KR960015605U - Mask holding device of mask cleaning equipment - Google Patents
Mask holding device of mask cleaning equipmentInfo
- Publication number
- KR960015605U KR960015605U KR2019940028685U KR19940028685U KR960015605U KR 960015605 U KR960015605 U KR 960015605U KR 2019940028685 U KR2019940028685 U KR 2019940028685U KR 19940028685 U KR19940028685 U KR 19940028685U KR 960015605 U KR960015605 U KR 960015605U
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- holding device
- cleaning equipment
- mask holding
- mask cleaning
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning In General (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940028685U KR0125857Y1 (en) | 1994-10-31 | 1994-10-31 | Mask phage device of mask cleaning equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940028685U KR0125857Y1 (en) | 1994-10-31 | 1994-10-31 | Mask phage device of mask cleaning equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960015605U true KR960015605U (en) | 1996-05-17 |
KR0125857Y1 KR0125857Y1 (en) | 1998-11-02 |
Family
ID=19396955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019940028685U KR0125857Y1 (en) | 1994-10-31 | 1994-10-31 | Mask phage device of mask cleaning equipment |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0125857Y1 (en) |
-
1994
- 1994-10-31 KR KR2019940028685U patent/KR0125857Y1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0125857Y1 (en) | 1998-11-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20090526 Year of fee payment: 12 |
|
EXPY | Expiration of term |