TWI475705B - 具有聚光元件及高有效面積之太陽能電池及其製造方法 - Google Patents
具有聚光元件及高有效面積之太陽能電池及其製造方法 Download PDFInfo
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/0543—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means comprising light concentrating means of the refractive type, e.g. lenses
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/0547—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means comprising light concentrating means of the reflecting type, e.g. parabolic mirrors, concentrators using total internal reflection
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
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- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Description
本發明係關於一種太陽能電池及其製造方法,特別是關於一種具有微型聚光元件例如微透鏡與高有效面積之太陽能電池。
基於全球暖化效應,能源逐漸形成嚴重社會問題,因此,節能逐漸衍生為一重要政策。太陽能電池可將太陽能轉換成電力,得以有效利用資源及防止環境污染,因此,太陽能電池成為一潔能之指標性產品。常見太陽能電池係於矽晶圓上製造,多晶矽與非晶矽太陽能電池與單晶矽太陽能電池相比成本較低且製程較容易。近年來,以高分子等有機材料製作的太陽能電池,越來越受到學術界與工業界的重視。高分子太陽能電池(polymer solar cells)以具有類似塑膠特性的高分子材料所製成,其重量輕且具有極佳的可撓性(flexibility),並且耐摔、耐衝擊、低成本。
此外,有機高分子太陽能電池之結構演進,由單層結構、異質接面(heterojunction)結構至混合塊材異質接面(bulk heteroiunction)結構。太陽能電池的能量轉換功率之效果仍然有限,因此,便出現了將數個子太陽能電池進行串聯/並聯方式進行疊合以製造太陽能電池元件。向上堆疊之太陽能子電池所製成之太陽能電池具有相當厚度且能量轉換功率並不如預期。
因此,極需一種有效手段提升太陽能電池的效率。
本發明之一目的係為提供一具有複數聚光元件之太陽能電池元件及其方法。
本發明之另一目的係為提供一種具有高有效面積之太陽能電池及其方法。
本發明之再一目的係提供具有透明電極以減少光遮蔽率之太陽能電池。
一種具複數微聚光元件,例如微透鏡之太陽能電池,包含:第一型半導電層;第二型半導電層,耦合該第一型半導電層;複數微聚光元件,形成於該第二型半導電層上。複數微聚光元件材質包含有機(organic)材料,例如光阻(photo-resist)、無機(inorganic)材料,例如氮化矽(silicon nitride)或氧化矽(silicon oxide)。透明電極配置於該第二型半導電層上。
一種具高有效面積之太陽能電池,其包含:第一型半導電層;第二型半導電層,耦合該第一型半導電層;其中該第二型半導電層包含凹陷結構,用以增加照吸光表面積。其中上述面積增為1/cosθ(或secθ)倍或π/2倍照光表面積,θ定義為與該第二型態半導電層表面之夾角。θ為小於九十度,大於十度。該凹陷結構包含周期性之斜面側壁溝槽、周期性之截面為三角型溝槽、弧形、波浪型溝槽。其中凹陷結構以光學微影蝕刻技術或機械力模具壓印製程製作。
一種太陽能電池,其包含:第一型半導電層;第二型
半導電層,耦合該第一型半導電層;透明電極位於該第二型半導電層之內或上,用以降低遮光率。其中該透明電極材質包含金屬氧化物,其中金屬係為一個或以上選自金、銀、銦、鎵、鋁、錫、鍺、銻、鋅、鉑與鈀。透明電極材質包含導電高分子、導電膠、銀鋁膠或奈米碳管。
上述優點將從以下較佳實施例之敘述並伴隨後附圖式及申請專利範圍將使讀者得以清楚了解本發明。
本發明將以較佳之實施例及觀點加以詳細敘述,而此類敘述係解釋本發明之結構及程序,只用以說明而非用以限制本發明之申請專利範圍。因此,除說明書中之較佳實施例之外,本發明亦可廣泛實行於其他實施例。現將描述本發明之細節,其包括本發明之實施例。參考附圖及以下描述,相同參考標號用於識別相同或功能上類似之元件,且期望以高度簡化之圖解方式說明實施例之主要特徵。此外,附圖並未描繪實際實施例之每一特徵,所描繪之圖式元件係皆為相對尺寸而非按比例繪製。以下之特徵可實施一項或多項之組合。
本發明適用於各類型太陽能,例如PN型、PIN型、均面接合型、BSF(back surface field)型、積層(疊合)型等。本發明亦適用於接合形成法、擴散法、單晶成長法與離子植入法,擴散法可以採用POCl3
與PH3
做為n型摻雜物。若採用多晶矽製程,因高速製程易在晶粒界外產生缺陷,故可通入氫氣處理。若採用非晶矽製程,則可以化學氣相
沉積法(CVD)通入SiH4
或濺鍍製作薄膜。以薄膜太陽能電池而言,亦可採用滾輪-滾輪製程(roll to roll)。
請參閱第一圖,提供一太陽能電池100,該太陽能電池包含一基板102,基板102係可為任何應用於太陽能電池之基板,包含玻璃基板、矽、鍺、石英、陶瓷或軟性基板等。於本實施例中,第一電極104位於基板102上,電極可為金屬、合金、氧化銦錫(indium tin oxide,簡稱ITO)、導電高分子、導電膠、銀鋁膠或奈米碳管。
一第一型態半導電層106,例如p型單晶、複晶或非晶形矽層(但不以此為限)或化合物半導體(如GaAs、InP,但不以此為限),位於該第一電極104上方,隨之,一第二型態半導電層108,例如n型單晶、複晶或非晶形矽層(但不以此為限)或化合物半導體(如GaAs InP,但不以此為限),位於該第一型態半導電層106,形成p-n接面。半導體層可採離子佈植法製作或是高溫擴散法製作。摻雜矽層利用磷進行形成摻雜矽層,磷之來源為PH3
。若為PIN型,則包含一絕緣層位於p-n接面間,例如薄氧化層可做為PIN結構之絕緣層。在一較佳之具體實施例中,該氧化層由溫度約800至1100℃之氧蒸氣環境中形成的氧化矽所構成。同理,氧化層亦可以合適的氧化物之化學組合及程序來形成。例如,氧化層可使用化學氣相沈積法形成二氧化矽,該化學氣相沈積法是以正矽酸乙酯(TEOS)在溫度600至800℃間且壓力約0.1至10torr時形成。
本發明特徵之一在於,包含複數個微聚光元件110,
例如微透鏡分佈於上述第二型態半導電層108上,用於將各方向直接或間接照射之太陽光聚集,導引其進入第二型態半導電層108,以利於增加光子數量。舉例而言,上述之複數微聚光元件可以包含複數微透鏡,上述之微型聚光元件110可以採用光學微影製程、噴塗、印刷或網印將微透鏡材質製作複數個凸塊於第二型態半導電層108之上而得。以光學微影製程為例,先塗佈一層厚度約1000nm的正光阻,再用光學微影技術曝光顯影以形成寬度約2000nm得的圖案,再經過熱流整(reflow)處理,溫度介於130℃到200℃之間,時間介於30秒到60秒之間,基於表面張力使其成為曲面狀或半球面狀因而具有像光學透鏡的聚光能力,造成太陽能轉換層內得以產生更多的光電子,參閱第二圖。基於複數聚光元件可以對應於多數太陽能胞(cell)配置,故可強化光吸收量。微透鏡材質包含液態玻璃、有機材料(例如光阻)、無機材料(例如氮化矽或氧化矽)。利用光學微影製程、遮罩或網印間距可控制微透鏡之尺寸與數量。
在另一具體例子中,本發明得提供高有效面積,舉一實施例而言,於第二型態半導電層108製作凹陷結構112,此凹陷結構112可增加表面積,以提升表面照光量,有利於受光效率之提升,參閱第三圖。其表面積增加量為1/cosθ(或secθ)倍,其為角度之函數值,θ定義為凹陷結構112側壁面與第二型態半導電層108表面(水平面)之夾角。建議之角度為大於十度,小於九十度。角度設計得當,可增
加二次光入射機會,如圖所示。值得注意的是此凹陷結構與用以降低反射率之微細(texture)結構不同,且用途有異,微細(texture)結構通常為不規則狀、隨機形成且無規律性,而本凹陷結構112至少具有區域性規則或區域性週期性圖案。第四與第五圖分別顯示不同截面形狀之凹陷結構112,第四圖所示截面為角狀結構,第五圖所示為弧狀結構,此結構可以減少暗影或遮蔽效應提升接收量與二次光入射機會,其表面積增加量為πr/2r(或π/2)倍,r為半圓之半徑。第六圖所示為波浪狀結構(具上凸113與凹陷112混合結構),其可更提升第五圖之表面積。於此技術領域而具通常知事者可知,凹陷結構112截面不限於上述舉例,可依據需求變換。凹陷結構112,可以利用光學微影製程(photo-lithography process)或模具壓印技術(micron print,採機械力)製作。
在上述諸多實施例中,包含第二電極116配置於太陽能電池上,其可配置於第二型態半導電層108上或埋於其中,一般利用壓印或光學微影製程可製作溝渠,再填入第二電極材料於溝渠中,在將之平坦化便可將第二電極埋入於第二型態半導電層108。傳統採用金屬或合金做為電極,惟此將遮蔽許多第二型態導電層108面積,而導致受光量減少。本實施例採用透明電極,透明導電電極材質包含金屬氧化物,其中金屬係選自以下族群之一或其組合:金、銀、銦、鎵、鋁、錫、鍺、銻、鋅、鉑、鈀。第二電極較佳可採用ITO、ZnO。而導電高分子、導電膠、銀鋁
膠或奈米碳管亦可做為透明電極。
上述之模具壓印技術乃採用具有特定圖形的模具120在適當的溫度與壓力下對半導體層108進行壓印,參第七圖所示,之後脫去模具形成壓印圖案,對壓印金屬進行表面熱處理,則可製作微米或奈米壓印122,如第八圖所示。若採軟性基板,則壓印製程可採用卷軸式製程(roll-to-roll process)來進行,如第九圖所示。以轉軸至轉軸式裝置驅動基材移動,而他端轉軸接合模具,使該薄膜移動且被壓模成型該軟質基材上,此卷軸式製程壓印製程將提高產能效率。轉軸至轉軸式(roll to roll)裝置得藉由驅動裝置,例如馬達等加以驅動使其依據一轉軸旋轉,而牽動軟質基材移動,例示如圖中之箭頭方向,使得基材可由一端捲至另一端。於此過程中將帶動基材移動,可控制轉軸之轉速,利於控制移動速率。
上述敘述係為本發明之較佳實施例。此領域之技藝者應得以領會其係用以說明本發明而非用以限定本發明所主張之專利權利範圍。其專利保護範圍當視後附之申請專利範圍及其等同領域而定。凡熟悉此領域之技藝者,在不脫離本專利精神或範圍內,所作之更動或潤飾,均屬於本發明所揭示精神下所完成之等效改變或設計,且應包含在下述之申請專利範圍內。
100‧‧‧太陽能電池
102‧‧‧基板
104‧‧‧第一電極
106‧‧‧第一型態半導電層
108‧‧‧第二型態半導電層
110‧‧‧聚光元件
112‧‧‧凹陷結構
114‧‧‧上凸結構
116‧‧‧第二電極配
120‧‧‧模具
122‧‧‧壓印
第一圖係顯示本發明形成凸塊示意圖。
第二圖係顯示本發明形成聚光元件示意圖。
第三圖係顯示本發明形成凹陷結構示意圖。
第四圖係顯示本發明形成凹陷結構示意圖。
第五圖係顯示本發明形成凹陷結構示意圖。
第六圖係顯示本發明形成凹陷結構示意圖。
第七圖係顯示本發明以模具壓印前示意圖。
第八圖係顯示本發明以模具壓印時示意圖。
第九圖係顯示本發明以滾軸-滾軸式模具壓印示意圖。
100‧‧‧太陽能電池
102‧‧‧基板
104‧‧‧第一電極
106‧‧‧第一型態半導電層
108‧‧‧第二型態半導電層
110‧‧‧聚光元件
Claims (14)
- 一種具複數聚光元件之太陽能電池,包含:基板;太陽能轉換層,位於該基板上;第一與第二電極配置於該太陽能轉換層,其中至少該第二電極面受光側且包含奈米碳管以提升光穿透率;以及複數聚光元件,置於該太陽能轉換層上,該複數聚光元件可以聚集入射的太陽能的量,以提升太陽能的轉換效率。
- 如申請專利範圍第1項所述之具複數聚光元件之太陽能電池,其中該複數聚光元件材質包含光阻。
- 如申請專利範圍第1項所述之具複數聚光元件之太陽能電池,其中該複數聚光元件材質包含有機材料。
- 如申請專利範圍第1項所述之具複數聚光元件之太陽能電池,其中該複數聚光元件材質包含無機材料。
- 如申請專利範圍第1項所述之具複數聚光元件之太陽能電池,其中該太陽能轉換層包含第一型半導電層。
- 如申請專利範圍第1項所述之具複數聚光元件之太陽能電池,其中該太陽能轉換層包含第二型半導電層上。
- 如申請專利範圍第6項所述之具複數聚光元件之太陽 能電池,其中該第二型半導電層包含凹陷結構。
- 如申請專利範圍第7項所述之具複數聚光元件之太陽能電池,其中該凹陷結構具有周期性圖案。
- 一種製作具複數聚光元件之太陽能電池之方法,包含:提供一基板,該基板包含一太陽能轉換層、配置第一與第二電極於該太陽能轉換層,其中至少該第二電極面受光側且包含奈米碳管以提升光穿透率;以及配置複數聚光元件於該太陽能轉換層上,該複數聚光元件可以聚集入射的太陽能的量,以提升太陽能的轉換效率。
- 如申請專利範圍第9項所述之製作具複數聚光元件之太陽能電池之方法,其中該複數聚光元件之材質包含有機材料。
- 如申請專利範圍第9項所述之製作具複數聚光元件之太陽能電池之方法,其中該複數聚光元件之材質包含無機材料。
- 如申請專利範圍第9項所述之製作具複數聚光元件之太陽能電池之方法,其中該複數聚光元件之材質包含二氧化矽。
- 如申請專利範圍第9項所述之製作具複數聚光元件之太陽能電池之方法,其中該複數聚光元件之材質包含氮 化矽。
- 如申請專利範圍第9項所述之製作具複數聚光元件之太陽能電池之方法,其中該複數聚光元件之材質包含光阻。
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US4956685A (en) * | 1984-12-21 | 1990-09-11 | Licentia Patent-Verwaltungs Gmbh | Thin film solar cell having a concave n-i-p structure |
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US7399421B2 (en) * | 2005-08-02 | 2008-07-15 | International Business Machines Corporation | Injection molded microoptics |
US20080023066A1 (en) * | 2006-07-28 | 2008-01-31 | Unidym, Inc. | Transparent electrodes formed of metal electrode grids and nanostructure networks |
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US4379202A (en) * | 1981-06-26 | 1983-04-05 | Mobil Solar Energy Corporation | Solar cells |
US5217539A (en) * | 1991-09-05 | 1993-06-08 | The Boeing Company | III-V solar cells and doping processes |
US6288388B1 (en) * | 1997-09-26 | 2001-09-11 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric converter wherein the lower electrode has bends |
TW200828604A (en) * | 2006-12-26 | 2008-07-01 | Univ Nat Chiao Tung | Polymer solar energy cell and the making method thereof |
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