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WO2012093808A3 - Method and device for fingerprint resistant coating - Google Patents

Method and device for fingerprint resistant coating Download PDF

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Publication number
WO2012093808A3
WO2012093808A3 PCT/KR2011/010297 KR2011010297W WO2012093808A3 WO 2012093808 A3 WO2012093808 A3 WO 2012093808A3 KR 2011010297 W KR2011010297 W KR 2011010297W WO 2012093808 A3 WO2012093808 A3 WO 2012093808A3
Authority
WO
WIPO (PCT)
Prior art keywords
resistant coating
fingerprint resistant
evaporating
thin film
plasma
Prior art date
Application number
PCT/KR2011/010297
Other languages
French (fr)
Korean (ko)
Other versions
WO2012093808A2 (en
Inventor
김윤택
Original Assignee
바코스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 바코스 주식회사 filed Critical 바코스 주식회사
Priority to CN2011800640892A priority Critical patent/CN103282541A/en
Publication of WO2012093808A2 publication Critical patent/WO2012093808A2/en
Publication of WO2012093808A3 publication Critical patent/WO2012093808A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The present invention relates to a method and a device for a fingerprint resistant coating having an enhanced productivity by using in combination AC plasma reform method and thermal evaporation method instead of the conventional electron beam evaporation method, and more specifically, the present invention relates to a fingerprint resistant coating method comprising: a) a step for evaporating a SiOx (x is 1.5-2.0) thin film using the AC plasma method; and b) a step for evaporating through thermal evaporation a fluorine compound on the surface of a basic material having evaporated thereon the SiOx thin film.
PCT/KR2011/010297 2011-01-05 2011-12-29 Method and device for fingerprint resistant coating WO2012093808A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011800640892A CN103282541A (en) 2011-01-05 2011-12-29 Method and device for fingerprint resistant coating

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0001064 2011-01-05
KR1020110001064A KR20120079717A (en) 2011-01-05 2011-01-05 Anti-fingerprint coating method and device

Publications (2)

Publication Number Publication Date
WO2012093808A2 WO2012093808A2 (en) 2012-07-12
WO2012093808A3 true WO2012093808A3 (en) 2012-09-27

Family

ID=46457812

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/010297 WO2012093808A2 (en) 2011-01-05 2011-12-29 Method and device for fingerprint resistant coating

Country Status (3)

Country Link
KR (1) KR20120079717A (en)
CN (1) CN103282541A (en)
WO (1) WO2012093808A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101539624B1 (en) * 2013-08-08 2015-07-27 바코스 주식회사 Apparatus For Continuous Evaporation Material Feeding, and Apparatus and In-line Equipment For Anti-fingerprint Coating By Top-down Type Using The Same
CN104513950B (en) * 2014-10-29 2019-10-01 苏州东杏表面技术有限公司 A method of quickly preparing wear-resisting anti-soil film
KR102648216B1 (en) * 2016-07-06 2024-03-15 삼성디스플레이 주식회사 Window, display device including the same and manufacturing method of window

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051298A (en) * 1997-01-22 2000-04-18 Samsung Electronics Co., Limited Optical disc having protective films
JP2001137775A (en) * 1999-11-17 2001-05-22 Nisshin Steel Co Ltd Stainless steel plate coated with transparent fluororesin having high film hardness and excellent wear resistance
KR20070059512A (en) * 2005-12-06 2007-06-12 주식회사 탑테크이십일 An ion plating jig ass'y
US20100045911A1 (en) * 2008-08-19 2010-02-25 Hiraide Yoshifumi Liquid crystal display apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2519591Y (en) * 2001-11-07 2002-10-30 鸿富锦精密工业（深圳）有限公司 Portable electronic device casing
CN1696744A (en) * 2004-05-14 2005-11-16 毅强企业股份有限公司 Method for preparing large plastic eyeglass
CN102016106A (en) * 2008-04-25 2011-04-13 株式会社爱发科 Film-forming method and film-forming apparatus
CN101294270B (en) * 2008-06-06 2011-02-16 东北大学 Equipment and method for producing nichrome composite plate with vacuum arc ion plating

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6051298A (en) * 1997-01-22 2000-04-18 Samsung Electronics Co., Limited Optical disc having protective films
JP2001137775A (en) * 1999-11-17 2001-05-22 Nisshin Steel Co Ltd Stainless steel plate coated with transparent fluororesin having high film hardness and excellent wear resistance
KR20070059512A (en) * 2005-12-06 2007-06-12 주식회사 탑테크이십일 An ion plating jig ass'y
US20100045911A1 (en) * 2008-08-19 2010-02-25 Hiraide Yoshifumi Liquid crystal display apparatus

Also Published As

Publication number Publication date
CN103282541A (en) 2013-09-04
WO2012093808A2 (en) 2012-07-12
KR20120079717A (en) 2012-07-13

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