US20130181118A1 - Solid-state image pickup device and control method thereof, and camera - Google Patents
Solid-state image pickup device and control method thereof, and camera Download PDFInfo
- Publication number
- US20130181118A1 US20130181118A1 US13/788,782 US201313788782A US2013181118A1 US 20130181118 A1 US20130181118 A1 US 20130181118A1 US 201313788782 A US201313788782 A US 201313788782A US 2013181118 A1 US2013181118 A1 US 2013181118A1
- Authority
- US
- United States
- Prior art keywords
- charge
- photoelectric conversion
- conversion unit
- unit
- signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims description 17
- 238000006243 chemical reaction Methods 0.000 claims abstract description 154
- 239000003990 capacitor Substances 0.000 claims description 13
- 239000000969 carrier Substances 0.000 claims 14
- 238000012546 transfer Methods 0.000 abstract description 32
- 238000009792 diffusion process Methods 0.000 description 38
- 239000012535 impurity Substances 0.000 description 15
- 238000012545 processing Methods 0.000 description 14
- 238000001514 detection method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 238000000926 separation method Methods 0.000 description 7
- 230000003321 amplification Effects 0.000 description 6
- 238000012937 correction Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000003199 nucleic acid amplification method Methods 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 238000009825 accumulation Methods 0.000 description 5
- 230000001419 dependent effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 206010065042 Immune reconstitution inflammatory syndrome Diseases 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000005036 potential barrier Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000013144 data compression Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- H04N5/369—
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/59—Control of the dynamic range by controlling the amount of charge storable in the pixel, e.g. modification of the charge conversion ratio of the floating node capacitance
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/60—Noise processing, e.g. detecting, correcting, reducing or removing noise
- H04N25/62—Detection or reduction of noise due to excess charges produced by the exposure, e.g. smear, blooming, ghost image, crosstalk or leakage between pixels
- H04N25/621—Detection or reduction of noise due to excess charges produced by the exposure, e.g. smear, blooming, ghost image, crosstalk or leakage between pixels for the control of blooming
- H04N25/622—Detection or reduction of noise due to excess charges produced by the exposure, e.g. smear, blooming, ghost image, crosstalk or leakage between pixels for the control of blooming by controlling anti-blooming drains
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
- H04N25/771—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising storage means other than floating diffusion
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/78—Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
Definitions
- the present invention relates to a solid-state image pickup device, a control method thereof and a camera.
- buried structure means a structure having a reverse conducting-type impurity diffusion region formed on the surface of an impurity diffusion region for forming an FD. With such structure, the generation of dark current on the surface of the impurity diffusion region for forming an FD is reduced.
- the dark current in the impurity region for forming an FD is larger than that in the photoelectric conversion unit. Accordingly, the FD is not suitable for a node holding data. Charge spilling into the FD is lost as time passes, so a high S/N ratio cannot be expected for a signal from the high brightness portion.
- MOS solid-state image pickup device in which a plurality of light receiving units are arranged in an array on the surface of a semiconductor substrate and a signal at each light receiving unit is read out on a per light receiving unit basis, each said light receiving unit being provided with a first signal charge detecting unit for detecting a signal dependent on the amount of incident light, and a second signal charge detecting unit for capturing a part of excess carrier of the first signal charge detecting unit when the detection signal at the first signal detecting unit saturates and thereby detecting a signal dependent on the amount of captured charge.
- the second signal charge detecting unit 38 which detects a part of saturating electron when the saturation of electron generated in the first signal charge detecting unit 31 occurs. Part of excessive carrier is captured and the rest is drained out to a vertical type overflow drain (OFD).
- the first and second signal detection units are separately provided.
- the charge dumping side has a structure of vertical type OFD
- the charge capturing side has a structure of horizontal type OFD.
- barriers having a different structure must be exceeded in each side.
- the spilling ratio is controlled by potential barriers based on density profiles determined by a different semiconductor process.
- the amount of spilling-out current typically varies exponentially relative to potential controlling voltage. Consequently, it may be difficult to control the spilling ratio finely and highly accurately. From the above described reason, there is also a drawback that the flowing-out ratio between the vertical type OFD and horizontal type OFD has a temperature dependence.
- the vertical type OFD determines the saturation charge of PD. Accordingly, the range where the potential can be controlled is considerably limited. Practically, to compensate for this, it is essential for the horizontal type OFD structure to have a potential controlling mechanism. This causes problems of increased false signal (dark current) at a dark state, reduced yield associated with an increasing number of control lines, and the like.
- An object of the present invention is to cause a part of the charge spilling from a photoelectric conversion unit to flow into a charge holding unit and thereby extend dynamic range and at the same time improve image quality.
- a solid-state image pickup device has a pixel comprising: a photoelectric conversion unit generating and accumulating charge by means of photoelectric conversion; a first charge holding unit being shielded from light, and being adaptable to accumulate a part of charge spilling from the photoelectric conversion unit in a period when the photoelectric conversion unit generates and accumulates charge; an amplifying unit amplifying charge; a first transfer unit transferring the charge accumulated in the photoelectric conversion unit to the amplifying unit; and a second transfer unit transferring the charge accumulated in the first charge holding unit to the amplifying unit.
- a solid-state image pickup device control method is a method for controlling a solid-state image pickup device which has a pixel comprising: a photoelectric conversion unit for generating and adaptable to accumulate charge by means of photoelectric conversion; a first charge holding unit light-shielded for accumulating a part of charge spilling from the photoelectric conversion in a period when the photoelectric conversion unit generates and accumulates charge; and an amplifying unit for amplifying charge, wherein charge is transferred in such a way that a path for transferring the charge accumulated in the photoelectric conversion unit to the amplifying unit is different from that for transferring the charge accumulated in the first charge holding unit to the amplifying unit.
- a camera comprises: the solid-state image pickup device; a lens focusing an optical image on the solid-state image pickup device; and an aperture varying the amount of light passing through the lens.
- FIG. 1 is a view showing an exemplary structure of a solid-state image pickup device according to a first embodiment of the present invention
- FIG. 2A is a graph showing a relationship between light quantity and signal charge of a photoelectric conversion unit
- FIG. 2B is a graph showing a relationship between light quantity and signal charge of a charge holding unit
- FIG. 3 is an equivalent circuit diagram of the solid-state image pickup device of FIG. 1 ;
- FIG. 4 is a timing chart showing an example of operation of the circuit of FIG. 3 ;
- FIG. 5 is a view showing an exemplary structure of a solid-state image pickup device according to a second embodiment of the present invention.
- FIG. 6A is a graph showing a relationship between light quantity and signal charge of the solid-state image pickup device according to the second embodiment
- FIG. 6B is a graph showing a relationship between light quantity and pixel signal of the solid-state image pickup device according to the second embodiment
- FIG. 7 is a block diagram showing an exemplary structure of a still video camera according to a third embodiment of the present invention.
- FIG. 8 is a block diagram showing an exemplary structure of a video camera according to a fourth embodiment of the present invention.
- FIG. 9 is a timing chart showing another example of operation of the solid-state image pickup device.
- FIG. 1 is a view showing an exemplary structure of a solid-state image pickup device according to a first embodiment of the present invention.
- the solid-state image pickup device has a plurality of pixels arranged in a two-dimensional array.
- an n-channel MOS field-effect transistor is simply referred to as a MOS transistor.
- a pixel includes transfer MOS transistors Tx-MOS and Ty-MOS, a reset MOS transistor RES-MOS, a source follower MOS transistor SF-MOS and a select MOS transistor SEL-MOS.
- the source and drain of the transfer MOS transistor Tx-MOS correspond to a photodiode PD 101 functioning as a photoelectric conversion unit and a floating diffusion FD.
- the source and drain of the transfer MOS transistor Ty-MOS correspond to a charge holding unit 102 and an FD.
- the photoelectric conversion unit 101 and charge holding unit 102 have a structure having a reverse conducting-type impurity region formed on the surface of an impurity region accumulating and holding charge.
- the photoelectric conversion unit 101 is opened and the charge holding unit 102 is light-shielded.
- the photoelectric conversion unit 101 has the circumference thereof enclosed by an element separation portion 103 .
- the element separation portion 103 has a higher potential barrier than that of the photoelectric conversion unit 101 against the charge accumulated in the photoelectric conversion unit 101 , so the photoelectric conversion unit 101 can accumulate a predetermined amount of charge. Referring to FIG.
- the photoelectric conversion unit 101 has a drain portion 104 a provided upward thereof via the element separation portion 103 , a drain portion 104 b provided to the left thereof, and the charge holding unit 102 provided downward thereof.
- the charge holding unit 102 has the drain portion 104 b provided to the left thereof and a drain portion 104 c provided downward thereof.
- the drain portions 104 a, 104 b and 104 c are separately or collectively referred to as a drain portion 104 .
- the drain portion 104 is connected to a fixed power source potential VDD.
- the drain portion 104 a is the drain of the reset MOS transistor RES-MOS, for example.
- the circumference of the drain portion 104 is enclosed by an element separation portion 105 .
- the element separation portion 105 prevents charge from leaking from the self pixel to a neighboring pixel.
- the photoelectric conversion unit 101 has a rectangular planar shape and has the drain portions 104 a and 104 b disposed opposite the two sides of the rectangular shape, and the charge holding unit 102 is disposed opposite another side.
- the element separation portion 105 includes the drain portion 104 .
- the drain portion can double as an impurity diffusion region such as the drain and source of a MOS transistor used as an amplifying unit or the like. This indicates that the structure of the present invention, i.e., the use of a lateral overflow mechanism is suitable for an amplification type solid-state image pickup device having MOS transistors within a pixel.
- the photoelectric conversion unit 101 is a photodiode generating and accumulating charge by means of photoelectric conversion, for example.
- the floating diffusion FD is a diffusing region accumulating charge and converting it to voltage.
- the gate of the transfer MOS transistor Tx-MOS serves to transfer charge generated by the photoelectric conversion unit 101 to the floating diffusion FD. By turning off the transfer gate, the photoelectric conversion unit 101 can generate and accumulate charge by means of photoelectric conversion. After completion of the accumulation time, by turning on the transfer gate, the charge accumulated in the photoelectric conversion unit 101 can be transferred (read out) to the floating diffusion FD.
- FIG. 2A is a graph showing a relationship between light quantity and signal charge of the photoelectric conversion unit 101 .
- the accumulatable amount of signal charge A 1 is fixed. Accordingly, when strong light is irradiated on the photoelectric conversion unit 101 , charge spills from the photoelectric conversion unit 101 and the photoelectric conversion unit 101 saturates at a light quantity t 1 . A part of charge spilling from the photoelectric conversion unit 101 flows into the charge holding unit 102 and the rest of charge is drained out to the drain portion 104 .
- FIG. 2B is a graph showing a relationship between light quantity and signal charge of the charge holding unit 102 .
- the charge holding unit 102 also, the accumulatable amount of signal charge A 2 is fixed, and hence the spilling charge is drained out to the drain portion 104 .
- Characteristic line 201 indicates a case where the charge spilling from the photoelectric conversion unit 101 entirely flows into the charge holding unit 102 .
- the slope of the characteristic line 201 of the charge holding unit 102 is identical to that of the characteristic line of the photoelectric conversion unit 101 of FIG. 2A . In this case, however, the charge holding unit 102 saturates at a relatively small light quantity.
- Characteristic line 202 indicates a case where from among the charge spilling from the photoelectric conversion unit 101 , one part flows into the charge holding unit 102 and the rest is drained out to the drain portion 104 .
- the slope of the characteristic line 202 of the charge holding unit 102 is less steep than that of the characteristic line of the photoelectric conversion unit 101 of FIG. 2A . Accordingly, even when strong light is irradiated on the photoelectric conversion unit 101 , the charge holding unit 102 hardly saturates. Dynamic range of pixel signal can thus be extended.
- the holding unit can have the same structure as that of the photoelectric conversion unit. Thus, even when the spilling ratio is reduced, detection with a small noise influence and a high sensitivity is possible.
- the charge holding unit 102 has a lateral (horizontal type) overflow drain structure, whereby a part of charge spilling from the photoelectric conversion unit 101 flows into the charge holding unit 102 .
- the drain portion 104 also has a horizontal type overflow drain structure, whereby another part of charge spilling from the photoelectric conversion unit 101 is drained out to the drain portion 104 . More specifically, the charge holding unit 102 and drain portion 104 are disposed at the same depth from the main surface of a semiconductor substrate.
- length L 1 represents the length of the side of the photoelectric conversion unit 101 opposite the drain portion 104 a.
- Length L 2 represents the length of the side of the photoelectric conversion unit 101 opposite the charge holding unit 102 .
- Length L 3 represents the length of the side of the photoelectric conversion unit 101 opposite the drain portion 104 b.
- the flowing-in amount per unit side is considered to be equal for each side, so the above ratio is obtained.
- a variation in process causes a small variation in potential barrier.
- the flowing-in amount per unit side is equal.
- an impurity region such as a MOS transistor, connected to the power source terminal is used, so any additional area is not particularly needed.
- a vertical (vertical type) overflow drain is employed, the impurity density of the lower part of the charge accumulation region must be low; thus the saturation charge A 1 of the photoelectric conversion unit 101 is reduced.
- a horizontal type overflow drain is employed, so the saturation charge A 1 of the photoelectric conversion unit 101 is not reduced. It is important that even when dynamic range is extended by the charge holding unit 102 , the saturation charge A 1 of the photoelectric conversion unit 101 being the main unit can be kept at a high level.
- the horizontal type overflow drain structure by virtue of the horizontal type overflow drain structure, there are provided a path for draining out to a fixed potential of the drain portion 104 the charge spilling from the photoelectric conversion unit 101 , and a path for draining it out to the charge holding unit 102 .
- the adjustment can be made by means of at least one of (1) widths L 1 and L 3 of the photoelectric conversion unit 101 neighboring the drain portion 104 , (2) length W 1 of the drain portion 104 , (3) width L 2 of the charge holding unit 102 , (4) length W 2 of the charge holding unit, and so on. It is also possible to have a different impurity profile between each region to send a desired percentage of spilling-out charge to the charge holding unit 102 .
- the photoelectric conversion unit 101 and charge holding unit 102 have a structure having a reverse conducting-type impurity region formed on the surface of an impurity region which accumulates and holds charge.
- the photoelectric conversion unit 101 is opened and the charge holding unit 102 is light-shielded.
- the photoelectric conversion unit 101 and charge holding unit 102 have the same structure and have a reverse conducting-type impurity region formed on the surface thereof, so even when a signal of the photoelectric conversion unit 101 is added to that of the charge holding unit 102 , noises hardly occur.
- the percentage of charge spilling from the photoelectric conversion unit 101 and flowing into the charge holding unit 102 is controlled by the area and the circumference length of the photoelectric conversion unit 101 , the charge holding unit 102 and the drain portion 104 , so the influence from a variation in process hardly exists.
- Negative charge (electron) photoelectrically converted by the photoelectric conversion unit 101 is accumulated in the first conducting-type (n-type) charge accumulation region of the photoelectric conversion unit 101 .
- the charge holding unit 102 is a light-shielded region separated from the photoelectric conversion unit 101 .
- the photoelectric conversion unit 101 is connected to a source follower MOS transistor SF-MOS constituting a source follower amplifier via a first transfer unit (the gate of MOS transistor Tx-MOS).
- the charge holding unit 102 is connected to a source follower MOS transistor SF-MOS constituting a source follower amplifier via a second transfer unit (the gate of MOS transistor Ty-MOS).
- the source follower amplifiers amplify the signal charge of the photoelectric conversion unit 101 and charge holding unit 102 .
- FIG. 3 is an equivalent circuit diagram of the solid-state image pickup device of FIG. 1 .
- FIG. 4 is a timing chart showing an example of operation of the circuit of FIG. 3 .
- Potential Ores denotes a gate potential of reset MOS transistor RES-MOS
- potential ⁇ tx denotes a gate potential of transfer MOS transistor Tx-MOS
- potential ⁇ ty denotes a gate potential of transfer MOS transistor Ty-MOS
- potential ⁇ sel denotes a gate potential of select MOS transistor SEL-MOS
- potential ⁇ CtsFD denotes a gate potential of transfer MOS transistor 411
- potential ⁇ Ctn denotes a gate potential of transfer MOS transistor 413
- potential ⁇ CtsPD denotes a gate potential of transfer MOS transistor 412 .
- potential ⁇ res is positive (ON) and potentials ⁇ tx, ⁇ ty, ⁇ sel, ⁇ CtsFD, ⁇ Ctn and ⁇ CtsPD are 0 V (OFF).
- the reset MOS transistor RES-MOS is turned on, the power source potential VDD is supplied to a floating diffusion FD.
- timing T 1 positive pulse are applied as potentials ⁇ tx and ⁇ ty.
- the transistors Tx-MOS and Ty-MOS are turned on to apply the power source potential VDD to the floating diffusion FD, the photoelectric conversion unit 101 and the charge holding unit 102 to reset them.
- potential ⁇ res is lowered to 0 V, and the reset MOS transistor RES-MOS is turned off.
- potentials ⁇ tx and ⁇ ty are lowered to, for example, ⁇ 1.3 V to change the photoelectric conversion unit 101 , the charge holding unit 102 and the floating diffusion FD to a floating state.
- an external mechanical shutter is still not opened, and the accumulation of photoinduced charge has not started yet in the photoelectric conversion unit 101 .
- a mechanical shutter 53 (refer to FIG. 7 ) is opened, and light is irradiated on the photoelectric conversion unit 101 , and the photoelectric conversion unit 101 begins to generate and accumulate photoinduced charge.
- weak light is irradiated on the photoelectric conversion unit 101
- the photoelectric conversion unit 101 does not saturate and charge does not flow from the photoelectric conversion unit 101 into the charge holding unit 102 .
- strong light is irradiated on the photoelectric conversion unit 101
- the photoelectric conversion unit 101 saturates and a part of charge flows from the photoelectric conversion unit 101 into the charge holding unit 102 .
- timing T 3 the shutter 53 is closed, and the photoelectric conversion unit 101 is changed to a light-shielded state, and the generation of photoinduced charge in the photoelectric conversion unit 101 is terminated.
- a positive pulse is applied as potential ⁇ ty.
- the transfer MOS transistor Ty-MOS is turned on to read out the negative charge accumulated in the charge holding unit 102 into the floating diffusion FD.
- a solid line drawn in the potential of the floating diffusion FD indicates a case where weak light is irradiated and no charge spills from the photoelectric conversion unit 101 to the charge holding unit 102 .
- a broken line drawn in the potential of the floating diffusion FD indicates a case where strong light is irradiated and charge spills from the photoelectric conversion unit 101 to the charge holding unit 102 .
- timing T 5 potential ⁇ sel is changed from 0 V to a positive value.
- the select MOS transistor SEL-MOS is turned on to change a signal output line 401 to an active state.
- the source follower MOS transistor SF-MOS constituting a source follower amplifier, outputs an output voltage to the signal output line 401 according to the potential of the floating diffusion FD.
- a positive pulse is applied as potential ⁇ CtsFD.
- the transistor 411 is turned on to cause a potential of the signal output line 401 dependent on the potential of the floating diffusion FD to be accumulated in capacitance CtsFD.
- charge does not spill out to the charge holding unit 102 , so an output dependent on the reset voltage VDD of the floating diffusion FD is accumulated in capacitance CtsFD.
- a lower output than the reset voltage VDD of the floating diffusion FD is accumulated in capacitance CtsFD.
- a positive pulse is applied as potential ⁇ res.
- the reset MOS transistor RES-MOS is turned on to reset again the floating diffusion FD to the reset voltage VDD.
- a positive pulse is applied as potential ⁇ Ctn.
- the MOS transistor 413 is turned on to cause an offset noise voltage of the signal output line 401 obtained when the floating diffusion FD is reset, to be accumulated in capacitance Ctn.
- timing T 9 a positive pulse is applied as potential ⁇ tx.
- the transfer MOS transistor Tx-MOS is turned on to read out the charge accumulated in the photoelectric conversion unit 101 into the floating diffusion FD.
- a positive pulse is applied as potential ⁇ CtsPD.
- the MOS transistor 412 is turned on to cause a voltage of the signal output line 401 dependent on the charge read out from the photoelectric conversion unit 101 to the floating diffusion FD, to be accumulated in capacitance CtsFD.
- a voltage corresponding to offset noise is accumulated in capacitance Ctn; a voltage corresponding to charge spilling from the photoelectric conversion unit 101 to the charge holding unit 102 is accumulated in capacitance CtsFD; and a voltage corresponding to the accumulated charge in the photoelectric conversion unit 101 is accumulated in capacitance CtsPD.
- FIG. 9 shows another example.
- FIG. 9 is a timing chart showing an example of operation in a structure in which, as capacitance Ctn accumulating a voltage corresponding to offset noise shown in FIG. 3 , there are further provided two capacitances, that is, capacitance CtnPD for the photoelectric conversion unit 101 and capacitance CtnFD for the charge holding unit 102 .
- capacitance CtnPD for the photoelectric conversion unit 101
- CtnFD for the charge holding unit 102
- MOS transistors 413 there are also two MOS transistors 413 ; one of them is controlled by gate potential ⁇ CtnPD and the other by gate potential ⁇ CtnFD.
- Timing T 1 is a reset period of the photoelectric conversion unit 101 and charge holding unit 102 .
- Timing T 2 to T 3 is a light irradiation period.
- Timing T 4 is a read initiation (reset release) period.
- Timing T 5 is a noise voltage write period for reading from the charge holding unit 102 .
- Timing T 6 is a period for transferring a signal from the charge holding unit 102 to the floating diffusion FD.
- Timing T 7 is a signal voltage write period for reading from the charge holding unit 102 .
- Timing T 8 is a period for resetting the floating diffusion FD.
- Timing T 9 is a noise voltage write period for reading from the photoelectric conversion unit 101 .
- Timing T 10 is a period for transferring a signal from the photoelectric conversion unit 101 to the floating diffusion FD.
- Timing T 11 is a signal voltage write period for reading from the photoelectric conversion unit 101 .
- Timing T 12 is a read completion (reset ON) period. More detailed descriptions will be given below.
- timing T 2 to T 3 a mechanical shutter 53 is opened to expose the photoelectric conversion unit 101 .
- timing T 4 potential ⁇ res is changed to 0 V to initiate the read.
- a positive pulse is applied as potential ⁇ CtnFD to cause N signal (offset noise) of the charge holding unit 102 to be accumulated.
- a positive pulse is applied as potential ⁇ ty to transfer signal charge accumulated in the charge holding unit 102 .
- a positive pulse is applied as potential ⁇ CtsFD to cause S signal (proper signal) to be accumulated in capacitance CtsFD.
- a differential amplifier 421 outputs a voltage obtained by subtracting the noise voltage of capacitance Ctn from the signal voltage of capacitance CtsFD.
- a differential amplifier 422 outputs a voltage obtained by subtracting the noise voltage of capacitance Ctn from the signal voltage of capacitance CtsPD.
- An amplifier 423 amplifies the output of the differential amplifier 421 .
- An amplifier 424 amplifies the output of the differential amplifier 422 .
- the gain of the amplifiers 423 and 424 is determined by the ratio between the amount of charge flowing into the charge holding unit 102 from among the charge spilling from the photoelectric conversion unit 101 and the amount drained out to the drain portion 104 .
- a description will be given of an example in which 1 ⁇ 3 of the charge spilling from the photoelectric conversion unit 101 flows into the charge holding unit 102 and 2 ⁇ 3 of the charge is drained out to the drain portion 104 .
- the input signal of the amplifier 423 is tripled to be outputted, and the input signal of the amplifier 424 is directly outputted. More specifically, this means that three times the amount of charge spilling out to the charge holding unit 102 is equal to the amount of charge spilling from the photoelectric conversion unit 101 .
- An adder 425 adds the outputs of the amplifiers 423 and 424 and outputs the resultant pixel signal.
- the pixel signal is generated based on the charge accumulated in the photoelectric conversion unit 101 and that spilling into the charge holding unit 102 .
- the dynamic range of pixel signal can be extended.
- An amplifier 426 amplifies the output of the adder 425 according to ISO sensitivity and outputs the resultant signal. When the value of ISO sensitivity is small, the gain is small; when the value of ISO sensitivity is large, the gain is large.
- the above elements constitute the pixel signal generation unit.
- the pixel signal generation unit generates pixel signal according to the charge accumulated in the photoelectric conversion unit 101 and that accumulated in the charge holding unit 102 .
- the ratio of the charge spilling from the photoelectric conversion unit 101 and flowing into the charge holding unit 102 can be controlled with high accuracy, thus extending dynamic range and at the same time improving image quality.
- both the structure for the overflow from the photoelectric conversion unit 101 to the charge holding unit 102 and that for the overflow from the photoelectric conversion unit 101 to the drain portion 104 are of horizontal type overflow drain. Accordingly, the ratio of the amount of spilling charge between the two structures can easily be controlled.
- FIG. 5 is a view showing an exemplary structure of a solid-state image pickup device according to a second embodiment of the present invention. The difference between FIG. 5 and FIG. 1 will now be described.
- a first charge holding unit 102 a and a second charge holding unit 102 b are provided instead of the charge holding unit 102 of FIG. 1 .
- the charge holding units 102 a and 102 b are separately or collectively referred as a charge holding unit 102 .
- the source and drain of a transfer MOS transistor Ty-MOS correspond to the first charge holding unit 102 a and floating diffusion FD.
- the charge accumulated in the first charge holding unit 102 a can be read out from the floating diffusion FD.
- the source and drain of a transfer MOS transistor Tz-MOS correspond to the second charge holding unit 102 b and floating diffusion FD.
- the gate of the MOS transistor Tz-MOS By controlling the gate of the MOS transistor Tz-MOS, the charge accumulated in the second charge holding unit 102 b can be read out from the floating diffusion FD.
- a drain portion 104 d disposed between the photoelectric conversion unit 101 and the first charge holding unit 102 a, drains out a part of the charge spilling from the photoelectric conversion unit 101 .
- a drain portion 104 e disposed between the first charge holding unit 102 a and second charge holding unit 102 b, drains out a part of the charge spilling from the first charge holding unit 102 a.
- the drain portions 104 a to 104 e are separately or collectively referred to as a drain portion 104 .
- a part of the charge spilling from the photoelectric conversion unit 101 flows into the first charge holding unit 102 a , another part thereof flows into the second charge holding unit 102 b , and the rest thereof is drained out to the drain portion 104 .
- the first charge holding unit 102 a saturates, a part of the charge spilling from the first charge holding unit 102 a flows into the second charge holding unit 102 b , and the rest thereof is drained out to the drain portion 104 .
- a direct flow path from the photoelectric conversion unit 101 to the second charge holding unit 102 b is not always needed. For example, it is possible to cause 1 ⁇ 2 the amount of charge spilling from the photoelectric conversion unit 101 to flow into the first charge holding unit 102 a , and further to cause 1 ⁇ 2 the amount of charge spilling from the first charge holding unit 102 a to flow into the second charge holding unit 102 b.
- the second charge holding unit 102 b can be two-dimensionally disposed. Thus it is further possible to capture the charge spilling from the first charge holding unit 102 a into the second charge holding unit 102 b , whereby dynamic range can be further extended.
- FIG. 6A is a graph showing a relationship between light quantity and signal charge of a solid-state image pickup device according to the present embodiment.
- Signal charge represents the total amount of charge accumulated in the photoelectric conversion unit 101 and the charge holding units 102 a and 102 b .
- Region 601 indicates the signal charge accumulated in the photoelectric conversion unit 101 before the photoelectric conversion unit 101 saturates.
- Region 602 indicates a region where a part of the charge accumulated in the photoelectric conversion unit 101 flows into the first charge holding unit 102 a after the photoelectric conversion unit 101 saturates.
- Region 603 indicates a region where a part of the charge accumulated in the first charge holding unit 102 a flows into the charge holding unit 102 b after the first charge holding unit 102 a saturates.
- the slope of characteristic line becomes gradually gentle from region 601 to region 603 .
- signal charge as it is can be considered as pixel signal. More specifically, the amplifiers 423 and 424 of FIG. 3 are not always needed.
- FIG. 6B is a graph showing a relationship between light quantity and pixel signal of the solid-state image pickup device according to the present embodiment.
- Pixel signal is obtained by applying gain correction to the signal charge in each region 601 to 603 of FIG. 6 by use of the amplifiers 423 and 424 and the like. In the entire region 601 to 603 , pixel signal can hold a linear characteristic relative to light quantity.
- the first charge holding unit 102 a and the second charge holding unit 102 b can easily be stepwise disposed, whereby the linear characteristic of FIG. 6(A) can have continuity.
- the charge accumulated in the photoelectric conversion unit 101 is more important than that accumulated in the charge holding units 102 a and 102 b . Accordingly, it is preferable that the ratio of the amount of charge flowing into the second charge holding unit 102 b is controlled by sufficiently turning off the transfer gate (the gate of transistor Tx-MOS) of the photoelectric conversion unit 101 and controlling the low-level potential of the transfer gate (the gate of transistor Ty-MOS) of the first charge holding unit 102 a.
- the voltage amplification may also be performed by adjusting the capacitance value (size) or the like of capacitances CtsFD and CtsPD without using the amplifiers 423 and 424 .
- FIG. 7 is a block diagram showing an exemplary structure of a still video camera according to a third embodiment of the present invention.
- An example where the solid-state image pickup device according to the first and second embodiments is applied to a still video camera will be described in detail with reference to FIG. 7 .
- a solid-state image pickup device 54 and a unit processing image pickup signal 55 correspond to the above solid state image pickup device.
- reference numeral 51 denotes a barrier doubling as a protect of lens and a main switch
- 52 denotes a lens focusing an optical image of a subject on the solid-state image pickup device 54
- 53 denotes an aperture (and a shutter) adjusting the amount of light passing through the lens 52
- 54 denotes a solid-state image pickup device capturing a subject focused through the lens 52 as an image signal
- 55 denotes a unit processing image pickup signal applying an analog signal processing to an image pickup signal (image signal) outputted from the solid-state image pickup device 54
- 56 denotes an A/D converter converting from analog to digital form an image signal outputted from the unit processing image pickup signal 55
- 57 denotes a signal processing unit performing various corrections and data compression on image data outputted from the A/D converter 56
- 58 denotes a timing generator outputting various timing signals to the solid-state image pickup device 54 , the unit processing image pickup signal 55 , the A/D converter 56 and the signal processing
- the unit controlling whole and arithmetic operation 59 opens the aperture 53 , and a signal outputted from the solid-state image pickup device 54 passes through the unit processing image pickup signal 55 and is converted by the A/D converter 56 and then supplied to the signal processing unit 57 . Based on the resultant data, an exposure calculation is made by the unit controlling whole and arithmetic operation 59 . Brightness is determined based on the photometry result. According to the determination result, the unit controlling whole and arithmetic operation 59 controls the aperture 53 .
- the unit controlling whole and arithmetic operation 59 extracts a high-frequency component and performs a calculation of the distance up to the subject. Then the lens is driven to determine whether or not the lens is in focus. If not, the lens is driven again to determine the distance. After it is confirmed that the lens is in focus, the shutter 53 is opened to initiate the actual exposure.
- the signal outputted from the solid-state image pickup device 54 passes through the unit processing image pickup signal 55 , is A/D converted by the A/D converter 56 , passes through the signal processing unit 57 , and is written into the memory unit 60 by the unit controlling whole and arithmetic operation 59 .
- the data stored in the memory unit 60 is recorded onto the detachable recording medium 62 , such as a semiconductor memory, via the I/F unit controlling recording medium 61 .
- the data may be directly supplied to a computer or the like via the external I/F unit 63 to be subjected to an image processing.
- the timing generator 58 controls the signals of FIG. 4 including ⁇ res, ⁇ tx, ⁇ ty, ⁇ sel, ⁇ CtsFD, ⁇ Ctn and ⁇ CtsPD.
- FIG. 8 is a block diagram showing an exemplary structure of a video camera according to a fourth embodiment of the present invention. An embodiment where the solid-state image pickup device according to the first and second embodiments is applied to a video camera will be described in detail with reference to FIG. 8 .
- Reference numeral 1 denotes a photographing lens comprising a focus lens 1 A adjusting the focus, a zoom lens 1 B performing a zoom operation and a lens 1 C focusing an optical image
- 2 denotes an aperture and a shutter
- 3 denotes a solid-state image pickup device photoelectrically converting a subject image focused on the image pickup surface into an electrical image pickup signal
- 4 denotes a S/H circuit sampling and holding an image pickup signal outputted from solid-state image pickup device 3 and further amplifying the level.
- the S/H circuit 4 outputs a video signal.
- Reference numeral 5 denotes a process circuit applying predetermined processings, including y correction, color separation and blanking, to a video signal outputted from the S/H circuit 4 .
- the process circuit outputs a luminance signal Y and a chrominance signal C.
- a chrominance signal C outputted from the process circuit 5 is subjected to white balance and color balance correction by a color signal correction circuit 21 and outputted as chrominance difference signals R-Y and B-Y.
- the luminance signal Y outputted from the process circuit 5 and the chrominance difference signals R-Y and B-Y outputted from the color signal correction circuit 21 are subjected to modulation by an encoder circuit (ENC circuit) 24 and outputted as a standard television signal. Then the signal is supplied to a video recorder (not shown) or an electric viewfinder such as a monitor electric view finder (EVF).
- EEC circuit encoder circuit
- Reference numeral 6 denotes an IRIS control circuit controlling an IRIS drive circuit 7 based on the video signal supplied from the S/H circuit 4 ; an ig meter 8 is automatically controlled to control the amount of opening of the aperture 2 so that the level of video signal has a predetermined value (a fixed value).
- Reference numerals 13 and 14 denote bandpass filters (BPF) having a different bandpass width from each other and extracting high-frequency components needed to perform focus detection from the video signal outputted from the S/H circuit 4 .
- the signals outputted from the first bandpass filter 13 (BPF 1 ) and the second bandpass filter 14 (BPF 2 ) are each gated by a gate circuit 15 and a focus gate frame signal and then the peak value thereof is detected by a peak detection circuit 16 and held.
- the resultant signal is supplied to a logic control circuit 17 . This signal is referred to as a focus voltage. Focusing is performed by this focus voltage.
- Reference numeral 18 denotes a focus encoder detecting a movement position of the focus lens 1 A
- 19 denotes a zoom encoder detecting a focal distance of the zoom lens 1 B
- 20 denotes an IRIS encoder detecting the amount of opening of the aperture 2 .
- the detection values from these encoders are supplied to the logic control circuit 17 for system control.
- the logic control circuit 17 Based on a video signal corresponding to a set focus detection range, the logic control circuit 17 performs focus detection and focus adjustment with respect to the subject. More specifically, the peak value information on the high-frequency component supplied from each bandpass filter 13 and 14 is acquired and then control signals controlling the rotation direction and rotation speed of a focus motor 10 or turning on/off the motor are supplied to the motor so that the focus lens 1 A is driven to a position where the peak value of high-frequency component becomes maximum.
- a zoom drive circuit 11 In response to a zoom instruction, a zoom drive circuit 11 causes a zoom motor 12 to rotate. When the zoom motor 12 rotates, the zoom lens 1 B moves, whereby zooming is performed.
- the charge holding unit 102 accumulates a part of the charge spilling from the photoelectric conversion unit 101 .
- the gate of transistor Tx-MOS is a first transfer unit transferring to the source follower amplifier SF-MOS the charge accumulated in the photoelectric conversion unit 101 .
- the gate of transistor Ty-MOS is a second transfer unit transferring to the source follower amplifier SF-MOS the charge accumulated in the charge holding unit 102 .
- the drain portion 104 is used to drain out another part of the charge spilling from the photoelectric conversion unit 101 .
- Charge is transferred in such a way that a path for transferring the charge accumulated in the photoelectric conversion unit 101 to the source follower amplifier SF-MOS is different from that for transferring the charge accumulated in the charge holding unit 102 to the source follower amplifier SF-MOS.
- the second charge holding unit 102 b accumulates a part of the charge spilling from the first charge holding unit 102 a .
- the gate of transistor Tz-MOS is a third transfer unit transferring to the source follower amplifier SF-MOS the charge accumulated in the second charge holding unit 102 b.
- the ratio of the charge spilling from the photoelectric conversion unit 101 and flowing into the charge holding unit 102 can be controlled with high accuracy, thus extending dynamic range and at the same time improving image quality.
- both the structure for the overflow from the photoelectric conversion unit 101 to the charge holding unit 102 and that for the overflow from the photoelectric conversion unit 101 to the drain portion 104 are of horizontal type overflow drain. Accordingly, the ratio of the amount of spilling charge between the two structures can easily be controlled.
- an image may be produced based on only the carrier overflowed into the storage capacitor.
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
An object of the invention is to cause a part of charge spilling from a photoelectric conversion unit to flow into a charge holding unit and thereby extend dynamic range and at the same time improve image quality. There is provided a solid-state image pickup device having a pixel including: a photoelectric conversion unit generating and accumulating charge by means of photoelectric conversion; a first charge holding unit being shielded from light, and being adaptable to accumulate a part of charge spilling from the photoelectric conversion unit in a period during which the photoelectric conversion unit generates and accumulates charge; an amplifying unit (SF-MOS) amplifying charge; a first transfer unit (Tx-MOS) transferring the charge accumulated in the photoelectric conversion unit to the amplifying unit; and a second transfer unit (Ty-MOS) transferring the charge accumulated in the first charge holding unit to the amplifying unit.
Description
- The present application is a continuation of application Ser. No. 13/326,743, filed on Dec. 15, 2011, which is a division of U.S. application Ser. No. 12/431,831, filed Apr. 29, 2009, now U.S. Pat. No. 8,089,545, which is a division of U.S. patent application Ser. No. 11/332,734, filed Jan. 13, 2006, now U.S. Pat. No. 7,538,810. This application claims benefit of each of those three prior applications under 35 U.S.C. §120, and claims priority benefit under 35 U.S.C. §119 of Japanese Patent Application 2005-008124, filed Jan. 14, 2005. The entire contents of each of those four applications are incorporated herein by reference.
- 1. Field of the Invention
- The present invention relates to a solid-state image pickup device, a control method thereof and a camera.
- 2. Related Background Art
- In U.S. Pat. No. 6,307,195, there is described a solid-state image pickup device in which charge spilling from a photodiode during accumulation of photoinduced charge flows into a floating diffusion (FD) via a transfer gate (TG). By reading out the charge flowing into the FD, dynamic range is extended.
- The capacity of FD, contributing to the amplification factor of an amplifying unit, cannot have a large value. Accordingly, only a small amount of charge spilling from the photodiode (PD) unit functioning as a photoelectric conversion unit can be accumulated. Also, the PD is connected to the input unit of the amplifying unit within a pixel, so the FD cannot have a perfectly buried structure. Here, “buried structure” means a structure having a reverse conducting-type impurity diffusion region formed on the surface of an impurity diffusion region for forming an FD. With such structure, the generation of dark current on the surface of the impurity diffusion region for forming an FD is reduced. Consequently, the dark current in the impurity region for forming an FD is larger than that in the photoelectric conversion unit. Accordingly, the FD is not suitable for a node holding data. Charge spilling into the FD is lost as time passes, so a high S/N ratio cannot be expected for a signal from the high brightness portion.
- In Japanese Patent Application Laid-Open No. 2004-335803, there is described a MOS solid-state image pickup device in which a plurality of light receiving units are arranged in an array on the surface of a semiconductor substrate and a signal at each light receiving unit is read out on a per light receiving unit basis, each said light receiving unit being provided with a first signal charge detecting unit for detecting a signal dependent on the amount of incident light, and a second signal charge detecting unit for capturing a part of excess carrier of the first signal charge detecting unit when the detection signal at the first signal detecting unit saturates and thereby detecting a signal dependent on the amount of captured charge.
- According to Japanese Patent Application Laid-Open No. 2004-335803, as shown in the accompanying
FIG. 2 , there is provided the second signal charge detecting unit 38 which detects a part of saturating electron when the saturation of electron generated in the first signal charge detecting unit 31 occurs. Part of excessive carrier is captured and the rest is drained out to a vertical type overflow drain (OFD). The first and second signal detection units are separately provided. - However, to dump one part to the vertical type OFD and collect the rest into the second signal charge detecting unit 38, there is needed a technique for fabricating with considerably high accuracy both the potentials of a barrier unit 33 and the vertical type OFD. When this accuracy is not sufficient, a variation in the flowing-in amount between the vertical type OM and the detection unit occurs. Accordingly, the flowing-in ratio varies according to sample, thus significantly reducing mass productivity.
- Also, the charge dumping side has a structure of vertical type OFD, and the charge capturing side has a structure of horizontal type OFD. Thus barriers having a different structure must be exceeded in each side. More specifically, the spilling ratio is controlled by potential barriers based on density profiles determined by a different semiconductor process. In addition, the amount of spilling-out current typically varies exponentially relative to potential controlling voltage. Consequently, it may be difficult to control the spilling ratio finely and highly accurately. From the above described reason, there is also a drawback that the flowing-out ratio between the vertical type OFD and horizontal type OFD has a temperature dependence.
- Furthermore, the vertical type OFD determines the saturation charge of PD. Accordingly, the range where the potential can be controlled is considerably limited. Practically, to compensate for this, it is essential for the horizontal type OFD structure to have a potential controlling mechanism. This causes problems of increased false signal (dark current) at a dark state, reduced yield associated with an increasing number of control lines, and the like.
- An object of the present invention is to cause a part of the charge spilling from a photoelectric conversion unit to flow into a charge holding unit and thereby extend dynamic range and at the same time improve image quality.
- A solid-state image pickup device according to the present invention has a pixel comprising: a photoelectric conversion unit generating and accumulating charge by means of photoelectric conversion; a first charge holding unit being shielded from light, and being adaptable to accumulate a part of charge spilling from the photoelectric conversion unit in a period when the photoelectric conversion unit generates and accumulates charge; an amplifying unit amplifying charge; a first transfer unit transferring the charge accumulated in the photoelectric conversion unit to the amplifying unit; and a second transfer unit transferring the charge accumulated in the first charge holding unit to the amplifying unit.
- A solid-state image pickup device control method according to the present invention is a method for controlling a solid-state image pickup device which has a pixel comprising: a photoelectric conversion unit for generating and adaptable to accumulate charge by means of photoelectric conversion; a first charge holding unit light-shielded for accumulating a part of charge spilling from the photoelectric conversion in a period when the photoelectric conversion unit generates and accumulates charge; and an amplifying unit for amplifying charge, wherein charge is transferred in such a way that a path for transferring the charge accumulated in the photoelectric conversion unit to the amplifying unit is different from that for transferring the charge accumulated in the first charge holding unit to the amplifying unit.
- A camera according to the present invention comprises: the solid-state image pickup device; a lens focusing an optical image on the solid-state image pickup device; and an aperture varying the amount of light passing through the lens.
- Other features and advantages of the present invention will be apparent from the following description taken in conjunction with the accompanying drawings, in which like reference characters designate the same or similar parts throughout the figures thereof.
-
FIG. 1 is a view showing an exemplary structure of a solid-state image pickup device according to a first embodiment of the present invention; -
FIG. 2A is a graph showing a relationship between light quantity and signal charge of a photoelectric conversion unit; -
FIG. 2B is a graph showing a relationship between light quantity and signal charge of a charge holding unit; -
FIG. 3 is an equivalent circuit diagram of the solid-state image pickup device ofFIG. 1 ; -
FIG. 4 is a timing chart showing an example of operation of the circuit ofFIG. 3 ; -
FIG. 5 is a view showing an exemplary structure of a solid-state image pickup device according to a second embodiment of the present invention; -
FIG. 6A is a graph showing a relationship between light quantity and signal charge of the solid-state image pickup device according to the second embodiment; -
FIG. 6B is a graph showing a relationship between light quantity and pixel signal of the solid-state image pickup device according to the second embodiment; -
FIG. 7 is a block diagram showing an exemplary structure of a still video camera according to a third embodiment of the present invention; -
FIG. 8 is a block diagram showing an exemplary structure of a video camera according to a fourth embodiment of the present invention; and -
FIG. 9 is a timing chart showing another example of operation of the solid-state image pickup device. - The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention.
-
FIG. 1 is a view showing an exemplary structure of a solid-state image pickup device according to a first embodiment of the present invention. The solid-state image pickup device has a plurality of pixels arranged in a two-dimensional array. Hereinafter an n-channel MOS field-effect transistor is simply referred to as a MOS transistor. A pixel includes transfer MOS transistors Tx-MOS and Ty-MOS, a reset MOS transistor RES-MOS, a source follower MOS transistor SF-MOS and a select MOS transistor SEL-MOS. The source and drain of the transfer MOS transistor Tx-MOS correspond to aphotodiode PD 101 functioning as a photoelectric conversion unit and a floating diffusion FD. The source and drain of the transfer MOS transistor Ty-MOS correspond to acharge holding unit 102 and an FD. - The
photoelectric conversion unit 101 andcharge holding unit 102 have a structure having a reverse conducting-type impurity region formed on the surface of an impurity region accumulating and holding charge. Thephotoelectric conversion unit 101 is opened and thecharge holding unit 102 is light-shielded. Thephotoelectric conversion unit 101 has the circumference thereof enclosed by anelement separation portion 103. Theelement separation portion 103 has a higher potential barrier than that of thephotoelectric conversion unit 101 against the charge accumulated in thephotoelectric conversion unit 101, so thephotoelectric conversion unit 101 can accumulate a predetermined amount of charge. Referring toFIG. 1 , thephotoelectric conversion unit 101 has adrain portion 104 a provided upward thereof via theelement separation portion 103, adrain portion 104 b provided to the left thereof, and thecharge holding unit 102 provided downward thereof. Thecharge holding unit 102 has thedrain portion 104 b provided to the left thereof and adrain portion 104 c provided downward thereof. Hereinafter thedrain portions drain portion 104 a is the drain of the reset MOS transistor RES-MOS, for example. The circumference of the drain portion 104 is enclosed by anelement separation portion 105. Theelement separation portion 105 prevents charge from leaking from the self pixel to a neighboring pixel. Thephotoelectric conversion unit 101 has a rectangular planar shape and has thedrain portions charge holding unit 102 is disposed opposite another side. - In the broad sense, the
element separation portion 105 includes the drain portion 104. By virtue of the drain portion, the leak to a neighboring pixel can be further suppressed. The drain portion can double as an impurity diffusion region such as the drain and source of a MOS transistor used as an amplifying unit or the like. This indicates that the structure of the present invention, i.e., the use of a lateral overflow mechanism is suitable for an amplification type solid-state image pickup device having MOS transistors within a pixel. - The
photoelectric conversion unit 101 is a photodiode generating and accumulating charge by means of photoelectric conversion, for example. The floating diffusion FD is a diffusing region accumulating charge and converting it to voltage. The gate of the transfer MOS transistor Tx-MOS serves to transfer charge generated by thephotoelectric conversion unit 101 to the floating diffusion FD. By turning off the transfer gate, thephotoelectric conversion unit 101 can generate and accumulate charge by means of photoelectric conversion. After completion of the accumulation time, by turning on the transfer gate, the charge accumulated in thephotoelectric conversion unit 101 can be transferred (read out) to the floating diffusion FD. -
FIG. 2A is a graph showing a relationship between light quantity and signal charge of thephotoelectric conversion unit 101. In thephotoelectric conversion unit 101, the accumulatable amount of signal charge A1 is fixed. Accordingly, when strong light is irradiated on thephotoelectric conversion unit 101, charge spills from thephotoelectric conversion unit 101 and thephotoelectric conversion unit 101 saturates at a light quantity t1. A part of charge spilling from thephotoelectric conversion unit 101 flows into thecharge holding unit 102 and the rest of charge is drained out to the drain portion 104. -
FIG. 2B is a graph showing a relationship between light quantity and signal charge of thecharge holding unit 102. In thecharge holding unit 102, also, the accumulatable amount of signal charge A2 is fixed, and hence the spilling charge is drained out to the drain portion 104. -
Characteristic line 201 indicates a case where the charge spilling from thephotoelectric conversion unit 101 entirely flows into thecharge holding unit 102. The slope of thecharacteristic line 201 of thecharge holding unit 102 is identical to that of the characteristic line of thephotoelectric conversion unit 101 ofFIG. 2A . In this case, however, thecharge holding unit 102 saturates at a relatively small light quantity. -
Characteristic line 202 indicates a case where from among the charge spilling from thephotoelectric conversion unit 101, one part flows into thecharge holding unit 102 and the rest is drained out to the drain portion 104. The slope of thecharacteristic line 202 of thecharge holding unit 102 is less steep than that of the characteristic line of thephotoelectric conversion unit 101 ofFIG. 2A . Accordingly, even when strong light is irradiated on thephotoelectric conversion unit 101, thecharge holding unit 102 hardly saturates. Dynamic range of pixel signal can thus be extended. - More specifically, if the ratio of charge spilling into the
charge holding unit 102 can be reduced, dynamic range can be further extended. In addition, according to the present invention, the holding unit can have the same structure as that of the photoelectric conversion unit. Thus, even when the spilling ratio is reduced, detection with a small noise influence and a high sensitivity is possible. - When light is irradiated on the
photoelectric conversion unit 101, charge is accumulated in thephotoelectric conversion unit 101 until the light quantity t1 is reached, and no charge is accumulated in thecharge holding unit 102. When the light quantity t1 is reached, thephotoelectric conversion unit 101 saturates, charge flows from thephotoelectric conversion unit 101 into thecharge holding unit 102, and thecharge holding unit 102 begins to accumulate charge. - The
charge holding unit 102 has a lateral (horizontal type) overflow drain structure, whereby a part of charge spilling from thephotoelectric conversion unit 101 flows into thecharge holding unit 102. The drain portion 104 also has a horizontal type overflow drain structure, whereby another part of charge spilling from thephotoelectric conversion unit 101 is drained out to the drain portion 104. More specifically, thecharge holding unit 102 and drain portion 104 are disposed at the same depth from the main surface of a semiconductor substrate. - Referring to
FIG. 1 , length L1 represents the length of the side of thephotoelectric conversion unit 101 opposite thedrain portion 104 a. Length L2 represents the length of the side of thephotoelectric conversion unit 101 opposite thecharge holding unit 102. Length L3 represents the length of the side of thephotoelectric conversion unit 101 opposite thedrain portion 104 b. If the amount of excessive carrier spilling from thephotoelectric conversion unit 101 when thephotoelectric conversion unit 101 saturates, is Q0, then the amount of excessive carrier Q1 flowing into thecharge holding unit 102 from thephotoelectric conversion unit 101 is expressed as the following formula. -
Q1=Q0×L2/(L1+L2+L3) - When the impurity profile between the
photoelectric conversion unit 101 andcharge holding unit 102 is substantially identical to that between thephotoelectric conversion unit 101 and drain portion 104, the flowing-in amount per unit side is considered to be equal for each side, so the above ratio is obtained. A variation in process causes a small variation in potential barrier. However, as described above, the flowing-in amount per unit side is equal. Thus, even when there exists a variation in process, if a design is not purposely made so that a different impurity profile is obtained, the above ratio is maintained. - As the drain portion 104, an impurity region, such as a MOS transistor, connected to the power source terminal is used, so any additional area is not particularly needed. When a vertical (vertical type) overflow drain is employed, the impurity density of the lower part of the charge accumulation region must be low; thus the saturation charge A1 of the
photoelectric conversion unit 101 is reduced. According to the present embodiment, a horizontal type overflow drain is employed, so the saturation charge A1 of thephotoelectric conversion unit 101 is not reduced. It is important that even when dynamic range is extended by thecharge holding unit 102, the saturation charge A1 of thephotoelectric conversion unit 101 being the main unit can be kept at a high level. - According to the present embodiment, by virtue of the horizontal type overflow drain structure, there are provided a path for draining out to a fixed potential of the drain portion 104 the charge spilling from the
photoelectric conversion unit 101, and a path for draining it out to thecharge holding unit 102. - By arranging horizontal type overflow drains in parallel, it is possible to adjust the amount of charge flowing into the
charge holding unit 102 by two-dimensional arrangement. For example, the adjustment can be made by means of at least one of (1) widths L1 and L3 of thephotoelectric conversion unit 101 neighboring the drain portion 104, (2) length W1 of the drain portion 104, (3) width L2 of thecharge holding unit 102, (4) length W2 of the charge holding unit, and so on. It is also possible to have a different impurity profile between each region to send a desired percentage of spilling-out charge to thecharge holding unit 102. - The
photoelectric conversion unit 101 andcharge holding unit 102 have a structure having a reverse conducting-type impurity region formed on the surface of an impurity region which accumulates and holds charge. Thephotoelectric conversion unit 101 is opened and thecharge holding unit 102 is light-shielded. Thephotoelectric conversion unit 101 andcharge holding unit 102 have the same structure and have a reverse conducting-type impurity region formed on the surface thereof, so even when a signal of thephotoelectric conversion unit 101 is added to that of thecharge holding unit 102, noises hardly occur. Also, the percentage of charge spilling from thephotoelectric conversion unit 101 and flowing into thecharge holding unit 102 is controlled by the area and the circumference length of thephotoelectric conversion unit 101, thecharge holding unit 102 and the drain portion 104, so the influence from a variation in process hardly exists. - Negative charge (electron) photoelectrically converted by the
photoelectric conversion unit 101 is accumulated in the first conducting-type (n-type) charge accumulation region of thephotoelectric conversion unit 101. Thecharge holding unit 102 is a light-shielded region separated from thephotoelectric conversion unit 101. There are provided a first path for draining out a part of excessive carrier to the drain portion 104 of a first conductive type in a pixel when the saturation charge of thephotoelectric conversion unit 101 is exceeded, and a second path for draining out another part of excessive carrier to thecharge holding unit 102. Thephotoelectric conversion unit 101 is connected to a source follower MOS transistor SF-MOS constituting a source follower amplifier via a first transfer unit (the gate of MOS transistor Tx-MOS). Thecharge holding unit 102 is connected to a source follower MOS transistor SF-MOS constituting a source follower amplifier via a second transfer unit (the gate of MOS transistor Ty-MOS). The source follower amplifiers amplify the signal charge of thephotoelectric conversion unit 101 andcharge holding unit 102. -
FIG. 3 is an equivalent circuit diagram of the solid-state image pickup device ofFIG. 1 .FIG. 4 is a timing chart showing an example of operation of the circuit ofFIG. 3 . Potential Ores denotes a gate potential of reset MOS transistor RES-MOS, potential φtx denotes a gate potential of transfer MOS transistor Tx-MOS, potential φty denotes a gate potential of transfer MOS transistor Ty-MOS, potential φsel denotes a gate potential of select MOS transistor SEL-MOS, potential φCtsFD denotes a gate potential of transfer MOS transistor 411, potential φCtn denotes a gate potential oftransfer MOS transistor 413, and potential φCtsPD denotes a gate potential of transfer MOS transistor 412. - Before timing T1, potential φres is positive (ON) and potentials φtx, φty, φsel, φCtsFD, φCtn and φCtsPD are 0 V (OFF). When the reset MOS transistor RES-MOS is turned on, the power source potential VDD is supplied to a floating diffusion FD.
- Subsequently, at timing T1, positive pulse are applied as potentials φtx and φty. The transistors Tx-MOS and Ty-MOS are turned on to apply the power source potential VDD to the floating diffusion FD, the
photoelectric conversion unit 101 and thecharge holding unit 102 to reset them. After the resetting, potential φres is lowered to 0 V, and the reset MOS transistor RES-MOS is turned off. Then potentials φtx and φty are lowered to, for example, −1.3 V to change thephotoelectric conversion unit 101, thecharge holding unit 102 and the floating diffusion FD to a floating state. At this time, an external mechanical shutter is still not opened, and the accumulation of photoinduced charge has not started yet in thephotoelectric conversion unit 101. - Subsequently, at timing T2, a mechanical shutter 53 (refer to
FIG. 7 ) is opened, and light is irradiated on thephotoelectric conversion unit 101, and thephotoelectric conversion unit 101 begins to generate and accumulate photoinduced charge. When weak light is irradiated on thephotoelectric conversion unit 101, thephotoelectric conversion unit 101 does not saturate and charge does not flow from thephotoelectric conversion unit 101 into thecharge holding unit 102. In contrast, when strong light is irradiated on thephotoelectric conversion unit 101, thephotoelectric conversion unit 101 saturates and a part of charge flows from thephotoelectric conversion unit 101 into thecharge holding unit 102. - Subsequently, at timing T3, the
shutter 53 is closed, and thephotoelectric conversion unit 101 is changed to a light-shielded state, and the generation of photoinduced charge in thephotoelectric conversion unit 101 is terminated. - Subsequently, at timing T4, a positive pulse is applied as potential φty. The transfer MOS transistor Ty-MOS is turned on to read out the negative charge accumulated in the
charge holding unit 102 into the floating diffusion FD. A solid line drawn in the potential of the floating diffusion FD indicates a case where weak light is irradiated and no charge spills from thephotoelectric conversion unit 101 to thecharge holding unit 102. A broken line drawn in the potential of the floating diffusion FD indicates a case where strong light is irradiated and charge spills from thephotoelectric conversion unit 101 to thecharge holding unit 102. When negative charge is read out from thecharge holding unit 102 to the floating diffusion FD, the potential of the floating diffusion FD is lowered. - Subsequently, at timing T5, potential φsel is changed from 0 V to a positive value. The select MOS transistor SEL-MOS is turned on to change a
signal output line 401 to an active state. The source follower MOS transistor SF-MOS, constituting a source follower amplifier, outputs an output voltage to thesignal output line 401 according to the potential of the floating diffusion FD. - Subsequently, at timing T6, a positive pulse is applied as potential φCtsFD. The transistor 411 is turned on to cause a potential of the
signal output line 401 dependent on the potential of the floating diffusion FD to be accumulated in capacitance CtsFD. In a pixel where thephotoelectric conversion unit 101 is not in a saturation state, charge does not spill out to thecharge holding unit 102, so an output dependent on the reset voltage VDD of the floating diffusion FD is accumulated in capacitance CtsFD. When strong light is irradiated on thephotoelectric conversion unit 101 and thephotoelectric conversion unit 101 saturates, a lower output than the reset voltage VDD of the floating diffusion FD is accumulated in capacitance CtsFD. - Subsequently, at timing T7, a positive pulse is applied as potential φres. The reset MOS transistor RES-MOS is turned on to reset again the floating diffusion FD to the reset voltage VDD.
- Subsequently, at timing T8, a positive pulse is applied as potential φCtn. The
MOS transistor 413 is turned on to cause an offset noise voltage of thesignal output line 401 obtained when the floating diffusion FD is reset, to be accumulated in capacitance Ctn. - Subsequently, at timing T9, a positive pulse is applied as potential φtx. The transfer MOS transistor Tx-MOS is turned on to read out the charge accumulated in the
photoelectric conversion unit 101 into the floating diffusion FD. - Subsequently, at timing T10, a positive pulse is applied as potential φCtsPD. The MOS transistor 412 is turned on to cause a voltage of the
signal output line 401 dependent on the charge read out from thephotoelectric conversion unit 101 to the floating diffusion FD, to be accumulated in capacitance CtsFD. - Subsequently, at timing T11, potential φsel is changed to 0 V. The select MOS transistor SEL-MOS is turned off to change the
signal output line 401 to a non-active state. - Subsequently, at timing T12, potential φres is turned positive. The reset MOS transistor RES-MOS is turned on to clamp the potential of the floating diffusion FD to the power source potential VDD.
- In the processings describe above, a voltage corresponding to offset noise is accumulated in capacitance Ctn; a voltage corresponding to charge spilling from the
photoelectric conversion unit 101 to thecharge holding unit 102 is accumulated in capacitance CtsFD; and a voltage corresponding to the accumulated charge in thephotoelectric conversion unit 101 is accumulated in capacitance CtsPD. -
FIG. 9 shows another example.FIG. 9 is a timing chart showing an example of operation in a structure in which, as capacitance Ctn accumulating a voltage corresponding to offset noise shown inFIG. 3 , there are further provided two capacitances, that is, capacitance CtnPD for thephotoelectric conversion unit 101 and capacitance CtnFD for thecharge holding unit 102. Similarly, there are also twoMOS transistors 413; one of them is controlled by gate potential φCtnPD and the other by gate potential φCtnFD. - Timing T1 is a reset period of the
photoelectric conversion unit 101 andcharge holding unit 102. Timing T2 to T3 is a light irradiation period. Timing T4 is a read initiation (reset release) period. Timing T5 is a noise voltage write period for reading from thecharge holding unit 102. Timing T6 is a period for transferring a signal from thecharge holding unit 102 to the floating diffusion FD. Timing T7 is a signal voltage write period for reading from thecharge holding unit 102. Timing T8 is a period for resetting the floating diffusion FD. Timing T9 is a noise voltage write period for reading from thephotoelectric conversion unit 101. Timing T10 is a period for transferring a signal from thephotoelectric conversion unit 101 to the floating diffusion FD. Timing T11 is a signal voltage write period for reading from thephotoelectric conversion unit 101. Timing T12 is a read completion (reset ON) period. More detailed descriptions will be given below. - Firstly, at timing T1, in order to reset the
photoelectric conversion unit 101 andcharge holding unit 102, potential φres is turned positive and positive pulses are applied as potentials φtx and φty. - Subsequently, at timing T2 to T3, a
mechanical shutter 53 is opened to expose thephotoelectric conversion unit 101. At timing T4, potential φres is changed to 0 V to initiate the read. - Firstly, at timing T5, a positive pulse is applied as potential φCtnFD to cause N signal (offset noise) of the
charge holding unit 102 to be accumulated. At timing T6, a positive pulse is applied as potential φty to transfer signal charge accumulated in thecharge holding unit 102. At timing T7, a positive pulse is applied as potential φCtsFD to cause S signal (proper signal) to be accumulated in capacitance CtsFD. - Subsequently, at timing T8, in order to reset the floating diffusion FD, potential φres is turned positive. At timing T9 to T11, the charge accumulated in the
photoelectric conversion unit 101 is read out. This is a sequence similar to that of reading out N signal and S signal from thecharge holding unit 102 at timing T5 to T7 and implemented by applying a pulse to potentials φCtsFD, φCtnPD and φtx. The potential of floating diffusion FD shown inFIG. 9 represents the amount of charge spilling into the floating diffusion FD. - Referring to
FIG. 3 , adifferential amplifier 421 outputs a voltage obtained by subtracting the noise voltage of capacitance Ctn from the signal voltage of capacitance CtsFD. Adifferential amplifier 422 outputs a voltage obtained by subtracting the noise voltage of capacitance Ctn from the signal voltage of capacitance CtsPD. Anamplifier 423 amplifies the output of thedifferential amplifier 421. Anamplifier 424 amplifies the output of thedifferential amplifier 422. - The gain of the
amplifiers charge holding unit 102 from among the charge spilling from thephotoelectric conversion unit 101 and the amount drained out to the drain portion 104. For example, a description will be given of an example in which ⅓ of the charge spilling from thephotoelectric conversion unit 101 flows into thecharge holding unit 102 and ⅔ of the charge is drained out to the drain portion 104. In this case, the input signal of theamplifier 423 is tripled to be outputted, and the input signal of theamplifier 424 is directly outputted. More specifically, this means that three times the amount of charge spilling out to thecharge holding unit 102 is equal to the amount of charge spilling from thephotoelectric conversion unit 101. - When an amplifier circuit within a pixel is shared to read out a signal from the
charge holding unit 102 and a signal from thephotoelectric conversion unit 101, i.e., the read paths are similar to each other, then a small difference of sensitivity or an offset difference caused by a variation in path can be suppressed. Consequently, it is possible to perform the amplification at a rear-stage amplifier. Particularly, in order to extend dynamic range, this amplification at a rear-stage amplifier must be large; by making the paths similar to each other, the amplification becomes possible. - An
adder 425 adds the outputs of theamplifiers photoelectric conversion unit 101 and that spilling into thecharge holding unit 102. Thus, compared to a case where only the charge accumulated in thephotoelectric conversion unit 101 is used, the dynamic range of pixel signal can be extended. - An
amplifier 426 amplifies the output of theadder 425 according to ISO sensitivity and outputs the resultant signal. When the value of ISO sensitivity is small, the gain is small; when the value of ISO sensitivity is large, the gain is large. - The above elements constitute the pixel signal generation unit. The pixel signal generation unit generates pixel signal according to the charge accumulated in the
photoelectric conversion unit 101 and that accumulated in thecharge holding unit 102. According to the present embodiment, the ratio of the charge spilling from thephotoelectric conversion unit 101 and flowing into thecharge holding unit 102 can be controlled with high accuracy, thus extending dynamic range and at the same time improving image quality. Also, both the structure for the overflow from thephotoelectric conversion unit 101 to thecharge holding unit 102 and that for the overflow from thephotoelectric conversion unit 101 to the drain portion 104 are of horizontal type overflow drain. Accordingly, the ratio of the amount of spilling charge between the two structures can easily be controlled. -
FIG. 5 is a view showing an exemplary structure of a solid-state image pickup device according to a second embodiment of the present invention. The difference betweenFIG. 5 andFIG. 1 will now be described. According to the present embodiment, instead of thecharge holding unit 102 ofFIG. 1 , a firstcharge holding unit 102 a and a secondcharge holding unit 102 b are provided. Hereinafter, thecharge holding units charge holding unit 102. - The source and drain of a transfer MOS transistor Ty-MOS correspond to the first
charge holding unit 102 a and floating diffusion FD. By controlling the gate of the MOS transistor Ty-MOS, the charge accumulated in the firstcharge holding unit 102 a can be read out from the floating diffusion FD. - The source and drain of a transfer MOS transistor Tz-MOS correspond to the second
charge holding unit 102 b and floating diffusion FD. By controlling the gate of the MOS transistor Tz-MOS, the charge accumulated in the secondcharge holding unit 102 b can be read out from the floating diffusion FD. - A
drain portion 104 d, disposed between thephotoelectric conversion unit 101 and the firstcharge holding unit 102 a, drains out a part of the charge spilling from thephotoelectric conversion unit 101. Adrain portion 104 e, disposed between the firstcharge holding unit 102 a and secondcharge holding unit 102 b, drains out a part of the charge spilling from the firstcharge holding unit 102 a. Hereinafter, thedrain portions 104 a to 104 e are separately or collectively referred to as a drain portion 104. - A part of the charge spilling from the
photoelectric conversion unit 101 flows into the firstcharge holding unit 102 a, another part thereof flows into the secondcharge holding unit 102 b, and the rest thereof is drained out to the drain portion 104. When the firstcharge holding unit 102 a saturates, a part of the charge spilling from the firstcharge holding unit 102 a flows into the secondcharge holding unit 102 b, and the rest thereof is drained out to the drain portion 104. - A direct flow path from the
photoelectric conversion unit 101 to the secondcharge holding unit 102 b is not always needed. For example, it is possible to cause ½ the amount of charge spilling from thephotoelectric conversion unit 101 to flow into the firstcharge holding unit 102 a, and further to cause ½ the amount of charge spilling from the firstcharge holding unit 102 a to flow into the secondcharge holding unit 102 b. - According to the present embodiment, the second
charge holding unit 102 b can be two-dimensionally disposed. Thus it is further possible to capture the charge spilling from the firstcharge holding unit 102 a into the secondcharge holding unit 102 b, whereby dynamic range can be further extended. -
FIG. 6A is a graph showing a relationship between light quantity and signal charge of a solid-state image pickup device according to the present embodiment. Signal charge represents the total amount of charge accumulated in thephotoelectric conversion unit 101 and thecharge holding units region 601 toregion 603.Region 601 indicates the signal charge accumulated in thephotoelectric conversion unit 101 before thephotoelectric conversion unit 101 saturates.Region 602 indicates a region where a part of the charge accumulated in thephotoelectric conversion unit 101 flows into the firstcharge holding unit 102 a after thephotoelectric conversion unit 101 saturates.Region 603 indicates a region where a part of the charge accumulated in the firstcharge holding unit 102 a flows into thecharge holding unit 102 b after the firstcharge holding unit 102 a saturates. The slope of characteristic line becomes gradually gentle fromregion 601 toregion 603. For human visual sensitivity characteristics, when light quantity is large (bright), the change of light quantity is relatively difficult to recognize. Accordingly, signal charge as it is, can be considered as pixel signal. More specifically, theamplifiers FIG. 3 are not always needed. -
FIG. 6B is a graph showing a relationship between light quantity and pixel signal of the solid-state image pickup device according to the present embodiment. Pixel signal is obtained by applying gain correction to the signal charge in eachregion 601 to 603 ofFIG. 6 by use of theamplifiers entire region 601 to 603, pixel signal can hold a linear characteristic relative to light quantity. - According to the present embodiment, the first
charge holding unit 102 a and the secondcharge holding unit 102 b can easily be stepwise disposed, whereby the linear characteristic ofFIG. 6(A) can have continuity. - By controlling the low-level potential of the gate of transfer MOS transistor Tx-MOS, it is also possible to cause a part of charge to flow from the
photoelectric conversion unit 101 into the floating diffusion FD, thereby controlling the ratio of the charge flowing into the firstcharge holding unit 102 a. However, while an overflow control of no less than 50% of excessive carrier is possible, it is difficult to control a lesser amount due to a variation. Thus, by simultaneously employing the present embodiment, a higher-accuracy control becomes possible. - When the low-level potential of the gate of transfer MOS transistor Tx-MOS is controlled, if the amount of charge spilling into the first
charge holding unit 102 a is suppressed, i.e., if the amount of charge spilling from thephotoelectric conversion unit 101 into the floating diffusion FD is increased, a problem of dark current occurring in the transfer MOS transistor Tx-MOS arises. Thus it is difficult to significantly extend dynamic range. - The charge accumulated in the
photoelectric conversion unit 101 is more important than that accumulated in thecharge holding units charge holding unit 102 b is controlled by sufficiently turning off the transfer gate (the gate of transistor Tx-MOS) of thephotoelectric conversion unit 101 and controlling the low-level potential of the transfer gate (the gate of transistor Ty-MOS) of the firstcharge holding unit 102 a. - In the first and second embodiments, there is described an example where pixel signal is generated by amplifying and correcting signal charge by use of the
amplifiers amplifiers -
FIG. 7 is a block diagram showing an exemplary structure of a still video camera according to a third embodiment of the present invention. An example where the solid-state image pickup device according to the first and second embodiments is applied to a still video camera will be described in detail with reference toFIG. 7 . A solid-stateimage pickup device 54 and a unit processingimage pickup signal 55 correspond to the above solid state image pickup device. - Referring to
FIG. 7 , reference numeral 51 denotes a barrier doubling as a protect of lens and a main switch, 52 denotes a lens focusing an optical image of a subject on the solid-state image pickup device 54, 53 denotes an aperture (and a shutter) adjusting the amount of light passing through the lens 52, 54 denotes a solid-state image pickup device capturing a subject focused through the lens 52 as an image signal, 55 denotes a unit processing image pickup signal applying an analog signal processing to an image pickup signal (image signal) outputted from the solid-state image pickup device 54, 56 denotes an A/D converter converting from analog to digital form an image signal outputted from the unit processing image pickup signal 55, 57 denotes a signal processing unit performing various corrections and data compression on image data outputted from the A/D converter 56, 58 denotes a timing generator outputting various timing signals to the solid-state image pickup device 54, the unit processing image pickup signal 55, the A/D converter 56 and the signal processing unit 57, 59 denotes a unit controlling whole and arithmetic operation which controls various operations and the whole still video camera, 60 denotes a memory unit temporarily storing image data, 61 denotes an I/F unit for recording and writing data onto/from a recording medium 62, 62 denotes a detachable recording medium, such as a semiconductor memory, for recording and reading image data, and 63 denotes an external I/F unit communicating with an external computer or the like. - The operation of the still video camera according to the above described configuration when videography is taken will now be described. When the
bather 51 is opened, the main power supply is turned on and then the power supply of the control system is turned on and then the power supply of the image pickup system circuits, such as an A/D converter 56, is turned on. Subsequently, in order to control the amount of exposure, the unit controlling whole andarithmetic operation 59 opens theaperture 53, and a signal outputted from the solid-stateimage pickup device 54 passes through the unit processingimage pickup signal 55 and is converted by the A/D converter 56 and then supplied to thesignal processing unit 57. Based on the resultant data, an exposure calculation is made by the unit controlling whole andarithmetic operation 59. Brightness is determined based on the photometry result. According to the determination result, the unit controlling whole andarithmetic operation 59 controls theaperture 53. - Subsequently, based on the signal outputted from the solid-state
image pickup device 54, the unit controlling whole andarithmetic operation 59 extracts a high-frequency component and performs a calculation of the distance up to the subject. Then the lens is driven to determine whether or not the lens is in focus. If not, the lens is driven again to determine the distance. After it is confirmed that the lens is in focus, theshutter 53 is opened to initiate the actual exposure. When the exposure is completed, the signal outputted from the solid-stateimage pickup device 54 passes through the unit processingimage pickup signal 55, is A/D converted by the A/D converter 56, passes through thesignal processing unit 57, and is written into thememory unit 60 by the unit controlling whole andarithmetic operation 59. Then, under the control of the unit controlling whole andarithmetic operation 59, the data stored in thememory unit 60 is recorded onto thedetachable recording medium 62, such as a semiconductor memory, via the I/F unit controllingrecording medium 61. Alternatively, the data may be directly supplied to a computer or the like via the external I/F unit 63 to be subjected to an image processing. - The
timing generator 58 controls the signals ofFIG. 4 including φres, φtx, φty, φsel, φCtsFD, φCtn and φCtsPD. -
FIG. 8 is a block diagram showing an exemplary structure of a video camera according to a fourth embodiment of the present invention. An embodiment where the solid-state image pickup device according to the first and second embodiments is applied to a video camera will be described in detail with reference toFIG. 8 . -
Reference numeral 1 denotes a photographing lens comprising afocus lens 1A adjusting the focus, azoom lens 1B performing a zoom operation and a lens 1C focusing an optical image, 2 denotes an aperture and a shutter, 3 denotes a solid-state image pickup device photoelectrically converting a subject image focused on the image pickup surface into an electrical image pickup signal, 4 denotes a S/H circuit sampling and holding an image pickup signal outputted from solid-state image pickup device 3 and further amplifying the level. The S/H circuit 4 outputs a video signal. -
Reference numeral 5 denotes a process circuit applying predetermined processings, including y correction, color separation and blanking, to a video signal outputted from the S/H circuit 4. The process circuit outputs a luminance signal Y and a chrominance signal C. A chrominance signal C outputted from theprocess circuit 5 is subjected to white balance and color balance correction by a colorsignal correction circuit 21 and outputted as chrominance difference signals R-Y and B-Y. - The luminance signal Y outputted from the
process circuit 5 and the chrominance difference signals R-Y and B-Y outputted from the colorsignal correction circuit 21 are subjected to modulation by an encoder circuit (ENC circuit) 24 and outputted as a standard television signal. Then the signal is supplied to a video recorder (not shown) or an electric viewfinder such as a monitor electric view finder (EVF). -
Reference numeral 6 denotes an IRIS control circuit controlling an IRIS drive circuit 7 based on the video signal supplied from the S/H circuit 4; anig meter 8 is automatically controlled to control the amount of opening of theaperture 2 so that the level of video signal has a predetermined value (a fixed value). -
Reference numerals H circuit 4. The signals outputted from the first bandpass filter 13 (BPF1) and the second bandpass filter 14 (BPF2) are each gated by agate circuit 15 and a focus gate frame signal and then the peak value thereof is detected by apeak detection circuit 16 and held. The resultant signal is supplied to alogic control circuit 17. This signal is referred to as a focus voltage. Focusing is performed by this focus voltage. -
Reference numeral 18 denotes a focus encoder detecting a movement position of thefocus lens zoom lens aperture 2. The detection values from these encoders are supplied to thelogic control circuit 17 for system control. - Based on a video signal corresponding to a set focus detection range, the
logic control circuit 17 performs focus detection and focus adjustment with respect to the subject. More specifically, the peak value information on the high-frequency component supplied from eachbandpass filter focus motor 10 or turning on/off the motor are supplied to the motor so that thefocus lens 1A is driven to a position where the peak value of high-frequency component becomes maximum. - In response to a zoom instruction, a
zoom drive circuit 11 causes a zoom motor 12 to rotate. When the zoom motor 12 rotates, thezoom lens 1B moves, whereby zooming is performed. - As described above, according to the first to fourth embodiments, in a period when the
photoelectric conversion unit 101 generates and accumulates charge, thecharge holding unit 102 accumulates a part of the charge spilling from thephotoelectric conversion unit 101. The gate of transistor Tx-MOS is a first transfer unit transferring to the source follower amplifier SF-MOS the charge accumulated in thephotoelectric conversion unit 101. The gate of transistor Ty-MOS is a second transfer unit transferring to the source follower amplifier SF-MOS the charge accumulated in thecharge holding unit 102. In a period when thephotoelectric conversion unit 101 generates and accumulates charge, the drain portion 104 is used to drain out another part of the charge spilling from thephotoelectric conversion unit 101. Charge is transferred in such a way that a path for transferring the charge accumulated in thephotoelectric conversion unit 101 to the source follower amplifier SF-MOS is different from that for transferring the charge accumulated in thecharge holding unit 102 to the source follower amplifier SF-MOS. - According to the second embodiment, in a period when the
photoelectric conversion unit 101 generates and accumulates charge, the secondcharge holding unit 102 b accumulates a part of the charge spilling from the firstcharge holding unit 102 a. The gate of transistor Tz-MOS is a third transfer unit transferring to the source follower amplifier SF-MOS the charge accumulated in the secondcharge holding unit 102 b. - By adjusting lengths L1, L2, L3, and so on, the ratio of the charge spilling from the
photoelectric conversion unit 101 and flowing into thecharge holding unit 102 can be controlled with high accuracy, thus extending dynamic range and at the same time improving image quality. Also, both the structure for the overflow from thephotoelectric conversion unit 101 to thecharge holding unit 102 and that for the overflow from thephotoelectric conversion unit 101 to the drain portion 104 are of horizontal type overflow drain. Accordingly, the ratio of the amount of spilling charge between the two structures can easily be controlled. - It is to be noted that an image may be produced based on only the carrier overflowed into the storage capacitor.
- The previous description is of specific examples for implementing the invention, and the technical scope of the invention should not be restrictively interpreted by the description of the embodiments. More specifically, many modifications to the embodiments described above are possible without departing from the spirit or gist of the invention.
- This application claims priority from Japanese Patent Application No. 2005-008124 filed on Jan. 14, 2005, which is hereby incorporated by reference herein.
Claims (2)
1. A driving method of an image pickup device including a plurality of pixels each comprising a photoelectric conversion unit, a light-shielded capacitor, and an amplifying unit amplifying a signal based on the carriers accumulated in the photoelectric conversion unit and the capacitor, the method comprising:
resetting carriers, accumulated in the photoelectric conversion unit and the capacitor;
accumulating carriers in the photoelectric conversion unit and the capacitor for a predetermined period;
reading a signal based on the carriers accumulated in the capacitor out from the pixel through the amplifying unit; and
reading a signal based on the carriers accumulated in the photoelectric conversion unit out from the pixel through the amplifying unit, after the reading out of the signal based on the carriers accumulated in the capacitor.
2. A driving method of an image pickup device including a plurality of pixels, each pixel comprising a photoelectric conversion unit, a light-shielded capacitor, and an amplifying unit amplifying a signal based on carriers accumulated in the photoelectric conversion unit and the capacitor, the method comprising:
resetting carriers, accumulated in the photoelectric conversion unit and the capacitor;
accumulating the carriers in the photoelectric conversion unit and the capacitor for a predetermined period;
reading a signal based on the carriers accumulated in the capacitor out from the pixel via the amplifying unit;
resetting carriers transferred to the amplifying unit;
reading a reset signal out from of the pixel;
reading a signal based on the carriers accumulated in the photoelectric conversion unit out from the pixel through the amplifying unit; and
combining a signal read out in said reading out of the signal based on the carriers accumulated in the capacitor and a signal read out in said reading out the signal based on the carriers accumulated in the photoelectric conversion unit,
wherein a dynamic range of a pixel signal is extended by said combining, as compared to a dynamic range used when a signal from the photoelectric conversion unit only is used.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/788,782 US20130181118A1 (en) | 2005-01-14 | 2013-03-07 | Solid-state image pickup device and control method thereof, and camera |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005-008124 | 2005-01-14 | ||
JP2005008124A JP4416668B2 (en) | 2005-01-14 | 2005-01-14 | Solid-state imaging device, control method thereof, and camera |
US11/332,734 US7538810B2 (en) | 2005-01-14 | 2006-01-13 | Solid-state image pickup device and control method thereof, and camera |
US12/431,831 US8089545B2 (en) | 2005-01-14 | 2009-04-29 | Solid-state image pickup device and control method thereof, and camera |
US13/326,743 US8421894B2 (en) | 2005-01-14 | 2011-12-15 | Solid-state image pickup device and control method thereof, and camera |
US13/788,782 US20130181118A1 (en) | 2005-01-14 | 2013-03-07 | Solid-state image pickup device and control method thereof, and camera |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/326,743 Continuation US8421894B2 (en) | 2005-01-14 | 2011-12-15 | Solid-state image pickup device and control method thereof, and camera |
Publications (1)
Publication Number | Publication Date |
---|---|
US20130181118A1 true US20130181118A1 (en) | 2013-07-18 |
Family
ID=36177893
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/332,734 Expired - Fee Related US7538810B2 (en) | 2005-01-14 | 2006-01-13 | Solid-state image pickup device and control method thereof, and camera |
US12/431,831 Expired - Fee Related US8089545B2 (en) | 2005-01-14 | 2009-04-29 | Solid-state image pickup device and control method thereof, and camera |
US13/326,743 Expired - Fee Related US8421894B2 (en) | 2005-01-14 | 2011-12-15 | Solid-state image pickup device and control method thereof, and camera |
US13/788,782 Abandoned US20130181118A1 (en) | 2005-01-14 | 2013-03-07 | Solid-state image pickup device and control method thereof, and camera |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/332,734 Expired - Fee Related US7538810B2 (en) | 2005-01-14 | 2006-01-13 | Solid-state image pickup device and control method thereof, and camera |
US12/431,831 Expired - Fee Related US8089545B2 (en) | 2005-01-14 | 2009-04-29 | Solid-state image pickup device and control method thereof, and camera |
US13/326,743 Expired - Fee Related US8421894B2 (en) | 2005-01-14 | 2011-12-15 | Solid-state image pickup device and control method thereof, and camera |
Country Status (5)
Country | Link |
---|---|
US (4) | US7538810B2 (en) |
EP (1) | EP1681850B1 (en) |
JP (1) | JP4416668B2 (en) |
CN (1) | CN100481891C (en) |
DE (1) | DE602006013056D1 (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9147708B2 (en) | 2012-01-18 | 2015-09-29 | Canon Kabushiki Kaisha | Solid-state image sensor and camera |
US9497403B2 (en) | 2013-05-10 | 2016-11-15 | Canon Kabushiki Kaisha | Solid-state imaging apparatus and camera |
WO2017146831A1 (en) * | 2016-02-26 | 2017-08-31 | Intel Corporation | Image sensor operation for shutter modulation and high dynamic range |
US9838633B2 (en) | 2014-03-31 | 2017-12-05 | Canon Kabushiki Kaisha | Photoelectric conversion device and image sensing system |
US9900539B2 (en) | 2015-09-10 | 2018-02-20 | Canon Kabushiki Kaisha | Solid-state image pickup element, and image pickup system |
US10194103B2 (en) | 2016-09-16 | 2019-01-29 | Canon Kabushiki Kaisha | Solid-state imaging device and method of driving solid-state imaging device with clipping level set according to transfer operation frequency |
US10319765B2 (en) | 2016-07-01 | 2019-06-11 | Canon Kabushiki Kaisha | Imaging device having an effective pixel region, an optical black region and a dummy region each with pixels including a photoelectric converter |
US10347679B2 (en) | 2016-05-26 | 2019-07-09 | Canon Kabushiki Kaisha | Imaging device |
US10382707B2 (en) | 2016-11-15 | 2019-08-13 | Canon Kabushiki Kaisha | Imaging device |
US10504949B2 (en) | 2016-10-07 | 2019-12-10 | Canon Kabushiki Kaisha | Solid-state imaging device, method of driving solid-state imaging device, imaging system, and movable object |
US10560650B2 (en) | 2017-04-24 | 2020-02-11 | Canon Kabushiki Kaisha | Photoelectric conversion device |
US10785433B2 (en) * | 2016-06-10 | 2020-09-22 | Canon Kabushiki Kaisha | Imaging sensor, imaging system, and moving body having signals amplified in two different accumulation periods |
US11336844B2 (en) | 2018-08-23 | 2022-05-17 | Canon Kabushiki Kaisha | Imaging device, imaging system, and movable object |
US11425365B2 (en) | 2018-12-14 | 2022-08-23 | Canon Kabushiki Kaisha | Photoelectric conversion device, method of manufacturing photoelectric conversion device, and method of manufacturing semiconductor device |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3890333B2 (en) * | 2004-02-06 | 2007-03-07 | キヤノン株式会社 | Solid-state imaging device |
JP4067054B2 (en) * | 2004-02-13 | 2008-03-26 | キヤノン株式会社 | Solid-state imaging device and imaging system |
US7294818B2 (en) * | 2004-08-24 | 2007-11-13 | Canon Kabushiki Kaisha | Solid state image pickup device and image pickup system comprising it |
JP4756839B2 (en) * | 2004-09-01 | 2011-08-24 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4916101B2 (en) | 2004-09-01 | 2012-04-11 | キヤノン株式会社 | Photoelectric conversion device, solid-state imaging device, and solid-state imaging system |
JP2006073736A (en) * | 2004-09-01 | 2006-03-16 | Canon Inc | Photoelectric converter, solid state imaging device and system |
JP4416668B2 (en) | 2005-01-14 | 2010-02-17 | キヤノン株式会社 | Solid-state imaging device, control method thereof, and camera |
JP2006197392A (en) * | 2005-01-14 | 2006-07-27 | Canon Inc | Solid-state imaging device, camera, and method of driving solid-state imaging device |
JP4459064B2 (en) * | 2005-01-14 | 2010-04-28 | キヤノン株式会社 | Solid-state imaging device, control method thereof, and camera |
JP4459099B2 (en) * | 2005-03-18 | 2010-04-28 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4794877B2 (en) * | 2005-03-18 | 2011-10-19 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4459098B2 (en) | 2005-03-18 | 2010-04-28 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4677258B2 (en) | 2005-03-18 | 2011-04-27 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4844032B2 (en) * | 2005-07-21 | 2011-12-21 | 株式会社ニコン | Imaging device |
JP2007242697A (en) * | 2006-03-06 | 2007-09-20 | Canon Inc | Image pickup device and image pickup system |
KR101255334B1 (en) * | 2006-05-08 | 2013-04-16 | 페어차일드코리아반도체 주식회사 | Power module for low thermal resistance and method of fabricating of the same power module |
JP3996618B1 (en) * | 2006-05-11 | 2007-10-24 | 総吉 廣津 | Semiconductor image sensor |
JP4185949B2 (en) * | 2006-08-08 | 2008-11-26 | キヤノン株式会社 | Photoelectric conversion device and imaging device |
JP4620780B2 (en) * | 2006-08-25 | 2011-01-26 | 京セラ株式会社 | Sensitivity correction method and imaging apparatus |
JP4928199B2 (en) * | 2006-09-07 | 2012-05-09 | キヤノン株式会社 | Signal detection device, signal readout method of signal detection device, and imaging system using signal detection device |
JP5173171B2 (en) | 2006-09-07 | 2013-03-27 | キヤノン株式会社 | PHOTOELECTRIC CONVERSION DEVICE, IMAGING DEVICE, AND SIGNAL READING METHOD |
JP5043388B2 (en) * | 2006-09-07 | 2012-10-10 | キヤノン株式会社 | Solid-state imaging device and imaging system |
JP5584982B2 (en) * | 2009-02-09 | 2014-09-10 | ソニー株式会社 | Solid-state imaging device and camera system |
JP4054839B1 (en) * | 2007-03-02 | 2008-03-05 | キヤノン株式会社 | Photoelectric conversion device and imaging system using the same |
JP5167677B2 (en) * | 2007-04-12 | 2013-03-21 | ソニー株式会社 | Solid-state imaging device, driving method for solid-state imaging device, signal processing method for solid-state imaging device, and imaging device |
JP4110193B1 (en) * | 2007-05-02 | 2008-07-02 | キヤノン株式会社 | Solid-state imaging device and imaging system |
JP4991436B2 (en) | 2007-08-02 | 2012-08-01 | キヤノン株式会社 | Imaging apparatus and imaging system |
EP2037667B1 (en) * | 2007-09-14 | 2017-08-23 | Canon Kabushiki Kaisha | Image sensing apparatus and imaging system |
DE102007045448A1 (en) | 2007-09-24 | 2009-04-02 | Arnold & Richter Cine Technik Gmbh & Co. Betriebs Kg | image sensor |
JP2009141631A (en) * | 2007-12-05 | 2009-06-25 | Canon Inc | Photoelectric conversion device and image pickup device |
JP5142749B2 (en) | 2008-02-14 | 2013-02-13 | キヤノン株式会社 | IMAGING DEVICE, IMAGING DEVICE CONTROL METHOD, AND IMAGING SYSTEM |
JP5156434B2 (en) * | 2008-02-29 | 2013-03-06 | キヤノン株式会社 | Imaging apparatus and imaging system |
JP5328207B2 (en) * | 2008-04-01 | 2013-10-30 | キヤノン株式会社 | Solid-state imaging device |
JP5161676B2 (en) * | 2008-07-07 | 2013-03-13 | キヤノン株式会社 | Imaging apparatus and imaging system |
JP5089514B2 (en) * | 2008-07-11 | 2012-12-05 | キヤノン株式会社 | Imaging apparatus and imaging system |
JP4617372B2 (en) * | 2008-08-29 | 2011-01-26 | キヤノン株式会社 | Imaging apparatus and imaging system |
JP5264379B2 (en) * | 2008-09-12 | 2013-08-14 | キヤノン株式会社 | IMAGING DEVICE, IMAGING SYSTEM, AND OPERATION METHOD OF IMAGING DEVICE |
JP5219724B2 (en) | 2008-10-09 | 2013-06-26 | キヤノン株式会社 | Solid-state imaging device |
JP5396809B2 (en) * | 2008-10-17 | 2014-01-22 | ソニー株式会社 | Solid-state imaging device, camera, and manufacturing method of solid-state imaging device |
DE102009004187A1 (en) | 2009-01-09 | 2010-07-15 | Arnold & Richter Cine Technik Gmbh & Co. Betriebs Kg | image sensor |
US8913166B2 (en) | 2009-01-21 | 2014-12-16 | Canon Kabushiki Kaisha | Solid-state imaging apparatus |
JP5478905B2 (en) * | 2009-01-30 | 2014-04-23 | キヤノン株式会社 | Solid-state imaging device |
JP5529613B2 (en) | 2009-04-17 | 2014-06-25 | キヤノン株式会社 | Photoelectric conversion device and imaging system |
CN101877758B (en) * | 2009-04-28 | 2013-04-03 | 英属开曼群岛商恒景科技股份有限公司 | Read-out system and method of image sensor |
JP4785963B2 (en) | 2009-10-09 | 2011-10-05 | キヤノン株式会社 | Solid-state imaging device |
JP5546198B2 (en) | 2009-10-09 | 2014-07-09 | キヤノン株式会社 | Solid-state imaging device |
JP5717329B2 (en) | 2009-10-09 | 2015-05-13 | キヤノン株式会社 | Solid-state imaging device and manufacturing method thereof |
JP5539373B2 (en) | 2009-10-09 | 2014-07-02 | キヤノン株式会社 | Solid-state imaging device and manufacturing method thereof |
JP5679653B2 (en) | 2009-12-09 | 2015-03-04 | キヤノン株式会社 | Photoelectric conversion device and imaging system using the same |
JP5538876B2 (en) * | 2009-12-25 | 2014-07-02 | キヤノン株式会社 | Solid-state imaging device |
JP5780711B2 (en) | 2010-04-06 | 2015-09-16 | キヤノン株式会社 | Solid-state imaging device |
KR101251744B1 (en) * | 2011-04-13 | 2013-04-05 | 엘지이노텍 주식회사 | Wdr pixel array, image sensor including the pixel array and method for operating the same |
US10243121B2 (en) | 2011-06-24 | 2019-03-26 | Cree, Inc. | High voltage monolithic LED chip with improved reliability |
JP5864990B2 (en) | 2011-10-03 | 2016-02-17 | キヤノン株式会社 | Solid-state imaging device and camera |
JP5967915B2 (en) | 2011-12-09 | 2016-08-10 | キヤノン株式会社 | Driving method of solid-state imaging device |
TWI516133B (en) * | 2012-01-18 | 2016-01-01 | 聯詠科技股份有限公司 | Apparatus and method for image processing |
JP5967955B2 (en) * | 2012-01-31 | 2016-08-10 | キヤノン株式会社 | Photoelectric conversion device and imaging system |
JP6023437B2 (en) | 2012-02-29 | 2016-11-09 | キヤノン株式会社 | Solid-state imaging device and camera |
CN102683368B (en) * | 2012-03-20 | 2015-01-14 | 格科微电子(上海)有限公司 | Complementary metal oxide semiconductor (CMOS) imaging sensor and producing method thereof |
JP2014112580A (en) * | 2012-12-05 | 2014-06-19 | Sony Corp | Solid-state image sensor and driving method |
JP2015053411A (en) * | 2013-09-09 | 2015-03-19 | ソニー株式会社 | Solid-state imaging device, method for manufacturing solid-state imaging device, and electronic equipment |
JP6541347B2 (en) | 2014-03-27 | 2019-07-10 | キヤノン株式会社 | Solid-state imaging device and imaging system |
EP3155217A4 (en) | 2014-08-15 | 2018-01-24 | Halliburton Energy Services, Inc. | High gain antenna for propagation logging tools |
JP6109125B2 (en) | 2014-08-20 | 2017-04-05 | キヤノン株式会社 | Semiconductor device, solid-state imaging device, and imaging system |
KR102010232B1 (en) * | 2014-11-17 | 2019-08-13 | 고쿠리츠다이가쿠호진 도호쿠다이가쿠 | Optical sensor, signal reading method therefor, solid-state imaging device, and signal reading method therefor |
CN105100651B (en) * | 2015-06-03 | 2019-04-23 | 格科微电子(上海)有限公司 | Imaging sensor and the method for reducing image sensor noise |
JP2017163010A (en) * | 2016-03-10 | 2017-09-14 | ソニー株式会社 | Imaging device and electronic apparatus |
JP2018060980A (en) | 2016-10-07 | 2018-04-12 | キヤノン株式会社 | Imaging display device and wearable device |
US10630897B2 (en) * | 2018-06-01 | 2020-04-21 | Semiconductor Components Industries, Llc | Image sensors with charge overflow capabilities |
US20240340547A1 (en) | 2021-08-10 | 2024-10-10 | ams Sensors USA Inc. | Self calibrating barrier modulation pixel |
JP2024516752A (en) * | 2022-04-15 | 2024-04-17 | 北京小米移動軟件有限公司 | Solid-state imaging devices and camera equipment |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5493423A (en) * | 1994-10-28 | 1996-02-20 | Xerox Corporation | Resettable pixel amplifier for an image sensor array |
US5633679A (en) * | 1995-05-19 | 1997-05-27 | Xerox Corporation | Photosensitive chip having transfer circuits which compensate for shielded test photosensors |
US20040119864A1 (en) * | 2002-12-03 | 2004-06-24 | Canon Kabushiki Kaisha | Photoelectric conversion device and image pick-up system using the photoelectric conversion device |
US20060057760A1 (en) * | 2004-09-16 | 2006-03-16 | Samsung Electronics Co., Ltd. | Image sensor and method for forming the same |
US7135668B2 (en) * | 2003-07-16 | 2006-11-14 | Canon Kabushiki Kaisha | Solid-state imaging apparatus comprising reference electric power source having the same circuit structure as that of signal amplification means for amplifying a signal from photoelectric conversion element |
US20060261246A1 (en) * | 2005-05-18 | 2006-11-23 | Alexander Krymski | Pixel circuit for image sensor |
US7442911B2 (en) * | 2002-12-25 | 2008-10-28 | Hamamatsu Photonics K.K. | Photodector including photodiodes having improved dynamic range, s/n ratio and speed of light detection |
US7442910B2 (en) * | 2002-08-29 | 2008-10-28 | Micron Technology, Inc. | High dynamic range cascaded integration pixel cell |
US7514732B2 (en) * | 2004-09-01 | 2009-04-07 | Canon Kabushiki Kaisha | Image pickup apparatus and image pickup system having plural semiconductor regions of a same conductivity type, with one of the semiconductor regions having a higher impurity concentration than and providing a potential to another of the semiconductor regions |
Family Cites Families (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4879470A (en) * | 1987-01-16 | 1989-11-07 | Canon Kabushiki Kaisha | Photoelectric converting apparatus having carrier eliminating means |
US5172249A (en) * | 1989-05-31 | 1992-12-15 | Canon Kabushiki Kaisha | Photoelectric converting apparatus with improved switching to reduce sensor noises |
JP3546525B2 (en) * | 1995-05-08 | 2004-07-28 | 日産自動車株式会社 | Image sensor |
JP3275579B2 (en) * | 1994-10-24 | 2002-04-15 | 日産自動車株式会社 | Image sensor |
JPH08186241A (en) | 1995-01-06 | 1996-07-16 | Canon Inc | Image pick-up element, and solid image pickup device |
JPH08289205A (en) * | 1995-04-13 | 1996-11-01 | Nissan Motor Co Ltd | Light receiving element and image input device using the same |
JP3559640B2 (en) | 1996-02-27 | 2004-09-02 | キヤノン株式会社 | Photoelectric conversion device |
TW421962B (en) | 1997-09-29 | 2001-02-11 | Canon Kk | Image sensing device using mos type image sensing elements |
US6246436B1 (en) * | 1997-11-03 | 2001-06-12 | Agilent Technologies, Inc | Adjustable gain active pixel sensor |
JPH11261046A (en) | 1998-03-12 | 1999-09-24 | Canon Inc | Solid-state image pickup device |
JP3571909B2 (en) | 1998-03-19 | 2004-09-29 | キヤノン株式会社 | Solid-state imaging device and method of manufacturing the same |
JP2000023041A (en) * | 1998-06-30 | 2000-01-21 | Toshiba Corp | Image pickup device |
US6054704A (en) * | 1998-06-30 | 2000-04-25 | Foveon, Inc. | Driven capacitor storage pixel sensor and array |
JP3592107B2 (en) * | 1998-11-27 | 2004-11-24 | キヤノン株式会社 | Solid-state imaging device and camera |
JP3592106B2 (en) * | 1998-11-27 | 2004-11-24 | キヤノン株式会社 | Solid-state imaging device and camera |
US6850278B1 (en) * | 1998-11-27 | 2005-02-01 | Canon Kabushiki Kaisha | Solid-state image pickup apparatus |
JP2000166755A (en) * | 1998-12-09 | 2000-06-20 | Morito Co Ltd | Drape forming tool for elevating curtain and elevating curtain |
US7324144B1 (en) | 1999-10-05 | 2008-01-29 | Canon Kabushiki Kaisha | Solid image pickup device, image pickup system and method of driving solid image pickup device |
US6307195B1 (en) | 1999-10-26 | 2001-10-23 | Eastman Kodak Company | Variable collection of blooming charge to extend dynamic range |
JP3467013B2 (en) | 1999-12-06 | 2003-11-17 | キヤノン株式会社 | Solid-state imaging device |
JP3558589B2 (en) * | 2000-06-14 | 2004-08-25 | Necエレクトロニクス株式会社 | MOS type image sensor and driving method thereof |
KR100504562B1 (en) * | 2001-07-18 | 2005-08-03 | 매그나칩 반도체 유한회사 | CMOS Image Sensor |
JP3984814B2 (en) * | 2001-10-29 | 2007-10-03 | キヤノン株式会社 | Imaging device, radiation imaging apparatus using the imaging device, and radiation imaging system using the imaging device |
US7429764B2 (en) | 2002-02-27 | 2008-09-30 | Canon Kabushiki Kaisha | Signal processing device and image pickup apparatus using the same |
JP3728260B2 (en) | 2002-02-27 | 2005-12-21 | キヤノン株式会社 | Photoelectric conversion device and imaging device |
JP2003298038A (en) * | 2002-04-05 | 2003-10-17 | Canon Inc | Photoelectric conversion element and solid-state imaging device using the same |
KR100523672B1 (en) * | 2003-04-30 | 2005-10-24 | 매그나칩 반도체 유한회사 | Cmos image sensor with multi floating diffusion region |
JP2004335803A (en) * | 2003-05-08 | 2004-11-25 | Fuji Photo Film Co Ltd | Mos type solid state imaging device and its driving method |
US7075049B2 (en) * | 2003-06-11 | 2006-07-11 | Micron Technology, Inc. | Dual conversion gain imagers |
JP2005012007A (en) * | 2003-06-19 | 2005-01-13 | Canon Inc | Element and apparatus for solid-state imaging and camera |
JP4514188B2 (en) | 2003-11-10 | 2010-07-28 | キヤノン株式会社 | Photoelectric conversion device and imaging device |
JP4508619B2 (en) | 2003-12-03 | 2010-07-21 | キヤノン株式会社 | Method for manufacturing solid-state imaging device |
JP3793202B2 (en) | 2004-02-02 | 2006-07-05 | キヤノン株式会社 | Solid-state imaging device |
JP3890333B2 (en) | 2004-02-06 | 2007-03-07 | キヤノン株式会社 | Solid-state imaging device |
JP4067054B2 (en) | 2004-02-13 | 2008-03-26 | キヤノン株式会社 | Solid-state imaging device and imaging system |
EP1732134B1 (en) * | 2004-02-27 | 2012-10-24 | National University Corporation Tohoku Unversity | Solid-state imagine device, line sensor, optical sensor, and method for operating solid-state imaging device |
US7605415B2 (en) | 2004-06-07 | 2009-10-20 | Canon Kabushiki Kaisha | Image pickup device comprising photoelectric conversation unit, floating diffusion region and guard ring |
JP4455435B2 (en) | 2004-08-04 | 2010-04-21 | キヤノン株式会社 | Solid-state imaging device and camera using the solid-state imaging device |
US7294818B2 (en) | 2004-08-24 | 2007-11-13 | Canon Kabushiki Kaisha | Solid state image pickup device and image pickup system comprising it |
JP2006073736A (en) | 2004-09-01 | 2006-03-16 | Canon Inc | Photoelectric converter, solid state imaging device and system |
JP4756839B2 (en) | 2004-09-01 | 2011-08-24 | キヤノン株式会社 | Solid-state imaging device and camera |
JP2006134396A (en) | 2004-11-04 | 2006-05-25 | Sony Corp | Linear tape system |
JP2006197392A (en) | 2005-01-14 | 2006-07-27 | Canon Inc | Solid-state imaging device, camera, and method of driving solid-state imaging device |
JP4416668B2 (en) | 2005-01-14 | 2010-02-17 | キヤノン株式会社 | Solid-state imaging device, control method thereof, and camera |
JP4459064B2 (en) | 2005-01-14 | 2010-04-28 | キヤノン株式会社 | Solid-state imaging device, control method thereof, and camera |
JP4459099B2 (en) | 2005-03-18 | 2010-04-28 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4794877B2 (en) | 2005-03-18 | 2011-10-19 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4459098B2 (en) | 2005-03-18 | 2010-04-28 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4677258B2 (en) | 2005-03-18 | 2011-04-27 | キヤノン株式会社 | Solid-state imaging device and camera |
JP4827508B2 (en) | 2005-12-02 | 2011-11-30 | キヤノン株式会社 | Imaging system |
JP2007242697A (en) | 2006-03-06 | 2007-09-20 | Canon Inc | Image pickup device and image pickup system |
US8184191B2 (en) * | 2006-08-09 | 2012-05-22 | Tohoku University | Optical sensor and solid-state imaging device |
-
2005
- 2005-01-14 JP JP2005008124A patent/JP4416668B2/en not_active Expired - Fee Related
-
2006
- 2006-01-12 CN CNB2006100051352A patent/CN100481891C/en not_active Expired - Fee Related
- 2006-01-12 EP EP06100266A patent/EP1681850B1/en not_active Not-in-force
- 2006-01-12 DE DE602006013056T patent/DE602006013056D1/en active Active
- 2006-01-13 US US11/332,734 patent/US7538810B2/en not_active Expired - Fee Related
-
2009
- 2009-04-29 US US12/431,831 patent/US8089545B2/en not_active Expired - Fee Related
-
2011
- 2011-12-15 US US13/326,743 patent/US8421894B2/en not_active Expired - Fee Related
-
2013
- 2013-03-07 US US13/788,782 patent/US20130181118A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5493423A (en) * | 1994-10-28 | 1996-02-20 | Xerox Corporation | Resettable pixel amplifier for an image sensor array |
US5633679A (en) * | 1995-05-19 | 1997-05-27 | Xerox Corporation | Photosensitive chip having transfer circuits which compensate for shielded test photosensors |
US7442910B2 (en) * | 2002-08-29 | 2008-10-28 | Micron Technology, Inc. | High dynamic range cascaded integration pixel cell |
US20040119864A1 (en) * | 2002-12-03 | 2004-06-24 | Canon Kabushiki Kaisha | Photoelectric conversion device and image pick-up system using the photoelectric conversion device |
US7442911B2 (en) * | 2002-12-25 | 2008-10-28 | Hamamatsu Photonics K.K. | Photodector including photodiodes having improved dynamic range, s/n ratio and speed of light detection |
US7135668B2 (en) * | 2003-07-16 | 2006-11-14 | Canon Kabushiki Kaisha | Solid-state imaging apparatus comprising reference electric power source having the same circuit structure as that of signal amplification means for amplifying a signal from photoelectric conversion element |
US7514732B2 (en) * | 2004-09-01 | 2009-04-07 | Canon Kabushiki Kaisha | Image pickup apparatus and image pickup system having plural semiconductor regions of a same conductivity type, with one of the semiconductor regions having a higher impurity concentration than and providing a potential to another of the semiconductor regions |
US20060057760A1 (en) * | 2004-09-16 | 2006-03-16 | Samsung Electronics Co., Ltd. | Image sensor and method for forming the same |
US20060261246A1 (en) * | 2005-05-18 | 2006-11-23 | Alexander Krymski | Pixel circuit for image sensor |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9276027B2 (en) | 2012-01-18 | 2016-03-01 | Canon Kabushiki Kaisha | Solid-state image sensor and camera |
US9818794B2 (en) | 2012-01-18 | 2017-11-14 | Canon Kabushiki Kaisha | Solid-state image sensor and camera |
US9147708B2 (en) | 2012-01-18 | 2015-09-29 | Canon Kabushiki Kaisha | Solid-state image sensor and camera |
US9497403B2 (en) | 2013-05-10 | 2016-11-15 | Canon Kabushiki Kaisha | Solid-state imaging apparatus and camera |
US9838633B2 (en) | 2014-03-31 | 2017-12-05 | Canon Kabushiki Kaisha | Photoelectric conversion device and image sensing system |
US9900539B2 (en) | 2015-09-10 | 2018-02-20 | Canon Kabushiki Kaisha | Solid-state image pickup element, and image pickup system |
WO2017146831A1 (en) * | 2016-02-26 | 2017-08-31 | Intel Corporation | Image sensor operation for shutter modulation and high dynamic range |
US9800807B2 (en) | 2016-02-26 | 2017-10-24 | Intel Corporation | Image sensor operation for shutter modulation and high dynamic range |
US10347679B2 (en) | 2016-05-26 | 2019-07-09 | Canon Kabushiki Kaisha | Imaging device |
US10785433B2 (en) * | 2016-06-10 | 2020-09-22 | Canon Kabushiki Kaisha | Imaging sensor, imaging system, and moving body having signals amplified in two different accumulation periods |
US10319765B2 (en) | 2016-07-01 | 2019-06-11 | Canon Kabushiki Kaisha | Imaging device having an effective pixel region, an optical black region and a dummy region each with pixels including a photoelectric converter |
US10194103B2 (en) | 2016-09-16 | 2019-01-29 | Canon Kabushiki Kaisha | Solid-state imaging device and method of driving solid-state imaging device with clipping level set according to transfer operation frequency |
US10504949B2 (en) | 2016-10-07 | 2019-12-10 | Canon Kabushiki Kaisha | Solid-state imaging device, method of driving solid-state imaging device, imaging system, and movable object |
US10382707B2 (en) | 2016-11-15 | 2019-08-13 | Canon Kabushiki Kaisha | Imaging device |
US10560650B2 (en) | 2017-04-24 | 2020-02-11 | Canon Kabushiki Kaisha | Photoelectric conversion device |
US11336844B2 (en) | 2018-08-23 | 2022-05-17 | Canon Kabushiki Kaisha | Imaging device, imaging system, and movable object |
US11425365B2 (en) | 2018-12-14 | 2022-08-23 | Canon Kabushiki Kaisha | Photoelectric conversion device, method of manufacturing photoelectric conversion device, and method of manufacturing semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
US20120086843A1 (en) | 2012-04-12 |
DE602006013056D1 (en) | 2010-05-06 |
JP4416668B2 (en) | 2010-02-17 |
CN1812507A (en) | 2006-08-02 |
CN100481891C (en) | 2009-04-22 |
US20090213260A1 (en) | 2009-08-27 |
JP2006197383A (en) | 2006-07-27 |
US8421894B2 (en) | 2013-04-16 |
US7538810B2 (en) | 2009-05-26 |
EP1681850A1 (en) | 2006-07-19 |
EP1681850B1 (en) | 2010-03-24 |
US8089545B2 (en) | 2012-01-03 |
US20060158539A1 (en) | 2006-07-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8089545B2 (en) | Solid-state image pickup device and control method thereof, and camera | |
US8883526B2 (en) | Image pickup device, its control method, and camera | |
US7550793B2 (en) | Image pickup device and camera with expanded dynamic range | |
US8698935B2 (en) | Solid-state image pickup device and camera having arrayed pixels including amplifying units | |
US7466003B2 (en) | Solid state image pickup device, camera, and driving method of solid state image pickup device | |
JP5247007B2 (en) | Imaging apparatus and imaging system | |
US7205523B2 (en) | Solid state image pickup device, method of manufacturing the same, and camera | |
JP2005065184A (en) | Solid state image sensor and its driving method, and video camera and still camera using it | |
JP5627728B2 (en) | Imaging apparatus and imaging system | |
JP5361938B2 (en) | Solid-state imaging device and camera | |
JP2007143067A (en) | Image sensing device and image sensing system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |