・・(3)
なお、式(2)および式(3)中、R1は、上述したR1と同義である。また、式(2)中、mは、上述したn以下の正数である。
上記反応は、撹拌により行われるのが好ましい。撹拌に際しては、例えば、50~65℃の温度範囲で加熱するのが好ましく、また、撹拌時間(反応時間)は、例えば、1~5時間であるのが好ましい。
分岐鎖状オルガノポリシロキサン(B)は、1分子中に、少なくとも3個のアルケニル基および少なくとも1個のアリール基を有する分岐鎖状オルガノポリシロキサンである。
このアルケニル基としては、例えば、ビニル基、アリル基、ブテニル基、ペンテニル基、ヘキセニル基、オクテニル基などの炭素数2~18のアルケニル基が挙げられ、ビニル基(以下、「Vi」で示すことがある)であるのが好ましい。
1分子中のアルケニル基は、2~12質量%が好ましく、3~10質量%がより好ましい。
このアリール基としては、例えば、フェニル基、トリル基、キシリル基などの炭素数6~18のアリール基が挙げられ、フェニル基であるのが好ましい。
これにより、得られる硬化物の光の屈折、反射、散乱等による減衰が小さくなるうえ、同じくアリール基を有する直鎖状オルガノポリシロキサン(A)との相溶性に優れ、濁り等が抑えられ、硬化物の透明性に優れる。
(R3SiO3/2)a(R3 2SiO2/2)b(R3 3SiO1/2)c(SiO4/2)d(X1O1/2)e …(4)
ただし、1分子中、R3の少なくとも3個はアルケニル基であり、アルケニル基であるR3が2~12質量%となる量が好ましく、3~10質量%がより好ましい。
また、1分子中、R3の少なくとも1個はアリール基であり、全R3の少なくとも30モル%はアリール基であるのが好ましく、少なくとも40モル%はアリール基であるのがより好ましい。
なお、分岐鎖状オルガノポリシロキサン(B)は、非常に粘稠な半固体状物または個体状物であり、粘度の測定は困難である。
Si-H/Si-Viモル比がこの範囲であれば、本発明の組成物の硬化性が優れ、また、硬化物の密着性もより優れる。
本発明の組成物に含有されるヒドロシリル化反応用触媒(C)は、直鎖状オルガノポリシロキサン(A)と併用されて、分岐鎖状オルガノポリシロキサン(B)のアルケニル基に対する付加反応(ヒドロシリル化反応)を促進する触媒として機能する。
ヒドロシリル化反応用触媒(C)としては、従来公知のものを用いることができ、例えば、白金系触媒、ロジウム系触媒、パラジウム系触媒等が挙げられ、白金系触媒であることが好ましい。白金系触媒の具体例としては、塩化白金酸、塩化白金酸-オレフィン錯体、塩化白金酸-ジビニルテトラメチルジシロキサン錯体、塩化白金酸-アルコール配位化合物、白金のジケトン錯体、白金ジビニルテトラメチルジシロキサン錯体などが挙げられ、これらを1種単独で用いてもよく、2種以上を併用してもよい。
ヒドロシリル化反応用触媒(C)の含有量は、触媒量であるが、本発明の組成物の硬化性が優れるという理由から、上述した直鎖状オルガノポリシロキサン(A)および分岐鎖状オルガノポリシロキサン(B)の合計100質量部に対して、0.00001~0.1質量部であるのが好ましく、0.0001~0.01質量部であるのがより好ましい。
本発明の組成物は、25℃における粘度が50,000mPa・s以下である低粘度オルガノポリシロキサン(D)を含有するのが好ましい。低粘度オルガノポリシロキサン(D)を含有することにより、硬化物の密着性がより優れる。これは、低粘度化することによって可とう性が付与され、クラック等がおこりにくくなるためと考えられる。
硬化物の密着性がさらに優れるという理由から、低粘度オルガノポリシロキサン(D)の25℃における粘度は、1,000~30,000mPa・sであるのが好ましい。
(R4SiO3/2)f(R4 2SiO2/2)g(R4 3SiO1/2)h(SiO4/2)i(X2O1/2)j …(5)
ただし、1分子中、少なくとも3個のR4がアルケニル基であるのが好ましい。また、1分子中、全R4の少なくとも10モル%はアリール基であるのが好ましい。
また、低粘度オルガノポリシロキサン(D)の含有量は、特に限定されないが、例えば、上述した直鎖状オルガノポリシロキサン(A)および分岐鎖状オルガノポリシロキサン(B)の合計100質量部に対し、5~50質量部であるのが好ましく、10~30質量部であるのがより好ましい。
本発明の組成物は、さらに、硬化遅延剤(E)を含有していてもよい。硬化遅延剤(E)は、本発明の組成物の硬化速度や作業可使時間を調整するための成分であり、例えば、3-メチル-1-ブチン-3-オール、3,5-ジメチル-1-ヘキシン-3-オール、フェニルブチノール、1-エチニル-1-シクロヘキサノールなどの炭素-炭素三重結合を有するアルコール誘導体;3-メチル-3-ペンテン-1-イン、3,5-ジメチル-3-ヘキセン-1-インなどのエンイン化合物;テトラメチルテトラビニルシクロテトラシロキサン、テトラメチルテトラヘキセニルシクロテトラシロキサンなどのアルケニル基含有低分子量シロキサン;メチル-トリス(3-メチル-1-ブチン-3-オキシ)シラン、ビニル-トリス(3-メチル-1-ブチン-3-オキシ)シランなどのアルキン含有シラン;等が挙げられ、これらを1種単独で用いてもよく、2種以上を併用してもよい。
硬化遅延剤(E)の含有量は、本発明の組成物の使用方法等に応じて適宜選択されるが、例えば、上述した直鎖状オルガノポリシロキサン(A)および分岐鎖状オルガノポリシロキサン(B)の合計100質量部に対して、0.00001~0.1質量部であるのが好ましく、0.0001~0.01質量部であるのがより好ましい。
本発明の組成物は、さらに、密着付与剤(F)を含有していてもよい。
密着付与剤(F)としては、例えば、シランカップリング剤が挙げられ、シランカップリング剤の具体例としては、アミノシラン、ビニルシラン、エポキシシラン、メタクリルシラン、イソシアネートシラン、イミノシラン、これらの反応物、これらとポリイソシアネートとの反応により得られる化合物等が挙げられ、エポキシシランであるのが好ましい。
エポキシシランとしては、エポキシ基とアルコキシシリル基とを有する化合物であれば特に限定されず、例えば、γ-グリシドキシプロピルメチルジメトキシシラン、γ-グリシドキシプロピルエチルジエトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン、β-(3,4エポキシシクロヘキシル)エチルメチルジメトキシシランなどのジアルコキシエポキシシラン;γ-グリシドキシプロピルトリメトキシシラン、β-(3,4エポキシシクロヘキシル)エチルトリメトキシシランなどのトリアルコキシエポキシシラン;等が挙げられる。
本発明の組成物は、上述した直鎖状オルガノポリシロキサン(A)とは別に、さらに、下記式(16)で表される直鎖状オルガノポリシロキサン(G)を含有してもよい。
HR2 2SiO(R2 2SiO)kSiR2 2H ・・・(16)
R2のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、各種ペンチル基、各種ヘキシル基、各種オクチル基、各種デシル基、シクロペンチル基、シクロヘキシル基などの炭素数1~18のアルキル基が挙げられ、メチル基が好ましい。
R2のアリール基としては、例えば、フェニル基、トリル基、キシリル基などの炭素数6~18のアリール基が挙げられ、フェニル基が好ましい。
R2のアルコキシ基としては、例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基などが挙げられ、メトキシ基が好ましい。
式(16)中、kは平均値で1~5の正数であり、1~3の正数が好ましい。
HMe2SiO(Ph2SiO)kSiMe2H ・・・(17)
なお、式(17)中、kは、上述したkと同義である。
また、本発明の組成物を硬化して硬化物を得る方法も特に限定されず、例えば、本発明の組成物を、80~200℃、10分~720分加熱する方法が挙げられる。
本発明の組成物を適用できる光半導体は特に制限されず、例えば、発光ダイオード(LED)、有機電界発光素子(有機EL)、レーザーダイオード、LEDアレイ等が挙げられる。
光半導体封止用組成物としての本発明の組成物の使用方法としては、例えば、光半導体に本発明の組成物を付与し、本発明の組成物が付与された光半導体を加熱して本発明の組成物を硬化させる方法が挙げられる。
このとき、本発明の組成物を付与し硬化させる方法は特に制限されず、例えば、ディスペンサーを使用する方法、ポッティング法、スクリーン印刷、トランスファー成形、インジェクション成形等が挙げられる。
(直鎖状オルガノポリシロキサンA1)
撹拌機および還流冷却管付きのフラスコに、下記式(6)で表されるシラノール基を有する直鎖状オルガノポリシロキサン100g、1,1,3,3-テトラメチルジシロキサン1gおよびトリフルオロメタンスルホン酸0.1gを投入、撹拌し50℃で2時間加熱した。その後トルエンを150g加え、生成した水を系外へ排出した。トルエン層を3回水洗した後、減圧濃縮して、下記式(7)で表される直鎖状オルガノポリシロキサンA1を得た。
HO(MePhSiO)6H ・・・(6)
HMe2SiO(MePhSiO)100SiMe2H ・・・(7)
1,1,3,3-テトラメチルジシロキサンの投入量を1.5gに変えた以外は、上記と同様にして、下記式(8)で表される直鎖状オルガノポリシロキサンA2を得た。
HMe2SiO(MePhSiO)60SiMe2H ・・・(8)
1,1,3,3-テトラメチルジシロキサンの投入量を3gに変えた以外は、上記と同様にして、下記式(9)で表される直鎖状オルガノポリシロキサンA3を得た。
HMe2SiO(MePhSiO)26SiMe2H ・・・(9)
攪拌機および還流冷却管つきのフラスコに、ジクロロジフェニルシラン100gおよびクロロジメチルシラン(HMe2SiCl)107gを投入し、攪拌しながら水30gを1時間かけて滴下し、滴下終了後、50℃で5時間加熱還流した。室温まで冷却した後、トルエンを加え、混合して静置し、下層(水層)を分離し、トルエン溶液層を3回水洗した。残ったトルエン溶液層を減圧濃縮して、下記式(10)で表される直鎖状オルガノポリシロキサンG1を得た。
HMe2SiO(Ph2SiO)SiMe2H ・・・(10)
攪拌機および還流冷却管つきのフラスコに、ジクロロジフェニルシラン100gおよびクロロジメチルシラン53.5gを投入し、攪拌しながら水30gを1時間かけて滴下し、滴下終了後、50℃で5時間加熱還流した。室温まで冷却した後、トルエンを加え、混合して静置し、下層(水層)を分離し、トルエン溶液層を3回水洗した。残ったトルエン溶液層を減圧濃縮して、下記式(18)で表される直鎖状オルガノポリシロキサンG2を得た。
HMe2SiO(Ph2SiO)2SiMe2H ・・・(18)
クロロジメチルシランの投入量を変更した以外は、直鎖状オルガノポリシロキサンG1またはG2の製造と同様にして、下記式(19)で表される直鎖状オルガノポリシロキサンG3を得た。
HMe2SiO(Ph2SiO)2.1SiMe2H ・・・(19)
攪拌機、還流冷却管、投入口および温度計付きの四口フラスコに、フェニルトリメトキシシラン194.6gおよびトリフルオロメタンスルホン酸0.22gを投入して混合し、攪拌しつつ水13.3gを15分間かけて滴下し、滴下終了後、1時間加熱還流した。室温まで冷却した後、1,1,3,3-テトラメチルジシロキサン118.6gを加え、攪拌しながら、酢酸88.4gを30分間かけて滴下した。滴下終了後、攪拌しながら50℃に昇温し、3時間反応させた。室温まで冷却した後、トルエンおよび水を加え、よく混合して静置し、水層を分離した。トルエン溶液層を3回水洗した後、減圧濃縮して、下記平均単位式(11)で表される25℃で液状のメチルフェニルハイドロジェンオリゴシロキサンである分岐鎖状オルガノポリシロキサンX1を得た。
(HMe2SiO1/2)0.6(PhSiO3/2)0.4 ・・・(11)
(分岐鎖状オルガノポリシロキサンB1)
攪拌機、還流冷却管、投入口および温度計付きの四口フラスコに、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン21.4g、水60g、トリフルオロメタンスルホン酸0.14gおよびトルエン200gを投入して混合し、攪拌しつつフェニルトリメトキシシラン151.5gを1時間かけて滴下し、滴下終了後、1時間加熱還流した。冷却後、下層を分離し、トルエン溶液層を3回水洗した。水洗したトルエン溶液層に5%炭酸水素ナトリウム水溶液100gを加え、攪拌しつつ75℃に昇温して1時間還流した。冷却後、下層を分離し、上層のトルエン溶液層を3回水洗した。残ったトルエン溶液層を減圧濃縮し、25℃で半固体状である下記平均単位式(12)で表されるメチルフェニルビニルポリシロキサン樹脂である分岐鎖状オルガノポリシロキサンB1を得た。
(ViMe2SiO1/2)0.25(PhSiO3/2)0.75 ・・・(12)
撹拌機、還流冷却管付きのフラスコに、下記式(13)で表されるシラノール基を有する直鎖状オルガノポリシロキサン100g、1,3-ジビニルテトラメチルジシロキサン60gおよびトリフルオロメタンスルホン酸0.1gを投入、撹拌し、70℃で2時間加熱し、トルエンを加え、トルエン層を3回水洗した後、減圧濃縮して、下記式(14)で表される直鎖状オルガノポリシロキサンY1を得た。
HO(Ph2SiO)5(Me2SiO)5H ・・・(13)
ViMe2SiO(Ph2SiO)5(Me2SiO)5SiViMe2 ・・・(14)
<硬化性樹脂組成物の製造>
下記第1表に示す成分を同表に示す量(単位:質量部)で用い、これらを真空攪拌機で均一に混合して硬化性樹脂組成物(以下、単に「組成物」ともいう。)を製造した。なお、同表中、「Si-H/Si-Viモル比」とは上述したとおりである。
製造された組成物を、150℃で2時間加熱して硬化させて、硬化物(厚さ=2.0mm)を得た。得られた硬化物について、JIS K 0115:2004に準じ、紫外・可視(UV-Vis)吸収スペクトル測定装置(島津製作所社製)を用いて波長400nmにおける透過率(単位:%)を測定した。測定結果を下記第1表に示す。透過率の値が80%以上であれば「透明性」に優れるものとして評価できる。
製造された組成物を、接着面積12.5mm×25mmとして、被着体(アルミニウム合金板、A1050P、パルテック社製)の間に挟み込んだ後、150℃で2時間加熱することにより硬化させ、試験体を得た。得られた試験体を用いて、JIS K6850:1999に準拠して、引張試験を行い、接着面積に対する凝集破壊(CF)面積の割合(単位:%)を測定した。結果を下記第1表に示す。CFの値が100に近いほど、密着性に優れるものとして評価できる。
製造された組成物を、150℃で2時間加熱して硬化させて、硬化物(厚さ=2.0mm)を製造し、製造した硬化物を180度に折り曲げた。折り曲げ線に亀裂が入らず硬化物が切断されなかった場合を「○」、折り曲げ線にやや亀裂が入ったが硬化物が切断されなかった場合を「△」、折り曲げ線に亀裂が入り硬化物が切断された場合を「×」とした。実用上、「○」または「△」であれば、折り曲げ物性に優れるものとして評価できる。
製造された組成物を、LEDパッケージ(エノモト社製)に塗布し、150℃で2時間加熱することにより硬化させて、試験体を作製した。なお、各例ごとに試験体を8個作製した。作製した8個の試験体を、以下4種の試験に供し、硬化物の剥離が確認されなかった試験体の個数をカウントした。この個数が多いほど、密着性に優れるものとして評価できる。
(リフロー試験)
試験体を、280℃に熱したホットプレート上に40秒間放置した後、硬化物の剥離の有無を目視にて確認した。
(耐湿リフロー試験1)
試験体を、温度30℃、湿度60%の環境下に72時間放置した後、上記リフロー試験を行い、硬化物の剥離の有無を目視にて確認した。
(湿熱試験)
試験体を、温度85℃、湿度85%の環境下に1000時間放置した後、硬化物の剥離の有無を目視にて確認した。
(耐湿リフロー試験2)
試験体を、温度30℃、湿度60%の環境下に192時間放置した後、上記リフロー試験を行い、硬化物の剥離の有無を目視にて確認した。
<Si-H系>
・直鎖状オルガノポリシロキサンA1:上述したもの(ケイ素原子結合水素原子の含有量:0.01質量%、ケイ素原子結合全有機基中のフェニル基の含有率:50モル%、Mw:15,000、粘度:10,000mPa・s)
・直鎖状オルガノポリシロキサンA2:上述したもの(ケイ素原子結合水素原子の含有量:0.02質量%、ケイ素原子結合全有機基中のフェニル基の含有率:49モル%、Mw:5,000、粘度:3,000mPa・s)
・直鎖状オルガノポリシロキサンA3:上述したもの(ケイ素原子結合水素原子の含有量:0.05質量%、ケイ素原子結合全有機基中のフェニル基の含有率:48モル%、Mw:2,800、粘度:1,200mPa・s)
・直鎖状オルガノポリシロキサンG2:上述したもの(ケイ素原子結合水素原子の含有量:0.40質量%、ケイ素原子結合全有機基中のフェニル基の含有率:50モル%)
・直鎖状オルガノポリシロキサンG3:上述したもの(ケイ素原子結合水素原子の含有量:0.35質量%、ケイ素原子結合全有機基中のフェニル基の含有率:52モル%)
・分岐鎖状オルガノポリシロキサンX1:上述したもの(ケイ素原子結合水素原子の含有量:0.38質量%、ケイ素原子結合全有機基中のフェニル基の含有率:60モル%、Mw:4,000、粘度:1,200mPa・s)
・分岐鎖状オルガノポリシロキサンB1:上述したもの(ビニル基の含有量:4.0質量%、ケイ素原子結合全有機基中のフェニル基の含有率:60モル%、Mw:1,500、粘度:非常に粘稠な半固体状物で粘度測定ができなかった)
・直鎖状オルガノポリシロキサンY1:上述したもの(ビニル基の含有量:4.5質量%、ケイ素原子結合全有機基中のフェニル基の含有率:50モル%、Mw:900、粘度:200mPa・s)
・低粘度オルガノポリシロキサンD1:下記平均単位式(15)で表されるオルガノポリシロキサン(ビニル基の含有量:8.8質量%、ケイ素原子結合全有機基中のフェニル基の含有率:36モル%、Mw:1,100、粘度:15,000mPa・s)
(PhSiO3/2)0.63(ViMe2SiO1/2)0.37 ・・・(15)
・密着付与剤F1:γ-グリシドキシプロピルトリメトキシシラン(信越化学工業社製KBM-403)と、フェニルトリメトキシシラン(信越化学工業社製KBM-103)と、1,3-ジビニル-1,1,3,3-テトラメチルジシロキサンとを脱水縮合させたエポキシシラン脱水縮合物
また、Si-H系の直鎖状オルガノポリシロキサンであっても、その重合度が1である直鎖状オルガノポリシロキサンG1のみを含有する比較例2についても、やはり、密着性が劣っていた。
また、実施例3~5を対比すると、低粘度オルガノポリシロキサンD1を含有する実施例4および5は、これを含有しない実施例3と比較して、耐湿リフロー試験2の結果が良好であり、より密着性に優れることが分かった。
また、直鎖状オルガノポリシロキサンG1~G3を含有する実施例3~6および8は、折り曲げ物性に優れることが分かった。
Claims (6)
- 1分子中に、少なくとも2個のケイ素原子結合水素原子および少なくとも1個のアリール基を有し、かつ、重合度が10超である直鎖状オルガノポリシロキサン(A)と、
1分子中に、少なくとも3個のアルケニル基および少なくとも1個のアリール基を有する分岐鎖状オルガノポリシロキサン(B)と、
ヒドロシリル化反応用触媒(C)と、
を含有する硬化性樹脂組成物。 - 前記直鎖状オルガノポリシロキサン(A)の重合度が30超である、請求項1に記載の硬化性樹脂組成物。
- 前記分岐鎖状オルガノポリシロキサン(B)が、下記平均単位式(4)で表されるオルガノポリシロキサンである、請求項1または2に記載の硬化性樹脂組成物。
(R3SiO3/2)a(R3 2SiO2/2)b(R3 3SiO1/2)c(SiO4/2)d(X1O1/2)e …(4)
(式(4)中、各R3は独立に、置換または非置換の一価炭化水素基である。ただし、1分子中、R3の少なくとも3個はアルケニル基であり、R3の少なくとも1個はアリール基である。
式(4)中、X1は水素原子またはアルキル基である。
式(4)中、aは正数であり、bは0または正数であり、cは0または正数であり、dは0または正数であり、eは0または正数であり、かつ、b/aは0~10の範囲内の数であり、c/aは0~5の範囲内の数であり、d/(a+b+c+d)は0~0.3の範囲内の数であり、e/(a+b+c+d)は0~0.4の範囲内の数である。) - さらに、25℃における粘度が50,000mPa・s以下である低粘度オルガノポリシロキサン(D)を含有する、請求項1~3のいずれかに記載の硬化性樹脂組成物。
- さらに、下記式(16)で表される直鎖状オルガノポリシロキサン(G)を含有する、請求項1~4のいずれかに記載の硬化性樹脂組成物。
HR2 2SiO(R2 2SiO)kSiR2 2H ・・・(16)
(式(16)中、各R2は独立に、アルキル基、アリール基、ヒドロキシ基、または、アルコキシ基であり、R2の少なくとも1個はアリール基である。
式(16)中、kは1~5の正数である。) - 光半導体素子封止用組成物である、請求項1~5のいずれかに記載の硬化性樹脂組成物。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013549650A JP5708824B2 (ja) | 2012-09-14 | 2013-08-26 | 硬化性樹脂組成物 |
EP13837529.0A EP2896658A4 (en) | 2012-09-14 | 2013-08-26 | HARDENABLE RESIN COMPOSITION |
US14/428,130 US9346954B2 (en) | 2012-09-14 | 2013-08-26 | Curable resin composition |
KR1020157005935A KR20150054801A (ko) | 2012-09-14 | 2013-08-26 | 경화성 수지 조성물 |
CN201380047280.5A CN104619780B (zh) | 2012-09-14 | 2013-08-26 | 固化性树脂组合物 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012-202767 | 2012-09-14 | ||
JP2012202767 | 2012-09-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014041994A1 true WO2014041994A1 (ja) | 2014-03-20 |
Family
ID=50278116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2013/072667 WO2014041994A1 (ja) | 2012-09-14 | 2013-08-26 | 硬化性樹脂組成物 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9346954B2 (ja) |
EP (1) | EP2896658A4 (ja) |
JP (1) | JP5708824B2 (ja) |
KR (1) | KR20150054801A (ja) |
CN (1) | CN104619780B (ja) |
TW (1) | TWI600715B (ja) |
WO (1) | WO2014041994A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015136820A1 (ja) * | 2014-03-12 | 2015-09-17 | 横浜ゴム株式会社 | 硬化性樹脂組成物 |
WO2016083224A1 (fr) * | 2014-11-27 | 2016-06-02 | Institut Vedecom | Encapsulation de composants electroniques dans des materiaux polymeres |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105452386B (zh) * | 2013-08-09 | 2018-12-11 | 横滨橡胶株式会社 | 可固化树脂组合物 |
TWI681992B (zh) * | 2014-11-20 | 2020-01-11 | 日商愛克工業股份有限公司 | 加成反應固化型樹脂組合物以及光半導體裝置 |
CN106317895B (zh) * | 2015-06-30 | 2019-09-06 | 广州慧谷化学有限公司 | 一种可固化的有机聚硅氧烷组合物及半导体器件 |
WO2018028792A1 (en) * | 2016-08-12 | 2018-02-15 | Wacker Chemie Ag | Curable organopolysiloxane composition, encapsulant and semiconductor device |
JP6702224B2 (ja) * | 2017-02-17 | 2020-05-27 | 信越化学工業株式会社 | 付加硬化性シリコーン樹脂組成物及び光半導体装置用ダイアタッチ材 |
US11091506B2 (en) * | 2017-08-16 | 2021-08-17 | Asahi Kasei Kabushiki Kaisha | Silanol composition, cured product, adhesive, and method for curing silanol composition |
WO2019187701A1 (ja) * | 2018-03-26 | 2019-10-03 | 横浜ゴム株式会社 | 硬化性樹脂組成物 |
JP7014745B2 (ja) * | 2019-01-29 | 2022-02-01 | 信越化学工業株式会社 | 付加硬化型シリコーン樹脂組成物及び光学素子 |
JP7415121B2 (ja) * | 2019-07-30 | 2024-01-17 | 横浜ゴム株式会社 | 自動車に搭載されるエアコンディショナー用配管システム |
CN114729191B (zh) * | 2019-07-30 | 2024-01-16 | 埃肯有机硅美国公司 | 能用于由液体有机硅橡胶组合物经由注射模塑生产模塑有机硅橡胶产品的方法和装置组件 |
JP7401247B2 (ja) * | 2019-10-08 | 2023-12-19 | 信越化学工業株式会社 | 硬化性組成物、その硬化物、及び半導体装置 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH111619A (ja) * | 1997-06-12 | 1999-01-06 | Shin Etsu Chem Co Ltd | 付加硬化型シリコーン樹脂組成物 |
US6432137B1 (en) * | 1999-09-08 | 2002-08-13 | Medennium, Inc. | High refractive index silicone for use in intraocular lenses |
JP2008111117A (ja) * | 2006-10-16 | 2008-05-15 | Rohm & Haas Co | 熱安定性アリールポリシロキサン組成物 |
WO2008123252A1 (ja) * | 2007-03-26 | 2008-10-16 | Nippon Steel Chemical Co., Ltd. | レンズ |
US20090105395A1 (en) * | 2006-04-25 | 2009-04-23 | Enikolopov Inst Of Synth Poly | Curable resin composition |
JP2009155442A (ja) * | 2007-12-26 | 2009-07-16 | Nippon Steel Chem Co Ltd | レンズ用樹脂組成物及びその硬化物 |
JP2009537992A (ja) * | 2006-05-17 | 2009-10-29 | スリーエム イノベイティブ プロパティズ カンパニー | 多層ケイ素含有封入材を有する発光デバイスを作製する方法 |
JP2010001336A (ja) | 2008-06-18 | 2010-01-07 | Dow Corning Toray Co Ltd | 硬化性オルガノポリシロキサン組成物及び半導体装置 |
CN101654560A (zh) * | 2009-07-10 | 2010-02-24 | 茂名市信翼化工有限公司 | 一种功率型led封装用的有机硅材料及其合成方法 |
JP2011190366A (ja) * | 2010-03-15 | 2011-09-29 | Shin-Etsu Chemical Co Ltd | 発光ダイオード用付加硬化型シリコーン樹脂組成物及び発光ダイオード |
JP2011246680A (ja) * | 2010-05-31 | 2011-12-08 | Shin-Etsu Chemical Co Ltd | 発光ダイオード用付加硬化型シリコーン樹脂組成物 |
JP2013139547A (ja) * | 2011-12-05 | 2013-07-18 | Jsr Corp | 硬化性組成物、硬化物および光半導体装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7060747B2 (en) * | 2001-03-30 | 2006-06-13 | Intel Corporation | Chain extension for thermal materials |
JP2004186168A (ja) * | 2002-11-29 | 2004-07-02 | Shin Etsu Chem Co Ltd | 発光ダイオード素子用シリコーン樹脂組成物 |
JP4908736B2 (ja) * | 2003-10-01 | 2012-04-04 | 東レ・ダウコーニング株式会社 | 硬化性オルガノポリシロキサン組成物および半導体装置 |
JP5136963B2 (ja) * | 2008-03-24 | 2013-02-06 | 信越化学工業株式会社 | 硬化性シリコーンゴム組成物及び半導体装置 |
JP5526823B2 (ja) * | 2009-02-24 | 2014-06-18 | 信越化学工業株式会社 | シリコーン樹脂で封止された光半導体装置 |
JP5549568B2 (ja) * | 2009-12-15 | 2014-07-16 | 信越化学工業株式会社 | 光半導体素子封止用樹脂組成物及び当該組成物で封止した光半導体装置 |
JP5553018B2 (ja) * | 2010-12-16 | 2014-07-16 | 信越化学工業株式会社 | 硬化性オルガノポリシロキサン組成物、光学素子封止材及び光学素子 |
EP2655057A2 (en) * | 2010-12-22 | 2013-10-30 | Dow Corning Corporation | Silicone composition, silicone adhesive, coated and laminated substrates |
TWI435914B (zh) * | 2010-12-31 | 2014-05-01 | Eternal Chemical Co Ltd | 可固化之有機聚矽氧烷組合物及其製法 |
JP5893874B2 (ja) * | 2011-09-02 | 2016-03-23 | 信越化学工業株式会社 | 光半導体装置 |
EP2878637B1 (en) * | 2012-07-27 | 2018-09-26 | LG Chem, Ltd. | Hardening composition |
-
2013
- 2013-08-26 WO PCT/JP2013/072667 patent/WO2014041994A1/ja active Application Filing
- 2013-08-26 JP JP2013549650A patent/JP5708824B2/ja active Active
- 2013-08-26 US US14/428,130 patent/US9346954B2/en active Active
- 2013-08-26 CN CN201380047280.5A patent/CN104619780B/zh not_active Expired - Fee Related
- 2013-08-26 EP EP13837529.0A patent/EP2896658A4/en not_active Withdrawn
- 2013-08-26 KR KR1020157005935A patent/KR20150054801A/ko not_active Application Discontinuation
- 2013-09-12 TW TW102132989A patent/TWI600715B/zh not_active IP Right Cessation
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH111619A (ja) * | 1997-06-12 | 1999-01-06 | Shin Etsu Chem Co Ltd | 付加硬化型シリコーン樹脂組成物 |
US6432137B1 (en) * | 1999-09-08 | 2002-08-13 | Medennium, Inc. | High refractive index silicone for use in intraocular lenses |
US20090105395A1 (en) * | 2006-04-25 | 2009-04-23 | Enikolopov Inst Of Synth Poly | Curable resin composition |
JP2009537992A (ja) * | 2006-05-17 | 2009-10-29 | スリーエム イノベイティブ プロパティズ カンパニー | 多層ケイ素含有封入材を有する発光デバイスを作製する方法 |
JP2008111117A (ja) * | 2006-10-16 | 2008-05-15 | Rohm & Haas Co | 熱安定性アリールポリシロキサン組成物 |
WO2008123252A1 (ja) * | 2007-03-26 | 2008-10-16 | Nippon Steel Chemical Co., Ltd. | レンズ |
JP2009155442A (ja) * | 2007-12-26 | 2009-07-16 | Nippon Steel Chem Co Ltd | レンズ用樹脂組成物及びその硬化物 |
JP2010001336A (ja) | 2008-06-18 | 2010-01-07 | Dow Corning Toray Co Ltd | 硬化性オルガノポリシロキサン組成物及び半導体装置 |
CN101654560A (zh) * | 2009-07-10 | 2010-02-24 | 茂名市信翼化工有限公司 | 一种功率型led封装用的有机硅材料及其合成方法 |
JP2011190366A (ja) * | 2010-03-15 | 2011-09-29 | Shin-Etsu Chemical Co Ltd | 発光ダイオード用付加硬化型シリコーン樹脂組成物及び発光ダイオード |
JP2011246680A (ja) * | 2010-05-31 | 2011-12-08 | Shin-Etsu Chemical Co Ltd | 発光ダイオード用付加硬化型シリコーン樹脂組成物 |
JP2013139547A (ja) * | 2011-12-05 | 2013-07-18 | Jsr Corp | 硬化性組成物、硬化物および光半導体装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2896658A4 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015136820A1 (ja) * | 2014-03-12 | 2015-09-17 | 横浜ゴム株式会社 | 硬化性樹脂組成物 |
JPWO2015136820A1 (ja) * | 2014-03-12 | 2017-04-06 | 横浜ゴム株式会社 | 硬化性樹脂組成物 |
US10100156B2 (en) | 2014-03-12 | 2018-10-16 | The Yokohama Rubber Co., Ltd. | Curable resin composition |
WO2016083224A1 (fr) * | 2014-11-27 | 2016-06-02 | Institut Vedecom | Encapsulation de composants electroniques dans des materiaux polymeres |
CN107109062A (zh) * | 2014-11-27 | 2017-08-29 | 维迪科研究所 | 电子部件在聚合物材料中的封装 |
US10242925B2 (en) | 2014-11-27 | 2019-03-26 | Institut Vedecom | Encapsulation of electronic components in polymer materials |
Also Published As
Publication number | Publication date |
---|---|
CN104619780A (zh) | 2015-05-13 |
JPWO2014041994A1 (ja) | 2016-08-18 |
US20150252191A1 (en) | 2015-09-10 |
US9346954B2 (en) | 2016-05-24 |
JP5708824B2 (ja) | 2015-04-30 |
KR20150054801A (ko) | 2015-05-20 |
TWI600715B (zh) | 2017-10-01 |
CN104619780B (zh) | 2017-07-07 |
TW201420684A (zh) | 2014-06-01 |
EP2896658A1 (en) | 2015-07-22 |
EP2896658A4 (en) | 2015-09-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5708824B2 (ja) | 硬化性樹脂組成物 | |
JP5972511B2 (ja) | 硬化性オルガノポリシロキサン組成物およびその硬化物 | |
KR101802736B1 (ko) | 가교결합성 실리콘 조성물 및 그의 가교결합 생성물 | |
US9564562B2 (en) | Silicone composition for sealing semiconductor | |
EP3591008B1 (en) | Curable silicone composition, cured product of same, and optical display | |
CN105733269A (zh) | 固化性硅树脂组合物 | |
US10100156B2 (en) | Curable resin composition | |
JP6400904B2 (ja) | 硬化性樹脂組成物 | |
JP5505436B2 (ja) | 硬化性組成物、硬化物、光半導体装置およびポリシロキサン | |
JP6015864B2 (ja) | 硬化性樹脂組成物 | |
KR20180128954A (ko) | 밀착 부여제 및 경화성 수지 조성물 | |
WO2014129347A1 (ja) | 硬化性樹脂組成物 | |
TWI801654B (zh) | 加成硬化型聚矽氧組成物及半導體裝置 | |
JP5913537B2 (ja) | 硬化性オルガノポリシロキサン組成物の製造方法 | |
JP5284490B2 (ja) | 半導体封止用シリコーン組成物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ENP | Entry into the national phase |
Ref document number: 2013549650 Country of ref document: JP Kind code of ref document: A |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13837529 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 20157005935 Country of ref document: KR Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14428130 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |