TW200401121A - Radiation sensitive composition for color filter, color filter, and color liquid display device - Google Patents

Abstract

The present invention provides a radiation sensitive composition for color filter, which has excellent pixel smoothness and tightness and excellent display capability. The radiation sensitive composition for color filter in accordance with the present invention is characterized in comprising pigment (A), alkaline dissoluble resin (B), multi-sense monomer radiation sensitive polymer catalytic and dissolvent (E). In the radiation sensitive composition for color filter, the pigment (A) is pre-distributed in a part of the alkaline dissoluble resin (B), or is totally dissolved in the solution formed by a part or all of the dissolvent (E). The alkaline dissoluble resin (B) for pre-distributing pigment is such alkaline dissoluble resin containing -NR2 base (but R is mutually independent hydrogen atom, alkyl with carbon number of 1~18, alkene with carbon number of 2~18, alkyne with carbon number of 2~18, allyl or aryl with carbon number of 6~18).

Description

200401121 (1) Description of the invention [Technical field to which the invention belongs] The present invention relates to radiation for a color filter for forming a color filter for a transmissive or reflective color liquid crystal display element, a color camera tube element, etc. A sensitive composition, a color filter formed by the composition, and a liquid crystal display element including the color filter. [Previous technology] In the past, when a color filter was manufactured using a radiation-sensitive composition, a radiation-sensitive composition was coated on a substrate or a substrate in which a light-shielding layer having a desired pattern was previously formed, and after drying, the dried coating film was exposed to Pixels of each color are obtained by developing the desired pattern. However, during the development of the color filter thus produced, residues or texture pollution may sometimes occur on the substrate or the light-shielding layer of the unexposed part. In addition, the surface smoothness of the pixels baked after development or the formed pixels are opposite to the substrate Or the adhesion of the light-shielding layer is insufficient, and there is a problem that the physical properties of the coating film are poor. The degree is more obvious as the concentration of the pigment contained in the radiation-sensitive composition increases, especially the degree of deterioration of the surface smoothness of the pixel is more obvious as the concentration of the pigment increases. Therefore, it is difficult to achieve a color filter The required full color density. The present inventors have found that radiation sensitivity for color filters containing (A) pigment, (B) alkali-soluble resin, (C) polyfunctional monomer, (D) radiation-sensitive polymerization initiator, and (E) solvent The composition and the solution in which (A) pigment is dispersed in part (B) of alkali-soluble resin in part or all are dissolved in part or all of (E) solvent, can solve the above problem of -6-(2) (2) 200401121 . However, in recent years, the display quality of color liquid crystal display elements has become stricter. Therefore, higher performance is required for the surface smoothness of the pixels, the adhesion to the substrate, and the developability. [Problems to be Solved by the Invention] The present invention provides a radiation-sensitive composition for a color filter, which is excellent in surface smoothness and adhesion of a pixel and has excellent developability, and more specifically, provides a surface of a pixel A radiation-sensitive composition for color filters that is excellent in smoothness and adhesion to a substrate and a light-shielding layer, and does not produce residues or texture pollution on the substrate and the light-shielding layer of an unexposed portion during development. [Method for solving the problem] According to the present invention, the above problem can be solved by a radiation-sensitive composition for a color filter, which contains (A) a pigment, (B) an alkali-soluble resin, and (C) a polyfunctional monomer. Polymer, (D) a radiation-sensitive polymerization initiator and (E) a solvent, and (A) a pigment previously dispersed in a part or all of (B) an alkali-soluble resin dissolved in a part or all of a solution formed by (E) a solvent The color-sensitive radiation-sensitive composition for color filters' is characterized by containing (B) an alkali-soluble resin used when a pigment (A) is dispersed in advance, which has a -NR2 group (but R is an independent hydrogen atom and a carbon number of 1 to 1). 1 8 alkyl group, alkenyl group with 2 to 18 carbon atoms, alkynyl group with 2 to 8 carbon atoms, allyl group, or alkali soluble resin with 6 to 18 carbon atoms). The present invention is described in detail below. (3) (3) 200401121 (A) Pigment The color tone of the pigment of the present invention is not particularly limited, and can be appropriately selected according to the application of the obtained color calender sheet, and may be an organic pigment or an inorganic pigment. Described. Marked: Pigments, for example, compounds classified as pigments (Pi gme η 1) in the color index (C.)-; The So ci et, issued by Of Dyers an d Colourists, specifically and specifically For example, there are the following colors: Color Index Numbered Compounds: 0. I. Pigment Yellow 83, c. I. Pigment Yellow] 2 8 C. I. Pigment Yellow 1: 38, C. 1. Pigment Yellow 13 9 ' C. I. Pigment Yellow 1 50, C_.I. Pigment-i = f-page 15 1'C.]. Pigment Yellow 15 2, C. I. Pigment Yellow 1 5 3, C. .I. Pigment -fc #-Page 154, C. 1_Pigment Yellow 15 5 'C_I. Pigment Yellow 1 5 6, C..]. Pigment Yellow 166' C. I. Pigment Yellow] 6 8, C.]. Pigment Yellow 1 7 5, C. I. Pigment Page 185; C. I. Color: Material Violet 19, C. I. Pigment Purple 23, C. I. Color, | /, 1 Private Purple 29, C. I. Pigment Violet 32, CI Pigment Violet 3 6, C. 1.11 i Material Violet 3 8; C. I. Pigment Red 1 7 7, C. 1. Pigment. Red 202, 1 CI Pigment Red 206 C. I. Pigment Red 2 0 7, C. I. Pigment Red: 2 丨 38 C.]. Pigment Red 09, C. I. Pigment Red 2 15 'C. I. Pigment Red 2 1 6, C. .1. Pigment Red 22 0 'C. I. Pigment Red 22 4, CI Pigment Red 2 2 6, C.,]. Pigment Red 242' C. I. Pigment Red 24 3 'C. I. Pigment Red 2 4 5, C. I. Pigment Red 254, CI Pigment Red 2 5 5, CI Pigment Red 2 6 4, C.. I. Pigment Red 2 6 5; C. 1. Color, Material Blue 15, C.]. Pigment Blue] 5 • 3 XC.I.Pigment Blue 15: 4, C.I.Pigment Blue 15: 6, C.I.Pigment Blue 60 > CI Pigment Green 7, C.I.Pigment Green 36 J CI Pigment Black 1, CI Pigment Black. (4) (4) 200401121 Specific examples of the aforementioned inorganic pigments include titanium oxide, barium sulfate, carbonic acid, zinc oxide, lead sulfate, yellow lead, zinc yellow, red iron oxide (In), cadmium red, ultramarine blue, and Prussian blue. Chrome green, cobalt green, amber 'phthalate black, synthetic iron black, carbon black, etc .; The pigment of the present invention requires high-precision color development and heat resistance for the color filter, therefore, the color of the pigment is relatively high, and the heat resistance is high. Organic pigments and / or carbon black are preferred. The 'pigment' in the present invention may be used alone or in combination of two or more. In the present invention, it can be used with dyes, natural pigments, etc. when necessary. In the present invention, each pigment can be used by modifying the surface of its particles with a polymer as required. Examples of the polymer modified on the surface of the pigment particles include polymers described in Japanese Patent Application Laid-Open No. 8-5 9 8 76, and polymers or oligomers for dispersing various pigments on the market. In the present invention, the 'pigment is previously dispersed in a solution of a part or all of the (B) amine group-containing alkali-containing soluble resin described later in part or all of the (E) solvent described later. In the present invention, "when pigment is dispersed (B) a part of the alkali-soluble resin containing an alkali-soluble resin containing an amine group is used", the amine-containing alkali-containing resin used in the preparation of the amine-group-containing alkali-soluble resin and the radiation-sensitive composition is used The soluble resin may be the same or different, but the amine group-containing test soluble resin used when the pigment is dispersed is preferably the following amine group-containing alkali-soluble resin (I) 'amine group-containing alkali-soluble resin (] 1), amine-containing Base-soluble resin (] π) and the like. As necessary, when dispersing pigments and when preparing radiation-sensitive compositions, alkali-soluble resins other than amine-containing alkali-soluble resins can be used. 9- (5) (5) 200401121 Resin, in which case amine-containing resins Alkali-soluble resins other than base-based alkali-soluble resins can be the same or different from pigment-dispersed and radiation-sensitive compositions when formulated. 0 Amine-soluble alkali-soluble resins and amine-containing amidine-soluble resins used when pigments are dispersed The soluble resin can be used alone or in combination of two or more. As long as the pigment can be uniformly dispersed in the aforementioned solution, the amount of the component (B) used when the pigment is dispersed can be appropriately selected. For 100 parts by weight of the pigment, 30 to 50 parts by weight is usually used, and ideally 50 to 300 parts by weight, more preferably 70 to 200 parts by weight. In the present invention, when a part of the (E) solvent is used when the pigment is dispersed, the remaining (E) solvent used when the (E) solvent and the radiation-sensitive composition are used in this part may be the same or different. The (E) solvent used includes, for example, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, and diethylene glycol methyl ether. , Cyclohexanone '2-heptanone, 3-heptanone, ethyl 2-hydroxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropionate Ethyl ester, 3-methyl-3-methoxybutylpropionate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, butyrate Isopropyl ester, n-butyl butyrate, ethyl pyruvate and the like. The pigment dispersion (E) solvent can be used alone or as a mixture of two or more. As long as the pigment can be uniformly dispersed in the aforementioned solution, the amount of (ε) component used when the pigment is dispersed can be appropriately selected. For pigments] 〇〇 重量 份 'usually used 5 0 ~ 2,000 parts by weight, ideally [00 ~~], and when the pigment is dispersed, using the (B) component and (E) component in the above-mentioned range of the amount used can achieve good pigment dispersion. State, at the same time, a radiation-sensitive composition having excellent adhesion between the substrate and the light-shielding layer can be obtained, and a pixel having excellent surface back smoothness and the like can be formed. Pigment · dispersion method As long as the pigment can be uniformly dispersed in the aforementioned solution, a suitable method can be used. 'However, when the pigment is dispersed, the pigment particles can be dispersed without pulverizing or miniaturizing the pigment particles.' For example, a glass ball mill or a roller mill can be used. Dispersing method of disperser. When the pigment is dispersed in a% glass ball mill, for example, glass beads or titanium oxide beads having a diameter of 0.5 to 5 are used, and the pigment, (B) component, and () may be mixed into a liquid mixture in which another pigment dispersant is added. Pigment dispersion was performed in a ball mill. Zhu U's charging car is usually 50 to 80% by volume, and the mixed liquid is put in ^ «It is about 2Gi of the honing mill's grain volume, and the dispersion time is generally. When the pigment is dispersed by a ball mill, the It is preferable to perform it in a cooling state such as cooling water. Roller mills are used for pigment dispersion. For example, a three-axis roller mill is used. Shaft roller mill, etc., mixing 薙, ～ 4 (Β) components and (£) components, and sometimes adding other pigment dispersions, 5, θ λ, tablets' This α liquid is put into the roller mill for Pigment dispersion. … The lighter interval of the draft mill is preferably 7 η h and less than 1 M m. The shearing force is generally -11-(7) 200401121. It is about osdyn / sec, and the dispersion time is generally about 2 to 4 hours. When the pigment of the present invention is dispersed, (B) the test-soluble resin containing an alkali-soluble resin containing an amine group has an excellent dispersant effect on the pigment, and proves that the || Viewpoints such as physical properties: It is preferable not to use pigment dispersants (hereinafter referred to as "other pigment dispersants") other than the component (B), but other pigment dispersants may be used.

Other pigment dispersants include polycarboxylates such as polyacrylates; (partial) amine salts of polyacrylic acid, such as polyacrylic acid, amidine, or ammonium salts; hydroxyl-containing polyacrylates, and other hydroxyl-containing polymers Carboxylic acid esters or these modified products; Polyurethanes; Unsaturated polydonamines; Polysuccinolides; Long-chain polyaminoamines; Poly (lowerimine); and Ammonium amine or its salts obtained from the polymerization reaction containing _ free carboxyl groups. In addition, there is no known product name below. 161, the same] 62, the same | j J 〇〇, | mouth] — 1 6 4 'the same 1 6 5, the same 166, the same] 70, the same — U] 71' the same] 82 (the above is Bea

(Made by Che mi); EFKA ~ 47, latch 47, Q-47EA, same 48, same 49, same 100, same-450 (1; 『h, above is EFKA CHEMICALS public page system); Solserse] 2. 〇〇 、 内. ^ Question—] 3240, same-13940, same—] 7000, same 20000 'same ~ 2 24000' same 27000, same 2800 (the above are made by ZENEKA company, ^ one call me) 'BP7n, BP821 (Made by Ajinomoto Co., Ltd. above), etc. For other pigments other than the aforementioned, A #-Μ ^ political agents, for example, cationic, anionic, non-ionic, Yu You _ take M _ w 1 raw, polysiloxane based, fluorine based, etc. surfactants Wait. -12- (8) (8) 200401121 Such surfactants include, for example, polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether and the like; polyoxyethylene octane Polyoxyethylene alkyl phenyl ethers such as phenylene ether, polyoxyethylene nonyl phenyl ether; polyethylene glycol diesters such as polyethylene glycol dilaurate, polyethylene glycol distearate; Sorbitan fatty acid esters; fatty acid modified polyesters; tertiary amine modified polyurethanes; polyethyleneimines, etc., and KP (made by Shin-Etsu Chemical Industry Co., Ltd.), p 〇iyf] ow (made by Kyoei Chemical Co., Ltd.), F P〇P (made by TOKEM PRODUC D), Megafac (made by Dainippon Ink Chemical Industry (Stock)), F] 〇rade (Sumitomo 3 M (stock) system, Asahi G ar d, Sar fr on e (the above is the Asahi glass (stock) system) and so on. These pigment dispersants can be used alone or in combination of two or more. Other pigment dispersants and pigments can be used in combination with pigment derivatives treated with acids, bases, polymers, etc. Examples of such pigment derivatives include blue pigments and yellow pigment derivatives such as copper-coated cyanine derivatives. These pigment derivatives may be used alone or in combination of two or more. The total amount of other pigment dispersants and pigment derivatives used is 100 parts by weight of the pigment, and is usually 50 parts by weight or less, and preferably 30 parts by weight or less. In the present invention, the average particle diameter of the pigment after the dispersion as described above is 0.0 μm to 0.1 μm, and more preferably 0.0 5 to 0.5 μm. (Bj Alkali-soluble resin The alkali-soluble resin of the present invention contains an alkali-soluble NR2 group-containing -13- (9) tree 0 = hereinafter referred to as "amine-containing soluble resin"). Alkali-soluble resins containing amine groups The alkali-soluble resins of the present invention are not particularly limited when they are alkali-soluble and have a dispersant and a sticky effect on the (A) pigment. Polymerization, polycondensation or addition? Dian Shui Shu Temple's ideal amine-containing alkali-soluble resin is (), for example, an ethylenically unsaturated monomer with a front @w: 4-NR2 group (referred to as "the amine-containing ethylenically unsaturated monomer" "), Copolymerization percentage of ethylenically unsaturated monomers with carboxyl groups, KM standing substituted maleimide, and other copolymerizable monomers (hereinafter referred to as" amine-containing soluble resin (π) amine-containing Copolymers of ethylenically unsaturated monomers, ethylenically unsaturated monomers with carboxyl groups, macromonomers, and other copolymerizable monomers (hereinafter referred to as "Amino-containing testable soluble tree g (]])丨). (1) 1) Amino ethylenically unsaturated monomers, ethylenically unsaturated monomers with carboxyl groups, N-position substituted maleimide, macromonomers and other copolymerizable monomers Copolymers (hereinafter referred to as "alkali-soluble resins (111) containing amine groups"), etc. Macromolecule single systems refer to monomers having an ethylenically unsaturated bond at the single terminal of the polymer molecular chain. Bases containing amine groups Soluble resin (I), amine-containing soluble resin (II), and amine-containing alkali-soluble resin (π I ), "Copolymers of other copolymerizable monomers" does not contain amine-containing ethylenically unsaturated monomers, ethylenically unsaturated monomers with carboxyl groups, and N-position substituted maleimidine and macromolecules Monomer. -14- (10) (10) 200401121 2-aminoethyl (meth) acrylate, 2-N-methylaminoethyl (meth) acrylate, 2-N-(meth) acrylic acid Ethylaminoethyl, 2-N, N-dimethylaminoethyl (meth) acrylate '2-aminopropyl (meth) acrylate, 2-methylaminopropyl (meth) acrylate , 2-N-ethylaminopropyl (meth) acrylate, 2-N, N-dimethylaminopropyl (meth) acrylate, 2-N, N-diethylamino (meth) acrylate Propyl ester, 3-aminopropyl (meth) acrylate, 3-N-methylaminopropyl (meth) acrylate, 3-N-ethylaminopropyl (meth) acrylate, (methyl ) 3-N, N-dimethylaminopropyl acrylate, 3-N, N-diethylaminopropyl (meth) acrylate, and other unsaturated carboxylic acid esters containing amine alkyl groups; N-2 -Aminoethyl (meth) acrylamide, N- (2-N, methylaminoethyl) (methyl Ammonium acrylate, N · (2-N'-ethylaminoethyl) (meth) ammonium propionate'N- (2-N ', dimethylaminoethyl) (meth) acrylic acid Unsaturated amidoamines containing amine alkyl groups such as amidine, N- (2-N ', N'-diethylaminoethyl) (meth) acrylate, amidoamine, etc .; 4-amine styrene, 4-N-methylaminostyrene, 4-N-ethylaminostyrene, 4-N, N-dimethylaminostyrene, 4-N, N-diethylaminostyrene, etc. Amine group-containing aromatic vinyl compounds, etc. Among these amine group-containing ethylenically unsaturated monomers, preferred are unsaturated carboxylic acid esters containing amine alkyl groups, and especially (meth) acrylic acid 2 -Aminoethyl, 2-N-ethylaminoethyl (meth) acrylate, 2-N, N-diethylaminoethyl (meth) acrylate, 2-aminopropyl (meth) acrylate Esters, 3-aminopropyl (meth) acrylate, and the like. The aforementioned amino group-containing ethylenically unsaturated monomers may be used alone or in combination of -15- (11) (11) 200401121 or more. Carboxy-containing ethylenically unsaturated monomers, for example, (meth) propionic acid, crotonic acid, α-chloroacrylic acid 'cinnamic acid, mono [2-mono (methyl) propanoyloxyethyl] succinate' Mono [(2 mono (methyl) propanone) ethyl phthalate, ω-continuous polycaprolactone mono (meth) propionate and other monocarboxylic acids; maleic acid, horse Maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, poplar acid, citraconic anhydride, mesaconic acid, unsaturated monocarboxylic acids (anhydrides); unsaturated polycarboxylic acids (anhydrides) of more than two valences Class, etc. Among these carboxyl group-containing ethylenically unsaturated monomers, (preferably) (meth) acrylic acid, mono [2- (meth) acryloxyethyl] succinate, ω-carboxy polycaprolactone mono ( (Meth) acrylic acid and so on. The aforementioned carboxyl group-containing ethylenically unsaturated monomers may be used singly or in combination of two or more kinds. Examples of the male stilbene substituted at the '' position include N-phenylmaleimide, N-o-hydroxyphenylmaleimide, N-m-hydroxyphenylmaleimide, N ~ p-hydroxyl Phenylmaleimide, N-o-methylbenzylmaleimide, N-m-methylphenylmaleimide, N-methylphenylmaleimide, N-o-methyl N-position aryl substituted maleimide of oxyphenyl maleimide, N-m-methoxyphenyl maleimide, N-p-oxyphenyl maleimide In addition, there are N-cyclohexylmaleimide and the like. Among these N-position substituted maleimides, the N-phenylmaleimide'N ~ p-hydroxyphenylmaleimide, N-cyclohexylmaleimide and the like are more preferable. -16- (12) (12) 200401121 BU mentioned N ~ position substituted maleimide can be used alone or in combination of two or more. The molecular chain of the polymer of the molecular monomer is, for example, polystyrene, poly (methyl) propane; I methylformate, poly (meth) acrylate, methyl (meth) propionate / (methyl) ) Molecular chain of 2-hydroxyethyl acrylate copolymer, polycaprolactone, polyoxyethylene, polysiloxane, etc. Macromonomers can be synthesized, for example, by reacting an appropriate precursor polymer at a single terminal of the aforementioned polymer molecular chain with an ethylenically unsaturated compound having a Lunengyl group which can react with the functional group. The precursor polymer having the foregoing functional group can be obtained, for example, by methods such as active anion ionization, living cationic polymerization, terminal modification reaction of the living polymer, and synthesis of a far polymer. Polymerization-based resins or polycondensation-based resins can also be used as the precursor polymer. The ethylenically unsaturated compound having the aforementioned complementary functional group may be appropriately selected according to the type of the functional group in the precursor polymer, and an ethylenically unsaturated acid such as (meth) propionic acid is used. Unsaturated acid chlorides, derivatives of amino alkyl esters, hydroxy alkyl esters, glycidyl esters, etc. or p-aminostyrene 'vinyl glycidyl ether, allyl glycidol, p-vinyl benzyl Glycidyl ether and the like. The macromolecule single system of the present invention has an ethylenically unsaturated bond at a single terminal of a polymethacrylic acid molecular chain, and is desirably a macromonomer having a (meth) acryloxy group (hereinafter referred to as "poly Macromolecular monomer of methyl methacrylate j). Ideally, methyl methacrylate / 2-hydroxyethylmethylpropionate copolymer has a single terminal ethylenic unsaturated bond, and is preferably -17. -(13) (13) 200401121 Macromolecular monomers with propylene or methacryloxy (hereinafter referred to as "poly (methyl methacrylate / 2-hydroxyethyl methacrylate)" macromolecules monomer"). The aforementioned macromonomers can be used alone or in combination. In addition, other copolymerizable ethylenically unsaturated monomers include, for example, styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, ortho- Aromatics such as methoxystyrene, m-methoxystyrene, p-methoxystyrene, knots, p-vinylbenzyl methyl ether, p-vinylbenzyl glycidyl ether, etc. Vinyl compounds: ep,]-methyl, etc. ©; methyl (meth) propionate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) propionate Propyl ester, n-butyl (meth) acrylate, isobutyl (meth) acrylate, second butyl (meth) acrylate, third butyl (meth) acrylate '2-hydroxyethyl (meth) acrylate Ester, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, allyl (meth) acrylate, (meth) acrylic acid Benzyl acid 'phenyl (meth) acrylate' 2-methoxyethyl (meth) acrylate, methoxydiethylene glycol (meth) acrylate, (methyl ) Other unsaturated hydroxy acid esters such as methoxytriethylene glycol acrylate, (meth) glycerol monoacrylate, etc .; Unsaturated carboxylic acid glycidyl esters such as (meth) glycidyl acrylate; vinyl acetate Esters, vinyl propionate, vinyl butyrate, vinyl benzoate, carboxylic acid vinyl esters such as 18- (14) (14) 200401121 esters; vinyl methyl ether, vinyl ether, allyl glycidyl ether Unsaturated ethers such as' methallyl glycidyl ether; (meth) acrylic acid nitriles, α-chloroacrylic acid nitriles, vinyl cyanide compounds such as vinylidene chloride. (Meth) acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth) acrylamide and other unsaturated amines; maleimide 'N-phenylmaleimide Unsaturated fluorene imines such as fluorene imine, N-cyclohexyl maleimide, and aliphatic conjugated diene such as 1,3-butadiene, isoprene, chloroprene, etc. Of these other copolymerizable ethylenically unsaturated monomers, styrene, methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, benzyl (meth) acrylate, Phenyl (meth) acrylate, (meth) glycerol monoacrylate, and the like. The aforementioned other copolymerizable ethylenically unsaturated monomers may be used alone or in combination of two or more. In the present invention, specific examples of the ideal amine-containing alkali-soluble resin (I) include 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / styrene / Benzyl methacrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / styrene / phenylmethacrylate copolymer, acrylic acid 2-N, N-diethylaminoethyl / methacrylic acid / succinic acid mono-19-(15) (15) 200401121 (2-propanyloxyethyl) / N-phenylmaleimide / Styrene / benzyl methacrylate copolymer, 2-N, N-diethylamino propionate / methacrylic acid / carboxy polyhexamethylene monoacrylate / N-phenylmaleimide / Styrene / benzyl methacrylate copolymer, 2-N'N-diethylaminopropionic acid / methacrylic acid / N_phenylmaleimide / phenethyl;)% / A Benzyl acrylate / glycerol monomethacrylate copolymer and the like. In the amine group-containing soluble resin (1), the copolymerization ratio of the amine group-containing ethylenically unsaturated monomer is usually 5 to 50% by weight, and ideally is 0 to 40% by weight. At this time, when the copolymerization ratio of the ethylenically unsaturated monomer containing an amine group is less than 5% by weight, the dispersibility of the pigment tends to decrease. If it exceeds 50% by weight, the alkali solubility of the copolymer obtained is reduced, and Residues or texture contamination may occur on the substrate of the exposed part or on the light-shielding layer. The copolymerization ratio of the residue-containing ethylenically unsaturated monomer is usually 5 to 50% of the amount of smoked, and is desirably 0 to 40% by weight. At this time, when the copolymerization ratio of the ethylenically unsaturated monomer containing the end group is less than 5% by weight, the solubility of the prepared radiation-sensitive composition to the rubidium developer tends to decrease. If it exceeds 50% by weight, When developing with an alkaline developer, the formed pixels tend to fall off the substrate or tend to cause the surface film of the pixels to become rough. The copolymerization ratio of N-position substituted maleimide is usually 5 to 50% by weight, preferably 10 to 40% by weight. At this time, when the copolymerization ratio of N-substituted maleimine is less than 5% by weight, the heat resistance of the produced pixel tends to decrease. If it exceeds 50% by weight, the base-20 of the copolymer obtained is -(16) (16) 200401121 The solubility tends to decrease, and residues or texture pollution may occur on the substrate or light-shielding layer of the unexposed area. Amino-group-containing alkali-soluble resin (the weight-average molecular weight of polystyrene converted to polystyrene measured by gel permeation chromatography (GPC) (hereinafter, referred to as "1 ^") is usually], 000 ~ 1: 000,000 , Ideally 2,000 ~ 500,000, more preferably 3,000 ~] 00,000. As mentioned above, the copolymerization ratio of each monomer and the pigment dispersing ability of the alkali-soluble resin () with MW containing amine group is high, and it has an alkali developing solution. Excellent solubility and various characteristics of the hardened product obtained from the monomer. The radiation-sensitive composition using the alkali-soluble resin (1) containing the amine group is not dissolved after being developed with an alkali developer. The residue of the object is extremely small, and the area other than the pixel forming portion on the substrate is unlikely to cause pollution, film residue, etc., and the pixel composed of the composition will not excessively dissolve the alkali developing solution, and has excellent adhesion to the substrate. Worry about falling off from the substrate. Specific examples of ideal amine-containing fluorene-soluble resins (Π): 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / Poly (methyl Methyl acrylate / 2-hydroxyethyl methacrylate) macromonomer / styrene / benzyl acrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-phenyl Maleimide / polymethyl methacrylate macromonomer / styrene / benzyl acrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-benzene Maleimide / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macro-21-(17) (17) 200401121 sub-monomer / styrene / phenyl methacrylate copolymer 2, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / polymethyl methacrylate macromonomer / styrene / phenyl acrylate copolymer, acrylic acid 2-N, N-diethylaminoethyl / methylpropionic acid / N-phenylmaleimide / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / Styrene / 2-hydroxyethyl methacrylate / benzyl methacrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / Polymethyl methacrylate macromonomer / benzene Ene / 2-hydroxyethyl methacrylate / benzyl methacrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / poly ( Methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / styrene / 2-hydroxyethyl methacrylate / phenyl methacrylate copolymer, 2-N, N-diethylamine acrylate Ethyl ester / methacrylic acid / N-phenylmaleimide / polymethyl propionate macromonomer / styrene / 2-hydroxyethyl methacrylate / phenyl methacrylate copolymer , 2-N, N-diethylaminoethyl acrylate / methacrylic acid / mono (2-propenyloxyethyl) succinate / N-phenylmaleimide / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / styrene / benzyl acrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / succinic acid mono-22-(18 ) (18) 200401121 (2-propanone ethyl acetate VN-phenylmaleimide / polymethyl methacrylate macromonomer / phenethyl ether / benzyl acrylate copolymer, acrylic acid 2 'N' N ~ Diethylaminoethyl / methacrylic acid / number Acid mono (2-propanoic acid ethoxylate VN —phenylmaleimide / poly (methyl methacrylate / methacrylic acid 2-via ethyl ester) macromonomer / styrene / methyl Copolymer of phenyl acrylate, 2 'N-diethylaminoethyl acrylate / methylpropionic acid / succinic acid mono (2 · propenyloxyethyl) / N-phenylmaleimide / polymethyl Methyl acrylate macromonomer / styrene / phenyl acrylate copolymer, 2-N'N-diethylaminoethyl acrylate / methacrylic acid / ω-kidney polycaprolactone / N-phenyl acrylic acid Maleimide / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / styrene / benzyl acrylate copolymer, 2-N, N-diethylaminoethyl acrylate Ester / methacrylic acid / monoacrylic omega-carboxy polycaprolactone / N-phenylmaleimide / polymethyl methacrylate macromonomer / styrene / benzyl acrylate copolymer, acrylic acid 2- N, diethylaminoethyl / methacrylic acid / ω-carboxy polycaprolactone monoacrylate / N-phenylmaleimide / poly (methyl methacrylate / methacrylic acid 2-hydroxyethyl Ester) macromonomer 7 styrene / Methacrylic acid benzene copolymer, acrylic acid 2_N, N-diethylaminoethyl / methacrylic acid / monoacrylic omega_endyl polycaprolactone / N-phenylmaleimide / Polymethyl methacrylate macromonomer / styrene / phenyl acrylic copolymer '-23- (19) (19) 200401121 acrylic 2-N' N-monoethylaminoethyl / methacrylic acid / N _Phenylmaleimide / Poly (methylpropionate / methacrylic acid 2-methylacetate) macromonomer / Phenylacetate / monomethylpropionate / Methacrylic acid benzoic acid copolymer, 2-N'N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / polymethyl methacrylate macromonomer / Styrene / glyceryl monomethacrylate / benzyl methacrylate copolymer, 2-N'N-diethylaminoethyl acrylate / methacrylic acid / N-phenylmaleimide / poly ( Methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / styrene / glyceryl monomethacrylate / phenyl methacrylate copolymer, 2-N, N-diethylaminoethyl acrylate Ester / methacrylic acid / N-phenylmaleimide / poly Methyl Acrylic Macromonomer / Phenylacetate / Glyceryl Mono Methacrylate / Phenyl Methacrylate Copolymer '2-N, Diethylamino Ethyl Acetate / N-Phenyl Malay醯 imine / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / polymethyl methacrylate macromonomer / styrene / benzyl methacrylate copolymer, acrylic acid 2-N, N-diethylaminoethyl / methacrylic acid / N-phenylmaleimide / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / poly Methyl methacrylate macromonomer / styrene / 2-hydroxyethyl methacrylate / phenyl methacrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / succinic acid Mono-24-(20) 200401121 (2-propenyloxyethyl) / N-phenylmaleimide / poly (methyl methacrylate / 2-methyl ethyl methacrylate) macromonomer / Polymethyl methacrylate macromonomer / styrene / benzyl acrylate copolymer, 2-N, N-diethylaminoethyl acrylate / methacrylic acid / ω-hydroxypolycaprolactone / N-Phenylmaleimide / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / styrene / benzyl methacrylate copolymer, acrylic acid 2-Ν, Ν- Diethylaminoethyl / methacrylic acid / N-phenylmaleimide / poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer / polymethyl methacrylate giant Molecular monomer / styrene / benzyl methacrylate / glyceryl monomethacrylate copolymer and the like. In the amine group-containing alkali-soluble resin (III), the copolymerization ratio of the amine group-containing ethylenically unsaturated monomer is usually 5 to 50% by weight, and preferably 10 to 40% by weight. At this time, when the copolymerization ratio of the ethylenically unsaturated monomer containing an amine group is less than 5% by weight, the dispersibility of the pigment tends to decrease. If it exceeds 50% by weight, the alkali solubility of the obtained copolymer decreases. Residues or texture contamination may occur on the substrate of the exposed part or on the light-shielding layer. The copolymerization ratio of the N-position-substituted maleimide is usually 5 to 50% by weight, and is desirably 10 to 40% by weight. At this time, when the copolymerization ratio of the N-position-substituted maleimide imine is less than 5% by weight, the solubility of the prepared radiation-sensitive composition to the alkali developer tends to decrease, if the amount of g g is 50 ^! At this time, the pixels formed when developing with the "developing solution" tend to be easily lost from the substrate or tend to cause the surface film of the pixels to be rough. Ideally, the copolymerization ratio of the macromonomer is usually 5 to 50% by weight -25-(21) (21) 200401121] 0 to 40% by weight. At this time, when the copolymerization ratio of the macromonomer is less than 5% by weight, the heat resistance of the produced pixel tends to decrease. If it exceeds 50% by weight, the solubility of the copolymer obtained by the preparation tends to decrease. Residues or texture contamination may occur on the substrate of the exposed part or on the light-shielding layer. The weight-average molecular weight (hereinafter referred to as "M Λν") of polyamine converted into polystyrene measured by gel permeation chromatography (GPC) based on the amino-soluble alkali-soluble resin (III) is usually I: 〇000〜; U 0 0 0, 0 0 0, ideally 2,000 to 500: 000, more preferably 3,000 to] 00,000. For example, the copolymerization ratio of each monomer and the pigment dispersing ability of the ammonium-soluble ammonium-soluble resin (III) with MW are high, and it has excellent solubility for the amaranth developer, and at the same time hardened by the monomer The various properties of the object are excellent, and the radiation-sensitive composition using the alkali-soluble resin (III) containing the amine group has little residue of undissolved matter after development with an alkali developing solution, and it is not easy for areas other than the portion where pixels are formed on the substrate. Pollution, film residues, etc. occur, and the pixels composed of this composition do not dissolve excessively to the alkali developer, and have excellent adhesion to the substrate. 'There is no need to worry about falling off from the substrate. The amine group-soluble soluble resin of the present invention is more preferably an amine group-containing ethylenically unsaturated monomer (π) and an amine group-containing ethylenically unsaturated monomer (111), and it is particularly desirable that these macromolecular monomers are at least one kind. Amine-group-soluble soluble resin (11) selected from polymethyl methacrylate macromonomer and poly (methyl methacrylate / methacrylic acid 2 · hydroxyethyl acetate) macromonomer group and Amine ethylenically unsaturated monomer (1 η) ° In the present invention, the amine group-containing alkali-soluble resin can be used alone or as a mixture of two or more of -26- (22) (22) 200401121. Amino-soluble alkali-soluble resins (]) to (Π I) other soluble resins (hereinafter referred to as "other alkali-soluble resins") are preferably other monomers that can be copolymerized with ethylenically unsaturated monomers having a carboxyl group. Copolymer (hereinafter referred to as "alkali soluble resin (i)"). Specific examples of the ideal alkali-soluble resin (i): acrylic acid / benzyl acrylate copolymer, acrylic acid / benzyl acrylate / styrene copolymer, acrylic acid / methyl acrylate / styrene copolymer, acrylic acid / benzene methacrylic acid Methyl ester copolymer, acrylic acid / benzyl methacrylate / styrene copolymer, acrylic acid / methyl methacrylate / styrene copolymer, methacrylic acid / phenyl methacrylate copolymer, methacrylic acid / acrylic acid Benzyl ester / styrene copolymer, methacrylic acid / methyl acrylate / styrene copolymer, methacrylic acid / benzyl methacrylate copolymer, methacrylic acid / benzyl methacrylate / styrene Copolymer, methacrylic acid / methyl methacrylate / styrene copolymer, acrylic acid / benzyl acrylate / 2-hydroxyethyl acrylate copolymer, acrylic acid / benzyl methacrylate / propionate 2-hydroxyethyl Ester copolymer, acrylic acid / benzyl acrylate / 2-hydroxyethyl acrylate copolymer, acrylic acid / benzyl methacrylate / methylpropionate 2-hydroxyethyl copolymer, -27- (23) (23 200401121 acrylic / N-phenyl horse Fluorene imine / benzyl acrylate / styrene copolymer, acrylic acid / N-phenylmaleimide / benzyl methacrylate / styrene copolymer, methacrylic acid / benzyl acrylate / acrylic acid 2- Hydroxyethyl copolymer, methacrylic acid / benzyl methacrylate / 2-hydroxyethyl acrylate copolymer, methacrylic acid / benzyl acrylate / 2-hydroxyethyl acrylate copolymer, methacrylic acid / Benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, methacrylic acid / N-phenylmaleimide / benzoic acid acrylate / styrene copolymer, methacrylic acid / N-benzene Methyl maleimide / benzyl methacrylate / styrene copolymer, acrylic acid / succinic acid mono (2-propenyloxyethyl) / N-phenylmaleimide / styrene / acrylic acid allyl Ester copolymer, acrylic acid / succinic acid mono (2-methacryloxyethyl) / N-phenylmaleimide / styrene / allylic acrylate copolymer, acrylic acid / succinic acid mono (2-propylene Ethoxyethyl) / N-phenylmaleimide / styrene / allyl methacrylate copolymer, acrylic acid / succinic acid (2-Methacryloxyethyl) / N-phenylmaleimide / styrene / allyl methacrylate copolymer, -28-(24) 200401121 methacrylic acid / succinic acid mono (2 -Acryloxyethyl) / N-phenylmaleimide / styrene / allyl acrylate copolymer, methacrylic acid / succinic acid mono (2-methylpropoxyethyl acetate) / N-benzene Methyl maleimide / styrene / acrylic acid allyl vinegar copolymer methyl propanoic acid / battery acid mono (2-propenyloxyethyl) / N-phenylmaleimide / styrene (Methacrylic acid): Glycolic acid, Propylene acetate copolymer, Methacrylic acid / Acrylic acid mono-methyl acetic acid,) / N-phenylmaleimide / Styrene / Methylpropene Acrylic acid copolymer phenyl

N Acrylic acid / Acrylic acid single (2 Acrylic acid), ΐχΐ Maleimide / Acrylic acid acetophenone / Ethyl acetic acid_copolymer acrylic acid, Succinic acid mono (2-Methacrylic acid) Ethyl) phenylmaleimide / benzyl acrylate acetophenone copolymer-phenylacrylic acid / succinic acid mono (2 -maleimide / methacrylic acid benzoic acid / succinic acid mono (2 -Phenylmaleimide / methacrylic acid methacrylic acid / succinic acid monophenylmaleimide / benzyl methacrylic acid / succinic acid monoacrylic acid ethyl ester) /] vinegar / styrene copolymerization Material, methacrylic acid ethyl ester) / N phenyl methyl ester / styrene copolymer, 2 to propylene ethoxymethyl ester) / N @ / styrene copolymer, methacrylic acid ethyl acetate) N —phenyl Malaysian imine / benzyl propionate / styrene copolymer propylene oxide ethyl ester) Ester / styrene copolymer ^ methacrylic acid ethoxylate _ 、

N methacrylic acid / succinic acid mono (2 phenylmaleimide / phenyl methacrylate EJ3 methacrylic acid / succinic acid mono (2--29- (25) (25) 200401121 N ~ phenylmaleic acid Imine / benzyl methacrylate / styrene copolymer 1 acrylic acid / N-phenylmaleimide / methacrylic acid methyl ester / glyceryl monoacrylate / styrene copolymer, acrylic acid / N-phenyl horse Copolymer of lymeimide / benzyl acrylate monoglyceride / styrene, acrylic acid / N-phenylmaleimide / benzoic acid methacrylate / glyceryl monomethacrylate / styrene copolymer Material, acrylic acid / N-phenylmaleimide / methacrylic acid benzoate / oleyl methacrylate / styrene copolymer, methacrylic acid / N-phenylmaleimide / acrylic acid Benzoacetate / Glyceryl monoacrylate / styrene copolymer, Methacrylic acid / N-phenylmaleimide / Benzyl acrylate / Glyceryl monopropionate / styrene copolymer, Methacrylic acid / N -Phenylmaleimide / benzyl methacrylate / glyceryl monomethacrylate / styrene copolymer, methacrylic acid / N-phenylmaleimide Amine / benzyl methacrylate / glyceryl monomethacrylate / styrene copolymer, etc. In the alkali-soluble resin (i), the copolymerization ratio of the ethylenically unsaturated monomer containing a carboxyl group is usually 5 to 50% by weight, Ideally] 0 to 40% by weight. At this time, when the copolymerization ratio of the ethylenically unsaturated monomer containing a carboxyl group is less than 5% by weight, the solubility of the prepared radiation-sensitive composition to the alkali developer tends to decrease. ' If it exceeds 50% by weight, the pixels formed when 'developed with an alkali developing solution' tend to fall off from the substrate or tend to cause a rough -30-(26) 200401121 of the pixel surface film. M w of the alkali-soluble resin (i) Normally, 〇〇〇〜 ～ Ideally 2J00 ～ 500,00 ′ ′, more preferably 33: 00 ～] 00 In the present invention, other alkali-soluble resins can be used alone or in combination. Other bases of the present invention Use ratio of soluble resin The entire soluble resin is preferably used in an amount of 50% by weight or less: 5% by weight or less. The total amount of the alkali-soluble resin used in the present invention is a centimeter] When 0 0 parts by weight, 30 to 50 are generally used 0 parts by weight to 3 0 0 weight In the present invention, it is used within this range (to obtain a superior composition such as adhesion to a substrate and a light-shielding layer, and developability. In the present invention, the pigment is previously dispersed in the alkali-soluble property of the (B) alkali-soluble resin. A part or all of the resin) a part or all of a solvent solution, the following is more clear about the use of the component (B). (1) When the alkali-soluble component constituting the radiation-sensitive composition is used for pigment dispersion, the remaining part Used to modulate the form when radiation sensitive: This form is the case of alkali-soluble resins used when pigments are dispersed) alkali-soluble resins containing amine groups or (mixtures of ethyl-soluble resins and other alkali-soluble resins) The use ratio of alkali-soluble resin is ideally], 000,000 >; 000 »Use or mix 2 is ideal for alkali concealment, which is 3 0 丨 in (A), ideally 50 B) Radiation sensitive ingredients with different components 5 of amine group is dissolved in (E body indicates that one part of the resin composition of this hair is composed of (A) only containing amine group, (B used 50 weight -31-(27) (27) 200401121% by weight or less) More preferably is 30 wt% or less. The alkali-soluble resin used for the modulation of radiation-sensitive compositions is only (A) the case of amine-containing osmium-soluble resins or (B) the amine-containing alkali-soluble resins and other alkali-soluble resins or only (C) In the case of other alkali-soluble resins, the use ratio of the other alkali-soluble resins in (B) is preferably 50% by weight or less, and more preferably 30% by weight or less. (2) All the alkali-soluble resins constituting the radiation-sensitive composition are used in the form of pigment dispersion: In this form, the alkali-soluble resins may be composed only of (a) alkali-soluble resins containing amine groups or (b) In the case of a mixture of an alkali-soluble resin containing an amine group and another alkali-soluble resin, the use ratio of the other alkali-soluble resin in the case of (B) is preferably 50% by weight or less, and more preferably 30% by weight or less. (C) Polyfunctional monomer The polyfunctional monomer in the present invention is a monomer having two or more polymerizable unsaturated bonds. Examples of the polyfunctional monomer include di (meth) acrylates of alkanediols such as ethylene glycol and propylene glycol; di (meth) acrylates of polyalkanediols such as polyethylene glycol and polypropylene glycol Poly (meth) acrylates of trivalent or higher polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, and dipentaerythritol, or modified products of these dicarboxylic acids; polyesters, epoxy resins, and urethane trees Esters, alkyd resins, polysilicon-32-(28) 200401121 oligomeric (meth) acrylates such as oxalane resins, spirane resins; rain-terminated hydroxy poly-], 3-butadiene, both ends Di (meth) acrylates of hydroxylated polymers such as hydroxypolyisoprene, rain-terminated hydroxypolycaprolactone, etc. In addition, there is tris [2- (meth) acryloxyethyl] phosphate Esters, etc. Among these polyfunctional monomers, poly (meth) acrylates of trivalent or higher polyhydric alcohols or modified products of these dicarboxylic acids are preferred, and specific examples thereof include trimethylolpropane tripropionate, Trimethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethyl acrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, two Pentaerythritol hexaacrylate and dipentaerythritol hexamethacrylate are represented by the following formula (): ch2ococh = ch2 h2c = chcooch2-—C-CH2OCOCH2CH2COOH (1) ch2ococh = ch2, and ch3 IH2C = CCOOCH2— H3IICOCIIΗ3 2) cioc20oc— c CCH2C iH20—cH20 ^ c —c · —ο

C Η

C Ηοο C 2 Η 2 C 2 Η ^ Η (The compounds represented by 2 etc., especially trimethylolpropane triacrylate, pentaerythritol triacrylate, and dipentaerythritol hexaacrylate, have high pixel layer strength and smooth pixel surface It has excellent properties, and is less prone to texture contamination on the substrate of the unexposed part and on the -33- (29) (29) 200401121. These polyfunctional monomers can be used alone or in combination of two or more. In the present invention, The above-mentioned polyfunctional monomer may be used in combination with a monofunctional monomer. Specific examples of the above-mentioned monofunctional monomer include the above-mentioned amine-group-containing alkali-soluble resins () and (π η-exemplified amine-group-containing In addition to ethylenically unsaturated monomers, ethylenically unsaturated monomers containing carboxyl groups, maleinimine substituted with N-position or other copolymerizable ethylenically unsaturated monomers, and commercially available products M-5300, M -54 00 (trade name, manufactured by Toa Kosei Co., Ltd.), etc. These monofunctional monomers can be used singly or in combination of two or more types. The proportion of the monofunctional monomer is based on the monofunctional monomer and polyfunctionality. When the total amount of monomers is used It is generally 90% by weight or less, and more preferably 50% by weight or less. In this case, if the use ratio of the monofunctional monomer exceeds 90% by weight, the strength or surface smoothness of the obtained pixel may be insufficient. The total amount of polyfunctional monomers and monofunctional monomers used is (for the (B) component) 0 to 0 parts by weight, usually 5 to 500 parts by weight, and more preferably 20 to 300 parts by weight In this case, if the total usage is less than 5 parts by weight, the strength and surface smoothness of the pixel tends to decrease. On the other hand, if it exceeds 500 parts by weight, for example, the alkali developability is reduced or the unexposed portion is reduced. The substrate and the light-shielding layer are liable to cause surface uncleanness or film residue. (D) Photopolymerization initiator -34- (30) (30) 200401121 The photopolymerization initiator of the present invention refers to visible light, ultraviolet light, Radicals such as extreme ultraviolet rays, electron beams, and X-rays are active compounds that decompose or bond to crack and cause radicals, cations, and anions of the above (C) polyfunctional monomers to polymerize. This photopolymerization Initiator Imidazole-based compounds, benzoin-based compounds, acetophenone-based compounds, benzophenone-based compounds, α-diketone-based compounds, polynuclear quinone-based compounds, thioxanthone-based compounds, triphine-based compounds, etc. Specific examples of the imidazole-based compound include 2,2'-bis (2-chlorophenyl) -4,4,5,5'-tetrakis (4-ethoxycarbonylphenyl) -1,2; -biimidazole , 2, 2, bis (2-bromophenyl) -4,4,4,5,5, tetrakis (4-ethoxycarbonylphenyl) -1,2'-biimidazole, 2,2 · -bis ( 2-chlorophenyl) -4,4:, 5,5'-tetraphenyl-1,2 · -biimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,4 ,, 5,5'-tetraphenyl-1,2'-biimidazole, 2,2, bis (2,4,6-trichlorophenyl) -4,4,5,5, -tetrabenzene 1,2'-biimidazole, 2,2'-bis (2,4-dibromophenyl) -4,4,5,5'-tetraphenyl-], 2, biimidazole, 2,2'-bis (2,4,6-tribromophenyl) -4,4,5,5'-tetraphenyl-1,2 · -biimidazole and the like. These biimidazole compounds are excellent in the solubility of the solvent, do not produce foreign matter such as undissolved matter or precipitates in -35- (31) (31) 200401121, and the sensitivity is high, and the hardening reaction can be fully performed even with a small amount of energy exposure Due to the high contrast, no hardening reaction occurs in the unexposed areas, so the exposed coating film is clearly distinguished from the insoluble hardened part of the developer and the unhardened part with high solubility for the developing solution, so that the High precision pixel array 歹 y. Specific examples of the aforementioned benzoin-based compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, methyl-2 2-benzylbenzyl benzyl Esters and so on. Specific examples of the aforementioned acetophenone-based compound include 2,2-dimethoxy-2-phenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropanone, and 1- (4-isopropyl Phenyl) -2—Ethyl-2-methylpropanone-1] —ketone, 4-((2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 2,2— Dimethoxyacetophenone, 2,2-diethoxyacetophenone, 2-methyl— (4-methylthiophenyl) —2—morpholine —]-Yiyuan-1—one-one, 2 -Benzyl-1,2-dimethylamino-1, 1- (4-morpholinylphenyl) butane-1, one, 1-hydroxycyclohexylphenyl ketone, 2,2-dimethoxyl], 2 diphenylethane-one and so on. Specific examples of the benzophenone-based compound include 4,4'-bis (dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone, and the like. Specific examples of the α-diketone-based compound include butanedione, benzophenone, and methylbenzophenylate. Specific examples of the polynuclear quinone-based compound include anthraquinone, 2-ethylallinoquinone-36- (32) (32) 200401121, 2-tert-butylanthraquinone, and 4-naphthoquinone. Specific examples of the glutathione-based compound include glutathione, thioxanthone, and 2-chlorobenzothioxanthone. Specific examples of the above-mentioned three-tillage compounds are], 3,5-tris (trichloromethyl) -3-three-tillage, 1,3-bis (trichloromethyl) -5- (2-chlorophenyl)- s-Sangen, 1,3-bis (trichloromethyl) -5-(4-chlorophenyl) -s-Sangen '1,1 -bis (trichloromethyl) -2-(3-methyl Oxyphenyl) -s-trioxo '1,3-bis (trichloromethyl) -5- (4-methoxyphenyl) -s-tri-D, 2- (2-ethylfuranyl) -4,6-bis (trichloromethyl) -s-triphorphine, 2- (4-methoxymethoxystyryl) -4,6-bis (trichloromethyl) -s-tri-U well, 2- (3 · 4-dimethoxystyryl) -4,6-bis (trichloromethyl) -S-di-D '' (2- (4-methoxynaphthyl) -4,6- Bis (trichloromethyl) -S-trimorphine, 2- (2-bromo-4-methylphenyl) -4,6-bis (trichloromethyl) -s-Sangen-37-1 〇2 When the photopolymerization initiator of the present invention is used in an amount of 100 parts by weight with respect to a total of (C) the polyfunctional monomer and the monofunctional monomer used when necessary, it is generally used in the range of 0.00 to 200 parts by weight. Ideally, it is ～ 120 parts by weight, 3- (2-thiophenylethylidene) -4,6-bis (trichloromethyl) -s-Sangen, etc. 4 The photopolymerization initiator of the present invention may be used singly or in combination of two or more. (33) (33) 200401121 More preferably, it is 1 to] 〇 〇 part by weight. At this time, when the amount of the photopolymerization initiator is less than 0.0 parts by weight, the curing of the exposure is insufficient, and it may be difficult to obtain a pixel array in which pixels are arranged in a desired arrangement. On the other hand, if it exceeds 2000 parts by weight, the formed pixels During development, it is easy to fall off from the substrate, and texture pollution, film residue, etc. are easily generated on the substrate or the light-shielding layer of the unexposed portion. In the present invention, as the photopolymerization initiator, if necessary, one or more sensitizers, hardening accelerators, polymer optical bridges, sensitizers, and the like may be used. (E) Solvent The solvent of the present invention is not particularly limited if it is dispersed or dissolved in the above-mentioned components (A) to (D) constituting a radiation-sensitive composition, and does not react with these components and has appropriate volatility. Specific examples of the solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, Diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monofluorene Ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether (Poly) alkanediol monoalkyl ethers such as alkyl ether, tripropylene glycol monomethyl ether, and tripropylene glycol monoethyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate , Diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl (Poly) alkanediol monoalkyl ether acetates such as ether acetate; diethylene glycol monodimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol-38- (34) (34 200401121 Alcohol diethyl ether, tetrahydrofuran and other ethers; methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone and other ketones; methyl 2-hydroxypropionate, 2-hydroxypropionic acid Alkyl lactates such as ethyl ester; 2-hydroxy-2-methyl propionate '3-methyl methoxypropionate, 3- 3-methoxypropionate, 3-ethyl ethoxypropionate , Ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, N-butyl propionate 'ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl ethyl acetate , Ethyl acetate, ethyl 2-oxobutanoate and other esters; toluene, dimethyl And other aromatic hydrocarbons; N-methyl-pyrrolidone adjoin 'N, N- dimethylformamide, N, N- dimethyl acyl amines such as acetamide and the like. '' Among these solvents, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether are used in terms of solubility, pigment dispersibility, and coatability. Ether ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl 2-hydroxypropionate, 3-methyl Ethyloxypropionate, Methyl 3-ethoxypropionate, Ethyl 3-ethoxypropionate, 3-Methyl-3-methoxybutylpropionate, n-butyl acetate, isopropyl acetate Butyl, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, isopropyl butyrate, n-butyl butyrate, ethyl pyruvate and the like are preferred. -39- (35) (35) 200401121 The above solvents can be used alone or in combination of two or more. The solvent can be used with benzylethyl ether, di-n-hexyl ether, acetone, acetone, isophorone, hexanoic acid, octanoic acid-octanol, 1-naphthol, benzyl alcohol, benzyl acetate, and benzoic acid. High boiling point solvents such as ethyl acetate, diethyl oxalate, diethyl maleate, r-butyrolactone, ethylene carbonate, propylene carbonate, and ethylene glycol monophenyl ether acetate are used. Among these high-boiling solvents, 7-butyrolactone and the like are preferable. These high boiling point solvents may be used alone or in combination of two or more. The amount of the solvent used in the present invention is not particularly limited, but from the viewpoints of coating properties and safety of the prepared radiation-sensitive composition, the total concentration of the components except the solvent is generally 5 to 5 0% by weight, more preferably in an amount of 0 to 40% by weight. Additives The radiation-sensitive composition for a color filter of the present invention may contain various additives as necessary. The above-mentioned additives include, for example, organic acids which improve the solubility of the radiation-sensitive group for color filters in alkaline developers, and further inhibit the residual effect of undissolved matter after development. This organic acid is preferably an aliphatic acetic acid or a phenyl-containing carboxylic acid having one or more carboxyl groups in the molecule. The aliphatic carboxylic acids include, for example, aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, hexanoic acid, diethylacetic acid, heptanoic acid, and octanoic acid; oxalic acid, malonic acid, Succinic acid, glutaric acid 'adipic acid, pimelic acid, -40- ¢ 36) ¢ 36) 200401121 suberic acid, azelaic acid, sebacic acid, azelaic acid, methylmalonic acid, ethylpropyl Dibasic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, cyclohexyl dicarboxylic acid, itaconic acid, citraconic acid, maleic acid, fumaric acid, mesaconic acid and other aliphatic dicarboxylic acids Carboxylic acids; aliphatic tricarboxylic acids such as glyceric acid, aconitic acid, and camphoric acid. The phenyl-containing carboxylic acid includes, for example, an aromatic carboxylic acid in which a carboxyl group is directly bonded to a phenyl group, or a carboxylic acid in which a carboxyl group is connected to a phenyl group through a carbon chain, and the phenyl-containing carboxylic acid includes, for example, benzoic acid, toluic acid, and Aromatic monocarboxylic acids such as acetic acid, dimethylbenzoic acid, and trimethylbenzoic acid; aromatic dicarboxylic acids such as phthalic acid, iso-phthalic acid, and terephthalic acid; trimellitic acid, Aromatic polycarboxylic acids, such as trimesic acid, trimellitic acid, pyromellitic acid, and the like, which are trivalent or higher; or phenylacetic acid, hydroatomic acid, hydrocinnamic acid, picric acid, phenylsuccinic acid, atto Acid, cinnamic acid, cinnamic acid, coumaric acid, umbellic acid, etc. Among these organic acids, they are soluble in alkali, soluble in the following solvents, and prevent the substrate and the light-shielding layer from being generated in the unexposed part. From the viewpoints of surface texture pollution or film residue, aliphatic dicarboxylic acids and aromatic dicarboxylic acids such as malonic acid, adipic acid, itaconic acid, citraconic acid, fumaric acid, mesaconic acid, phthalic acid, and the like Acids are preferred. These organic acids may be used alone or in combination of two or more. The amount of the organic acid used is generally 10% by weight or less, more preferably 5% by weight or less, and more preferably (37) (37) 200401121 1% by weight or less for the entire radiation-sensitive composition. At this time, the amount of organic acid used exceeds 10% by weight ^. At this time, the formed pixel tends to have lower adhesion to the substrate. Specific examples of additives other than the aforementioned organic acids include dispersion aids such as blue pigment derivatives such as copper phthalocyanine derivatives and yellow pigment derivatives; fillers such as glass and alumina; polyvinyl alcohol and polyethylene glycol monomers. Polymer compounds such as alkyl ethers and poly (fluoroalkyl acrylates); non-ionic, cationic, and anionic surfactants: vinyltrimethoxysilane, vinyltriethoxysilane, ethylene Ginseng (2-methylaminoethoxy, aryl), N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3 -aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-epoxypropyltrimethoxysilane, 3-epoxypropylmethyldimethoxysilane, 2 -(3,4-Epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxy Adhesives such as propyltrimethoxysilane, 3-methylpropyltrimethoxysilane; 2,2-thiobis (4-methyl-6-tert-butylphenol), 2,6-di- three Antioxidants such as phenol; 2-(3 -Third-butyl-5-methyl-2 -hydroxyphenyl) -5 -chlorobenzotriazole, alkoxybenzophenones and other ultraviolet absorbers; Anticoagulants such as sodium acrylate; epoxy compounds, melamine compounds, diazide compounds, etc. The radiation-sensitive composition for a color filter of the present invention can fundamentally solve the problem of surface smoothness, adhesion, and developability of the pixels mentioned in the aforementioned problems. The surface smoothness of a pixel is evaluated according to R a defined by the following formula (]),

[But R a is the average roughness (A) along the center line of the pixel, L is the measured length, y is the distance from the center line of the pixel to the roughness curve (A), and X is the position coordinate in the length direction] . It was previously thought that 50 A was sufficient, but it is now required to be below 30 A. Using the radiation-sensitive composition for a color filter of the present invention, the R a 値 of a pixel can generally be less than 30 A, preferably less than 20 A. ()) The contact area between the pixel and the liquid crystal is increased, and impurities are caused by the coloring layer. Infiltrating into liquid crystal, (2) It can appropriately suppress the adverse effects of poor liquid crystal domination due to the roughness of the pixel surface, etc. 'It is possible to obtain display defects that do not cause image retention or display unevenness, and excellent high-quality color liquid crystal display elements, etc. . Method for modulating radiation-sensitive composition for color filter The radiation-sensitive composition for color filter of the present invention is as described above, (A) pigment is previously dispersed in (B) alkali-soluble resin containing amine-group-containing alkali-soluble resin A part or all of the solution dissolved in (E) a part or all of the solvent 'the pigment dispersion liquid prepared with (C) the polyfunctional monomer and (D) the photopolymerization initiator' and if necessary added (B ) The remainder of the alkali-soluble resin and (E) the remainder of the solvent are prepared by mixing. -43 * (39) (39) 200401121 There is no particular limitation on the method of mixing the components after the pigment dispersing step. A general mixing method can be used. Method for forming color filter Next, a method for forming a color filter using the radiation-sensitive composition for a color filter of the present invention will be described. A light-shielding layer is formed on the surface of the substrate as necessary to distinguish the pixel portions. After coating a liquid composition such as a radiation-sensitive composition in which a red pigment is dispersed, the substrate is pre-baked to evaporate the solvent to form a coating film. Next, after this coating film is irradiated with radiation through a photomask, it is developed using an alkaline developer to dissolve and remove the unexposed portions of the coating film, and then post-baking to form a pixel array in which red pixel patterns are arranged in a predetermined arrangement. In addition, after using a liquid composition of each radiation-sensitive composition in which a green or blue pigment is dispersed, coating, pre-baking, exposure, and development are performed in the same manner as described above, and then post-baking is performed on the same substrate The green pixel array and the blue pixel array can obtain color filters in which pixel arrays of three primary colors of red, green and blue are arranged on a substrate. However, the formation order of the pixel patterns of the respective colors when forming the color filter is not limited as described above. Examples of the substrate used when forming the color filter include glass, silicone, polycarbonate, polyester, aromatic polyimide, polyimide, polyimide, and the like. For these substrates, if necessary, chemical treatment such as a silane coupling agent, plasma treatment, ion plating, sputtering, vapor phase reaction method, vacuum evaporation, etc. may be performed as appropriate. When the liquid composition of the radiation-sensitive composition is applied to a substrate, a suitable coating method such as spin coating, drool coating, or roll coating can be used. -44-(40) (40) 200401121 The coating thickness is the thickness of the film after drying, and is usually 0.] ~ 〖0μηι, preferably 0 · 2 ~ 5 · 0 μm, particularly preferably 0.2 ~ 3. 0 μm. The radiation used in making the color phosphor film can be, for example, visible light, ultraviolet, far ultraviolet, electron rays, X-rays, and the like, and it is preferable that the radiation is in the range of 90 to 450 nm. The exposure energy of the radiation is desirably 100-1000 m c m 2. The alkali developing solution is, for example, sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo- [5.4.0] -7-11. Aqueous solutions of ene,], 5 -diazabicyclo- [4.3.0] -5 -nonene and the like are preferred. An appropriate amount of a water-soluble organic solvent such as methanol, ethanol, or a surfactant may be added to the alkali developing solution. After alkali development, it is usually washed with water. As the development treatment method, a shower development method, a spray development method, an immersion development method, and a stirring development method can be applied. The development conditions are preferably 5 to 300 seconds at room temperature. The color filter formed by the radiation-sensitive composition for a color filter of the present invention can be used in, for example, a transmissive or reflective color liquid crystal display element, a color camera tube element, a color sensor, and the like. In the case of a display element, it is very suitable for forming pixels on a driving substrate of a thin film transistor (TFT) type color liquid crystal display device. [Embodiment] [Embodiments of the invention]]. The radiation-sensitive composition for a color filter of the present invention, which contains -45-(41) (41) 200401121, including (A), (B), (C ), (D) and (E) components, and (a) component is previously dispersed in a solution obtained by dissolving part or all of (B) component to part or all of (E) component, which is ideal for the present invention The composition is as follows (a) to (d). (A) (B) The component is a color filter containing at least one group selected from the group consisting of amine-group-containing alkali-soluble resins (、), amine-group-containing alkali-soluble resins () 1), and amine-group-containing alkali-soluble resins (Π1). Radiation-sensitive composition for light sheets. (B) The radiation-sensitive composition for a color filter as described in (A) above, in which the amine group-containing alkali-soluble resin (π) and the amine-group-containing fluorene-soluble resin (IΠ) constituting the component (B) are huge. The molecular monomer is an alkali-soluble copolymer composed of at least one kind selected from a polymethyl methacrylate macromonomer and a poly (methyl methacrylate / 2-hydroxyethyl methacrylate) macromonomer group. (C) The radiation-sensitive composition for color filters (a) or (b) above, wherein the component (C) is at least one selected from the group consisting of trimethylolpropanedioic acid and pentaerythritol triacrylate And dipentaerythritol hexapropionate group. (D) The radiation-sensitive composition for a color filter described in (A), (B), or (C) above, wherein the component (A) is an organic pigment and / or carbon black. The ideal color filter of the present invention The series (e) is composed of a color filter formed by the radiation-sensitive composition for a color filter according to any one of (a) to (d), -46-(42) (42) 200401121 The present invention A more desirable color filter system (H) is formed of the radiation-sensitive composition for a color filter according to any one of (A) to (D), and the Ra 値 of the pixel is 30 A or less. Consists of color filters. An ideal color liquid crystal display element of the present invention is a color liquid crystal display element including the aforementioned (penta) or (di) color filter. [Examples] The following describes the embodiments of the present invention in detail. However, the present invention is not limited by this embodiment. Example 1 (A) 60 parts by weight of CI Pigment Green 36 and 30 parts by weight of CI Pigment Yellow 1 50, and (B) 2-N, N-diethylaminoethyl methacrylate / formaldehyde Acrylic acid / polymethyl methacrylate macromonomer / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer (copolymerization weight ratio = 15/15/10/45 /) 5, Mw = 10,000 ) Of 90 parts by weight, and (E) a mixture of 200 parts by weight of propylene glycol monomethyl ether acetate, a ball mill was used to disperse the pigment to prepare a pigment dispersion. When the pigment dispersion was prepared, the filling ratio of the balls was 60% by volume, the filling ratio of the mixture was 40% by volume, and the dispersion time was 3 hours. Next, the obtained pigment dispersion liquid and 60 parts by weight of dipentaerythritol hexaacrylate of component (C), 2-benzyl-1, 2-dimethylamino-1]-(4-morpholine) of component (D), 50 parts by weight of phenyl) butane-1-one, -47-(43) (43) 200401121 (E) 3-ethoxypropionic acid ethyl ester 1,500 parts by weight are mixed to modulate radiation sensitivity Liquid composition of sexual composition. Next, the aforementioned liquid composition was coated on the surface of a soda-lime glass substrate having a si 02 film preventing the dissolution of sodium ions on the surface using a spin coater, and then pre-baked at 80 r for 10 minutes to form a film thickness of 2.0 μηΊ. Coating film. After the substrate was cooled to room temperature, the coating film was irradiated with radiation with wavelengths of 3 6 5 n; m, 405 ηηι, and 436 nm through a photomask (] L3 S line spacing pattern) using a high-pressure mercury lamp. And exposure at an exposure amount of 0.000 / cm2. Then, the substrate was immersed in a solution of 23 t of a 4% sodium hydroxide aqueous solution for 1 minute, and then developed, and then washed with ultrapure water and air-dried. Thereafter, baking was performed in an oven at 23 ° C for 30 minutes, and green strip-shaped color filters were formed on the substrate. The obtained substrate was observed with an optical microscope to confirm that all the patterns having a line width of 10 μ ™ or more Adhered to the substrate, there is no residue on the substrate of the unexposed portion. Also, when this substrate is observed using a light projector, there is no residue on the substrate of the unexposed portion. The pixel R a 値 is 2 2 A, and the surface is extremely smooth. This substrate The surface of the unexposed part was wiped with an alcohol-containing cleansing paper (trade name, manufactured by Toray Co., Ltd.] ense 1 eaner) 0 times, and the cleansing paper had no green coloration. Example 2 Except that Example 1 of ( A) 90% by weight of CI Pigment Blue 15: 6, (B) 2-N, N-diethylaminomethacrylate / methacrylic acid / N-phenylmaleimide / Polymethyl methacrylate macromonomer / styrene / benzyl methacrylate copolymer (copolymerization weight ratio -48-(44) (44) 200401121 = 2 0/1 0/2 0/1 5/2 0/1 5 'M w 2] 0:50 parts by weight, (E) a mixture of 200 parts by weight of propylene glycol monomethyl ether acetate, and Example] A ball mill was used to disperse the pigment, and the pigment dispersion liquid was prepared, and the rest was the same as in Example 1. The liquid composition of the radiation-sensitive composition was prepared to form a blue stripe-shaped color filter on the substrate. The substrate was observed with an optical microscope, and it was confirmed that the pattern with a line width of more than 0 μm was closely adhered to the substrate, and there was no residue on the substrate in the unexposed portion. When the substrate was observed using a light projector, there was no residue on the substrate in the unexposed portion. Pixel The Ra 値 is 20 A, and the surface is extremely smooth. The surface of the unexposed part of this substrate is wiped 10 times with a cleansing paper containing ethanol (trade name, I ensec 1 ea η er made by Toray Industries, Ltd.), This facial cleansing paper has no green coloration. Example 3 Except that the component (A) of Example 1 was changed to 100 parts by weight of CI Pigment Red 177, and the component (B) was 2-N, N-diethyl methacrylate Aminoethyl ester / methacrylic acid / N-phenylmaleimide / glyceryl monomethylpropionate / styrene / benzyl methacrylate copolymer (copolymerization weight ratio -2 0/15 / 2 0/10/1 5/2 0 'Mw = 28: 000), 90 parts by weight, (E) ingredient A mixture of 200 parts by weight of propylene glycol monomethyl ether acetate was treated in the same manner as in Example 1. The ball mill was used to disperse the pigment, and the pigment dispersion liquid was prepared, and the rest were the same as in Example 1. The liquid composition of the radiation-sensitive composition was prepared. A red stripe-shaped color filter is formed on the substrate. The obtained substrate is observed with an optical microscope to confirm that the patterns above the line width are all adhered to the substrate, and there is no residue on the substrate in the unexposed portion. Moreover, -49- (45) (45) 200401121 observed this substrate with a light projector, and there was no residue on the substrate in the unexposed portion. The Ra 値 of the pixel is 2 3 A, and the surface smoothness is extremely excellent. The surface of the unexposed part of this substrate was wiped with ethanol-containing facial cleansing paper (trade name, manufactured by Toray Industries, Inc.) e n s e c 1 e a n e 1 ·) 0 times, and the facial cleansing paper was not colored in green. Example 4 In addition to changing the component (A) of Example 1 to C.]. Pigment Blue] 5: 6 and 90 parts by weight, (B) 2-N, N-diethylaminoethyl methacrylate / Methacrylic acid / N-phenylmaleimide / poly (methyl methacrylate macromonomer / styrene / benzyl methacrylate copolymer (copolymerization weight ratio = 20/20/20/10 /] 90 parts by weight of 0/10/10, M w = 17,000), a mixture of 200 parts by weight of propylene glycol monomethyl ether acetate of the component (E), the same as in Example] dispersing the pigment with a ball mill Except that the pigment dispersion liquid was prepared, the rest of the liquid composition of the radiation-sensitive composition was modulated in the same manner as in Example 1 to form a red strip-shaped color filter on the substrate. The obtained substrate was observed with an optical microscope to confirm the line width ] All patterns above 0 μm are closely adhered to the substrate, and there is no residue on the substrate in the unexposed portion. Also: When this substrate is observed using a light projector, there is no residue on the substrate in the unexposed portion. The Ra of the pixel is 9A, and the surface is smooth Excellent performance. The surface of the unexposed part of this substrate is made of ethanol-containing cleansing paper (trade name, made by Toray Industries, Ltd.) 1 e nsecjeane 1 ·) Wipe] 0 times, this cleansing paper has no green coloring. Comparative Example 1 Except for methacrylic acid / methacrylic acid using soluble resin 鹸 2--50- (46) (46) 200401121 hydroxyethyl ester / 90 parts by weight of benzyl methacrylate / polymethyl methacrylate macromonomer copolymer (copolymerization weight ratio 5 /] 5/60 /] 0, Mw = 2 00:00) instead of the examples] (B) Except for the components, the rest is the same as in the Example] The liquid composition of the radiation-sensitive composition is modulated to form a green strip-shaped color filter on the substrate. The obtained substrate was observed with an optical microscope and the line width was confirmed to be 25 μ 】 · All the patterns above η are closely adhered to the substrate, but the patterns with a line width of 20μ! Π or less are peeled off from the substrate, and there is some residue on the substrate of the unexposed portion. Furthermore, this substrate is observed with a light projector, and the substrate of the unexposed portion is on the substrate. There are some residues. The Ra of the pixel is 3 9 A, and the surface smoothness is slightly inferior. The surface of the unexposed part of this substrate is cleaned with ethanol-containing cleansing paper (trade name, lens cleaner made by Toray Co., Ltd.) 5 times. Although this cleansing paper has no green coloring: but wipe it] 〇 This cleansing paper has a green coloration. Comparative Example 2 A radiation-sensitive composition was prepared in the same manner as in Example 1 except that the pigment dispersion liquid of Example 1 was prepared, and the dispersion treatment of a mixing ball mill was used. The liquid composition forms a green strip-shaped color filter on the substrate. The prepared substrate is observed with an optical microscope, and a pattern with a line width of 30 μm or less is peeled from the substrate. The substrate is observed with a light projector, and the substrate in the unexposed portion is observed. There is texture pollution. The Ra 値 of the pixel is 63A, and the surface smoothness is slightly worse. The surface of the unexposed part of this substrate was wiped 5 times with an alcohol-containing cleansing paper (trade name, lens cleaner manufactured by Toray Industries, Inc.). The cleansing paper had -51-(47) (47) 200401121 green coloring. Comparative Example 3 Except that the components (A), (B), and (E) of Example 1 were not previously prepared, the components (A) to (E) were temporarily mixed to prepare a liquid composition of the radiation-sensitive composition. Except the object, the rest is the same as in the embodiment], and a green strip-shaped color filter is formed on the substrate. The obtained substrate was observed with an optical microscope, and a pattern having a line width of 40 μm or less was peeled off from the substrate, and there were many residues on the substrate in the unexposed portion. Observing this substrate with a light projector, there was obvious texture contamination on the substrate in the unexposed area. The Ra 値 of the pixel is 8 8 A, and the surface smoothness is extremely poor. The surface of the unexposed portion of this substrate was wiped once with a cleansing paper (trade name, manufactured by Toray Industries, Inc.) [n s e c I e a n e r] containing ethanol, and the cleansing paper was colored green. [Effect of the invention] In the radiation-sensitive composition for a color filter of the present invention, the (A) pigment is dispersed in advance in a solution of a specific (B) alkali-soluble resin dissolved in the (E) solvent to form a smooth surface. Pixels that are excellent in adhesion and adhesion to the substrate and the light-shielding layer, and have no residue or texture pollution on the substrate and the light-shielding layer of the unexposed portion during development. Therefore, the radiation-sensitive composition for color filters of the present invention is extremely suitable for manufacturing various types of color phosphors for color phosphors used in color liquid crystal display elements in the field of electronics industry. -52

Claims (1)

(1) (1) 200401121 (Scope of patent application and application). A radiation-sensitive composition for a color filter, which contains (A) a pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer, (D) a color of a radiation-sensitive polymerization initiator and (E) a solvent, and (A) a pigment previously dispersed in a part or all of (B) an alkali-soluble resin dissolved in a part or all of a solution formed by (E) a solvent A radiation-sensitive composition for a filter, which is characterized by containing (B) a 鹸 soluble resin used when a pigment (A) is dispersed in advance, which has a -NR2 group (but R is an independent hydrogen atom and carbon number) ~~ 8 Alkyl-soluble resins such as alkyl, alkenyl having 2 to 18 carbons, alkynyl'allyl having 2 to 8 carbons or aryl having 6 to 18 carbons). 2. The radiation-sensitive composition for a color filter according to item 1 of the patent application scope, wherein the alkali-soluble resin having a -N R2 group in the (B) component contains at least one member selected from (I) having the -N R2 -Based ethylenically unsaturated monomers, ethylenically unsaturated monomers with carboxyl groups, alkali-soluble copolymers of N-position substituted maleimide and other copolymerizable monomers, () I) has the -NR2 group Ethylenically unsaturated monomers, ethylenically unsaturated monomers having carboxyl groups, alkali-soluble copolymers of macromonomers and other copolymerizable monomers, and (ΠΙ) ethylenically unsaturated monomers having the -NR2 group A group of alkali-soluble copolymers of ethylenically unsaturated monomers having a continuation group, N-position substituted maleimide, macromonomers and other copolymerizable monomers. 3. The radiation-sensitive composition for a color filter according to item 2 of the patent application scope, wherein the macromonomer of the alkali-soluble copolymer constituting the component (B) is a polymethyl methacrylate molecular chain having Acetosaturation -53- (2) (2) 200401121 A macromonomer with a bond and / or methyl methacrylate / 2-hydroxyethyl acrylate copolymer molecular chain with ethylenic instability at one end Saturated bond composed of macromolecular monomers. 4. A color filter, which is characterized by being formed of a radiation-sensitive composition for a color filter as described in any one of the scope of patent applications] to 3. 5. A color liquid crystal display element, characterized by having a color filter according to item 4 of the scope of patent application. -54-200401121 Lu, (a), the designated representative of this case is: None (b), the representative symbols of the elements of this case are simply explained: no, if there is a chemical formula in this case, please reveal the chemical formula that best shows the characteristics of the invention: no