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US20070007517A1 - Cavity ball grid array apparatus having improved inductance characteristics - Google Patents

Cavity ball grid array apparatus having improved inductance characteristics Download PDF

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Publication number
US20070007517A1
US20070007517A1 US11/523,177 US52317706A US2007007517A1 US 20070007517 A1 US20070007517 A1 US 20070007517A1 US 52317706 A US52317706 A US 52317706A US 2007007517 A1 US2007007517 A1 US 2007007517A1
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Prior art keywords
package
die
semiconductor die
conductive
conductive element
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US11/523,177
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Jerry Brooks
Steven Thummel
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Priority to US11/523,177 priority Critical patent/US20070007517A1/en
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Definitions

  • This invention relates generally to integrated circuit packages and, more particularly, to the fabrication of integrated circuit packages having multiple layers, and the resulting structure. More particularly still, the present invention relates to a fully populated ball grid array integrated circuit package providing a cavity for mounting of a semiconductor die therein and a ground plane element extending about or optionally over the die.
  • VLSI very large scale integrated circuit
  • Such devices may typically be encapsulated in a protective package providing a large number of pin-outs for mounting or interconnection to external circuitry through a carrier substrate such as a printed circuit board or other higher-level packaging.
  • the pin-outs for such packages may include, for example, a pin grid array (“PGA”), or a ball grid array (“BGA”). Both PGA and BGA packages allow for surface mounting upon a printed circuit board.
  • PGA arrays include a two-dimensional array of metal pins that can be directly connected, as by soldering, to the printed circuit board or inserted in a mating socket arrangement carried by the board.
  • a BGA array includes a two-dimensional array of conductive elements formed as, for example, balls, bumps or pillars instead of metal pins.
  • the conductive elements may, by way of example only, be formed as solder (typically lead/tin, although other alloys are employed) balls, may each comprise a relatively higher melting point ball or bump having a solder or other relatively lower melting point outer covering, or may comprise conductive bumps or pillars formed of a conductive or conductor-filled adhesive such as an epoxy.
  • the bond pads of the semiconductor die disposed within a package must be connected to the printed circuit board via conductors carried by the package, either by direct contact therewith in a flip-chip orientation through conductive balls, bumps or pillars or, alternatively, by intermediate connector elements comprising wire bonds, or TAB (flexible circuit) connections.
  • the semiconductor die is usually protected on the package by an encapsulant of a plastic, epoxy or silicone material or by being housed in a rigid-walled chamber. Exemplary BGA structures are disclosed in the following U.S. Pat. Nos.
  • BGA packages are offered by various manufacturers and include, among others, the Tessera ⁇ BGA, the Advanced Semiconductor Assembly Technology BGA, the Motorola PBGA (OMPAC), the Yamichi YFlex-LCP, the ProLinx VBGATM, and the IBM TBGA.
  • BGA packages are becoming widely accepted within the industry due to the ability of BGA designs to accommodate a large number of I/Os, the number of which appears to be ever-increasing for all die types, in the relatively compact area defined within the conductive element array.
  • a number of conventional BGA packages are not capable of supporting a fully populated array of conductive ball elements, as the manner in which the die is mounted in the package, or electrically connected to the package traces, requires a conductive element-devoid area in the middle of the conductive element array and so limits the number of solder balls or other conductive elements in the array.
  • the integrated circuits carried on a semiconductor die would ideally be electrically connected to conductive traces on carrier substrates such as printed circuit boards and thus to other integrated circuits carried on the same or other such substrates by infinitesimally short conductors, eliminating impedance problems such as undesirable inductance and other conductor-induced system noise.
  • the present invention provides a BGA package supporting a fully populated array of solder balls or other conductive elements and exhibiting superior inductance characteristics.
  • the BGA package of the present invention comprises a base laminate or sandwich of a dielectric interposed between two conductive sheets and which, in turn, are respectively partially covered by two outer insulative layers.
  • One conductive sheet is patterned to provide sites for the conductive elements of an array for connecting the semiconductor die of the package to external circuitry.
  • the other conductive sheet is patterned to define a plurality of conductive traces, each trace extending from an interior die-attach location on the laminate to a location above a conductive site, or to a location suitable for connection to a ground plane for the package.
  • a conductive die-attach pad may be provided at the same time as the traces and communicate with a trace for providing a ground or reference voltage for the semiconductor die.
  • Vias formed with conductive material extend from the traces on one side of the laminate through the dielectric to the conductive element sites on the opposing side.
  • An anisotropically or “Z-axis” conductive adhesive layer in the form of a film configured as a frame is then applied over the trace side of the laminate to define an interior region cavity including the die-attach location as well as openings in the frame to allow electrical connection between a conductive stiffener for the package formed as a lid extending over the die-attach location and appropriate conductive traces.
  • the cavity is large enough to leave inner trace ends exposed for connection of bond pads of the semiconductor die thereto by wire bonds, although the invention is not limited to this interconnection technology.
  • the inner trace ends may be patterned as a conductive pad array to connect to intermediate conductive elements such as solder balls or epoxy pillars protruding from the active surface of a flip-chip configured die placed face down on the laminate.
  • a ground or other voltage reference plane element (hereinafter sometimes referenced generally as a “reference plane element”) is secured to the adhesive layer.
  • reference plane element Various embodiments of the structure of the BGA package of the invention include differing reference plane element structures, which in turn also permit different die enclosure techniques.
  • the insulative layer over the traces is provided with at least one through hole for connection of one or more circuit traces to the reference plane element by mutual contact with the anisotropically conductive adhesive layer.
  • the reference plane element is also formed as a frame of like size and shape to the adhesive frame, and placed thereover in alignment therewith, providing a deepened cavity. It should be noted that the use of a relatively thick, and thus rigid, reference plane element permits the use of a flexible, tape-type base laminate in the package, and also provides additional mass to facilitate heat transfer from the semiconductor die. After the semiconductor die is back-bonded to the die-attach location on the base laminate, connections are formed between the traces and the bond pads of the die, after which the die, inner trace ends and connections may be encapsulated with a so-called “glob top” of dielectric material, providing physical and environment protection for the encapsulated elements. The reference plane element and underlying adhesive provide a four-sided dam to prevent unwanted lateral encapsulant spread.
  • the reference plane element comprises an imperforate conductive sheet extending over the cavity defined by the adhesive frame.
  • the adhesive is particularly thick, the semiconductor die relatively thin, or a recess is provided in an unusually thick dielectric portion of the base laminate, the reference plane element may be planar in nature, providing a flat lid for the cavity containing the die. If, however, the die thickness plus the height of connecting elements, such as wire bonds, exceeds the thickness of the adhesive frame, the reference plane element may be formed with a central dome or protrusion over the cavity area to provide adequate clearance. Such a feature may also enhance package rigidity, while permitting use of thinner conductive sheet material for the reference plane element.
  • the die is connected to the conductive traces of the base laminate before the reference plane element is applied.
  • a thick encapsulant may again be used to protect the die and connections, but it may be preferred, in this instance, to employ a low viscosity dielectric material to merely coat the exterior of the die and the connections to prevent shorting of the latter against the inner side of the reference plane element.
  • yet another embodiment of the invention includes a package configured for use with a flip-chip configured semiconductor die, wherein the upper conductive sheet of the base laminate is patterned with traces having ends configured and arranged in an array of pads or terminals for contact with intermediate conductive elements, such as solder balls or conductive epoxy pillars, protruding transversely from the active surface of the die.
  • An encapsulant may be employed to surround and in-fill between the active surface of the die and the pads, or a reference plane element employed as a lid over the cavity area to enclose the die.
  • FIG. 1 is a top view of one embodiment of a ball grid array package according to the present invention.
  • FIG. 2 is a partial cross-sectional side view of the ball grid array package according to FIG. 1 ;
  • FIG. 3 is a partial cross-sectional side view of a first variant of another embodiment of the ball grid array package of the invention.
  • FIG. 4 is a partial cross-sectional side view of a second variant of the embodiment of FIG. 3 of the ball grid array package of the present invention.
  • FIG. 5 is an enlarged partial cross-sectional side view of a flip-chip embodiment of the present invention.
  • FIG. 6 is a block diagram of an electronic system incorporating the semiconductor package of the invention.
  • FIGS. 1 and 2 depict an exemplary ball grid array integrated circuit (IC) package 10 having a cavity 12 , shown in cross-section in FIG. 2 , for receiving an integrated circuit device, such as a semiconductor die 14 .
  • IC integrated circuit
  • IC package 10 includes a base laminate 16 formed of a dielectric film or sheet 18 , which may comprise a polyimide such as a KAPTON® film, sandwiched between two conductive layers 20 and 22 , preferably of copper, over which are located two insulative layers 6 and 8 , preferably of Taiyo 9000® solder mask, although other alternative materials are suitable.
  • the base laminate 16 may be procured as one system through Shedahl, Inc. of Northfield, Minn. as ViaThin® integrated circuit substrate.
  • the lower conductive layer 20 has been patterned to define an exemplary 6 ⁇ 12 array of pad-type conductive element sites 24 (only some shown for clarity) on which a like number of conductive elements 26 for connecting die 14 to external circuitry 28 on a carrier substrate 30 (shown in broken lines in FIG. 2 ) are placed or formed.
  • the copper conductive element sites 24 are preferably plated with nickel and then gold before conductive elements 26 , in the form of tin/lead solder balls, are formed thereon.
  • the upper conductive layer 22 has been patterned to define a plurality of circuit traces 32 , the trace inner ends 46 of at least some of which extend from locations within cavity 12 to locations of conductive vias 34 extending through dielectric film 18 to conductive element sites 24 .
  • Upper conductive layer 22 may also be patterned to provide a conductive die-attach pad 36 , as well as traces 32 extending to the locations of vias 34 and sites 44 for connection of a ground or reference plane thereto, as hereinafter described.
  • Die-attach pad 36 and traces 32 (or at least trace inner ends 46 ) preferably comprise a lay-up of gold over nickel over the copper of layer 22 .
  • Patterning of the conductive layers 20 and 22 may be effected by any technique known in the art, such as application of a positive or negative photoresist, selective exposure of the resist layer through a mask to define the desired pattern followed by removal of the unfixed resist from the sheet, and chemical etching of the exposed conductive sheet material.
  • Formation of the conductive vias 34 may be effected by 1) photo-etching, laser ablation or numerically controlled punching of apertures through the laminate structure followed by 2) electroless or electrolytic plating of a metal, preferably copper.
  • solder mask insulative layers 6 and 8 are respectively formed over the lower and upper surfaces of the laminate. Apertures exposing conductive element sites are defined through lower solder mask layer 6 , while upper solder mask layer 8 is imperforate except over die-attach pad 36 or a die-attach area of the upper surface of the base laminate if no die-attach pad is employed and at locations where conductive paths of Z-axis adhesive layer 40 (see below) are to connect to vias 34 extending through base laminate 16 and connecting a conductive ground or reference plane element 50 (see below) to a conductive element site 24 and its associated conductive element 26 .
  • lower solder mask layer 6 defines the locations for conductive elements 26 in the form of solder balls or bumps formed or placed on conductive element sites 24 and constrains migration of the solder during reflow when the package 10 is attached to a carrier substrate 30 .
  • a Z-axis adhesive layer 40 which may comprise Nitto ACF® anisotropic conductive film available from Nitto Denko America, Inc. of Fremont, Calif., is applied over the base laminate 16 to at least partially define cavity 12 in which die 14 will reside.
  • a “Z-axis” or anisotropically conductive adhesive comprises an adhesive or adhesively coated dielectric or insulative film or layer having laterally separated conductive paths 52 (some shown in broken lines) extending therethrough in an orientation transverse to the plane of the film or layer.
  • Adhesive layer 40 is preferably applied in the form of a frame-shaped, preform sheet by which one or more traces 32 may be electrically connected to ground or reference plane element 50 . Trace inner ends 46 of traces 32 extend from under adhesive layer 40 into central aperture 42 framed thereby, so that bond pads 14 a of die 14 may be wire-bonded or otherwise connected as shown at 48 to the trace inner ends 46 .
  • a frame-shaped ground or reference plane element 50 having a central aperture 54 of like size and shape with central aperture 42 of adhesive layer 40 is applied over adhesive layer 40 in alignment therewith.
  • the combined thicknesses of adhesive layer 40 and reference plane element 50 define the depth of cavity 12 .
  • Ground or reference plane element 50 is preferably formed of copper, and may be selected to be at least of a thickness to provide desired rigidity to package 10 . Additional thickness may be incorporated in reference plane element 50 to provide a heat sink and facilitate heat transfer from die 14 .
  • Z-axis adhesive layer 40 electrically connects ground or reference plane element 50 to the upper end of a via 34 exposed through an aperture in solder mask layer 8 .
  • a complete base laminate 16 with conductive elements 26 , Z-axis adhesive layer 40 and reference plane element 50 is assembled prior to affixation of die 14 thereto.
  • Die 14 may then be secured to a conductive die-attach pad 36 (if used) by a conductive epoxy, silver solder, or other conductive bonding agent known in the art. If a conductive back side connection for die 14 is not required, numerous bonding agents may be employed. Further, if die 14 is secured by a dielectric adhesive, traces 32 may be patterned to extend from the edge of die 14 back under the die-attach adhesive for connection through vias 34 to underlying conductive element sites 24 to achieve the aforementioned fully populated array of conductive elements 26 . Alternatively, if a conductive die-attach pad 36 is employed, traces 24 a may be patterned on the lower conductive layer 20 extending from vias 34 laterally offset from die 14 to conductive element sites 24 directly under die 14 .
  • Die 14 attached to die-attach pad 36 with a conductive bonding agent, may be connected through an appropriate via 34 , conductive element site 24 and conductive element 26 typically to V ss (ground) or V bb (back bias, or reference, potential), or even possibly to V cc (power), depending upon the application. In the latter instance, use of a non-conductive die-attach adhesive would naturally be required. However, using die-attach pad 36 for power as suggested provides great flexibility in the number of options available for connecting power input bond pads of the die 14 to the die-attach pad 36 .
  • wire bonds 48 are formed between bond pads 14 a of die 14 and trace inner ends 46 , using gold, aluminum, or other suitable materials as known in the art.
  • a so-called “glob top” encapsulant 56 (shown for clarity in broken lines) comprising a mass of non-conductive epoxy or silicone may be applied over die 14 to fill cavity 12 to a level high enough to submerge the wire bonds 48 in encapsulant to protect the package components within cavity 12 against physical and environmental damage. It is desirable that encapsulant 56 be thermally conductive to facilitate heat transfer from die 14 during operation.
  • a suitable thermally conductive, electrically insulative encapsulant may be a Hysol® compound, as offered by Dexter Electronic Materials of Industry, California.
  • FIG. 3 another embodiment 100 of the package of the present invention is depicted.
  • Package 100 is similar to package 10 , with the base laminate 16 , conductive element sites 24 , conductive elements 26 , traces 32 , solder mask insulative layers 6 and 8 , die-attach pad 36 (if employed) and anisotropically conductive adhesive layer 40 being configured and assembled as described with respect to package 10 . It is at this juncture, differing from the assembly process for package 10 , that die 14 would be attached and wire-bonded, before a ground or reference plane element 150 is affixed.
  • the ground or reference plane element 150 of package 100 is configured as an imperforate, substantially planar sheet (again, preferably of copper) extending over cavity 12 and providing a lid therefore, the combination of adhesive layer 40 and reference plane element 150 providing an environmentally sealed chamber 152 for die 14 .
  • the thickness of adhesive layer 40 may be sufficient to provide clearance for die 14 and wire bonds 48 under ground or reference plane element 150 .
  • reference plane element 150 may be provided with an underside recess 154 to be aligned with cavity 12 . While a “glob top” encapsulant is not required in this embodiment, a low-viscosity dielectric material may be applied after wire-bonding to prevent shorting of the wire bonds 48 against the underside of reference plane element 150 .
  • a dielectric film 156 may be applied to the underside of reference plane element 150 in the central area wherein it extends over cavity 12 .
  • Ground or reference plane 250 of package 200 rather than being planar, includes a central dome or protrusion 260 defining a recess 254 thereunder, which is located to be above cavity 12 in assembled package 200 and thus define an environmentally sealed chamber 252 of enhanced height to clear die 14 and wire bonds 48 .
  • a dielectric film 256 may be formed on the underside of ground or reference plane 250 to preclude wire bond shorting, or a dielectric coating may be applied to the wire bonds 48 .
  • a flip-chip configured die 14 is carried in package 300 , only the die cavity 12 portion of which is depicted for clarity, all other aspects of package 300 corresponding to the structure of one or more of the previously described packages 10 , 100 or 200 .
  • the same reference numerals are used in FIG. 5 to identify the same features present in FIGS. 1 through 4 .
  • die-attach pad 36 is eliminated and base laminate 16 includes traces 32 extending into cavity 12 defined by central aperture 42 of adhesive layer 40 and terminating at trace inner ends 46 sized, shaped and located to define a terminal array 302 configured to connect to intermediate conductive elements 126 extending transversely from active surface 14 as of a flip-chip configured die 14 .
  • Conductive elements 126 may comprise solder, or a conductive- or conductor-carrying adhesive.
  • Reference plane element 50 may surround cavity 12 as shown, or extend thereover as shown in broken lines at 50 a .
  • a connection between the back side 14 b of die 14 and the reference plane element 50 may be effected by a wire or strap 51 (which may even comprise a protrusion of the reference plane material over central aperture 42 ), while in the latter instance, a conductive material such as a conductive epoxy or silver solder or even a resilient conductive element may be interposed between the back side 14 b of the die and the underside of the reference plane element 50 , such interposed structures shown in broken lines and generally designated by reference numeral 53 in FIG. 5 .
  • the present invention comprises a packaged semiconductor device wherein inductance and impedance of a group of adjacent, substantially co-planar circuit traces is reduced, and reflection and signal integrity improved, through the use of at least one voltage reference plane element in close, overlapping or superimposed proximity to the plane of the traces.
  • V ss the voltage potential will be connected to ground, or V ss , it is contemplated that there are some applications where another reference potential may be employed with the plane element.
  • the reference plane element of the present invention reduces the self inductance associated with closely adjacent elongated traces by reducing the magnetic flux caused by oppositely directed currents flowing in the traces and the reference plane element, typically ground.
  • the reference plane element reduces the self inductance through an increase in effective width and a decrease in the distance between the voltage reference plane and the traces.
  • the immediate proximity of the reference plane element to closely laterally adjacent traces of the base laminate exhibiting troublesome inductance characteristics reduces mutual inductance by interruption of the magnetic fields generated by adjacent traces and thus the effects of their interaction.
  • circuit switching times are reduced while noise is maintained at a tolerable level.
  • the voltage reference plane arrangement of the invention also provides at least a nominal heat sink effect to the semiconductor device as housed in the central cavity of the package, promoting more even distribution of heat generated during operation of the semiconductor die than might be achieved through the traces alone.
  • the heat sink effect may, of course, be enhanced by increasing the mass of the reference plane element, as by enhancing its thickness within the constraints of the package dimensions.
  • a further advantage of the present invention resides in the bending and torsional rigidity, mechanical support and protection provided the traces, the base laminate and the package as a whole by the reference plane element.
  • semiconductor dice usable with packages according to the present invention may comprise an integrated circuit die 14 employed for storing or processing digital information, including, for example, a Dynamic Random Access Memory (DRAM) integrated circuit die, a Static Random Access Memory (SRAM) integrated circuit die, a Synchronous Graphics Random Access Memory (SGRAM) integrated circuit die, a Programmable Read-Only Memory (PROM) integrated circuit die, an Electrically Erasable PROM (EEPROM) integrated circuit die, a flash memory die and a microprocessor die, and that the present invention includes such devices within its scope.
  • DRAM Dynamic Random Access Memory
  • SRAM Static Random Access Memory
  • SGRAM Synchronous Graphics Random Access Memory
  • PROM Programmable Read-Only Memory
  • EEPROM Electrically Erasable PROM
  • an electronic system 400 includes an input device 402 and an output device 404 coupled to a processor device 406 which, in turn, is coupled to a memory device 408 , at least one of the processor device 406 and the memory device 408 being configured as one of the exemplary integrated circuit packages 10 , 100 , 200 or 300 according to the invention.
  • an insulative layer defining one or more suitably placed apertures therethrough housing conductive materials may be employed to connect the ground or reference plane element to a trace on the base laminate, to a via therethrough and ultimately to higher-level packaging through a conductive element on the bottom of the base laminate.
  • the upper insulative film may be eliminated.
  • Conductive elements other than solder may be employed, and other materials may be substituted for those disclosed for use in the various other structural features of the invention. Therefore, the invention should be limited only by the following claims.

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Abstract

A ball grid array (BGA) package that includes a central cavity for receiving a semiconductor die therein is disclosed. The die rests on a base laminate, the die side of which includes traces therein extending into the cavity, which is framed at least by an anisotropically conductive adhesive layer. Bond pads on the die are electrically connected, to the traces. The traces are, in turn, electrically connected through conductive vias to conductive element sites on the opposite side of the base laminate through a dielectric layer, the conductive element sites carrying solder balls or other discrete conductive bonding elements for connection to higher-level packaging. A ground plane, may extend over the adhesive layer and frame the cavity, or also extend over the cavity to provide an enclosure for the die. In the former case, an encapsulant is applied over the die and electrical connections to the traces.

Description

    CROSS-REFERENCE TO RELATED APPLICATIONS
  • This application is a divisional of application Ser. No. 11/265,350, filed Nov. 2, 2005, pending, which is a continuation of application Ser. No. 10/847,705, filed May 17, 2004, now U.S. Pat. No. 6,982,486, issued Jan. 3, 2006, which is a continuation of application Ser. No. 10/011,525, filed Nov. 5, 2001, now U.S. Pat. No. 6,740,971, issued May 25, 2004, which is a continuation of application Ser. No. 09/567,633, filed May 9, 2000, now U.S. Pat. No. 6,326,244, issued Dec. 4, 2001, which is a continuation of application Ser. No. 09/146,643, filed Sep. 3, 1998, now U.S. Pat. No. 6,084,297, issued Jul. 4, 2000.
  • BACKGROUND OF THE INVENTION
  • This invention relates generally to integrated circuit packages and, more particularly, to the fabrication of integrated circuit packages having multiple layers, and the resulting structure. More particularly still, the present invention relates to a fully populated ball grid array integrated circuit package providing a cavity for mounting of a semiconductor die therein and a ground plane element extending about or optionally over the die.
  • In recent years, semiconductor miniaturization has resulted in the development of very large scale integrated circuit (“VLSI”) devices including perhaps thousands of active components thereon. Such devices may typically be encapsulated in a protective package providing a large number of pin-outs for mounting or interconnection to external circuitry through a carrier substrate such as a printed circuit board or other higher-level packaging. The pin-outs for such packages may include, for example, a pin grid array (“PGA”), or a ball grid array (“BGA”). Both PGA and BGA packages allow for surface mounting upon a printed circuit board. PGA arrays include a two-dimensional array of metal pins that can be directly connected, as by soldering, to the printed circuit board or inserted in a mating socket arrangement carried by the board. On the other hand, a BGA array includes a two-dimensional array of conductive elements formed as, for example, balls, bumps or pillars instead of metal pins. The conductive elements may, by way of example only, be formed as solder (typically lead/tin, although other alloys are employed) balls, may each comprise a relatively higher melting point ball or bump having a solder or other relatively lower melting point outer covering, or may comprise conductive bumps or pillars formed of a conductive or conductor-filled adhesive such as an epoxy.
  • The bond pads of the semiconductor die disposed within a package must be connected to the printed circuit board via conductors carried by the package, either by direct contact therewith in a flip-chip orientation through conductive balls, bumps or pillars or, alternatively, by intermediate connector elements comprising wire bonds, or TAB (flexible circuit) connections. Finally, the semiconductor die is usually protected on the package by an encapsulant of a plastic, epoxy or silicone material or by being housed in a rigid-walled chamber. Exemplary BGA structures are disclosed in the following U.S. Pat. Nos. 5,397,921; 5,409,865; 5,455,456; 5,490,324; 5,563,446; 5,586,010; 5,594,275; 5,596,227; 5,598,033; 5,598,036; 5,598,321; and 5,708,567. BGA packages are offered by various manufacturers and include, among others, the Tessera μBGA, the Advanced Semiconductor Assembly Technology BGA, the Motorola PBGA (OMPAC), the Yamichi YFlex-LCP, the ProLinx VBGA™, and the IBM TBGA.
  • The use of BGA packages is becoming widely accepted within the industry due to the ability of BGA designs to accommodate a large number of I/Os, the number of which appears to be ever-increasing for all die types, in the relatively compact area defined within the conductive element array. However, a number of conventional BGA packages are not capable of supporting a fully populated array of conductive ball elements, as the manner in which the die is mounted in the package, or electrically connected to the package traces, requires a conductive element-devoid area in the middle of the conductive element array and so limits the number of solder balls or other conductive elements in the array.
  • In addition, there is a continued trend in the computer industry toward ever-higher speed integrated circuit (IC) assemblies based upon semiconductor die technology. Such high signal speeds, however, lack utility unless accompanied by suppression of system noise to an acceptable level. The trend toward lower operational signal voltages in combination with such high speeds exacerbates noise problems.
  • At state-of-the art operational speeds, signal propagation delays, switching noise, and crosstalk between signal conductors resulting from mutual inductance and self inductance phenomena of the conductive paths all become significant to signal degradation. Mutual inductance results from an interaction between magnetic fields created by signal currents flowing to and from a packaged IC die through leads or traces, while self inductance results from the interaction of the foregoing fields with magnetic fields created by oppositely directed currents flowing to and from ground.
  • Therefore, the integrated circuits carried on a semiconductor die would ideally be electrically connected to conductive traces on carrier substrates such as printed circuit boards and thus to other integrated circuits carried on the same or other such substrates by infinitesimally short conductors, eliminating impedance problems such as undesirable inductance and other conductor-induced system noise.
  • As a practical matter, however, as the capacity and speed of many integrated circuit devices such as dynamic random access memories (DRAMs) have increased, the number of inputs and outputs (I/Os) to each die has increased, requiring more numerous and complex external connections thereto and, in some instances, requiring undesirably long traces to place the bond pads serving as I/Os for the typical die in communication with the traces of the carrier substrate.
  • While lead inductance in IC packages has not traditionally been troublesome because slow signal frequencies of past devices render such inductance relatively insignificant, faster and ever-increasing signal frequencies of state-of-the-art electronic systems have substantially increased the practical significance of package lead or trace inductance. For example, at such faster signal frequencies, performance of IC dice using extended leads or traces for external electrical connection is slower than desirable because the inductance associated with the elongated conductive paths required slows changes in signal currents through the leads or traces, prolonging signal propagation therethrough. Further, digital signals propagating along the leads or traces are dispersing or “spreading out” because the so-called “Fourier” components of various frequencies making up the digital signals propagate through the inductance associated with the leads or traces at different speeds, causing the signal components and thus the signals themselves to disperse. While mild dispersion merely widens the digital signals without detrimental effect, severe dispersion can make the digital signals unrecognizable upon receipt. In addition, so-called “reflection” signals propagating along the leads or traces as a result of impedance mismatches between the lead fingers and associated IC die or between the leads or traces and external circuitry, caused in part by lead-associated inductance, can distort normal signals propagating concurrently with the reflection signals. Further, magnetic fields created by signal currents propagating through the lead or trace-associated inductance can induce currents in adjacent leads or traces, causing so-called “crosstalk” noise on the latter. While these various effects might be troublesome in any electronic system, the aforementioned trend toward lower voltage systems (currently 3.3 volts) and away from the traditional 5.0 volt systems increases their visibility and significance.
  • The ever-more-popular BGA die and package configurations described previously serve to exacerbate the noise problems by favoring a large plurality of laterally adjacent traces of substantial and varying lengths extending from adjacent, generally centralized die locations to the horizontally spaced, offset locations of vias extending to solder balls or other conductive elements for securing and electrically connecting the package to a carrier substrate. While a mechanically and electrically desirable packaging concept to accommodate the ever-increasing numbers of I/Os for state-of-the-art dice, long, varying-length, closely mutually adjacent trace runs over the package substrate become abusive in terms of unacceptably increasing real impedance as well as lead inductance (both self and mutual) in the circuit. These trace runs also increase 1) signal reflection in the circuit due to transmission line effects and degrade signal integrity due to the aforementioned, 2) propagation delays, 3) switching noise, 4) crosstalk and 5) dispersion. Further, elimination of a die-attach pad, as in many BGA packages, also eliminates the potential for employing a ground plane under the die, and such a ground plane in any case would not alleviate the problems attendant to use of the long package trace runs.
  • Therefore, it would also be desirable for a BGA package to accommodate and substantially overcome inductance-related deficiencies so that full advantage of the beneficial aspects of the packaging concept might be realized in a relatively simple, cost-effective BGA package.
  • BRIEF SUMMARY OF THE INVENTION
  • The present invention provides a BGA package supporting a fully populated array of solder balls or other conductive elements and exhibiting superior inductance characteristics.
  • The BGA package of the present invention comprises a base laminate or sandwich of a dielectric interposed between two conductive sheets and which, in turn, are respectively partially covered by two outer insulative layers. One conductive sheet is patterned to provide sites for the conductive elements of an array for connecting the semiconductor die of the package to external circuitry. The other conductive sheet is patterned to define a plurality of conductive traces, each trace extending from an interior die-attach location on the laminate to a location above a conductive site, or to a location suitable for connection to a ground plane for the package. A conductive die-attach pad may be provided at the same time as the traces and communicate with a trace for providing a ground or reference voltage for the semiconductor die. Vias formed with conductive material extend from the traces on one side of the laminate through the dielectric to the conductive element sites on the opposing side. An anisotropically or “Z-axis” conductive adhesive layer in the form of a film configured as a frame is then applied over the trace side of the laminate to define an interior region cavity including the die-attach location as well as openings in the frame to allow electrical connection between a conductive stiffener for the package formed as a lid extending over the die-attach location and appropriate conductive traces. The cavity is large enough to leave inner trace ends exposed for connection of bond pads of the semiconductor die thereto by wire bonds, although the invention is not limited to this interconnection technology. For example, the inner trace ends may be patterned as a conductive pad array to connect to intermediate conductive elements such as solder balls or epoxy pillars protruding from the active surface of a flip-chip configured die placed face down on the laminate.
  • A ground or other voltage reference plane element (hereinafter sometimes referenced generally as a “reference plane element”) is secured to the adhesive layer. Various embodiments of the structure of the BGA package of the invention include differing reference plane element structures, which in turn also permit different die enclosure techniques. In each embodiment, however, the insulative layer over the traces is provided with at least one through hole for connection of one or more circuit traces to the reference plane element by mutual contact with the anisotropically conductive adhesive layer.
  • In one embodiment, the reference plane element is also formed as a frame of like size and shape to the adhesive frame, and placed thereover in alignment therewith, providing a deepened cavity. It should be noted that the use of a relatively thick, and thus rigid, reference plane element permits the use of a flexible, tape-type base laminate in the package, and also provides additional mass to facilitate heat transfer from the semiconductor die. After the semiconductor die is back-bonded to the die-attach location on the base laminate, connections are formed between the traces and the bond pads of the die, after which the die, inner trace ends and connections may be encapsulated with a so-called “glob top” of dielectric material, providing physical and environment protection for the encapsulated elements. The reference plane element and underlying adhesive provide a four-sided dam to prevent unwanted lateral encapsulant spread.
  • In another embodiment, the reference plane element comprises an imperforate conductive sheet extending over the cavity defined by the adhesive frame. If the adhesive is particularly thick, the semiconductor die relatively thin, or a recess is provided in an unusually thick dielectric portion of the base laminate, the reference plane element may be planar in nature, providing a flat lid for the cavity containing the die. If, however, the die thickness plus the height of connecting elements, such as wire bonds, exceeds the thickness of the adhesive frame, the reference plane element may be formed with a central dome or protrusion over the cavity area to provide adequate clearance. Such a feature may also enhance package rigidity, while permitting use of thinner conductive sheet material for the reference plane element. In this embodiment, the die is connected to the conductive traces of the base laminate before the reference plane element is applied. A thick encapsulant may again be used to protect the die and connections, but it may be preferred, in this instance, to employ a low viscosity dielectric material to merely coat the exterior of the die and the connections to prevent shorting of the latter against the inner side of the reference plane element.
  • As alluded to previously, yet another embodiment of the invention includes a package configured for use with a flip-chip configured semiconductor die, wherein the upper conductive sheet of the base laminate is patterned with traces having ends configured and arranged in an array of pads or terminals for contact with intermediate conductive elements, such as solder balls or conductive epoxy pillars, protruding transversely from the active surface of the die. An encapsulant may be employed to surround and in-fill between the active surface of the die and the pads, or a reference plane element employed as a lid over the cavity area to enclose the die.
  • BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS
  • FIG. 1 is a top view of one embodiment of a ball grid array package according to the present invention;
  • FIG. 2 is a partial cross-sectional side view of the ball grid array package according to FIG. 1;
  • FIG. 3 is a partial cross-sectional side view of a first variant of another embodiment of the ball grid array package of the invention;
  • FIG. 4 is a partial cross-sectional side view of a second variant of the embodiment of FIG. 3 of the ball grid array package of the present invention;
  • FIG. 5 is an enlarged partial cross-sectional side view of a flip-chip embodiment of the present invention; and
  • FIG. 6 is a block diagram of an electronic system incorporating the semiconductor package of the invention.
  • DETAILED DESCRIPTION OF THE INVENTION
  • FIGS. 1 and 2 depict an exemplary ball grid array integrated circuit (IC) package 10 having a cavity 12, shown in cross-section in FIG. 2, for receiving an integrated circuit device, such as a semiconductor die 14. In some instances, the number of elements depicted on these and the remaining drawing figures herein has been limited for clarity of illustration only, and is not intended or to be taken as a limitation on the invention as claimed.
  • IC package 10 includes a base laminate 16 formed of a dielectric film or sheet 18, which may comprise a polyimide such as a KAPTON® film, sandwiched between two conductive layers 20 and 22, preferably of copper, over which are located two insulative layers 6 and 8, preferably of Taiyo 9000® solder mask, although other alternative materials are suitable. The base laminate 16 may be procured as one system through Shedahl, Inc. of Northfield, Minn. as ViaThin® integrated circuit substrate. In the package 10 as illustrated, the lower conductive layer 20 has been patterned to define an exemplary 6×12 array of pad-type conductive element sites 24 (only some shown for clarity) on which a like number of conductive elements 26 for connecting die 14 to external circuitry 28 on a carrier substrate 30 (shown in broken lines in FIG. 2) are placed or formed. The copper conductive element sites 24 are preferably plated with nickel and then gold before conductive elements 26, in the form of tin/lead solder balls, are formed thereon. The upper conductive layer 22 has been patterned to define a plurality of circuit traces 32, the trace inner ends 46 of at least some of which extend from locations within cavity 12 to locations of conductive vias 34 extending through dielectric film 18 to conductive element sites 24. Upper conductive layer 22 may also be patterned to provide a conductive die-attach pad 36, as well as traces 32 extending to the locations of vias 34 and sites 44 for connection of a ground or reference plane thereto, as hereinafter described. Die-attach pad 36 and traces 32 (or at least trace inner ends 46) preferably comprise a lay-up of gold over nickel over the copper of layer 22.
  • Patterning of the conductive layers 20 and 22 may be effected by any technique known in the art, such as application of a positive or negative photoresist, selective exposure of the resist layer through a mask to define the desired pattern followed by removal of the unfixed resist from the sheet, and chemical etching of the exposed conductive sheet material. Formation of the conductive vias 34 may be effected by 1) photo-etching, laser ablation or numerically controlled punching of apertures through the laminate structure followed by 2) electroless or electrolytic plating of a metal, preferably copper.
  • After conductive element sites 24 and traces 32 have been defined and conductive vias 34 formed and filled, solder mask insulative layers 6 and 8 are respectively formed over the lower and upper surfaces of the laminate. Apertures exposing conductive element sites are defined through lower solder mask layer 6, while upper solder mask layer 8 is imperforate except over die-attach pad 36 or a die-attach area of the upper surface of the base laminate if no die-attach pad is employed and at locations where conductive paths of Z-axis adhesive layer 40 (see below) are to connect to vias 34 extending through base laminate 16 and connecting a conductive ground or reference plane element 50 (see below) to a conductive element site 24 and its associated conductive element 26. It should be noted that lower solder mask layer 6 defines the locations for conductive elements 26 in the form of solder balls or bumps formed or placed on conductive element sites 24 and constrains migration of the solder during reflow when the package 10 is attached to a carrier substrate 30.
  • A Z-axis adhesive layer 40, which may comprise Nitto ACF® anisotropic conductive film available from Nitto Denko America, Inc. of Fremont, Calif., is applied over the base laminate 16 to at least partially define cavity 12 in which die 14 will reside. As known to those of ordinary skill in the art, a “Z-axis” or anisotropically conductive adhesive comprises an adhesive or adhesively coated dielectric or insulative film or layer having laterally separated conductive paths 52 (some shown in broken lines) extending therethrough in an orientation transverse to the plane of the film or layer. Adhesive layer 40 is preferably applied in the form of a frame-shaped, preform sheet by which one or more traces 32 may be electrically connected to ground or reference plane element 50. Trace inner ends 46 of traces 32 extend from under adhesive layer 40 into central aperture 42 framed thereby, so that bond pads 14 a of die 14 may be wire-bonded or otherwise connected as shown at 48 to the trace inner ends 46.
  • In the embodiment of FIGS. 1 and 2, a frame-shaped ground or reference plane element 50 having a central aperture 54 of like size and shape with central aperture 42 of adhesive layer 40 is applied over adhesive layer 40 in alignment therewith. The combined thicknesses of adhesive layer 40 and reference plane element 50 define the depth of cavity 12. Ground or reference plane element 50 is preferably formed of copper, and may be selected to be at least of a thickness to provide desired rigidity to package 10. Additional thickness may be incorporated in reference plane element 50 to provide a heat sink and facilitate heat transfer from die 14. Z-axis adhesive layer 40 electrically connects ground or reference plane element 50 to the upper end of a via 34 exposed through an aperture in solder mask layer 8. In fabricating package 10, a complete base laminate 16 with conductive elements 26, Z-axis adhesive layer 40 and reference plane element 50 is assembled prior to affixation of die 14 thereto.
  • Die 14 may then be secured to a conductive die-attach pad 36 (if used) by a conductive epoxy, silver solder, or other conductive bonding agent known in the art. If a conductive back side connection for die 14 is not required, numerous bonding agents may be employed. Further, if die 14 is secured by a dielectric adhesive, traces 32 may be patterned to extend from the edge of die 14 back under the die-attach adhesive for connection through vias 34 to underlying conductive element sites 24 to achieve the aforementioned fully populated array of conductive elements 26. Alternatively, if a conductive die-attach pad 36 is employed, traces 24 a may be patterned on the lower conductive layer 20 extending from vias 34 laterally offset from die 14 to conductive element sites 24 directly under die 14. Die 14, attached to die-attach pad 36 with a conductive bonding agent, may be connected through an appropriate via 34, conductive element site 24 and conductive element 26 typically to Vss (ground) or Vbb (back bias, or reference, potential), or even possibly to Vcc (power), depending upon the application. In the latter instance, use of a non-conductive die-attach adhesive would naturally be required. However, using die-attach pad 36 for power as suggested provides great flexibility in the number of options available for connecting power input bond pads of the die 14 to the die-attach pad 36.
  • Subsequent to die attach, wire bonds 48 are formed between bond pads 14 a of die 14 and trace inner ends 46, using gold, aluminum, or other suitable materials as known in the art. After wire bonding is completed, a so-called “glob top” encapsulant 56 (shown for clarity in broken lines) comprising a mass of non-conductive epoxy or silicone may be applied over die 14 to fill cavity 12 to a level high enough to submerge the wire bonds 48 in encapsulant to protect the package components within cavity 12 against physical and environmental damage. It is desirable that encapsulant 56 be thermally conductive to facilitate heat transfer from die 14 during operation. A suitable thermally conductive, electrically insulative encapsulant may be a Hysol® compound, as offered by Dexter Electronic Materials of Industry, California.
  • Referring now to FIG. 3, another embodiment 100 of the package of the present invention is depicted. The same reference numerals are employed in FIG. 3 to identify the same features as in FIGS. 1 and 2 for clarity. Package 100 is similar to package 10, with the base laminate 16, conductive element sites 24, conductive elements 26, traces 32, solder mask insulative layers 6 and 8, die-attach pad 36 (if employed) and anisotropically conductive adhesive layer 40 being configured and assembled as described with respect to package 10. It is at this juncture, differing from the assembly process for package 10, that die 14 would be attached and wire-bonded, before a ground or reference plane element 150 is affixed. The ground or reference plane element 150 of package 100 is configured as an imperforate, substantially planar sheet (again, preferably of copper) extending over cavity 12 and providing a lid therefore, the combination of adhesive layer 40 and reference plane element 150 providing an environmentally sealed chamber 152 for die 14. In this embodiment, of course, the thickness of adhesive layer 40 may be sufficient to provide clearance for die 14 and wire bonds 48 under ground or reference plane element 150. Alternatively, reference plane element 150 may be provided with an underside recess 154 to be aligned with cavity 12. While a “glob top” encapsulant is not required in this embodiment, a low-viscosity dielectric material may be applied after wire-bonding to prevent shorting of the wire bonds 48 against the underside of reference plane element 150. Alternatively, a dielectric film 156 may be applied to the underside of reference plane element 150 in the central area wherein it extends over cavity 12.
  • Referring now to FIG. 4, a variation 200 of package 100 is depicted. Package 200 and its assembly process flow are similar to that of package 100, and the same reference numerals are used in FIG. 4 to identify the same features present in FIGS. 1-3. Ground or reference plane 250 of package 200, rather than being planar, includes a central dome or protrusion 260 defining a recess 254 thereunder, which is located to be above cavity 12 in assembled package 200 and thus define an environmentally sealed chamber 252 of enhanced height to clear die 14 and wire bonds 48. Such a configuration may be required to accommodate an unusually thick die or excessive wire bond height. Again, a dielectric film 256 may be formed on the underside of ground or reference plane 250 to preclude wire bond shorting, or a dielectric coating may be applied to the wire bonds 48.
  • In the embodiment of FIG. 5, a flip-chip configured die 14 is carried in package 300, only the die cavity 12 portion of which is depicted for clarity, all other aspects of package 300 corresponding to the structure of one or more of the previously described packages 10, 100 or 200. The same reference numerals are used in FIG. 5 to identify the same features present in FIGS. 1 through 4. In package 300, die-attach pad 36 is eliminated and base laminate 16 includes traces 32 extending into cavity 12 defined by central aperture 42 of adhesive layer 40 and terminating at trace inner ends 46 sized, shaped and located to define a terminal array 302 configured to connect to intermediate conductive elements 126 extending transversely from active surface 14 as of a flip-chip configured die 14. Conductive elements 126 may comprise solder, or a conductive- or conductor-carrying adhesive. Reference plane element 50 may surround cavity 12 as shown, or extend thereover as shown in broken lines at 50 a. In the former instance, a connection between the back side 14 b of die 14 and the reference plane element 50 may be effected by a wire or strap 51 (which may even comprise a protrusion of the reference plane material over central aperture 42), while in the latter instance, a conductive material such as a conductive epoxy or silver solder or even a resilient conductive element may be interposed between the back side 14 b of the die and the underside of the reference plane element 50, such interposed structures shown in broken lines and generally designated by reference numeral 53 in FIG. 5.
  • In all its embodiments, the present invention comprises a packaged semiconductor device wherein inductance and impedance of a group of adjacent, substantially co-planar circuit traces is reduced, and reflection and signal integrity improved, through the use of at least one voltage reference plane element in close, overlapping or superimposed proximity to the plane of the traces. As noted above, while in many, if not most, instances the voltage potential will be connected to ground, or Vss, it is contemplated that there are some applications where another reference potential may be employed with the plane element.
  • The reference plane element of the present invention reduces the self inductance associated with closely adjacent elongated traces by reducing the magnetic flux caused by oppositely directed currents flowing in the traces and the reference plane element, typically ground. The reference plane element reduces the self inductance through an increase in effective width and a decrease in the distance between the voltage reference plane and the traces. Similarly, the immediate proximity of the reference plane element to closely laterally adjacent traces of the base laminate exhibiting troublesome inductance characteristics reduces mutual inductance by interruption of the magnetic fields generated by adjacent traces and thus the effects of their interaction. As a result of the presence of the reference plane element in the package, circuit switching times are reduced while noise is maintained at a tolerable level.
  • The voltage reference plane arrangement of the invention also provides at least a nominal heat sink effect to the semiconductor device as housed in the central cavity of the package, promoting more even distribution of heat generated during operation of the semiconductor die than might be achieved through the traces alone. As noted above, the heat sink effect may, of course, be enhanced by increasing the mass of the reference plane element, as by enhancing its thickness within the constraints of the package dimensions. A further advantage of the present invention resides in the bending and torsional rigidity, mechanical support and protection provided the traces, the base laminate and the package as a whole by the reference plane element.
  • Those skilled in the art will appreciate that semiconductor dice usable with packages according to the present invention may comprise an integrated circuit die 14 employed for storing or processing digital information, including, for example, a Dynamic Random Access Memory (DRAM) integrated circuit die, a Static Random Access Memory (SRAM) integrated circuit die, a Synchronous Graphics Random Access Memory (SGRAM) integrated circuit die, a Programmable Read-Only Memory (PROM) integrated circuit die, an Electrically Erasable PROM (EEPROM) integrated circuit die, a flash memory die and a microprocessor die, and that the present invention includes such devices within its scope. In addition, it will be understood that the shape, size, and configuration of dice and bond pads thereon may be varied without departing from the scope of the invention and appended claims.
  • As shown in FIG. 6, an electronic system 400 includes an input device 402 and an output device 404 coupled to a processor device 406 which, in turn, is coupled to a memory device 408, at least one of the processor device 406 and the memory device 408 being configured as one of the exemplary integrated circuit packages 10, 100, 200 or 300 according to the invention.
  • Although the invention has been described in detail, it should be realized that certain modifications can be made within the scope and spirit of the invention by those skilled in the art. For example, although less preferred, in lieu of an anisotropic adhesive layer, an insulative layer defining one or more suitably placed apertures therethrough housing conductive materials may be employed to connect the ground or reference plane element to a trace on the base laminate, to a via therethrough and ultimately to higher-level packaging through a conductive element on the bottom of the base laminate. In such an arrangement, the upper insulative film may be eliminated. Conductive elements other than solder may be employed, and other materials may be substituted for those disclosed for use in the various other structural features of the invention. Therefore, the invention should be limited only by the following claims.

Claims (12)

1. A semiconductor die package, comprising:
a package substrate having a surface including circuit traces extending from a central area on the surface to a peripheral area on the surface, the central area defining a die-attach location;
an adhesive layer disposed over the peripheral area on the surface of the package substrate; and
a conductive element disposed over the adhesive layer, wherein the adhesive layer provides an electrical connection between the conductive element and the circuit traces.
2. The semiconductor die package of claim 1, further comprising an insulative layer over the circuit traces having at least one aperture permitting electrical contact between the circuit traces and the conductive element.
3. The semiconductor die package of claim 2, wherein the insulative layer comprises a solder mask.
4. The semiconductor die package of claim 1, wherein a semiconductor die is electrically connected to the package substrate with at least one wire bond.
5. The semiconductor die package of claim 1, wherein a semiconductor die is electrically connected to the package substrate in a flip-chip configuration by conductive elements extending from an active surface of the semiconductor die.
6. The semiconductor die package of claim 1, wherein the conductive element includes an aperture therethrough aligned with the central area.
7. The semiconductor die package of claim 1, wherein the conductive element extends over the central area.
8. The semiconductor die package of claim 7, further comprising an underside recess in the conductive element aligned with the central area.
9. The semiconductor die package of claim 7, wherein the conductive element includes a protrusion defining a recess thereunder that is aligned with the central area.
10. The semiconductor die package of claim 1, wherein a semiconductor die is attached to a conductive die-attach pad on the surface of the package substrate.
11. The semiconductor die package of claim 1, further comprising at least one conductive element on an opposing surface of the package substrate and in electrical communication with the circuit traces.
12. A computer system, comprising:
an input device;
an output device;
a processor device; and
a memory device;
at least one of the processor device and the memory device being configured as:
a package substrate having a surface including circuit traces extending from a central area on the surface to a peripheral area on the surface, the central area defining a die-attach location;
an adhesive layer disposed over the peripheral area on the surface of the package substrate; and
a conductive element disposed over the adhesive layer, wherein the adhesive layer provides an electrical connection between the conductive element and the circuit traces.
US11/523,177 1998-09-03 2006-09-19 Cavity ball grid array apparatus having improved inductance characteristics Abandoned US20070007517A1 (en)

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Application Number Priority Date Filing Date Title
US09/146,643 US6084297A (en) 1998-09-03 1998-09-03 Cavity ball grid array apparatus
US09/567,633 US6326244B1 (en) 1998-09-03 2000-05-09 Method of making a cavity ball grid array apparatus
US10/011,525 US6740971B2 (en) 1998-09-03 2001-11-05 Cavity ball grid array apparatus having improved inductance characteristics
US10/847,705 US6982486B2 (en) 1998-09-03 2004-05-17 Cavity ball grid array apparatus having improved inductance characteristics and method of fabricating the same
US11/265,350 US7268013B2 (en) 1998-09-03 2005-11-02 Method of fabricating a semiconductor die package having improved inductance characteristics
US11/523,177 US20070007517A1 (en) 1998-09-03 2006-09-19 Cavity ball grid array apparatus having improved inductance characteristics

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US11/265,350 Division US7268013B2 (en) 1998-09-03 2005-11-02 Method of fabricating a semiconductor die package having improved inductance characteristics

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US09/146,643 Expired - Lifetime US6084297A (en) 1998-09-03 1998-09-03 Cavity ball grid array apparatus
US09/567,633 Expired - Fee Related US6326244B1 (en) 1998-09-03 2000-05-09 Method of making a cavity ball grid array apparatus
US10/011,525 Expired - Lifetime US6740971B2 (en) 1998-09-03 2001-11-05 Cavity ball grid array apparatus having improved inductance characteristics
US10/847,705 Expired - Fee Related US6982486B2 (en) 1998-09-03 2004-05-17 Cavity ball grid array apparatus having improved inductance characteristics and method of fabricating the same
US11/265,350 Expired - Fee Related US7268013B2 (en) 1998-09-03 2005-11-02 Method of fabricating a semiconductor die package having improved inductance characteristics
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US10/011,525 Expired - Lifetime US6740971B2 (en) 1998-09-03 2001-11-05 Cavity ball grid array apparatus having improved inductance characteristics
US10/847,705 Expired - Fee Related US6982486B2 (en) 1998-09-03 2004-05-17 Cavity ball grid array apparatus having improved inductance characteristics and method of fabricating the same
US11/265,350 Expired - Fee Related US7268013B2 (en) 1998-09-03 2005-11-02 Method of fabricating a semiconductor die package having improved inductance characteristics

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090026593A1 (en) * 2007-07-24 2009-01-29 Micron Technology, Inc. Thin semiconductor die packages and associated systems and methods
US9679834B2 (en) 2007-07-24 2017-06-13 Micron Technology, Inc. Semiconductor dies with recesses, associated leadframes, and associated systems and methods

Families Citing this family (288)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040124545A1 (en) * 1996-12-09 2004-07-01 Daniel Wang High density integrated circuits and the method of packaging the same
EP0960438A1 (en) * 1996-12-09 1999-12-01 Microbonds, Inc. High density integrated circuits and the method of packaging the same
US5837153A (en) * 1997-01-15 1998-11-17 Kawan; Joseph C. Method and system for creating and using a logotype contact module with a smart card
JPH11148068A (en) * 1997-11-18 1999-06-02 Shinko Electric Ind Co Ltd Anisotropic stress buffer and semiconductor device by using the same
US6184463B1 (en) * 1998-04-13 2001-02-06 Harris Corporation Integrated circuit package for flip chip
SG75841A1 (en) * 1998-05-02 2000-10-24 Eriston Invest Pte Ltd Flip chip assembly with via interconnection
US6406939B1 (en) 1998-05-02 2002-06-18 Charles W. C. Lin Flip chip assembly with via interconnection
US6143981A (en) 1998-06-24 2000-11-07 Amkor Technology, Inc. Plastic integrated circuit package and method and leadframe for making the package
US6084297A (en) * 1998-09-03 2000-07-04 Micron Technology, Inc. Cavity ball grid array apparatus
TW396462B (en) 1998-12-17 2000-07-01 Eriston Technologies Pte Ltd Bumpless flip chip assembly with solder via
SG82590A1 (en) 1998-12-17 2001-08-21 Eriston Technologies Pte Ltd Bumpless flip chip assembly with strips and via-fill
SG78324A1 (en) 1998-12-17 2001-02-20 Eriston Technologies Pte Ltd Bumpless flip chip assembly with strips-in-via and plating
US6576988B2 (en) * 1999-08-30 2003-06-10 Micron Technology, Inc. Semiconductor package
US6562545B1 (en) * 1999-09-17 2003-05-13 Micron Technology, Inc. Method of making a socket assembly for use with a solder ball
US6356452B1 (en) * 1999-10-13 2002-03-12 Micron Technology, Inc. Soldermask opening to prevent delamination
US6841412B1 (en) * 1999-11-05 2005-01-11 Texas Instruments Incorporated Encapsulation for particle entrapment
US6534861B1 (en) * 1999-11-15 2003-03-18 Substrate Technologies Incorporated Ball grid substrate for lead-on-chip semiconductor package
US20010023118A1 (en) * 2000-01-14 2001-09-20 Macpherson John Customization of an integrated circuit in packaged form
US6710454B1 (en) * 2000-02-16 2004-03-23 Micron Technology, Inc. Adhesive layer for an electronic apparatus having multiple semiconductor devices
US7042068B2 (en) 2000-04-27 2006-05-09 Amkor Technology, Inc. Leadframe and semiconductor package made using the leadframe
US6538898B1 (en) 2000-05-01 2003-03-25 Micron Technology, Inc. Method and apparatus of die attachment for BOC and F/C surface mount
US6558600B1 (en) * 2000-05-04 2003-05-06 Micron Technology, Inc. Method for packaging microelectronic substrates
WO2001085415A1 (en) 2000-05-08 2001-11-15 Micron Technology, Inc. Method and apparatus for distributing mold material in a mold for packaging microelectronic devices
US6589820B1 (en) 2000-06-16 2003-07-08 Micron Technology, Inc. Method and apparatus for packaging a microelectronic die
US6576494B1 (en) 2000-06-28 2003-06-10 Micron Technology, Inc. Recessed encapsulated microelectronic devices and methods for formation
US6365434B1 (en) 2000-06-28 2002-04-02 Micron Technology, Inc. Method and apparatus for reduced flash encapsulation of microelectronic devices
US6534876B1 (en) * 2000-06-30 2003-03-18 Amkor Technology, Inc. Flip-chip micromachine package
US7273769B1 (en) 2000-08-16 2007-09-25 Micron Technology, Inc. Method and apparatus for removing encapsulating material from a packaged microelectronic device
US6660626B1 (en) 2000-08-22 2003-12-09 Charles W. C. Lin Semiconductor chip assembly with simultaneously electrolessly plated contact terminal and connection joint
US6403460B1 (en) 2000-08-22 2002-06-11 Charles W. C. Lin Method of making a semiconductor chip assembly
US6562709B1 (en) 2000-08-22 2003-05-13 Charles W. C. Lin Semiconductor chip assembly with simultaneously electroplated contact terminal and connection joint
US6562657B1 (en) 2000-08-22 2003-05-13 Charles W. C. Lin Semiconductor chip assembly with simultaneously electrolessly plated contact terminal and connection joint
US6551861B1 (en) 2000-08-22 2003-04-22 Charles W. C. Lin Method of making a semiconductor chip assembly by joining the chip to a support circuit with an adhesive
US6436734B1 (en) 2000-08-22 2002-08-20 Charles W. C. Lin Method of making a support circuit for a semiconductor chip assembly
US6350633B1 (en) 2000-08-22 2002-02-26 Charles W. C. Lin Semiconductor chip assembly with simultaneously electroplated contact terminal and connection joint
US6402970B1 (en) 2000-08-22 2002-06-11 Charles W. C. Lin Method of making a support circuit for a semiconductor chip assembly
US6483044B1 (en) 2000-08-23 2002-11-19 Micron Technology, Inc. Interconnecting substrates for electrical coupling of microelectronic components
US6563299B1 (en) * 2000-08-30 2003-05-13 Micron Technology, Inc. Apparatus for measuring parasitic capacitance and inductance of I/O leads on an electrical component using a network analyzer
US6525553B1 (en) * 2000-09-11 2003-02-25 St Assembly Test Services Ltd. Ground pin concept for singulated ball grid array
US6350632B1 (en) 2000-09-20 2002-02-26 Charles W. C. Lin Semiconductor chip assembly with ball bond connection joint
US6350386B1 (en) 2000-09-20 2002-02-26 Charles W. C. Lin Method of making a support circuit with a tapered through-hole for a semiconductor chip assembly
US6511865B1 (en) 2000-09-20 2003-01-28 Charles W. C. Lin Method for forming a ball bond connection joint on a conductive trace and conductive pad in a semiconductor chip assembly
US6448108B1 (en) 2000-10-02 2002-09-10 Charles W. C. Lin Method of making a semiconductor chip assembly with a conductive trace subtractively formed before and after chip attachment
US6544813B1 (en) 2000-10-02 2003-04-08 Charles W. C. Lin Method of making a semiconductor chip assembly with a conductive trace subtractively formed before and after chip attachment
US6576493B1 (en) 2000-10-13 2003-06-10 Bridge Semiconductor Corporation Method of connecting a conductive trace and an insulative base to a semiconductor chip using multiple etch steps
US6537851B1 (en) 2000-10-13 2003-03-25 Bridge Semiconductor Corporation Method of connecting a bumped compliant conductive trace to a semiconductor chip
US6576539B1 (en) 2000-10-13 2003-06-10 Charles W.C. Lin Semiconductor chip assembly with interlocked conductive trace
US6740576B1 (en) 2000-10-13 2004-05-25 Bridge Semiconductor Corporation Method of making a contact terminal with a plated metal peripheral sidewall portion for a semiconductor chip assembly
US6492252B1 (en) 2000-10-13 2002-12-10 Bridge Semiconductor Corporation Method of connecting a bumped conductive trace to a semiconductor chip
US6667229B1 (en) 2000-10-13 2003-12-23 Bridge Semiconductor Corporation Method of connecting a bumped compliant conductive trace and an insulative base to a semiconductor chip
US6548393B1 (en) 2000-10-13 2003-04-15 Charles W. C. Lin Semiconductor chip assembly with hardened connection joint
US6440835B1 (en) 2000-10-13 2002-08-27 Charles W. C. Lin Method of connecting a conductive trace to a semiconductor chip
US7414319B2 (en) * 2000-10-13 2008-08-19 Bridge Semiconductor Corporation Semiconductor chip assembly with metal containment wall and solder terminal
US6699780B1 (en) 2000-10-13 2004-03-02 Bridge Semiconductor Corporation Method of connecting a conductive trace to a semiconductor chip using plasma undercut etching
US6673710B1 (en) 2000-10-13 2004-01-06 Bridge Semiconductor Corporation Method of connecting a conductive trace and an insulative base to a semiconductor chip
US6544812B1 (en) * 2000-11-06 2003-04-08 St Assembly Test Service Ltd. Single unit automated assembly of flex enhanced ball grid array packages
TW457663B (en) * 2000-11-08 2001-10-01 Advanced Semiconductor Eng Substrate structure of heat spreader and its package
WO2002039583A1 (en) * 2000-11-09 2002-05-16 Koninklijke Philips Electronics N.V. Electronic device, semiconductor device comprising such a device and method of manufacturing such a device
US6882042B2 (en) * 2000-12-01 2005-04-19 Broadcom Corporation Thermally and electrically enhanced ball grid array packaging
US6444489B1 (en) 2000-12-15 2002-09-03 Charles W. C. Lin Semiconductor chip assembly with bumped molded substrate
US20020079572A1 (en) * 2000-12-22 2002-06-27 Khan Reza-Ur Rahman Enhanced die-up ball grid array and method for making the same
US6906414B2 (en) * 2000-12-22 2005-06-14 Broadcom Corporation Ball grid array package with patterned stiffener layer
US7132744B2 (en) 2000-12-22 2006-11-07 Broadcom Corporation Enhanced die-up ball grid array packages and method for making the same
US7161239B2 (en) 2000-12-22 2007-01-09 Broadcom Corporation Ball grid array package enhanced with a thermal and electrical connector
US6917461B2 (en) * 2000-12-29 2005-07-12 Texas Instruments Incorporated Laminated package
US6469897B2 (en) * 2001-01-30 2002-10-22 Siliconware Precision Industries Co., Ltd. Cavity-down tape ball grid array package assembly with grounded heat sink and method of fabricating the same
US6653170B1 (en) 2001-02-06 2003-11-25 Charles W. C. Lin Semiconductor chip assembly with elongated wire ball bonded to chip and electrolessly plated to support circuit
US6853070B2 (en) * 2001-02-15 2005-02-08 Broadcom Corporation Die-down ball grid array package with die-attached heat spreader and method for making the same
KR100411206B1 (en) * 2001-02-19 2003-12-18 삼성전자주식회사 Semiconductor package
US6571468B1 (en) * 2001-02-26 2003-06-03 Saturn Electronics & Engineering, Inc. Traceless flip chip assembly and method
KR100401020B1 (en) 2001-03-09 2003-10-08 앰코 테크놀로지 코리아 주식회사 Stacking structure of semiconductor chip and semiconductor package using it
US6545345B1 (en) 2001-03-20 2003-04-08 Amkor Technology, Inc. Mounting for a package containing a chip
KR100369393B1 (en) 2001-03-27 2003-02-05 앰코 테크놀로지 코리아 주식회사 Lead frame and semiconductor package using it and its manufacturing method
US6888240B2 (en) * 2001-04-30 2005-05-03 Intel Corporation High performance, low cost microelectronic circuit package with interposer
US6894399B2 (en) 2001-04-30 2005-05-17 Intel Corporation Microelectronic device having signal distribution functionality on an interfacial layer thereof
US6433565B1 (en) * 2001-05-01 2002-08-13 Lsi Logic Corporation Test fixture for flip chip ball grid array circuits
US7259448B2 (en) * 2001-05-07 2007-08-21 Broadcom Corporation Die-up ball grid array package with a heat spreader and method for making the same
US20020167804A1 (en) * 2001-05-14 2002-11-14 Intel Corporation Polymeric encapsulation material with fibrous filler for use in microelectronic circuit packaging
US7071024B2 (en) * 2001-05-21 2006-07-04 Intel Corporation Method for packaging a microelectronic device using on-die bond pad expansion
TW486793B (en) * 2001-05-29 2002-05-11 Siliconware Precision Industries Co Ltd Packaging method for preventing a low viscosity encapsulant from flashing
TW574750B (en) * 2001-06-04 2004-02-01 Siliconware Precision Industries Co Ltd Semiconductor packaging member having heat dissipation plate
US7061102B2 (en) 2001-06-11 2006-06-13 Xilinx, Inc. High performance flipchip package that incorporates heat removal with minimal thermal mismatch
US6660559B1 (en) 2001-06-25 2003-12-09 Amkor Technology, Inc. Method of making a chip carrier package using laser ablation
US6548759B1 (en) 2001-06-28 2003-04-15 Amkor Technology, Inc. Pre-drilled image sensor package
US6730536B1 (en) 2001-06-28 2004-05-04 Amkor Technology, Inc. Pre-drilled image sensor package fabrication method
US6564979B2 (en) 2001-07-18 2003-05-20 Micron Technology, Inc. Method and apparatus for dispensing adhesive on microelectronic substrate supports
US6486545B1 (en) * 2001-07-26 2002-11-26 Amkor Technology, Inc. Pre-drilled ball grid array package
US6607942B1 (en) * 2001-07-26 2003-08-19 Taiwan Semiconductor Manufacturing Company Method of fabricating as grooved heat spreader for stress reduction in an IC package
US6740959B2 (en) * 2001-08-01 2004-05-25 International Business Machines Corporation EMI shielding for semiconductor chip carriers
US6534391B1 (en) * 2001-08-17 2003-03-18 Amkor Technology, Inc. Semiconductor package having substrate with laser-formed aperture through solder mask layer
SG111919A1 (en) * 2001-08-29 2005-06-29 Micron Technology Inc Packaged microelectronic devices and methods of forming same
US7183658B2 (en) 2001-09-05 2007-02-27 Intel Corporation Low cost microelectronic circuit package
US6535388B1 (en) * 2001-10-04 2003-03-18 Intel Corporation Wirebonded microelectronic packages including heat dissipation devices for heat removal from active surfaces thereof
TW498472B (en) * 2001-11-27 2002-08-11 Via Tech Inc Tape-BGA package and its manufacturing process
US6879039B2 (en) 2001-12-18 2005-04-12 Broadcom Corporation Ball grid array package substrates and method of making the same
EP1324386B1 (en) * 2001-12-24 2011-06-15 ABB Research Ltd. Semiconductor module and method of manufacturing a semiconductor module
TW529112B (en) * 2002-01-07 2003-04-21 Advanced Semiconductor Eng Flip-chip packaging having heat sink member and the manufacturing process thereof
US6853202B1 (en) * 2002-01-23 2005-02-08 Cypress Semiconductor Corporation Non-stick detection method and mechanism for array molded laminate packages
GB2384909A (en) * 2002-01-31 2003-08-06 Ubinetics Ltd Electromagnetic radiation screening method
US6825108B2 (en) * 2002-02-01 2004-11-30 Broadcom Corporation Ball grid array package fabrication with IC die support structures
US7550845B2 (en) * 2002-02-01 2009-06-23 Broadcom Corporation Ball grid array package with separated stiffener layer
US7245500B2 (en) * 2002-02-01 2007-07-17 Broadcom Corporation Ball grid array package with stepped stiffener layer
US6861750B2 (en) 2002-02-01 2005-03-01 Broadcom Corporation Ball grid array package with multiple interposers
TW550991B (en) * 2002-02-06 2003-09-01 Via Tech Inc Multi-layered substrate having voltage reference signal circuit layout
US6622380B1 (en) 2002-02-12 2003-09-23 Micron Technology, Inc. Methods for manufacturing microelectronic devices and methods for mounting microelectronic packages to circuit boards
US6977436B2 (en) * 2002-02-14 2005-12-20 Macronix International Co. Ltd. Semiconductor packaging device
US6838309B1 (en) 2002-03-13 2005-01-04 Amkor Technology, Inc. Flip-chip micromachine package using seal layer
US6876553B2 (en) 2002-03-21 2005-04-05 Broadcom Corporation Enhanced die-up ball grid array package with two substrates
US7196415B2 (en) * 2002-03-22 2007-03-27 Broadcom Corporation Low voltage drop and high thermal performance ball grid array package
US7109588B2 (en) 2002-04-04 2006-09-19 Micron Technology, Inc. Method and apparatus for attaching microelectronic substrates and support members
US7276802B2 (en) * 2002-04-15 2007-10-02 Micron Technology, Inc. Semiconductor integrated circuit package having electrically disconnected solder balls for mounting
US6788092B2 (en) * 2002-04-15 2004-09-07 Advanced Semiconductor Engineering, Inc. Test assembly for integrated circuit package
JP3539952B2 (en) * 2002-06-13 2004-07-07 沖電気工業株式会社 Level identification circuit
US6713853B1 (en) * 2002-07-23 2004-03-30 Applied Micro Circuits Corporation Electronic package with offset reference plane cutout
US6974330B2 (en) * 2002-08-08 2005-12-13 Micron Technology, Inc. Electronic devices incorporating electrical interconnections with improved reliability and methods of fabricating same
US7067905B2 (en) * 2002-08-08 2006-06-27 Micron Technology, Inc. Packaged microelectronic devices including first and second casings
SG120879A1 (en) 2002-08-08 2006-04-26 Micron Technology Inc Packaged microelectronic components
SG127684A1 (en) * 2002-08-19 2006-12-29 Micron Technology Inc Packaged microelectronic component assemblies
US6740546B2 (en) * 2002-08-21 2004-05-25 Micron Technology, Inc. Packaged microelectronic devices and methods for assembling microelectronic devices
US6696748B1 (en) * 2002-08-23 2004-02-24 Micron Technology, Inc. Stress balanced semiconductor packages, method of fabrication and modified mold segment
US6818973B1 (en) 2002-09-09 2004-11-16 Amkor Technology, Inc. Exposed lead QFP package fabricated through the use of a partial saw process
US6882038B2 (en) * 2002-09-24 2005-04-19 International Business Machines Corporation Plating tail design for IC packages
US7723210B2 (en) 2002-11-08 2010-05-25 Amkor Technology, Inc. Direct-write wafer level chip scale package
US6905914B1 (en) 2002-11-08 2005-06-14 Amkor Technology, Inc. Wafer level package and fabrication method
DE10258094B4 (en) * 2002-12-11 2009-06-18 Qimonda Ag Method of forming 3-D structures on wafers
US6657864B1 (en) * 2002-12-16 2003-12-02 International Business Machines Corporation High density thermal solution for direct attach modules
US7400036B2 (en) 2002-12-16 2008-07-15 Avago Technologies General Ip Pte Ltd Semiconductor chip package with a package substrate and a lid cover
US7173342B2 (en) * 2002-12-17 2007-02-06 Intel Corporation Method and apparatus for reducing electrical interconnection fatigue
US6798047B1 (en) 2002-12-26 2004-09-28 Amkor Technology, Inc. Pre-molded leadframe
TWI231579B (en) * 2002-12-31 2005-04-21 Advanced Semiconductor Eng Flip chip package
US7105931B2 (en) * 2003-01-07 2006-09-12 Abbas Ismail Attarwala Electronic package and method
US6750545B1 (en) 2003-02-28 2004-06-15 Amkor Technology, Inc. Semiconductor package capable of die stacking
KR100548554B1 (en) * 2003-03-04 2006-02-02 주식회사 하이닉스반도체 Test vehicle ball grid array package
SG143931A1 (en) 2003-03-04 2008-07-29 Micron Technology Inc Microelectronic component assemblies employing lead frames having reduced-thickness inner lengths
US6794740B1 (en) 2003-03-13 2004-09-21 Amkor Technology, Inc. Leadframe package for semiconductor devices
US6921860B2 (en) 2003-03-18 2005-07-26 Micron Technology, Inc. Microelectronic component assemblies having exposed contacts
DE10339762B4 (en) * 2003-08-27 2007-08-02 Infineon Technologies Ag Chip stack of semiconductor chips and method of making the same
US7061085B2 (en) * 2003-09-19 2006-06-13 Micron Technology, Inc. Semiconductor component and system having stiffener and circuit decal
JP2005129904A (en) * 2003-09-29 2005-05-19 Sanyo Electric Co Ltd Semiconductor device and method of manufacturing the same
WO2005036604A2 (en) * 2003-10-09 2005-04-21 E.I. Dupont De Nemours And Company Apparatus and method for supporting a flexible substrate during processing
SG153627A1 (en) 2003-10-31 2009-07-29 Micron Technology Inc Reduced footprint packaged microelectronic components and methods for manufacturing such microelectronic components
US7993983B1 (en) 2003-11-17 2011-08-09 Bridge Semiconductor Corporation Method of making a semiconductor chip assembly with chip and encapsulant grinding
US7538415B1 (en) 2003-11-20 2009-05-26 Bridge Semiconductor Corporation Semiconductor chip assembly with bumped terminal, filler and insulative base
US7425759B1 (en) 2003-11-20 2008-09-16 Bridge Semiconductor Corporation Semiconductor chip assembly with bumped terminal and filler
US7026711B2 (en) * 2003-12-16 2006-04-11 Taiwan Semiconductor Manufacturing Company, Ltd. Thermal dispensing enhancement for high performance flip chip BGA (HPFCBGA)
CN100386873C (en) * 2004-01-05 2008-05-07 扬智科技股份有限公司 Wire bonding packaging body
US7575955B2 (en) * 2004-01-06 2009-08-18 Ismat Corporation Method for making electronic packages
TW200540611A (en) * 2004-06-04 2005-12-16 Hon Hai Prec Ind Co Ltd System and method for verifying delay of a motherboard layout
US7482686B2 (en) * 2004-06-21 2009-01-27 Braodcom Corporation Multipiece apparatus for thermal and electromagnetic interference (EMI) shielding enhancement in die-up array packages and method of making the same
US7432586B2 (en) 2004-06-21 2008-10-07 Broadcom Corporation Apparatus and method for thermal and electromagnetic interference (EMI) shielding enhancement in die-up array packages
US7411281B2 (en) * 2004-06-21 2008-08-12 Broadcom Corporation Integrated circuit device package having both wire bond and flip-chip interconnections and method of making the same
SG145547A1 (en) 2004-07-23 2008-09-29 Micron Technology Inc Microelectronic component assemblies with recessed wire bonds and methods of making same
US7235880B2 (en) * 2004-09-01 2007-06-26 Intel Corporation IC package with power and signal lines on opposing sides
US7157310B2 (en) * 2004-09-01 2007-01-02 Micron Technology, Inc. Methods for packaging microfeature devices and microfeature devices formed by such methods
US7786591B2 (en) 2004-09-29 2010-08-31 Broadcom Corporation Die down ball grid array package
US7271479B2 (en) * 2004-11-03 2007-09-18 Broadcom Corporation Flip chip package including a non-planar heat spreader and method of making the same
US7750483B1 (en) 2004-11-10 2010-07-06 Bridge Semiconductor Corporation Semiconductor chip assembly with welded metal pillar and enlarged plated contact terminal
JP4972306B2 (en) * 2004-12-21 2012-07-11 オンセミコンダクター・トレーディング・リミテッド Semiconductor device and circuit device
US7719108B2 (en) * 2005-01-10 2010-05-18 Lockheed Martin Corporation Enhanced reliability semiconductor package
EP1684366A1 (en) * 2005-01-25 2006-07-26 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Electronic device comprising an electronic component and encapsulation members
US8278751B2 (en) 2005-02-08 2012-10-02 Micron Technology, Inc. Methods of adhering microfeature workpieces, including a chip, to a support member
TWI267181B (en) * 2005-03-18 2006-11-21 Silicon Integrated Sys Corp Structure and assembly method of IC packaging
US7352039B2 (en) * 2005-03-24 2008-04-01 Intel Corporation Methods and apparatuses for microelectronic assembly having a material with a variable viscosity around a MEMS device
US20060237829A1 (en) * 2005-04-26 2006-10-26 Eiichi Hosomi Method and system for a semiconductor package with an air vent
US7807505B2 (en) 2005-08-30 2010-10-05 Micron Technology, Inc. Methods for wafer-level packaging of microfeature devices and microfeature devices formed using such methods
US7745944B2 (en) * 2005-08-31 2010-06-29 Micron Technology, Inc. Microelectronic devices having intermediate contacts for connection to interposer substrates, and associated methods of packaging microelectronic devices with intermediate contacts
US20070117268A1 (en) * 2005-11-23 2007-05-24 Baker Hughes, Inc. Ball grid attachment
US7507603B1 (en) 2005-12-02 2009-03-24 Amkor Technology, Inc. Etch singulated semiconductor package
US7572681B1 (en) 2005-12-08 2009-08-11 Amkor Technology, Inc. Embedded electronic component package
US20070141751A1 (en) * 2005-12-16 2007-06-21 Mistry Addi B Stackable molded packages and methods of making the same
SG133445A1 (en) 2005-12-29 2007-07-30 Micron Technology Inc Methods for packaging microelectronic devices and microelectronic devices formed using such methods
SG135074A1 (en) 2006-02-28 2007-09-28 Micron Technology Inc Microelectronic devices, stacked microelectronic devices, and methods for manufacturing such devices
US7675180B1 (en) 2006-02-17 2010-03-09 Amkor Technology, Inc. Stacked electronic component package having film-on-wire spacer
US20070235872A1 (en) * 2006-03-28 2007-10-11 Ping-Chang Wu Semiconductor package structure
SG136009A1 (en) 2006-03-29 2007-10-29 Micron Technology Inc Packaged microelectronic devices recessed in support member cavities, and associated methods
JP4884830B2 (en) * 2006-05-11 2012-02-29 三菱電機株式会社 Semiconductor device
US7910385B2 (en) 2006-05-12 2011-03-22 Micron Technology, Inc. Method of fabricating microelectronic devices
US8183680B2 (en) 2006-05-16 2012-05-22 Broadcom Corporation No-lead IC packages having integrated heat spreader for electromagnetic interference (EMI) shielding and thermal enhancement
US7902660B1 (en) 2006-05-24 2011-03-08 Amkor Technology, Inc. Substrate for semiconductor device and manufacturing method thereof
US7633144B1 (en) * 2006-05-24 2009-12-15 Amkor Technology, Inc. Semiconductor package
US7968998B1 (en) 2006-06-21 2011-06-28 Amkor Technology, Inc. Side leaded, bottom exposed pad and bottom exposed lead fusion quad flat semiconductor package
CN101449375B (en) 2006-06-29 2012-01-18 英特尔公司 A device, a system and a method applied to the connection without leads in the encapsulation of an integrate circuit
EP1878692B1 (en) * 2006-07-14 2011-04-20 STMicroelectronics Srl Semiconductor package for MEMS devices
US7811863B1 (en) 2006-10-26 2010-10-12 Bridge Semiconductor Corporation Method of making a semiconductor chip assembly with metal pillar and encapsulant grinding and heat sink attachment
US7687893B2 (en) 2006-12-27 2010-03-30 Amkor Technology, Inc. Semiconductor package having leadframe with exposed anchor pads
US7829990B1 (en) 2007-01-18 2010-11-09 Amkor Technology, Inc. Stackable semiconductor package including laminate interposer
US7833456B2 (en) 2007-02-23 2010-11-16 Micron Technology, Inc. Systems and methods for compressing an encapsulant adjacent a semiconductor workpiece
US7982297B1 (en) 2007-03-06 2011-07-19 Amkor Technology, Inc. Stackable semiconductor package having partially exposed semiconductor die and method of fabricating the same
US7955898B2 (en) 2007-03-13 2011-06-07 Micron Technology, Inc. Packaged microelectronic devices and methods for manufacturing packaged microelectronic devices
US7635914B2 (en) * 2007-05-17 2009-12-22 Texas Instruments Incorporated Multi layer low cost cavity substrate fabrication for pop packages
KR100930095B1 (en) * 2007-06-01 2009-12-07 삼성전자주식회사 Package using printed circuit board with air vent and printed circuit board with air vent
US7786602B2 (en) * 2007-06-06 2010-08-31 The Boeing Company Patterned die attach and packaging method using the same
US8723332B2 (en) 2007-06-11 2014-05-13 Invensas Corporation Electrically interconnected stacked die assemblies
TW200917391A (en) * 2007-06-20 2009-04-16 Vertical Circuits Inc Three-dimensional circuitry formed on integrated circuit device using two-dimensional fabrication
US7977774B2 (en) 2007-07-10 2011-07-12 Amkor Technology, Inc. Fusion quad flat semiconductor package
US7687899B1 (en) 2007-08-07 2010-03-30 Amkor Technology, Inc. Dual laminate package structure with embedded elements
US8704379B2 (en) * 2007-09-10 2014-04-22 Invensas Corporation Semiconductor die mount by conformal die coating
US7777351B1 (en) 2007-10-01 2010-08-17 Amkor Technology, Inc. Thin stacked interposer package
US8089159B1 (en) 2007-10-03 2012-01-03 Amkor Technology, Inc. Semiconductor package with increased I/O density and method of making the same
JP5251066B2 (en) * 2007-10-15 2013-07-31 富士電機株式会社 Semiconductor device
JP4550102B2 (en) * 2007-10-25 2010-09-22 スパンション エルエルシー Semiconductor package, manufacturing method thereof, and semiconductor device including semiconductor package
US7847386B1 (en) 2007-11-05 2010-12-07 Amkor Technology, Inc. Reduced size stacked semiconductor package and method of making the same
US7956453B1 (en) * 2008-01-16 2011-06-07 Amkor Technology, Inc. Semiconductor package with patterning layer and method of making same
US7723852B1 (en) 2008-01-21 2010-05-25 Amkor Technology, Inc. Stacked semiconductor package and method of making same
US8178978B2 (en) * 2008-03-12 2012-05-15 Vertical Circuits, Inc. Support mounted electrically interconnected die assembly
US7910838B2 (en) * 2008-04-03 2011-03-22 Advanced Interconnections Corp. Solder ball interface
US8067821B1 (en) 2008-04-10 2011-11-29 Amkor Technology, Inc. Flat semiconductor package with half package molding
US7768135B1 (en) 2008-04-17 2010-08-03 Amkor Technology, Inc. Semiconductor package with fast power-up cycle and method of making same
US7808084B1 (en) 2008-05-06 2010-10-05 Amkor Technology, Inc. Semiconductor package with half-etched locking features
US7863159B2 (en) * 2008-06-19 2011-01-04 Vertical Circuits, Inc. Semiconductor die separation method
US9153517B2 (en) 2008-05-20 2015-10-06 Invensas Corporation Electrical connector between die pad and z-interconnect for stacked die assemblies
KR101486420B1 (en) * 2008-07-25 2015-01-26 삼성전자주식회사 Chip package and stacked package using the same and method of fabricating them
US8125064B1 (en) 2008-07-28 2012-02-28 Amkor Technology, Inc. Increased I/O semiconductor package and method of making same
US8184453B1 (en) 2008-07-31 2012-05-22 Amkor Technology, Inc. Increased capacity semiconductor package
US7989950B2 (en) * 2008-08-14 2011-08-02 Stats Chippac Ltd. Integrated circuit packaging system having a cavity
US7847392B1 (en) 2008-09-30 2010-12-07 Amkor Technology, Inc. Semiconductor device including leadframe with increased I/O
US7989933B1 (en) 2008-10-06 2011-08-02 Amkor Technology, Inc. Increased I/O leadframe and semiconductor device including same
US8008758B1 (en) 2008-10-27 2011-08-30 Amkor Technology, Inc. Semiconductor device with increased I/O leadframe
US8089145B1 (en) 2008-11-17 2012-01-03 Amkor Technology, Inc. Semiconductor device including increased capacity leadframe
US8072050B1 (en) 2008-11-18 2011-12-06 Amkor Technology, Inc. Semiconductor device with increased I/O leadframe including passive device
US7875963B1 (en) 2008-11-21 2011-01-25 Amkor Technology, Inc. Semiconductor device including leadframe having power bars and increased I/O
US7982298B1 (en) 2008-12-03 2011-07-19 Amkor Technology, Inc. Package in package semiconductor device
US8487420B1 (en) 2008-12-08 2013-07-16 Amkor Technology, Inc. Package in package semiconductor device with film over wire
US20170117214A1 (en) 2009-01-05 2017-04-27 Amkor Technology, Inc. Semiconductor device with through-mold via
US8680656B1 (en) 2009-01-05 2014-03-25 Amkor Technology, Inc. Leadframe structure for concentrated photovoltaic receiver package
US8058715B1 (en) 2009-01-09 2011-11-15 Amkor Technology, Inc. Package in package device for RF transceiver module
TWI394245B (en) * 2009-02-05 2013-04-21 Unimicron Technology Corp Package substrate and fabrication method thereof
US8026589B1 (en) 2009-02-23 2011-09-27 Amkor Technology, Inc. Reduced profile stackable semiconductor package
US7960818B1 (en) 2009-03-04 2011-06-14 Amkor Technology, Inc. Conformal shield on punch QFN semiconductor package
US20120061695A1 (en) * 2009-03-24 2012-03-15 Kang Kim Light-emitting diode package
US8575742B1 (en) 2009-04-06 2013-11-05 Amkor Technology, Inc. Semiconductor device with increased I/O leadframe including power bars
US8184440B2 (en) * 2009-05-01 2012-05-22 Abl Ip Holding Llc Electronic apparatus having an encapsulating layer within and outside of a molded frame overlying a connection arrangement on a circuit board
US20100295168A1 (en) * 2009-05-21 2010-11-25 Chien-Te Feng Semiconductor package using conductive plug to replace solder ball
WO2010151578A2 (en) * 2009-06-26 2010-12-29 Vertical Circuits, Inc. Electrical interconnect for die stacked in zig-zag configuration
US8796561B1 (en) 2009-10-05 2014-08-05 Amkor Technology, Inc. Fan out build up substrate stackable package and method
TWI520213B (en) 2009-10-27 2016-02-01 英維瑟斯公司 Selective die electrical insulation by additive process
TWI544604B (en) 2009-11-04 2016-08-01 英維瑟斯公司 Stacked die assembly having reduced stress electrical interconnects
US8937381B1 (en) 2009-12-03 2015-01-20 Amkor Technology, Inc. Thin stackable package and method
US9691734B1 (en) 2009-12-07 2017-06-27 Amkor Technology, Inc. Method of forming a plurality of electronic component packages
US8435837B2 (en) * 2009-12-15 2013-05-07 Silicon Storage Technology, Inc. Panel based lead frame packaging method and device
TWI381513B (en) * 2010-01-08 2013-01-01 Powertech Technology Inc Chip stacked package structure and fabrication method thereof
CN102130085B (en) * 2010-01-18 2013-03-13 矽品精密工业股份有限公司 Semiconductor package with electrical connection structure and manufacturing method thereof
US20120314390A1 (en) * 2010-03-03 2012-12-13 Mutual-Tek Industries Co., Ltd. Multilayer circuit board
US8324511B1 (en) 2010-04-06 2012-12-04 Amkor Technology, Inc. Through via nub reveal method and structure
US8294276B1 (en) 2010-05-27 2012-10-23 Amkor Technology, Inc. Semiconductor device and fabricating method thereof
US8440554B1 (en) 2010-08-02 2013-05-14 Amkor Technology, Inc. Through via connected backside embedded circuit features structure and method
US8338943B2 (en) * 2010-08-31 2012-12-25 Stmicroelectronics Asia Pacific Pte Ltd. Semiconductor package with thermal heat spreader
US8411444B2 (en) * 2010-09-15 2013-04-02 International Business Machines Corporation Thermal interface material application for integrated circuit cooling
US8487445B1 (en) 2010-10-05 2013-07-16 Amkor Technology, Inc. Semiconductor device having through electrodes protruding from dielectric layer
US8791501B1 (en) 2010-12-03 2014-07-29 Amkor Technology, Inc. Integrated passive device structure and method
US8674485B1 (en) 2010-12-08 2014-03-18 Amkor Technology, Inc. Semiconductor device including leadframe with downsets
KR101176350B1 (en) 2011-01-03 2012-08-24 앰코 테크놀로지 코리아 주식회사 Substrate for manufacturing semiconductor package, and semiconductor package using the same
US8390130B1 (en) 2011-01-06 2013-03-05 Amkor Technology, Inc. Through via recessed reveal structure and method
TWI557183B (en) 2015-12-16 2016-11-11 財團法人工業技術研究院 Siloxane resin composition, and photoelectric device employing the same
US8648450B1 (en) 2011-01-27 2014-02-11 Amkor Technology, Inc. Semiconductor device including leadframe with a combination of leads and lands
US8552548B1 (en) 2011-11-29 2013-10-08 Amkor Technology, Inc. Conductive pad on protruding through electrode semiconductor device
KR20200029638A (en) 2011-12-20 2020-03-18 인텔 코포레이션 Conformal low temperature hermetic dielectric diffusion barriers
US9704725B1 (en) 2012-03-06 2017-07-11 Amkor Technology, Inc. Semiconductor device with leadframe configured to facilitate reduced burr formation
US9048298B1 (en) 2012-03-29 2015-06-02 Amkor Technology, Inc. Backside warpage control structure and fabrication method
US9129943B1 (en) 2012-03-29 2015-09-08 Amkor Technology, Inc. Embedded component package and fabrication method
US9111847B2 (en) * 2012-06-15 2015-08-18 Infineon Technologies Ag Method for manufacturing a chip package, a method for manufacturing a wafer level package, a chip package and a wafer level package
US8912670B2 (en) * 2012-09-28 2014-12-16 Intel Corporation Bumpless build-up layer package including an integrated heat spreader
US9136236B2 (en) 2012-09-28 2015-09-15 Intel Corporation Localized high density substrate routing
TWI473552B (en) * 2012-11-21 2015-02-11 Unimicron Technology Corp Substrate structure having component-disposing area and manufacturing process thereof
CN103855099B (en) * 2012-12-03 2017-05-24 欣兴电子股份有限公司 Substrate structure with component arrangement area and manufacturing technology thereof
US9190380B2 (en) 2012-12-06 2015-11-17 Intel Corporation High density substrate routing in BBUL package
KR101486790B1 (en) 2013-05-02 2015-01-28 앰코 테크놀로지 코리아 주식회사 Micro Lead Frame for semiconductor package
US9159690B2 (en) 2013-09-25 2015-10-13 Intel Corporation Tall solders for through-mold interconnect
US9349703B2 (en) 2013-09-25 2016-05-24 Intel Corporation Method for making high density substrate interconnect using inkjet printing
KR101563911B1 (en) 2013-10-24 2015-10-28 앰코 테크놀로지 코리아 주식회사 Semiconductor package
US9673122B2 (en) 2014-05-02 2017-06-06 Amkor Technology, Inc. Micro lead frame structure having reinforcing portions and method
US20160037645A1 (en) * 2014-08-01 2016-02-04 Samsung Electro-Mechanics Co., Ltd. Embedded board and method of manufacturing the same
US9360644B2 (en) 2014-09-08 2016-06-07 International Business Machines Corporation Laser die and photonics die package
BR112017003175A2 (en) 2014-09-18 2017-11-28 Intel Corp multi-matrix package and method for forming a multi-matrix package
US9490195B1 (en) 2015-07-17 2016-11-08 Invensas Corporation Wafer-level flipped die stacks with leadframes or metal foil interconnects
US9871019B2 (en) 2015-07-17 2018-01-16 Invensas Corporation Flipped die stack assemblies with leadframe interconnects
US9825002B2 (en) 2015-07-17 2017-11-21 Invensas Corporation Flipped die stack
US9508691B1 (en) 2015-12-16 2016-11-29 Invensas Corporation Flipped die stacks with multiple rows of leadframe interconnects
US10566310B2 (en) 2016-04-11 2020-02-18 Invensas Corporation Microelectronic packages having stacked die and wire bond interconnects
US9595511B1 (en) 2016-05-12 2017-03-14 Invensas Corporation Microelectronic packages and assemblies with improved flyby signaling operation
US9728524B1 (en) 2016-06-30 2017-08-08 Invensas Corporation Enhanced density assembly having microelectronic packages mounted at substantial angle to board
US11031345B2 (en) * 2018-08-14 2021-06-08 Medtronic, Inc. Integrated circuit package and method of forming same
US11581240B2 (en) * 2018-12-21 2023-02-14 Intel Corporation Liquid thermal interface material in electronic packaging
KR20210083461A (en) 2019-12-26 2021-07-07 삼성디스플레이 주식회사 Apparatus for manufacturing conductive film and method of manufacturing conductive film
US12002780B2 (en) * 2020-11-12 2024-06-04 Taiwan Semiconductor Manufacturing Company Ltd. Package structure including a base and a lid disposed over the base and method of forming the package structure
US11676912B2 (en) * 2020-12-23 2023-06-13 Advanced Semiconductor Engineering, Inc. Semiconductor device package and method for manufacturing the same
CN112908943A (en) * 2021-01-12 2021-06-04 华为技术有限公司 Embedded packaging structure, preparation method thereof and terminal equipment
CN113656888B (en) * 2021-07-29 2024-09-03 东风柳州汽车有限公司 Automatic modeling method, device, equipment and storage medium for opening and closing part

Citations (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3697666A (en) * 1971-09-24 1972-10-10 Diacon Enclosure for incapsulating electronic components
US4410927A (en) * 1982-01-21 1983-10-18 Olin Corporation Casing for an electrical component having improved strength and heat transfer characteristics
US4542259A (en) * 1984-09-19 1985-09-17 Olin Corporation High density packages
US4761518A (en) * 1987-01-20 1988-08-02 Olin Corporation Ceramic-glass-metal packaging for electronic components incorporating unique leadframe designs
US4831212A (en) * 1986-05-09 1989-05-16 Nissin Electric Company, Limited Package for packing semiconductor devices and process for producing the same
US5397921A (en) * 1993-09-03 1995-03-14 Advanced Semiconductor Assembly Technology Tab grid array
US5455456A (en) * 1993-09-15 1995-10-03 Lsi Logic Corporation Integrated circuit package lid
US5490324A (en) * 1993-09-15 1996-02-13 Lsi Logic Corporation Method of making integrated circuit package having multiple bonding tiers
US5529959A (en) * 1992-06-23 1996-06-25 Sony Corporation Charge-coupled device image sensor
US5563446A (en) * 1994-01-25 1996-10-08 Lsi Logic Corporation Surface mount peripheral leaded and ball grid array package
US5586010A (en) * 1995-03-13 1996-12-17 Texas Instruments Incorporated Low stress ball grid array package
US5594275A (en) * 1993-11-18 1997-01-14 Samsung Electronics Co., Ltd. J-leaded semiconductor package having a plurality of stacked ball grid array packages
US5596227A (en) * 1994-09-01 1997-01-21 Yamaha Corporation Ball grid array type semiconductor device
US5598033A (en) * 1995-10-16 1997-01-28 Advanced Micro Devices, Inc. Micro BGA stacking scheme
US5598321A (en) * 1995-09-11 1997-01-28 National Semiconductor Corporation Ball grid array with heat sink
US5598036A (en) * 1995-06-15 1997-01-28 Industrial Technology Research Institute Ball grid array having reduced mechanical stress
US5708567A (en) * 1995-11-15 1998-01-13 Anam Industrial Co., Ltd. Ball grid array semiconductor package with ring-type heat sink
US5763939A (en) * 1994-09-30 1998-06-09 Nec Corporation Semiconductor device having a perforated base film sheet
US5896276A (en) * 1994-08-31 1999-04-20 Nec Corporation Electronic assembly package including connecting member between first and second substrates
US5909058A (en) * 1996-09-25 1999-06-01 Kabushiki Kaisha Toshiba Semiconductor package and semiconductor mounting part
US5943558A (en) * 1996-09-23 1999-08-24 Communications Technology, Inc. Method of making an assembly package having an air tight cavity and a product made by the method
US6084297A (en) * 1998-09-03 2000-07-04 Micron Technology, Inc. Cavity ball grid array apparatus
US6117705A (en) * 1997-04-18 2000-09-12 Amkor Technology, Inc. Method of making integrated circuit package having adhesive bead supporting planar lid above planar substrate
US6127833A (en) * 1999-01-04 2000-10-03 Taiwan Semiconductor Manufacturing Co. Test carrier for attaching a semiconductor device
US6150193A (en) * 1996-10-31 2000-11-21 Amkor Technology, Inc. RF shielded device
US6168970B1 (en) * 1990-08-01 2001-01-02 Staktek Group L.P. Ultra high density integrated circuit packages
US6171888B1 (en) * 1996-03-08 2001-01-09 Lsi Logic Corp. Multi-layer tab tape having distinct signal, power and ground planes, semiconductor device assembly employing same, apparatus for and method of assembling same
US6455925B1 (en) * 2001-03-27 2002-09-24 Ericsson Inc. Power transistor package with integrated flange for surface mount heat removal

Patent Citations (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3697666A (en) * 1971-09-24 1972-10-10 Diacon Enclosure for incapsulating electronic components
US4410927A (en) * 1982-01-21 1983-10-18 Olin Corporation Casing for an electrical component having improved strength and heat transfer characteristics
US4542259A (en) * 1984-09-19 1985-09-17 Olin Corporation High density packages
US4831212A (en) * 1986-05-09 1989-05-16 Nissin Electric Company, Limited Package for packing semiconductor devices and process for producing the same
US4761518A (en) * 1987-01-20 1988-08-02 Olin Corporation Ceramic-glass-metal packaging for electronic components incorporating unique leadframe designs
US6168970B1 (en) * 1990-08-01 2001-01-02 Staktek Group L.P. Ultra high density integrated circuit packages
US5529959A (en) * 1992-06-23 1996-06-25 Sony Corporation Charge-coupled device image sensor
US5397921A (en) * 1993-09-03 1995-03-14 Advanced Semiconductor Assembly Technology Tab grid array
US5409865A (en) * 1993-09-03 1995-04-25 Advanced Semiconductor Assembly Technology Process for assembling a TAB grid array package for an integrated circuit
US5490324A (en) * 1993-09-15 1996-02-13 Lsi Logic Corporation Method of making integrated circuit package having multiple bonding tiers
US5455456A (en) * 1993-09-15 1995-10-03 Lsi Logic Corporation Integrated circuit package lid
US5594275A (en) * 1993-11-18 1997-01-14 Samsung Electronics Co., Ltd. J-leaded semiconductor package having a plurality of stacked ball grid array packages
US5563446A (en) * 1994-01-25 1996-10-08 Lsi Logic Corporation Surface mount peripheral leaded and ball grid array package
US5896276A (en) * 1994-08-31 1999-04-20 Nec Corporation Electronic assembly package including connecting member between first and second substrates
US5596227A (en) * 1994-09-01 1997-01-21 Yamaha Corporation Ball grid array type semiconductor device
US5763939A (en) * 1994-09-30 1998-06-09 Nec Corporation Semiconductor device having a perforated base film sheet
US5586010A (en) * 1995-03-13 1996-12-17 Texas Instruments Incorporated Low stress ball grid array package
US5598036A (en) * 1995-06-15 1997-01-28 Industrial Technology Research Institute Ball grid array having reduced mechanical stress
US5598321A (en) * 1995-09-11 1997-01-28 National Semiconductor Corporation Ball grid array with heat sink
US5598033A (en) * 1995-10-16 1997-01-28 Advanced Micro Devices, Inc. Micro BGA stacking scheme
US5708567A (en) * 1995-11-15 1998-01-13 Anam Industrial Co., Ltd. Ball grid array semiconductor package with ring-type heat sink
US6171888B1 (en) * 1996-03-08 2001-01-09 Lsi Logic Corp. Multi-layer tab tape having distinct signal, power and ground planes, semiconductor device assembly employing same, apparatus for and method of assembling same
US5943558A (en) * 1996-09-23 1999-08-24 Communications Technology, Inc. Method of making an assembly package having an air tight cavity and a product made by the method
US5909058A (en) * 1996-09-25 1999-06-01 Kabushiki Kaisha Toshiba Semiconductor package and semiconductor mounting part
US6150193A (en) * 1996-10-31 2000-11-21 Amkor Technology, Inc. RF shielded device
US6117705A (en) * 1997-04-18 2000-09-12 Amkor Technology, Inc. Method of making integrated circuit package having adhesive bead supporting planar lid above planar substrate
US6084297A (en) * 1998-09-03 2000-07-04 Micron Technology, Inc. Cavity ball grid array apparatus
US6326244B1 (en) * 1998-09-03 2001-12-04 Micron Technology, Inc. Method of making a cavity ball grid array apparatus
US6740971B2 (en) * 1998-09-03 2004-05-25 Micron Technology, Inc. Cavity ball grid array apparatus having improved inductance characteristics
US6982486B2 (en) * 1998-09-03 2006-01-03 Micron Technology, Inc. Cavity ball grid array apparatus having improved inductance characteristics and method of fabricating the same
US6127833A (en) * 1999-01-04 2000-10-03 Taiwan Semiconductor Manufacturing Co. Test carrier for attaching a semiconductor device
US6455925B1 (en) * 2001-03-27 2002-09-24 Ericsson Inc. Power transistor package with integrated flange for surface mount heat removal

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090026593A1 (en) * 2007-07-24 2009-01-29 Micron Technology, Inc. Thin semiconductor die packages and associated systems and methods
US7816750B2 (en) 2007-07-24 2010-10-19 Aptina Imaging Corporation Thin semiconductor die packages and associated systems and methods
US9679834B2 (en) 2007-07-24 2017-06-13 Micron Technology, Inc. Semiconductor dies with recesses, associated leadframes, and associated systems and methods
US10074599B2 (en) 2007-07-24 2018-09-11 Micron Technology, Inc. Semiconductor dies with recesses, associated leadframes, and associated systems and methods
US10431531B2 (en) 2007-07-24 2019-10-01 Micron Technology, Inc. Semiconductor dies with recesses, associated leadframes, and associated systems and methods

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US6326244B1 (en) 2001-12-04
US20060055040A1 (en) 2006-03-16
US6084297A (en) 2000-07-04
US20020042160A1 (en) 2002-04-11
US7268013B2 (en) 2007-09-11

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