TW201443557A - Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, method for forming pattern, electronic device and method for manufacturing electronic device - Google Patents

Abstract

According to the invention, an actinic ray-sensitive or radiation-sensitive resin composition is provided, which contains a resin (Aa), a resin (Ab) and a compound generating acid by irradiating actinic ray or radiation. The resin (Aa) contains a repeating unit (c) having at least two or more of a partial structure containing -COO- in a structure represented by the formula (KA-1) or the formula (KB-1). The resin (Ab) contains a repeating unit represented by the formula (A), and the solubility thereof to a developer is changed by an action of an acid.

Description

Photosensitive ray- or radiation-sensitive resin composition, sensitized shot Linear or radiation sensitive film, pattern forming method, electronic component, and method of manufacturing electronic component

The present invention relates to a sensitized ray-sensitive or radiation-sensitive resin composition, a sensitized ray-sensitive or radiation-sensitive film using the same, a pattern forming method, an electronic component, and a method of producing an electronic component. More specifically, the present invention relates to a manufacturing process and a nanoimprint mold which can be preferably used for a large scale integrated circuit (LSI) and a high-capacity microchip. a microlithography process applicable to a manufacturing process and a manufacturing process of a high-density information recording medium, and a sensitizing ray-sensitive or radiation-sensitive resin composition in a photofabrication process, using the same Photosensitive ray or radiation sensitive film, pattern forming method, electronic component and method of manufacturing electronic component.

Previously, half of an integrated circuit (IC) or LSI In the manufacturing process of a conductor element, microfabrication has been performed by using a lithography of a photoresist composition. In recent years, with the high integration of integrated circuits, it has been demanded to form ultra-fine patterns of sub-micron regions or quarter-micron regions. Along with this, the exposure wavelength also tends to be shorter than the wavelength of the g-ray to the i-ray and further to the KrF excimer laser light, and an exposure machine using an ArF excimer laser having a wavelength of 193 nm as a light source has been developed. In addition, as a technique for further improving the resolving power, a so-called liquid immersion method in which a liquid having a high refractive index between a projection lens and a sample (hereinafter also referred to as "liquid immersion liquid") has been developed has been developed, for example, in the patent literature. 1 and Patent Document 2 disclose a chemically amplified resist composition having a preferable hydrophobicity as a liquid immersion exposure.

In addition, in addition to excimer laser light, lithography using electron beams, X-rays, and extreme ultraviolet (EUV) light is also under development. Along with this, a chemically amplified resist composition which is excellent in various types of radiation, sensitivity, and resolution is being developed. These electron beams or X-rays or EUV lithography are positioned as next-generation or next-generation pattern forming technologies, and a high-sensitivity, high-resolution resist composition is desired. In particular, in order to reduce the wafer processing time, high sensitivity is a very important problem. In the ultrafine region of 0.25 μm or less, not only the resolution is lowered, but also the pattern is reduced with the pattern refinement. The problem is obvious.

Further, it is known that in EUV photolithography, out-band light (ultraviolet light other than the wavelength of EUV) from an exposure light source is generated to deteriorate the pattern shape. (For example, refer to Non-Patent Document 1 and Non-Patent Document 2).

[Previous Technical Literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-118318

[Patent Document 2] Japanese Patent Laid-Open No. 2011-038066

[Non-patent literature]

[Non-Patent Document 1] "Proceedings of The International Society for Optical. Engineering, Proc. of SPIE", Vol. 7273, 72731W, 2009

[Non-Patent Document 2] "Proceedings of The International Society for Optical. Engineering, Proc. of SPIE", Vol. 7636, 763626, 2010

In order to improve the pattern collapse due to the ultrafine refinement of the pattern, the resist composition may be hydrophobized, and depending on the method of hydrophobization, adverse effects on lithography characteristics may be observed, for example, the inventors and the like. It has been found that the affinity with the alkaline developer is sometimes lowered, the permeability is lowered, the sensitivity is lowered, or the roughness characteristics are deteriorated, or development defects are caused.

Therefore, it is desired to develop a sensitivity, an analytical property, a roughness characteristic, a pattern shape, and a development defect, and it is possible to suppress the deterioration of the pattern shape (film thinning) caused by the out-of-band light for EUV exposure. A radioactive or radiation sensitive resin composition.

An object of the present invention is to provide a sensitized ray-sensitive or radiation-sensitive resin composition, a sensitizing ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for producing an electronic component and an electronic component, wherein the sensitizing ray or feeling The radiation linear resin composition is excellent in sensitivity, resolution, roughness characteristics, pattern shape, and development defect suppressing ability, and particularly in the case of EUV exposure, the pattern shape is deteriorated (film thinning) by the out-of-band light. Excellent.

The present invention is as follows, for example.

[1] A photosensitive ray-sensitive or radiation-sensitive resin composition comprising a resin (Aa), a resin (Ab), and a compound which generates an acid by irradiation with actinic rays or radiation, wherein the resin (Aa) contains a repeating unit (c) The repeating unit (c) has at least two or more groups represented by -COO- in the structure represented by the formula (KA-1) or (KB-1), and the above resin (Ab) a repeating unit represented by the formula (A) and having a solubility in a developing solution due to an action of an acid,

In the formula (KA-1), Z _ka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, a decylamino group, an aryl group, a lactone ring group or an electron-withdrawing group; when a plurality of Z _ka are present, Z _ka plurality may be identical or different, Z _ka may link each other to form a ring; NKA represents an integer of 0 to 10; Q represents an atomic group necessary for the lactone ring with the atom in the formula; formula ( In KB-1), X _kb1 and X _kb2 each independently represent a pull electron group; nkb and nkb' respectively represent 0 or 1; R _kb1 , R _kb2 , R _kb3 and R _kb4 each independently represent a hydrogen atom or an alkane; a group, a cycloalkyl group, an aryl group or an electron-donating group; at least two of R _kb1 , R _kb2 and X _kb1 may be linked to each other to form a ring, and at least two of R _kb3 , R _kb4 and X _kb2 may be linked to each other. Forming a ring;

In the formula, R ₂₁ , R ₂₂ and R ₂₃ each independently represent a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group; wherein R ₂₂ may also bond with Ar ₂ to form a ring, at this time R ₂₂ represents a single bond or an alkylene group; X ₂ represents a single bond, -COO- or -CONR ₃₀ -, R ₃₀ represents a hydrogen atom or an alkyl group; L ₂ represents a single bond or an alkyl group; and Ar ₂ represents (n+) 1) A valence aromatic ring group, in the case of bonding to R ₂₂ to form a ring, represents an (n+2)-valent aromatic ring group; and n represents an integer of 1 to 4.

[2] The sensitized ray-sensitive or radiation-sensitive resin composition according to [1], wherein the repeating unit (c) contained in the resin (Aa) has a structure represented by the following formula (KY-3).

In the formula (KY-3), Rs represents a chain or cyclic alkyl group, and when it is plural, it may be the same or different; Ls represents a single bond, an ether bond, an ester bond, a guanamine bond, or an amine. The urethane bond or the urea bond may be the same or different when there are a plurality of cases; ns represents the number of repeats of the linker represented by -(Rs-Ls)-, and represents an integer of 0 to 5; L _ky represents alkylene, oxygen atom or sulfur atom; Z _ka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, an acyl group, an aryl group, a lactone ring group or electron withdrawing group; in the presence of a plurality of case Z _ka When a plurality of Z _ka may be the same or different, Z _ka may be bonded to each other to form a ring; nka represents an integer of 0 to 10; and R _kb1 and R _kb2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, and an aromatic group; At least two of R _kb1 , R _kb2 and R _ky5 may be bonded to each other to form a ring; nkb represents 0 or 1; and R _ky5 represents an electron-withdrawing group.

[3] The photosensitive ray-sensitive or radiation-sensitive resin composition according to [1] or [2] wherein the resin (Aa) further contains a repeating unit (Aa3) having a fluorine atom selected from the group consisting of fluorine atoms a fluorine atom-containing group, a halogen atom-containing group, an alkyl group having 6 or more carbon atoms, a cycloalkyl group having 5 or more carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms. More than one group in the group.

The photosensitive ray-sensitive or radiation-sensitive resin composition according to any one of the above-mentioned, wherein the resin (Aa) further contains a repeating unit represented by the following formula (Aa4),

In the formula (aa2-1), Rb represents a hydrogen atom, an alkyl group or a halogen atom; S _1a represents a substituent, and when it is plural, it is independent; and p represents an integer of 0-5.

[5] The sensitized ray-sensitive or radiation-sensitive resin composition according to any one of [1] to [4] wherein the resin (Aa) further contains a repeat having a group decomposed by the action of an acid unit.

[6] The photosensitive ray-sensitive or radiation-sensitive resin composition according to [5], wherein the above repeating unit having a group decomposed by an action of an acid is represented by the following formula (Aa1) or (Aa2),

In the formula (Aa1), R' represents a hydrogen atom or an alkyl group; L represents a single bond or a divalent linking group; R ₁ represents a hydrogen atom or a monovalent substituent; R ₂ represents a monovalent substituent; R ₁ and R ₂ Further, they may be bonded to each other to form a ring together with an oxygen atom in the formula; R ₃ represents a hydrogen atom, an alkyl group or a cycloalkyl group; in the formula (Aa2), Ra represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom; L ₁ represents a single bond or a divalent linking group; R ₁ and R ₂ each independently represent an alkyl group; R ₁₁ and R ₁₂ each independently represent an alkyl group, R ₁₃ represents a hydrogen atom or an alkyl group; R ₁₁ and R ₁₂ and any two of R ₁₃ may be mutually connected to form a ring.

The sensitized ray-sensitive or radiation-sensitive resin composition according to any one of the above aspects, wherein the resin (Ab) contains at least the following formula (Ab1) or formula (Ab2) a repeating unit as a repeating unit represented by the general formula (A),

In the formula (A2), R ₂₃ represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.

[8] The sensitized ray-sensitive or radiation-sensitive resin composition according to any one of [1] to [7] wherein, based on the total solid content in the composition, the tree The content of the fat (Aa) is in the range of 0.01% by mass to 30% by mass.

The sensitizing ray-sensitive or radiation-sensitive resin composition according to any one of the above aspects, wherein the content of the resin (Aa) is based on the total solid content in the composition. It is in the range of 0.01% by mass to 20% by mass.

[10] The sensitized ray-sensitive or radiation-sensitive resin composition according to any one of [1] to [7] wherein the content of the resin (Aa) is based on the total solid content in the composition. It is in the range of 0.01% by mass to 10% by mass.

[11] The sensitized ray-sensitive or radiation-sensitive resin composition according to any one of [1], wherein the content of the resin (Aa) is based on the total solid content in the composition. It is in the range of 0.01% by mass to 5% by mass.

[12] A sensitizing ray-sensitive or radiation-sensitive film which is formed using the sensitized ray-sensitive or sensitized radioactive resin composition according to any one of [1] to [11].

[13] A pattern forming method comprising: forming a sensitized ray-sensitive or radiation-sensitive film using the sensitized ray-sensitive or radiation-sensitive resin composition according to any one of [1] to [11]; The sensitizing ray-sensitive or radiation-sensitive film is irradiated with actinic rays or radiation to perform exposure, and the exposed sensitized ray-sensitive or radiation-sensitive film is developed.

[14] The pattern forming method according to [13], wherein an electron beam or an extreme ultraviolet ray is used as the actinic ray or radiation.

[15] A semiconductor element produced by the step of the pattern forming method according to [13] or [14].

[16] A method of producing an electronic component, comprising the pattern forming method according to [13] or [14].

According to the present invention, it is possible to provide a sensitized ray-sensitive or radiation-sensitive resin composition, a sensitizing ray-sensitive or radiation-sensitive film, a pattern forming method, a method for producing an electronic device, and an electronic component, and the sensitizing ray or feeling The radiation linear resin composition is excellent in sensitivity, resolution, roughness characteristics, pattern shape, and development defect suppressing ability, and particularly in the case of EUV exposure, the pattern shape is deteriorated (film thinning) by the out-of-band light. Excellent.

In the expression of the group (atomic group) in the present specification, it is not described that the substituted and unsubstituted expression includes a group having no substituent, and also includes a group having a substituent. For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).

In addition, the term "actinic ray" or "radiation" as used herein means, for example, a bright line spectrum of a mercury lamp, a far-ultraviolet light represented by an excimer laser, an extreme ultraviolet (EUV) line, an X-ray, a soft X-ray, or an electron. Beam (Electron Beam, EB) and so on. Further, in the present invention, the term "light" means actinic rays or radiation.

In addition, the term "exposure" as used herein means not only unless otherwise stated. It includes exposure to far ultraviolet rays, X-rays, EUV light, etc. represented by mercury lamps and excimer lasers, and also includes drawing using particle beams such as electron beams and ion beams.

Hereinafter, embodiments of the present invention will be described in detail.

<Photosensitized ray-sensitive or radiation-sensitive resin composition>

The sensitizing ray-sensitive or radiation-sensitive resin composition of the present invention (hereinafter also referred to as "the composition of the present invention" or the like) contains a resin (Aa), a resin (Ab), and is produced by irradiation with actinic rays or radiation. In the acid compound, the resin (Aa) contains a repeating unit (c) having at least two or more polar transition groups described later, and the resin (Ab) contains a repeating unit represented by the following formula (A) and is used for a developing solution. Solubility changes due to the action of acid.

In one aspect, the composition of the present invention further contains at least one selected from the group consisting of an acid multiplier, a solvent, a basic compound, a surfactant, and other additives.

Hereinafter, each component will be described.

[1] Resin (Aa)

<repeat unit (c)>

The resin (Aa) contains a repeating unit (c) having at least two or more of -COO- represented by a structure represented by a formula (KA-1) or a formula (KB-1) described later. The group (hereinafter referred to as "polar transition group"). The resin (Aa) can be formed on the surface of the film to form a protective film by forming a film due to the difference in hydrophilicity and hydrophobicity of the resin (Ab) to be described later. The polar transition group is a group which is decomposed by the action of an alkaline developer and has an increased solubility in an alkaline developer due to the action of an alkaline developer. On the other hand, the decomposed component tends to exist in the surface layer portion of the film, whereby the affinity with the alkaline developing solution is increased, and improvement in high sensitivity, roughness characteristics, and development defects can be achieved. In addition, it is also possible to simultaneously improve pattern shape deterioration (film thinning) caused by out-of-band light in EUV lithography. Further, whether or not the film is formed on the surface of the film to form a protective film, for example, a static contact angle (contact angle of pure water) of the film of the composition to which the resin (Aa) is not added, and a resin (for addition) The surface static contact angle of the composition film of Aa) is compared, and when the contact angle is raised, it is considered that a protective layer is formed.

The repeating unit (c) is preferably a repeating unit (c') having at least two or more polar transition groups and at least one of a fluorine atom and a halogen atom in one side chain. That is, it is a repeating unit having a structure including at least one of a fluorine atom and a ruthenium atom on a side chain having a plurality of polar transition groups. Further, the fluorine atom may be a fluorine atom which is an electron-withdrawing group in a polar transition group to be described later, or may be a fluorine atom different from a fluorine atom as the electron-withdrawing group.

Further, it is also preferred that the repeating unit (c) is a repeating unit (c*) having at least two or more polar transition groups and having no fluorine atom and a halogen atom, and the resin (Aa) further contains a fluorine atom and a ruthenium A repeating unit (Aa3) which is described later of at least one of the atoms.

Alternatively, the repeating unit (c) preferably has at least two or more polar transition groups in one side chain, and has a fluorine atom and a germanium atom in a side chain different from the above side chain in the same repeating unit. At least one of the repeating units (c"). In this case, it is preferred that the side chain having a polar transition group and the side chain having at least one of a fluorine atom and a ruthenium atom intervene in the carbon atom of the main chain to be in the α Positional relationship That is, the positional relationship like the following formula (4). In the formula, B1 represents a partial structure having a polar transition group, and B2 represents a partial structure having at least one of a fluorine atom and a ruthenium atom.

In the aspect of the resin (Aa), it is more preferred to contain a repeating unit (c').

Here, the polar transition group is a group which is decomposed by the action of the alkaline developing solution and has an increased solubility in the alkaline developing solution, and is a formula (KA-1) or a pass which will be described later. A partial structure represented by -COO- in the structure represented by the formula (KB-1).

The lactone structure represented by the formula (KA-1) may be any group as long as it has a lactone ring, preferably a group having a 5-membered ring to a 7-membered ring lactone structure, and preferably 5 The ring of the member ring has a ring structure with a ring structure in the form of a bicyclic structure or a spiro ring structure.

Further, the ester group directly bonded to the resin main chain in the repeating unit (e.g., -COO- in the acrylate) is not included in the polar transition group of the present application because of its poor function as a polar transition group.

Further, the repeating unit (c) may not have two structural entities represented by (KA-1) or (KB-1), respectively, regardless of a form in which a part of the repeating structure, for example, two ester structures are sandwiched by one electron withdrawing group, Or the form of the following formula (KY-1), The solution is composed of two polar transition groups.

Further, in the repeating unit (c*) and the repeating unit (c"), the polar transition group is more preferably a partial structure represented by -COO- in the structure represented by the formula (KA-1).

In the formula (KA-1), Z _ka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, a decylamino group, an aryl group, a lactone ring group or an electron-withdrawing group. In the case where there is a plurality of Z _ka, Z _ka plurality may be identical or different, Z _ka may link each other to form a ring. Examples of the ring formed by linking Z _{ka to} each other include a cycloalkyl ring and a hetero ring (a cyclic ether ring, a lactone ring, etc.).

Nka represents an integer from 0 to 10. Nka is preferably an integer of 0 to 8, more preferably an integer of 0 to 5, and further preferably an integer of 1 to 4, and most preferably an integer of 1 to 3.

Q represents the group of atoms necessary to form a lactone ring together with the atoms in the formula. As described above, the lactone ring is not particularly limited as long as it has a lactone structure, and is preferably a group having a 5-membered ring to a 7-membered ring lactone structure, and is preferably a 5-membered ring. The 7-membered ring lactone structure has other rings in the form of a bicyclic structure and a spiro ring structure. structure.

In the general formula (KB-1), X _kb1 and X _kb2 each independently represent an electron-withdrawing group.

Nkb and nkb' respectively represent 0 or 1. Further, when nkb and nkb' are 0, X _kb1 and X _kb2 indicate direct bonding to an ester group (-COO-).

R _kb1 , R _kb2 , R _kb3 and R _kb4 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an electron-withdrawing group. At least two of R _kb1 , R _kb2 and X _kb1 may be linked to each other to form a ring, and at least two of R _kb3 , R _kb4 and X _kb2 may be linked to each other to form a ring.

The ring formed by at least two of R _kb3 , R _kb4 and X _kb2 is preferably a cycloalkyl group or a heterocyclic group, and the heterocyclic group is preferably a lactone ring group. The lactone ring is, for example, a structure represented by the following formula (KA-1-1) to formula (KA-1-17).

In addition, the structure represented by the formula (KA-1) or the formula (KB-1) is a structure represented by the formula (KA-1), and X _kb1 and X _kb2 are monovalent (KB- 1) When there is no bond in the case of the structure shown, at least one of the obtained monovalent or higher partial structures is removed for any hydrogen atom in the structure.

The electron withdrawing group of Z _ka , X _kb1 , X _kb2 , and R _kb1 to R _kb4 may, for example, be a halogen atom, a cyano group, an oxy group, a carbonyl group, a carbonyloxy group, an oxycarbonyl group, a nitrile group, a nitro group or a sulfonyl group. A sulfinyl group, or a halogenated (cyclo)alkyl group or a halogenated aryl group represented by -C(R _f1 )(R _f2 )-R _f3 and a combination thereof.

Further, the "halo (cyclo)alkyl group" means at least a part of a halogenated alkyl group and a cycloalkyl group. When the electron-donating group is a group having a divalent or higher group, The remaining bond bond forms a bond with an arbitrary atom or a substituent, and may be bonded to the main chain of the resin (Aa) via a further substituent.

Here, R _f1 represents a halogen atom, a perhaloalkyl group, a perhalocycloalkyl group or a perhaloaryl group, more preferably a fluorine atom, a perfluoroalkyl group or a perfluorocycloalkyl group, and further preferably represents a fluorine atom or Trifluoromethyl.

R _f2 and R _f3 each independently represent a hydrogen atom, a halogen atom or an organic group, and R _f2 and R _f3 may be bonded to each other to form a ring. The organic group means, for example, an alkyl group, a cycloalkyl group, an alkoxy group or the like.

At least two of R _f1 to R _f3 may be bonded to each other to form a ring, and examples of the ring to be formed include a (halogenated) cycloalkyl ring and a (halogenated) aryl ring.

The (halogenated) alkyl group of R _f1 to R _f3 may, for example, be an alkyl group of the above Z _ka and a halogenated structure thereof.

Examples of the (per)halocycloalkyl group and the (per)haloaryl group in the ring formed by linking R _f1 to R _f3 or R _f2 to R _f3 include a halogenated structure of the above-mentioned Z _ka cycloalkyl group. More preferably, it is a fluorocycloalkyl group represented by -C _(n) F _(2n-2) H and a perfluoroaryl group represented by -C _(n) F _(n-1) . Here, the carbon number n is not particularly limited, but is preferably 5 to 13, more preferably 6.

More preferably, R _f2 represents the same group as R _f1 or is bonded to R _f3 to form a ring.

The electron withdrawing group is preferably a halogen atom or a halogenated (cyclo)alkyl group or a halogenated aryl group represented by -C(R _f1 )(R _f2 )-R _f3 , more preferably -C(CF ₃ ) ₂ H Or -C(CF ₃ ) ₂ CH ₃ .

Furthermore, in the above-mentioned electron withdrawing group, a part of fluorine atoms may be pulled through other electrons. Substituted by the base.

Z _{ka is} preferably an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group or an electron-withdrawing group, more preferably an alkyl group, a cycloalkyl group or an electron-withdrawing group. Further, the ether group is preferably an alkyl group or a cycloalkyl group or the like, that is, an alkyl ether group or the like. The electron withdrawing group has the same meaning as the above-mentioned electron withdrawing group.

The halogen atom of Z _ka may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and is preferably a fluorine atom.

The alkyl group as Z _ka may have a substituent, and may be either a straight chain or a branched one. The linear alkyl group preferably has 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, and examples thereof include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, and a positive group. Xinji, Zhengyiji, Zhengjiji, etc. The branched alkyl group preferably has a carbon number of 3 to 30, more preferably 3 to 20, and examples thereof include an isopropyl group, an isobutyl group, a second butyl group, a tert-butyl group, an isopentyl group, and a third pentyl group. Isohexyl, tert-hexyl, isoheptyl, third heptyl, isooctyl, trioctyl, isodecyl, t-decanoyl, and the like. A group having 1 to 4 carbon atoms such as a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group or a t-butyl group is preferred.

The cycloalkyl group of Z _ka may be a monocyclic type or a polycyclic type. In the latter case, the cycloalkyl group may also be bridged. That is, in this case, the cycloalkyl group may also have a bridge structure. Further, a part of the carbon atoms in the cycloalkyl group may be substituted with a hetero atom such as an oxygen atom.

The monocyclic cycloalkyl group is preferably a group having 3 to 8 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and a cyclooctyl group.

The polycyclic cycloalkyl group may, for example, be a group having a bicyclic, tricyclic or tetracyclic structure having a carbon number of 5 or more. The polycyclic cycloalkyl group is preferably a group having 6 to 20 carbon atoms, and examples thereof include an adamantyl group, a norbornyl group, an isobornyl group, a campanyl group, a dicyclopentyl group, and an α-fluorene group. A-pinel, tricyclodecyl, tetracyclododecyl and androstanyl.

Examples of the cycloalkyl group include a group represented by the following formula.

Preferred examples of the above alicyclic moiety include adamantyl and noradamantane. Base, decahydronaphthyl, tricyclodecyl, tetracyclododecyl, norbornyl, cedarol, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, cyclododecyl. More preferred are adamantyl, decahydronaphthyl, norbornyl, cedarol, cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, cyclododecyl, tricyclodecyl.

Examples of the substituent of the alicyclic structure include an alkyl group, a halogen atom, a hydroxyl group, an alkoxy group, a carboxyl group, and an alkoxycarbonyl group. The alkyl group is preferably a lower alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group or a butyl group, and more preferably represents a methyl group, an ethyl group, a propyl group or an isopropyl group. The alkoxy group is preferably a group having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group or a butoxy group. Examples of the substituent which the alkyl group and the alkoxy group may have include a hydroxyl group, a halogen atom, and an alkoxy group (preferably, a carbon number of 1 to 4).

Examples of the aryl group of Z _ka include a phenyl group and a naphthyl group.

Examples of the substituent which the alkyl group, the cycloalkyl group and the aryl group of Z _ka may have include, for example, a hydroxyl group; a halogen atom; a nitro group; a cyano group; the above alkyl group; a methoxy group, an ethoxy group, a hydroxyethoxy group, Alkoxy groups such as propoxy, hydroxypropoxy, n-butoxy, isobutoxy, second butoxy and tert-butoxy; alkoxycarbonyl groups such as methoxycarbonyl and ethoxycarbonyl; Aralkyl group such as benzyl, phenethyl and cumyl; aralkyloxy; methyl, ethyl, butyl, benzylidene, cinnamyl and valeryl Anthracenyl; anthracenyloxy; aryloxy; aryloxy; aryloxy; aryloxy; And an aryloxycarbonyl group such as a benzyl methoxy group.

The polar transition group is decomposed by the action of the alkaline developing solution and undergoes a polarity transition, whereby the receding contact angle of the resin composition film after alkali development with water can be reduced.

The receding contact angle of the resin composition film after alkali development with water is preferably at a temperature at the time of exposure, usually 23 ° C ± 3 ° C at room temperature and 50 ° or less at a humidity of 45% ± 5%, more It is preferably 40 or less, and more preferably 35 or less, and most preferably 30 or less.

The receding contact angle refers to a contact angle measured when the contact line on the droplet-substrate interface retreats, and is generally known to be useful when the droplet is easily moved in a simulated dynamic state. In short, it can be defined that when droplets ejected from the tip of the needle are sprayed onto the substrate, and the droplet is again sucked into the needle, the contact angle at which the interface of the droplet retreats can be used, which is generally called expansion. The measurement method of the contact angle of the shrinkage method was performed.

The hydrolysis rate of the resin (Aa) to the alkaline developer is preferably 0.001 nm/sec or more, more preferably 0.01 nm/sec or more, further preferably 0.1 nm/sec or more, and most preferably 1 nm/sec or more.

Here, the hydrolysis rate of the resin (Aa) to the alkaline developer is a tetramethylammonium hydroxide (TAAH aqueous solution) having a film thickness of 23 ° C when the resin film is produced by using only the resin (Aa) (2.38 mass) Reduced speed in %).

The lactone ring structure in the formula (KA-1) is more preferably a group having a lactone structure represented by any one of the following (KA-1-1) to (KA-1-17). In addition, a group having a lactone structure may be directly bonded to the main chain. Preferred lactone structures are (KA-1-1), (KA-1-4), (KA-1-5), (KA-1-6), (KA-1-13), (KA- 1-14), (KA-1-17).

Specific examples of the skeleton having a lactone structure are shown below, but are not limited thereto.

The lactone moiety may or may not have a substituent. Preferred examples of the substituent include an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 4 to 7 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 2 to 8 carbon atoms, and a carboxyl group. A halogen atom, a hydroxyl group, a cyano group, an acid-decomposable group, or the like. More preferably, it is an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 5 to 6 carbon atoms, a cyano group, an alkoxycarbonyl group having 2 to 4 carbon atoms, a carboxyl group, a halogen atom, a hydroxyl group or an acid-decomposable group. In the case where a plurality of substituents are present, they may be the same or different, and the substituents may be bonded to each other to form a ring.

The lactone structure also has an optically active body, and any optically active substance can be used. Further, one type of optically active substance may be used alone, or a plurality of types of optically active substances may be used in combination. In the case where an optically active substance is mainly used, the optical purity (enantiomeric excess (ee)) is preferably 90% or more, more preferably 95% or more, and most preferably 98% or more.

The structure represented by the above (KB-1) has a structure in which an electron-withdrawing group exists at a position close to the ester structure, and thus has a high polarity conversion ability.

X _{kb2 is} preferably a halogen atom or a halogenated (cyclo)alkyl group or a halogenated aryl group represented by the above -C(R _f1 )(R _f2 )R _f3 .

The at least two polar transition groups of the repeating unit (c) are more preferably a partial structure having two polar transition groups represented by the following formula (KY-1). Further, the structure represented by the formula (KY-1) is a group having a monovalent or higher group obtained by removing at least one of any hydrogen atom in the structure.

In the general formula _{(KY-1), R ky1} , R ky4 each independently represent a hydrogen atom, a halogen atom, an alkyl group, a cycloalkyl group, a carbonyl group, a carbonyl group, an oxycarbonyl group, an ether group, a hydroxyl group, a cyano group, acyl Amine or aryl. Alternatively, _{R ky1,} R ky4 may be bonded to the same atom form a double bond, e.g. _{R ky1,} R ky4 the same may be bonded to an oxygen atom of the carbonyl portion (= O) is formed.

_{R ky2,} R ky3 each independently an electron withdrawing group, or R _ky1 and _R ky3 linked to form a lactone ring, and R _ky2 is an electron withdrawing group. The lactone ring formed is preferably a structure of the above (KA-1-1) to (KA-1-17). The electron withdrawing group may be the same as X _kb1 in the above formula (KB-1), and is preferably a halogen atom or a halogenated (cyclo)alkane represented by the above -C(R _f1 )(R _f2 )-R _f3 . Base or halogenated aryl.

_{R ky1,} R ky3 _R ky4 and also at least two mutually connected to form a monocyclic or polycyclic structure.

_{R kb1 ~ R kb4, nkb,} nkb ' R _kb1 respectively in the above formula _{(KB-1) ~ R kb4} , nkb, nkb' have the same meaning.

_{R ky1, Z ka (KA-} 1) of the formula _R ky4 Specific examples thereof include the same groups.

Preferred R _ky1 lactone ring and _R ky3 is formed by connecting the above-described structure (KA-1-1) ~ (KA -1-17) a. The electron withdrawing group is the same as X _kb1 in the above formula (KB-1).

The structure represented by the formula (KY-1) is more preferably a structure represented by the following formula (KY-2). Further, the structure represented by the formula (KY-2) is a group having a monovalent or higher group obtained by removing at least one of any hydrogen atom in the structure.

In the formula (KY-2), R _ky6 to R _ky10 each independently represent a hydrogen atom, a halogen atom, an alkyl group, a cycloalkyl group, a carbonyl group, a carbonyloxy group, an oxycarbonyl group, an ether group, a hydroxyl group, a cyano group or a decylamine. Base or aryl.

Two or more of R _ky6 to R _ky10 may be bonded to each other to form a single ring structure or a polycyclic structure.

R _ky5 represents the electron-based base. The electron withdrawing group may be the same as the electron withdrawing group of X _kb1 in the above formula (KB-1), preferably a halogen atom or a halogen represented by the above -C(R _f1 )(R _f2 )-R _f3 . (Cyclo)alkyl or haloaryl.

R _kb1, R _kb2, nkb and R _kb1 (KB-1) respectively above formulas, R _kb2, nkb same meaning.

Specific examples of R _ky5 to R _ky10 include the same groups as Z _ka in the formula (KA-1).

The structure represented by the formula (KY-2) is more preferably a partial structure represented by the following formula (KY-3).

In the formula (KY-3), Rs represents a chain or a cyclic alkyl group, and when it is present in a plurality of cases, it may be the same or different.

Ls represents a single bond, an ether bond, an ester bond, a guanamine bond, a urethane bond or a urea bond, and may be the same or different when there are a plurality of cases.

Ns represents the number of repetitions of the linking group represented by -(Rs-Ls)-, and represents an integer of 0 to 5.

L _ky represents an alkyl group, an oxygen atom or a sulfur atom.

Z _ka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, a decylamino group, an aryl group, a lactone ring group or a pendant electron group. In the case where there is a plurality of Z _ka, Z _ka plurality may be identical or different, Z _ka may link each other to form a ring.

Nka represents an integer from 0 to 10.

R _kb1 and R _kb2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an electron-withdrawing group, and at least two of R _kb1 , R _kb2 and R _ky5 may be bonded to each other to form a ring.

Nkb means 0 or 1.

R _ky5 represents the electron-based base.

* indicates the bonding site with the rest of the repeating unit.

The general formula (KY-3) will be described in more detail.

Z _ka, nka respectively, in the general formula (KA-1) is the same meaning. R _ky5 has the same meaning as the above formula (KY-2).

R _kb1, R _kb2, nkb respectively R _kb1 (KB-1) in the formula, R _kb2, nkb same meaning.

As described above, L _ky represents an alkyl group, an oxygen atom or a sulfur atom. Examples of the alkyl group of L _ky include a methylene group and an ethyl group. L _{ky is} preferably an oxygen atom or a methylene group, more preferably a methylene group.

As described above, Rs represents a chain or a cyclic alkyl group, and there are a plurality of When it is shaped, it can be the same or different.

As described above, Ls represents a single bond, an ether bond, an ester bond, a guanamine bond, a urethane bond or a urea bond, and when it is plural, it may be the same or different.

Ns represents the number of repetitions of the linking group represented by -(Rs-Ls)-, and represents an integer of 0 to 5. Ns is preferably 0 or 1.

The repeating unit (c) preferably has a structure represented by the formula (K0).

In the formula, R _k1 represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or a group having a polar transition group.

R _k2 represents an alkyl group, a cycloalkyl group, an aryl group or a group having a polar transition group. Among them, R _k1 and R _k2 have two or more polar transition groups in total.

Further, as described above, the ester group directly bonded to the main chain of the repeating unit represented by the formula (K0) is not included in the polar transition group of the present invention.

The repeating unit (c) is not limited as long as it is a repeating unit obtained by polymerization such as addition polymerization, condensation polymerization, addition condensation or the like, and is preferably a repeating unit obtained by addition polymerization of a carbon-carbon double bond. Examples thereof include an acrylate-based repeating unit (a system also having a substituent at the α-position and the β-position), and a styrene-based repeating unit. (including a system having a substituent at the α-position and the β-position), a vinyl ether repeating unit, a norbornene-based repeating unit, a maleic acid derivative (maleic anhydride or a derivative thereof, maleimide) The repeating unit or the like is preferably an acrylate-based repeating unit, a styrene-based repeating unit, a vinyl ether-based repeating unit, or a norbornene-based repeating unit, more preferably an acrylate-based repeating unit or a vinyl ether-based repeating unit. The norbornene-based repeating unit is preferably an acrylate-based repeating unit.

In one aspect of the invention, the resin (Aa) has at least one of a fluorine atom and a ruthenium atom, and the hydrophobicity (water followability) of the surface of the resist is improved, and the development residue (scum) is reduced.

Furthermore, in one aspect of the invention, the resin (Aa) may be a resin having a plurality of polar transition groups and having at least one of a fluorine atom and a ruthenium atom, and the fluorine atom may be a general formula (KB-1). The electron withdrawing groups of X _kb1 and X _{kb2 in the} above may also be contained in the repeating unit (Aa-3) described later.

In one aspect of the invention, the fluorine atom or the ruthenium atom of the resin (Aa) may be contained in the main chain of the resin or may be substituted on the side chain.

Specific examples of the repeating unit (c) are shown below, but the present invention is not limited thereto. Ra represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group.

[化15]

[Chemistry 16]

[化17]

[化18]

[Chemistry 20]

In the case where the resin (Aa) contains the repeating unit (c), the content of the repeating unit (c) is preferably from 10 mol% to 90 mol%, more preferably 30 mol%, based on all the repeating units in the resin (Aa). 85 mol%, and further preferably 50 mol% to 80 mol%.

The content of the repeating unit (c') is preferably from 10 mol% to 90 mol%, more preferably from 30 mol% to 85 mol%, even more preferably from 50 mol% to 80 mol%, based on all the repeating units in the resin (Aa).

The content of the repeating unit (c*) is preferably from 10 mol% to 90 mol%, more preferably from 30 mol% to 85 mol%, even more preferably from 50 mol% to 80 mol%, based on all the repeating units in the resin (Aa).

The content of the repeating unit (c") is preferably from 10 mol% to 90 mol%, more preferably from 30 mol% to 85 mol%, even more preferably from 50 mol% to 80 mol%, based on all the repeating units in the resin (Aa).

<Repeating unit (Aa3)>

In one aspect of the invention, the resin (Aa) may further contain a repeating unit (Aa3) having a group selected from a fluorine atom, a fluorine atom, a group containing a halogen atom, and a carbon number. 6 or more alkyl groups, 5 or more carbon atoms, and 6 carbon atoms One or more groups in the group consisting of an aryl group and an aralkyl group having 7 or more carbon atoms. This repeating unit (Aa3) is a repeating unit different from the above repeating unit (c).

From the viewpoint of sensitivity, the repeating unit (Aa3) is preferably a group having a fluorine atom or a fluorine atom. It is considered that the resin (Aa) has a fluorine atom or a fluorine atom-containing group, and the resin (Aa) has an absorption coefficient against extreme ultraviolet rays, and the resin (Aa) has a property of being biased on the surface of the resist film. Therefore, it is possible to efficiently absorb the energy of the above-mentioned extreme ultraviolet rays on the surface of the film which is irradiated more strongly by the ultraviolet rays at the time of exposure, and as a result, the sensitivity is improved.

The fluorine atom-containing group may, for example, be a fluorine atom-containing alkyl group, a fluorine atom-containing cycloalkyl group or a fluorine atom-containing aryl group.

The fluorine atom-containing alkyl group is preferably a fluorine atom-containing alkyl group having 1 to 10 carbon atoms, more preferably 1 to 4 carbon atoms, and is a linear or branched alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. More has a substituent other than a fluorine atom.

The cycloalkyl group having a fluorine atom is a monocyclic or polycyclic cycloalkyl group in which at least one hydrogen atom is substituted with a fluorine atom, and may have a substituent other than a fluorine atom.

The aryl group of the fluorine atom may be a group obtained by substituting at least one hydrogen atom of an aryl group such as a phenyl group or a naphthyl group with a fluorine atom, and may further have a substituent other than a fluorine atom.

The fluorine atom-containing alkyl group, the fluorine atom-containing cycloalkyl group, and the fluorine atom-containing aryl group are preferably a group represented by the following formula (F2) to formula (F4), but the invention is not limited thereto. this.

[Chem. 21]

In the general formulae (F2) to (F4), R ₅₇ to R ₆₈ each independently represent a hydrogen atom, a fluorine atom or an alkyl group (straight chain or branched). Wherein at least one of R ₅₇ to R ₆₁ , at least one of R ₆₂ to R ₆₄ and at least one of R ₆₅ to R ₆₈ each independently represent a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom (preferably Carbon number 1~4).

R ₅₇ to R ₆₁ and R ₆₅ to R _{67 are} preferably all fluorine atoms. R ₆₂ , R ₆₃ and R _{68 are} preferably an alkyl group in which at least one hydrogen atom is substituted by a fluorine atom (preferably, a carbon number of 1 to 4), and more preferably a perfluoroalkyl group having a carbon number of 1 to 4. R ₆₂ and R ₆₃ may also be bonded to each other to form a ring.

Specific examples of the group represented by the formula (F2) include p-fluorophenyl group, pentafluorophenyl group, and 3,5-bis(trifluoromethyl)phenyl group.

Specific examples of the group represented by the formula (F3) include trifluoromethyl, pentafluoropropyl, pentafluoroethyl, heptafluorobutyl, hexafluoroisopropyl, heptafluoroisopropyl, and hexafluoro. (2-methyl)isopropyl, nonafluorobutyl, octafluoroisobutyl, nonafluorohexyl, nonafluoro-tert-butyl, perfluoroisopentyl, perfluorooctyl, perfluoro(trimethyl Hexyl, 2,2,3,3-tetrafluorocyclobutyl, perfluorocyclohexyl, and the like. Preferred is hexafluoroisopropyl, heptafluoroisopropyl, hexafluoro(2-methyl)isopropyl, octafluoroisobutyl, nonafluoro-tert-butyl, perfluoroisopentyl, More preferred is hexafluoroisopropyl or heptafluoroisopropyl.

Specific examples of the group represented by the formula (F4) include -C(CF ₃ ) ₂ OH, -C(C ₂ F ₅ ) ₂ OH, -C(CF ₃ )(CH ₃ )OH, -CH. (CF ₃ )OH or the like is preferably -C(CF ₃ ) ₂ OH.

The group containing a halogen atom may, for example, be an alkyl fluorenyl group structure (preferably a trialkyl decyl group), a cyclic oxirane structure or the like.

Specific examples of the alkyl fluorenyl group structure or the cyclic oxime structure of W ₃ to W ₆ include a group represented by the following formula (CS-1) to formula (CS-3).

In the general formula (CS-1) to the general formula (CS-3), R ₁₂ to R ₂₆ each independently represent a linear or branched alkyl group (preferably, a carbon number of 1 to 20) or a cycloalkyl group (preferably Carbon number 3~20).

L ₃ to L ₅ represent a single bond or a divalent linking group. The divalent linking group may be exemplified by a group selected from the group consisting of alkylene, phenyl, ether, thioether, carbonyl, ester, amide, urethane, and urea linkages. One or more combinations (preferably having a total carbon number of 12 or less).

n represents an integer from 1 to 5. n is preferably an integer of 2 to 4.

The alkyl group having 6 or more carbon atoms is preferably a linear or branched alkyl group having 6 to 20 carbon atoms, more preferably 6 to 15 carbon atoms, and may have a substituent (wherein, it is not equivalent to a fluorine atom or a fluorine atom). a group and a group containing a halogen atom).

The cycloalkyl group having 5 or more carbon atoms is preferably a cycloalkyl group having 5 to 20 carbon atoms, more preferably 5 to 15 carbon atoms, and may have a substituent (wherein, a group which does not correspond to a fluorine atom or a fluorine atom) a group and a group containing a ruthenium atom).

The aryl group having 6 or more carbon atoms is preferably an aryl group having 6 to 20 carbon atoms, more preferably 6 to 15 carbon atoms, and may have a substituent (wherein a group which does not correspond to a fluorine atom or a fluorine atom) a group containing a halogen atom).

The aryl group may be substituted with at least one alkyl group having 3 or more carbon atoms or at least one cycloalkyl group having 5 or more carbon atoms, or may further be substituted with other substituents other than the groups (wherein, it is not equivalent to a fluorine atom) Substituted by a fluorine atom-containing group and a halogen atom-containing group.

The alkyl group having 3 or more carbon atoms is preferably a linear or branched alkyl group having 3 to 15 carbon atoms, more preferably 3 to 10 carbon atoms. In the aryl group substituted with at least one alkyl group having 3 or more carbon atoms, the aryl group is preferably substituted with 1 to 9 carbon atoms having 3 or more carbon atoms, more preferably 1 to 7 carbon atoms. The alkyl group having 3 or more carbon atoms is substituted, and it is preferably substituted with one to five alkyl groups having 3 or more carbon atoms.

The cycloalkyl group having 5 or more carbon atoms is preferably a cycloalkyl group having 5 to 20 carbon atoms, more preferably 5 to 15 carbon atoms. Taking at least one cycloalkyl group having 5 or more carbon atoms In the aryl group, the aryl group is preferably substituted by 1 to 5 cycloalkyl groups having 5 or more carbon atoms, more preferably 1 to 4 cycloalkyl groups having 5 or more carbon atoms. Further, it is preferably substituted by one to three cycloalkyl groups having 5 or more carbon atoms.

The aralkyl group having 7 or more carbon atoms is preferably an aralkyl group having 7 to 20 carbon atoms, more preferably 7 to 15 carbon atoms, and may have a substituent (wherein a fluorine atom or a fluorine atom-free group is not contained). a group and a group containing a ruthenium atom).

The resin (Aa) preferably contains at least one of the repeating units represented by any one of the following general formulae (C-Ia) to (C-Id) as the repeating unit (Aa3).

In the formula, R ₁₀ and R ₁₁ each independently represent a hydrogen atom, a fluorine atom or an alkyl group. The alkyl group is preferably a linear or branched alkyl group having 1 to 4 carbon atoms, and may have a substituent. The alkyl group having a substituent may, for example, be a fluorinated alkyl group. R ₁₀ and R _{11 are} preferably each independently a hydrogen atom or a methyl group.

W ₃ , W ₅ and W ₆ each independently represent a group selected from a group containing a fluorine atom, a group containing a halogen atom, an alkyl group having 6 or more carbon atoms, a cycloalkyl group having 5 or more carbon atoms, and a carbon number of 6 or more. One or more organic groups in the group consisting of an aryl group and an aralkyl group having 7 or more carbon atoms.

W ₄ represents one or more organic groups having a group selected from the group consisting of a fluorine atom-containing group, a halogen atom-containing group, a carbon number of 3 or more, and a cycloalkyl group having 5 or more carbon atoms.

Ar ₁₁ represents an (r+1)-valent aromatic ring group.

r represents an integer from 1 to 10.

The divalent aromatic ring group in the case where the (r+1)-valent aromatic ring group Ar ₁₁ and r are 1 may have a substituent, and examples thereof include a stretching phenyl group, a methylphenyl group, a naphthyl group, and a stretching group. The base has a carbon number of 6 to 18 and an extended aryl group.

A specific example of the (r+1)-valent aromatic ring group in the case where r is an integer of 2 or more is preferably exemplified by removing (r-1) arbitrary hydrogen from the above specific example of the divalent aromatic ring group. A group of atoms.

The fluorine atom-containing group of W ₃ to W _{6 is} the same as those listed above for the fluorine atom-containing group.

The fluorine atom-containing group of W ₃ to W ₆ may be directly bonded to the repeating unit represented by the above formula (C-Ia) to formula (C-Id), and may further be selected from an alkyl group selected from a group in a group consisting of a phenyl group, an ether bond, a thioether bond, a carbonyl group, an ester bond, a guanamine bond, a urethane bond, and a ureido group, or a combination of two or more of these a group bonded to a repeating unit represented by the above formula (C-Ia) to formula (C-Id).

The ruthenium atom-containing group of W ₃ to W _{6 is} the same as those listed above for the ruthenium atom-containing group.

The alkyl group having 6 or more carbon atoms of W ₃ , W ₅ and W ₆ , a cycloalkyl group having 5 or more carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms are each the same as described above.

The alkyl group having 3 or more carbon atoms and the cycloalkyl group having 5 or more carbon atoms of W ₄ and the "alkyl group having 3 or more carbon atoms" in the aromatic ring group substituted with at least one alkyl group having 3 or more carbon atoms, respectively. And the "cycloalkyl group having 5 or more carbon atoms" in the aromatic ring group substituted with at least one cycloalkyl group having 5 or more carbon atoms is the same as described above.

In the case where the exposure source is extreme ultraviolet ray (EUV light), for the above reasons, W ₃ , W ₅ and W ₆ preferably also independently represent an alkane having a carbon number of 6 or more selected from a group containing a ruthenium atom. One or more organic groups in the group consisting of a cycloalkyl group having 5 or more carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms, and W _{4 is} preferably also selected from the group consisting of One or more organic groups in the group consisting of a group containing a halogen atom, an alkyl group having 3 or more carbon atoms, and a cycloalkyl group having 5 or more carbon atoms.

W ₃ , W ₅ and W ₆ are each preferably an organic group containing a fluorine atom, an organic group containing a halogen atom, an alkyl group having 6 or more carbon atoms, a cycloalkyl group having 5 or more carbon atoms, and a carbon number of 6 or more. When the aryl group or the aralkyl group having 7 or more carbon atoms is in the form of extreme ultraviolet rays (EUV light), the above-mentioned reason is preferably an organic group containing a halogen atom or an alkyl group having 6 or more carbon atoms. A cycloalkyl group having 5 or more carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms.

W _{4 is} preferably a fluorine atom-containing organic group, a halogen atom-containing organic group, a C 3 or more alkyl group or a C 5 or more cycloalkyl group, and when the exposure source is extremely ultraviolet (EUV light), For the above reasons, an organic group containing a halogen atom, an alkyl group having 3 or more carbon atoms, or a cycloalkyl group having 5 or more carbon atoms is preferable.

Specific examples of the repeating unit represented by any one of the above formula (C-Ia) to formula (C-Id) are shown below, but the present invention is not limited thereto.

In a specific example, X ₁ represents a hydrogen atom, -CH ₃ , -F or -CF ₃ .

The resin (Aa) preferably has an aryl group, and more preferably contains a repeating unit having an aryl group. By the aryl group of the resin (Aa), the aryl group absorbs the out-of-band light of the EUV light, and the following disadvantages can be further suppressed: only the surface of the exposed portion is exposed to light outside the band, and the surface of the pattern is rough. (In particular, in the case of EUV exposure), or the cross-sectional shape of the pattern is a T-top shape or an inverted cone shape, and the surfaces of the patterns to be separated are not separated from each other to form a bridge portion.

In this case, the above repeating unit (Aa3) may have an aryl group, or the resin (Aa) may further contain a repeating unit other than the above repeating unit (Aa3), and the repeating unit has an aryl group.

The repeating unit (Aa3) in the case where the repeating unit (Aa3) has an aryl group is preferably a repeating unit represented by the following formula (C-II).

In the above formula, R ₁₂ represents a hydrogen atom, a methyl group, a trifluoromethyl group or a fluorine atom.

W ₇ represents one or more organic groups having a group selected from the group consisting of a fluorine atom-containing group, a halogen atom-containing group, a carbon number of 3 or more, and a cycloalkyl group having 5 or more carbon atoms.

L ₁ represents a single bond or a -COOL ₂ - group. L ₂ represents a single bond or an alkylene group.

n represents an integer from 1 to 5.

The fluorine atom-containing group and the ruthenium atom-containing group of W ₇ are the same as those exemplified for the fluorine atom-containing group and the ruthenium atom-containing group.

The alkyl group having 3 or more carbon atoms and the cycloalkyl group having 5 or more carbon atoms of W ₇ and the alkyl group having 3 or more carbon atoms in the aromatic ring group substituted with at least one alkyl group having 3 or more carbon atoms, respectively And the above-mentioned "cycloalkyl group having 5 or more carbon atoms" in the aromatic ring group substituted with at least one cycloalkyl group having 5 or more carbon atoms is the same.

W _{7 is} preferably a trialkylalkylene group, a trialkoxyalkylene group, a trialkylalkylalkyl group-containing alkyl group, a trialkoxyalkylalkyl group-containing alkyl group, a carbon number of 3 or more alkyl group or a carbon number of 5 The above cycloalkyl group.

Trialkyl silicon as the W ₇ group, an alkyl trialkoxy silicon, trialkyl silicon-containing alkyl groups and silicon-containing trialkoxysilane group, the alkyl group bonded to silicon atoms or alkoxy The carbon number of the base is preferably from 1 to 5, more preferably from 1 to 3.

Further, in the alkyl group containing a trialkylsilyl group of W ₇ and the alkyl group having a trialkoxyalkyl group, the carbon number of the alkyl group bonded to the trialkyldecyl group or the trialkoxyalkyl group is higher Good for 1~5, better for 1~3.

R _{12 is} preferably a hydrogen atom or a methyl group.

The alkylene group as L ₂ is preferably an alkylene group having 1 to 5 carbon atoms, more preferably an alkylene group having 1 to 3 carbon atoms. L _{2 is} preferably a single bond.

W _{7 is} preferably a fluorine atom-containing organic group, a halogen atom-containing organic group, a C 3 or more alkyl group or a C 5 or more cycloalkyl group.

Specific examples of the repeating unit represented by the formula (C-II) are shown below, but are not limited to these specific examples.

[化27]

In the case where the resin (Aa) contains the repeating unit (Aa3), the content of the repeating unit (Aa3) relative to all repeating units of the resin (Aa) is preferably from 1 mol% (% by mole) to 95 mol%, more preferably 3 mol% to 65 mol%, and further preferably 5 mol% to 35 mol%.

<Repeating unit (Aa4)>

In one embodiment of the present invention, the resin (Aa) may further contain a repeating unit represented by the following formula (Aa4) (hereinafter also referred to as "repeating unit (Aa4)"). When the resin (Aa) contains a repeating unit (Aa4), the hydrophobicity is improved, the biasing property can be further improved, and the absorption of the out-of-band light can be improved.

[化28]

In the formula (Aa4), Rb represents a hydrogen atom, an alkyl group or a halogen atom.

S _1a represents a substituent, and is independent in the case where there are a plurality of cases.

p represents an integer from 0 to 5.

The general formula (Aa4) will be described in detail.

As described above, Rb in the formula represents a hydrogen atom, an alkyl group or a halogen atom, and the alkyl group may have a substituent.

Rb is preferably a hydrogen atom, a methyl group, a trifluoromethyl group or a fluorine atom, and more preferably a hydrogen atom.

As described above, S _1a represents a substituent.

Examples of the substituent represented by S _1a include an alkyl group, a cycloalkyl group, an alkoxy group, a decyl group, a decyloxy group, a halogen atom, a cyano group, an organic group containing a ruthenium atom, an aryl group, and an aryloxy group. An aralkyl group, an aralkyloxy group, a hydroxyl group, a nitro group, a sulfonylamino group, an alkylthio group, an arylthio group, an aralkylthio group or the like.

With respect to the substituent represented by S _1a , the above-mentioned group may also be a group bonded to a divalent linking group, and the divalent linking group may, for example, be a substituted or unsubstituted alkylene group, substituted or Unsubstituted cycloalkylene, -O- or a divalent linking group which combines these multiples.

The alkyl group represented by S _1a is preferably, for example, an alkyl group having 1 to 20 carbon atoms, and specific examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, and an isobutyl group. Third butyl, pentyl, hexyl and the like. The alkyl group may have a more substituent. Preferred substituents which may be further provided are, for example, a halogen atom, an alkoxy group, a cycloalkyl group, a hydroxyl group, a nitro group, a decyl group, a decyloxy group, a decylamino group, a sulfonylamino group, an alkylthio group, A heterocyclic residue such as an arylthio group, an aralkylthio group, a thiophenecarbonyloxy group, a thiophenemethylcarbonyloxy group or a pyrrolidone residue is preferably a substituent having a carbon number of 12 or less.

The cycloalkyl group represented by S _1a is, for example, preferably a cycloalkyl group having 3 to 10 carbon atoms, and specific examples thereof include a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a norbornyl group, an adamantyl group, and the like. . The cycloalkyl group may also have a more substituent. A preferred substituent which may be further provided is, for example, an alkyl group, in addition to the substituent which the alkyl group of the above S _1a may have.

The alkoxy group represented by S _1a is preferably, for example, an alkoxy group having 1 to 10 carbon atoms, and specific examples thereof include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group. The alkoxy group may have a further substituent, and examples of such a substituent include the same groups as the preferred substituent which the above-mentioned alkyl group as S _1a has.

The mercapto group represented by S _1a is, for example, preferably a group having 2 to 10 carbon atoms, and specific examples thereof include an ethyl group, a propyl group, a butyl group, an isobutyl group and the like. The mercapto group may have a further substituent, and such a substituent may, for example, be the same group as the preferred substituent which the above-mentioned alkyl group as S _1a may have.

The decyloxy group represented by S _1a is preferably, for example, a group having 2 to 10 carbon atoms. Examples of the fluorenyl group in the decyloxy group include the same specific examples as the above fluorenyl group, and the substituents which may be the same are also the same.

The aryl group represented by S _1a is, for example, preferably a group having 6 to 10 carbon atoms, and specific examples thereof include a phenyl group, a xylyl group, a tolylmethyl group, a cumenyl group, and a naphthyl group. , 蒽基, etc. The aryl group may have a further substituent. Examples of such a substituent include the same groups as the preferred substituent which the above-mentioned alkyl group or cycloalkyl group of S _1a may have.

The aryloxy group or the arylthio group represented by S _1a is preferably a group having 2 to 10 carbon atoms, for example. Examples of the aryl group in the aryloxy group and the arylthio group include the same specific examples as the above-mentioned aryl group, and the substituents which may be the same may be the same.

The aralkyl group represented by S _1a is preferably a group having 7 to 15 carbon atoms, and specific examples thereof include a benzyl group and the like. These groups may have a further substituent, and examples of such a substituent include the same groups as the preferred substituent which the above-mentioned alkyl group or cycloalkyl group of S _1a may have.

The aralkyloxy group or the aralkylthio group represented by S _1a is preferably, for example, a group having 7 to 15 carbon atoms. The aralkyl group in the aralkyloxy group and the aralkylthio group may, for example, be the same specific examples as the above-mentioned aralkyl group, and may have the same substituents.

The alkylthio group represented by S _1a is preferably, for example, a group having 1 to 10 carbon atoms. The alkyl group in the alkylthio group may, for example, be the same specific examples as the above alkyl group, and may have the same substituents.

The halogen atom represented by S _1a may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, preferably a fluorine atom or a chlorine atom, and most preferably a fluorine atom.

The organic group in the organic group containing a halogen atom represented by S _1a is a group containing at least one carbon atom, and may also contain an oxygen atom, a nitrogen atom, a sulfur atom, a halogen atom, a halogen atom (for example, a fluorine atom or a chlorine atom). , bromine atom, etc.) and other heteroatoms. The organic group preferably has from 1 to 30 carbon atoms.

The organic group based on the ruthenium atom is preferably represented by the following general formula (S).

In the formula, R ₁ , R ₂ and R ₃ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an alkoxy group, an aryl group, an aralkyl group or a halogen atom.

L represents a single bond or a divalent linking group.

The alkyl group of R ₁ , R ₂ and R ₃ is preferably, for example, an alkyl group having 1 to 20 carbon atoms, and may have a substituent.

The alkenyl group of R ₁ , R ₂ and R ₃ is preferably an alkenyl group having 2 to 10 carbon atoms, and may have a substituent.

The cycloalkyl group of R ₁ , R ₂ and R ₃ is preferably, for example, a cycloalkyl group having 3 to 10 carbon atoms, and may have a substituent.

The alkoxy group of R ₁ , R ₂ and R ₃ is preferably, for example, an alkoxy group having 1 to 10 carbon atoms, and may have a substituent.

The aryl group of R ₁ , R ₂ and R ₃ is preferably, for example, an aryl group having 6 to 10 carbon atoms, and may have a substituent.

The aralkyl group of R ₁ , R ₂ and R ₃ is preferably, for example, an aralkyl group having 7 to 15 carbon atoms, and may have a substituent.

The divalent linking group represented by L may, for example, be a substituted or unsubstituted alkylene group, -O-, -S-, -(C=O)- or a combination of these two. Linkage base.

In a certain aspect, S _1a is preferably an alkyl group having a substituent, a halogen atom or an organic group containing a halogen atom, more preferably an alkyl group, an alkyl group substituted by a halogen atom or an organic group containing a halogen atom. Further, it is preferably an alkyl group or a group represented by the following formula (S-1).

In the formula, R ₁₁ , R ₂₁ and R ₃₁ each independently represent an alkyl group.

L ₁ represents a single bond or a divalent linking group.

The alkyl group as R ₁₁ , R ₂₁ and R _{31 has} the same meaning as the alkyl group of R ₁ , R ₂ and R ₃ in the above formula (S), and is a divalent linking group of L ₁ and The divalent linking group of L in the general formula (S) has the same meaning.

As described above, p represents an integer of 0 to 5. p is preferably an integer of 1 to 5.

Specific examples of the repeating unit (Aa4) are shown below. However, the present invention is not limited to these specific examples, and the position of the substituent on the benzene ring (corresponding to the _S1a group) is not limited to the specific examples described below.

[化31]

[化32]

[化33]

[化35]

When the resin (Aa) contains a repeating unit (Aa4), the content of the repeating unit (Aa4) is preferably from 1 mol% to 99 mol%, more preferably 1 mol%, based on all the repeating units in the resin (Aa). 70 mol%, further preferably 1 mol% to 50 mol%, particularly preferably 1 mol% to 30 mol%.

<Repeating unit having a group decomposed by the action of an acid>

In one aspect of the invention, the resin (Aa) preferably further contains a repeating unit having a group which is decomposed by the action of an acid (hereinafter also referred to as "acid-decomposable group").

The acid-decomposable group of the repeating unit is preferably a group which forms a phenol or a carboxylic acid after decomposition of an acid, and more preferably a group which forms a carboxylic acid. Further, the acid-decomposable group which forms a phenol after acid decomposition is preferably an acetal group.

In one embodiment of the present invention, the repeating unit having an acid-decomposable group which may be contained in the resin (Aa) may, for example, be the formula (A1), formula (A2) or formula (described in the above-mentioned resin (Ab). A3) Representation of the repeating unit.

Further, in one aspect of the invention, the carboxylic acid is formed after the acid is decomposed. The repeating unit of the acid-decomposable group is preferably a repeating unit represented by the following formula (Aa1) or formula (Aa2).

In the formula (Aa1), R' represents a hydrogen atom or an alkyl group.

L represents a single bond or a divalent linking group.

R ₁ represents a hydrogen atom or a monovalent substituent.

R ₂ represents a monovalent substituent. R ₁ and R ₂ may also be bonded to each other to form a ring together with an oxygen atom in the formula.

R ₃ represents a hydrogen atom, an alkyl group or a cycloalkyl group.

In the formula (Aa2), Ra represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom.

L ₁ represents a single bond or a divalent linking group.

R ₁ and R ₂ each independently represent an alkyl group.

R ₁₁ and R ₁₂ each independently represent an alkyl group, and R ₁₃ represents a hydrogen atom or an alkyl group. Any two of R ₁₁ , R ₁₂ and R ₁₃ may be bonded to each other to form a ring.

As described above, the repeating unit represented by the formula (Aa1) (hereinafter also referred to as "repeating unit (Aa1)") and the repeating unit represented by the formula (Aa2) (hereinafter also referred to as "repeating unit (Aa2)") ") The reaction rate of the action of the acid is high, but the reaction rate of the repeating unit (Aa1) to the action of the acid is higher. Therefore, from the viewpoint of high sensitivity, the resin (Aa) more preferably contains a repeating unit (Aa1).

Hereinafter, the repeating unit (Aa1) and the repeating unit (Aa2) will be described in detail.

<Repeating unit (Aa1)>

First, the repeating unit represented by the formula (Aa1) will be described.

In the above formula (Aa1), the alkyl group of R' is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 5 carbon atoms, and further preferably an alkyl group having 1 to 3 carbon atoms. Preferred is an alkyl group having 1 or 2 carbon atoms (i.e., methyl or ethyl). Specific examples of the alkyl group of R' include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a second butyl group, and a third butyl group.

R' is preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, more preferably a hydrogen atom or The alkyl group having 1 to 3 carbon atoms is preferably a hydrogen atom, a methyl group or an ethyl group, and particularly preferably a hydrogen atom.

Examples of the divalent linking group represented by L include an alkylene group, an aromatic ring group, a cycloalkyl group, -COO-L ₁ '-, -OL ₁ '-, and -CONH-, and two or more of these are combined. Formation of groups, etc. Here, L ₁ ' represents an alkylene group (preferably having a carbon number of 1 to 20), a cycloalkyl group (preferably having a carbon number of 3 to 20), a group having a lactone structure, an aromatic ring group, and a stretching group. a group in which an alkyl group is combined with an aromatic ring group.

The alkylene group as the divalent linking group represented by L is preferably a methylene group, an ethyl group, a propyl group, a butyl group, a hexyl group, a decyl group, or the like. . More preferably, it is an alkylene group having 1 to 4 carbon atoms, and particularly preferably an alkylene group having 1 or 2 carbon atoms.

The cycloalkyl group having a divalent linking group represented by L is preferably a cycloalkyl group having 3 to 20 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentylene group, and a cyclohexyl group. , stretching ring heptyl, stretching cyclooctyl, stretching borneol or stretching adamantyl.

The aromatic ring group which is a divalent linking group represented by L is preferably an aromatic ring group having a carbon number of 6 to 18 (more preferably 6 to 10 carbon atoms) such as a benzene ring group or a naphthalene ring group. Or containing, for example, a thiophene ring, a furan ring, a pyrrole ring, a benzothiophene ring, a benzofuran ring, a benzopyrrole ring, a triazine ring, an imidazole ring, a benzimidazole ring, a triazole ring, a thiadiazole ring, a thiazole The aromatic ring group of the heterocyclic ring is preferably a benzene ring group.

The definition and preferred range of the alkylene group, the extended cycloalkyl group and the aromatic ring group represented by L ₁ ' are the same as those of the alkylene group, the extended cycloalkyl group and the aromatic ring group which are the divalent linking groups represented by L.

The group having a lactone structure represented by L ₁ ' may be optionally used as long as it has a lactone structure, preferably a 5-membered ring to 7-membered ring lactone structure, and preferably a 5-membered ring to a 7-membered ring. The lactone is structurally condensed in the form of a bicyclic structure or a spiro ring structure with other ring structures. For example, KA-1-1 to KA-1-17 which will be described later is preferable, and KA-1-1, KA-1-4, KA-1-5, and KA-1-17 are preferable.

The definition and preferred range of the alkylene group and the aromatic group in the group in which the alkyl group and the aromatic ring group are combined, represented by L ₁ ', and the alkylene group as the divalent linking group represented by L and The aromatic ring group is the same.

L is preferably a single bond, an aromatic ring group, a norbornane ring group or an adamantane ring group, more preferably a single bond, a norbornane ring group or an adamantane ring group, and thus preferably a single bond or a norbornane ring group. , especially good for a single button.

The monovalent substituent of R ₁ is preferably a group represented by *-C(R ₁₁₁ )(R ₁₁₂ )(R ₁₁₃ ). * represents a bond bonding to a carbon atom in a repeating unit represented by the formula (Aa1). R ₁₁₁ to R ₁₁₃ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group or a heterocyclic group.

The alkyl group of R ₁₁₁ to R ₁₁₃ is preferably an alkyl group having 1 to 15 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and still more preferably an alkyl group having 1 to 6 carbon atoms. Specific examples of the alkyl group of R ₁₁₁ to R ₁₁₃ include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, second butyl group, tert-butyl group, neopentyl group, hexyl group, and 2- The alkyl group of R ₁₁₁ to R ₁₁₃ is preferably a methyl group, an ethyl group, a propyl group, an isopropyl group or a tert-butyl group, such as ethylhexyl, octyl or dodecyl.

At least two of R ₁₁₁ to R ₁₁₃ each independently represent an alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group or a heterocyclic group, and preferably R ₁₁₁ to R ₁₁₃ all represent an alkyl group, a cycloalkyl group or an aryl group. , aralkyl or heterocyclic group.

The cycloalkyl group of R ₁₁₁ to R ₁₁₃ may be a monocyclic type or a polycyclic type, preferably a cycloalkyl group having 3 to 15 carbon atoms, more preferably a cycloalkyl group having 3 to 10 carbon atoms, and further preferably It is a cycloalkyl group having 3 to 6 carbon atoms. Specific examples of the cycloalkyl group of R ₁₁₁ to R ₁₁₃ include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a decahydronaphthyl group, a cyclodecyl group, and 1- Adamantyl, 2-adamantyl, 1-norbornyl and 2-norbornyl. The cycloalkyl group of R ₁₁₁ to R ₁₁₃ is preferably a cyclopropyl group, a cyclopentyl group or a cyclohexyl group.

The aryl group of R ₁₁₁ to R ₁₁₃ is preferably an aryl group having 6 to 15 carbon atoms, more preferably an aryl group having 6 to 12 carbon atoms, and a structure in which a plurality of aromatic rings are linked to each other via a single bond (for example, a biphenyl group) , terphenyl). Specific examples of the aryl group of R ₁₁₁ to R ₁₁₃ include a phenyl group, a naphthyl group, an anthracenyl group, a biphenyl group, and a terphenyl group. The aryl group of R ₁₁₁ to R ₁₁₃ is preferably a phenyl group, a naphthyl group or a biphenyl group.

The aralkyl group of R ₁₁₁ to R ₁₁₃ is preferably an aralkyl group having 6 to 20 carbon atoms, more preferably an aralkyl group having 7 to 12 carbon atoms. Specific examples of the aralkyl group of R ₁₁₁ to R ₁₁₃ include a benzyl group, a phenethyl group, a naphthylmethyl group, and a naphthylethyl group.

The heterocyclic group of R ₁₁₁ to R ₁₁₃ is preferably a heterocyclic group having 6 to 20 carbon atoms, more preferably a heterocyclic group having 6 to 12 carbon atoms. Specific examples of the heterocyclic group of R ₁₁₁ to R ₁₁₃ include pyridyl, pyrazinyl, tetrahydrofuranyl, tetrahydropyranyl, tetrahydrothiophenyl, piperidinyl, piperazinyl, furyl, and pyran. Base, chromanyl and the like.

The alkyl group, the cycloalkyl group, the aryl group, the arylalkyl group and the heterocyclic group of R ₁₁₁ to R ₁₁₃ may have a further substituent.

Examples of the substituent which the alkyl group of R ₁₁₁ to R ₁₁₃ may have include, for example, a cycloalkyl group, an aryl group, an amine group, a decylamino group, a guanyl urea group, an amino urethane group, a hydroxyl group, a carboxyl group, and a halogen atom. Alkoxy, aralkyloxy, thioether, decyl, decyloxy, alkoxycarbonyl, cyano and nitro groups. The substituents may be bonded to each other to form a ring, and the ring in which the substituents are bonded to each other to form a ring may, for example, be a cycloalkyl group having 3 to 10 carbon atoms or a phenyl group.

The cycloalkyl group of R ₁₁₁ ~ R ₁₁₃ may further have a substituent group include: alkyl groups, and each group above as alkyl group R ₁₁₁ ~ R ₁₁₃ may have a more specific example of the substituent group.

Further, the substituent which the cycloalkyl group may have more preferably has 1 to 8 carbon atoms.

Examples of the substituent which the aryl group, the aralkyl group and the heterocyclic group of R ₁₁₁ to R ₁₁₃ may further include, for example, a halogen atom such as a nitro group or a fluorine atom, a carboxyl group, a hydroxyl group, an amine group, a cyano group or an alkyl group. Preferably, the carbon number is 1 to 15), the alkoxy group (preferably having a carbon number of 1 to 15), the cycloalkyl group (preferably having a carbon number of 3 to 15), and the aryl group (preferably having a carbon number of 6 to 14). The alkoxycarbonyl group (preferably having 2 to 7 carbon atoms), a mercapto group (preferably having 2 to 12 carbon atoms), and an alkoxycarbonyloxy group (preferably having 2 to 7 carbon atoms) may be mentioned.

At least two of R ₁₁₁ to R ₁₁₃ may be bonded to each other to form a ring.

In the case where at least two of R ₁₁₁ to R ₁₁₃ are bonded to each other to form a ring, examples of the ring to be formed include a tetrahydropyran ring, a cyclopentane ring, a cyclohexane ring, an adamantane ring, and a norbornene. An olefin ring, a norbornane ring, and the like. These rings may have a substituent, and examples of the substituent which may be exemplified are the alkyl group and the respective groups described above as specific examples of the substituent which the alkyl group of R ₁₁₁ to R ₁₁₃ may have.

In the case where all of R ₁₁₁ to R ₁₁₃ are bonded to each other to form a ring, examples of the ring to be formed include an adamantane ring, a norbornane ring, a norbornene ring, and a bicyclo[2,2,2]octane ring. , bicyclo[3,1,1]heptane ring. Among them, it is especially preferred to be an adamantane ring. These rings may have a substituent, and examples of the substituent which may be exemplified are the alkyl group and the respective groups described above as specific examples of the substituent which the alkyl group of R ₁₁₁ to R ₁₁₃ may have.

In one embodiment of the invention, the monovalent substituent of R ₂ is preferably a group represented by *-MQ. * represents a bond bonding to an oxygen atom in the formula (Aa1). M represents a single bond or a divalent linking group. Q represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group. In one aspect of the invention, it is preferred that R ₂ does not contain a fluorine atom.

The divalent linking group as M is, for example, an alkylene group (preferably an alkylene group having 1 to 8 carbon atoms, such as a methylene group, an ethyl group, a propyl group, a butyl group, a hexyl group or a decyl group). a cycloalkyl group (preferably a cycloalkyl group having a carbon number of 3 to 15, such as a cyclopentyl group or a cyclohexyl group), -S-, -O-, -CO-, -CS-, -SO ₂ -, -N(R ₀ )- or a combination of two or more of these, preferably a group having a total carbon number of 20 or less. Here, R ₀ is a hydrogen atom or an alkyl group (for example, an alkyl group having 1 to 8 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, a n-butyl group, a second butyl group, a hexyl group, an octyl group, etc.) .

M is preferably a single bond, an alkylene group or a divalent linking group comprising a combination of an alkyl group and at least one of -O-, -CO-, -CS- and -N(R ₀ )-, more preferably a single A bond, an alkyl group or a divalent linking group comprising a combination of an alkyl group and -O-. Here, R ₀ and R ₀ is the same meaning as above.

M may have a more substituent, and M may have a substituent which is the same as the substituent which the above alkyl group of R ₁₁₁ to R ₁₁₃ may have.

Specific examples and preferred examples of the alkyl group as Q are the same as those described for the alkyl group as R ₁₁₁ to R ₁₁₃ described above.

The cycloalkyl group as Q may be a monocyclic type or a polycyclic type. The carbon number of the cycloalkyl group is preferably set to 3 to 10. Examples of the cycloalkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a 1-adamantyl group, a 2-adamantyl group, a 1-norbornyl group, and 2 -norbornyl, borneol, isobornyl, 4-tetracyclo[6.2.1.1 ^3,6 .0 ^2,7 ]dodecyl, 8-tricyclo[5.2.1.0 ^2,6 ]decyl, 2 - Bicyclo [2.2.1] heptyl. Among them, a cyclopentyl group, a cyclohexyl group, a 2-adamantyl group, an 8-tricyclo[5.2.1.0 ^2,6 ]fluorenyl group, and a 2-bicyclo[2.2.1]heptyl group are preferred.

Specific examples and preferred examples of the aryl group of Q are the same as those described above for the aryl group as R ₁₁₁ to R ₁₁₃ .

Specific examples and preferred examples of the heterocyclic group of Q are, for example, the same as those described above for the heterocyclic group of R ₁₁₁ to R ₁₁₃ .

The alkyl group, the cycloalkyl group, the aryl group and the heterocyclic group of Q may have a substituent, and examples thereof include an alkyl group, a cycloalkyl group, a cyano group, a halogen atom, a hydroxyl group, an alkoxy group, a carboxyl group, and an alkoxycarbonyl group.

R _{2 is} preferably an alkyl group, a cycloalkyl-substituted alkyl group, a cycloalkyl group, an aralkyl group, an aryloxyalkyl group or a heterocyclic group, more preferably an alkyl group or a cycloalkyl group. An alkyl group as R _{2 ,} a cycloalkyl group as R ₂ and a cycloalkyl group in a cycloalkyl-substituted alkyl group, and an aralkyl group as an ion group represented by R ₂ Specific examples and preferred examples of the aryl group in the alkyl group" and the "aryloxyalkyl group" are the same as those described for the alkyl group, the cycloalkyl group and the aryl group which are Q.

Specific examples and preferred examples of the alkyl moiety in the "cycloalkyl-substituted alkyl group", the "aralkyl group" and the "aryloxyalkyl group" of R ₂ are respectively referred to as M The description of the alkyl group is the same.

Specific examples and preferred examples of the heterocyclic group of R ₂ are the same as those described for the heterocyclic group of Q.

Specific examples of the substituent represented by R ₂ include a methyl group, an ethyl group, an isopropyl group, a cyclopentyl group, a cyclohexyl group, a cyclohexylethyl group, a 2-adamantyl group, and an 8-tricyclo[ 5.2.1.0 ^2,6 ] mercapto, 2-bicyclo[2.2.1]heptyl, benzyl, 2-phenylethyl, 2-phenoxyethyl and the like.

R ₁ and R ₂ may also be bonded to each other and form a ring (oxygen-containing hetero ring) together with an oxygen atom in the formula. The oxygen-containing heterocyclic ring structure may be any of a monocyclic ring, a polycyclic ring or a spiro ring, and is preferably a monocyclic oxygen-containing heterocyclic ring structure having a carbon number of preferably 3 to 10, more preferably 4 or 5.

Further, as described above, when M is a divalent linking group, Q may be a single bond or may be bonded to M via another linking group to form a ring. The other linking group may be an alkyl group (preferably an alkyl group having 1 to 3 carbon atoms), and the ring formed is preferably a 5-membered ring or a 6-membered ring.

R _{3 is} preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, further preferably a hydrogen atom, a methyl group or an ethyl group, and particularly preferably a hydrogen atom.

In one aspect of the invention, it is preferred that one of R ₁ and R ₃ is a group containing two or more carbon atoms.

The repeating unit represented by the formula (Aa1) is preferably a repeating unit represented by any one of the following formulae (Aa1-1) to (Aa1-4).

[化38]

In the formula (Aa1-1), R' ₁ represents a hydrogen atom or a methyl group, preferably a methyl group.

R ₁₁ , R ₁₂ and R ₁₃ have the same meanings as R ₁ , R ₂ and R ₃ in the above formula (Aa1), respectively.

In the formula (Aa1-2), R' ₂ represents a hydrogen atom or a methyl group, preferably a methyl group.

R ₂₁ , R ₂₂ and R ₂₃ have the same meanings as R ₁ , R ₂ and R ₃ in the above formula (Aa1), respectively.

In the formula (Aa1-3), R' ₃ represents a hydrogen atom or a methyl group, preferably a methyl group.

R ₃₁ , R ₃₂ and R ₃₃ have the same meanings as R ₁ , R ₂ and R ₃ in the above formula (Aa1), respectively.

In the formula (Aa1-4), L' represents a single bond or a divalent linking group. Examples of the divalent linking group of L' include an alkylene group, an aromatic ring group, a cycloalkyl group, -COO-L ₁ '-, -OL ₁ '-, and -CONH-, and two or more of these are combined. Formation of groups, etc. Here, L ₁ ' represents an alkylene group (preferably having 1 to 20 carbon atoms), a cycloalkyl group (preferably having 3 to 20 carbon atoms), an aromatic ring group, and an alkyl group and an aromatic ring group. a group. L' is preferably a single bond.

R ₄₁ , R ₄₂ and R ₄₃ have the same meanings as R ₁ , R ₂ and R ₃ in the above formula (Aa1), respectively.

In one aspect of the present invention, the repeating unit represented by the formula (Aa1) is preferably a repeating unit represented by any one of the formula (Aa1-1) to the formula (Aa1-4), more preferably a pass. The repeating unit represented by any one of the formula (Aa1-1) to the formula (Aa1-3) is preferably a repeating unit represented by the formula (Aa1-1) or the formula (Aa1-3), and particularly preferably A repeating unit represented by the formula (Aa1-1).

The repeating unit represented by the formula (Aa1) is also preferably a repeating unit represented by any one of the following (Aa1-a) to (Aa1-f).

In the general formula (Aa1-a), R _a ', L _a , R _2a and R _1a are the same as R', L, R ₂ and R ₁ in the formula (Aa1), respectively, and the preferred ranges are also the same.

In the general formula (Aa1-b), R _b ', L _b , R _2b and R _3b are the same as R', L, R ₂ and R ₃ in the formula (Aa1), respectively, and the preferred ranges are also the same.

In the general formula (Aa1-c), R _c ', L _c , R _2c and R _3c are the same as R', L, R ₂ and R ₃ in the formula (Aa1), respectively, and the preferred ranges are also the same.

R _1a ' is the same as R ₁₁₁ in the formula (Aa1), and the preferred range is also the same.

In the general formula (Aa1-d), R _d ', L _d , R _2d and R _3d are the same as R', L, R ₂ and R ₃ in the formula (Aa1), respectively, and the preferred ranges are also the same.

R _2a ' and R _2b ' are the same as R ₁₁₁ and R ₁₁₂ in the formula (Aa1), respectively, and the preferred ranges are also the same.

[Chem. 46]

In the general formula (Aa1-e), R _e ', L _e , R _2e and R _3e are the same as R', L, R ₂ and R ₃ in the formula (Aa1), respectively, and the preferred ranges are also the same.

R _3a ', R _3b ' and R _3c ' are the same as R ₁₁₁ , R ₁₁₂ and R ₁₁₃ in the formula (Aa1), respectively, and the preferred ranges are also the same.

In the general formula (Aa1-f), R _f ' and L _f are the same as R' and L in the formula (Aa1), and the preferred ranges are also the same.

R _3f is the same as R ₃ in the formula (Aa1), and the preferred range is also the same.

R _4f represents an atomic group necessary for forming an oxygen-containing hetero ring together with a carbon atom and an oxygen atom in the formula. The oxygen-containing heterocyclic ring structure formed by R _4f together with a carbon atom and an oxygen atom is preferably a monocyclic oxygen-containing heterocyclic ring structure, and the number of carbon atoms of the oxygen-containing hetero ring is preferably from 3 to 10, more preferably 4 or 5.

In one aspect of the present invention, the repeating unit represented by the formula (Aa1) is more preferably a repeating unit represented by any one of the formula (Aa1-c) to the formula (Aa1-f), and further preferably A repeating unit represented by the formula (Aa1-e) or the formula (Aa1-f).

Preferred specific examples of the structure of each moiety and each group in the above formula (Aa1) are shown below.

A preferred embodiment of the partial structure represented by the following formula (Aa1') in the above formula (Aa1) is as follows. In the general formula (Aa'') and specific examples, * represents a bond to a carbon atom bonded to R ₁ and R ₃ in the above formula (Aa1), and R' and L represent a formula (Aa1), respectively. R' and L.

[化49]

Specific examples of the monovalent substituent of R ₁ in the above formula (Aa1) include the following. * represents a bond bonding to a carbon atom in the formula (Aa1).

[化50]

Specific examples of R ₂ in the above formula (Aa1) are shown. In the following specific examples, * represents a bond bond of an oxygen atom bonded to the formula (Aa1).

When the repeating unit represented by the above formula (Aa1) is a repeating unit represented by the above formula (Aa1-f), the specificity of the oxygen-containing hetero ring formed by R _4f together with the carbon atom and the oxygen atom in the formula The examples are as follows. * represents a bond bonding to an oxygen atom in the formula (Aa1-f). R _3f general formula (Aa1-f) R _3f are the same.

Specific examples of the repeating unit represented by the above formula (Aa1) are shown below, but the present invention is not limited to these specific examples.

[化53]

[54]

With respect to all the repeating units in the above-mentioned resin (Aa), the content of the repeating unit represented by the above formula (Aa1) in the resin (Aa) (the total amount in the case of containing a plurality of kinds) is preferably 5 mol%. 80 mol%, more preferably 5 mol% to 60 mol%, and further preferably 10 mol% to 40 mol%.

<Repeating unit (Aa2)>

Next, the repeating unit represented by the formula (Aa2) will be described in detail.

In the formula (Aa2), the alkyl group as R ₁ , R ₂ and R ₁₁ to R ₁₃ is preferably an alkyl group having 1 to 10 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group and an isopropyl group. Base, n-butyl, t-butyl, tert-butyl, neopentyl, hexyl, 2-ethylhexyl, octyl and dodecyl groups, and the like.

From the viewpoint of more reliably achieving the effects of the present invention, the alkyl group of R ₁ and R ₂ is more preferably an alkyl group having 2 to 10 carbon atoms, and further preferably both R ₁ and R ₂ are an ethyl group.

The alkyl group of R ₁₁ and R ₁₂ is more preferably an alkyl group having 1 to 4 carbon atoms, further preferably a methyl group or an ethyl group, and particularly preferably a methyl group.

R _{13 is more} preferably a hydrogen atom or a methyl group.

As described above, R ₁₁ and R ₁₂ may be bonded to each other to form a ring, and R ₁₁ and R ₁₃ may be bonded to each other to form a ring. The ring formed is, for example, preferably a monocyclic or polycyclic alicyclic hydrocarbon group, and it is particularly preferred that R ₁₁ and R ₁₂ are bonded to each other to form a monocyclic or polycyclic alicyclic hydrocarbon group.

The ring formed by joining R ₁₁ and R _{12 is} preferably a 3-membered ring to an 8-membered ring, more preferably a 5-membered ring or a 6-membered ring.

The ring formed by joining R ₁₁ and R _{13 is} preferably a 3-membered ring to an 8-membered ring, more preferably a 5-membered ring or a 6-membered ring.

The ring formed by linking R ₁₁ and R ₁₂ or R ₁₁ and R ₁₃ is more preferably an alicyclic group described below as X of the formula (Aa2-1).

The alkyl group as R ₁ , R ₂ and R ₁₁ to R ₁₃ may have a more substituent. Examples of such a substituent include a cycloalkyl group, an aryl group, an amine group, a hydroxyl group, a carboxyl group, a halogen atom, an alkoxy group, an aralkyloxy group, a thioether group, a decyl group, a decyloxy group, an alkoxycarbonyl group, and the like. Cyano and nitro groups.

In one aspect of the invention, it is preferred that at least one of the alkyl groups of R ₁ and R ₂ has a carbon number of 2 or more.

Further, a ring formed by linking R ₁₁ and R ₁₂ and a ring formed by linking R ₁₁ and R ₁₃ may have a substituent. Examples of such a substituent include an alkyl group (methyl group, ethyl group, propyl group, butyl group). And a perfluoroalkyl group (for example, a trifluoromethyl group) or the like, and each group described above as a specific example of a substituent which the alkyl group of R ₁ , R ₂ and R ₁₁ to R ₁₃ may have.

The substituents may be bonded to each other to form a ring, and the ring in which the substituents are bonded to each other to form a ring may, for example, be a cycloalkyl group having 3 to 10 carbon atoms or a phenyl group.

As described above, Ra represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom.

The alkyl group of Ra is preferably an alkyl group having 1 to 4 carbon atoms and may have a substituent.

Preferred substituents which the alkyl group of Ra may have include a hydroxyl group and a halogen atom.

Examples of the halogen atom of Ra include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

Ra is preferably a hydrogen atom, a methyl group, a hydroxymethyl group or a perfluoroalkyl group having a carbon number of 1 to 4 (for example, a trifluoromethyl group), thereby increasing the glass transition point (Tg) of the resin (A) and improving From the viewpoint of the resolution force and the space width roughness, a methyl group is particularly preferable.

In the case where L ₁ is a phenyl group as described below, Ra is also preferably a hydrogen atom.

As described above, L ₁ represents a single bond or a divalent linking group.

Examples of the divalent linking group represented by L ₁ include an alkylene group, a divalent aromatic ring group, -COO-L ₁₁ -, -OL ₁₁ -, a group formed by combining two or more of these, and the like. Here, L ₁₁ represents an alkyl group, a cycloalkyl group, a divalent aromatic ring group, a group in which an alkyl group and a divalent aromatic ring group are combined.

The alkylene group of L ₁ and L ₁₁ may, for example, be an alkylene group having a carbon number of 1 to 8 such as a methylene group, an ethyl group, a propyl group, a butyl group, a hexyl group or a octyl group. More preferably, it is an alkylene group having 1 to 4 carbon atoms, and particularly preferably an alkylene group having 1 or 2 carbon atoms.

The cycloalkyl group of L ₁₁ is preferably a cycloalkyl group having 3 to 20 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutene butyl group, a cyclopentylene group, a cyclohexylene group, and a cycloheptyl group. Extend the octyl group, extend the borneol base or extend the adamantyl group.

In the cycloalkyl group of L ₁₁ , the carbon constituting the ring (carbon which contributes to the ring) may be a carbonyl carbon, a hetero atom such as an oxygen atom, or an ester bond to form a lactone ring.

The divalent aromatic ring group of L ₁ and L ₁₁ is preferably a phenyl group, a 1,3-phenylene group, a 1,2-phenylene group, or the like, a 1,4-phenylene group. More preferably, it is a 1,4-phenylene group.

L _{1 is} preferably a single bond, a divalent aromatic ring group, a divalent group having a borneol group or a divalent group having an adamantyl group, and particularly preferably a single bond.

Preferred examples of the divalent linking group for L ₁ are exemplified below, but the present invention is not limited to these specific examples.

In one embodiment of the present invention, the repeating unit represented by the above formula (Aa2) is preferably a repeating unit represented by the following formula (Aa2-1).

In the above formula (Aa2-1), X represents an alicyclic group.

R _1, R _2, Ra, respectively, and L ₁ in the general formula (Aa2) R in _1, R _2, Ra L ₁ is the same meaning and specific examples, the preferred embodiment also of the general formula (Aa2) R ₁ is R ₂ , Ra and L _{1 are the} same.

The alicyclic group which is X may be a monocyclic, polycyclic or bridged type, and preferably represents an alicyclic group having a carbon number of 3 to 25.

Further, the alicyclic group may have a substituent, and examples of the substituent include the same substituents as those described above for the substituent which the ring formed by linking R ₁₁ and R ₁₂ may have.

X is preferably an alicyclic group having 3 to 25 carbon atoms, more preferably an alicyclic group having 5 to 20 carbon atoms, and particularly preferably a cycloalkyl group having 5 to 15 carbon atoms.

Further, X is preferably an alicyclic group of a 3-membered ring to an 8-membered ring or a condensed ring group thereof, Preferably, it is a 5-membered ring or a 6-membered ring or a fused ring thereof.

An example of the structure of the alicyclic group as X is shown below.

[化59]

Preferred examples of the above alicyclic group include adamantyl group, noradamantyl group, decahydronaphthalene residue, tricyclodecyl group, tetracyclododecyl group, norbornyl group, cedarol group, cyclopentyl group. , cyclohexyl, cycloheptyl, cyclooctyl, cyclodecyl, cyclododecyl. More preferably, it is a cyclohexyl group, a cyclopentyl group, an adamantyl group, a norbornyl group, and further preferably a cyclohexyl group, a cyclopentyl group, and more preferably a cyclohexyl group.

The weight represented by the above formula (Aa2) or formula (Aa2-1) is shown below. Specific examples of the complex unit, but the present invention is not limited to the specific examples.

[化66]

With respect to all the repeating units in the resin (Aa), the content of the repeating unit represented by the above formula (Aa2) in the resin (Aa) (in the case where it is contained in a plurality of cases) is preferably from 5 mol% to 80 mol. % is more preferably 5 mol% to 60 mol%, and further preferably 10 mol% to 40 mol%.

<Repeating unit (Aa5)>

In one aspect of the invention, the resin (Aa) may further contain at least one repeating unit (Aa5) derived from a monomer represented by the following formula (aa1-1).

In the formula (aa1-1), Q ₁ represents an organic group containing a polymerizable group.

L ₁ and L ₂ each independently represent a single bond or a divalent linking group.

Rf represents an organic group of a fluorine atom.

The organic group containing a polymerizable group represented by Q ₁ in the formula is not particularly limited as long as it is a group containing a polymerizable group. Examples of the polymerizable group include an acrylic group, a methacryl group, a styryl group, a norbornene group, a maleidino group, a vinyl ether group, etc., and particularly preferably an acrylic group, a methacryl group, and a styryl group. .

The divalent linking group represented by L ₁ and L ₂ may, for example, be a substituted or unsubstituted extended aryl group, a substituted or unsubstituted alkylene group, a substituted or unsubstituted stretched alkyl group. , -O-, -CO-, or a divalent linking group in which these multiple components are combined.

The aryl group is preferably a group having 6 to 14 carbon atoms, and specific examples thereof include a stretching phenyl group, a stretching naphthyl group, a stretching fluorenyl group, a phenanthrenyl group, a stretching phenyl group, and a stretching terphenyl group.

The alkylene group and the cycloalkylene group are preferably a group having 1 to 15 carbon atoms, and specific examples thereof include a form in which a hydrogen atom is removed from a linear, branched or cyclic alkyl group to be enumerated below. Group: methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, tert-butyl, third pentyl, n-pentyl, n-hexyl, n-heptyl, n-octyl , n-decyl, n-decyl, cyclopentyl, cyclohexyl, cyclopentylmethyl, cyclopentylethyl, cyclopentylbutyl, cyclohexylmethyl, cyclohexylethyl, cyclohexylbutyl, diamond alkyl.

Examples of the substituent which the above-mentioned extended aryl group, alkylene group and cycloalkylene group may have include an alkyl group, an aralkyl group, an alkoxy group, a fluorine atom and the like.

In one aspect of the invention, L _{1 is more} preferably a single bond, a phenyl group, an ether group, a carbonyl group or a carbonyloxy group, and L _{2 is more} preferably an alkyl group, an ether group, a carbonyl group or a carbonyloxy group.

The organic group in the organic group of the fluorine atom-containing atom of Rf is a group containing at least one carbon atom, and preferably an organic group containing a carbon-hydrogen bond moiety. Rf is, for example, an alkyl group substituted by a fluorine atom or a cycloalkyl group substituted by a fluorine atom.

The repeating unit (Aa5) is preferably a repeating unit represented by the following formula (aa1-2-1) or formula (aa1-3-1) in one aspect.

In the formula (aa1-2-1) and the formula (aa1-3-1), Ra ₁ and Ra ₂ each independently represent a hydrogen atom or an alkyl group. Ra ₁ and Ra _{2 are} preferably a hydrogen atom or a methyl group.

L ₂₁ and L ₂₂ each independently represent a single bond or a divalent linking group, and have the same meaning as L ₂ in the above formula (aa1-1).

Rf ₁ and Rf ₂ each independently represent an organic group of a fluorine atom, and have the same meaning as Rf in the formula (aa1-1).

Further, the repeating unit (Aa5) is preferably in the following form (aa1-2-2) or a repeating unit represented by the formula (aa1-3-2).

In the general formula (aa1-2-2) and the general formula (aa1-3-2), Ra ₁ and Ra ₂ each independently represent a hydrogen atom or an alkyl group.

R ₁ , R ₂ , R ₃ and R ₄ each independently represent a hydrogen atom or an alkyl group.

m ₁ and m ₂ each independently represent an integer of 0 to 5.

Rf ₁ and Rf ₂ each independently represent an organic group of a fluorine atom.

Ra ₁ and Ra _{2 are} preferably a hydrogen atom or a methyl group.

The alkyl group represented by R ₁ , R ₂ , R ₃ and R ₄ is, for example, preferably a linear or branched alkyl group having 1 to 10 carbon atoms, and specific examples thereof include a methyl group, an ethyl group and a propyl group. Isopropyl, butyl, tert-butyl, and the like. The alkyl group may have a substituent, and examples of the substituent include an alkoxy group, an aryl group, a halogen atom and the like.

m ₁ and m _{2 are} preferably an integer of 0 to 3, more preferably 0 or 1, most preferably 1.

The organic group having a fluorine atom of Rf ₁ and Rf _{2 has} the same meaning as Rf in the formula (aa1-1).

Further, in one aspect, the repeating unit (Aa5) is preferably a repeating unit represented by the following formula (aa1-2-3) or formula (aa1-3-3).

In the formula (aa1-2-3) and the formula (aa1-3-3), Ra ₁ represents a hydrogen atom or a methyl group.

Rf ₁ and Rf ₂ each independently represent an organic group of a fluorine atom, and have the same meaning as Rf in the formula (aa1-1).

Specific examples of the repeating unit (Aa5) are shown below, but the present invention is not limited thereto.

[71]

[化72]

[化73]

[化74]

[化75]

[化76]

When the resin (Aa) contains a repeating unit (Aa5), The content of the repeating unit (Aa5) in all the repeating units (Aa5) in the resin (Aa) is preferably from 10 mol% to 90 mol%, more preferably from 30 mol% to 85 mol%, still more preferably from 50 mol% to 80 mol%.

<Repeating unit (Aa6)>

In one aspect of the invention, the resin (Aa) may further contain a repeating unit corresponding to the polymerizable compound represented by the following formula (ca-1) or formula (cb-1).

In the general formula (ca-1) and the general formula (cb-1), A represents a methacrylic group which may have a substituent, an acrylic group which may have a substituent or a norbornenyl group which may have a substituent.

Z ₁ each independently represents a single bond, an ether bond (-O-), an ester bond, a guanamine bond, a urethane bond or a urea bond. When q is 2 or more, a plurality of groups represented by Z ₁ may be the same or different.

Z ₂ each independently represents a single bond or a chain or cyclic alkyl group which may have a substituent. When q is 2 or more, a plurality of groups represented by Z ₂ may be the same or different.

Ta and Tb each independently represent a halogen atom and an alkyl group which may have a substituent a cycloalkyl group which may have a substituent, an alkoxy group which may have a substituent, a mercapto group which may have a substituent, an alkoxycarbonyl group which may have a substituent, a carboxyl group, a nitrile group, a hydroxyl group, may have a substituent Amidino group or an aryl group which may have a substituent.

When there are a plurality of Tas, Ta may be bonded to each other to form a ring.

In the case where there are a plurality of Tbs, Tb may be bonded to each other to form a condensed ring which may contain a hetero atom together with the benzene ring substituted with Tb.

Tc represents a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, a cycloalkyl group which may have a substituent, a nitrile group, a hydroxyl group, a mercapto group which may have a substituent, or an aryl group which may have a substituent.

L represents a carbonyl group, a carbonyloxy group or an ether bond (-O-). When r is an integer of 2 or more, (L)r represents a group in which r pieces are combined, and a plurality of L's may be the same or different.

m represents an integer from 1 to 28.

n represents an integer from 0 to 11.

p represents an integer from 0 to 5.

q represents an integer from 0 to 5.

r represents an integer from 0 to 5.

For a preferred embodiment, a production method, and a specific example of the polymerizable compound represented by the formula (ca-1) and the formula (cb-1), refer to paragraph [0026] of JP-A-2010-159413. The description of paragraph [0053].

In the case where the resin (Aa) contains a repeating unit (Aa6), the content of the repeating unit (Aa6) is preferably relative to all repeating units in the resin (Aa). 10 mol% to 90 mol%, more preferably 30 mol% to 85 mol%, and further preferably 50 mol% to 80 mol%.

In one form, the resin (Aa) may further have at least one selected from the group consisting of the following groups (x) to (z).

(x) an alkali soluble group, (y) a group which is decomposed by the action of an alkaline developing solution and has an increased solubility in an alkaline developing solution, (z) a group which is decomposed by the action of an acid.

For the group of (x) to (z), the description of paragraphs [0323] to [0358] of JP-A-2011-118318 can be referred to.

When the resin (Aa) contains a fluorine atom, the content of the fluorine atom is preferably from 5% by mass to 80% by mass, and more preferably from 10% by mass to 80% by mass based on the molecular weight of the resin (Aa). Further, the repeating unit containing a fluorine atom is preferably 10% by mass to 100% by mass, and more preferably 30% by mass to 100% by mass based on all the repeating units in the resin (Aa).

When the resin (Aa) contains a ruthenium atom, the content of the ruthenium atom is preferably from 2% by mass to 50% by mass, and more preferably from 2% by mass to 30% by mass based on the molecular weight of the resin (Aa). Further, the repeating unit containing a halogen atom is preferably 10% by mass to 90% by mass, and more preferably 20% by mass to 80% by mass based on all the repeating units of the resin (Aa).

The standard polystyrene-equivalent weight average molecular weight of the resin (Aa) is preferably from 1,000 to 100,000, more preferably from 1,000 to 50,000, and still more preferably from 2,000 to 2,000. 20,000.

When the resin (Aa) contains a repeating unit having at least one of a fluorine atom and a ruthenium atom, the resin (Aa) is biased in the surface layer of the sensitizing ray-sensitive or radiation-sensitive resin film, and the liquid immersion medium is water. In this case, the receding contact angle of the surface of the resist film against water when the photosensitive ray-sensitive or radiation-sensitive resin film is formed can be improved, and the liquid immersion followability can be improved.

The receding contact angle of the sensitizing ray-sensitive or radiation-sensitive resin film is usually at room temperature of 23 ° C ± 3 ° C and at a humidity of 45% ± 5%, preferably 60 ° to 90 °, more preferably Preferably, it is 65° or more, and further preferably 70° or more.

The content of the resin (Aa) in the sensitizing ray-sensitive or radiation-sensitive resin composition can be appropriately adjusted and used to form a sensitized ray so that the reclining contact angle of the sensitizing ray-sensitive or radiation-sensitive resin film is within the above range. The total solid content of the radiation or linear radiation resin composition is preferably from 0.01% by mass to 30% by mass, more preferably from 0.01% by mass to 20% by mass, even more preferably from 0.01% by mass to 10% by mass, particularly preferably from 0.01% by mass to 10% by mass. It is 0.1% by mass to 5% by mass. The resin (Aa) is present at the interface as described above, but unlike the surfactant, it is not necessary to have a hydrophilic group in the molecule, and it is not helpful to uniformly mix the polar/nonpolar substance.

In the immersion exposure step, the liquid immersion liquid must follow the high-speed scanning of the exposure head on the wafer and form an exposure pattern to move on the wafer, so that the contact angle of the liquid immersion liquid to the resist film in the dynamic state becomes It is important that the resist does not remain in the resist and follows the performance of the high speed scanning of the exposure head.

Of course, the resin (Aa) is preferably a metal or the like similar to the resin (Ab) described later. The amount of impurities is small, and the residual monomer or oligomer component is from 0% by mass to 10% by mass, more preferably from 0% by mass to 5% by mass, even more preferably from 0% by mass to 1% by mass. Thereby, a resist composition having no change in the amount of foreign matter, sensitivity, or the like in the liquid can be obtained. Further, the molecular weight distribution (Mw/Mn, also referred to as dispersion degree) is preferably in the range of 1 to 3 in terms of resolution, resist shape, side wall of the resist pattern, roughness, and the like, and more preferably 1~2, and then preferably 1~1.8, the best range is 1~1.5.

The resin (Aa) can also be synthesized by various commercial products, or can be synthesized according to a usual method (for example, radical polymerization or anionic polymerization). For example, it can be synthesized by the same method as the usual synthesis method of the resin (Ab) described in the resin (Ab) described later.

Specific examples of the resin (Aa) are shown below, but the present invention is not limited thereto.

[化78]

[2] Resin in which the solubility of the developer changes due to the action of acid (Ab)

The composition of the present invention contains a resin (Ab) containing a repeating unit represented by the following formula (A), and the solubility in the developing solution is changed by the action of an acid. Chemical.

The resin (Ab) is a resin which changes the solubility of the developer due to the action of an acid, and specifically, the solubility of the alkaline developer due to the action of the acid is increased, or the developer having the organic solvent as a main component The solubility is reduced.

The resin (Ab) is preferably insoluble or poorly soluble in an alkaline developer.

The resin (Ab) contains a repeating unit represented by the following formula (A) having a phenolic hydroxyl group.

In the above formula, R ₂₁ , R ₂₂ and R ₂₃ each independently represent a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group. Wherein R ₂₂ may also be bonded to Ar ₂ to form a ring, and in this case, R ₂₂ represents a single bond or an alkylene group.

X ₂ represents a single bond, -COO- or -CONR ₃₀ -, and R ₃₀ represents a hydrogen atom or an alkyl group.

L ₂ represents a single bond or an alkylene group.

Ar ₂ represents an (n+1)-valent aromatic ring group, and when R _{22 is} bonded to form a ring, it represents an (n+2)-valent aromatic ring group.

n represents an integer from 1 to 4.

The alkyl group of R ₂₁ , R ₂₂ and R ₂₃ in the above formula (A) is preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group or a second butyl group which may have a substituent. An alkyl group having a carbon number of 20 or less, such as a hexyl group, a 2-ethylhexyl group, an octyl group or a dodecyl group, more preferably an alkyl group having 8 or less carbon atoms, and particularly preferably an alkyl group having 3 or less carbon atoms.

The alkyl group contained in the alkoxycarbonyl group is preferably the same group as the alkyl group of the above R ₂₁ , R ₂₂ and R ₂₃ .

The halogen atom may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and particularly preferably a fluorine atom.

Preferred substituents of the above respective groups include, for example, an alkyl group, a cycloalkyl group, an aryl group, an amine group, a decylamino group, a guanidino group, an amino urethane group, a hydroxyl group, a carboxyl group, a halogen atom, and an alkoxy group. The substituent, the thiol group, the fluorenyl group, the decyloxy group, the alkoxycarbonyl group, the cyano group, the nitro group and the like have a carbon number of preferably 8 or less.

Ar ₂ represents an (n+1)-valent aromatic ring group. When the n is 1, the divalent aromatic ring group may have a substituent. For example, the following groups may be mentioned as preferred examples: a carbon number of 6 to 18 such as a phenyl group, a methylphenyl group, a naphthyl group, and a fluorenyl group. Aryl group, or an aromatic ring group containing a heterocyclic ring such as thiophene, furan, pyrrole, benzothiophene, benzofuran, benzopyrrole, triazine, imidazole, benzimidazole, triazole, thiadiazole, thiazole .

A specific example of the (n+1)-valent aromatic ring group in the case where n is an integer of 2 or more is preferably exemplified by (n-1) removed from the above specific example of the divalent aromatic ring group. a group of arbitrary hydrogen atoms.

The (n+1)-valent aromatic ring group may have a more substituent.

The alkyl group of R ₃₀ in -CONR ₃₀ - (R ₃₀ represents a hydrogen atom or an alkyl group) represented by X ₂ may be the same as the alkyl group of R ₂₁ to R ₂₃ .

X _{2 is} preferably a single bond, -COO-, -CONH-, more preferably a single bond, -COO-.

The alkylene group of L ₂ is preferably a group having a carbon number of from 1 to 8 such as a methylene group which may have a substituent, an exoethyl group, a propyl group, a butyl group, a hexyl group, and a octyl group.

Ar _{2 is more} preferably an aromatic ring group having 6 to 18 carbon atoms which may have a substituent, and particularly preferably a benzene ring group, a naphthalene ring group or a biphenyl ring group.

The repeating unit preferably has a hydroxystyrene structure. That is, Ar _{2 is} preferably a benzene ring group.

Specific examples of the repeating unit represented by the general formula (A) are shown below, but the present invention is not limited to the specific examples. Where a represents 1 or 2.

[化80]

[化81]

The repeating unit represented by the formula (A) is preferably a repeating unit represented by the following formula (Ab1) or formula (Ab2). In one aspect of the invention, the formula (Ab1) is preferred.

In the formula (Ab2), R ₂₃ in the general formula (A) is of the same meaning as R _23.

The resin (Ab) may also contain two or more repeating units represented by the formula (A).

The resin (Ab) preferably contains a repeating unit represented by the following formula (Ab3) in one aspect.

[化83]

In the formula, n represents an integer of 1 to 5, and m represents an integer of 0 to 4 satisfying the relationship of 1 ≦ m + n ≦ 5 . n is preferably 1 or 2, more preferably 1. m is preferably 0 to 2, more preferably 0 or 1, and particularly preferably 0.

S ₁ represents a substituent. When m is 2 or more, a plurality of S _{1 's} may be the same or different from each other.

Examples of the substituent represented by S ₁ include an alkyl group, an alkoxy group, a decyl group, a decyloxy group, an aryl group, an aryloxy group, an aralkyl group, an aralkyloxy group, a hydroxyl group, a halogen atom, and a cyano group. Nitro, sulfonylamino, alkylthio, arylthio, aralkylthio.

For example, an alkyl group or a cycloalkyl group is preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, a cyclopentyl group, a hexyl group, a cyclohexyl group, or a octyl group. A linear or branched alkyl group having a carbon number of 1 to 20 such as a decyl group or a cycloalkyl group. These groups may have more substituents.

Examples of the substituent which may be further included are an alkyl group, an alkoxy group, a hydroxyl group, a halogen atom, a nitro group, a decyl group, a decyloxy group, a decylamino group, a sulfonylamino group, an alkylthio group, an arylthio group, A heterocyclic residue such as an aralkylthio group, a thiophenecarbonyloxy group, a thiophenemethylcarbonyloxy group or a pyrrolidone residue is preferably a substituent having a carbon number of 12 or less.

Examples of the alkyl group having a substituent include a cyclohexylethyl group and an alkylcarbonyloxy group. Methyl, alkylcarbonyloxyethyl, cycloalkylcarbonyloxymethyl, cycloalkylcarbonyloxyethyl, arylcarbonyloxyethyl, aralkylcarbonyloxyethyl, alkoxy Methyl, cycloalkoxymethyl, aryloxymethyl, aralkoxymethyl, alkoxyethyl, cycloalkoxyethyl, aryloxyethyl, aralkyloxyethyl, alkane Thiomethyl, cycloalkylthiomethyl, arylthiomethyl, aralkylthiomethyl, alkylthioethyl, cycloalkylthioethyl, arylthioethyl, aralkylthioethyl Wait.

The alkyl group or the cycloalkyl group in the groups is not particularly limited, and may have a substituent such as the above alkyl group, cycloalkyl group or alkoxy group.

Examples of the above alkylcarbonyloxyethyl group and cycloalkylcarbonyloxyethyl group include a cyclohexylcarbonyloxyethyl group, a tert-butylcyclohexylcarbonyloxyethyl group, and a n-butylcyclohexylcarbonyloxy group. Base.

The aryl group is not particularly limited, and examples thereof include a group having 6 to 14 carbon atoms such as a phenyl group, a xylyl group, a tolylmethyl group, a cumenyl group, a naphthyl group or a decyl group, and the alkyl group and the naphthene group may be further contained. a substituent such as a group or an alkoxy group.

Examples of the above aryloxyethyl group include a phenoxyethyl group and a cyclohexylphenoxyethyl group. These groups may have more substituents.

The aralkyl group is also not particularly limited, and examples thereof include a benzyl group and the like.

Examples of the above aralkylcarbonyloxyethyl group include a benzylcarbonyloxyethyl group and the like. These groups may have more substituents.

The repeating unit represented by the general formula (Ab3) may, for example, be the following repeating unit.

[化84]

With respect to achieving higher resolution, sensitivity, Post Exposure Bake (PEB) temperature dependence, dry etching resistance, and good pattern shape, the resin (Ab) is used. The content of the repeating unit represented by the formula (A) in the resin (Ab) (the total amount in the case of containing a plurality of repeating units) is preferably 10 mol% or more and 75 mol% or less, more preferably 15 mol. % or more and 70 mol% or less, and further preferably 20 mol% or more and 65 mol% or less.

The content of the repeating unit represented by the formula (Ab3) in the resin (Ab) is preferably from 0 mol% to 90 mol%, more preferably from 5 mol% to 80 mol%, based on all the repeating units in the resin (Ab). Preferably, it is 10 mol% to 70 mol%, and particularly preferably 20 mol% to 60 mol%.

In the resin (Ab), it is also preferred to contain a repeating unit represented by the following formula. In the following formula, j represents an integer of 0 to 3, preferably an integer of 0 to 2, more preferably Is 0 or 1.

The following specific examples are given to the repeating unit represented by these general formulas.

[化86]

The resin (Ab) preferably further contains a repeating unit having an acid-decomposable group.

Examples of the acid-decomposable group include a group protected by a group in which a hydrogen atom of an alkali-soluble group such as a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group or a thiol group is removed by the action of an acid.

Examples of the group which is detached by the action of an acid include -C(R ₃₆ )(R ₃₇ )(R ₃₈ ), -C(R ₃₆ )(R ₃₇ )(OR ₃₉ ), -C(=O)- OC(R ₃₆ )(R ₃₇ )(R ₃₈ ), -C(R ₀₁ )(R ₀₂ )(OR ₃₉ ), -C(R ₀₁ )(R ₀₂ )-C(=O)-OC(R ₃₆ ) (R ₃₇ ) (R ₃₈ ) and the like.

In the formula, R ₃₆ to R ₃₉ each independently represent an alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group or an alkenyl group. R ₃₆ and R ₃₇ may also be bonded to each other to form a ring.

R ₀₁ to R ₀₂ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group or an alkenyl group.

The resin (Ab) preferably contains at least one of the repeating units represented by the following formula (A1) and formula (A2) in one aspect.

In the general formula (A1), n represents an integer of 1 to 5, and m represents an integer of 0 to 4 satisfying the relationship of 1 ≦ m + n ≦ 5 .

S ₁ represents a substituent (excluding a hydrogen atom), and when m is 2 or more, a plurality of S _{1 's} may be the same or different from each other.

A ₁ represents a hydrogen atom or a group which is desorbed by the action of an acid. Among them, at least one A ₁ represents a group which is detached by the action of an acid. In the case of n≧2, the plurality of A ₁ may be identical to each other or different from each other.

In the formula (A2), X represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, a decyl group, a decyloxy group, a cycloalkyl group, a cycloalkyloxy group, an aryl group, Carboxy, alkoxycarbonyl, alkylcarbonyloxy or aralkyl.

T represents a single bond or a divalent linking group.

A ₂ represents a group which is detached by the action of an acid.

First, the repeating unit represented by the general formula (A1) will be described.

As described above, n represents an integer of 1 to 5, preferably 1 or 2, and particularly preferably 1.

As described above, m represents an integer of 0 to 4 satisfying the relationship of 1 ≦ m + n ≦ 5, preferably 0 to 2, more preferably 0 or 1, and particularly preferably 0.

As described above, S ₁ represents a substituent (except a hydrogen atom). The substituent may, for example, be the same as the substituent described above for S ₁ in the formula (Ab3).

As described above, A ₁ represents a hydrogen atom or a group which is desorbed by the action of an acid, and at least one of A ₁ is a group which is desorbed by the action of an acid.

Examples of the group which is detached by the action of an acid include a tertiary alkyl group such as a third butyl group and a third pentyl group, a third butoxycarbonyl group, a third butoxycarbonylmethyl group, and a formula -C ( L ₁ ) (L ₂ ) an acetal group represented by OZ ₂ .

Hereinafter, the acetal group represented by the formula -C(L ₁ )(L ₂ )-OZ ₂ will be described. In the formula, L ₁ and L ₂ each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group or an aralkyl group. Z ₂ represents an alkyl group, a cycloalkyl group or an aralkyl group. Further, Z ₂ and L ₁ may be bonded to each other to form a 5-membered ring or a 6-membered ring.

The alkyl group may be a linear alkyl group or a branched alkyl group.

The linear alkyl group is preferably a group having 1 to 30 carbon atoms, more preferably a group having 1 to 20 carbon atoms. Examples of such a linear alkyl group include methyl, ethyl, n-propyl, n-butyl, t-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, and壬基和正癸基.

The branched alkyl group is preferably a group having 3 to 30 carbon atoms, more preferably a group having 3 to 20 carbon atoms. Examples of such a branched alkyl group include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group, a third pentyl group, an isohexyl group, a third hexyl group, an isoheptyl group, a third heptyl group, and an isooctyl group. Base, third octyl, isodecyl and third sulfhydryl.

The alkyl groups may have more substituents. Examples of the substituent include a hydroxyl group; a halogen atom such as fluorine, chlorine, bromine or an iodine atom; a nitro group; a cyano group; a guanamine group; a sulfonylamino group; a methyl group, an ethyl group, a propyl group, an isopropyl group, and a positive group. Alkyl groups such as butyl, t-butyl, hexyl, 2-ethylhexyl, octyl and dodecyl; methoxy, ethoxy, hydroxyethoxy, propoxy, hydroxypropoxy and butyl Alkoxy group such as oxy group; alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbonyl group; fluorenyl group such as methyl ketone group, ethyl acetyl group and benzamidine group; oxime group such as ethoxy group and butyl oxy group Base; and carboxyl group.

The alkyl group is preferably an ethyl group, an isopropyl group, an isobutyl group, a cyclohexylethyl group, a phenylmethyl group or a phenylethyl group.

The cycloalkyl group may be a monocyclic type or a polycyclic type. In the latter case, the cycloalkyl group may also be bridged. That is, in this case, the cycloalkyl group may also have a bridge structure. Further, a part of the carbon atoms in the cycloalkyl group may be substituted with a hetero atom such as an oxygen atom.

The monocyclic cycloalkyl group is preferably a group having 3 to 8 carbon atoms. Examples of such a cycloalkyl group include a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, a cyclobutyl group, and a cyclooctyl group.

The polycyclic cycloalkyl group may, for example, be a group having a bicyclic, tricyclic or tetracyclic structure. The polycyclic cycloalkyl group is preferably a group having 6 to 20 carbon atoms. Examples of such a cycloalkyl group include adamantyl group, norbornyl group, isobornyl group, fluorenyl group, dicyclopentyl group, α-pinanyl group, tricyclodecyl group, tetracyclododecyl group. And male alkyl.

Examples of the aralkyl group of L ₁ , L ₂ and Z ₂ include a group having 7 to 15 carbon atoms such as a benzyl group and a phenethyl group.

The aralkyl groups may have more substituents. Preferred examples of the substituent include an alkoxy group, a hydroxyl group, a halogen atom, a nitro group, a decyl group, a decylamino group, a sulfonylamino group, an alkylthio group, an arylthio group and an aralkylthio group. Examples of the aralkyl group having a substituent include an alkoxybenzyl group, a hydroxybenzyl group, and a phenylthiophenethyl group. Further, the substituent which the aralkyl group may have has a carbon number of preferably 12 or less.

Examples of the 5-member or 6-membered ring in which Z ₂ and L ₁ are bonded to each other include a tetrahydropyran ring and a tetrahydrofuran ring. Among these, a tetrahydropyran ring is particularly preferred.

Z _{2 is} preferably a linear or branched alkyl group. Thereby, the effect of the present invention is more remarkable.

Specific examples of the repeating unit represented by the general formula (A1) are listed below, but are not limited to these specific examples.

[化88]

[化89]

Next, the repeating unit represented by the general formula (A2) will be described.

As described above, X represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, a decyl group, a decyloxy group, a cycloalkyl group, a cycloalkyloxy group, an aryl group, a carboxyl group, or an alkane. An oxycarbonyl group, an alkylcarbonyloxy group or an aralkyl group.

The alkyl group as X may have a substituent, and may be either a straight chain or a branched one. The linear alkyl group preferably has a carbon number of from 1 to 30, more preferably from 1 to 20, and examples thereof include a methyl group, an ethyl group, a n-propyl group, a n-butyl group, a second butyl group, a t-butyl group, and a n-pentyl group. Base, n-hexyl, n-heptyl, n-octyl, n-decyl, n-decyl and the like. The branched alkyl group preferably has a carbon number of 3 to 30, more preferably 3 to 20, and examples thereof include an isopropyl group, an isobutyl group, and a third group. A group, an isopentyl group, a third amyl group, an isohexyl group, a third hexyl group, an isoheptyl group, a third heptyl group, an isooctyl group, a third octyl group, an isodecyl group, a third fluorenyl group and the like.

The alkoxy group of X may have a substituent, and is, for example, the above alkoxy group having 1 to 8 carbon atoms, and examples thereof include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, and a hexyloxy group. , cyclohexyloxy and the like.

The halogen atom of X may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and is preferably a fluorine atom.

The fluorenyl group as X may have a substituent, and is, for example, a fluorenyl group having 2 to 8 carbon atoms, and specific examples thereof include a fluorenyl group, an ethyl fluorenyl group, a propyl fluorenyl group, a butyl fluorenyl group, a trimethyl ethane group, and a benzoic acid group.醯基等.

The decyloxy group of X may have a substituent, and is preferably a fluorenyloxy group having 2 to 8 carbon atoms, and examples thereof include an ethoxycarbonyl group, a propenyloxy group, a butyloxy group, a pentyloxy group, and a trimethyl group. Ethyl ethoxycarbonyl, hexyloxy, octyloxy, benzhydryloxy and the like.

The cycloalkyl group as X may have a substituent, and may be a monocyclic type, a polycyclic type, or a bridged type. For example, a cycloalkyl group may also have a bridge structure. The monocyclic type is preferably a cycloalkyl group having 3 to 8 carbon atoms, and examples thereof include a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, a cyclobutyl group, and a cyclooctyl group. The polycyclic type may be a group having a bicyclic, tricyclic or tetracyclic structure having a carbon number of 5 or more, and preferably a cycloalkyl group having 6 to 20 carbon atoms, and examples thereof include an adamantyl group, a norbornyl group, and a different Borne, fluorenyl, dicyclopentyl, α-fluorenyl, tricyclodecyl, tetracyclododecyl, androstalkyl. Further, a part of the carbon atoms in the cycloalkyl group may be substituted with a hetero atom such as an oxygen atom.

The aryl group as X may have a substituent, preferably a carbon number of 6 to 14, for example Phenyl, xylyl, tolylmethyl, cumenyl, naphthyl, anthracenyl, etc. are mentioned.

The alkoxycarbonyl group of X may have a substituent, and preferably has 2 to 8 carbon atoms, and examples thereof include a methoxycarbonyl group, an ethoxycarbonyl group, and a propoxycarbonyl group.

The alkylcarbonyloxy group of X may have a substituent, and preferably has 2 to 8 carbon atoms, and examples thereof include a methylcarbonyloxy group and an ethylcarbonyloxy group.

The aralkyl group as X may have a substituent, and is preferably an aralkyl group having 7 to 16 carbon atoms, and examples thereof include a benzyl group.

Examples of the substituent which may further be an alkyl group, an alkoxy group, a decyl group, a cycloalkyl group, an aryl group, an alkoxycarbonyl group, an alkylcarbonyloxy group or an aralkyl group of X include a hydroxyl group, a fluorine atom and a chlorine atom. , bromine atom, iodine atom, alkyl group, hydroxyl group, alkoxy group, halogen atom, cyano group, nitro group, mercapto group, decyloxy group, cycloalkyl group, aryl group, carboxyl group, alkoxycarbonyl group, alkylcarbonyloxy group Base or aralkyl group.

As described above, T represents a single bond or a divalent linking group.

The divalent linking group of T may, for example, be an alkyl group, a -COO-Rt- group or a -O-Rt- group. In the formula, Rt represents an alkylene group or a cycloalkyl group.

T is preferably a single bond or a -COO-Rt- group. Rt is preferably an alkylene group having 1 to 5 carbon atoms, more preferably a -CH ₂ - group or a -(CH ₂ ) ₃ - group.

As described above, A ₂ represents a group which is detached by the action of an acid. In other words, the repeating unit represented by the formula (A2) has a group represented by "-COOA ₂ " as an acid-decomposable group. A ₂ may, for example, be the same as the group described above for A ₁ in the formula (A1).

A _{2 is} preferably a hydrocarbon group (preferably having a carbon number of 20 or less, more preferably 4 to 12), more preferably a third butyl group, a third pentyl group or a hydrocarbon group having an alicyclic structure (for example, an alicyclic group itself and a fat group). a group in which a ring group is substituted with an alkyl group).

A _{2 is} preferably a tertiary alkyl group or a tertiary alkyl group.

The alicyclic structure may be a single ring or a polycyclic ring. Specific examples thereof include a monocyclic, bicyclic, tricyclic, and tetracyclic structure having a carbon number of 5 or more. The carbon number is preferably from 6 to 30, and particularly preferably from 7 to 25. The hydrocarbon group having such an alicyclic structure may have a substituent.

Examples of the alicyclic structure include an alicyclic structure (1) to an alicyclic structure (50) exemplified as the cycloalkyl group of Z _ka in the general formula (KA-1) in the above resin (Aa). Further, specific examples of the preferred alicyclic structure and specific examples of the substituent which the alicyclic structure may have may be the same as the specific examples described in the alicyclic structure of Z _ka in the general formula (KA-1). example of.

The acid-decomposable group having an alicyclic structure is preferably a group represented by the following formula (pI) to formula (pV).

[化90]

In the above formula (pI) to formula (pV), R ₁₁ represents a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group or a second butyl group, and Z represents a carbon atom. An atomic group necessary for forming an alicyclic hydrocarbon group.

R ₁₂ to R ₁₆ each independently represent a straight or branched alkyl group or an alicyclic hydrocarbon group having 1 to 4 carbon atoms, wherein at least one of R ₁₂ to R ₁₄ or any of R ₁₅ and R ₁₆ Represents an alicyclic hydrocarbon group.

R ₁₇ to R ₂₁ each independently represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms or an alicyclic hydrocarbon group, and at least one of R ₁₇ to R ₂₁ represents an alicyclic hydrocarbon group. Further, any of R ₁₉ and R ₂₁ represents a straight or branched alkyl group or an alicyclic hydrocarbon group having 1 to 4 carbon atoms.

R ₂₂ to R ₂₅ each independently represent a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, or an alicyclic hydrocarbon group, and at least one of R ₂₂ to R ₂₅ represents an alicyclic hydrocarbon group. Further, R ₂₃ and R ₂₄ may be bonded to each other to form a ring.

In the formula (pI) to the formula (pV), the alkyl group of R ₁₂ to R ₂₅ may be either substituted or unsubstituted, and represents a straight or branched alkyl group having 1 to 4 carbon atoms. . Examples of the alkyl group include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a second butyl group, and a third butyl group.

Further, examples of the further substituent of the alkyl group include an alkoxy group having 1 to 4 carbon atoms, a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom), a mercapto group, a decyloxy group, and a cyano group. , hydroxyl, carboxyl, alkoxycarbonyl, nitro, and the like.

The alicyclic hydrocarbon group of R ₁₁ to R _{25 or} the alicyclic hydrocarbon group formed by Z and a carbon atom may be exemplified as the group described above as the alicyclic structure.

In the embodiment, the repeating unit represented by the formula (A2) is preferably a repeating unit represented by the following formula.

Further, in another embodiment, the repeating unit represented by the formula (A2) is also preferably a repeating unit represented by the formula (A3) shown below.

In the formula (A3), AR represents an aryl group.

Rn represents an alkyl group, a cycloalkyl group or an aryl group. Rn and AR may also be bonded to each other to form a non-aromatic ring.

R represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.

The repeating unit represented by the general formula (A3) will be described in detail.

As described above, AR represents an aryl group. The aryl group of the AR is preferably a group having 6 to 20 carbon atoms such as a phenyl group, a naphthyl group, an anthracenyl group or a fluorenyl group, and more preferably a group having 6 to 15 carbon atoms.

In the case where AR is a naphthyl group, an anthracenyl group or a fluorenyl group, the bonding position of the carbon atom to which Rn is bonded to the AR is not particularly limited. For example, in the case where AR is a naphthyl group, the carbon atom may be bonded to the α-position of the naphthyl group or may be bonded to the β-position. Or in the case where AR is a sulfhydryl group, the carbon atom may be bonded to the 1 position of the sulfhydryl group, or may be bonded to the 2 position or may be bonded to the 9 position.

The aryl group as the AR may have one or more substituents. Specific examples of such a substituent include methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, hexyl, octyl and dodecyl groups. a linear or branched alkyl group having 1 to 20 carbon atoms, an alkoxy group containing the alkyl moiety, a cycloalkyl group such as a cyclopentyl group and a cyclohexyl group, a cycloalkoxy group containing the cycloalkyl moiety, and a hydroxyl group , halogen atom, aryl, cyano, nitro, fluorenyl, decyloxy, decylamino, sulfonylamino, alkylthio, arylthio, aralkylthio, thiophenecarbonyloxy, thiophene A heterocyclic residue such as a methylcarbonyloxy group or a pyrrolidone residue. The substituent is preferably a linear or branched alkyl group having 1 to 5 carbon atoms, an alkoxy group containing the alkyl group, and more preferably a p-methyl group or a p-methoxy group.

When the aryl group as the AR has a plurality of substituents, at least two of the plurality of substituents may be bonded to each other to form a ring. The ring is preferably a 5-member ring to an 8-member ring, more preferably a 5-member ring or a 6-member ring. Further, the ring may be a hetero ring containing a hetero atom such as an oxygen atom, a nitrogen atom or a sulfur atom in the ring member.

Further, the ring may have a substituent. The substituent may be the same as the group described below with respect to the substituent which Rn may have.

Further, from the viewpoint of the roughness performance, the repeating unit represented by the formula (A3) preferably contains two or more aromatic rings. The number of aromatic rings which the repeating unit has is usually preferably 5 or less, more preferably 3 or less.

Further, in the repeating unit represented by the general formula (A3), it is more preferable that the AR contains two or more aromatic rings from the viewpoint of the roughness performance, and further preferably, the AR is a naphthyl group or a biphenyl group. The number of aromatic rings which the AR has is usually preferably 5 or less, more preferably 3 or less.

As described above, Rn represents an alkyl group, a cycloalkyl group or an aryl group.

The alkyl group of Rn may be a linear alkyl group or a branched alkyl group. The alkyl group is preferably exemplified by methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, hexyl, cyclohexyl, octyl and dodecyl groups. A group having 1 to 20 carbon atoms. The alkyl group of Rn is preferably a group having 1 to 5 carbon atoms, more preferably a group having 1 to 3 carbon atoms.

Examples of the cycloalkyl group of Rn include a group having 3 to 15 carbon atoms such as a cyclopentyl group and a cyclohexyl group.

The aryl group of Rn is preferably a group having 6 to 14 carbon atoms such as a phenyl group, a xylyl group, a tolylmethyl group, a cumenyl group, a naphthyl group or a fluorenyl group.

The alkyl group, the cycloalkyl group and the aryl group as Rn may each have a substituent. Examples of the substituent include an alkoxy group, a hydroxyl group, a halogen atom, a nitro group, a decyl group, a decyloxy group, a decylamino group, a sulfonylamino group, a dialkylamino group, an alkylthio group, and an arylthio group. a heterocyclic residue such as an aralkylthio group, a thiophenecarbonyloxy group, a thiophenemethylcarbonyloxy group, and a pyrrolidone residue. Among them, an alkoxy group, a hydroxyl group, a halogen atom, a nitro group, a decyl group, a decyloxy group, a decylamino group, and a sulfonylamino group are particularly preferable.

As described above, R represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group.

The alkyl group and the cycloalkyl group of R may, for example, be the same groups as those described above for Rn. The alkyl group and the cycloalkyl group each may have a substituent. Examples of the substituent include the same groups as those described above for Rn.

In the case where R is an alkyl group or a cycloalkyl group having a substituent, preferred examples of R include a trifluoromethyl group, an alkoxycarbonylmethyl group, an alkylcarbonyloxymethyl group, and a hydroxy group. Methyl and alkoxymethyl.

The halogen atom of R may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. Among them, a fluorine atom is particularly preferred.

The alkyl moiety contained in the alkoxycarbonyl group of R can be exemplified by the above-mentioned alkyl group as R.

Rn and AR are preferably bonded to each other to form a non-aromatic ring, whereby the roughness performance can be further improved.

The non-aromatic ring formed by bonding Rn and AR to each other is preferably a 5-membered ring to an 8-membered ring, more preferably a 5-membered ring or a 6-membered ring.

The non-aromatic ring may be an aliphatic ring or a hetero ring containing a hetero atom such as an oxygen atom, a nitrogen atom or a sulfur atom as a ring member.

The non-aromatic ring may have a substituent. The substituent may, for example, be the same as the group described above with respect to the further substituent which Rn may have.

Specific examples of the monomer corresponding to the repeating unit represented by the general formula (A2) and specific examples of the repeating unit are listed below, but are not limited to the specific examples.

[化95]

[化96]

[化97]

Specific examples of the structure of the repeating unit represented by the general formula (A3) are listed below, but are not limited to these specific examples.

[化101]

Among them, the repeating unit shown below is more preferable.

The repeating unit represented by the general formula (A2) is in a form, preferably a A repeating unit of a third butyl acrylate or ethyl cyclopentyl methacrylate.

The monomer corresponding to the repeating unit represented by the formula (A2) can be synthesized by reacting (meth)acryloyl chloride with an alcohol in a solvent such as tetrahydrofuran (THF), acetone or dichloromethane. The compound is basic in triethylamine, pyridine, 1,8-diazabicyclo[5.4.0]undec-7-ene (1,8-Diazabicyclo[5.4.0]undec-7-ene, DBU) Esterification is carried out in the presence of a catalyst. Further, a commercially available product can also be used.

The resin (Ab) may further contain a repeating unit represented by the following formula (A5).

In the formula (A5), X represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, a decyl group, a decyloxy group, a cycloalkyl group, an aryl group, a carboxyl group, an alkoxycarbonyl group, The alkylcarbonyloxy group or the aralkyl group is the same as X in the formula (A2b).

A ₄ represents a hydrocarbon group which is not desorbed by the action of an acid.

The hydrocarbon group which is not decomposed by the action of the acid in the A ₄ of the formula (A5) is a hydrocarbon group other than the acid-decomposable group, and examples thereof include an alkyl group which is not desorbed by the action of an acid (preferably, a carbon number of 1 to 2). 15) A cycloalkyl group (preferably having a carbon number of 3 to 15) which is not desorbed by the action of an acid, or an aryl group which is not desorbed by the action of an acid (preferably, a carbon number of 6 to 15).

The hydrocarbon group of A _{4 which} is not desorbed by the action of an acid may be further substituted with a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or the like.

The resin (Ab) is also preferably further contained in the repeating unit represented by the formula (A6).

In the formula (A6), R ₂ represents a hydrogen atom, a methyl group, a cyano group, a halogen atom or a perfluoro group having 1 to 4 carbon atoms.

R ₃ represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, an aryl group, an alkoxy group or a fluorenyl group.

q represents an integer from 0 to 4.

Ar represents an aromatic ring of q+2 valence.

W represents a group or a hydrogen atom which is not decomposed by the action of an acid.

The aromatic ring represented by Ar is preferably a benzene ring, a naphthalene ring or an anthracene ring, and more preferably a benzene ring.

W is a group which is not decomposed by the action of an acid (also referred to as an acid-stable group), and examples thereof include a group other than the acid-decomposable group, and specific examples thereof include a halogen atom and an alkane. A group, a cycloalkyl group, an alkenyl group, an aryl group, a decyl group, an alkyl guanylamino group, an aryl decylamino group, an aryl decylamino group or the like. The acid stabilizing group is preferably a mercapto group or an alkyl mercaptoamine group, more preferably an anthracenyl group, an alkylcarbonyloxy group, an alkyloxy group, a cycloalkyloxy group or an aryloxy group.

In the acid stabilizing group of W, the alkyl group is preferably a methyl group, an ethyl group, a propyl group, a n-butyl group, a second butyl group or a t-butyl group having a carbon number of 1 to 4 groups, and a cycloalkyl group. Preferably, it is a cyclopropyl group, a cyclobutyl group, a cyclohexyl group or an adamantyl group having 3 to 10 carbon atoms, and the alkenyl group is preferably a vinyl group, a propenyl group, an allyl group or a butenyl group. The group having 2 to 4 carbon atoms, the alkenyl group is preferably a group having 2 to 4 carbon atoms such as a vinyl group, a propenyl group, an allyl group or a butenyl group, and the aryl group is preferably a phenyl group. A group having 6 to 14 carbon atoms such as xylyl, tolylmethyl, cumenyl, naphthyl or anthracenyl. W may be located at any position on the benzene ring, preferably in the meta or para position of the styrene skeleton, and more preferably in the para position.

Specific examples of the repeating unit represented by the formula (A6) are listed below, but are not limited to these specific examples.

[110]

[化112]

The resin (Ab) is also preferably a repeating unit containing a (meth)acrylic acid derivative which is not decomposed by the action of an acid. Specific examples are listed below, but are not limited thereto.

[化113]

In all the repeating units, the content of the repeating unit having an acid-decomposable group in the resin (Ab) is preferably from 5 mol% to 95 mol%, more preferably from 10 mol% to 60 mol%, still more preferably from 15 mol% to 50 mol%.

In all the repeating units, the content of the repeating unit represented by the formula (A1) in the resin (Ab) is preferably from 0 mol% to 90 mol%, more preferably from 10 mol% to 70 mol%, still more preferably from 20 mol% to 50 mol%. %.

In all the repeating units, the content of the repeating unit represented by the formula (A2) in the resin (Ab) is preferably from 0 mol% to 90 mol%, more preferably from 5 mol% to 75 mol%, still more preferably from 10 mol% to 60 mol%. %.

In all the repeating units, the content of the repeating unit represented by the formula (A3) in the resin (Ab) is preferably from 0 mol% to 90 mol%, more preferably from 5 mol% to 75 mol%, still more preferably from 10 mol% to 60 mol%. %.

In all the repeating units, the content of the repeating unit represented by the formula (A5) in the resin (Ab) is preferably from 0 mol% to 50 mol%, more preferably from 0 mol% to 40 mol%, particularly preferably from 0 mol% to 30 mol. %.

The resin (Ab) may further contain a repeating unit represented by the formula (A6), and is preferable from the viewpoint of improving the film quality and suppressing film thinning in the unexposed portion. The content of the repeating unit represented by the formula (A5) in all the repeating units is preferably from 0 mol% to 50 mol%, more preferably from 0 mol% to 40 mol%, still more preferably from 0 mol% to 30 mol%.

Further, in the resin (Ab), in order to maintain good developability to the alkaline developing solution, it is also possible to copolymerize an appropriate other polymerizable monomer so as to introduce an alkali-soluble group, for example, a phenolic hydroxyl group or a carboxyl group. In order to improve the film quality, other polymerizable monomers having a hydrophobicity such as an alkyl acrylate or an alkyl methacrylate may be copolymerized.

The monomer corresponding to the repeating unit represented by the formula (A2) can be synthesized by reacting (meth)acryloyl chloride with an alcohol compound in triethylamine in a solvent such as THF, acetone or dichloromethane. Esterification is carried out in the presence of an alkaline catalyst such as pyridine or DBU. Further, a commercially available product can also be used.

The monomer corresponding to the repeating unit represented by the formula (A1) can be synthesized by subjecting a hydroxy group-substituted styrene monomer to a vinyl ether compound to p-toluenesulfonic acid in a solvent such as THF or dichloromethane. Acidic catalyst such as p-toluenesulfonic acid pyridinium salt The acetalization is carried out in the presence of acetal; or the third butanoxycarbonyl (t-Boc) protection is carried out in the presence of a basic catalyst such as triethylamine, pyridine or DBU using tert-butyl dicarbonate. Further, a commercially available product can also be used.

The weight average molecular weight (Mw) of the resin (Ab) is preferably in the range of 1,000 to 200,000, respectively. It is preferably 200,000 or less in terms of the dissolution rate and sensitivity of the resin itself to the alkali. The degree of dispersion (Mw/Mn) is preferably from 1.0 to 3.0, more preferably from 1.0 to 2.5, and still more preferably from 1.0 to 2.0.

The weight average molecular weight (Mw) of the resin is preferably in the range of 1,000 to 200,000, more preferably in the range of 1,000 to 100,000, particularly preferably in the range of 1,000 to 50,000, and most preferably in the range of 1,000 to 25,000.

Here, the weight average molecular weight is defined by a polystyrene equivalent value of Gel Permeation Chromatography. Specifically, the weight average molecular weight (Mw) and the number average molecular weight (Mn) of the resin (Ab) can be obtained, for example, by using HLC-8120 (manufactured by Tosoh Corporation) and using TSK gel Multipore HXL- M (manufactured by Tosoh Corporation, 7.8 mm ID × 30.0 cm) was used as a column, and THF (tetrahydrofuran) was used as a solution.

(Ab) Various commercially available products can be used, and they can also be synthesized according to a usual method (for example, a radical polymerization or an anionic polymerization method). For example, a general synthesis method may be a method in which a monomer type and a starter are dissolved in a solvent and heated to carry out polymerization, and a monomer polymerization method is carried out in a heating solvent for 1 hour to 10 hours. The dropwise addition polymerization method of the solution of the initiator is preferably a dropping polymerization method. Examples of the reaction solvent include ethers such as tetrahydrofuran, 1,4-dioxane and diisopropyl ether, or methyl ethyl ketone and methyl group. Isobutyl ketone-like ketones, ethyl acetate-like ester solvents, guanamine solvents such as dimethylformamide and dimethylacetamide, and further propylene glycol monomethyl ether acetate (PGMEA (Propyleneglycol Monomethylether) Acetate), alias 1-methoxy-2-ethoxypropane), PGME (Propyleneglycol Monomethylether, alias 1-methoxy-2-propanol), cyclohexanone-like dissolution A solvent for the composition of the invention. More preferably, the polymerization is carried out by using the same solvent as that used in the photosensitive ray-sensitive or radiation-sensitive resin composition of the present invention. Thereby, generation of particles at the time of storage can be suppressed.

The resin (Ab) is preferably polymerized by a known anionic polymerization method or a radical polymerization method.

The anionic polymerization method is carried out by using an alkali metal or an organic alkali metal as a polymerization initiator, and anion polymerization is carried out in an organic solvent at a temperature of from -100 ° C to 90 ° C in an inert gas atmosphere such as nitrogen or argon. . Further, in the copolymerization, a block copolymer can be obtained by sequentially adding a monomer to the reaction system to carry out polymerization, and further, by adding a mixture of the respective monomers to the reaction system for polymerization, A random copolymer is obtained.

The alkali metal of the polymerization initiator may, for example, be lithium, sodium, potassium or rubidium. The organic alkali metal may be an alkylate, an allyl compound or an aryl compound of the above alkali metal, and specific examples thereof include ethyl lithium and Butyl lithium, second butyl lithium, tert-butyl lithium, ethyl sodium, biphenyl lithium, lithium naphthalene, triphenyl lithium, sodium naphthalene, sodium α-methylstyrene dianion, 1,1- Diphenylhexyllithium, 1,1-diphenyl-3-methylpentyllithium, and the like.

The radical polymerization method is carried out as follows: using azobisisobutyronitrile, azo a known radical polymerization initiator such as an azo compound such as bis-isovaleronitrile or an organic peroxide such as benzamidine peroxide, methyl ethyl ketone peroxide or cumene hydroperoxide, if necessary, 1- A known chain transfer agent such as dodecanethiol is subjected to radical polymerization in an organic solvent at a temperature of from 50 ° C to 200 ° C under an inert gas atmosphere such as nitrogen or argon.

Examples of the organic solvent include aliphatic hydrocarbons such as n-hexane and n-heptane, alicyclic hydrocarbons such as cyclohexane and cyclopentane, aromatic hydrocarbons such as benzene and toluene, and methyl ethyl ketone and cyclohexanone. Ketones, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, ethylene glycol monobutyl ether acetate, ethylene glycol monobutyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monoethyl ether, propylene glycol single a polyol derivative such as diethyl ether acetate or propylene glycol monoethyl ether; an ether such as diethyl ether, tetrahydrofuran or dioxane; an organic solvent used in usual anionic polymerization such as anisole or hexamethylphosphonium. It is used in the form of a single solvent or a mixture of two or more. More preferable solvents include propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, and cyclohexanone.

The radical initiator is preferably an azo initiator, and is preferably an azo initiator having an ester group, a cyano group or a carboxyl group. Preferred examples of the initiator include azobisisobutyronitrile, azobis-dimethylvaleronitrile, dimethyl 2,2'-azobis(2-methylpropionate), and the like. The concentration of the reaction is usually 5% by mass to 50% by mass, preferably 30% by mass to 50% by mass. The reaction temperature is usually from 10 ° C to 150 ° C, preferably from 30 ° C to 120 ° C, more preferably from 60 ° C to 100 ° C. The resin (Ab) having a degree of dispersion of 2.0 or less can be synthesized by radical polymerization using an azo polymerization initiator. A more preferred resin (Ab) having a degree of dispersion of 1.0 to 1.5 can be synthesized, for example, by living radical polymerization.

After completion of the reaction, the mixture was allowed to cool to room temperature and purified. For the purification, a usual method such as the following method: a liquid-liquid extraction method in which residual monomers or oligomer components are removed by washing with water or a suitable solvent, and a solution state such as ultrafiltration which is extracted by removing only a specific molecular weight or less is used. a purification method; or a reprecipitation method in which a resin is solidified in a poor solvent by dropping a resin solution into a poor solvent, thereby removing residual monomers or the like, or cleaning a resin slurry separated by filtration using a poor solvent A purification method or the like in a solid state. For example, a solvent (poor solvent) in which the resin is poorly soluble or insoluble is brought into contact with the resin in a volume of 10 times or less, preferably 10 times to 5 times the volume of the reaction solution, whereby the resin is solid. Forms are precipitated.

The solvent (precipitation or reprecipitation solvent) used in the precipitation or reprecipitation operation of the polymer solution may be a poor solvent of the polymer, and may be derived from a hydrocarbon, a halogenated hydrocarbon, a nitro compound, or an ether depending on the kind of the polymer. A ketone, an ester, a carbonate, an alcohol, a carboxylic acid, water, a mixed solvent containing these solvents, and the like are appropriately selected and used. Among these solvents, the precipitating or reprecipitation solvent is preferably a solvent containing at least an alcohol (particularly methanol or the like) or water.

The amount of the precipitating or reprecipitation solvent to be used may be appropriately selected in consideration of efficiency, productivity, etc., and is usually 100 parts by mass to 10,000 parts by mass, preferably 200 parts by mass to 2000 parts by mass, based on 100 parts by mass of the polymer solution. It is preferably 300 parts by mass to 1000 parts by mass.

The temperature at the time of precipitation or reprecipitation can be appropriately selected in consideration of efficiency or workability, and is usually about 0 ° C to 50 ° C, preferably near room temperature (for example, about 20 ° C to 35 ° C). The precipitation or reprecipitation operation is a conventional mixing vessel using a stirring tank, etc. A known method such as batch type or continuous type is carried out.

The precipitated or reprecipitated polymer is usually subjected to conventional solid-liquid separation such as filtration, centrifugation, and the like, and dried for use. Filtration is preferably carried out under pressure using a solvent resistant filter material. The drying is carried out at a temperature of from about 30 ° C to 100 ° C, preferably from about 30 ° C to 50 ° C under normal pressure or reduced pressure (preferably under reduced pressure).

Further, the resin may be temporarily precipitated and separated, and then dissolved again in a solvent to be in contact with a solvent in which the resin is poorly soluble or insoluble. That is, it may be a method comprising the steps of: after the completion of the radical polymerization reaction, contacting a solvent in which the polymer is poorly soluble or insoluble with the polymer to precipitate a resin (step a); separating the resin from the solution (Step b); re-dissolving in a solvent to prepare a resin solution A (step c); thereafter, making the resin insoluble or insoluble solvent less than 10 times the volume of the resin solution A (preferably 5 times or less) The volume of the resin is contacted with the resin solution A, thereby precipitating the resin solid (step d); and separating the precipitated resin (step e).

Further, when the positive resist of the present invention is exposed by an ArF excimer laser, from the viewpoint of transparency to an ArF excimer laser, it is preferred to use a resin having no aromatic ring as a resin (Ab ). For the resin (Ab) suitable for the ArF excimer laser exposure, for example, the resin (A') described in paragraphs 0446 to 0477 of JP-A-2013-15590 can be used.

The resin (Ab) may be used in combination of two or more kinds.

The amount of the resin (Ab) to be added is usually 10% by mass to 99% by mass, preferably 20% by mass to 99% by mass, and particularly preferably 30% by mass based on the total solid content of the composition of the present invention. %~99% by mass.

Hereinafter, specific examples of the resin (Ab) are shown below, but are not limited to these specific examples.

[化115]

[116]

[化118]

[化119]

[化121]

[化122]

[化123]

[化124]

[化125]

[化127]

[化128]

[化129]

[化130]

[化131]

[化132]

[化133]

[化134]

When the resin (Ab) does not contain the repeating unit (B) which generates an acid, the content of the repeating unit containing a fluorine atom is preferably 1 mol% or less, and more preferably no fluorine atom. In the case where the resin (Ab) contains the repeating unit (B), it is further preferred The content of the repeating unit other than the complex unit (B) and containing a fluorine atom is 1 mol% or less, and most preferably no fluorine atom.

[3] Compounds which generate acid by irradiation with actinic rays or radiation

The composition of the present invention contains a compound which generates an acid by irradiation with actinic rays or radiation (hereinafter also referred to as "acid generator").

The acid generator is not particularly limited as long as it is known, and it is preferred to generate an organic acid such as sulfonic acid, bis(alkylsulfonyl) ruthenium or tri(alkane) by irradiation with actinic rays or radiation. A compound of at least one of a sulfonyl group) methide.

More preferably, it is a compound represented by the following general formula (ZI), general formula (ZII), and general formula (ZIII).

In the above formula (ZI), R ₂₀₁ , R ₂₀₂ and R ₂₀₃ each independently represent an organic group.

The organic group as R ₂₀₁ , R ₂₀₂ and R ₂₀₃ has a carbon number of usually 1 to 30, preferably 1 to 20.

Further, two of R ₂₀₁ to R ₂₀₃ may be bonded to form a ring structure, and may contain an oxygen atom, a sulfur atom, an ester bond, a guanamine bond or a carbonyl group in the ring. The group formed by bonding two of R ₂₀₁ to R ₂₀₃ may, for example, be an alkyl group (e.g., a butyl group or a pentyl group).

Z ^- represents a non-nucleophilic anion (an anion having a significantly lower ability to cause a nucleophilic reaction).

Examples of the non-nucleophilic anion include a sulfonate anion (an aliphatic sulfonate anion, an aromatic sulfonate anion, a camphor sulfonate anion, etc.), a carboxylate anion (an aliphatic carboxylate anion, an aromatic carboxylate anion, and an aralkyl group). a carboxylate anion or the like), a sulfonyl quinone imine anion, a bis(alkylsulfonyl) quinone imine anion, a tris(alkylsulfonyl) methide anion, and the like.

The aliphatic moiety in the aliphatic sulfonate anion and the aliphatic carboxylate anion may be an alkyl group or a cycloalkyl group, preferably a linear or branched alkyl group having 1 to 30 carbon atoms and a carbon number of 3 to 30. Cycloalkyl.

The aromatic group in the aromatic sulfonate anion and the aromatic carboxylate anion is preferably an aryl group having 6 to 14 carbon atoms, for example, a phenyl group, a tolyl group or a naphthyl group.

The alkyl group, the cycloalkyl group and the aryl group exemplified above may have a substituent. Specific examples thereof include a halogen atom such as a nitro group or a fluorine atom, a carboxyl group, a hydroxyl group, an amine group, a cyano group, an alkoxy group (preferably having a carbon number of 1 to 15), and a cycloalkyl group (preferably a carbon number of 3~). 15) an aryl group (preferably having a carbon number of 6 to 14), an alkoxycarbonyl group (preferably having a carbon number of 2 to 7), a mercapto group (preferably having a carbon number of 2 to 12), and an alkoxycarbonyloxy group. (preferably having a carbon number of 2 to 7), an alkylthio group (preferably having a carbon number of 1 to 15), an alkylsulfonyl group (preferably having a carbon number of 1 to 15), and an alkylimidosulfonyl group ( Preferably, the carbon number is 2 to 15), the aryloxysulfonyl group (preferably having a carbon number of 6 to 20), the alkylaryloxysulfonyl group (preferably having a carbon number of 7 to 20), and a cycloalkyl group. Oxysulfonyl (preferably from 10 to 20 carbon atoms), alkyloxyalkyloxy group (preferably carbon number) 5 to 20), a cycloalkylalkyloxyalkyloxy group (preferably having a carbon number of 8 to 20), and the like. Further, as the aryl group and the ring structure of each group, an alkyl group (preferably having a carbon number of 1 to 15) may be mentioned as a substituent.

The aralkyl group in the aralkylcarboxylate anion is preferably an aralkyl group having 7 to 12 carbon atoms, such as a benzyl group, a phenethyl group, a naphthylmethyl group, a naphthylethyl group or a naphthylbutyl group.

Examples of the sulfonyl quinone imine anion include a saccharin anion.

The alkyl group in the bis(alkylsulfonyl)phosphonium anion and the tris(alkylsulfonyl)methide anion is preferably an alkyl group having 1 to 5 carbon atoms. The substituent of the alkyl group may, for example, be a halogen atom, an alkyl group substituted with a halogen atom, an alkoxy group, an alkylthio group, an alkoxysulfonyl group, an aryloxysulfonyl group or a cycloalkylaryloxysulfonate. The group or the like is preferably a fluorine atom or an alkyl group substituted by a fluorine atom.

Further, the alkyl groups in the bis(alkylsulfonyl) quinone imine anion may be bonded to each other to form a ring structure. Thereby, the acid strength increases.

Examples of the other non-nucleophilic anion include phosphorus fluoride (for example, PF ₆ ^- ), boron fluoride (for example, BF ₄ ^- ), and cesium fluoride (for example, SbF ₆ ^- ).

The non-nucleophilic anion is preferably an aliphatic sulfonate anion having at least the α position of the sulfonic acid substituted by a fluorine atom, an aromatic sulfonate anion substituted with a fluorine atom or a fluorine atom-containing group, and an alkyl group substituted by a fluorine atom. A bis(alkylsulfonyl) quinone imine anion, a tris(alkylsulfonyl) methide anion having an alkyl group substituted with a fluorine atom. The non-nucleophilic anion is more preferably a perfluoroaliphatic sulfonate anion (and thus preferably has a carbon number of 4 to 8), The fluorine atom-containing benzenesulfonate anion is more preferably a nonafluorobutanesulfonate anion, a perfluorooctanesulfonate anion, a pentafluorobenzenesulfonate anion or a 3,5-bis(trifluoromethyl)benzenesulfonate anion.

From the viewpoint of acid strength, in order to improve the sensitivity, it is preferred that the pKa of the generated acid is -1 or less.

Further, the non-nucleophilic anion may be an anion represented by the following general formula (AN1) as a preferred embodiment.

In the formula, Xf each independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom.

R ¹ and R ² each independently represent a hydrogen atom, a fluorine atom or an alkyl group, and when there are a plurality of cases, R ¹ and R ² may be the same or different.

L represents a divalent linking group, and when there are a plurality of L, the L may be the same or different.

A represents a cyclic organic group.

x represents an integer from 1 to 20, y represents an integer from 0 to 10, and z represents an integer from 0 to 10.

The general formula (AN1) will be described in more detail.

The alkyl group in the alkyl group substituted by the fluorine atom of Xf is preferably a carbon number of 1 to 10, more preferably a carbon number of 1 to 4. Further, the alkyl group substituted with a fluorine atom of Xf is preferably a perfluoroalkyl group.

Xf is preferably a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms. Specific examples of Xf include a fluorine atom, CF ₃ , C ₂ F ₅ , C ₃ F ₇ , C ₄ F ₉ , CH ₂ CF ₃ , CH ₂ CH ₂ CF ₃ , CH ₂ C ₂ F ₅ , CH ₂ CH ₂ C ₂ F ₅ , CH ₂ C ₃ F ₇ , CH ₂ CH ₂ C ₃ F ₇ , CH ₂ C ₄ F ₉ , CH ₂ CH ₂ C ₄ F ₉ , of which a fluorine atom or CF _{3 is} preferred. It is especially preferred that the two Xf are fluorine atoms.

The alkyl group of R ¹ and R ² may have a substituent (preferably a fluorine atom), and is preferably a group having 1 to 4 carbon atoms. More preferably, it is a perfluoroalkyl group having 1 to 4 carbon atoms. Specific examples of the alkyl group having a substituent of R ¹ and R ² include CF ₃ , C ₂ F ₅ , C ₃ F ₇ , C ₄ F ₉ , C ₅ F ₁₁ , C ₆ F ₁₃ , and C ₇ F _{15 .} , C ₈ F ₁₇ , CH ₂ CF ₃ , CH ₂ CH ₂ CF ₃ , CH ₂ C ₂ F ₅ , CH ₂ CH ₂ C ₂ F ₅ , CH ₂ C ₃ F ₇ , CH ₂ CH ₂ C ₃ F ₇ , CH ₂ C ₄ F ₉ , CH ₂ CH ₂ C ₄ F ₉ , wherein CF _{3 is} preferred.

R ¹ and R ^{2 are} preferably a fluorine atom or CF ₃ .

x is preferably from 1 to 10, more preferably from 1 to 5.

y is preferably 0 to 4, more preferably 0.

z is preferably 0 to 5, more preferably 0 to 3.

The divalent linking group of L is not particularly limited, and examples thereof include: -COO-, -OCO-, -CO-, -O-, -S-, -SO-, -SO ₂ -, alkylene, cycloalkane The base group, the alkenyl group or the linking group obtained by linking these plurality of groups are preferably a linking group having a total carbon number of 12 or less. Among them, preferred are -COO-, -OCO-, -CO-, -O-, and more preferably -COO-, -OCO-.

The cyclic organic group of A is not particularly limited as long as it has a cyclic structure, and examples thereof include an alicyclic group, an aryl group, and a heterocyclic group (including not only aromatics but also aromatic ones).

The alicyclic group may be a single ring or a polycyclic ring, preferably a monocyclic cycloalkyl group such as a cyclopentyl group, a cyclohexyl group or a cyclooctyl group, a norbornyl group, a tricyclic fluorenyl group, a tetracyclic fluorenyl group or a tetracyclic ring. A polycyclic cycloalkyl group such as dodecyl or adamantyl. Among them, from the viewpoint of suppressing the diffusibility in the film in the post-exposure heating step and improving the Mask Error Enhancement-Factor (MEEF), it is preferably a norborne base, a tricyclic fluorenyl group, or a tetracyclic ring. An alicyclic group having a large volume structure having a carbon number of 7 or more, such as a mercapto group, a tetracyclododecyl group or an adamantyl group.

Examples of the aryl group include a benzene ring, a naphthalene ring, a phenanthrene ring, and an anthracene ring.

The heterocyclic group may, for example, be a group derived from a furan ring, a thiophene ring, a benzofuran ring, a benzothiophene ring, a dibenzofuran ring, a dibenzothiophene ring or a pyridine ring. Among them, a group derived from a furan ring, a thiophene ring or a pyridine ring is preferred.

In addition, the cyclic organic group may be a lactone structure, and a lactone structure represented by the general formula (LC1-1) to the general formula (LC1-17) which the resin (P) may have may be mentioned.

The cyclic organic group may have a substituent, and examples of the substituent include an alkyl group (which may be linear, branched or cyclic, preferably having a carbon number of 1 to 12) and a cycloalkyl group (which may be a single Any of a ring, a polycyclic ring, and a spiro ring, preferably having a carbon number of 3 to 20), an aryl group (preferably having a carbon number of 6 to 14), a hydroxyl group, an alkoxy group, an ester group, a decylamino group, or an aminocarboxylic acid. Ethyl ester group, urea group, thioether group, sulfonamide group, sulfonate group, and the like. Further, the carbon constituting the cyclic organic group (carbon which contributes to the formation of a ring) may also be a carbonyl carbon.

The organic group of R ₂₀₁ , R ₂₀₂ and R ₂₀₃ may, for example, be an aryl group, an alkyl group or a cycloalkyl group.

Of R ₂₀₁ , R ₂₀₂ and R ₂₀₃ , preferably at least one is an aryl group, and more preferably all three are aryl groups. The aryl group may be a heteroaryl group such as an anthracene residue or a pyrrole residue, in addition to a phenyl group or a naphthyl group. The alkyl group and the cycloalkyl group of R ₂₀₁ to R ₂₀₃ are preferably a linear or branched alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms. More preferably, the alkyl group may be a methyl group, an ethyl group, a n-propyl group, an isopropyl group or an n-butyl group. More preferably, the cycloalkyl group may be a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group or a cycloheptyl group. These groups may have more substituents. Examples of the substituent include a halogen atom such as a nitro group or a fluorine atom, a carboxyl group, a hydroxyl group, an amine group, a cyano group, an alkoxy group (preferably having a carbon number of 1 to 15), and a cycloalkyl group (preferably having a carbon number of 3~). 15) an aryl group (preferably having a carbon number of 6 to 14), an alkoxycarbonyl group (preferably having a carbon number of 2 to 7), a mercapto group (preferably having a carbon number of 2 to 12), and an alkoxycarbonyloxy group. (preferably, carbon number 2 to 7), etc., but it is not limited to these groups.

In the case where two of R ₂₀₁ to R ₂₀₃ are bonded to form a ring structure, the structure represented by the following formula (A1) is preferred.

In the formula (A1), R ^1a to R ^13a each independently represent a hydrogen atom or a substituent.

In R ^1a to R ^13a , preferably one to three are not hydrogen atoms, and more preferably any of R ^9a to R ^13a is not a hydrogen atom.

Za is a single bond or a divalent linking group.

X ^- is the same as Z ^- in the formula (ZI).

Specific examples of the case where R ^1a to R ^{13a are} not a hydrogen atom include the following groups: a halogen atom, a linear or branched or cyclic alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, and a cyanogen. Base, nitro, carboxyl, alkoxy, aryloxy, decyloxy, heterocyclic oxy, decyloxy, amine methoxycarbonyl, alkoxycarbonyloxy, aryloxycarbonyloxy, amine Base (including anilino), ammonium, mercaptoamine, aminocarbonylamino, alkoxycarbonylamino, aryloxycarbonylamino, aminesulfonylamino, alkylsulfonylamino and Arylsulfonylamino, fluorenyl, alkylthio, arylthio, heterocyclic thio, sulfonyl, sulfo, alkylsulfinyl and arylsulfinyl, alkylsulfonyl And arylsulfonyl, fluorenyl, aryloxycarbonyl, alkoxycarbonyl, aminemethanyl, arylazo and heterocyclic azo, fluorenylene, phosphino, phosphinyl, oxygen Phosphonooxy, phosphinylamino, phosphono, decyl, decyl, ureido, boronic acid (-B(OH) ₂ ), phosphate (-OPO(OH) ₂ ), sulfuric acid Root (-OSO ₃ H), other well-known substituents.

When R ^1a to R ^{13a are} not a hydrogen atom, a linear, branched or cyclic alkyl group substituted with a hydroxyl group is preferred.

The divalent linking group of Za may, for example, be an alkyl group, an aryl group, a carbonyl group, a sulfonyl group, a carbonyloxy group, a carbonylamino group, a sulfonylamino group, an ether bond, a thioether bond, an amine group, or a disulfide group. Ether group, -(CH ₂ ) _n -CO-, -(CH ₂ ) _n -SO ₂ -, -CH=CH-, aminocarbonylamino group, aminosulfonylamino group, etc. (n is 1 to 3) Integer).

Further, a preferred structure of the case where at least one of R ₂₀₁ , R ₂₀₂ and R ₂₀₃ is not an aryl group is exemplified by paragraph 0046, paragraph 0047, paragraph 0048 of Japanese Patent Laid-Open Publication No. 2004-233661, Japanese Patent Laid-Open No. 2003 - PCT Patent Application Publication No. 2003/0077540A1 In the specification, a cationic structure such as a compound exemplified by the formula (IA-1) to the formula (IA-54) and the formula (IB-1) to the formula (IB-24) is used.

General formula (ZII), general formula _{(ZIII), R 204 ~ R} 207 each independently represent an aryl, alkyl or cycloalkyl.

R ₂₀₄ ~ R ₂₀₇ is aryl, alkyl, cycloalkyl and Examples of the compound R (ZI) in ₂₀₁ ~ R ₂₀₃ is an aryl group, an alkyl group, a cycloalkyl group described aryl, alkyl, cycloalkyl The same base.

The aryl group, the alkyl group or the cycloalkyl group of R ₂₀₄ to R ₂₀₇ may have a substituent. The substituent may also be a group which the aryl group, the alkyl group or the cycloalkyl group of R ₂₀₁ to R ₂₀₃ in the above compound (ZI) may have.

Z ^- represents a non-nucleophilic anion, and is the same as the non-nucleophilic anion of Z ^- in the general formula (ZI).

Further, the acid generator may be exemplified by the following general formula (ZIV), general formula (ZV), A compound represented by the formula (ZVI).

In the general formula (ZIV) to the general formula (ZVI), Ar ₃ and Ar ₄ each independently represent an aryl group.

R ₂₀₈ , R ₂₀₉ and R ₂₁₀ each independently represent an alkyl group, a cycloalkyl group or an aryl group.

A represents an alkyl group, an alkenyl group or an aryl group.

Specific examples of the aryl group of Ar ₃ , Ar ₄ , R ₂₀₈ , R ₂₀₉ and R ₂₁₀ include the same groups as the specific examples of the aryl group of R ₂₀₁ , R ₂₀₂ and R ₂₀₃ in the above formula (ZI). .

Specific examples of the alkyl group and the cycloalkyl group of R ₂₀₈ , R ₂₀₉ and R ₂₁₀ are the same as the specific examples of the alkyl group and the cycloalkyl group as R ₂₀₁ , R ₂₀₂ and R ₂₀₃ in the above formula (ZI). Group.

The alkylene group of A may, for example, be an alkylene group having 1 to 12 carbon atoms (e.g., methylene, ethyl, propyl, isopropyl, butyl, isobutyl, etc.), The base may be an alkenyl group having 2 to 12 carbon atoms (e.g., a vinyl group, a propenyl group, a butenyl group, etc.), and the aryl group of A may be a aryl group having a carbon number of 6 to 10 (e.g., a phenyl group). , methyl phenyl, naphthyl, etc.).

A preferred example of the acid generator is listed below.

[化140]

[化141]

[化142]

[化143]

[化145]

[化146]

[化147]

The acid generators may be used alone or in combination of two or more.

Further, the content of the photoacid generator is preferably from 0.1% by mass to 50% by mass, more preferably from 0.5% by mass to 45% by mass, even more preferably from 1% by mass to 40% by mass based on the total solid content of the composition. %.

[4] Compounds that decompose due to the action of acid to produce acid

The sensitizing ray-sensitive or radiation-sensitive composition of the present invention may further contain one or two or more compounds which are decomposed by an action of an acid to generate an acid (hereinafter also referred to as an acid multiplying agent). The acid produced by the acid multiplier is preferably a sulfonic acid, a methamic acid or a liminium acid. The content of the acid multiplying agent is preferably from 0.1% by mass to 50% by mass, more preferably from 0.5% by mass to 30% by mass, even more preferably from 1.0% by mass to 20% by mass based on the total solid content of the composition.

The ratio of the acid proliferator to the acid generator (the solid content of the acid multiplier based on the total solid content of the composition / the solid content of the acid generator based on the total solid content in the composition) There is no particular limitation, and it is preferably 0.01 to 50, more preferably 0.1 to 20, and particularly preferably 0.2 to 1.0.

Examples of the compounds which can be used in the present invention are shown below, but are not limited to these examples.

[5] Solvent

The solvent which can be used in the preparation of the composition of the present invention is not particularly limited as long as the components are dissolved, and examples thereof include an alkylene glycol monoalkyl ether carboxylate (propylene glycol monomethyl ether acetate (PGMEA; alias 1 - Methoxy-2-ethenyloxypropane), alkanediol monoalkyl ether (propylene glycol monomethyl ether (PGME; 1-methoxy-2-propanol), etc.), alkyl lactate (lactic acid) Ethyl ester, methyl lactate, etc.), cyclic lactone (γ-butyrolactone, etc., preferably 4 to 10 carbon atoms), chain or cyclic ketone (2-heptanone, cyclohexanone, etc.) Preferably, the carbon number is 4 to 10), alkyl carbonate (ethyl carbonate, propylene carbonate, etc.), alkyl carboxylate (preferably alkyl acetate such as butyl acetate), alkoxyacetic acid An alkyl ester (ethyl ethoxypropionate) or the like. Other solvents which can be used include, for example, the solvent described in [0244] of the specification of U.S. Patent Application Publication No. 2008/0248425 A1.

Among the above, an alkanediol monoalkyl ether carboxylate and an alkanediol monoalkyl ether are preferred.

These solvents may be used alone or in combination of two or more. In the case of mixing two or more kinds, it is preferred to mix a solvent having a hydroxyl group with a solvent having no hydroxyl group. The mass ratio of the solvent having a hydroxyl group to the solvent having no hydroxyl group is from 1/99 to 99/1, preferably from 10/90 to 90/10, and more preferably from 20/80 to 60/40.

The solvent having a hydroxyl group is preferably an alkanediol monoalkyl ether, and the solvent having no hydroxyl group is preferably an alkanediol monoalkyl ether carboxylate.

[6] Basic compounds

The photosensitive ray-sensitive or radiation-sensitive resin composition of the present invention may further contain a basic compound. The basic compound is preferably a compound which is more basic than phenol. In addition, The basic compound is preferably an organic basic compound, more preferably a nitrogen-containing basic compound.

The nitrogen-containing basic compound which can be used is not particularly limited, and for example, compounds classified as the following (1) to (7) can be used.

(1) a compound represented by the general formula (BS-1)

In the general formula (BS-1), R independently represents a hydrogen atom or an organic group. Among them, at least one of the three R is an organic group. The organic group is a linear or branched alkyl group, a monocyclic or polycyclic cycloalkyl group, an aryl group or an aralkyl group.

The carbon number of the alkyl group as R is not particularly limited, but is usually 1 to 20, preferably 1 to 12.

The number of carbon atoms of the cycloalkyl group as R is not particularly limited, and is usually from 3 to 20, preferably from 5 to 15.

The carbon number of the aryl group as R is not particularly limited, but is usually 6 to 20, preferably 6 to 10. Specific examples thereof include a phenyl group and a naphthyl group.

The carbon number of the aralkyl group as R is not particularly limited, but is usually 7 to 20, preferably 7 to 11. Specific examples thereof include a benzyl group and the like.

As the alkyl group, the cycloalkyl group, the aryl group and the aralkyl group of R, a hydrogen atom can pass through Substituted by a substituent. Examples of the substituent include an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, a hydroxyl group, a carboxyl group, an alkoxy group, an aryloxy group, an alkylcarbonyloxy group, and an alkoxycarbonyl group.

Further, among the compounds represented by the formula (BS-1), at least two of R are preferably an organic group.

Specific examples of the compound represented by the formula (BS-1) include tri-n-butylamine, tri-n-pentylamine, tri-n-octylamine, tri-n-decylamine, triisodecylamine, dicyclohexylmethylamine, and ten. Tetraalkylamine, pentadecylamine, hexadecylamine, octadecylamine, diamine, methyloctadecylamine, dimethylundecylamine, N,N-dimethyl Dodecylamine, methyl di-octadecylamine, N,N-dibutylaniline, N,N-dihexylaniline, 2,6-diisopropylaniline and 2,4,6- Tris(t-butyl)aniline.

Further, preferred examples of the basic compound represented by the formula (BS-1) include at least one compound wherein R is a hydroxyl group-substituted alkyl group. Specific examples thereof include triethanolamine and N,N-dihydroxyethylaniline.

Further, the alkyl group as R may have an oxygen atom in the alkyl chain. That is, an oxygen-extended alkyl chain can also be formed. The oxygen alkyl chain is preferably -CH ₂ CH ₂ O-. Specific examples thereof include tris(methoxyethoxyethyl)amine and the compounds exemplified in the third row and the 60th column of the specification of US Pat. No. 6,401,012.

The basic compound represented by the formula (BS-1) is exemplified by the following compounds.

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(2) Compounds having a nitrogen-containing heterocyclic structure

The nitrogen-containing heterocyclic ring may have aromaticity or may not be aromatic. In addition, it may have a plurality of nitrogen atoms. Further, it may contain a hetero atom other than nitrogen. Specific examples thereof include a compound having an imidazole structure (2-phenylbenzimidazole, 2,4,5-triphenylimidazole, etc.), a compound having a piperidine structure [N-hydroxyethylpiperidine, and Bis(1,2,2,6,6-pentamethyl-4-piperidinyl) phthalate, a compound having a pyridine structure (4-dimethylaminopyridine, etc.), and having an anthracene Combination of antipyrine structures (antipyrine and hydroxyantipyrine, etc.).

Further, a compound having two or more ring structures can also be preferably used. Specific examples thereof include 1,5-diazabicyclo[4.3.0]non-5-ene and 1,8-diazabicyclo[5.4.0]-undec-7-ene.

(3) Amine compounds having a phenoxy group

The amine compound having a phenoxy group means a compound having a phenoxy group at the terminal opposite to the N atom of the alkyl group contained in the amine compound. The phenoxy group may have, for example, an alkyl group, an alkoxy group, a halogen atom, a cyano group, a nitro group, a carboxyl group, a carboxylate group, a sulfonate group, an aryl group, an aralkyl group, a decyloxy group, and an aryloxy group. base.

More preferably, the compound has at least one oxygen alkyl chain between the phenoxy group and the nitrogen atom. The number of oxygen-extended alkyl chains in one molecule is preferably from 3 to 9, more preferably from 4 to 6. In the oxygen alkyl chain, it is particularly preferably -CH ₂ CH ₂ O-.

Specific examples include 2-[2-{2-(2,2-dimethoxy-phenoxyethoxy)ethyl}-bis-(2-methoxyethyl)]-amine and US2007 Compound (C1-1) to compound (C3-3) exemplified in paragraph [0066] of the specification 02724539A1.

The amine compound having a phenoxy group is obtained, for example, by heating a primary or secondary amine having a phenoxy group and a halogenated alkyl ether to react, and adding sodium hydroxide, potassium hydroxide, tetraalkylammonium, or the like. After the aqueous solution of the strong base is extracted, it is extracted with an organic solvent such as ethyl acetate or chloroform. Further, an amine compound having a phenoxy group can also be obtained by heating a primary or secondary amine with a halogenated alkyl ether having a phenoxy group at the terminal, and adding sodium hydroxide, potassium hydroxide and tetra After an aqueous solution of a strong base such as an alkylammonium is extracted with an organic solvent such as ethyl acetate or chloroform.

(4) ammonium salt

As the basic compound, an ammonium salt can also be suitably used. Examples of the anion of the ammonium salt include a halide, a sulfonate, a borate, and a phosphate. Among these, halides and sulfonates are particularly preferred.

Halides are particularly preferred as chlorides, bromides and iodides.

The sulfonate is particularly preferably an organic sulfonate having 1 to 20 carbon atoms. Examples of the organic sulfonate include an alkylsulfonate having 1 to 20 carbon atoms and an arylsulfonate.

The alkyl group contained in the alkyl sulfonate may have a substituent. Examples of the substituent include a fluorine atom, a chlorine atom, a bromine atom, an alkoxy group, a fluorenyl group, and an aryl group. Specific examples of the alkyl sulfonate include mesylate, ethanesulfonate, butanesulfonate, hexanosulfonate, octanesulfonate, benzylsulfonate, trifluoromethanesulfonate, and pentafluoroethane. Sulfonate and nonafluorobutanesulfonate.

Examples of the aryl group contained in the arylsulfonate include a phenyl group, a naphthyl group, and an anthracenyl group. The aryl groups may have a substituent. The substituent is preferably, for example, a linear or branched alkyl group having 1 to 6 carbon atoms and a cycloalkyl group having 3 to 6 carbon atoms. Specifically, for example, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, an isobutyl group, a t-butyl group, a n-hexyl group, and a cyclohexyl group are preferable. Examples of the other substituent include an alkoxy group having 1 to 6 carbon atoms, a halogen atom, a cyano group, a nitro group, a decyl group and a decyloxy group.

The ammonium salt can also be a hydroxide or a carboxylate. In this case, the ammonium salt is preferably a tetraalkylammonium hydroxide having a carbon number of 1 to 8 (tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetra-(n-butyl)ammonium hydroxide or the like. Tetraalkylammonium oxide).

Preferred basic compounds include, for example, guanidine and an amine group. Pyridine, aminoalkylpyridine, aminopyrrolidine, oxazole, imidazole, pyrazole, pyrazine, pyrimidine, indole, imidazoline, pyrazoline, piperazine, aminomorpholine and aminoalkylmorpholine. These compounds may have more substituents.

Preferred examples of the substituent include an amine group, an aminoalkyl group, an alkylamino group, an aminoaryl group, an arylamino group, an alkyl group, an alkoxy group, a decyl group, a decyloxy group, an aryl group, and an aromatic group. Oxyl, nitro, hydroxy and cyano groups.

Particularly preferred basic compounds include, for example, hydrazine, 1,1-dimethylhydrazine, 1,1,3,3-tetramethylguanidine, imidazole, 2-methylimidazole, 4-methylimidazole, N- Methylimidazole, 2-phenylimidazole, 4,5-diphenylimidazole, 2,4,5-triphenylimidazole, 2-aminopyridine, 3-aminopyridine, 4-aminopyridine, 2- Dimethylaminopyridine, 4-dimethylaminopyridine, 2-diethylaminopyridine, 2-(aminomethyl)pyridine, 2-amino-3-methylpyridine, 2-amino group 4-methylpyridine, 2-amino 5-methylpyridine, 2-amino-6-methylpyridine, 3-aminoethylpyridine, 4-aminoethylpyridine, 3-aminopyrrolidine , piperazine, N-(2-aminoethyl)piperazine, N-(2-aminoethyl)piperidine, 4-amino-2,2,6,6-tetramethylpiperidine, 4 - piperidin piperidine, 2-iminopiperidine, 1-(2-aminoethyl)pyrrolidine, pyrazole, 3-amino-5-methylpyrazole, 5-amino-3- Methyl-1-p-tolylpyrazole, pyrazine, 2-(aminomethyl)-5methylpyrazine, pyrimidine, 2,4-diaminopyrimidine, 4,6-dihydroxypyrimidine, 2- Pyrazoline, 3-pyrazoline, N-aminomorpholine and N-(2-aminoethyl)morpholine.

(5) A compound (PA) having a proton-receptive functional group and decomposing by irradiation with actinic rays or radiation to cause a decrease in proton acceptability, disappearance, or a change from a proton acceptor to an acidic compound.

The composition of the present invention may further contain the following compound as a basic compound: A compound having a proton-receptive functional group and which is decomposed by irradiation with actinic rays or radiation to cause a decrease in proton acceptability, disappearance, or a change from proton acceptor to acid (hereinafter also referred to as a compound (PA) )].

The term "proton acceptor functional group" refers to a group which can electrostatically interact with a proton or a functional group having an electron, such as a functional group having a macrocyclic structure such as a cyclic polyether, or a A functional group of a nitrogen atom of a non-shared electron pair of a yoke. The nitrogen atom having an unshared electron pair which does not contribute to π conjugate is, for example, a nitrogen atom having a partial structure represented by the following general formula.

Preferred partial structures of the proton acceptor functional group include, for example, a crown ether, an azacrown ether, a primary to tertiary amine, a pyridine, an imidazole, a pyrazine structure, and the like.

The compound (PA) is decomposed by irradiation with actinic rays or radiation, and produces a compound having reduced proton acceptability, disappearance, or acidity change from proton acceptor. Here, the decrease or disappearance of proton acceptor property or the change from proton acceptor property to acidity refers to a change in proton acceptor property caused by the addition of a proton to a proton acceptor functional group. Specifically, When a proton-addition product is formed from a compound (PA) having a proton-receptive functional group and a proton, the equilibrium constant in the chemical equilibrium is reduced.

Specific examples of the compound (PA) are shown below, but are not limited to the specific examples. example.

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[化155]

[化156]

[化157]

[化158]

[化159]

[化160]

Further, in the present invention, a compound (PA) other than the compound which produces the compound represented by the formula (PA-1) can be appropriately selected. For example, a compound which is an ionic compound and has a proton acceptor moiety in the cation moiety can also be used. More specifically, a compound represented by the following formula (7) or the like can be given.

In the formula, A represents a sulfur atom or an iodine atom.

m represents 1 or 2, and n represents 1 or 2. Wherein, when A is a sulfur atom, m+n=3, and when A is an iodine atom, m+n=2.

R represents an aryl group.

R _N represents an aryl group substituted with a proton acceptor functional group.

X ^- represents a counter anion.

Specific examples of X ^- may be the same as X- in the above formula (ZI).

A specific example of the aryl group of R and R _N is preferably a phenyl group.

Specific examples of the proton acceptor functional group possessed by R _N are the same as the proton acceptor functional group described in the above formula (PA-1).

In the composition of the present invention, the compounding ratio of the compound (PA) in the total composition of the total solid content is preferably from 0.1% by mass to 10% by mass, more preferably from 1% by mass to 8% by mass.

(6) bismuth compound

The composition of the present invention may further contain an anthracene compound having a structure represented by the following formula.

The ruthenium compound stabilizes the positive charge of the conjugate acid by three nitrogens, so Shows strong alkaline.

The basicity of the ruthenium compound (A) of the present invention is preferably such that the pKa of the conjugated acid is 6.0 or more, and when it is 7.0 to 20.0, the neutralization reactivity with the acid is high and the roughness characteristics are excellent, which is preferable and preferable. It is 8.0~16.0.

Therefore, since the species is strongly alkaline, it can suppress the diffusibility of the acid and contribute to the formation of an excellent pattern shape.

In addition, the "pKa" here means that the pKa in an aqueous solution is described, for example, in "Chemical Fact (II)" (Revised 4th Edition, 1993, edited by the Chemical Society of Japan, Maruzen Co., Ltd.). A low value indicates a greater acid strength. The pKa in the aqueous solution can be specifically determined by measuring the acid dissociation constant at 25 ° C using an infinitely diluted aqueous solution. Alternatively, the following software package 1 can be used to calculate the Hammett based on the calculation. The substituent constant of Hammett) and the value of the database of well-known literature values. The values of pKa described in the present specification all indicate values obtained by calculation using the kit software.

Software Package 1: Advanced Chemistry Development (ACD/Labs) Software Version 8.14 (V8.14) for Solaris Systems (for Solaris) (1994-2007 ACD/Labs).

In the present invention, the term "logP" means a logarithmic value of the n-octanol/water partition coefficient (P), and is an effective parameter for imparting hydrophilicity/hydrophobicity to a wide range of compounds. The distribution coefficient is usually obtained by calculation rather than experiment. In the present invention, it is represented by CS Chem Draw Ultra version 8.0 (Ver. 8.0) software package (Crippen's method) Fragmentation Method)) The calculated value.

Further, the log P of the hydrazine compound (A) is preferably 10 or less. By being equal to or less than the above value, it can be uniformly contained in the resist film.

The log P of the ruthenium compound (A) of the present invention is preferably in the range of 2 to 10, more preferably in the range of 3 to 8, and further preferably in the range of 4 to 8.

Further, the ruthenium compound (A) of the present invention preferably has no nitrogen atom other than the ruthenium structure.

Specific examples of the ruthenium compound are shown below, but are not limited to these specific examples.

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(7) a low molecular compound having a nitrogen atom and having a group desorbed by the action of an acid

The composition of the present invention may contain a low molecular compound having a nitrogen atom and having a group which is desorbed by the action of an acid (hereinafter also referred to as "low molecular compound (D)" or "compound (D)"). The low molecular compound (D) is preferably basic after being detached from the group which is detached by the action of an acid.

The group which is detached by the action of an acid is not particularly limited, and is preferably an acetal group, a carbonate group, a carbamate group, a tertiary ester group, and a tertiary stage. A hydroxyl group or a hemiminal ether group, particularly preferably a urethane group or a hemiamine acetal group.

The molecular weight of the low molecular compound (D) having a group which is desorbed by the action of an acid is preferably from 100 to 1,000, more preferably from 100 to 700, still more preferably from 100 to 500.

The compound (D) is preferably an amine derivative having a group which is liberated by an action of an acid on a nitrogen atom.

The compound (D) may also contain a urethane group having a protective group on a nitrogen atom. The protecting group constituting the urethane group can be represented by the following formula (d-1).

In the formula (d-1), R' each independently represents a hydrogen atom, a linear or branched alkyl group, a cycloalkyl group, an aryl group, an arylalkyl group or an alkoxyalkyl group. R' may also be bonded to each other to form a ring.

R' is preferably a linear or branched alkyl group, a cycloalkyl group or an aryl group. More preferably, it is a linear or branched alkyl group or a cycloalkyl group.

The specific structure of such a group is shown below.

[化166]

The compound (D) can also be constituted by arbitrarily combining the basic compound with the structure represented by the formula (d-1).

The compound (D) is particularly preferably a structure represented by the following formula (D).

In addition, the compound (D) may be a low molecular compound having a group which is detached by the action of an acid, and may be equivalent to the above basic compound.

In the formula (D), Ra represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group. Further, when n = 2, the two Ra may be the same or different, and the two Ra may be bonded to each other to form a divalent heterocyclic hydrocarbon group (preferably having a carbon number of 20 or less) or a derivative thereof.

Rb each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, or an alkoxyalkyl group. Wherein, in -C(Rb)(Rb)(Rb), when at least one Rb is a hydrogen atom, at least one of the remaining Rb is a cyclopropyl group, a 1-alkoxyalkyl group or an aryl group.

At least two Rbs may also be bonded to form an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic hydrocarbon group or a derivative thereof.

n represents an integer of 0 to 2, m represents an integer of 1 to 3, and n + m = 3.

In the formula (D), the alkyl group, the cycloalkyl group, the aryl group or the aralkyl group represented by Ra and Rb may be via a hydroxyl group, a cyano group, an amine group, a pyrrolidinyl group, a piperidinyl group, a morpholinyl group, a side oxygen group. Substituted by a functional group such as a group, an alkoxy group or a halogen atom. The same applies to the alkoxyalkyl group represented by Rb.

The alkyl group, the cycloalkyl group, the aryl group and the aralkyl group of the above Ra and/or Rb (the alkyl group, the cycloalkyl group, the aryl group and the aralkyl group may be substituted by the above functional group, alkoxy group or halogen atom) ), for example, a linear or branched type derived from methane, ethane, propane, butane, pentane, hexane, heptane, octane, decane, decane, undecane or dodecane a group of an alkane derived from a group of the alkane such as a cyclobutyl group, a cyclopentyl group, a cyclohexyl group or the like a group of one or more substituted groups of a cycloalkyl group; a cycloalkane derived from cyclobutane, cyclopentane, cyclohexane, cycloheptane, cyclooctane, norbornane, adamantane, noradamantane a group, or a group derived from the cycloalkane such as methyl, ethyl, n-propyl, isopropyl, n-butyl, 2-methylpropyl, 1-methylpropyl, third One or more substituted groups of a linear or branched alkyl group such as a butyl group; a group derived from an aromatic compound such as benzene, naphthalene or an anthracene, and a group derived from the aromatic compound is, for example, One or more of linear or branched alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, 2-methylpropyl, 1-methylpropyl, and t-butyl or More than one substituted group; derived from pyrrolidine, piperidine, morpholine, tetrahydrofuran, tetrahydropyran, hydrazine, porphyrin, quinoline, perhydroquinoline, carbazole, benzimidazole, etc. a group of a compound derived from a group of the heterocyclic compound, a linear or branched alkyl group or a group derived from an aromatic compound Or one or more substituted groups, a group derived from a linear or branched alkane, a group derived from a cycloalkane group, a group derived from an aromatic compound such as a phenyl group, a naphthyl group or a fluorenyl group. The above-mentioned one or more substituted groups and the like, or a group in which the above substituent is substituted with a functional group such as a hydroxyl group, a cyano group, an amine group, a pyrrolidinyl group, a piperidinyl group, a morpholinyl group or a pendant oxy group.

Further, the divalent heterocyclic hydrocarbon group (preferably having a carbon number of 1 to 20) or a derivative thereof in which the above Ra is bonded to each other may, for example, be derived from pyrrolidine, piperidine, morpholine, 1,4,5. ,6-tetrahydropyrimidine, 1,2,3,4-tetrahydroquinoline, 1,2,3,6-tetrahydropyridine, homopiperazine, 4-azabenzimidazole, benzotriazole, 5 -azabenzotriazole, 1H-1,2,3- Triazole, 1,4,7-triazacyclononane, tetrazole, 7-azaindole, oxazole, benzimidazole, imidazo[1,2-a]pyridine, (1S, 4S)- (+)-2,5-diazabicyclo[2.2.1]heptane, 1,5,7-triazabicyclo[4.4.0]non-5-ene, anthracene, porphyrin, 1, a group of a heterocyclic compound such as 2,3,4-tetrahydroquinoxaline, perhydroquinoline or 1,5,9-triazacyclododecane, derived from a group of the heterocyclic compound a group derived from a linear or branched alkane, a group derived from a cycloalkane, a group derived from an aromatic compound, a group derived from a heterocyclic compound, a hydroxyl group, a cyano group, an amine group, a pyrrole group One or more or one or more substituted groups of a functional group such as a pyridyl group, a piperidinyl group, a morpholinyl group or a pendant oxy group.

Specifically, the compound (D) which is particularly preferred in the present invention is specifically shown, but the present invention is not limited thereto.

[化168]

[化169]

The compound represented by the formula (D) can be synthesized in accordance with JP-A-2007-298569, JP-A-2009-199021, and the like.

In the present invention, the low molecular compound (D) may be used alone or in combination of two or more.

The composition of the present invention may contain a low molecular compound (D) or a low molecular compound (D). When the low molecular compound (D) is contained, the total solid content of the composition in combination with the above basic compound is The content of the compound (D) is usually 0.001% by mass to 20% by mass, preferably 0.001% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass.

Further, when the composition of the present invention contains an acid generator, the ratio of the acid generator to the compound (D) used in the composition is preferably an acid generator / [compound (D) + the following basic compound] (Morbi) = 2.5~300. In other words, in terms of the sensitivity and the resolution, the molar ratio is preferably 2.5 or more, and the degree of resolution due to the coarseness of the resist pattern over time after the post-exposure heat treatment is suppressed. Good for 300 or less. The acid generator / [compound (D) + the above basic compound] (mole ratio) is more preferably 5.0 to 200, and further preferably 7.0 to 150.

In addition, the composition of the present invention can be exemplified by a compound synthesized in the examples of JP-A-2002-363146, and a compound described in paragraph 0108 of JP-A-2007-298569. Wait.

A photosensitive basic compound can also be used as the basic compound. For the photosensitive basic compound, for example, Japanese Patent Laid-Open Publication No. 2003-524799 and "J. Photopolym. Sci & Tech." (Vol. 8, P. 543-553) can be used. (1995)) A compound described in the above.

The molecular weight of the basic compound is usually from 100 to 1,500, preferably from 150 to 1300, more preferably from 200 to 1,000.

These basic compounds may be used alone or in combination of two or more.

When the composition of the present invention contains a basic compound, the content thereof is preferably from 0.01% by mass to 8.0% by mass, more preferably from 0.1% by mass to 5.0% by mass, based on the total solid content of the composition. It is 0.2% by mass to 4.0% by mass.

The molar ratio of the basic compound to the photoacid generator is preferably from 0.01 to 10, more preferably from 0.05 to 5, and even more preferably from 0.1 to 3. If the molar ratio is excessively increased, the sensitivity and/or resolution may be lowered. If the molar ratio is excessively reduced, a reduction in pattern may occur between exposure and heating (post-baking). More preferably 0.05 to 5, and thus preferably 0.1 to 3. In addition, the photo-acid generator of the above-mentioned molar ratio is based on the total amount of the photo-acid generator which can be further contained in the repeating unit (B) of the above-mentioned resin and the above-mentioned resin.

[7] surfactants

The sensitizing ray-sensitive or radiation-sensitive resin composition of the present invention may further contain a surfactant. The surfactant is particularly preferably a fluorine-based and/or a lanthanide surfactant.

Examples of the fluorine-based and/or lanthanide-based surfactants include Megafac F176 and Megafac R08 manufactured by Dainippon Ink Chemical Industry Co., Ltd., and PF656 and PF6320 manufactured by OMNOVA. Troy Sol S-366, manufactured by Troy Chemical Co., Ltd. Fluorad FC430 manufactured by Sumitomo 3M Co., Ltd., and polyoxyalkylene polymer KP-341 manufactured by Shin-Etsu Chemical Co., Ltd.

Surfactants other than fluorine and/or lanthanide may also be used. Examples of the surfactant include anionic surfactants such as polyoxyethylene ethyl ethers and polyoxyalkylene aryl ethers.

Besides, a well-known surfactant can also be used suitably. The surfactant which can be used, for example, is a surfactant described in [0273] and later on the specification of US Pat. No. 2008/0248425A1.

The surfactant may be used singly or in combination of two or more.

When the composition of the present invention further contains a surfactant, the amount of use of the composition is preferably from 0.0001% by mass to 2% by mass, more preferably 0.001% by mass based on the total solid content of the composition. 1% by mass.

[8] Other additives

In addition to the components described above, the composition of the present invention may suitably contain a carboxylic acid, a carboxylic acid strontium salt, and "Proceeding of The International Society for Optical. Engineering (Proceeding of SPIE)" (2724). A dissolution inhibiting compound having a molecular weight of 3,000 or less as described in 355 (1996)), a dye, a plasticizer, a photosensitizer, a light absorbing agent, an antioxidant, and the like.

In particular, in order to improve the performance, a carboxylic acid is particularly preferably used. The carboxylic acid is preferably an aromatic carboxylic acid such as benzoic acid or naphthoic acid.

The content of the carboxylic acid in the total solid content concentration of the composition is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass, and further preferably 0.01% by mass. Mass%~3 mass%.

The photosensitive ray-sensitive or radiation-sensitive resin composition of the present invention is preferably used in a film thickness of 10 nm to 250 nm, more preferably in a film thickness of 20 nm to 200 nm, from the viewpoint of improving the resolution. It is used in a film thickness of 30 nm to 100 nm. The film thickness can be obtained by setting the solid content concentration in the composition to an appropriate range and having an appropriate viscosity to improve coatability and film formability.

The solid content concentration of the photosensitive ray-sensitive or radiation-sensitive resin composition of the present invention is usually 1.0% by mass to 10% by mass, preferably 2.0% by mass to 5.7% by mass, and more preferably 2.0% by mass to 5.3% by mass. By setting the solid content concentration to the above range, the resist solution can be uniformly applied onto the substrate, and a resist pattern having excellent line width roughness can be formed. Though the reason for this is not clear, it is considered that the solid content concentration is 10% by mass or less, preferably 5.7% by mass or less, thereby suppressing aggregation of a material, particularly a photoacid generator, in the resist solution. As a result, a uniform resist film can be formed.

The solid content concentration refers to the weight percentage of the weight of the resist component other than the solvent to the total weight of the sensitizing ray-sensitive or radiation-sensitive resin composition.

In the sensitizing ray-sensitive or radiation-sensitive resin composition of the present invention, the above-mentioned components are dissolved in a predetermined organic solvent, preferably in the above-mentioned mixed solvent, and filtered by a filter, and then applied to a predetermined support (substrate). And use. The filter used for the filtration of the filter is preferably made of polytetrafluoroethylene, polyethylene or nylon having a pore diameter of 0.1 μm or less, more preferably 0.05 μm or less, and still more preferably 0.03 μm or less. Filter. When the filter is filtered, for example, it can be circulated and filtered as in the case of JP-A-2002-62667, and a plurality of filters can be filtered in series or in parallel. Alternatively, the composition can be filtered multiple times. Further, the composition may be subjected to a degassing treatment or the like before and after the filter is filtered.

<pattern forming method>

The present invention relates to a sensitized ray-sensitive or radiation-sensitive film formed using the above-described composition of the present invention. Further, the pattern forming method of the present invention includes the step of exposing and developing the above-described sensitized ray-sensitive or radiation-sensitive film.

The composition of the present invention is typically used as follows. That is, typically, the composition of the present invention is applied onto a support such as a substrate to form a film. The thickness of the film is preferably from 0.02 μm to 0.1 μm. The method of coating on the substrate is preferably spin coating, and the rotation speed thereof is preferably from 1,000 rpm to 3000 rpm.

The composition is, for example, a substrate (for example, a tantalum/yttria coating or a tantalum nitride) which is applied to a precision integrated circuit element, an imprint mold, or the like using a spinner, a coater, or the like. And chrome-deposited quartz substrate, etc.). Thereafter, it is dried to form a sensitized ray-sensitive or radiation-sensitive film (hereinafter also referred to as a resist film). Further, a known anti-reflection film may be applied in advance.

Then, the actinic radiation or radiation sensitive film is irradiated with actinic rays or radiation, preferably after baking (usually 80 ° C to 150 ° C, more preferably 90 ° C to 130 ° C), and then developing. By baking, a better pattern can be obtained.

Examples of actinic rays or radiation include infrared light, visible light, ultraviolet light, far ultraviolet light, X-ray, and electron beam. The actinic rays or radiation are more preferably, for example, those having a wavelength of 250 nm or less, particularly 220 nm or less. Examples of such actinic rays or radiation include KrF excimer laser (248 nm), ArF excimer laser (193 nm), F ₂ excimer laser (157 nm), X-ray, and electron beam. Preferred actinic rays or radiations include, for example, KrF excimer lasers, electron beams, X-rays, and EUV light. More preferred are electron beam, X-ray and EUV light.

That is, the present invention is also directed to a sensitized ray- or radiation-sensitive resin composition for KrF excimer laser, electron beam, X-ray or EUV light (more preferably for electron beam, X-ray or EUV light).

In the developing step, an alkaline developing solution is usually used.

Examples of the alkaline developing solution include alkaline aqueous solutions containing the following compounds: inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, sodium metasilicate, and aqueous ammonia; and primary amines such as ethylamine and n-propylamine. , secondary amines such as diethylamine and di-n-butylamine, tertiary amines such as triethylamine and methyldiethylamine, alcoholamines such as dimethylethanolamine and triethanolamine, tetramethylammonium hydroxide and hydrogen A quaternary ammonium salt such as tetraethylammonium or a cyclic amine such as pyrrole or piperidine.

An appropriate amount of an alcohol and/or a surfactant may be added to the alkaline developer.

The concentration of the alkaline developer is usually from 0.1% by mass to 20% by mass. The pH of the alkaline developer is usually from 10.0 to 15.0.

The composition of the present invention can also be used in the following processes: after coating, film formation, and exposure, development is carried out using a developer having an organic solvent as a main component to obtain a negative pattern. Such a process can be used, for example, in Japanese Patent Laid-Open Publication No. 2010-217884. Documented process.

As the organic developing solution, an ester solvent (for example, butyl acetate or ethyl acetate), a ketone solvent (for example, 2-heptanone or cyclohexanone), an alcohol solvent, a guanamine solvent, or an ether solvent can be used. Equipolar solvent and hydrocarbon solvent. The organic developer solution preferably has a water content of less than 10% by mass, more preferably substantially no moisture.

The organic developing solution may contain a basic compound, and the basic compound may specifically be a compound described as a basic compound which can be contained in the resin composition of the present invention. A dual development process in which organic solvent development and alkaline development are combined can also be performed.

In addition, the embossing mold can be produced by using the composition of the present invention. For details, for example, refer to Japanese Patent No. 4109085, Japanese Patent Laid-Open No. 2008-162101, and "Basic of Nano Imprinting". And technology development. Application development - nano-imprinted substrate technology and the latest technology development - edit: Hirai Yoshihiko (Frontier published).

[Examples]

Hereinafter, the aspects of the present invention will be described in more detail by way of examples, but the contents of the present invention are not limited by the examples.

[Synthesis Example 1: Resin (Aa-2)]

The resin (Aa-2) was synthesized in accordance with the following procedure.

0.54 g of the compound (1), 19.77 g of the compound (2), and 0.69 g of a polymerization initiator V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) were dissolved in 92.09 g of cyclohexanone. 23.02 g of cyclohexanone was added to the reaction vessel, and the mixture was added dropwise for 4 hours under a nitrogen atmosphere at 85 °C. After the reaction solution was heated and stirred for 2 hours, it was left to cool to room temperature.

The above reaction solution was added dropwise to 1350 g of heptane / ethyl acetate = 8/2, and the polymer was precipitated and filtered. The filtered solid was washed with 400 g of heptane / ethyl acetate = 8/2. Thereafter, the washed solid was dried under reduced pressure to obtain 9.55 g of a resin (resin (Aa-2)).

GPC (manufactured by Tosoh Corporation; HLC-8120; Tsk gel Multipore HXL-M) was used for the resin (Aa-2), and weight average molecular weight and dispersity were measured using THF as a solvent. Further, the composition ratio was calculated by ¹ H-NMR or ¹³ C-NMR using Nuclear Magnetic Resonance (NMR) (manufactured by Bruker-Biospin Co., Ltd.; AVANCE III400 type). The results are shown in Table 1.

[Other Resin (Aa)]

The above-exemplified resin (Aa-1), resin (Aa-3) to resin (Aa-36) were synthesized in the same manner as in the method described in Synthesis Example 1. Further, as a comparison, the resin (Aa '-1) and the resin (Aa' -2) synthesized as shown below. Further, with respect to these resins, the weight average molecular weight, the dispersion degree, and the composition ratio were measured by the same method as the method described in Synthesis Example 1. The results are shown in Table 1.

[Synthesis Example 2: Resin (Ab-289)]

46.50 g of the compound (6) was dissolved in 263.5 g of n-hexane, and 87.19 g of cyclohexanol, 46.50 g of anhydrous magnesium sulfate, and 4.81 g of 10-camphorsulfonic acid were added, and the mixture was stirred at room temperature for 6 hours. 10.49 g of triethylamine was added, and after stirring for 10 minutes, it was filtered to remove a solid. 400 g of ethyl acetate was added, and the organic layer was washed five times with 200 g of ion-exchanged water, and then dried over anhydrous magnesium sulfate, and the solvent was distilled off to obtain 116.27 g of a solution containing the compound (7).

8.80 g of ethyl hydrazine chloride was added to 41.19 g of the solution containing the compound (7), and the mixture was stirred at room temperature for 2 hours to obtain 49.99 g of a solution containing the compound (8).

7.40 g of the compound (9) was dissolved in 79.93 g of dehydrated tetrahydrofuran, and 7.40 g of anhydrous magnesium sulfate and 60.89 g of triethylamine were added, and the mixture was stirred under a nitrogen atmosphere. After cooling to 0 ° C, 49.99 g of a solution containing the compound (8) was added dropwise, and the mixture was stirred at room temperature for 3 hours, and then filtered to remove a solid. 400 g of ethyl acetate was added, and the organic layer was washed 5 times with 200 g of ion-exchanged water, and then dried with anhydrous magnesium sulfate. The line was dried and the solvent was distilled off. Separation and purification were carried out using a column chromatography to obtain 23.91 g of Compound (10).

6.61 g of the compound (11) (50.00% by mass of a cyclohexanone solution), 6.31 g of the compound (10), and 0.35 g of a polymerization initiator V-601 (manufactured by Wako Pure Chemical Industries, Ltd.) were dissolved in 32.10. g in cyclohexanone. 19.07 g of cyclohexanone was added to the reaction vessel, and the mixture was added dropwise for 4 hours under a nitrogen atmosphere at 85 °C. After the reaction solution was heated and stirred for 2 hours, it was left to cool to room temperature.

The above reaction solution was added dropwise to 450 g of heptane / ethyl acetate = 9 / 1 (mass ratio), and the polymer was precipitated and filtered. The washing of the filtered solid was carried out using 200 g of heptane / ethyl acetate = 9 / 1 (mass ratio). Thereafter, the washed solid was dried under reduced pressure to obtain 4.90 g of a resin (Ab-289).

[Other Resins (Ab)]

From the resin (Ab-1) to the resin (Ab-312) enumerated above, each of the resins shown in Table 2 was synthesized by the same method as that described in Synthesis Example 2. Further, for comparison, the resin (Ab'-1) shown below was synthesized. Further, with respect to these resins, the weight average molecular weight, the dispersion degree, and the composition ratio were measured by the same method as the method described in Synthesis Example 1. The results are shown in Table 2.

[174]

[Photoacid generator]

The photoacid generator is from the acid generator z1 to acid generator z143 listed above. Choose the right use.

[alkaline compound]

The basic compound is any one of the following compounds (N-1) to (N-10).

In addition, the above-mentioned compound (N-7) corresponds to the above-mentioned compound (PA), and is synthesized according to the description of [0354] of JP-A-2006-330098.

[Surfactant]

For the surfactant, the following W-1 to W-4 were used.

W-1: Megafac R08 (manufactured by Dainippon Ink Chemical Industry Co., Ltd.; fluorine and lanthanide)

W-2: Polyoxane polymer KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.; 矽)

W-3: Troy Sol S-366 (manufactured by Troy Chemical Co., Ltd.; fluorine system)

W-4: PF6320 (manufactured by OMNOVA; fluorine)

<Electron beam (EB) exposure> (Examples 1A to 42A, Comparative Example 1A to Comparative Example 4A)

(1) Preparation and coating of coating liquid for sensitizing ray-sensitive or radiation-sensitive resin composition

The coating liquid composition having a solid content concentration of 3% by mass having the composition shown in the following table was subjected to microfiltration using a membrane filter having a pore size of 0.1 μm to obtain a sensitized ray-sensitive or radiation-sensitive resin composition (resistance Agent composition) solution.

The sensitizing ray-sensitive or radiation-sensitive resin composition was applied to 6 预先 previously treated with Hexamethyldisilazane (HMDS) using a spin coater Mark 8 manufactured by Tokyo Electron. The Si wafer was dried on a hot plate at 100 ° C for 60 seconds to obtain a resist film having a film thickness of 100 nm.

(2) EB exposure and development

The resist film-coated wafer obtained in the above (1) was subjected to pattern irradiation using an electron beam drawing apparatus (manufactured by Hitachi, Ltd., HL750, acceleration voltage: 50 keV). At this time, drawing is performed in such a manner as to form a line and a gap of 1:1. After electron beam drawing, it was heated on a hot plate at 100 ° C for 90 seconds, and then impregnated with a 2.38 mass % aqueous solution of tetramethylammonium hydroxide (TMAH) for 60 seconds. Rinse for 30 seconds. Thereafter, the wafer was rotated at 4000 rpm for 30 seconds, and then heated at 95 ° C for 60 seconds, thereby obtaining a 1:1 line and gap pattern resist pattern having a line width of 100 nm.

(3) Evaluation of resist pattern

(3-1) Sensitivity

The irradiation energy when a line having a line width of 100 nm and a line of gap = 1:1 was analyzed was used as the sensitivity (Eop). The smaller the value, the better the performance.

(3-2) pattern shape

The scanning electron microscope (manufactured by Hitachi, Ltd., S-4300) was used to observe the cross-sectional shape of a line having a line width of 100 nm and a gap of 1:1 at an exposure amount showing the above sensitivity, and the following is performed. 5 rating evaluation.

A: no bridge

B: between A and C

C: Slightly bridged

D: between C and E

E: Bridge

(3-3) Thin film

Film thinning was evaluated by the following formula. The smaller the film thinning ratio (%), the better the residual film of the pattern and the more excellent the resolution.

Film thinning rate (%) = (coating film thickness: 100 nm - pattern height) / coating film thickness: 100 nm × 100

A: less than 5.0%

B: 5.0% or more and less than 10.0%

C: 10.0% or more and less than 15.0%

D: 15.0% or more and less than 20.0%

E: 20.0% or more

(3-4) LER

The above 100 nm line pattern (line: gap = 1:1) was observed using a scanning electron microscope (manufactured by Hitachi, Ltd., S-9260). Then, the distance between the reference line where the edge should exist and the actual edge should be measured at 30 points which are equally spaced in the longitudinal direction of 50 μm. Then, the standard deviation of the distance is obtained, and 3σ is calculated. Then, the 3σ is referred to as "LER(nm)".

<Extreme ultraviolet (EUV) exposure> (Examples 1B to 42B, Comparative Example 1B to Comparative Example 4B)

(1) Preparation and coating of coating liquid for sensitizing ray-sensitive or radiation-sensitive resin composition

The coating composition having a solid content concentration of 1.5% by mass having the composition shown in the following table was subjected to microfiltration using a membrane filter having a pore size of 0.05 μm to obtain a sensitized ray-sensitive or radiation-sensitive resin composition (resistance Agent composition) solution.

The sensitizing ray-sensitive or radiation-sensitive resin composition was applied to a 6 吋 Si crystal previously treated with hexamethyldiaziridine (HMDS) using a spin coater Mark 8 manufactured by Tokyo Electron Co., Ltd. On the circle, at 100 ° C The film was dried on a hot plate for 60 seconds to obtain a resist film having a film thickness of 50 nm.

(2) EUV exposure and development

The resist film-coated wafer obtained in the above (1) was subjected to an EUV exposure apparatus (manufactured by Exetech Co., Ltd., Micro Exposure Tool, and Numerical Aperture (NA)). 0.3, Quadrupole, outer σ (outer sigma) is 0.68, inner σ (inner sigma) is 0.36), and exposure exposure is performed using an exposure mask (line/gap=1/1). After the exposure, the film was heated at 100 ° C for 90 seconds on a hot plate, and then immersed in a 2.38 mass % aqueous solution of tetramethylammonium hydroxide (TMAH) for 60 seconds, and then rinsed with water for 30 seconds. Thereafter, the wafer was rotated at 4000 rpm for 30 seconds, and then baked at 95 ° C for 60 seconds, thereby obtaining a 1:1 line and gap pattern resist pattern having a line width of 50 nm.

(3) Evaluation of resist pattern

(3-1) Sensitivity

The irradiation energy at the time of analyzing a pattern having a line width of 50 nm of line/gap = 1:1 was taken as the sensitivity (Eop). The smaller the value, the better the performance.

(3-2) pattern shape

The scanning electron microscope (manufactured by Hitachi, Ltd., S-4300) was used to observe the cross-sectional shape of a line having a line width of 50 nm and a gap of 1:1 at an exposure amount showing the above sensitivity, and the following is performed. 5 rating evaluation.

A: no bridge

B: between A and C

C: Slightly bridged

D: between C and E

E: Bridge

(3-3) Thin film

Film thinning was evaluated by the following formula. The smaller the film thinning ratio (%), the better the residual film of the pattern and the more excellent the resolution.

Film thinning rate (%) = (coating film thickness: 50 nm - pattern height) / coating film thickness: 50 nm × 100

A: less than 5.0%

B: 5.0% or more and less than 10.0%

C: 10.0% or more and less than 15.0%

D: 15.0% or more and less than 20.0%

E: 20.0% or more

(3-4) LER

The above 50 nm line pattern (line: gap = 1:1) was observed using a scanning electron microscope (manufactured by Hitachi, Ltd., S-9260). Then, the distance between the reference line of the edge and the actual edge should be measured at 30 points which are equally spaced in the longitudinal direction of 50 μm. Then, the standard deviation of the distance is obtained, and 3σ is calculated. Then, the 3σ is referred to as "LER(nm)".

<Development defect> (Example 1C to Example 42C, Comparative Example 1C~ Comparative Example 4C)

The positive resist liquid prepared as described above was uniformly applied to an antireflection film coated with 60 nm (manufactured by Brewer Science) using a spin coater Mark8 manufactured by Tokyo Electron. The substrate of DUV44) was dried by heating at 130 ° C for 60 seconds to form a positive resist film having an average film thickness of 60 nm. A KrF excimer laser scanner (manufactured by ASML, PAS5500/850C, wavelength: 248 nm) was used for the resist film, and the exposed portion of the open frame was opened on the entire surface of the wafer at a surface area of 15 mm square. Black and white check flag exposures of the unexposed portions alternately exposed (exposure conditions: NA = 0.80, σ = 0.89, 20 mJ). After the irradiation, the mixture was baked at 110 ° C for 60 seconds, and after being immersed for 60 seconds with a 2.38 mass % aqueous solution of tetramethylammonium hydroxide (TMAH), it was rinsed with water for 30 seconds and dried. The obtained pattern was evaluated by the following method.

Further, the sensitivity E ₀ of the film thickness of the resist film was measured to be zero.

At the above-described effective sensitivity E ₀ , the mask size of the mask at 78 in-plane exposure was 0.15 μm. The resulting patterned wafer was measured for the number of development defects by KLA-2360 manufactured by KLA-Tencor Co., Ltd. The inspection area at this time was 205 cm ^{2 in} total, the pixel size was 0.25 μm, the threshold was 30, and the inspection light was visible light. The value obtained by dividing the obtained value by the inspection area was evaluated as the number of defects (number/cm ² ). The case where the value is less than 1.0 is evaluated as A, the case where 1.0 or more and less than 3.0 is evaluated as B, the case where 3.0 or more and less than 5.0 is evaluated as C, and the case where 5.0 or more and less than 10.0 is evaluated as D, and 10.0 or more is evaluated. The situation is evaluated as E. A smaller value indicates better performance. The results are shown in Table 5.

Claims (16)

A resin composition comprising a sensitizing ray or a radiation sensation and comprising a resin (Aa), a resin (Ab), and a compound which generates an acid by irradiation with actinic rays or radiation, wherein the resin (Aa) contains a repeat In the unit (c), the repeating unit (c) has at least two or more groups represented by -COO- in the structure represented by the formula (KA-1) or the formula (KB-1), and the above resin ( Ab) contains a repeating unit represented by the formula (A), and the solubility in the developer changes depending on the action of the acid. In the formula (KA-1), Z _ka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, a decylamino group, an aryl group, a lactone ring group or an electron-withdrawing group; when a plurality of Z _ka are present, A plurality of Z _ka may be the same or different, and Z _ka may be bonded to each other to form a ring; nka represents an integer of 0 to 10; and Q represents an atomic group necessary for forming a lactone ring together with an atom in the formula; In KB-1), X _kb1 and X _kb2 each independently represent a pull electron group; nkb and nkb' respectively represent 0 or 1; R _kb1 , R _kb2 , R _kb3 and R _kb4 each independently represent a hydrogen atom or an alkane; a group, a cycloalkyl group, an aryl group or an electron-donating group; at least two of R _kb1 , R _kb2 and X _kb1 may be linked to each other to form a ring, and at least two of R _kb3 , R _kb4 and X _kb2 may be linked to each other. Forming a ring; In the formula, R ₂₁ , R ₂₂ and R ₂₃ each independently represent a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group; wherein R ₂₂ may also bond with Ar ₂ to form a ring, at this time R ₂₂ represents a single bond or an alkylene group; X ₂ represents a single bond, -COO- or -CONR ₃₀ -, R ₃₀ represents a hydrogen atom or an alkyl group; L ₂ represents a single bond or an alkyl group; and Ar ₂ represents (n+) 1) The aromatic cyclic group of a valence represents an (n+2)-valent aromatic ring group when bonded to R ₂₂ to form a ring; n represents an integer of 1 to 4. The resin composition according to claim 1, wherein the repeating unit (c) contained in the resin (Aa) contains a structure represented by the following formula (KY-3). In the formula (KY-3), Rs represents a chain or cyclic alkyl group, and when it is plural, it may be the same or different; Ls represents a single bond, an ether bond, an ester bond, a guanamine bond, or an amine. The urethane bond or the urea bond may be the same or different when there are a plurality of cases; ns represents the number of repeats of the linker represented by -(Rs-Ls)-, and represents an integer of 0-5; _ky represents alkylene, oxygen atom or sulfur atom; Z _ka represents an alkyl group, a cycloalkyl group, an ether group, a hydroxyl group, an acyl group, an aryl group, a lactone ring group or electron withdrawing group; in the presence of a plurality of Z _ka In the case, a plurality of Z _ka may be the same or different, and Z _ka may be linked to each other to form a ring; nka represents an integer of 0 to 10; and R _kb1 and R _kb2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, An aryl group or a _pendant electron group, at least two of R _kb1 , R _kb2 and R _ky5 may be bonded to each other to form a ring; nkb represents 0 or 1; and R _ky5 represents an electron-withdrawing group. The resin composition according to claim 1, wherein the resin (Aa) further contains a repeating unit (Aa3) having a group selected from a fluorine atom, a fluorine atom, and a germanium atom. One or more groups of the group consisting of an alkyl group having 6 or more carbon atoms, a cycloalkyl group having 5 or more carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms. The resin composition according to claim 1, wherein the resin (Aa) further contains a repeating unit represented by the following formula (Aa4), In the formula (aa2-1), Rb represents a hydrogen atom, an alkyl group or a halogen atom; S _1a represents a substituent, and when it is plural, it is independent; and p represents an integer of 0-5. The resin composition according to claim 1, wherein the resin (Aa) further contains a repeating unit having a group decomposed by the action of an acid. The resin composition according to claim 5, wherein the repeating unit having a group decomposed by an action of an acid is represented by the following formula (Aa1) or (Aa2), In the formula (Aa1), R' represents a hydrogen atom or an alkyl group; L represents a single bond or a divalent linking group; R ₁ represents a hydrogen atom or a monovalent substituent; R ₂ represents a monovalent substituent; R ₁ and R ₂ Further, they may be bonded to each other to form a ring together with an oxygen atom in the formula; R ₃ represents a hydrogen atom, an alkyl group or a cycloalkyl group; in the formula (Aa2), Ra represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom; L ₁ represents a single bond or a divalent linking group; R ₁ and R ₂ each independently represent an alkyl group; R ₁₁ and R ₁₂ each independently represent an alkyl group, R ₁₃ represents a hydrogen atom or an alkyl group; R ₁₁ and R ₁₂ and Any two of R ₁₃ may be connected to each other to form a ring. The resin composition according to claim 1, wherein the resin (Ab) contains at least a repeating unit represented by the following formula (Ab1) or formula (Ab2) as a repeating unit represented by the formula (A), In the formula (A2), R ₂₃ represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group. The resin composition according to the first aspect of the invention, wherein the content of the resin (Aa) is in the range of 0.01% by mass to 30% by mass based on the total solid content of the composition. The resin composition according to the first aspect of the invention, wherein the content of the resin (Aa) is in the range of 0.01% by mass to 20% by mass based on the total solid content of the composition. The resin composition according to the first aspect of the invention, wherein the content of the resin (Aa) is in the range of 0.01% by mass to 10% by mass based on the total solid content of the composition. The resin composition according to the first aspect of the invention, wherein the content of the resin (Aa) is in the range of 0.01% by mass to 5% by mass based on the total solid content of the composition. A film having a sensitizing ray or a radiation sensation and formed using the resin composition as described in claim 1 of the patent application. A pattern forming method comprising: forming a sensitized ray-sensitive or radiation-sensitive film using a resin composition as described in claim 1; irradiating the sensitized ray-sensitive or radiation-sensitive film with actinic rays or radiation Exposing is performed; and the exposed sensitized ray-sensitive or radiation-sensitive film is exposed. The pattern forming method according to claim 13, wherein an electron beam or an extreme ultraviolet ray is used as the actinic ray or radiation. A semiconductor element manufactured by the steps comprising the pattern forming method as described in claim 13 of the patent application. A method of manufacturing an electronic component, comprising the pattern forming method according to claim 13 of the patent application.