KR20000027343A - Chemical filter assembly of a semiconductor device manufacturing facilities - Google Patents

Abstract

PURPOSE: A filter assembly is provided to enhance the filtering efficiency and to prolong the life expectancy by attaching membranes in a shape covering an outer portion of a support screen arranged in a radial direction. CONSTITUTION: Plural support screens(34) are formed in a cylindrical shape and have pluralgrooves. A membrane(36) has a certain width and a certain length and consecutively covers the surface of the support screens(34) and are attached to seal each support screen(34). A sealing member is fusion-welded between both support screens(34) to maintain the sealing. A lower fixing plate(44) is fixed on a lower portion of the cylindrical shape to maintain the sealing, and an upper fixing plate(46) is fixed to communicate between the upper and lower portions.

Description

Assembled chemical-filter of semiconductor device manufacturing equipment

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical filter assembly of a semiconductor device manufacturing facility. More particularly, the present invention relates to a chemical filter assembly required for a semiconductor device manufacturing process, and to filtering and simultaneously filtering various types of particles contained in a chemical. The present invention relates to a chemical filter assembly of a semiconductor device manufacturing facility for smoothly supplying high quality chemicals.

Typically, wafers are extremely sophisticated devices that are fabricated as semiconductor devices by repeated processes such as photolithography, diffusion, etching, chemical vapor deposition, and metal deposition. The manufacturing process is a strict process condition, precise manufacturing technology and a high level of cleanliness. Is required.

The above-described cleanliness aims to isolate the wafer from particles which damage the semiconductor device to be manufactured and change its characteristics.

There are various ways to prevent the inflow of particles, but here, the particles contained in the chemical are filtered and the high-quality chemicals obtained through this process are supplied to each manufacturing facility where the process is performed, thereby yielding semiconductor device manufacturing yields. It will be described with respect to the chemical filter assembly to improve the.

The basic principle of the chemical filter assembly described above is to separate the particles from the chemical by passing the chemical at a predetermined flow pressure against a membrane through which the particles are difficult to pass.

Such a chemical filter assembly is required to increase the particle filtration capacity, that is, efficiency, and a configuration for smoothly supplying the chemical accordingly.

Each example of the configuration and installation relationship of the conventional chemical filter assemblies 10a and 10b corresponding to the above conditions will be described with reference to the accompanying drawings.

The general chemical filter assembly 10a, 10b has a housing 12 (refer to the configuration shown in Fig. 2) which is installed on the connection line between the chemical supply part and the supply part and has a membrane inside the housing 12. And a filter assembly 16a including 14a.

First, referring to the configuration of the filter assembly 16a of the chemical filter assembly 10a shown in FIG. 1, the membrane 14a having the same shape is inserted between the fibrous supports 18 having a predetermined width and length, so that the filter 20 As shown in Fig. 1, the filter 20 is folded into a plurality of times in the longitudinal direction and is formed into a corrugated corrugated wave shape by connecting both ends thereof.

In addition, the filter 20 thus formed is located between the tubular inner and outer cores 22 and 24 having a plurality of holes, and upper and lower fixing plates at the upper and lower portions of these configurations (omitted for simplification of the drawing). And the lower fixing plate 26a is thermally fused to constitute the filter assembly 16a, and the upper fixing plate of the filter assembly 16a is thermally fused in communication with the outlet of the housing 12 to complete the chemical filter assembly 10a. Is formed.

However, as described above, according to the filter assembly formed into a corrugated tubular shape using the fibrous support, although the filtration area is formed wide, there is a high probability that particles remain between the fibrous support and the membrane during the filtration process, and such particles are in use. Along with the filtered chemicals into the manufacturing facility there was a problem that causes a process failure.

In addition, in the filter assembly of the corrugated wave structure, the fibrous support including the membrane by the mechanical flow pressure or mechanical impact caused by the pulse of the pump generates particles by the pressure and friction caused by mutual contact, resulting in process failure There was also an uneconomical problem that shortened the life of the expensive chemical filter assembly.

On the other hand, in the chemical filter assembly 10b shown in FIG. 2, the configuration of the filter assembly 16b, which is installed inside the housing 12 described above, is provided with a hole in the center portion thereof facing the outlet side of the housing 12. The disk-shaped support screens 28 are arranged in a line stacked shape, and each of the support screens 28 is formed as one passage in which each formed hole communicates with the above-described outlet as shown in FIG. It is assembled by heat-sealing one by one from the housing 12 of the outlet peripheral.

In addition, in the above-described assembling relationship, the lower fixing plate 26b is heat-sealed in a shape of blocking one side formed in one passage through the hole of the support screen 28 facing the inlet side of the housing 12. It is fixed.

On the other hand, on both sides of the support screen 28, a circumferential cylindrical groove gradually changing in diameter around the hole and a plurality of radial grooves connecting the circumferential grooves are formed, and one end of the radial groove is formed at a predetermined site. It is bent in a shape penetrating both sides of the support screen 28 and extends and communicates with the inner wall of the hole.

In addition, the disk-shaped membrane 14b is attached to both surfaces of the support screen 28 to cover curved portions of the circumferential groove and the radial groove.

According to the chemical filter assembly 10b of this configuration, the chemical flowing into the housing 12 through the inlet passes through the membrane 14b attached at the surface of each laminated support screen 28 and the membrane 14b. ) Flows through the gap between the groove and the circumferential groove or the radial groove, whereby the particles contained in the chemical are filtered at the outer surface of the membrane 14b as the chemical passes through the membrane 14b. You will go through the process.

Therefore, the chemical passing through the membrane 14b flows to the chemical supply through the outlet of the housing 12 as a fine chemical filtered out particles.

However, the manufactured chemical filter assembly has a number of support screens with membranes arranged in a row so as to correspond to each other precisely, and is then laminated and assembled one by one in a heat fusion process. Due to the large number of processes by the thermal fusion welding process, there was an uneconomical problem in that the production time and manufacturing cost increased.

In addition, as the support screen is disc-shaped, the membrane attached to the support screen is also disc-shaped, which is unnecessary for the manufacture of the membrane, which is uneconomical, and the membrane is attached to each support screen surface. This results in an uneconomic problem such as a large number of processes, a decrease in productivity, and an increase in manufacturing cost.

An object of the present invention is to form a wide filtration area along the membrane, to increase the filtration efficiency according to the generation and flow of particles to prevent process failure, and to extend the life of the filter assembly to reduce the cost accordingly A chemical filter assembly of a semiconductor device manufacturing facility is provided.

In addition, by simplifying the shape of the support screen and the number of assembly processes, it is easy to manufacture and at the same time reduce the production cost and production time to increase productivity, reduce the manufacturing cost, and shape the membrane attached to the support screen The present invention provides a chemical filter assembly of a semiconductor device manufacturing facility that simplifies and reduces waste area and reduces manufacturing costs.

1 is a partially cutaway perspective view showing a conventional configuration of a filter assembly of a conventional chemical filter assembly.

Figure 2 is a cross-sectional view showing the configuration of another example of the chemical filter assembly of Figure 1 and the supply relationship of the chemical.

3 is a cross-sectional view partially showing the configuration of the chemical filter assembly according to an embodiment of the present invention and the chemical supply relation thereto.

FIG. 4 is a partially cutaway perspective view for explaining the attachment relationship of the membrane to the support screen of one of the configurations of the filter assembly shown in FIG.

FIG. 5 is a cross-sectional plan view illustrating a coupling relationship between the support screen and the membrane and the sealing member according to FIG. 4.

6 is an exploded perspective view showing a coupling relationship of the filter assembly configuration to the configuration of FIG.

7 is a partial cutaway sectional view showing another embodiment according to the configuration and coupling relationship of the filter assembly shown in FIG.

※ Explanation of codes for main parts of drawing

10a, 10b, 30: chemical filter assembly 12: housing

14a, 14b, 36: membrane 16a, 16b, 32: filter assembly

18: Fibrous support 20: Filter

22, 40: inner core 24, 42: outer core

26a, 26b, 44: lower fixing plate 28, 34: support screen

38: sealing member 46: upper fixing plate

A characteristic of the chemical filter assembly of the semiconductor device manufacturing equipment of the present invention for achieving the above object is, in the chemical filter assembly having a filter assembly including a membrane and a support in a housing which is installed in communication on the chemical flow line, the thickness of one side A support screen having a plurality of relatively large plate shapes formed in a cylindrical shape at the time of the interlocking engagement, and having a plurality of grooves formed in a lateral direction with a thin thickness on each of both surfaces thereof; A membrane having a predetermined width and length, the membrane covering the surface of each of the support screens continuously and sealably attached to the upper and lower portions of each of the support screens by continuous thermal fusion; A sealing member which is filled between the two support screens at which both ends of the membrane are positioned, and heat-sealed to maintain airtightness; A lower fixing plate fixed to the airtight portion at the lower portion of the cylindrical shape by the coupling of the support screen, the membrane and the sealing member; The upper center portion of the cylindrical shape and the discharge port of the housing is heat-sealed, the upper portion is fixed to the hole formed in the center portion and the upper and lower communication therebetween; consisting of a configuration including a.

In addition, the inner core having a plurality of holes of a predetermined size in the side wall in a tubular shape inserted into the central portion of the cylindrical shape between the lower fixing plate and the upper fixing plate; The outer core having a plurality of holes in the side wall in a tubular shape to cover the outer portion of the cylindrical shape between the lower fixing plate and the upper fixing plate; may be formed with a configuration further provided.

On the other hand, the cylindrical shape is arranged in a line in the upper and lower side in the longitudinal direction, and the upper fixing plate is placed therebetween and heat-sealed so as to communicate with each other to form a combination, and fixed to the lower portion of the assembly with the lower fixing plate In addition, the upper fixing plate may be formed in a shape for fixing the upper fixing plate by heat fusion between the upper portion of the combination and the outlet of the housing.

Hereinafter, the configuration of the chemical filter assembly of the semiconductor device manufacturing apparatus according to the exemplary embodiment and the flow relationship between the chemicals will be described in detail with reference to the accompanying drawings.

3 is a cross-sectional view showing the configuration of the chemical filter assembly and the assembled state of the configuration of the semiconductor device manufacturing apparatus according to an embodiment of the present invention, Figure 4 is an exploded perspective view showing the coupling relationship of the filter assembly shown in FIG. 5 and 6 are perspective views and cross-sectional views showing the fusion relationship between the support screen and the membrane shown in FIGS. 3 and 4, and the same reference numerals are given to the same parts as in the prior art, and detailed description thereof will be omitted. do.

In the configuration of the chemical filter assembly 30 according to the present invention, as shown in Figure 3, there is a housing 12 is installed in communication on the chemical flow line, the interior of the housing 12, the particles contained in the chemical A filter assembly 32 is installed for filtration separation.

As shown in FIG. 4, the above-described filter assembly 32 has a thickness in one side of the longitudinal direction that is gradually thinner than that in the counterpart, and a plurality of branches and guide grooves are formed at regular intervals on one side of the thinner side. As shown in Fig. 5, a plurality of support screens 34 are arranged in a radial shape with the thin side thickness portion inward to form an interconnected cylindrical shape.

In addition, as shown in Fig. 5, each support screen 34 has a shape in which a membrane 36 having a predetermined width and length continuously covers the outside portion of each support screen 34, respectively. While being continuously thermally fused at the top and bottom of the screen 34, the support screen 34 is sealably attached in a configuration in which the thickness of the support screen 34 is heat fused or compressed at a thin side portion.

As described above, between the two support screens 34 at which both ends of the membrane 36 are positioned, as shown in FIG. 5, the sealing member 38 is filled and heat-sealed to maintain airtightness. The combination of the three support screens 34 and the membrane 36 and the sealing member 38 covering the outer portions of the support screens 34 forms one cylindrical assembly 34, 36, 38.

On the other hand, in the inner portion and the outer portion of the assembly 34, 36, 38 formed in this way, as shown in Figure 6, the inner core 40 and the outer core 42 in which a plurality of holes are formed are combined (34, 36) , 38 is provided in a shape to cover the inner and outer portions, and the inner and outer cores 40 and 42 fix the cylindrical shape formed by the unions 34, 36 and 38.

In addition, a disc-shaped lower fixing plate 44 is heat-sealed at a portion corresponding to the chemical inlet of the housing 12, that is, the lower portion of the coupling body 34, 36, 38 and the inner and outer cores 40, 42. The upper fixing plate 46 having a hole formed in the center portion is thermally fused to the upper portion of the assembly 34, 36, 38, and the peripheral portion of the hole formed in the upper fixing plate 46 is shown in FIG. 3. As described above, heat-sealing opposite to the outlet of the housing 12 forms a configuration in communication with the inner core 40 of the coupling body 34, 36, 38.

According to the chemical filter assembly 30 of this configuration, as shown in FIG. 3, the chemical flowing through the inlet of the housing 12 is guided to the inner wall of the housing 12 by the lower fixing plate 44 so that the outer core Through the hole formed in 42, it flows between the membranes 36 in a corrugated shape.

At this time, the chemical flows through the membrane 36 by the continuous flow pressure and flows inwardly of the assembly 34, 36, 38 along the guide groove of the support screen 34. 40 is formed through the hole of the coupling body 34, 36, 38 after the union of the upper fixing plate 46 and the communication opening through the opening of the housing 12 is made to the chemical supply section.

On the other hand, the configuration of the filter assembly 32 shown in Figure 7 is a modification of the above-described chemical filter assembly 30, as described above, the combination 34, 36, including the inner and outer cores 40, 42, 38) arranged in a row, and assembled by heat fusion in a state where the upper fixing plates 46 are opposed to each other, and then fixed by the lower fixing plates 44 at the lower parts thus assembled, and the upper fixing plates 46 at the top thereof. It is formed in the structure of the fixed shape.

The configuration of the filter assembly 32, the length of the housing 12 is formed to be extended, it is possible to form a wider filtration area corresponding to the flowing chemical.

In the construction of the filter assembly 32 described above, the support screen 34 is radially disposed around the inner core 40, and the outer portion of the support screen 34 is covered with the membrane 36. After the heat sealing, the sealing member 38 may be sealed and inserted into the outer core 42, and subsequently the lower fixing plate 44 and the upper fixing plate 46 may be thermally fused.

On the other hand, reference numerals 48a, 48b, 48c, 48d, 48e, and 48f denote vent parts used when exchanging consumed chemicals or when discharging gas or the like that can be generated therein.

Therefore, according to the present invention, as the membrane is attached in a shape covering the outer portion of the support screen disposed in a radial shape, the filtration area is increased to increase the filtration efficiency, and the support screen and the membrane of the Teflon material having rigidity By combining the particles to suppress the generation of the filtration process to suppress the process defects, there is an economic advantage that the cost is reduced by extending the life.

In addition, since the shape and assembly process of the support screen are easily and continuously manufactured, productivity is increased due to reduction in manufacturing cost and manufacturing time, manufacturing cost is reduced, and economical reduction of membrane waste due to membrane shape There is an advantage.

Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.

Claims (3)

In the chemical filter assembly having a filter assembly including a membrane and a support in a housing in communication with the chemical flow line, A support screen having a plurality of plate-shaped ones having a relatively large thickness on one side thereof being formed in a cylindrical shape at the time of linkage coupling, and having a plurality of grooves formed in a lateral direction with a thin thickness on each side thereof; A membrane formed to have a predetermined width and length and continuously covering the surface of each support screen, the membrane being sealably attached to the upper and lower portions of each of the support screens by continuous thermal fusion; A sealing member filled between the two support screens at which both ends of the membrane are positioned to be heat-sealed to maintain airtightness; A lower fixing plate fixed to maintain the airtightness in the lower portion of the cylindrical shape by the coupling of the support screen, the membrane and the sealing member; And An upper fixing plate having a cylindrical upper center portion and an outlet of the housing being heat-sealed, and having holes formed in the central portion thereof, the upper and lower sides being fixed to communicate with each other therebetween; Chemical filter assembly of the semiconductor device manufacturing equipment, characterized in that comprising a. The method of claim 1, An inner core having a plurality of holes having a predetermined size in a side wall in a tubular shape inserted into a central portion of the cylindrical shape between the lower fixing plate and the upper fixing plate; and An outer core having a plurality of holes formed in a sidewall in a tubular shape covering the outer portion of the cylindrical shape between the lower fixing plate and the upper fixing plate; Chemical filter assembly of the semiconductor device manufacturing equipment characterized in that it is further provided. The method of claim 1, The cylindrical ones are arranged in a row in the longitudinal direction up and down, and the upper fixing plates are mutually opposed to each other, and are thermally fused to be connected to each other, and are formed as a combination, and fixed to the lower fixing plate at the lower portion of the assembly. And the upper fixing plate is formed in a shape fixed by heat fusion between the upper part of the assembly and the outlet of the housing.