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KR960015605U - Mask holding device of mask cleaning equipment - Google Patents

Mask holding device of mask cleaning equipment

Info

Publication number
KR960015605U
KR960015605U KR2019940028685U KR19940028685U KR960015605U KR 960015605 U KR960015605 U KR 960015605U KR 2019940028685 U KR2019940028685 U KR 2019940028685U KR 19940028685 U KR19940028685 U KR 19940028685U KR 960015605 U KR960015605 U KR 960015605U
Authority
KR
South Korea
Prior art keywords
mask
holding device
cleaning equipment
mask holding
mask cleaning
Prior art date
Application number
KR2019940028685U
Other languages
Korean (ko)
Other versions
KR0125857Y1 (en
Inventor
송경섭
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019940028685U priority Critical patent/KR0125857Y1/en
Publication of KR960015605U publication Critical patent/KR960015605U/en
Application granted granted Critical
Publication of KR0125857Y1 publication Critical patent/KR0125857Y1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR2019940028685U 1994-10-31 1994-10-31 Mask phage device of mask cleaning equipment KR0125857Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940028685U KR0125857Y1 (en) 1994-10-31 1994-10-31 Mask phage device of mask cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940028685U KR0125857Y1 (en) 1994-10-31 1994-10-31 Mask phage device of mask cleaning equipment

Publications (2)

Publication Number Publication Date
KR960015605U true KR960015605U (en) 1996-05-17
KR0125857Y1 KR0125857Y1 (en) 1998-11-02

Family

ID=19396955

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940028685U KR0125857Y1 (en) 1994-10-31 1994-10-31 Mask phage device of mask cleaning equipment

Country Status (1)

Country Link
KR (1) KR0125857Y1 (en)

Also Published As

Publication number Publication date
KR0125857Y1 (en) 1998-11-02

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20090526

Year of fee payment: 12

EXPY Expiration of term