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TW201238716A - Abrasive article with replicated microstructured backing and method of using same - Google Patents

Abrasive article with replicated microstructured backing and method of using same Download PDF

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Publication number
TW201238716A
TW201238716A TW101102916A TW101102916A TW201238716A TW 201238716 A TW201238716 A TW 201238716A TW 101102916 A TW101102916 A TW 101102916A TW 101102916 A TW101102916 A TW 101102916A TW 201238716 A TW201238716 A TW 201238716A
Authority
TW
Taiwan
Prior art keywords
abrasive
adhesive
abrasive article
flexible backing
microstructure
Prior art date
Application number
TW101102916A
Other languages
Chinese (zh)
Inventor
Paul Stuart Lugg
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of TW201238716A publication Critical patent/TW201238716A/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/001Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as supporting member
    • B24D3/002Flexible supporting members, e.g. paper, woven, plastic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B24B37/245Pads with fixed abrasives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/02Backings, e.g. foils, webs, mesh fabrics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Magnetic Heads (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

An abrasive article is provided that includes a flexible backing having opposed first and second major surfaces. The first major surface includes a plurality of abrasive particles in at least one binder disposed thereon. The second major surface includes replicated microstructures having recesses. The abrasive article also includes adhesive contained substantially in the recesses of the replicated microstructures. A rigid substrate can be in contact with at least a portion of the replicated microstructures. Also provide is a method of polishing a work-piece that uses the provided articles.

Description

201238716 六、發明說明: 【發明所屬之技術領域】 本發明係關於可用於拋光複合材料之研磨物件。 【先前技術】 諸如用於硬碟驅動機(HDD)工業之讀/寫頭之工件具有極 硬及極軟之複合材料,其等一般係利用研磨物件同時進行 研光及拋光加工。構成讀/寫傳感器之極軟材料位於極硬 材料(如碳化鋁鈦(alumina titania carbide,AlTiC))之邊緣 處。由於需要高壓力來移除硬AlTiC材料,故施加至大4〇 崎/平方英寸(psi)之壓力。若研磨基質具有充分低模量, 則在工件上之咼負載可導致研磨表面移位。此可導致研磨 材料在工件邊緣上累積。在工件邊緣上之過量研磨劑可導 致邊緣加速移除,或一般稱為「冠凸」或「邊緣滾降」。 此冠凸效應可破壞位於工件邊緣上之傳感器。具有順從性 壓感黏著劑之多層研磨物件可加劇讀/寫頭之冠凸。 圖1係一般先前技藝中之一研磨物件系統丨〇之示意圖, 研磨粒子12分散於黏結劑13(形成一研磨層)中,該黏結層 位於可撓背襯18之第一主表面i8a上,該可撓背襯18具有 塗覆於該研磨物件之第二主表面18b上之黏著劑層14。該 黏著劑層(如,例如,一壓感黏著劑層)將研磨物件固定至 剛性支撑物22。當將研磨物件1 〇中之各組件進行對比時, 該黏著劑層較可撓背襯及研磨粒子軟(即,具有較低楊氏 模量)。 如圖1及2中所示,於使用時,—般在負載P下使工件20 161856.doc 201238716 曝露於研磨層(包括研磨粒子l8a及黏結劑13)。於此等環境 下’該工件及施加其上之負載會使相對軟之黏著劑層14變 形。可撓基板18及研磨層13之輪廓將跟隨黏著劑層之變 形,導致工件邊緣圓化或冠凸。此外,工件2〇邊緣處之高 應力亦可導致工件邊緣圓化。 【發明内容】 需解決在待拋光工件上,特定言之,在用於敏感電子工 業中之工件(如’用於硬碟驅動機或薄型硬碟驅動機之讀· 寫頭、驅動機自身)上發生冠凸之問題。本發明之研磨物 件及方法對以下方面有利:延長使用期限,使材料易於自 工件移除,拋光至精密加工之能力及高移除速率。此外, 其等防止該等工件之邊緣發生冠凸並製成更適宜產品。 於一態樣中,提供一種研磨物件,其包括具有對置之第 一及第二主表面之一可撓背襯;包含保留於至少一黏結劑 中之複數個研磨粒子之一研磨層,該研磨層佈置於該可撓 背襯之第一主表面上,其中該可撓背襯之第二主表面中之 至少一部分包括具有凹口之複製微結構;及黏著劑,其中 該黏著劑實質上容納於該等複製微結構之凹口中。該物件 可進一步包括與該等複製微結構中之至少一部分接觸之一 剛性基板或與該黏著劑中之至少一部分接觸之一釋放襯 墊。該可撓背襯可具有大於約0.5吉帕(GPa)或甚至大於2 GPa之楊乂模量,且在其他可行形狀中可尤其包括棒體、 三角形體、稜錐形體、截頭稜錐形體、圓錐形體、戴頭圓 錐形體、球形體或橢球形體。 161836.doc 201238716 於另一態樣中,提供一種拋光方法,其包括提供一工 件,使該工件與包含以下組件之研磨物件接觸:具有對置 之第一及第二主表面之一可撓背襯、包含保留於至少一黏 結劑中之複數個研磨粒子之一研磨層,該研磨層佈置於該 可撓背襯之第一主表面上,其中該可撓背襯之第二主表面 中之至少一部分包括具有凹口之複製微結構、黏著劑;及 與該等複製微結構之至少一部分接觸之一剛性基板,其中 該黏著劑實質上容納於該等複製微結構之凹口中;及使該 研磨物件相對該工件移動。使該研磨物件相對該工件移 動’藉此拋光該工件之一表面。一般而言,將一負載施加 至該工件。 所提供之研磨物件及方法可用於拋光在其等整個維度上 要求極光/月及平整之工件。包括複製微結構之可挽背觀容 許在拋光期間藉由一剛性基板支撐可施加至該工件之負 載。該等複製微結構承受該負載中之一部分,將該負載中 之至少-部分轉移至該剛性基板,藉此減小或消除黏著劑 變形。該黏著劑實質上容納於該等複製微結構之凹口中, 使該等複製微結構與該剛性基板直接接觸。所提供之研磨 物件及方法可獲得具有優異平整度之成品工件,進而提供 長使用期限、易應用、易移除、精密加工及高移除速率之 益處比冠凸減少技術進步之研磨物件。 以上發明内容非意欲描述本發明各實施方案之各揭示實 施例。以下圖式簡單說明及實施方式將更具體地例舉說明 性實施例。 161856.doc 201238716 【實施方式】 本發明可參照附圖進一步定義。 於以下淪述中,參照構成該論述一部分及以說明數個具 體實施例之方式顯示之附圖。應理解,在不脫離本發明範 圍或精神下可涵蓋及實施其他實施例。因此,以下實施方 式不應作限制理解。 除非另外說明,否則表示用於說明書及專利申請範圍中 之特徵尺寸、量及物理性質之所有數字應視為在所有情況 中藉由術語「約」修飾。因此’除非另外說明,否則在說 明書及附接專财請範巾所㈣之數字參數係近似值, 其等可視由熟習本項技術者使用本文中所揭示之教義而獲 得之所需性質變化。含端點之數字範圍包括在彼範圍内之 所有數字(例如,^5包括1' 1.5、2、2 75、3、38()、4 及5 )及在彼範圍内之任何範圍。 可撓背襯 所提供之研磨物件及方法包括具 表面之-可挽背概。可用於所提供之研磨置物:中= 撓背襯一般係研磨技藝中已知夕Μ^ η名仪知之彼荨物。其等包括聚合基 板,例如,聚酿、聚碳酸醋、聚丙稀、聚乙稀、纖維素、 聚㈣、㈣亞胺、聚石夕氧及聚四氣乙稀;金屬箱片,包 括紹、銅、錫及青銅;及紙張,句 巴括增密牛皮紙及聚合塗 覆紙。 可撓背襯之材料包含在其第 複製微結構。於一些實施例中 二主表面之至少一部分上之 ’包含一複製微結構之分離 I61856.doc • 6 - 201238716 背襯可經選擇以提供在整個工件上展現均一材料移除, 即,良好均一性及平坦度(包括平整度)之研磨構造。重要 的是,可撓背襯之材料性質及包含於其上之複製微結構特 徵具有使工件表面之所有維度(尤其工件邊緣)平滑之材料 性質》 所提供之研磨物件包括一研磨層,該研磨層包含保留於 至少一黏結劑中之複數個研磨粒子,該研磨層佈置於該可 撓背襯之第一主表面上,其中該可撓背襯之第二主表面中 之至少一部分包括具有凹口之複製微結構。可用於所提供 之物件及方法中之適宜研磨粒子包括熔融氧化鋁、熱處理 氧化鋁、白熔融氧化鋁、黑碳化矽、綠碳化矽、二硼化 鈦、碳化硼、碳化鎢、碳化鈦、金剛石(天然及合成,包 括多晶金剛石)、氧化石夕、氧化鐵、氧化鉻、氧化鈽、氧 化锆、氧化鈦'矽酸鹽、氧化錫、立方氮化硼、石榴石、 熔融氧化鋁氧化錯、溶凝膠研磨粒子及類似者。溶凝膠磨 粒粒子之㈣可參見美國專利案4,314,827(Leitheis4 人)、4,623,364(Cottringer 等人)、4,744,8〇2(Schwabei)等 人 ' 4,770,671(M〇nroe等人)及4,88l,951(w〇〇d等人)。 如本文中所❹’術語研磨粒子亦涵蓋研磨粒子與聚合201238716 VI. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to abrasive articles that can be used to polish composite materials. [Prior Art] A workpiece such as a read/write head for the hard disk drive (HDD) industry has a very hard and extremely soft composite material, which is generally subjected to polishing and polishing by using an abrasive article. The extremely soft material that makes up the read/write sensor is located at the edge of an extremely hard material such as alumina titania carbide (AlTiC). Since high pressure is required to remove the hard AlTiC material, it is applied to a pressure of 4 oz. If the abrasive substrate has a sufficiently low modulus, the load on the workpiece can cause the abrasive surface to shift. This can result in the abrasive material accumulating on the edge of the workpiece. Excessive abrasive on the edge of the workpiece can result in accelerated edge removal, or generally referred to as "crown" or "edge roll-off." This crowning effect destroys the sensor located on the edge of the workpiece. Multilayer abrasive articles with compliant pressure sensitive adhesives can exacerbate the crown of the read/write head. 1 is a schematic view of a polishing article system in accordance with one of the prior art techniques, in which abrasive particles 12 are dispersed in a binder 13 (forming an abrasive layer) on a first major surface i8a of the flexible backing 18, The flexible backing 18 has an adhesive layer 14 applied to the second major surface 18b of the abrasive article. The layer of adhesive (e.g., a layer of pressure sensitive adhesive) secures the abrasive article to the rigid support 22. When the components in the abrasive article 1 are compared, the adhesive layer is softer than the flexible backing and the abrasive particles (i.e., has a lower Young's modulus). As shown in Figures 1 and 2, in use, the workpiece 20 161856.doc 201238716 is exposed to the abrasive layer (including the abrasive particles 18a and the binder 13) under load P. The workpiece and the load applied thereto deform the relatively soft adhesive layer 14 in such environments. The contours of the flexible substrate 18 and the abrasive layer 13 will follow the deformation of the adhesive layer, resulting in rounding or crowning of the workpiece edges. In addition, the high stress at the edge of the workpiece 2 can also cause the edge of the workpiece to be rounded. SUMMARY OF THE INVENTION It is necessary to solve the workpieces to be polished, in particular, for the workpieces used in the sensitive electronics industry (such as 'reading/writing heads for hard disk drives or thin hard disk drives, drive itself) The problem of crowning occurs on the top. The abrasive article and method of the present invention is advantageous in that it extends the lifespan, allows the material to be easily removed from the workpiece, the ability to be polished to precision machining, and a high removal rate. In addition, they prevent crowning of the edges of the workpieces and make a more suitable product. In one aspect, an abrasive article is provided that includes a flexible backing having one of opposing first and second major surfaces; and an abrasive layer comprising a plurality of abrasive particles retained in at least one bonding agent, An abrasive layer disposed on the first major surface of the flexible backing, wherein at least a portion of the second major surface of the flexible backing comprises a replica microstructure having a recess; and an adhesive, wherein the adhesive is substantially Included in the recesses of the replicated microstructures. The article can further include a release liner that contacts one of the rigid substrates with at least a portion of the replicated microstructures or with at least a portion of the adhesive. The flexible backing may have a modulus of yang greater than about 0.5 gigapascals (GPa) or even greater than 2 GPa, and may include, among other possible shapes, a rod, a triangular body, a pyramidal cone, a truncated pyramid, a cone Shape, head-shaped conical body, spherical body or ellipsoidal body. 161836.doc 201238716 In another aspect, a polishing method is provided, comprising: providing a workpiece in contact with an abrasive article comprising: a first back and a second major surface a lining comprising an abrasive layer of a plurality of abrasive particles retained in at least one binder, the abrasive layer being disposed on the first major surface of the flexible backing, wherein the second major surface of the flexible backing is At least a portion comprising a replica microstructure having a recess, an adhesive; and a rigid substrate in contact with at least a portion of the replica microstructures, wherein the adhesive is substantially received in the recess of the replica microstructure; The abrasive article moves relative to the workpiece. The abrasive article is moved relative to the workpiece' thereby polishing a surface of the workpiece. In general, a load is applied to the workpiece. The abrasive articles and methods provided can be used to polish workpieces that require aurora/month and flatness throughout their dimensions. The removable backside including the replica microstructure supports the load that can be applied to the workpiece during polishing by a rigid substrate. The replica microstructures are subjected to a portion of the load, transferring at least a portion of the load to the rigid substrate, thereby reducing or eliminating adhesive deformation. The adhesive is substantially contained within the recesses of the replicated microstructures such that the replicated microstructures are in direct contact with the rigid substrate. The abrasive articles and methods provided provide finished articles with excellent flatness, thereby providing abrasive articles with long life, ease of application, easy removal, precision machining, and high removal rate benefits over crown reduction techniques. The above summary is not intended to describe the disclosed embodiments of the various embodiments of the invention. The illustrative embodiments will be more specifically illustrated by the following detailed description of embodiments and embodiments. 161856.doc 201238716 [Embodiment] The present invention can be further defined with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS In the following description, reference is made to the accompanying drawings, Other embodiments may be covered and implemented without departing from the spirit and scope of the invention. Therefore, the following embodiments are not to be construed as limiting. All numbers expressing feature sizes, quantities, and physical properties used in the specification and claims are to be construed as being modified by the term "about" in all instances. Therefore, unless otherwise stated, the numerical parameters of the specification (4) in the specification and attached financial statements are approximate, and the like may be changed by the skill of the person skilled in the art using the teachings disclosed herein. The numerical range with endpoints includes all numbers within the range (for example, ^5 includes 1' 1.5, 2, 2 75, 3, 38(), 4, and 5) and any range within the scope. The flexible article and method provided by the flexible backing include a surface-retractable profile. It can be used for the provided abrasive deposits: medium = scratched backing is generally known in the art of grinding. The materials include polymerized substrates, for example, polystyrene, polycarbonate, polypropylene, polyethylene, cellulose, poly(tetra), (tetra)imine, polyoxet and polytetraethylene; metal box, including Copper, tin and bronze; and paper, sentenced with dense kraft paper and polymer coated paper. The material of the flexible backing is contained in its first replica microstructure. In some embodiments, the separation of at least a portion of the two major surfaces comprises a replica microstructure. I61856.doc • 6 - 201238716 The backing can be selected to provide uniform material removal throughout the workpiece, ie, good uniformity And the polishing structure of flatness (including flatness). Importantly, the material properties of the flexible backing and the replicated microstructure features contained thereon have material properties that smooth all dimensions of the surface of the workpiece, particularly the edge of the workpiece. The abrasive article provided includes an abrasive layer, the abrasive The layer includes a plurality of abrasive particles retained in the at least one binder, the abrasive layer disposed on the first major surface of the flexible backing, wherein at least a portion of the second major surface of the flexible backing comprises a concave The copy of the micro-structure. Suitable abrasive particles that can be used in the articles and methods provided include fused alumina, heat treated alumina, white fused alumina, niobium carbide, green niobium carbide, titanium diboride, boron carbide, tungsten carbide, titanium carbide, diamond (natural and synthetic, including polycrystalline diamond), oxidized stone, iron oxide, chromium oxide, cerium oxide, zirconia, titanium oxide 'tantalate, tin oxide, cubic boron nitride, garnet, oxidized alumina oxidation error , gel-gel abrasive particles and the like. The sol-gel abrasive particles can be found in U.S. Patent Nos. 4,314,827 (Leitheis 4), 4,623,364 (Cottringer et al.), 4,744, 8〇2 (Schwabei) et al. 4,770,671 (M〇nroe et al.) and 4,88 l, 951 (w〇〇d et al.). As used herein, the term abrasive particles also encompass abrasive particles and polymerization.

密之氧化矽。研磨聚結物進— 研磨材料/氧化矽聚結 之溫度下之退火步驟增 步描述於美國專利案 161856.doc 201238716 4,311,489(Kressner)、4,652,275(Bloecher等人)、4,799 939 (Bloecher 等人)、5,500,273(H〇lmes 等人)、6 645 624 (Adefris等人)、7,044,835(Mujumdar等人)。或者,可藉由 粒子間相互吸引力將研磨粒子結合一起,如美國專利案 5’201,916(8!^等人)中所描述。常見研磨聚結物包括具有 金剛石作為研磨粒子及氧化矽作為結合成分之聚結物。當 使用聚結物時,包含於該聚合物中之單個研磨粒子之尺寸 可介於0.1至50微米(pm)(;0.0039至2.〇密耳),較佳〇 2至2〇 μηι(0.0079 至 0.79 密耳)及最佳 〇.5 至 5 μηι(〇 〇2〇 至 〇2〇 密耳) 之間。 研磨粒子之平均粒子尺寸可小於15〇 μηι(5·9密耳),一般 而言,小於100 μιη(3·9密耳)或甚至小於5〇 _(2〇密耳卜 研磨粒子之尺寸一般係指其最長維度。一般而言,存在粒 子尺寸範圍分佈。於—些情;兄中,該粒子尺寸分佈可經嚴 格控制以使所獲得之研磨物件在經研磨之工件上提供一致 表面力σ工。 另一類有用研磨粒子係金屬基研磨粒子,其具有:具有 一圓周之實質橢球形含金屬基質及至少部分嵌埋於該含金 屬基質之圓周内之具有小於5〇 μιη,較佳小於8叫之平均 直徑之超研磨材料。此等研磨粒子可藉由將含金屬基質 (主要為橢球體)、超研磨粒子及研磨介質裝入一容器中製 成°隨後’ -般可在室溫下’使該容器滾動一段時間。雖 然不受理論約束’然而據信’該研磨製程會逼使超研磨材 料滲透入、附接至及凸伸出該含金屬基質。含金屬基質之 161856.doc 201238716 圓周自純金屬或金屬合金轉變為超研磨劑與金屬或金屬合 金之複合物。含金屬基質中靠近圓周之亞表面亦含有超研 磨材料’並將此視為嵌埋於含金屬基質中。此金屬基研磨 粒子揭示於受讓人共同申請中之美國專利申請公開案 2010/0000160(Lugg等人)中。 可以某些材料塗覆研磨粒子以提供該等粒子所需之特 性。例如,已發現,施用至研磨粒子表面之材料會改良研 磨粒子與黏結劑之間之黏著。此外,當將軟化粒狀可固化 黏結劑材料用作黏結劑時,施用至研磨粒子表面之材料可 改良研磨粒子之黏著。或者,表面塗層可改變及改良所獲 得之研磨粒子之切割特性。此等表面塗層描述於,例如, 美國專利案 5,011,508(Wald 等人)、3,〇4U56(R〇wse 等 人)、5,〇〇9,675(KUnz等人)、4,997,461(Markh〇ff_Matheny 等人)、5,213,591(Celikkaya等人)、5,085,671(Martin等人) 及 5,042,991(Kunz 等人)中。 所提供之研磨物件及方法可包括習知經塗覆研磨物件、 塗層(底塗層、膠結塗層及表膠塗層)及材料。示例性經塗 覆之研磨物件描述於美國專利案5,378,252(F〇丨丨、 美國專利案5,834,109(Follett等人)及美國專利案6,979,713 (Barber)中。所提供之研磨物件及方法可包括經成型或結 構化之研磨塗層。成型或結構化意指該研磨塗層具有凸起 及凹陷部分°包含經成型或圖案化之研磨塗層之示例 性研磨物件可在商品名TRIZACT下自3Μ Company,St. ,MN購置。其等基本上描述於美國專利案5,152,917 16I856.doc 201238716 (Pieper等人)中。於所提供之 磨物件之其他研光材料亦描述;^及專方=可用作研 (Gagnardi^)^ 〇 ^於美國專利案$,彻,如 可將研磨粒子部分地钱埋至可撓背襯之第一對置 2可藉由該可撓背襯維持於原位。亦可藉由熱結合、超音 ^接或微波激活結合將研磨粒子結合至可撓背概 者主可使用黏結劑以將該等研磨粒子固定至可撓背襯之第 面上。用於將研磨粒子固定至可撓背襯之第-表面上 之有用黏結劑係為本技藝一般熟練者熟知及點著劑。 適宜黏結劑前驅物一般係呈未固化或未交聯狀態在或 接近周圍條件下可流動。隨後一般使該點結劑前驅物曝露 於使黏結劑前驅物至少部分固化或交聯(即,自由基聚人) 之條件(通常為能源),藉此將其轉化為可持留分散研磨^ 子之黏結劑。示例性能量源包括:電子束 '紫外輻射、可 見光輻射、紅外輻射、γ·輻射、熱及其等組合。 可使用之聚(曱基)丙稀酸自旨包括具有至少兩(曱基)丙烯 酸酿基之單體及/或寡聚物;例如,三(甲基)丙稀酸醋,及 四(曱基丙烯酸酯)。示例性聚(甲基丙烯酸S旨)包括:二(甲 基)丙烯酸醋,如,例如,二(甲基)丙烯酸丨,3_ 丁二醇酿、 =(甲基)丙料M_ 丁二醇西旨、二(甲基)丙烤酸Μ·己二醇 酯、單(甲基)丙烯酸丨,6·己二醇酯、二(曱基)丙烯酸乙二醇 酉曰炫·氧化月曰族二(甲基)丙稀酸酯、烧氧化二(曱基)丙烯 酸環己烷二甲醇酯、烷氧化二(甲基)丙烯酸己二醇酯、烷 氧化一(曱基)丙稀酸新戊二醇酯、己内酯改質之羥基三甲 I61856.doc •10· 201238716 基乙酸二(甲基)丙烯酸新戊二醇酯、二(甲基)丙烯酸環己 烷二甲醇酯、二(甲基)丙烯酸二乙二醇酯、二(甲基)丙烯 酸二丙二醇酯、乙氧化(10)二(甲基)丙烯酸雙酚A酯、乙氧 化(3)二(甲基)丙烯酸雙酚A酯、乙氧化(30)二(甲基)丙烯酸 雙酚A酯、乙氧化(4)二(甲基)丙烯酸雙酚A酯、羥基三甲 基乙醛改質之二(甲基)丙烯酸三羥曱基丙酯、二(曱基)丙 烯酸新戊二醇酯、二(曱基)丙烯酸聚乙二醇(200)酯、二 (甲基)丙烯酸聚乙二醇(400)自旨、二(曱基)丙烯酸聚乙二醇 (600)酯、丙氧化二(甲基)丙烯酸新戊二醇酯、二(曱基)丙 烯酸四乙二醇酯、二(甲基)丙烯酸三環癸烷二甲醇酯、二 (甲基)丙烯酸三乙二醇酯、二(甲基)丙烯酸三丙二醇酯; 三(甲基)丙烯酸酯,如三(曱基)丙烯酸甘油酯、三(曱基)丙 烯酸三羥曱基丙酯、乙氧化三(甲基)丙烯酸酯(例如,乙氧 化(3)三(曱基)丙烯酸三羥甲基丙酯、乙氧化(6)三(甲基)丙 烯酸三羥甲基丙酯、乙氧化(9)三(甲基)丙烯酸三羥曱基丙 S旨、乙氧化(20)三(甲基)丙烯酸三羥甲基丙酯)、三(甲基) 丙烯酸異戊四醇酯、丙氧化三(甲基)丙烯酸酯(例如,丙氧 化(3)三(曱基)丙烯酸甘油酯、丙氧化(5.5)三(曱基)丙烯酸 甘油酯、丙氧化(3)三(曱基)丙烯酸三羥曱基丙酯、丙氧化 (6)三(甲基)丙烯酸三羥曱基丙酯)、三(曱基)丙烯酸三羥曱 基丙醋、三(甲基)丙烯酸三(2-羥乙基)異氰尿酸酯;及含 較咼官能度(曱基)丙稀酸基之化合物,如四(曱基)丙稀酸 雙•三羥曱基丙酯、五(甲基)丙烯酸二異戊四醇酯、乙氧化 (4)四(甲基)丙烯酸異戊四醇酯、四(曱基)丙烯酸異戊四醇 161856.doc •11- 201238716 酯、己内酯改質之六(甲基)丙烯酸二異戊四醇醋;寡聚(甲 基)丙烯酸基化合物,如,例如,聚酯(甲基)丙烯酸酯、環 氧基(甲基)丙烯酸酯;及其等組合。此等化合物可廣泛地 自供應商獲得,如,例如,Sartomer c〇. of Exton,PA、 UCB Chemicals Corporation of Smyrna及 Aldrich ChemicalA dense cerium oxide. Grinding agglomerates into - an annealing step at the temperature at which the abrasive material/cerium oxide is coalesced is described in U.S. Patent No. 161,856.doc 201238716 4,311,489 (Kressner), 4,652,275 (Bloecher et al.), 4,799,939 (Bloecher et al. ), 5,500,273 (H〇lmes et al.), 6 645 624 (Adefris et al.), 7,044,835 (Mujumdar et al.). Alternatively, the abrasive particles can be joined together by mutual attraction between the particles as described in U.S. Patent 5,201,916 (8!^ et al.). Common abrasive agglomerates include agglomerates having diamond as abrasive particles and cerium oxide as a binding component. When agglomerates are used, the size of the individual abrasive particles contained in the polymer may range from 0.1 to 50 microns (pm) (; 0.0039 to 2. mils), preferably 〇 2 to 2 〇 μη (0.0079) Between 0.79 mils and the best 〇.5 to 5 μηι (〇〇2〇 to 〇2〇 密). The average particle size of the abrasive particles can be less than 15 〇μηι (5·9 mil), in general, less than 100 μηη (3·9 mils) or even less than 5 〇 _ (2 〇 密 磨 abrasive particles are generally Refers to its longest dimension. In general, there is a range of particle size distributions. In some cases, the particle size distribution can be tightly controlled to provide a consistent surface force σ on the ground workpiece. Another type of useful abrasive-based metal-based abrasive particles having a substantially ellipsoidal metal-containing matrix having a circumference and at least partially embedded within the circumference of the metal-containing substrate having less than 5 μm, preferably less than 8, Ultra-abrasive material of average diameter. These abrasive particles can be made by filling a metal-containing matrix (mainly ellipsoid), superabrasive particles and grinding media into a container. Then, at room temperature 'Rotate the container for a period of time. Although not bound by theory', it is believed that the grinding process forces the superabrasive material to penetrate, attach to, and protrude out of the metal-containing matrix. 161856.doc 201238716 The circumference transforms from a pure metal or metal alloy to a composite of a superabrasive and a metal or metal alloy. The subsurface near the circumference of the metal-containing matrix also contains a superabrasive material' and is considered to be embedded in the metal-containing In the matrix, the metal-based abrasive particles are disclosed in U.S. Patent Application Publication No. 2010/0000160 (Lugg et al.), the entire disclosure of which is incorporated herein by reference. For example, it has been found that the material applied to the surface of the abrasive particles improves the adhesion between the abrasive particles and the binder. Further, when the softened particulate curable binder material is used as a binder, the material applied to the surface of the abrasive particles can be The adhesion of the abrasive particles is improved. Alternatively, the surface coating can modify and modify the cutting characteristics of the obtained abrasive particles. Such surface coatings are described, for example, in U.S. Patent No. 5,011,508 (Wald et al.), 3, 〇4U56. (R〇wse et al.), 5, 〇〇9,675 (KUnz et al.), 4,997,461 (Markh〇ff_Matheny et al.), 5,213,591 (Celikkaya et al.), 5,085,671 (Martin et al). And 5,042,991 (Kunz et al.) The abrasive articles and methods provided may include conventionally coated abrasive articles, coatings (primer coatings, cementitious coatings, and topcoats) and materials. The coated abrasive article is described in U.S. Patent No. 5,378,252, issued to U.S. Patent No. 5,834,109 (Follett et al.) and U.S. Patent No. 6,979,713 (Barber). The provided abrasive article and method can include molded or Structured abrasive coating. Formed or structured means that the abrasive coating has raised and recessed portions. An exemplary abrasive article comprising a shaped or patterned abrasive coating is available under the trade name TRIZACT from 3Μ Company, St. ., MN purchase. It is basically described in U.S. Patent No. 5,152,917, 16 I 856.doc 201238716 (Pieper et al.). Other polishing materials for the abrasive articles provided are also described; ^ and the prescription = can be used as a research (Gagnardi^) ^ 〇 ^ in the US patent case, and if the abrasive particles can be partially buried in the flexible The first opposing 2 of the backing can be maintained in place by the flexible backing. The abrasive particles can also be bonded to the flexible backing by means of thermal bonding, supersonic bonding or microwave activation bonding. The bonding agent can be used to secure the abrasive particles to the front surface of the flexible backing. Useful binders for securing abrasive particles to the first surface of the flexible backing are well known and accommodating to those skilled in the art. Suitable binder precursors generally flow in an uncured or uncrosslinked state at or near ambient conditions. The puncture precursor is then typically exposed to conditions (usually energy sources) that at least partially cure or crosslink the binder precursor (ie, free radicals), thereby converting it into a retentive dispersion grind. Adhesive. Exemplary energy sources include: electron beam 'ultraviolet radiation, visible light radiation, infrared radiation, gamma radiation, heat, and the like. Poly(indenyl)acrylic acid which may be used is intended to include monomers and/or oligomers having at least two (indenyl) acrylic acid groups; for example, tris(meth)acrylic acid vinegar, and tetrakis(曱) Acrylate). Exemplary poly(methacrylic acid S) includes: di(meth)acrylic acid vinegar, such as, for example, bismuth (meth) acrylate, 3 - butane diol, = (methyl) propylene M_ butanediol 、, bis(methyl)propene sulphate·hexanediol ester, bis(meth)acrylic acid oxime, 6·hexanediol ester, bis(indenyl)acrylic acid glycol hydrazine·oxidation (Methyl) acrylate, oxidized bis(indenyl) acrylate cyclohexane dimethanol ester, alkoxylated hexane (meth) acrylate, alkoxylated mono(indenyl) acrylate dipentane Alcohol ester, caprolactone modified hydroxy trimethyl I61856.doc •10· 201238716 ketoacetic acid di(meth)acrylic acid neopentyl glycol ester, di(meth)acrylic acid cyclohexanedimethanol ester, di(methyl) Diethylene glycol acrylate, dipropylene glycol di(meth)acrylate, bisphenol A ethoxylate (10) di(meth)acrylate, bisphenol A ethoxylate (3) di(meth)acrylate, B Oxidation of (30) bis(A) bis (meth) acrylate, ethoxylated (4) bis (meth) bisphenol A ester, hydroxytrimethyl acetaldehyde modification Di(hydroxy) propyl (meth) acrylate, neopentyl glycol di(indenyl) acrylate, polyethylene glycol (200) bis(meth) acrylate, poly(ethylene) di(meth) acrylate Alcohol (400) from the purpose, polyethylene (600) ester of bis(indenyl)acrylate, neopentyl glycol di(meth)acrylate, tetraethylene glycol bis(decyl)acrylate, Tricyclodecane dimethanol ester of methyl)acrylic acid, triethylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate; tris(meth)acrylate such as tris(decyl)acrylic acid glycerin Ester, tris(hydroxy)propyl tris(decyl) acrylate, tris(meth) acrylate (for example, ethoxylated (3) tris(mercapto)acrylic acid trimethylol propyl ester, ethoxylated (6) Trimethylolpropyl tris(meth)acrylate, ethoxylated (9) tris(meth)acrylic acid trishydroxypropyl propyl S, ethoxylated (20) tris(methyl) propyl tris(meth)acrylate) , tris(meth)isobornyl acrylate, tris(meth)acrylate (for example, propoxylated (3) tris(fluorenyl) propyl Glyceryl ester, propane oxidized (5.5) tris(decyl) acrylate, propoxylated (3) tris(mercapto)acrylic acid trishydroxypropyl propyl ester, propoxylated (6) tris(meth)acrylic acid trishydroxyindole Propyl propyl ester), tris(mercapto)acrylic acid trishydroxypropyl propyl vinegar, tris(2-hydroxyethyl)isocyanurate tris(meth)acrylate; and fluorene-containing thiol-based propylene Acid-based compounds such as tetras(mercapto)acrylic acid bis-trihydroxydecyl propyl ester, diisopentyl pentoxide (meth) acrylate, ethoxylated (4) tetrakis(meth) acrylate Alcohol ester, tetrakis(indenyl)isopentaerythritol 161856.doc •11- 201238716 ester, caprolactone modified hexa(meth)acrylic acid diisoamyl alcohol vinegar; oligomeric (meth)acrylic compound For example, polyester (meth) acrylate, epoxy (meth) acrylate; and combinations thereof. Such compounds are widely available from suppliers such as, for example, Sartomer c〇. of Exton, PA, UCB Chemicals Corporation of Smyrna and Aldrich Chemical

Company of Milwaukee,WI。 黏結劑前驅物可包含有效量之至少一光引發劑;例如, 自0.1、1或3重量百分比,至高達5、7或甚至1〇重量百分 比或更大之量。可使用之光引發劑包括已知可用於自由基 光固化(曱基)丙烯酸之彼等物。示例性光引發劑包括苯偶 姻及其衍生物,如(X-甲基苯偶姻、α_苯基苯偶姻、α_烯丙 基本偶姻、α-~基本偶姻;苯偶姻醚,如苯偶醯二甲基縮 酮(自 Ciba Specialty Chemicals, Tarrytown,ΝΥ 購置之 IRGACURE 651)、苯偶姻甲基醚、苯偶姻乙基醚、苯偶姻 正丁基醚;苯乙酮及其衍生物,如2-羥基-2-甲基-l-苯基- 1_ 丙酮(自 Ciba Specialty Chemicals購置之 DAROCUR 1173) 及1-經基環己基苯基酮(自Ciba Specialty Chemicals購置之 IRGACURE 184)、2·曱基-l-[4-(曱硫基)苯基]-2-(4-嗎啉 基)-1-丙酮(自 Ciba Specialty Chemicals購置之 IRGACURE 907)、2-’基-2-( 一甲基胺基)-1-[4-(4·嗎嘴基)苯基]-1-丁 酮(自 Ciba Specialty Chemicals購置之 IRGACURE 369)及苯 基雙(2,4,6·三曱基苯甲醯基)氧化膦(自Ciba Specialty Chemicals,NY購置之IRGACURE 819)。其他可使用之光 引發劑包括早_及雙-酿基滕(例如,自Ciba Specialty 161856.doc 12 201238716Company of Milwaukee, WI. The binder precursor can comprise an effective amount of at least one photoinitiator; for example, from 0.1, 1 or 3 weight percent, up to 5, 7 or even 1 weight percent or greater. Photoinitiators which can be used include those known to be useful in free radical photocuring (fluorenyl) acrylic acid. Exemplary photoinitiators include benzoin and its derivatives, such as (X-methylbenzoin, alpha-phenylbenzoin, alpha-allyl acylate, alpha-~ basic acyloin; benzoin Ethers such as benzoin dimethyl ketal (IRGACURE 651 from Ciba Specialty Chemicals, Tarrytown, )), benzoin methyl ether, benzoin ethyl ether, benzoin n-butyl ether; phenyl Ketones and derivatives thereof, such as 2-hydroxy-2-methyl-l-phenyl-1_acetone (DAROCUR 1173 available from Ciba Specialty Chemicals) and 1-cyclohexylphenyl ketone (purchased from Ciba Specialty Chemicals) IRGACURE 184), 2· Mercapto-l-[4-(indolylthio)phenyl]-2-(4-morpholinyl)-1-propanone (IRGACURE 907 purchased from Ciba Specialty Chemicals), 2-' Benzyl-2-(monomethylamino)-1-[4-(4·?)-phenyl]-1-butanone (IRGACURE 369 purchased from Ciba Specialty Chemicals) and phenyl bis (2,4) , 6·trimercaptobenzylidene) phosphine oxide (IRGACURE 819 available from Ciba Specialty Chemicals, NY). Other photoinitiators that can be used include early- and double-branched (eg, from Ciba Specialty 161856. Doc 12 201238716

Chemicals 購置之 IRGACURE 1700 > IRGACURE 1800、 IRGACURE 1850及 DAROCUR 4265) 〇 黏結劑前驅物可包含有效量之至少一熱引發劑;例如, 自0.1、1或3重量百分比’至尚達5、7或甚至1〇重量百分 比或更大之量。示例性熱自由基引發劑包括:偶氮化合 物,如,例如,2,2-偶氮-雙異丁腈、二曱基2,2,·偶氮雙 (異丁酸酯)、偶氮雙(二苯基甲烷)、4,4,-偶氮雙_(4_氰基戊 酸)、2,2’-偶氮雙(2,4·二甲基戊腈)(自E j du p〇nt心IRGACURE 1700 > IRGACURE 1800, IRGACURE 1850 and DAROCUR 4265, purchased from Chemicals, may contain an effective amount of at least one thermal initiator; for example, from 0.1, 1 or 3 weight percent 'to Shangda 5, 7 or Even 1% by weight or more. Exemplary thermal free radical initiators include: azo compounds such as, for example, 2,2-azo-bisisobutyronitrile, dimercapto 2,2, azobis(isobutyrate), azobis (diphenylmethane), 4,4,-azobis-(4-cyanovaleric acid), 2,2'-azobis(2,4.dimethylpentanenitrile) (from E j du p 〇nt heart

Nemours and Co. 〇f Wilmington, DE之VAZO 52);過氧化 物,如,例如,過氧化苯甲醯、過氧化異丙苯、過氧化第 二丁基、過氧化環己酮、過氧化戊二酸及過氧化二月桂 基,過氧化氫;氫過氧化物,如,例如,第三丁基氫過氧 化物及氫過氧化異丙苯;過酸,如,例如,過乙酸及過苯 甲酸;過硫酸鉀;及過酯,如,例如,過碳酸二異丙酯。 於些貫施例中,黏結劑前驅物宜包括一或多種單乙烯 性不飽和自由基可聚合化合物,例如,以降低所得之黏結 劑之黏度及/或降低交聯密度。示例性單乙稀性不飽和自 由土可聚&amp;化合物包括:單(甲基)丙烯酸酯,包括(甲基) 丙烯酸己醋、丙烯酸2_乙基己醋、(甲基)丙烯酸異壬醋、 (甲基)丙烯酸異冰片酷、(甲基)丙烯酸苯氧乙S旨、(甲基)丙 烯酸2红基乙、(甲基)丙烯酸十二炫醋、(甲基)丙稀酸 (甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(曱基)丙 ㈣正丁酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異丁 知、(甲基)丙稀酸環己醋或(曱基)丙稀酸十八院醋;N_乙 I6I856.doc 201238716 烯基化合物,如,例如,Ν·乙烯基甲醯胺、N_乙烯基吡咯 啶酮或N-乙烯基己内醯胺;及其等組合。 於一些實施例令,研磨層亦可包含一或多種添加劑。該 等添加劑可包括抗氧化劑、|色劑、熱及/或光穩定劑或 填充劑(實質上不影響研磨性能之填充劑)中之一或多者。 因此,該黏結劑可自包含研磨粒子、表面活性劑及分散有 研磨粒子之添加劑(例如,作為漿料)之黏結劑前驅物製 備。 微結構 所提供之研磨物件包含具有對置之第一及第二主表面之 一可撓背襯。該可撓背襯之第二主表面中之至少一部分包 含具有凹口之複製微結構。該等複製微結構係整合至可撓 背襯。整合意指該等複製微結構係可撓背襯(例如,可撓 背襯之第二表面)之一部分。該等複製微結構可自一共用 基底(即,可撓背襯)延伸、佈置於一不同背襯上及其等組 合’藉此形成凸起(複製微結構之遠端)及凹口。於一些實 施例中,該等複製微結構可係可撓背襯材料之延伸,如, 例如,該等複製微結構係與可撓基板同時形成、模製或壓 紋或直接於該可撓基板上生長之情況。 於一些實施例中,該等複製微結構在該可撓背襯之第二 表面中形成凹口,即,其等藉由紋理化製程(例如,壓紋) 在忒可撓背襯上形成紋理化表面。可使用之可撓背襯已在 上文出示及包括聚酯、聚碳酸酯、聚丙烯、聚乙烯、纖維 素、聚醯胺、聚醯亞胺、聚矽氧及聚四氟乙烯;金屬箔 161856.doc -14· 201238716 片,包括铭、銅、錫及青銅;及紙張,包括增密牛皮紙及 聚合塗覆紙。 或者**亥等複製微結構可佈置或形成於一不同背襯上。 該不同背襯可呈可撓性或剛性。隨後可將該不同背概結構 性接合至該可撓背襯之第二側面。可使用任何不同背概, 然而’該* JSJ背襯應不會明.顯?文變可挽背概-尤其靠近可 形成研磨元件之頂表面處之整體模量。當使用一不同背概 時,第一背襯上之複製微結構可利用不同機構(包括,例 如黏性組合物(如結構黏著劑)、音波溶接、熱炫接、機 械式緊固件及其等組合)結構性接合至可撓背襯。 複製微結構可具有某一形狀。此等形狀之實例包括棒 體、三角形體、稜錐形體、截頭稜錐形體、圓錐形體、截 頭圓錐形體、立方角、立方體、球形體或橢球形體。該等 複製微結構可具有形成隆脊之伸長形狀。於一些實施例 中,隆脊具有三角形或截頭三角形(具有平坦頂端之三角 形)之橫戴面。於其他實施例中,隆脊可具有長方形、正 方形或梯形橫截面。或者,該等複製微結構可呈隨機形 狀。由於該等複製微結構係複製體,故一般而言,該等複 製微結構之三維形狀或該等複製微結構之二維橫截面具有 相對可撓背襯之第二主表面平面成約90。或更大之角之側 壁。換言之,複製微結構之形狀一般不包含無法輕易自模 具移除同時保留複製微結構之特徵之底切部分。 ' J如本文中所定義’「複製微結構」係可藉由複製或重複 製程建立之微結構。此等製程包括為複製微結 161856.doc 201238716 般技術者所熟知之複製製程,如,例如,壓紋、射出成 型、洗鎮及固化、熱形成或網印。 複製微結構可依照不同方法形成,包括,例如,模製、 擠製、壓紋及其等組合。形成微結構元件之可使用方法描 述於’例如’美國專利案5,897,930(Calh〇un等人)、 5,183,597(Lu)、4,588,258(Hoopman)、4,576,850(Martens) 及4,374,077(Kerfeld)f。用於製造複製微結構之其他可使 用方法包括美國專利案5,958,794(Bruxvoort等人)中所揭示 之製造三維研磨物件之基本方法。亦可藉由各種其他方法 製造複製微結構。例如,可藉由使母工具(master t〇〇丨)形 成生產工具之澆鑄及固化製程將複製微結構自母工具轉移 至諸如聚合材料帶或腹板之其他介質。隨後可利用上述複 製方法中之任一者將此生產工具用於製造包含複製微結構 之微複製結構。可將諸如電鑄之其他方法用於複製該母工 具。 製造複製微結構之另一替代方法係直接切割或機械加工 i可撓寺襯材料之第二主表面以形成複製微結構。針對此 的可採用諸如化學蝕刻、雷射切除、珠粒喷擊之技術或 -隨機表面改質技術。當將微結構直接切割至可撓背襯 主表面時,若該製程在某些類型之電腦系統控制下 ::重複地引導諸如切除雷射器之切割工具以製造具有複 ^ 構之多個可繞背概’則將該等微結構視為「複製微 ;構」關於製造具有複製微結構之可撓背襯之其他内容 〇 例如’美國專利申請公開案2010/0277802 16I856.doc -16 - 201238716 (Gardiner 等人)。 黏著劑 所提供之研磨物件及方法包含在可撓背襯與剛性基板之 間提供黏性之黏著劑β於一些實施例中,該黏著劑可與一 釋放襯墊接觸。可提供黏性之任何黏著劑適宜用於本發明 中。該黏著劑實質上容納於複製微結構之凹口中。「實質 上容納於」意指該黏著劑佔據在可撓背襯之相反第二主表 面上之複製微結構中之凹口之大部分容積。當存在剛性基 板時,凹口之容積係藉由凹口壁與該剛性基板所界定之容 積。當剛性基板不存在時,凹口之容積係藉由凹口壁與橫 跨複製微結構遠端之一平面所界定之容積。於所提供之物 件及方法中,黏著劑可佔據該等凹口容積之大於約15容積 百分比、大於約25容積百分比或甚至大於約35容積百分 比。於一些實施例中,黏著劑之體積可大於凹口之容積, 為凹口容積之11〇%、120%或甚至13〇%大,一般不超過凹 口容積之1 50%。此外,該黏著劑可恰好約佔據凹口之整 個容積,或可佔據凹口容積之小於約85容積百分比,小於 約75容積百分比或甚至小於約65容積百分比。 此外,「實質上容納於」意指在形成可撓背襯之第二主 表面之複製微結構遠端或凸起上實質上不存在黏著劑。一 般而言,當剛性基板存在時,該剛性基板與複製微結構中 之至少一部分直接接觸《對於操作所提供之研磨物件及方 法而言重要的是,使可撓背襯及剛性支撐物存在某些直接 接觸以使當工件在拋光或研光期間處於負載下時,承受工 161856.doc •17* 201238716 件之負載。此重要特徵可阻止或防止當利用所提供之研磨 物件及方法拋光工件時發生冠凸或邊緣圓化。一般而言, 在形成可撓背襯之第二主表面之複製微結構遠端或凸起上 實質上不存在黏著劑。於一些實施例中,在複製微結構之 遠知》或凸起上實際上不存在黏著劑。於其他實施例中,可 存在於微結構之遠端或凸起上之黏著劑之平均量小於約i 〇 μΠ1、小於約5 μΓη或甚至小於約3 μηι之厚度。重要的是存 在之黏著劑未達到改變整體機械性質及維持研磨物件整體 模量之量。於拋光期間在研磨物件上來自工件之負載需支 樓傳遞至剛性支撐物以避免冠凸。 用於將研磨物件固定至剛性基板之可使用黏著劑係為本 技藝一般技術者所熟知。適宜黏著劑包括壓感黏著劑 (PSA)、熱熔融黏著劑及可藉由一般方式固化及/或玻化(包 括輻射可固化,例如,光可固化、υν可固化、電子束可 固化、γ可固化;熱可固化、濕可固化及類似者)之液體黏 著劑》熱熔融黏著劑係在高於該黏著劑之玻璃及/或熔融 轉复m·度之溫度下加熱時可流動之彼等黏著劑。當冷卻至 低於轉變溫度時’該熱熔融黏著劑會凝@]。-些熱炼融黏 著齊丨可在加熱時流動及隨後由於黏著劑之進一步固化而凝 固。 可使用黏著劑包括’例如’壓感黏著劑、熱炫融黏著劑 及膠。適宜壓感黏著劑包括各種不同的壓感黏著劑,包 括’例如’基於天然橡膠之黏著劑、(甲基)丙烯酸酯聚合 物及共聚物、熱塑性橡膠之AB或ΑΒΑ嵌段共聚物,例 161856.doc 201238716 如在商 口口名 KRAT〇N(Shell Chemical Co.,Houston,Tex.) 下購置之苯乙烯/丁二烯或苯乙烯/異戊二烯嵌段共聚物, 或聚烯烴。適宜熱熔融黏著劑包&amp;,例如,聚醋、乙稀乙 S变乙烯自曰(EVA)、聚醯胺、環氧化物及其等組合。黏著劑 般具有足以在使用期間使研磨物件之成分維持彼此固定 聯繫之内聚強度及剝離抗性,且應在使用條件下耐化學降 解示例性黏著劑包括環氧樹脂,如在商品名SCOTCH- WELD 下自 3M Company, St. Paul, MN購置之彼等物 ,如 3M SCOTCH-WELD Ep〇xy Adhesives 1 838、2158、2216及 3501。 剛性基板 術語「剛性」描述至少自支撐,即,其在自有重量下不 會實質變形之基板。剛性並非意指該基板絕對不可撓。剛 性基板可在所施加之負載下變形或彎曲但提供極低可壓縮 性。於一實施例中,剛性基板包含具有1 χ 1〇6磅/平方英寸 (psi)(7xl〇4 kg/cm2)或更大之剛度模量之材料。於另一實 施例中,剛性基板包含具有10x106 psi(7xl〇5 kg/cm2)或更 大之剛度模量之材料。 可用作剛性基板之適宜材料包括金屬、金屬合金、金 屬-基質複合物、金屬化塑膠、無機玻璃及玻化有機樹 脂、成形陶瓷及聚合物基質強化複合物。剛性基板可係一 平台’在基板拋光期間可將所提供之研磨物件安裝於該平 台上。 適宜剛性基板材料包括,例如,有機聚合物、無機聚合 161856.doc 201238716 物、陶瓷'金屬、有機聚合物之複合物及其等組合。適宜 有機聚合物可係熱塑性或熱固性。適宜熱塑性材料包括聚 碳酸酯、聚酯、聚胺基曱酸酯、聚苯乙烯、聚烯烴、聚全 氟烯烴、聚氣乙烯及其等共聚物。適宜熱固性聚合物包 括,例如,環氧樹脂、聚醯亞胺、聚酯及其等共聚物 (即’含有至少兩不同單體之聚合物,包括,例如,三元 聚合物及四元聚合物)。 剛性基板之聚合物可經強化。該強化可採取纖維或粒狀 材料之形式。用作強化之適宜材料包括,例如,有機或無 機纖維(例如,連續或定長纖維)、矽酸鹽,例如,雲母或 滑石;基於氧化矽之材料,例如,砂石及石英;金屬粒 子、玻璃、金屬氧化物及碳酸鈣,或其等組合。 特別有用之剛性基板亦可包括聚(對笨二曱酸乙二酯广 聚碳酸醋、玻璃纖維強化之環氧板材、鋁、鋼、不鏽:。 例如, 板,例 亦可將金屬片或板用作剛性基板。適宜金屬包括, 鋁、不鏽鋼、銅、鎳及鉻。亦可使用多層式金屬 如,錫覆鋼或錫覆鋁。 所提供之物件及方法可藉由依附本發明之附圖進—步說 明。圖3係所提供之研磨物件之一實施例之示意性橫截面 圖,其中微結構係該可撓背襯之第二表面之一部分且包含 稜錐體或稜錐形隆脊。圖3係包含可撓背襯雇之研磨:: 3〇〇之-實施例。將研磨層3G2(包含存留於黏結劑中之研 磨粒子)佈置於可撓背襯308之第一主表面上。在其第二主 表面之至少一部分上’可撓背襯扇包含具有凹口之:結 161856.doc -20· 201238716 構306。黏著劑305實質上位於該等凹口中。於此實施例 中,該等微結構之橫截面係呈藉由該等凹口所界定之V 形。包含待拋光表面之工件320接觸研磨層302,及相對研 磨物件300移動以拋光工件320。如圖2中所顯示般將負載P 施加至工件320。該負載P係藉由至少一部分微結構3〇6與 剛性基板3 12之直接接觸支撐’藉此最小化(若未消除)黏著 劑層之變形及減少(若未消除)工件320邊緣之冠凸或圓化。 圖4係所提供之研磨物件之另一實施例之示意性橫截面 圖。研磨物件400包含可撓背襯408。將研磨層402(包含存 留於黏結劑中之研磨粒子)佈置於該可撓背襯408之第一主 表面上。於其第二主表面之至少一部分上,可撓背襯4〇8 包含具有凹口之複製微結構406。黏著劑405實質上位於該 等凹口中。該等微結構之形狀與圖3中所顯示之實施例之 形狀相同。然而,於圖4所顯示之實施例中,複製微結構 406已形成於一不同背襯(未顯示)上及隨後整合結合至可撓 背襯408 »包含待拋光表面之工件42〇接觸研磨層4〇2,該 研磨層相對該研磨物件400移動以拋光該工件42〇。如圖2 中所顯示般將負載P施加至工件420。該負載p係藉由至少 一部分複製微結構406與剛性基板412之直接接觸支撐,藉 此最小化(右未消除)黏著劑層之變形及減少(若未消除)工 件420邊緣之冠凸或圓化。 圖5係所提供之研磨物件之另一實施例之示意性橫截面 圖,其中該等複製微結構包含截頭稜錐體或稜錐形隆脊。 圖5係包含可撓背襯508之研磨物件5〇〇之一實施例。將研 161856.doc •21 201238716 磨層502(包含存留在黏結劑中之研磨粒子,未顯示)佈置於 可撓背襯508之第一主表面上。於其第二主表面之至少一 部分上,可撓背襯508包含具有凹口之複製微結構5〇6。黏 著劑505貫質上位於該等凹口中。於此實施例中,該等複 製微結構之橫截面呈藉由該等凹口所界定之截頭¥形。該 等截頭微結構具有一平台,該平台增大可撓背襯5〇8與剛 性基板512之間之接觸面積。此做法提供在拋光期間承受 更大負載之支樓。包含待拋光表面之工件52〇接觸研磨層 502,該研磨層相對研磨物件5〇〇移動以拋光工件52〇。如 圖2中所顯示般將負载p施加至工件52〇。該負載p係藉由至 少一部分複製微結構506與剛性基板5 12之直接接觸支撐, 藉此最小化(若未消除)黏著劑層之變形及減少(若未消除) 工件520邊緣之冠凸或圓化。 圖6係所提供之研磨物件之又一實施例之示意性橫截面 圖’其中該等複製微結構係立方體或立方體隆脊。該等複 製微結構之橫截面係呈藉由凹口所界定之矩形。圖6係包 含可撓背襯608之研磨物件6〇〇之一實施例。將研磨層 602(包含存留於黏結劑中之研磨粒子)佈置於可撓背襯6〇8 之第一主表面上。於其第二主表面之至少一部分上,該可 挽背襯608包含具有凹口之複製微結構6〇6。黏著劑605實 質上位於該等凹口中。該等立方體微結構具有一平台,該 平台增大可撓背襯608與剛性基板612之間之接觸面積。此 做法提供在拋光期間承受更大負載之支撐。包含待拋光表 面之工件620接觸研磨層6〇2,該研磨層相對研磨物件600 161856.doc -22- 201238716 移動以拋光該工件620。如圖2中所顯示般將負載p施加至 工件620。該負載P係藉由至少一部分複製微結構6〇6與剛 性基板612之直接接觸支撐,藉此最小化(若未消除)黏著劑 層之變形及減少(若未消除)工件620邊緣之冠凸或圓化。 本發明之目的及優點係藉由以下實例進一步說明,然 而,在此等實例中所引述之特定材料及其等量,以及其他 條件及細節不應視為對本發明過度限制。 實例 測試方法 研光程序 利用一研光工具 ’ Lapmaster model 15(自 LapmasterNemours and Co. 〇f Wilmington, VAZO 52); peroxides such as, for example, benzamidine peroxide, cumene peroxide, dibutyl peroxide, cyclohexanone peroxide, peroxy pentoxide Diacid and dilauryl peroxide, hydrogen peroxide; hydroperoxides such as, for example, tert-butyl hydroperoxide and cumene hydroperoxide; peracids such as, for example, peracetic acid and perbenzoic acid Formic acid; potassium persulfate; and peresters such as, for example, diisopropyl percarbonate. In some embodiments, the binder precursor preferably includes one or more monoethylenically unsaturated radical polymerizable compounds, for example, to reduce the viscosity of the resulting binder and/or to reduce crosslink density. Exemplary monoethylenically unsaturated free soil polymerizable &amp; compounds include: mono (meth) acrylates, including (meth) hexyl acrylate, 2-ethyl hexyl acrylate, isophthalic acid (meth) acrylate , (meth)acrylic acid isobornyl cool, (meth)acrylic acid phenoxyethyl S, (meth)acrylic acid 2 red ethyl, (meth)acrylic acid 12 vinegar, (methyl) acrylic acid (A) Ethyl acrylate, n-propyl (meth) acrylate, (decyl) propyl (tetra) n-butyl acrylate, n-octyl (meth) acrylate, isobutyl methacrylate, (meth) acrylic acid Cyclohexanoic vinegar or (mercapto) acrylic acid 18 vinegar; N_B I6I856.doc 201238716 Alkenyl compounds such as, for example, Ν·vinylcarbamide, N-vinylpyrrolidone or N-ethylene Amidoxime; and combinations thereof. In some embodiments, the abrasive layer can also include one or more additives. The additives may include one or more of an antioxidant, a toner, a heat and/or a light stabilizer or a filler (a filler that does not substantially affect the abrasive properties). Thus, the binder can be prepared from a binder precursor comprising abrasive particles, a surfactant, and an additive (e.g., as a slurry) in which the abrasive particles are dispersed. The microstructure provided provides an abrasive article comprising a flexible backing having opposing first and second major surfaces. At least a portion of the second major surface of the flexible backing comprises a replica microstructure having a recess. The replicated microstructures are integrated into the flexible backing. Integration means that the replicated microstructure is part of a flexible backing (e.g., a second surface of the flexible backing). The replica microstructures can extend from a common substrate (i.e., a flexible backing), be disposed on a different backing, and the like, thereby forming protrusions (reproducing the distal ends of the microstructures) and recesses. In some embodiments, the replica microstructures can be extensions of the flexible backing material, such as, for example, the replica microstructures are simultaneously formed, molded or embossed with the flexible substrate or directly onto the flexible substrate. The situation of growth. In some embodiments, the replica microstructures form a recess in the second surface of the flexible backing, ie, the texture is textured on the flexible backing by a texturing process (eg, embossing) Surface. Flexible backings that can be used have been shown above and include polyester, polycarbonate, polypropylene, polyethylene, cellulose, polyamide, polyimine, polyoxymethylene, and polytetrafluoroethylene; metal foil 161856.doc -14· 201238716 Films, including Ming, Bronze, Tin and Bronze; and paper, including densified kraft paper and polymeric coated paper. Alternatively, the replica microstructures such as **Hai can be arranged or formed on a different backing. The different backing can be flexible or rigid. The different backing can then be structurally joined to the second side of the flexible backing. Any different backing can be used, however, the *JSJ backing should not be obvious. The variability can be pulled back—especially close to the overall modulus at which the top surface of the abrasive element can be formed. When a different backing is used, the replication microstructure on the first backing can utilize different mechanisms (including, for example, viscous compositions (such as structural adhesives), sonic fusion, heat sinking, mechanical fasteners, etc. Combined) structurally joined to the flexible backing. The replica microstructure can have a certain shape. Examples of such shapes include rods, triangular bodies, pyramidal cones, truncated pyramidal cones, conical bodies, truncated cones, cube corners, cubes, spheres or ellipsoids. The replica microstructures can have an elongated shape that forms a ridge. In some embodiments, the ridge has a cross-face of a triangular or truncated triangle (triangle with a flat top). In other embodiments, the ridges can have a rectangular, square or trapezoidal cross section. Alternatively, the replica microstructures can be in a random shape. Since the replicating microstructures are replicas, in general, the three-dimensional shape of the replica microstructures or the two-dimensional cross-section of the replica microstructures has a second major surface plane relative to the flexible backing of about 90. Or the side wall of the larger corner. In other words, the shape of the replica microstructure generally does not include undercut portions that cannot be easily removed from the mold while retaining the features of the replica microstructure. 'J as defined herein' "Replicated Microstructure" is a microstructure that can be created by copying or repeating processes. Such processes include replication processes well known to those skilled in the art of replicating micro-junctions such as, for example, embossing, injection molding, washing and curing, heat forming or screen printing. The replication microstructure can be formed in accordance with various methods including, for example, molding, extrusion, embossing, and the like. The methods of forming the microstructured elements are described in, for example, U.S. Patent Nos. 5,897,930 (Calh〇un et al.), 5,183,597 (Lu), 4,588,258 (Hoopman), 4,576,850 (Martens) and 4,374,077 (Kerfeld)f. Other methods of making a replica microstructure include the basic method of making a three-dimensional abrasive article as disclosed in U.S. Patent No. 5,958,794 (Buxvoort et al.). Replicated microstructures can also be fabricated by a variety of other methods. For example, the replicated microstructure can be transferred from the parent tool to other media such as polymeric tape or web by forming a master tool into the casting and curing process of the production tool. This production tool can then be used to fabricate a microreplicated structure comprising replicated microstructures using any of the above replication methods. Other methods such as electroforming can be used to replicate the master tool. Another alternative to making replicated microstructures is to directly cut or machine the second major surface of the flexible lining material to form a replica microstructure. For this, techniques such as chemical etching, laser ablation, bead blasting or - random surface modification techniques can be employed. When the microstructure is cut directly onto the main surface of the flexible backing, if the process is under the control of certain types of computer systems:: repeatedly cutting a cutting tool such as a laser cutting device to produce a plurality of composites </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; (Gardiner et al.). Adhesives The abrasive articles and methods provided include an adhesive that provides adhesion between the flexible backing and the rigid substrate. In some embodiments, the adhesive can be in contact with a release liner. Any adhesive which provides viscous properties is suitable for use in the present invention. The adhesive is substantially contained within the recess of the replication microstructure. "Substantially contained" means that the adhesive occupies most of the volume of the recess in the replica microstructure of the opposite second major surface of the flexible backing. When a rigid substrate is present, the volume of the recess is defined by the walls of the recess defined by the rigid substrate. When the rigid substrate is not present, the volume of the recess is defined by the wall of the recess and the volume defined by one of the planes across the distal end of the replica microstructure. In the articles and methods provided, the adhesive can occupy more than about 15 volume percent, greater than about 25 volume percent, or even greater than about 35 volume percent of the volume of the recesses. In some embodiments, the volume of the adhesive may be greater than the volume of the recess, which is 11%, 120% or even 13% of the volume of the recess, and generally does not exceed 1 50% of the volume of the recess. In addition, the adhesive may occupy approximately the entire volume of the recess, or may occupy less than about 85 volume percent of the volume of the recess, less than about 75 volume percent, or even less than about 65 volume percent. Further, "substantially contained" means that substantially no adhesive is present on the distal end or projection of the replica microstructure forming the second major surface of the flexible backing. In general, when a rigid substrate is present, the rigid substrate is in direct contact with at least a portion of the replication microstructure. "It is important for the abrasive article and method provided by the operation to have a flexible backing and a rigid support present. These direct contacts are used to support the load of 161856.doc • 17* 201238716 when the workpiece is under load during polishing or polishing. This important feature prevents or prevents crowning or edge rounding from occurring when the workpiece is polished using the provided abrasive article and method. Generally, there is substantially no adhesive present on the distal end or projection of the replica microstructure forming the second major surface of the flexible backing. In some embodiments, there is virtually no adhesive present on the known structure or protrusion of the replicated microstructure. In other embodiments, the average amount of adhesive that may be present on the distal end or projection of the microstructure is less than about 〇μΠ1, less than about 5 μΓη, or even less than about 3 μηι. It is important that the adhesive present does not achieve an amount that alters the overall mechanical properties and maintains the overall modulus of the abrasive article. The load from the workpiece on the abrasive article during polishing requires the support to be transferred to the rigid support to avoid crowning. Adhesives useful for securing abrasive articles to rigid substrates are well known to those of ordinary skill in the art. Suitable adhesives include pressure sensitive adhesives (PSAs), hot melt adhesives, and can be cured and/or vitrified by conventional means (including radiation curable, for example, photocurable, υν curable, electron beam curable, gamma Curable; heat curable, wet curable, and the like) liquid adhesives. The hot melt adhesive can flow when heated above the temperature of the glass and/or the molten transition m. Equivalent adhesive. When cooled below the transition temperature, the hot melt adhesive will condense @]. - Some of the hot smelting adhesives can flow during heating and then solidify due to further curing of the adhesive. Adhesives can be used including, for example, pressure sensitive adhesives, thermal offset adhesives, and glues. Suitable pressure sensitive adhesives include a variety of different pressure sensitive adhesives, including, for example, natural rubber based adhesives, (meth) acrylate polymers and copolymers, thermoplastic rubber AB or bismuth block copolymers, Example 161856 .doc 201238716 A styrene/butadiene or styrene/isoprene block copolymer, or a polyolefin, purchased under the trade name KRAT〇N (Shell Chemical Co., Houston, Tex.). Suitable heat-melt adhesive packages &amp;, for example, polyacetate, ethylene sulphur ethylene self-twisting (EVA), polyamine, epoxide and the like. The adhesive has a cohesive strength and peel resistance sufficient to maintain the components of the abrasive article in a fixed relationship during use, and should be resistant to chemical degradation under the conditions of use. Exemplary adhesives include epoxy resins, such as under the trade name SCOTCH- WELD is purchased from 3M Company, St. Paul, MN, such as 3M SCOTCH-WELD Ep〇xy Adhesives 1 838, 2158, 2216 and 3501. Rigid Substrate The term "rigid" describes a substrate that is at least self-supporting, i.e., that does not substantially deform under its own weight. Rigidness does not mean that the substrate is absolutely inflexible. The rigid substrate can be deformed or bent under the applied load but provides very low compressibility. In one embodiment, the rigid substrate comprises a material having a stiffness modulus of 1 χ 1 〇 1 〇 6 psi (7 x 1 〇 4 kg/cm 2 ) or greater. In another embodiment, the rigid substrate comprises a material having a stiffness modulus of 10 x 106 psi (7 x 1 〇 5 kg/cm2) or greater. Suitable materials for use as rigid substrates include metals, metal alloys, metal-matrix composites, metallized plastics, inorganic glass and vitrified organic resins, shaped ceramics, and polymer matrix reinforced composites. The rigid substrate can be a platform upon which the provided abrasive article can be mounted during substrate polishing. Suitable rigid substrate materials include, for example, organic polymers, inorganic polymerization 161856.doc 201238716, ceramic 'metals, composites of organic polymers, and the like. Suitable organic polymers can be thermoplastic or thermoset. Suitable thermoplastic materials include polycarbonates, polyesters, polyamino phthalates, polystyrenes, polyolefins, polyperfluoroolefins, polystyrene, and the like. Suitable thermoset polymers include, for example, epoxy, polyimine, polyester, and the like (ie, 'polymers containing at least two different monomers, including, for example, terpolymers and tetrapolymers ). The polymer of the rigid substrate can be strengthened. The reinforcement can take the form of a fibrous or granular material. Suitable materials for reinforcement include, for example, organic or inorganic fibers (for example, continuous or fixed length fibers), silicates, for example, mica or talc; materials based on cerium oxide, such as sand and quartz; metal particles, Glass, metal oxides and calcium carbonate, or combinations thereof. Particularly useful rigid substrates may also include poly(ethylene carbonate for polyethylene phthalate, glass reinforced epoxy sheets, aluminum, steel, stainless: for example, plates, for example, metal sheets or The board is used as a rigid substrate. Suitable metals include aluminum, stainless steel, copper, nickel and chromium. Multi-layer metals such as tin-clad steel or tin-coated aluminum may also be used. The articles and methods provided may be attached by the present invention Figure 3 is a schematic cross-sectional view of one embodiment of a provided abrasive article, wherein the microstructure is part of a second surface of the flexible backing and comprises a pyramid or a pyramidal cone Ridge. Figure 3 is a grinding comprising a flexible backing:: 〇〇 - Example. The abrasive layer 3G2 (containing abrasive particles retained in the binder) is disposed on the first major surface of the flexible backing 308 The flexible backing fan includes a notch on at least a portion of its second major surface: a knot 161856.doc -20· 201238716 306. The adhesive 305 is substantially located in the recesses. Where the cross sections of the microstructures are by the notches The defined V-shape. The workpiece 320 containing the surface to be polished contacts the abrasive layer 302 and moves relative to the abrasive article 300 to polish the workpiece 320. The load P is applied to the workpiece 320 as shown in Figure 2. The load P is At least a portion of the microstructures 3〇6 are in direct contact with the rigid substrate 312 to thereby 'minimize (if not eliminate) deformation of the adhesive layer and reduce (if not eliminated) crown crowning or rounding of the workpiece 320. A schematic cross-sectional view of another embodiment of an abrasive article provided. The abrasive article 400 includes a flexible backing 408. The abrasive layer 402 (containing abrasive particles retained in the binder) is disposed on the flexible backing On a first major surface of 408. On at least a portion of its second major surface, the flexible backing 4'8 includes a replica microstructure 406 having a recess. The adhesive 405 is substantially located in the recesses. The shape of the structure is the same as that of the embodiment shown in Figure 3. However, in the embodiment shown in Figure 4, the replication microstructure 406 has been formed on a different backing (not shown) and subsequently integrated into Scratching Backing 408 » Bag The workpiece 42 to be polished surface contacts the polishing layer 4〇2, and the polishing layer moves relative to the abrasive article 400 to polish the workpiece 42. The load P is applied to the workpiece 420 as shown in Fig. 2. The load p is borrowed The direct contact support of at least a portion of the replica microstructure 406 with the rigid substrate 412 minimizes (right without eliminating) deformation of the adhesive layer and reduces (if not eliminated) crown crowning or rounding of the edge of the workpiece 420. A schematic cross-sectional view of another embodiment of the provided abrasive article, wherein the replicated microstructures comprise truncated pyramids or pyramidal ridges. Figure 5 is abraded article 5 comprising a flexible backing 508. One embodiment. A grinding layer 502 (containing abrasive particles retained in the binder, not shown) will be disposed on the first major surface of the flexible backing 508. On at least a portion of its second major surface, the flexible backing 508 includes a replica microstructure 5〇6 having a recess. Adhesive 505 is located in the recesses. In this embodiment, the cross sections of the replicated microstructures are in the shape of a truncated shape defined by the notches. The truncated microstructures have a platform that increases the contact area between the flexible backing 5'8 and the rigid substrate 512. This approach provides a building that can withstand greater loads during polishing. The workpiece 52 containing the surface to be polished is in contact with the abrasive layer 502, which is moved relative to the abrasive article 5 to polish the workpiece 52. The load p is applied to the workpiece 52A as shown in FIG. The load p is supported by direct contact of at least a portion of the replica microstructure 506 with the rigid substrate 51, thereby minimizing (if not eliminating) deformation of the adhesive layer and reducing (if not eliminated) crown crowning of the workpiece 520 or Rounded. Figure 6 is a schematic cross-sectional view of yet another embodiment of a provided abrasive article wherein the replicated microstructures are cube or cube ridges. The cross-section of the replicated microstructures is a rectangle defined by the recesses. Figure 6 is an embodiment of a workpiece 6 包 comprising a flexible backing 608. An abrasive layer 602 (containing abrasive particles retained in the binder) is disposed on the first major surface of the flexible backing 6〇8. On at least a portion of its second major surface, the removable backing 608 includes a replica microstructure 6〇6 having a recess. Adhesive 605 is physically located in the recesses. The cube microstructures have a platform that increases the contact area between the flexible backing 608 and the rigid substrate 612. This approach provides support for greater loads during polishing. The workpiece 620 containing the surface to be polished contacts the abrasive layer 6〇2, which is moved relative to the abrasive article 600 161856.doc -22-201238716 to polish the workpiece 620. Load p is applied to workpiece 620 as shown in FIG. The load P is supported by direct contact of at least a portion of the replica microstructures 6〇6 with the rigid substrate 612, thereby minimizing (if not eliminating) deformation of the adhesive layer and reducing (if not eliminated) crown crowning of the workpiece 620 edge. Or round. The invention is further described in the following examples, and the particular materials and equivalents thereof, and other conditions and details are not to be construed as limiting the invention. Example Test method Light polishing program Using a research tool ’ Lapmaster model 15 (from Lapmaster

International LLC,Mount Prospect,Illinois獲得)對三個International LLC, Mount Prospect, Illinois)) for three

AlTiC試樣塊(2.40 cmx〇.20 cmx〇.5 cm)進行同時研光。將 具有接合研磨物件之平台安裝至該工具之基部。利用黏著 劑SCOTCHWELD DP100二部式環氧黏著劑(獲自3Μ Company,St. Paul,Minnes〇ta)將一 15 ⑽直徑 χΐ mm Amc 曰日圓女裝至該Lapmaster model 15之5.5英寸(14.0 cm)直徑 環之頂表面上。利用相同環氧黏著劑將三個AlTiC試樣塊 安裝至AlTiC晶圓表面。該等試樣塊係沿該晶圓之一 4 5 mm半彳k安裝,並均勻間隔,即,彼此分隔約丨2〇。,且其 等長度垂直於該等半徑。安裝該等試樣《,使2 4〇 cmx〇.20 cm表面安裝至該晶圓。研光條件係2〇 頭旋 轉,40 rpm平台旋轉及3小時研光時間。於第一小時期 間’將-2 kg負載施加至該頭;於第.二小時期間,施加一 161S56.doc •23· 201238716 4 kg負載及於第三小時期間,施加一 6 kg負載。該等AiTiC 試樣塊係沿研磨材料覆蓋平台之外徑與内徑之間之一路徑 旋轉。使用研光流體,在該3小時製程中以Q 36 g/分鐘之 速率將無水乙二醇滴注至該平台上。 冠凸測量程序 在實施研光之後利用M〇del P16 Pr〇m〇meter(獲自尺匕八·The AlTiC coupon (2.40 cm x 〇.20 cm x 〇.5 cm) was subjected to simultaneous polishing. A platform having joined abrasive articles is mounted to the base of the tool. Using a SCOTCHWELD DP100 two-part epoxy adhesive (available from 3Μ Company, St. Paul, Minnes〇ta), a 15 (10) diameter χΐ mm Amc 曰 yen dress to the 5.5 inch (14.0 cm) of the Lapmaster model 15 On the top surface of the diameter ring. Three AlTiC coupons were mounted to the AlTiC wafer surface using the same epoxy adhesive. The coupons are mounted along a 45 mm half of the wafer and are evenly spaced, i.e., separated from each other by about 2 〇. And its equal length is perpendicular to the equal radii. Install the specimens so that a surface of 2 4 〇 cm x 〇 .20 cm is mounted to the wafer. The polishing conditions are 2 旋 rotation, 40 rpm platform rotation and 3 hours of polishing time. A -2 kg load was applied to the head during the first hour; during the second hour, a 161S56.doc •23·201238716 4 kg load was applied and during the third hour a 6 kg load was applied. The AiTiC coupons are rotated along a path between the outer and inner diameters of the abrasive material covering the platform. Using a polishing fluid, anhydrous ethylene glycol was dripped onto the platform at a rate of Q 36 g/min in the 3-hour process. Crown convex measurement procedure M〇del P16 Pr〇m〇meter (obtained from the ruler)

Teneor* Coi*p〇fation’ Milpitas,California)測量 AlTiC試樣塊 之平整度。沿各試樣塊之〇·2 cm寬度進行四次表面測平儀 掃描。在試樣塊之長度上以約〇5 cm遞增量實施該四次掃 指。將冠凸定義為&amp;定表面測平儀掃描之最大與最小高度 之差。隨後將自該三個試樣塊獲得之12次測量平均化以獲 得平均冠凸值。 具有包含凹口之微結構之背襯之製造 cm)之寬度 在一金剛石車床上切割具有25 25英寸(641 及12英寸(3 0.5 cm)直徑之具有銅表面之一鋼輥輪以製造具 有一系列微結構且在該等微結構之間具有凹口之一表面。 微結構輥輪表面700、親輪之—]F ρ 74Λ @ m&lt; 小^段740之橫截面視圖顯 示於圖7中。切出凹σ71〇以使其等沿該輥輪之周長且垂直 於藉由虛線雙頭箭頭730顯示之輥輪軸73〇方向延伸。此做 法製成亦沿該輥輪之周長延伸之一系列微結構特徵。 凹7 10之平均冰度係i 3密耳(33〇叫)。微結構特徵no 之基部之平均寬度係U密耳(15 4 pm)。微結構特徵72〇之 基部之間之平均距離係〇.48密耳(12 ]㈣)。該等微結構特 徵720係呈梯形,在該等特徵之頂部測量之平均内角為約 161856.doc •24- 201238716 110度。在金剛石車床上進行切割之後,藉由異丙醇對親 輪除油及將鹼性溶液用於清潔表面。利用無電錦錄方法, 對鋼輥輪之銅表面實施鎳鍍以保護表面免於氧化。 將此輥輪用作連續鑄造及固化製程中之工具來製造微择 構表面、隆脊,及在背襯上形成凹口《於此鑄造及固化製 程中’將一 23英寸(58.4 cm)寬X0.005英寸(127微米)厚聚醋 膜用作背襯。將光可聚合丙烯酸樹脂施用至該工具,沿該 輥輪之長度塗覆約20英寸(50.8 cm)之寬度。該丙烯酸樹脂 係75重量%脂族胺基甲酸g旨二丙烯酸自旨(在商標名Teneor* Coi*p〇fation' Milpitas, California) measures the flatness of the AlTiC coupon. Four surface level scans were performed along the width of 2 cm per sample block. The four sweeps were carried out in increments of about 5 cm over the length of the coupon. The crown is defined as the difference between the maximum and minimum heights of the & surface leveler scan. The 12 measurements obtained from the three coupons were then averaged to obtain an average crown value. The width of the backing of the backing having a microstructure comprising a notch is cut on a diamond lathe with a steel roller having a copper surface of 25 25 inches (641 and 12 inches (3 0.5 cm) diameter) to have a A series of microstructures and having a surface of the recess between the microstructures. A cross-sectional view of the microstructured roller surface 700, the parent wheel -]F ρ 74 Λ @ m &lt; small section 740 is shown in FIG. The concave σ71〇 is cut out so as to extend along the circumference of the roller and perpendicular to the direction of the roller shaft 73 显示 indicated by the double-headed arrow 730. This is done to extend along the circumference of the roller. Series of microstructure features. The average iceness of the concave 7 10 is i 3 mils (33 〇). The average width of the base of the microstructure feature no is U mil (15 4 pm). The base of the microstructure feature 72 〇 The average distance between the two is 4848 mil (12) (4). The microstructure features 720 are trapezoidal, and the average internal angle measured at the top of the features is approximately 161856.doc • 24-201238716 110 degrees. After cutting on a lathe, de-oiling the parent wheel with isopropyl alcohol and using an alkaline solution Clean the surface. Use the electroless recording method to apply nickel plating to the copper surface of the steel roller to protect the surface from oxidation. Use this roller as a tool in continuous casting and curing process to make micro-selective surfaces and ridges. And forming a notch on the backing "in this casting and curing process" a 23 inch (58.4 cm) wide X 0.005 inch (127 micrometer) thick polyester film is used as a backing. Application of photopolymerizable acrylic resin To the tool, a width of about 20 inches (50.8 cm) is applied along the length of the roller. The acrylic resin is 75% by weight of aliphatic carbamic acid g for diacrylic acid (in the trade name)

PHOTOMER 6210下自 Cognis Corporation,Cincinnati, OH 獲得)、24重量%之二丙烯酸ι,6-己二醇酯(在商標名SR238 下自 Sartomer Company,Inc.,Exton,PA獲得)及 1 重量。/0之 光引發劑(在商標名LUCIRIN TPO下自BASF Corp., Charlotte,NC獲得)。隨後將該背襯施用至該工具之丙烯酸 酿塗覆區段。該丙烯酸酯樹脂係經過該背襯以UV固化, 但仍位於輥輪微結構之凹口中。隨後將該背襯自該工具剝 離。該已固化丙烯酸樹脂黏附至該背襯及自該工具釋放, 產生一微結構表面。該背襯微結構之橫截面視圖(對應一 橫截腹板視圖)顯示於圖8中。圖8顯示在背襯表面840上具 有凹口 810及微結構特徵820之微結構背襯表面800。已指 出橫戴腹板方向830 »該背襯之複製微結構表面具有與工 具之微結構互逆之微結構。凹口 81〇之平均深度係1.3密耳 (33·0 μιη) »微結構特徵82〇之基部之平均寬度係1 〇密耳 (1 5.4 μιη) ^微結構特徵820之基部之間之平均距離係0.48 161856.doc -25- 201238716 密耳(12·1 μΓΠ)»該等微結構特徵82〇係呈梯形,在該等特 徵之底部測量之平均外角為約1〇〇度。微結構及其等之間 之相應凹口係沿腹板之縱向腹板方向。 實例 將以上具有微結構表面之一 2〇英寸(5〇 8 cm)x2〇英寸 (50.8 cm)板膠黏至一 18 英寸(45 7 cm)x2l 英寸(53 3 cm)x〇.625英寸(0.159 cm)鋁板上,使微結構表面面向該鋁 板。製備依照供應商說明混合之! g 3M sc〇tch_welPHOTOMER 6210 available from Cognis Corporation, Cincinnati, OH), 24% by weight of diacrylic acid i,6-hexanediol (available from Sartomer Company, Inc., Exton, PA under the trade name SR238) and 1 weight. Photoinitiator of /0 (obtained under the trade name LUCIRIN TPO from BASF Corp., Charlotte, NC). The backing was then applied to the acrylic coating section of the tool. The acrylate resin is UV cured through the backing but still in the recess of the roller microstructure. The backing is then peeled off from the tool. The cured acrylic resin adheres to the backing and is released from the tool to create a microstructured surface. A cross-sectional view of the backing microstructure (corresponding to a cross-sectional web view) is shown in FIG. FIG. 8 shows a microstructured backing surface 800 having a recess 810 and microstructure features 820 on the backing surface 840. The direction of the transverse web is indicated 830 » The replicated microstructured surface of the backing has a microstructure that is reciprocal to the microstructure of the tool. The average depth of the notch 81〇 is 1.3 mils (33·0 μm) » the average width of the base of the microstructure feature 82〇 is 1 〇 mil (1 5.4 μm) ^ the average distance between the bases of the microstructure feature 820 Department 0.48 161856.doc -25- 201238716 mil (12·1 μΓΠ)»The microstructure features 82 are trapezoidal, and the average external angle measured at the bottom of the features is about 1 degree. The corresponding recess between the microstructure and its etc. is in the direction of the longitudinal web of the web. An example is to glue a 2 inch (5 〇 8 cm) x 2 inch (50.8 cm) plate with a microstructured surface to an 18 inch (45 7 cm) x 2l inch (53 3 cm) x 〇 .625 inch ( 0.159 cm) aluminum plate with the microstructured surface facing the aluminum plate. Preparation is mixed according to the supplier's instructions! g 3M sc〇tch_wel

Epoxy B/A黏著劑(獲自 3M C〇mpany,St Paul,mn)與 3 §曱 基乙基酮(MEK)之溶液。將該溶液傾至聚酯背襯上及利用 一橡膠滾筒使其展布至該背襯之整個表面上。當溶劑蒸發 時重複親壓該表面及使環氧黏著劑以均勻方式覆蓋該表 面。沿邊緣線將依照美國專利案6,645,624(Adefris等人)製 備且經篩分至小於38微米之尺寸之1〇克包含i微米金剛石/ 矽石50/50重量%之研磨複合粒子傾倒至該環氧黏著劑 上。使銘板與經塗覆背襯維持4 5。角及輕敲以使該等粒子 滾動及塗覆該膠黏樹脂。重複該程序直至該背襯含有完整 塗層。隨後使該板維持垂直及劇烈敲擊以逐出鬆散粒子。 隨後藉由一片聚石夕氧釋放襯塾覆蓋該受束缚研磨劑及藉由 一橡膠手持式滾筒輥壓以將粒子壓逼至該環氧黏著劑之一 單平面中。使該塗層在室溫下固化達丨2小時及隨後在7〇。〔 下再固化2小時。 隨後藉由樹脂之膠結塗料喷塗該研磨層。該膠結塗覆樹 脂溶液係由以下物質組成:4 g苯氧樹脂於2-丁酮中之3〇重 161856.doc •26· 201238716 量%溶液,(在商標名YP-50S下自Tohto Kasei Co, Lt. Inabata America Corp,NY,NY購置);2.3 g聚酯聚胺基甲 酸酯溶液於MEK(自21重量。/〇之新戊二醇,29重量%之聚己 内酯及50重量%之二異氰酸亞甲酯内合成)中之35重量〇/〇溶 液;1.1 g之聚異氰酸酯(在商標名Mondur MRS下自Bayer Chemical,Pittsburgh,PA.購置);40 g MEK及 1〇 g環己酮。 將膠結塗層樹脂溶液置於一氣溶膠容器中。在一通風良好 罩中藉由該膠結塗覆溶液喷塗該研磨表面持續約6〇秒或直 至該表面看起來濕潤。隨後在烘箱中於7〇〇c下將铭板及研 磨物件加熱1 7小時《冷卻之後,翻轉具有微結構之膜,以 使該研磨表面接觸該鋁板及曝露該微結構表面。隨後利用 一橡膠滾筒將具有0.0009英寸(22·9微米)標稱厚度、塗覆 於一聚石夕氧化牛皮紙釋放襯塾上之一未交聯、丙稀酸醋 基、壓感黏著劑層手工層壓至該背襯之微結構表面。移除 該研磨物件之釋放襯墊及利用一橡膠滾筒將該研磨物件手 工層壓至利用標準CNC切割技術製成之具有16英 ⑽)外徑、8英寸(2〇_3 cm)内徑及丨5英寸(3 8叫厚度之平 坦環形鋁平台。 &amp; 隨後使具有該研磨物件之平台之研磨面朝下地放置於一 23 英寸(58.4 cm)xl8 英寸(45.7 cm)x3/8 英寸(〇95 叫石英 板上岐-致平台放置於具有接合研磨劑之 第-'台之頂部上及在烘箱中以70t將整個堆疊加熱叫 具有接自烘相移出’將第二平台自該堆疊移除及使 具有接合研磨物件之平台冷卻,同時該研磨物件㈣該石 I61856.doc •27· 201238716 英板接觸。藉由一剃刀片將該研磨物件修整至匹配該平台 之尺寸。在上述研光程序及冠凸測量程序之後,該三個 AlTiC試樣塊之平均冠凸係0.9微英寸(0.0229 μπι)。 熟習本項技術者將瞭解不脫離本發明之範圍及精神之對 本發明之各種修改及替換。應理解,本發明不過度地受本 文中描述之說明性實施例及實例限制且此等實例及實施例 僅以實例方式出現,而本發明之範圍僅由下文描述之專利 申晴範圍限制。於本發明中所引述之所有參考文獻係以引 用其等全文之方式併入本文。 以下係具有複製微結構背襯之研磨物件及使用根據本考 明各態樣之該研磨物件之方法之示例性實施例。 實施例1係一種研磨物件,其包含:具有對置之第一 2 第一主表面之一可撓背襯,其中該可撓背襯之第二主表召 中之至少一部分包含具有凹口之複製微結構;包含存留方 至少一黏結劑中之複數個研磨粒子之一研磨層,該研磨/ 佈置於該可撓背襯之第一主表面上;及黏著劑,其中該專 著劑實質上容納於該等複製微結構之凹口中。 實施例2係如實施例1之研磨物件,其進一步包含:與言 等複製微結構之至少-部分接觸之—㈣基板。 實施例3係如實施例1之研磨物件,其進一步包含^ 黏著劑中之至少-部分接觸之—釋放概塾。 實施例4係如實施例1之讲路 之研磨物件,其中該可撓背襯係i 自由增密牛皮紙、聚合塗霜 隻復紙、金屬箔片及聚合基板組; 之群》 16t8S6.doc •28· 201238716 實施例5係如實施例4之研磨物件,其中該等金屬揭片係 選自鋁、銅、錫及青銅。 實施例6係如實施例4之研磨物件,其中該聚合基板係選 自由以下物質組成之群:聚酯、聚碳酸酯、聚丙烯、聚乙 烯、纖維素、聚醯胺、聚醯亞胺、聚矽氧及聚四氟乙烯。 實施例7係如實施例丨之研磨物件,其中該等研磨粒子係 選自由以下物質組成之群:熔融氧化鋁、熱處理氧化鋁、 白炫融氧化紹、黑碳化石夕、綠碳化石夕、二硼化鈦、碳化 硼、碳化鎢、碳化鈦、金剛石、氧化矽、氧化鐵、氧化 鉻、氧化錦、氧化錯、氧化欽、石夕酸鹽、氧化錫、立方氮 化硼、石榴石、熔融氧化鋁·氧化錯、溶凝膠研磨粒子、 研磨聚結物、金屬基粒子及其等組合。 實施例8係如實施例】之研磨物件,其中該可撓背襯具有 大於約0.5 GPa之楊氏模量。 實施例9係如實施例8之研磨物件,其中該可撓背襯具有 大於約2.0 GPa之揚氏模量。 實施例10係如實施例1之研磨物件,其中該等複製微結 構具有包括棒體、三角形體、稜錐形體、截頭稜錐形體、 圓錐形體、截頭圓錐形體、立 立方角'立方體、球形體或橢 球形體之一形狀。 搂實施例11係如實施例1之研磨物件’其中該等複製微結 構具有包括隆脊之一形狀。 實施例12係如實施例1之研磨物件,其中該黏著劑係選 自由屋感黏著劑、熱炼融點著劑及可固化液體黏著劑組成 I61856.doc -29· 201238716 之群。 實施例1 3係如實施例1之研磨物件,其中該黏著劑佔據 該等複製微結構之凹口之體積之大於約25體積百分比及小 於約120體積百分比。 實施例14係一種拋光方法,其包含:提供一待拋光工 件;使該工件與一研磨物件接觸,該研磨物件包含:具有 對置之第一及第二主表面之一可撓背襯,其中該可撓背襯 之該第二主表面中之至少一部分包含具有凹口之複製微結 構;一研磨層,其包含存留於至少一黏結劑中之複數個研 磨粒子’該研磨層佈置於該可撓背襯之第一主表面上·,黏 著劑;及與至少一部分該等複製微結構接觸之—剛性基 板,其中該黏著劑實質上容納於該等複製微結構之凹= 中;及使該研磨物件相對該工件移動。 實施例15係如實施例14之拋光方法,其中該等研磨粒子 係選自由以下物質組成之群:熔融氧化鋁、熱處理氧化 紹、白炫融氧化铭、黑碳化石夕、綠碳化石夕、二硼化鈦、碳 化硼、碳化鎢、碳化鈦、金剛石、氧化矽、氧化鐵、氧化 鉻、氧化鈽、氧化鍅、氧化鈦、矽酸鹽、氧化錫、立方氮 化棚、Μ石、㈣氧㈣氧化n疑膠研磨粒子 磨聚結物 '金屬基粒子及其等組合。 實施例1 6係如實施例14之拋光方法,盆士分故 描目h方法’其中該等複製微結 構具有包括棒體、:r &amp;7 。 一角形體、稜錐形體、截頭稜錐形 圓錐形體、截頭圓錐形體' 月且万體、球形體岑橢 球形體之形狀。 I61856.doc 201238716 實施例17係如實施例14之拋光方法,其中該等複製微結 構具有包括隆脊之形狀。 實施例1 8係如實施例14之抛光方法,其中該黏著劑係選 自由壓感黏著劑、熱熔融黏著劑及可固化液體黏著劑組成 之群。 實施例19係如實施例14之拋光方法,其中該黏著劑佔據 該等複製微結構之凹口之體積之大於約25體積百分比及小 於約120體積百分比。 實施例20係如實施例14之拋光方法,其進一步包含佈置 於該黏著劑上之一釋放襯墊。 雖然在本文中已針對描述較佳實施例之目的說明具體實 施例,然而本技藝一般技術者將瞭解,可以各種不同的經 計算以獲得實現相同目的之替換及/或等效方案取代所顯 示及描述之具體實施例而不脫離本發明之範圍。熟習機 械、電機械及電學領域之技術者將輕易瞭解,本發明可以 多種不同的實施例實施。本申請案將涵蓋在本文中所揭示 之較佳實施例之任何採用方式或變化。因此,本發明顯然 僅藉由專利申請範圍及其等效内容限制。 【圖式簡單說明】 圖1係先前技藝研磨系統之示意性橫截面圖; 圖2係圖1之先前技藝研磨系統且已將負載施加至工件之 示意性橫截面圖; 圖3係所提供之研磨物件之一實施例之示意性橫截面 圖,其中該等複製微結構係該可撓背襯之第二表面之一部 161856.doc •31 - 201238716 分且包括稜錐體或稜錐形隆脊; 圖4係所提供之研磨物件之一實施例之示意性橫截面 圖,其中該等複製微結構係結構性接合至該可撓背襯之第 二表面且包括稜錐體或稜錐形隆脊; 圖5係所提供之研磨物件之另一實施例之示意性橫截面 圖,其中複製微結構包括截頭稜錐體或稜錐形隆脊;及 圖6係所提供之研磨物件之另一實施例之示意性橫截面 圖,其中複製微結構包括正方形隆脊; 圖7係用於所提供之研磨物件之一示例性實施例中之一 微結構化輥壓表面之橫截面視圖; 圖8係使用圖7中之微結構化輥壓表面所製成之示例性背 襯微結構之橫戴面或橫截腹板視圖。 【主要元件符號說明】 10 研磨物件系統 12 研磨粒子 13 黏結劑 14 黏著劑層 18 可撓背襯 18a 第一主表面 18b 第二主表面 20 工件 22 剛性支撐物 300 研磨物件 302 研磨層 161856.doc . 32 - 201238716 305 黏著劑 306 微結構 308 可撓背襯 312 剛性基板 320 工件 400 研磨物件 402 研磨層 405 黏著劑 406 微結構 408 可撓背襯 412 剛性基板 420 工件 500 研磨物件 502 研磨層 505 黏著劑 506 微結構 508 可撓背襯 512 剛性基板 520 工件 600 研磨物件 602 研磨層 605 黏著劑 606 微結構 608 可撓背襯 161856.doc •33 201238716 612 剛性基板 620 工件 700 微結構輥輪表面 710 凹口 720 微結構特徵 730 幸昆輪軸 740 輥輪之一小區段 800 微結構背襯表面 810 凹口 820 微結構特徵 830 腹板方向 840 背襯表面 P 負載 161856.doc -34-A solution of Epoxy B/A adhesive (available from 3M C〇mpany, St Paul, mn) and 3 § mercaptoethyl ketone (MEK). The solution was poured onto a polyester backing and spread onto the entire surface of the backing using a rubber roller. The surface is repeatedly pressed while the solvent evaporates and the epoxy adhesive is applied to the surface in a uniform manner. A 1 gram of abrasive composite particles comprising i micron diamond / vermiculite 50/50% by weight prepared according to U.S. Patent No. 6,645,624 (Adefris et al.) and sieved to a size of less than 38 microns are poured onto the epoxy along the edge line. Adhesive. Maintain the nameplate and coated backing 4 5 . Corners and taps to cause the particles to roll and coat the adhesive resin. This procedure is repeated until the backing contains a complete coating. The panel is then maintained vertically and severely tapped to dislodge loose particles. The bound abrasive is then covered by a piece of polyoxygen lining and pressed by a rubber hand held roller to force the particles into a single plane of the epoxy. The coating was allowed to cure at room temperature for up to 2 hours and then at 7 Torr. [Cure for another 2 hours. The abrasive layer is then sprayed by a resin cementitious coating. The cement-coated resin solution consists of 4 g of phenoxy resin in 2-butanone, 3 〇 161,856.doc •26·201238716, % solution, (under the trade name YP-50S from Tohto Kasei Co) , Lt. Inabata America Corp, NY, NY purchased); 2.3 g polyester polyurethane solution in MEK (from 21 wt. / 〇 neopentyl glycol, 29 wt% polycaprolactone and 50 wt 35 parts by weight of rhodium/iridium solution in the synthesis of % of methylene diisocyanate; 1.1 g of polyisocyanate (purchased from Bayer Chemical, Pittsburgh, PA. under the trade name Mondur MRS); 40 g MEK and 1〇 g cyclohexanone. The cemented coating resin solution is placed in an aerosol container. The abrasive surface is sprayed by the cement coating solution in a well vented hood for about 6 seconds or until the surface appears wet. The nameplate and the abrasive article were then heated in an oven at 7 ° C for 1 hour. After cooling, the microstructured film was flipped so that the abrasive surface contacted the aluminum panel and exposed the microstructured surface. Subsequently, using a rubber roller to have a nominal thickness of 0.0009 inches (22.9 microns), coated on a poly-stone oxidized kraft paper release liner, one uncrosslinked, acrylic acid acrylate, pressure sensitive adhesive layer manually Laminated to the microstructured surface of the backing. Removing the release liner of the abrasive article and manually laminating the abrasive article to a 16 inch (10)) outer diameter, 8 inch (2 inch - 3 cm) inner diameter and using standard rubber cutting techniques.丨 5 inches (3 8 is the thickness of the flat annular aluminum platform. &amp; then the platform with the abrasive article is placed face down on a 23 inch (58.4 cm) xl8 inch (45.7 cm) x 3/8 inch (〇 95 The quartz plate is placed on the top of the first stage with the bonding abrasive and the entire stack is heated in the oven at 70t to remove the self-bake phase. The second platform is removed from the stack. And cooling the platform having the joined abrasive article while the abrasive article (4) is in contact with the stone. The abrasive article is trimmed to match the size of the platform by a razor blade. After the crown measurement procedure, the average crown crown of the three AlTiC coupons is 0.9 microinches (0.0229 μm). It will be apparent to those skilled in the art that various modifications and substitutions of the present invention are possible without departing from the scope and spirit of the invention. It is to be understood that the invention is not to be construed as limited by the illustrative embodiments and examples described herein All references cited in the present invention are incorporated herein by reference in their entirety. The following is exemplary of the disclosure of the s s s s s s s s s s s s s s s s s s s s s s s s s s s s s Embodiment 1 is an abrasive article comprising: a flexible backing having one of the first first major surfaces opposite, wherein at least a portion of the second primary representation of the flexible backing comprises a replica microstructure of the recess; comprising an abrasive layer of a plurality of abrasive particles in the at least one binder of the remaining side, the grinding/disposing on the first major surface of the flexible backing; and an adhesive, wherein the monologue Substantially contained in the recess of the replica microstructure. Embodiment 2 is the abrasive article of embodiment 1, further comprising: contacting at least a portion of the replica microstructure such as Embodiment 3 is the abrasive article of Embodiment 1, which further comprises at least a partial contact-release profile of the adhesive. Embodiment 4 is an abrasive article as described in Embodiment 1, wherein the Scratching lining i free-density kraft paper, polymeric frost-coated only paper, metal foil and polymeric substrate set; Groups 16T8S6.doc • 28· 201238716 Embodiment 5 is the abrasive article of Example 4, wherein The metal strip is selected from the group consisting of aluminum, copper, tin and bronze. Embodiment 6 is the abrasive article of embodiment 4, wherein the polymeric substrate is selected from the group consisting of polyester, polycarbonate, polypropylene, poly Ethylene, cellulose, polyamide, polyimide, polyoxymethylene and polytetrafluoroethylene. Embodiment 7 is the abrasive article of Embodiment ,, wherein the abrasive particles are selected from the group consisting of fused alumina, heat-treated alumina, white smelting oxide, black carbonized fossil, green carbonized fossil, diboron Titanium, boron carbide, tungsten carbide, titanium carbide, diamond, yttria, iron oxide, chromium oxide, oxidized bromine, oxidized oxidized, oxidized chin, oxalate, tin oxide, cubic boron nitride, garnet, melt oxidation Aluminium oxidization, sol-gel abrasive particles, abrasive agglomerates, metal-based particles, and the like. Embodiment 8 is the abrasive article of embodiment, wherein the flexible backing has a Young's modulus greater than about 0.5 GPa. Embodiment 9 is the abrasive article of embodiment 8, wherein the flexible backing has a Young's modulus greater than about 2.0 GPa. Embodiment 10 is the abrasive article of embodiment 1, wherein the replicated microstructures comprise a rod, a triangular body, a pyramidal cone, a truncated pyramid, a conical, a truncated cone, a cube cube, One of a spherical body or an ellipsoidal shape. Embodiment 11 is the abrasive article of Embodiment 1 wherein the replica microstructures have a shape including one of the ridges. Embodiment 12 is the abrasive article of Embodiment 1, wherein the adhesive is selected from the group consisting of a free-standing adhesive, a hot smelting point agent, and a curable liquid adhesive. I61856.doc -29· 201238716. Embodiment 1 The abrasive article of Embodiment 1, wherein the adhesive occupies more than about 25 volume percent and less than about 120 volume percent of the volume of the recess of the replicate microstructure. Embodiment 14 is a polishing method comprising: providing a workpiece to be polished; contacting the workpiece with an abrasive article, the abrasive article comprising: a flexible backing having one of the first and second major surfaces opposite, wherein At least a portion of the second major surface of the flexible backing comprises a replica microstructure having a recess; an abrasive layer comprising a plurality of abrasive particles retained in at least one binder - the abrasive layer being disposed on the a first major surface of the scratch, an adhesive; and a rigid substrate in contact with at least a portion of the replica microstructures, wherein the adhesive is substantially contained in the recesses of the replica microstructures; The abrasive article moves relative to the workpiece. Embodiment 15 is the polishing method of Embodiment 14, wherein the abrasive particles are selected from the group consisting of fused alumina, heat-treated oxidation, white smelting, black carbonized stone, green carbonized stone, diboron Titanium, boron carbide, tungsten carbide, titanium carbide, diamond, cerium oxide, iron oxide, chromium oxide, cerium oxide, cerium oxide, titanium oxide, cerium salt, tin oxide, cubic nitriding shed, vermiculite, (iv) oxygen (4) Oxidation n suspected abrasive particles agglomerate 'metal based particles and combinations thereof. Example 1 6 is a polishing method as in Example 14, a method of depicting h, wherein the replica microstructures have a rod comprising: r &amp; An angular body, a pyramidal cone, a truncated pyramidal conical body, a truncated conical body, a shape of a spheroidal body, a spherical body, and an ellipsoid. Embodiment 17 is the polishing method of Embodiment 14, wherein the replication microstructures have a shape including a ridge. Embodiment 1 The polishing method of Embodiment 14, wherein the adhesive is selected from the group consisting of a pressure sensitive adhesive, a hot melt adhesive, and a curable liquid adhesive. Embodiment 19 is the polishing method of embodiment 14, wherein the adhesive occupies more than about 25 volume percent and less than about 120 volume percent of the volume of the recess of the replicate microstructure. Embodiment 20 is the polishing method of Embodiment 14, further comprising a release liner disposed on the adhesive. Although specific embodiments have been described herein for the purposes of describing the preferred embodiments, those skilled in the art will understand that various alternatives and/or equivalents can be The specific embodiments are described without departing from the scope of the invention. Those skilled in the art of mechanical, electrical, and electrical engineering will readily appreciate that the present invention can be implemented in a variety of different embodiments. This application is intended to cover any adaptations or variations of the preferred embodiments disclosed herein. Therefore, the invention is obviously limited only by the scope of the patent application and its equivalents. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic cross-sectional view of a prior art abrasive system; Figure 2 is a schematic cross-sectional view of the prior art abrasive system of Figure 1 and having applied a load to the workpiece; Figure 3 is provided A schematic cross-sectional view of one embodiment of an abrasive article, wherein the replicated microstructure is one of the second surface of the flexible backing 161856.doc • 31 - 201238716 and includes a pyramid or a pyramidal cone Figure 4 is a schematic cross-sectional view of one embodiment of an abrasive article provided, wherein the replicated microstructures are structurally bonded to a second surface of the flexible backing and include pyramids or pyramids Rough ridge; Figure 5 is a schematic cross-sectional view of another embodiment of the abrasive article provided, wherein the replicated microstructure comprises a truncated pyramid or a pyramidal ridge; and Figure 6 is provided by the abrasive article A schematic cross-sectional view of another embodiment, wherein the replica microstructure comprises a square ridge; FIG. 7 is a cross-sectional view of one of the microstructured roll surfaces used in an exemplary embodiment of the provided abrasive article; Figure 8 is the use of the micro in Figure 7. A cross-sectional or cross-sectional web view of an exemplary backing microstructure made of a structured roll surface. [Main Component Symbol Description] 10 Abrasive Object System 12 Abrasive Particles 13 Adhesive 14 Adhesive Layer 18 Flexible Backing 18a First Main Surface 18b Second Main Surface 20 Workpiece 22 Rigid Support 300 Abrasive Object 302 Abrasive Layer 161856.doc 32 - 201238716 305 Adhesive 306 Microstructure 308 Flexible Backing 312 Rigid Substrate 320 Workpiece 400 Abrasive Object 402 Abrasive Layer 405 Adhesive 406 Microstructure 408 Flexible Backing 412 Rigid Substrate 420 Workpiece 500 Abrasive Object 502 Abrasive Layer 505 Adhesive Agent 506 microstructure 508 flexible backing 512 rigid substrate 520 workpiece 600 abrasive article 602 abrasive layer 605 adhesive 606 microstructure 608 flexible backing 161856.doc • 33 201238716 612 rigid substrate 620 workpiece 700 Port 720 Microstructure Features 730 Lucky Kun Wheel Axle 740 Roller One Small Section 800 Microstructure Backing Surface 810 Notch 820 Microstructure Feature 830 Web Direction 840 Backing Surface P Load 161856.doc -34-

Claims (1)

201238716 七、申請專利範圍: 1. 一種研磨物件,其包含: 具有對置之第一及第二主表面之可撓背襯,其中該可 撓背襯之第二主表面中之至少一部分包含具有凹口之複 製微結構; 研磨層’其包含存留於至少一黏結劑中之複數個研磨 粒子’該研磨層係佈置於該可撓背襯之第一主表面上;及 黏著劑, 其中該黏著劑係實質上容納於該等複製微結構之凹口 中。 2. 如請求項1之研磨物件,其進一步包含: 與至少一部分該等複製微結構接觸之剛性基板。 3. 如請求項1之研磨物件,其進一步包含: 與該黏著劑中之至少一部分接觸之釋放襯墊。 4_如請求項1之研磨物件,其中該可撓背襯係選自由增密 牛皮紙、聚合塗覆紙、金屬揭片及聚合基板組成之群。 5. 如請求項4之研磨物件,其中該等金屬箔片係選自鋁、 銅、錫及青鋼。 6. 如請求項4之研磨物件,其中該聚合基板係選自由以下 物質組成之群:聚酯、聚碳酸酯、聚丙烯、聚乙烯、纖 維素、聚醯胺、聚醯亞胺、聚矽氧及聚四氟乙烯。 7. 如請求項丨之研磨物件,其中該等研磨粒子係選自由以 下物質組成之群:㈣氧化紐、熱處理氧化銘、白溶融 氧化銘、黑碳化石夕、綠碳化石夕、二棚化鈥、碳化爛、碳 t61856.doc 201238716 化鎢、碳化鈦、金剛石、 ,^ . 氧化矽、氧化鐵、氧化鉻、氧 硼、^ ^ m立方氮化 麼心也 鋁氧化鍅、溶凝膠研磨粒子 '研 磨聚結物、金屬基粒子及其等組合。 研 8.如請求項1之研磨物件, +』β 其中§亥可撓背襯具有大於約〇 5 GPa之楊氏模量。 · 其中該可撓背襯具有大於約2〇 9.如請求項8之研磨物件 GPa之楊氏模量。 該等複製微結構具有包括 、截頭稜錐形體、圓錐形 立方體、球形體或橢球形 10.如請求項1之研磨物件,其中 棒體、三角形體、稜錐形體 體、截頭圓錐形體、立方角、 體之形狀。 11. 如明求項1之研磨物件,纟中該等複製微結構具有包括 隆脊之形狀。 12. 2明求項丨之研磨物件,其中該黏著劑係選自由壓感黏 著劑、熱炼融黏著劑及可固化液體黏著劑組成之群。 13. 如請求項丨之研磨物件,其中該黏著劑佔據該等複製微 結構之凹口體積之大於約2 5體積百分比及小於約丨2 〇體 積百分比》 14. 一種拋光方法,其包含: 提供一待拋光工件; 使該工件與一研磨物件接觸,該研磨物件包含: 具有對置之第一及第二主表面之可撓背襯,其中該 可換背襯之第二主表面中之至少一部分包含具有凹口 161856.doc 201238716 之複製微結構; 研磨層’其包含存留於至少一黏結劑中之複數個研 磨粒子,該研磨層係佈置於該可撓背襯之第一主表面 黏著劑;及 與至少一部分該等複製微結構接觸之剛性基板,其 中該黏著劑係實質上容納於該等複製微結構之凹口 中;及 使該研磨物件相對該工件移動。 15.如凊求項14之拋光方法,其中該等研磨粒子係選自由以 下物質組成之群:溶融氧化銘、熱處理氧㈣、白炼融 氧化鋁、黑碳化矽、綠碳化矽、二硼化鈦、碳化硼、碳 化鶴、碳化欽、金剛石、氧切、氧化鐵、氧化絡、氧 化鈽氧化錯、氧化欽、石夕酸鹽、氧化錫、立方氣化 刪石掏石、熔融氧化紹氧化錯、溶凝膝研磨粒子、研 磨聚結物、金屬基粒子及其等組合β 16.如請求項14之拋光 棒體、三角形體、 體、截頭圓錐形體 體之形狀。 方法,其中該等複製微結構具有包括 稜錐形體、戴頭稜錐形體、圓錐形 、立方角、立方體、球形體或橢球形 17·如請求項14之拋光方法 隆脊之形狀。 18.如請求項Μ之拋光方法, 著劑、熱熔融黏著劑及可 其中該等複製微結構具有包括 其中該黏著劑係選自由壓感黏 固化液體黏著劑組成之群。 161856.doc 201238716 19. 如請求項14之拋光方法,其中該黏著劑佔據該等複製微 結構之凹口體積之大於約25體積百分比及小於約120體 積百分比。 20. 如請求項14之拋光方法,其進一步包含佈置於該黏著劑 上之釋放襯墊。 161856.doc201238716 VII. Patent Application Range: 1. An abrasive article comprising: a flexible backing having opposing first and second major surfaces, wherein at least a portion of the second major surface of the flexible backing comprises a replica microstructure of the recess; the abrasive layer 'comprising a plurality of abrasive particles remaining in the at least one binder' disposed on the first major surface of the flexible backing; and an adhesive, wherein the adhesive The agent is substantially contained within the recesses of the replicated microstructures. 2. The abrasive article of claim 1, further comprising: a rigid substrate in contact with at least a portion of the replicate microstructures. 3. The abrasive article of claim 1, further comprising: a release liner in contact with at least a portion of the adhesive. 4. The abrasive article of claim 1, wherein the flexible backing is selected from the group consisting of densified kraft paper, polymeric coated paper, metal release sheets, and polymeric substrates. 5. The abrasive article of claim 4, wherein the metal foil is selected from the group consisting of aluminum, copper, tin, and cyan. 6. The abrasive article of claim 4, wherein the polymeric substrate is selected from the group consisting of polyester, polycarbonate, polypropylene, polyethylene, cellulose, polyamide, polyimine, polyfluorene Oxygen and polytetrafluoroethylene. 7. The abrasive article according to claim ,, wherein the abrasive particles are selected from the group consisting of: (4) oxidation nucleus, heat treatment oxidation, white melting oxidization, black carbonized fossil, green carbonized fossil eve, and second shed鈥,carburization,carbon t61856.doc 201238716 Tungsten, titanium carbide, diamond, , ^. yttrium oxide, iron oxide, chromium oxide, oxyboron, ^ ^ m cubic nitriding, also aluminum yttrium oxide, lyotropic gel grinding Particles 'abrasive agglomerates, metal-based particles, and the like. 8. The abrasive article of claim 1 wherein + § β wherein the sigma flexible backing has a Young's modulus greater than about 〇 5 GPa. Wherein the flexible backing has a Young's modulus greater than about 2 〇 9. The abrasive article GPa of claim 8. The replica microstructures include, a truncated pyramid, a conical cube, a sphere, or an ellipsoid. 10. The abrasive article of claim 1, wherein the rod, the triangle, the pyramid, the truncated cone, Cube angle, shape of the body. 11. The abrasive article of claim 1, wherein the replicated microstructures have a shape comprising a ridge. 12. The abrasive article of claim 2, wherein the adhesive is selected from the group consisting of a pressure sensitive adhesive, a thermal sizing adhesive, and a curable liquid adhesive. 13. The abrasive article of claim 3, wherein the adhesive occupies more than about 25 volume percent and less than about 〇2 〇 volume percent of the recess volume of the replicate microstructures. 14. A polishing method comprising: providing a workpiece to be polished; contacting the workpiece with an abrasive article, the abrasive article comprising: a flexible backing having opposing first and second major surfaces, wherein at least one of the second major surfaces of the replaceable backing A portion includes a replica microstructure having a recess 161856.doc 201238716; an abrasive layer comprising a plurality of abrasive particles retained in at least one binder, the abrasive layer being disposed on the first major surface adhesive of the flexible backing And a rigid substrate in contact with at least a portion of the replica microstructures, wherein the adhesive is substantially received in the recess of the replica microstructure; and the abrasive article is moved relative to the workpiece. 15. The polishing method of claim 14, wherein the abrasive particles are selected from the group consisting of: melt oxidation, heat treatment oxygen (four), white smelting alumina, black carbon carbide, green carbon carbide, titanium diboride, Boron carbide, carbonized crane, carbonized plastic, diamond, oxygen cut, iron oxide, oxidized complex, oxidized ytterbium oxide, oxidized chin, oxalate, tin oxide, cubic gas-reduced stone, oxidized oxide Coagulating knee abrasive particles, abrasive agglomerates, metal-based particles, and the like, β. 16. The shape of the polished rod, the triangular body, the body, and the frustoconical body of claim 14. The method wherein the replica microstructures comprise a pyramidal body, a pyramidal cone, a conical shape, a cube corner, a cube, a spherical body, or an ellipsoidal shape. The shape of the ridge of the polishing method of claim 14. 18. A method of polishing a coating, a coating, a hot melt adhesive, and wherein the replication microstructure comprises, wherein the adhesive is selected from the group consisting of pressure sensitive adhesive liquid adhesives. 19. The method of polishing of claim 14, wherein the adhesive occupies greater than about 25 volume percent and less than about 120 volume percent of the notch volume of the replicated microstructures. 20. The polishing method of claim 14, further comprising a release liner disposed on the adhesive. 161856.doc
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