KR102074675B1 - A evaporation source for deposition material - Google Patents

Abstract

A vapor deposition apparatus is disclosed. The evaporation material evaporation apparatus of the present invention, the crucible unit that accommodates the deposition material therein, a heating unit disposed adjacent to the crucible unit and heating the crucible unit, and disposed adjacent to the heating unit and heat radiated from the heating unit And a heat reflection unit reflecting to the crucible unit, wherein the heat reflection unit includes a reflection area variable heat reflection unit having a reflection area for reflecting heat.

Description

A evaporation source for deposition material

The present invention relates to an evaporation material evaporation apparatus, and more particularly, to an evaporation material evaporation apparatus capable of controlling the amount of heat transferred to the crucible unit by using a reflecting plate having a variable heat reflection area.

With the rapid development of information and communication technology and the expansion of the market, flat panel displays have been in the spotlight as display devices.

Such flat panel display devices include liquid crystal displays, plasma display panels, and organic light emitting diode displays.

Among these, OLED displays have a fast response speed, lower power consumption than conventional LCDs, low weight, and no need for a separate back light device. It is very popular as a next generation display device because it has very good advantages such as high brightness.

OLED display can be divided into passive PMOLED and active AMOLED depending on the driving method. In particular, AMOLED is a self-luminous display, which has a faster response speed than conventional displays, has a natural color, and consumes less power. In addition, AMOLED can be applied to a film, not a substrate, to implement a technology of flexible display.

The organic light emitting diode display (OLED display) is a product through a pattern forming process, an organic thin film deposition process, an etching process, an encapsulation process, and a bonding process for attaching a substrate on which an organic thin film is deposited and a substrate that has undergone an encapsulation process. Can be produced.

In the organic light emitting display device used in the organic light emitting diode display (OLED display), an anode film, an organic thin film, and a cathode film are sequentially coated on a substrate, and an appropriate energy difference is formed on the organic thin film by applying a voltage between the anode and the cathode. It is a principle that emits light by itself.

In other words, the injected electrons and holes are recombined, and the remaining excitation energy is generated as light. In this case, since the wavelength of light generated according to the amount of the dopant of the organic material may be adjusted, full color may be realized.

1 is a structural diagram of an organic light emitting display device. As shown in the figure, the organic light emitting display device has an anode, a hole injection layer, a hole transfer layer, an emitting layer, a hole blocking layer on a substrate. A layer, an electron transfer layer, an electron injection layer, a cathode, and the like are sequentially stacked.

In this structure, ITO (Indium Tin Oxide) having a small surface resistance and good permeability is mainly used as the anode. The organic thin film is composed of a multilayer of a hole injection layer, a hole transport layer, a light emitting layer, a hole blocking layer, an electron transport layer, and an electron injection layer in order to increase luminous efficiency. Organic materials used as the light emitting layer include Alq3, TPD, PBD, m-MTDATA, TCTA and the like.

As the cathode, a LiF-Al metal film is used. In addition, since the organic thin film is very weak to moisture and oxygen in the air, an encapsulation film is formed on the top to increase the life time of the device.

To summarize the organic electroluminescent device shown in FIG. 1 again, the organic electroluminescent device includes an anode, a cathode, and a light emitting layer interposed between the anode and the cathode, and when driven, holes are injected from the anode into the light emitting layer, Is injected from the cathode into the light emitting layer. Holes and electrons injected into the light emitting layer combine in the light emitting layer to generate excitons, and the excitons emit light as they transition from the excited state to the ground state.

The organic light emitting diodes may be classified into monochromatic or full color organic light emitting diodes according to the color to be implemented. The full color organic light emitting diodes are red (R), green (G), and three primary colors of light. Full color is realized by providing a light emitting layer patterned for each blue (B).

In order to realize full color, the light emitting layer must be patterned. In order to manufacture a large OLED display, a direct patterning method using a FMM (Fine Metal Mask) and a LITI ( Laser Induced Thermal Imaging, and a color filter.

A deposition material evaporation apparatus for evaporating the deposition material is used to make the organic light emitting device having a structure as shown in FIG.

This vapor deposition apparatus is located inside the vacuum chamber with an internal pressure lower than atmospheric pressure. In such a vacuum atmosphere, a deposition material is deposited on a substrate by heating the deposition material to a temperature that can be evaporated through a heat source.

The vapor deposition material evaporation apparatus according to the prior art is provided in a cylindrical shape having an opening formed in the upper portion, a crucible in which the deposition material is accommodated therein, a heating element supplying heat to the crucible, and a heat radiated from the heating element. The reflector which heat-reflects a crucible is provided.

In the evaporation process according to the prior art, the amount of heat delivered to the crucible is low, so that the temperature around the opening is low, thereby causing clogging, and the amount of heat delivered to the crucible is high. Creeping phenomenon occurs in which the deposition material is ejected into the openings.

The temperature of the crucible must be properly adjusted to prevent such clogging and creeping from occurring during the deposition process. It is not easy to vary the amount of heat emitted from the heating element to control the temperature of the crucible. In addition, there is a problem that it is not easy to locally vary the temperature of the crucible even if the amount of heat radiated from the heating element is varied.

Korean Patent Office Application No. 10-2006-0063602

Therefore, the technical problem to be achieved by the present invention is to provide a vapor deposition material evaporation apparatus that can adjust the temperature of the crucible without changing the amount of heat radiated from the heating element, and further can locally vary the temperature of the crucible.

According to an aspect of the present invention, there is provided a crucible unit having a deposition material contained therein; A heating unit disposed adjacent to the crucible unit and heating the crucible unit; And a heat reflection unit disposed adjacent to the heating unit and reflecting heat radiated from the heating unit to the crucible unit, wherein the heat reflection unit has a variable reflection area having a variable reflection area reflecting the heat. A vapor deposition material evaporation apparatus including a heat reflection unit may be provided.

The reflection area variable heat reflection unit may include: an inner reflection part disposed to be spaced apart from the crucible unit and having a cutout for the inner reflection part; And an outer reflector disposed farther with respect to the crucible unit than the inner reflector based on the crucible unit, and having an incision hole for forming an outer reflector.

At least one of the inner reflector and the outer reflector may be connected to the other side so as to be relatively rotatable.

The inner reflection part is provided in a cylindrical shape having a hollow inside and having a predetermined inner diameter, and the outer reflection part is provided in a cylindrical shape having a hollow inside and larger than an inner diameter of the inner reflection part, and the crucible unit May be disposed in the inner reflector, and the inner reflector may be disposed in the outer reflector.

The inner reflecting portion is provided with a plurality of cutouts, the plurality of inner reflecting portion is disposed in the spaced apart by a predetermined interval along the circumferential direction of the inner reflector, the outer reflecting portion is provided with a plurality, The cutting holes for the outer reflector may be spaced apart by a predetermined interval along the circumferential direction of the outer reflector.

The inner reflector cutting hole may include: an upper inner reflector cutting hole provided in an upper region of the inner reflector; And a cutout hole for a lower inner reflector provided in a lower region of the inner reflector.

At least one of the upper inner reflector cutouts and the lower inner reflector cutouts may be disposed to be offset from each other with respect to a virtual center axis of the inner reflector.

The shortest distance between the lower inner reflector cutout of any one of the lower inner reflector cutouts and an imaginary straight line passing parallel to the upper inner reflector cutout located adjacent to the virtual central axis of the inner reflector, It may be different from the shortest distance between the lower inner reflector incision hole and the virtual straight line passing parallel to the other inner inner reflector incision hole located parallel to the virtual center axis of the inner reflector.

The outer reflector cutout may include an upper outer reflector cutout provided in an upper region of the outer reflector; And a cutout hole for a lower outer reflector provided in a lower region of the outer reflector.

At least one of the cutouts for the upper outer reflector and the cutouts for the lower outer reflector may be disposed to be offset from the virtual center axis of the outer reflector.

The shortest distance between the lower outer reflector cutout of any one of the lower outer reflector cuts and an imaginary straight line passing along the virtual center axis of the outer reflector and adjacent to the upper outer reflector cutout adjacent to each other, It may be different from the shortest distance from the cutout for the lower outer reflecting portion of the and the imaginary straight line that is located parallel to the virtual center axis of the outer reflecting portion and passing through the other upper outer reflecting cutout.

The inner reflector cutoff hole may include at least one cutout hole for the first unit inner reflector that is spaced apart along the longitudinal direction of the inner reflector; And a second unit inner reflection provided at least one spaced apart along the longitudinal direction of the inner reflector and spaced apart by a predetermined interval in a circumferential direction of the inner reflector with respect to the cutout for the first unit inner reflector. Including a bouillon cutting hole, the number of the first unit inner reflector cutout hole and the second unit inner reflector cutout hole may be different from each other.

The outer reflector cutting hole may include at least one cutout hole for the first unit outer reflecting part spaced apart along the longitudinal direction of the outer reflector; And a second unit outer reflection provided at least one spaced apart along the longitudinal direction of the outer reflector and spaced apart by a predetermined interval in a circumferential direction of the outer reflector with respect to the cutout for the first unit outer reflector. A bouillon cutting hole may be included, but the number of the first unit outer reflector cutout holes and the second unit outer reflector cutout holes may be different from each other.

The reflective area variable heat reflection unit may further include a support part that supports the inner reflector and the outer reflector, and at least one of the inner reflector and the outer reflector is rotatably connected to each other.

The reflective area variable heat reflection unit may further include a rotation limiter configured to limit relative rotation of at least one of the inner reflector and the outer reflector.

The rotation limiting part restricts relative rotation with respect to the support part of the outer reflector, and the support part is provided with a screw hole in which the support part is formed recessed in the side wall and a screw thread is formed on the inner wall, and the rotation limiting part is provided with the outer reflecting part. It may include a pressure bolt that penetrates the through-hole formed in the fitting hole to press the outer reflector to the support.

The through hole may be provided in a long hole shape extending in the circumferential direction of the outer reflector.

A cooling unit disposed adjacent to the outer reflecting unit and provided with a cooling line through which cooling water flows, wherein the cooling unit is provided in a cylindrical shape having a hollow inside and having an inner diameter larger than that of the outer reflecting unit, A cooling unit main body supporting the cooling line; An upper communicating portion disposed in an upper region of the cooling unit body and communicating with the cooling line; And a lower communication part disposed in a lower area of the main body of the cooling unit and communicating with the cooling line.

The cooling unit may further include a cooling unit controller for supplying the cooling water to any one of the upper communicating portion and the lower communicating portion and selectively controlling the cooling unit to discharge the cooling water from the other.

According to the present invention, by transferring the heat radiated from the heating element to the crucible unit through the reflecting area variable heat reflection unit having a variable reflecting area reflecting heat, thereby controlling the temperature of the crucible unit without changing the amount of heat radiated from the heating element The temperature of the crucible unit can be further varied locally.

1 is a structural diagram of an organic light emitting display device.
2 is a schematic view showing a substrate deposition system using a deposition material evaporation apparatus according to a first embodiment of the present invention.
3 is a view showing the deposition material evaporation apparatus of FIG.
4 is a view illustrating an inner reflector of FIG. 3.
5 is a diagram illustrating the outer reflector of FIG. 3.
FIG. 6 is a view illustrating the inner reflector and the outer reflector of FIG. 3 developed in a planar shape.
7 is an enlarged view of A of FIG. 3.
8 and 9 are operational state diagrams of FIG. 6.
FIG. 10 is a view illustrating an inner reflector of an evaporation material deposition apparatus according to a second embodiment of the present invention.
FIG. 11 is a view illustrating an outer reflecting part of the deposition material evaporation apparatus according to the second exemplary embodiment of the present invention.
FIG. 12 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the third embodiment of the present invention.
FIG. 13 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the fourth embodiment of the present invention.
FIG. 14 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the fifth embodiment of the present invention.
FIG. 15 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the sixth embodiment of the present invention.
FIG. 16 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the seventh embodiment of the present invention.
FIG. 17 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the eighth embodiment of the present invention.

In order to fully understand the present invention, the operational advantages of the present invention, and the objects achieved by the practice of the present invention, reference should be made to the accompanying drawings, which illustrate preferred embodiments of the present invention.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. Like reference numerals in the drawings denote like elements.

Prior to the drawings, the substrate may be a substrate using a liquid crystal display, a plasma display panel, an organic light emitting diode, or the like, for convenience of description. Hereinafter, an organic light emitting diode (OLED) substrate will be described.

2 is a schematic view showing a substrate deposition system using a deposition material evaporation apparatus according to a first embodiment of the present invention, Figure 3 is a view showing the deposition material evaporation apparatus of Figure 2, Figure 4 3 is a view showing an inner reflector of FIG. 3, FIG. 5 is a view showing an outer reflector of FIG. 3, and FIG. 6 is a view showing an inner reflector and an outer reflector of FIG. 3 in a planar shape, and FIG. 3 is an enlarged view of A, and FIGS. 8 and 9 are operational state diagrams of FIG. 6.

6, 8, and 9 illustrate the cylindrical inner reflector 140 and the outer reflector 150 in a planar shape for convenience of description.

Referring to FIG. 2, a substrate deposition system includes a process chamber 10 through which a deposition process is performed on a substrate, and a deposition material evaporation apparatus provided on one side of the process chamber 10 and spraying deposition material M toward the substrate ( 100).

The process chamber 10 is a place where a deposition process for a substrate is performed. That is, the process chamber 10 forms a place where a light emitting layer (organic material) and an electrode layer (inorganic material) are deposited in order to manufacture the organic light emitting display device illustrated in FIG. 1.

During the deposition process, the inside of the process chamber 10 maintains a vacuum atmosphere. Therefore, a vacuum pump (not shown) may be connected to the process chamber 10.

On the other hand, the deposition material evaporator 100 is provided on one side of the process chamber 10 to spray the deposition material (M) toward the substrate. The evaporation material evaporator 100 is, as shown in detail in Figures 2 to 9, the crucible unit 110 and the crucible unit 110, the deposition material (M) is accommodated therein is disposed adjacent to the crucible unit 110 A heating unit 120 for heating the unit 110, a heat reflection unit 130 disposed adjacent to the heating unit 120, and reflecting heat radiated from the heating unit 120 to the crucible unit 110; The cooling unit 180 is disposed adjacent to the heat reflection unit 130 and provided with a cooling line 181 through which cooling water flows.

In the present embodiment, the crucible unit 110 is a bottle-shaped structure. The inside of the crucible unit 110 receives the deposition material M deposited on the substrate surface of FIG. 2 while being evaporated upon heating. The deposition material M accommodated in the crucible unit 110 may be an organic material or an inorganic material.

In the present exemplary embodiment, an opening 111 communicating with the inside of the crucible unit 110 is provided in the upper region of the crucible unit 110. The opening 111 serves to discharge the evaporation material M evaporated by heating from the crucible unit 110.

The heating unit 120 is disposed adjacent to the crucible unit 110 and heats the crucible unit 110 by dissipating heat. The heating unit 120 may be provided in a wire or plate shape. In the present embodiment, the heating unit 120 is provided in a plate shape, and provided in plural numbers and disposed radially spaced apart from each other on the basis of the crucible unit 110, but the scope of the present invention is not limited thereto. The unit 120 may be provided in various shapes.

The heat reflection unit 130 is disposed adjacent to the heating unit 120 and reflects the heat radiated from the heating unit 120 to the crucible unit 110. The heat reflection unit 130, by reflecting the heat emitted from the heating unit 120 to the crucible unit 110, it is possible to increase the thermal efficiency.

The heat reflection unit 130 according to the present embodiment includes a reflection area variable heat reflection unit 130 having a variable reflection area for reflecting heat. The reflective area variable heat reflection unit 130 may adjust the temperature of the crucible unit 110 without changing the amount of heat radiated from the heating element by varying the reflection area of the heat radiated from the heating unit 120, Furthermore, the temperature of the crucible unit 110 may be locally different.

As shown in detail in FIG. 3, the reflective area variable heat reflection unit 130 is disposed to be spaced apart from the crucible unit 110 and has an inner reflector 140 having an incision hole 141 for an inner reflector, The outer reflector 150 and the inner reflector 150, which are disposed farther from the inner reflector 140 than the inner reflector 140 and have an incision hole 151 for outer reflector, are formed on the crucible unit 110. The support unit 160 supports the 140 and the outer reflector 150, and the rotation limiter 170 restricts relative rotation of the outer reflector 150 with respect to the support unit 160.

The inner reflector 140 is supported by the support 160. The inner reflector 140 is hollow and provided in a cylindrical shape having a predetermined inner diameter. In the present embodiment, the crucible unit 110 and the heating unit 120 are disposed inside the inner reflector 140. As shown in detail in FIG. 3, the crucible unit 110 is disposed in the inner central region of the inner reflector 140, and the heating unit 120 is disposed between the crucible unit 110 and the inner reflector 140. Is placed.

In the inner reflector 140, as shown in detail in FIG. 4, the incision hole 141 for the inner reflector is formed. A plurality of cutout holes 141 for inner reflection parts are provided. The plurality of inner reflector cutouts 141 are spaced apart by a predetermined interval along the circumferential direction of the inner reflector 140. In FIG. 4, the inner reflecting portion cutout 141 is provided in a rectangular shape, but a right range is not limited thereto, and the inner reflecting portion cutout 141 may be provided in various shapes.

The reflection area of the heat reflection unit 130 may be varied by interaction with the outer reflector 150 by the inner reflector 140 having the inner reflector cutout 141 formed therein. Here, the interaction with the outer reflector 150 will be described together when describing the outer reflector 150 for convenience of description.

In addition, as shown in detail in FIG. 4, the inner reflector cutout 141 may include the upper inner reflector cutout 142 and the inner reflector 140 provided in the upper region of the inner reflector 140. And a cutout hole 143 for the lower inner reflection part provided in the lower area.

The upper inner reflector cutout 142 and the lower inner reflector cutout 143 are spaced apart from each other in the axial direction of the inner reflector 140, and are offset from each other with respect to a virtual center axis of the inner reflector 140. Is placed. That is, the upper inner reflector cutout 142 and the lower inner reflector cutout 143 are virtual straight lines positioned side by side on the virtual center axis of the inner reflector 140 as shown in FIG. 6. (G) are not arranged together.

As such, when the upper inner reflector cutout 142 and the lower inner reflector cutout 143 are disposed to be offset from each other with respect to the virtual center axis of the inner reflector 140, the upper reflector 150 may interact with the outer reflector 150. As a result, the reflection area of the upper region and the reflection area of the lower region of the heat reflection unit 130 may be different from each other.

When the size of the reflecting area of the upper region and the lower region of the heat reflection unit 130 is changed in this way, a difference occurs in the amount of heat reflected by the upper region and the lower region of the crucible unit 110, and thus the crucible The temperature of the upper region and the lower region of the unit 110 may be different from each other.

 The outer reflector 150 is rotatably supported by the support 160. The outer reflector 150 is hollow inside and is provided in a cylindrical shape having an inner diameter larger than the inner diameter of the inner reflector 140.

In the outer reflector 150, as shown in detail in FIG. 5, a cutout hole 151 for the outer reflector is formed. A plurality of cutout holes 151 for the outer reflection part are provided. The plurality of outer reflector cutouts 151 may be spaced apart by a predetermined interval along the circumferential direction of the outer reflector 150. In FIG. 5, the outer reflector cutout 151 is provided in a rectangular shape, but the scope of the present invention is not limited, and the outer reflector cutout 151 may be provided in various shapes.

In the present embodiment, the inner reflector 140 is disposed inside the outer reflector 150, as shown in detail in FIG. 3. The outer reflector 150 is rotatably supported by the support 160, and thus may be relatively rotated with respect to the inner reflector 140. Therefore, the inner reflector cutout hole 141 and the outer reflector cutout hole 151 may face each other by the relative rotation of the outer reflector 150 with respect to the inner reflector 140, and the inner reflector cutout hole ( 141 may be shielded by outer reflector 150.

When the inner reflector cutout 141 and the outer reflector cutout 151 are opposed to each other, the reflection area of the heat reflection unit 130 is the cutout hole for the inner reflector 141 at the surface area of the inner circumferential surface of the inner reflector 140. Corresponds to the size minus the area).

On the contrary, when the inner reflecting portion 141 and the outer reflecting portion 151 are not opposed to each other and the inner reflecting portion 141 is shielded by the outer reflecting portion 150, the heat reflection unit 130 ) Reflects the surface area of the inner circumferential surface of the inner reflector 140.

As such, the degree of overlap between the inner reflector cutout hole 141 and the outer reflector cutout hole 151 is changed by the relative rotation of the outer reflector 150 with respect to the inner reflector 140. Since the reflection area of the heat reflection unit 130 varies depending on the overlapping degree of the ball 141 and the cutout hole 151 for the outer reflector, the heating is caused by the rotation of the outer reflector 150 with respect to the inner reflector 140. The reflection area of the heat reflection unit 130 that reflects the heat emitted from the unit 120 to the crucible unit 110 is variable.

In addition, as shown in detail in FIG. 5, the outer reflector cutout hole 151 includes the upper outer reflector cutout hole 152 provided in the upper region of the outer reflector 150 and the outer reflector 150. And a cutout hole 153 for the lower outer reflector provided in the lower region.

The upper outer reflector cutout hole 152 and the lower outer reflector cutout hole 153 are disposed to be spaced apart in the central axis direction of the outer reflector 150. In the present embodiment, the upper outer reflector cutout 152 and the lower outer reflector cutout 153 are located side by side on the virtual center axis of the outer reflector 150, as shown in detail in FIG. 6. It is arranged on the imaginary straight line H.

As described above, the upper inner reflector cutout 142 and the lower inner reflector cutout 143 of the inner reflector 140 are positioned in parallel with the virtual center axis of the inner reflector 140. Since it is not disposed together on (G), when the upper inner reflector cutout 142 and the upper outer reflector cutout 152 overlap with each other as shown in FIG. 9 by the rotation of the outer reflector 150. The lower inner reflector cutout 143 and the lower outer reflector cutout 153 do not overlap.

If the upper inner reflector cut-out hole 142 and the upper outer reflector cut-out hole 152 overlap and the lower inner reflector cut-out hole 143 and the lower outer reflector cut-out hole 153 do not overlap, the heat reflection unit The reflecting area of the upper region of 130 is smaller than the reflecting area of the lower region. Therefore, the amount of heat transferred to the upper region of the crucible unit 110 is smaller than the amount of heat transferred to the lower region of the crucible unit 110.

Similarly, as shown in FIG. 8, when the lower inner reflector cutout 143 and the lower outer reflector cutout 153 overlap with each other by the rotation of the outer reflector 150, the upper inner reflector cutout 142. ) And the upper outer reflector cutting hole 152 do not overlap.

If the lower inner reflector cutout 143 and the lower outer reflector cutout 153 overlap and the upper inner reflector cutout 142 and the upper outer reflector cutout 152 do not overlap, the heat reflection unit The reflecting area of the lower region of 130 is smaller than the reflecting area of the upper region. Therefore, the amount of heat transferred to the lower region of the crucible unit 110 is smaller than the amount of heat transferred to the upper region of the crucible unit 110.

As such, the reflective areas of the upper region and the lower region of the heat reflection unit 130 are changed by the relative rotation with respect to the inner reflector 140 of the outer reflector 150, thereby increasing the temperature of the upper region of the crucible unit 110. The temperature of the and lower regions may be different from each other to prevent the occurrence of clogging and creeping.

On the other hand, the lower region of the outer reflector 150 is provided with a through-hole 155 having a long hole shape extending along the circumferential direction of the outer reflector 150. In the present embodiment, a plurality of through holes 155 may be provided and spaced apart by a predetermined interval along the circumferential direction of the outer reflector 150. The pressure bolt 171 to be described later of the rotation limiting part 170 penetrates the through hole 155.

The support unit 160 supports the inner reflector 140 and the outer reflector 150. The outer reflecting part 150 is connected to the support part 160 so as to be relatively rotatable. In the present embodiment, the support 160 is provided with a screw hole 161 which is formed recessed in the side wall of the support 160 and a thread is formed on the inner wall. In the present embodiment, a plurality of screw holes 161 may be provided and spaced apart by a predetermined interval along the circumferential direction of the outer reflector 150.

The rotation limiter 170 selectively restricts relative rotation of the outer reflector 150 to the support 160 by pressing and releasing the outer reflector 150 to the support 160. The rotation limiter 170 selectively restricts relative rotation of the outer reflector 150 with respect to the support part 160, thereby selectively limiting relative rotation of the outer reflector 150 with respect to the inner reflector 140. can do.

In this embodiment, the rotation limiting part 170 is engaged with the threaded hole 161 through the through hole 155 formed in the outer reflecting part 150 to press the outer reflecting part 150 to the support part 160. Bolt 171.

In this embodiment, the pressure bolt 171, the bolt body portion 171a is formed with a screw thread to be engaged with the screw hole 161, and the bolt head portion 171b provided in a shape having a diameter larger than the bolt body portion 171a. ).

The pressure bolt 171 is engaged with the screw hole 161 to press and release the outer reflector 150 to the support unit 160 with the bolt head portion 171b, thereby selectively rotating the outer reflector 150. Restrict to

On the other hand, the cooling unit 180 is disposed adjacent to the outer reflector 150. The cooling unit 180 is disposed in the cooling line 181 through which the coolant flows, the cooling unit body 182 supporting the cooling line 181, and an upper region of the cooling unit body 182. 181 is in communication with the upper communication unit 183, the lower communication unit 184 is disposed in the lower region of the cooling unit body 182 and in communication with the cooling line 181, the cooling line 181 and the cooling water Cooling water circulation unit (P1, P2) for circulating the.

The cooling unit main body 182 is provided in a cylindrical shape having a hollow inside and having an inner diameter larger than the inner diameter of the outer reflector 150. The crucible unit 110 is disposed in the inner central region of the cooling unit 180, and the inner reflector 140 and the outer reflector 150 are disposed between the crucible unit 110 and the cooling unit body 182. .

The cooling line 181 is provided in a pipe shape and is spirally wound to be supported by the cooling unit body 182. Cooling water flows along the cooling line 181.

The upper communication unit 183 is supported by the cooling unit body 182 and is disposed in an upper region of the cooling unit body 182. The upper communication part 183 is in communication with the cooling line 181 and is connected to the cooling water circulation parts P1 and P2 for circulating the cooling water. In the present embodiment, the upper communication part 183 is detachably coupled to the cooling water circulation parts P1 and P2.

The lower communication portion 184 is supported by the cooling unit body 182 and disposed in the lower region of the cooling unit body 182. The lower communication portion 184 communicates with the cooling line 181 and is connected to the cooling water circulation portions P1 and P2 for circulating the cooling water. In the present embodiment, the lower communication portion 184 is detachably coupled to the cooling water circulation portions P1 and P2.

In this embodiment, the cooling water circulation units P1 and P2 include a cooling water supply pipe P1 for supplying the cooling water to the cooling line 181, and a cooling water discharge pipe P2 for recovering the cooling water discharged from the cooling line 181. And a heat exchanger (not shown) connected to the cooling water supply pipe (P1) and the cooling water discharge pipe (P2) to lower the temperature of the cooling water received from the cooling water discharge pipe (P2), and the cooling water supply pipe (P1) or the cooling water discharge pipe. It is connected to (P2) and includes a circulation pump (not shown) for circulating the coolant.

As described above, the upper communication unit 183 and the lower communication unit 184 are spaced apart in the longitudinal direction of the cooling unit body 182, whereby the cooling water supply pipe P1 and the cooling water discharge pipe P2 are connected. The temperature of the upper region and the lower region of the heat reflection unit 130 may vary, and accordingly the amount of heat reflected by the heat reflection unit 130 is changed, so that the temperature of the upper region and the lower region of the unit of the crucible unit 110 varies. May vary.

That is, as shown in Figure 3, when the cooling water supply pipe (P1) is connected to the upper communication unit 183 and the cooling water discharge pipe (P2) is connected to the lower communication unit 184, the cooling water supply pipe (P1) Since the temperature of the cooling water flowing along is relatively lower than the temperature of the cooling water flowing along the cooling water discharge pipe P2, the temperature of the upper region of the heat reflection unit 130 is lower than the temperature of the lower region, and thus the crucible The amount of heat transferred in the upper region of the unit 110 is relatively smaller than the amount of heat transferred to the lower region, so that the temperature of the upper region of the crucible unit 110 is relatively lower than the temperature of the lower region.

On the contrary, in contrast to FIG. 3, when the cooling water supply pipe P1 is connected to the lower communication unit 184 and the cooling water discharge pipe P2 is connected to the upper communication unit 183, the lower region temperature of the heat reflection unit 130 is used. Is lower than the temperature of the upper region, so that the lower region temperature of the unit of the crucible unit 110 is lower than the temperature of the upper region.

As described above, the vapor deposition material evaporation apparatus 100 according to the present embodiment is disposed in the longitudinal direction of the cooling unit body 182 to communicate with the cooling line 181 and the upper communication unit 183 and the lower communication unit 184. The upper and lower portions of the crucible unit 110 are changed by changing the coupling target when the upper communicating portion 183 and the lower communicating portion 184 are coupled to the cooling water supply pipe P1 and the cooling water discharge pipe P2. The relative temperature rise and fall of the zone can be changed.

On the other hand, the cooling water circulation unit (not shown) in another manner, the first cooling water delivery pipe (not shown) connected to the upper communication unit 183, and the second cooling water delivery pipe (not shown) connected to the lower communication unit 184. And a heat exchanger (not shown) connected to the first coolant delivery pipe (not shown) and the second coolant delivery pipe (not shown) to receive the coolant and lowering the temperature of the coolant, and a first coolant delivery pipe (not shown). Or a cooling unit controller (not shown) connected to the second cooling water delivery pipe (not shown) and circulating the cooling water.

In this embodiment, the cooling unit control unit (not shown) is provided with a circulation pump capable of selectively converting forward and reverse. The cooling unit controller (not shown) may change the flow direction of the coolant in the opposite direction. For example, in the forward operation of the circulation pump, the cooling water cooled by passing through the heat exchanger to the upper communication unit 183 may be supplied, and the cooling water of the cooling line 181 may be discharged to the lower communication unit 184. On the contrary, in the reverse operation of the reverse conversion circulation pump, the coolant of the cooling line 181 may be discharged to the upper communication unit 183 and the cooled cooling water may be supplied to the lower communication unit 184 through the heat exchanger.

Hereinafter, an operation of the deposition material evaporation apparatus 100 having the above-described configuration will be described with reference to FIGS. 2 to 9.

First, a method of increasing the temperature of the upper region of the crucible unit 110 to prevent clogging phenomenon in which the opening 111 of the crucible unit 110 is blocked will be described.

In order to increase the temperature of the upper region of the crucible unit 110 relative to the temperature of the lower region, as shown in FIG. 8, the outer reflector 150 is rotated relative to the inner reflector 140 so as to reflect the upper inner reflector. It does not overlap the bouillon cut hole 142 and the upper outer reflector cutout hole 152 and the lower inner reflector cutout hole 143 and the lower outer reflector cutout hole 153 overlap.

If the lower inner reflector cutout 143 and the lower outer reflector cutout 153 overlap and the upper inner reflector cutout 142 and the upper outer reflector cutout 152 do not overlap, the heat reflection unit The reflecting area of the upper region of 130 is larger than the reflecting area of the lower region. Therefore, the amount of heat transferred to the upper region of the crucible unit 110 by the heat reflection unit 130 is greater than the amount of heat transferred to the lower region of the crucible unit 110, and thus the temperature of the upper region of the crucible unit 110. Is relatively high to prevent clogging.

Next, a method of lowering the temperature of the upper region of the crucible unit 110 to prevent a creeping phenomenon in which the deposition material M is ejected into the opening 111 of the crucible unit 110 will be described.

In order to lower the temperature of the upper region of the crucible unit 110 relative to the temperature of the lower region, as illustrated in FIG. 9, the outer reflector 150 is rotated relative to the inner reflector 140 so that the upper inner reflector. The bouillon cutout 142 and the upper outer reflector cutout hole 152 overlap the lower inner reflector cutout hole 143 and the lower outer reflector cutout hole 153 so as not to overlap.

When the lower inner reflector cutout hole 143 and the lower outer reflector cutout hole 153 do not overlap and the upper inner reflector cutout hole 142 and the upper outer reflector cutout hole 152 overlap, the heat reflection unit The reflecting area of the upper region of 130 is smaller than the reflecting area of the lower region. Therefore, the amount of heat transferred to the upper region of the crucible unit 110 by the heat reflection unit 130 is smaller than the amount of heat transferred to the lower region of the crucible unit 110, whereby the temperature of the upper region of the crucible unit 110 is increased. It is relatively low to prevent creeping.

As described above, the deposition material evaporation apparatus 100 according to the present embodiment transmits heat radiated from the heating element to the crucible unit 110 through the reflection area variable heat reflection unit 130 having a variable reflection area for reflecting heat. The temperature of the crucible unit 110 may be adjusted without changing the amount of heat radiated from the heating element, and further, the temperature of the crucible unit 110 may be locally different.

In addition, the vapor deposition material evaporator 100 according to the present embodiment, the upper communication unit 183 and the lower communication unit 184 spaced apart in the longitudinal direction of the cooling unit body 182 in communication with the cooling line 181. By supplying the coolant through the upper communication unit 183, the cooling water may be discharged through the lower communication unit 184, and the cooling water is discharged through the upper communication unit 183 and the lower communication unit 184 Cooling water may be supplied through the cooling unit 180 to vary the amount of heat absorbed by the cooling unit 180 according to the cooling unit body 182, thereby changing the relative temperature rises and lowers of the upper and lower regions of the crucible unit 110. Can be.

10 is a view showing an inner reflector of the deposition material evaporation apparatus according to the second embodiment of the present invention, Figure 11 is a view showing an outer reflector of the deposition material evaporation apparatus according to the second embodiment of the present invention.

This embodiment differs from the first embodiment in FIGS. 2 through 9 only in that the arrangement of the inner reflecting portion cutout hole 241 and the outer reflecting portion cutout hole is changed in the opposite manner as compared with the first embodiment. Since it is the same as the structure of an example, below, the same code | symbol is used about the same structure, and the description is abbreviate | omitted.

In the present embodiment, the upper outer reflector cutout 252 and the lower outer reflector cutout 253 are spaced apart in the virtual central axis direction of the outer reflector 250, as shown in FIG. 11. It is arrange | positioned mutually offset with respect to the virtual center axis of the outer reflection part 250. FIG.

In addition, in the present embodiment, the upper inner reflector cutout 242 and the lower inner reflector cutout 243 are disposed on an imaginary central axis of the inner reflector 240 as shown in FIG. 10. .

The present embodiment may differ only in that the arrangement of the inner reflector cutout 141 of the inner reflector 140 and the outer reflector cutout 151 of the outer reflector 150 is opposite to that of the first embodiment. However, since there is no difference in function and operation, the functions and operations described in the first embodiment are omitted.

The vapor deposition material evaporation apparatus according to the present embodiment includes an outer reflector 250 having an upper outer reflector cutout 252 and a lower outer reflector cutoff 253 disposed to be offset from each other with respect to a central axis; Reflection of the upper region of the heat reflection unit (not shown) by including an inner reflector 240 having an upper inner reflector cutout 242 and a lower inner reflector cutout 243 disposed on the central axis. The area and the reflecting area of the lower region can be different.

FIG. 12 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the third embodiment of the present invention.

This embodiment differs only in the shape of the inner reflecting portion cutout hole 341 and the outer reflecting portion cutoff hole 351 as compared with the first embodiment, and in other configurations, the first embodiment of FIGS. Since it is the same as a structure, below, the same code | symbol is used about the same structure, and the description is abbreviate | omitted.

In the present embodiment, the cutout hole 341 for the inner reflection part is provided in a circular shape. The inner reflector cutout hole 341 is provided in plurality and spaced apart by a predetermined interval along the circumferential direction of the inner reflector 340.

In addition, at least one inner reflecting portion cutout 341 is provided with at least one cutout hole for the first unit inner reflecting portion 341a spaced apart along the longitudinal direction of the inner reflecting portion 340 (in the central axis direction of the inner reflecting portion). And at least one of the inner reflecting portions 340 and spaced apart along the longitudinal direction of the inner reflecting portion 340 (in the central axis direction of the inner reflecting portion), and the inner reflecting portion 340 with respect to the cut hole 341a for the first unit inner reflecting portion. It includes a cutting hole (341b) for the second unit inner reflector spaced apart by a predetermined interval in the circumferential direction of the.

In this embodiment, the cut holes 341 for the inner reflection part are arranged in two rows, as shown in detail in FIG. 12. The first unit inner reflection part cutouts 341a which are the first row are provided in three and are spaced apart along the longitudinal direction of the inner reflection part 340. One cutout hole 341b for the second unit inner reflection part, which is the second row, is provided.

The number of cutout holes 341a for the first unit inner reflector and the cut hole 341b for the second unit inner reflector may be variously changed, but the cut holes 341a for the first unit inner reflector and the second unit inner reflection may vary. The number of bouillon cut holes 341b is provided different from each other.

Meanwhile, in the present embodiment, the cutout hole 351 for the outer reflection part is provided in a circular shape. The outer reflector cutout hole 351 is provided in plural and spaced apart by a predetermined interval along the circumferential direction of the outer reflector 350.

In addition, in the present exemplary embodiment, the cutout hole 351 for the outer reflector includes a plurality of cutout holes 351 for the unit outer reflector disposed to be spaced apart in the longitudinal direction (the center axis direction of the outer reflector) of the outer reflector 350. do.

In the present embodiment, three cutout holes 351 for the unit outer reflector are disposed along the longitudinal direction of the outer reflector 350. In the present embodiment, the number of cutout holes 351 for the unit outer reflector may be variously changed.

In the present embodiment, the cutout hole 341 for the inner reflector is provided in the upper region of the inner reflector 340, and the cutout hole 351 for the outer reflector is provided in the upper region of the outer reflector 350. Therefore, when the first unit inner reflector cutout 341a overlaps the unit outer reflector cutout 351 according to the relative rotation of the outer reflector 350 with respect to the inner reflector 340, the second unit When the inner reflecting portion cutout 341b overlaps the unit outer reflecting portion cutting hole 351, both the first unit inner reflecting portion cutting hole 341a and the second unit inner reflecting portion cutting hole 341b are outside the unit. If the reflection portion cut hole 351 does not overlap, the reflection area of the heat reflection unit 130 is changed in three stages, so that the temperature of the upper region of the crucible unit 110 is subdivided into three stages. There is an advantage that can be adjusted.

FIG. 13 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the fourth embodiment of the present invention.

This embodiment differs in the arrangement positions of the inner reflecting portion cutout hole 441 and the outer reflecting portion cutout hole 451 as compared with the third embodiment, and in other configurations, it is different from the structure of the first embodiment of FIG. Since they are the same, the same reference numerals are used for the same components and the description thereof will be omitted below.

In this embodiment, the inner reflector cutout 441 is provided in the lower region of the inner reflector 440, and the outer reflector cutout 451 is provided in the lower region of the outer reflector 450. Therefore, when the first unit inner reflector cutout 441a overlaps the unit outer reflector cutout 451 according to the relative rotation of the outer reflector 450 with respect to the inner reflector 440, the second unit When the inner reflecting portion cutout 441b overlaps the unit outer reflecting portion cutting hole 451, both the first unit inner reflecting portion cutting hole 441a and the second unit inner reflecting portion cutting hole 441b are outside the unit. When the reflection portion cut hole 451 does not overlap, the reflection area of the heat reflection unit 130 is changed in three stages, thereby subdividing the temperature of the lower region of the crucible unit 110 in three stages. There is an adjustable advantage.

FIG. 14 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the fifth embodiment of the present invention.

This embodiment differs only in the shape of the inner reflecting portion cutout 541 and the outer reflecting portion cutout 551 as compared with the first embodiment, and in other configurations, the first embodiment of FIGS. Since it is the same as a structure, below, the same code | symbol is used about the same structure, and the description is abbreviate | omitted.

In the present embodiment, the cutout hole 551 for the outer reflection part is provided in a circular shape. The outer reflecting portion cutting holes 551 are provided in plural and are spaced apart by a predetermined interval along the circumferential direction of the outer reflecting portion 550.

In addition, at least one cutout hole 551 for the outer reflecting part is provided at least one cutout hole 551a for the first unit outer reflecting part spaced apart along the longitudinal direction of the outer reflecting part 550 (in the central axis direction of the outer reflecting part). And an outer reflector 550 provided with at least one and spaced apart along the longitudinal direction of the outer reflector 550 (in the central axis direction of the outer reflector) and with respect to the cutout 551a for the first unit outer reflector. And a cutout hole 551b for the second unit outer reflector spaced apart by a predetermined interval in the circumferential direction of the second unit.

In the present embodiment, the cutout holes 551 for the outer reflection part are arranged in two rows, as shown in detail in FIG. 14. The first unit outer reflector cutouts 551a are arranged in three and are spaced apart along the longitudinal direction of the outer reflector 550. The second unit outer reflecting portion cutout 551b, which is the second row, is provided as one and spaced apart from the first unit outer reflecting portion cutout 551a by a predetermined interval in the circumferential direction of the outer reflecting portion 550.

The number of cutout holes 551a for the first unit outer reflector and cutout holes 551b for the second unit outer reflector may be variously changed, but the cutout holes 551a for the first unit outer reflector and the second unit outer reflection may vary. The number of bouillon cut holes 551b should be different from each other.

On the other hand, in the present embodiment the cutout hole 541 for the inner reflection portion is provided in a circular shape. The inner reflector cutouts 541 are provided in plural and are spaced apart by a predetermined interval along the circumferential direction of the inner reflector 540.

In addition, in the present embodiment, the inner reflector cutout 541 includes a plurality of unit inner reflector cutouts 541 spaced apart in the longitudinal direction (the central axis direction of the inner reflector) of the inner reflector 540. do.

In the present embodiment, the plurality of unit inner reflecting portions cutting holes 541 are provided in three and disposed along the longitudinal direction of the outer reflecting portion 550. In the present embodiment, the number of cutouts 541 for the unit inner reflection part may vary.

In the present embodiment, the outer reflector cutout 551 is provided in the upper region of the outer reflector 550, and the inner reflector cutout 541 is provided in the upper region of the outer reflector 550. Therefore, when the first unit outer reflector cutout 551a overlaps the unit inner reflector cutout 541 according to the relative rotation of the outer reflector 550 with respect to the inner reflector 540, the second unit When the outer reflector cutout 551b overlaps the unit inner reflector cutout 541, both the first unit outer reflector cutout 551a and the second unit outer reflector cutout 551b are inside the unit. If the reflection portion cut hole 541 does not overlap, the reflection area of the heat reflection unit 130 is changed in three stages, thereby subdividing the temperature of the upper region of the crucible unit 110 in three stages. There is an adjustable advantage.

FIG. 15 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the sixth embodiment of the present invention.

This embodiment differs only in the arrangement positions of the inner reflecting portion cutout 641 and the outer reflecting portion cutout 651 as compared with the fifth embodiment. In other configurations, the present embodiment differs from the structure of the fifth embodiment of FIG. Since they are the same, the same reference numerals are used for the same components and the description thereof will be omitted below.

In this embodiment, the inner reflector cutout 641 is provided in the lower region of the inner reflector 640, and the outer reflector cutout 651 is provided in the lower region of the outer reflector 650. Therefore, when the first unit outer reflector cutout 651a overlaps the unit inner reflector cutout 641 according to the relative rotation of the outer reflector 650 with respect to the inner reflector 640, the second unit When the outer reflector cutout 651b overlaps the unit inner reflector cutout 641, both the first unit outer reflector cutout 651a and the second unit outer reflector cutout 651b are inside the unit. If the reflection portion cut hole 641 does not overlap, the reflection area of the heat reflection unit 130 is changed in three stages, thereby subdividing the temperature of the lower region of the crucible unit 110 into three stages. There is an adjustable advantage.

FIG. 16 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the seventh embodiment of the present invention.

This embodiment differs only in shape and arrangement of the inner reflecting portion cutout 741 and the outer reflecting portion cutout 751 as compared with the first embodiment, and in other configurations, the first embodiment of FIGS. Since it is the same as the structure of an Example, below, the same code | symbol is used about the same structure, and the description is abbreviate | omitted.

In the present embodiment, the cutout hole 741 for the inner reflection part is provided in a circular shape. The inner reflector cutout 741 is an upper inner reflector cutout 742 provided in an upper region of the inner reflector 740 and a lower inner reflector cutoff provided in a lower region of the inner reflector 740. Ball 743.

The upper inner reflector cutout hole 742 is provided in plural and spaced apart along the circumferential direction of the inner reflector 740. The upper inner reflecting portion cutting hole 742 has a circular shape and is disposed in the longitudinal direction of the inner reflecting portion 740 (in the central axis direction of the inner reflecting portion) spaced apart from the plurality of unit upper inner reflecting portion cutting holes 742. Include.

In the present embodiment, the unit upper inner reflecting portion cutout 742 is provided along the longitudinal direction of the inner reflecting portion 740 is provided with three, this is not limited scope of the present invention, the unit upper inner reflecting portion cutout The number of 742 may vary.

The lower inner reflector cutout hole 743 is provided in plural and spaced apart along the circumferential direction of the inner reflector 740. The lower inner reflector cutout 743 is formed in a circular shape and is spaced apart in the longitudinal direction of the inner reflector 740 (in the central axis direction of the inner reflector). Include.

In the present embodiment, the lower portion of the inner reflecting portion 743 for the lower unit is provided along the longitudinal direction of the inner reflecting portion 740, but the scope of the present invention is not limited thereto. The number of 743 may vary.

In the present embodiment, the upper inner reflecting portion cutting hole 742 and the lower inner reflecting portion cutting hole 743 are disposed to be offset from each other with respect to the virtual center axis of the inner reflecting portion 740. That is, the upper inner reflecting portion cutting hole 742 and the lower inner reflecting portion cutting hole 743 are virtual straight lines positioned side by side on the virtual center axis of the inner reflecting portion 740 as shown in FIG. 16. (G) are not arranged together.

In addition, at least one of the lower inner reflector cutouts 743 disposed along the circumferential direction of the inner reflector 740 in the present embodiment, as shown in detail in FIG. 16, the inner reflector 740. A virtual straight line passing along the other central reflector incision hole 742 that is parallel to the imaginary central axis of the shortest distance a with an imaginary straight line G passing through the adjacent upper inner reflector incision hole 742 ( It is arranged differently from the shortest distance b between G) and the other lower inner reflecting cutout 743.

On the other hand, in the present embodiment, the cut hole 751 for the outer reflection portion is provided in a circular shape. The outer reflector cutout 751 includes an upper outer reflector cutout 752 provided in the upper region of the outer reflector 750 and a lower outer reflector cutoff provided in the lower region of the outer reflector 750. Ball 753.

A plurality of cutout holes 752 for the upper outer reflector are provided and spaced apart along the circumferential direction of the outer reflector 750. The upper outer reflector cutout 752 is formed in a circular shape and is disposed in the longitudinal direction of the outer reflector 750 spaced apart in the longitudinal direction (the center axis direction of the outer reflector). Include.

In the present embodiment, the unit upper outer reflecting portion cutout 752 is provided in three along the longitudinal direction of the inner reflecting portion 740, which is not limited to the scope of the present invention, the unit upper outer reflecting portion cutout The number of 752 may vary.

A plurality of cutout holes 753 for the lower outer reflector are provided and spaced apart along the circumferential direction of the outer reflector 750. The lower outer reflector cutout 753 may have a circular shape and may be disposed to be spaced apart in the longitudinal direction of the outer reflector 750 in the longitudinal direction (the center axis direction of the outer reflector). Include.

In the present embodiment, the unit lower outer reflecting portion (753) is provided with three arranged along the longitudinal direction of the outer reflecting portion 750, which is not limited to the scope of the present invention, the lower portion of the outer reflecting portion for the unit The number of 753 may vary.

Meanwhile, in at least one of the lower outer reflector cutouts 753 disposed along the circumferential direction of the outer reflector 750 in the present embodiment, the outer reflector 750 is illustrated in detail in FIG. 16. It is not arranged together on an imaginary straight line H which is located side by side on the imaginary central axis of. That is, some of the lower outer reflector cutouts 753 are located parallel to the virtual center axis of the outer reflector 750 and pass through the adjacent upper outer reflector cutouts 752, as shown in FIG. 16. It is not arranged on the imaginary straight line H.

An operation of the vapor deposition material evaporator 100 having the above-described configuration will be described with reference to FIG. 16.

When the outer reflector 750 is rotated to the left side with respect to the inner reflector 740, the upper inner reflector cutout 742 and the upper outer reflector cutoff 752 overlap with each other, and the lower inner reflector cutout is partially cut. 743 and a portion of the lower outer reflector cutout 753 overlap.

As the outer reflector 750 is rotated a predetermined angle to the left side with respect to the inner reflector 740, both the upper inner reflector cutout 742 and the upper outer reflector cutout 752 overlap and partially lower the inner part. By overlapping the reflecting hole 743 for the reflecting portion and the lower portion of the reflecting portion for the lower portion of the unit, the reflection area of the heat reflection unit 130 is reduced to lower the temperature of the crucible unit 110.

In addition, the upper inner reflector incision hole 742 and the upper outer reflector incision hole 752 are all overlapped, while the lower inner reflector incision hole 743 and the lower outer reflector incision hole 753 partially overlap. As a result, the reflection area of the upper region of the heat reflection unit 130 may be relatively smaller than the reflection area of the lower region, so that the temperature of the upper region of the crucible unit 110 may be lower than that of the lower region.

Meanwhile, when the outer reflector 750 is rotated to the right with respect to the inner reflector 740, the upper inner reflector cutout 742 and the upper outer reflector cutout 752 do not overlap, but partially for the lower inner reflector. Only the cutout 743 and the cutout 753 for the partial lower reflector overlap.

Therefore, the reflecting area of the upper region of the heat reflection unit 130 is wider than the reflecting area of the lower region, so that the temperature of the upper region of the crucible unit 110 may be relatively higher than the temperature of the lower region.

FIG. 17 is a view illustrating an inner reflection part and an inner reflection part of the deposition material evaporation apparatus according to the eighth embodiment of the present invention.

This embodiment differs from the seventh embodiment in that the inner reflecting portion cutting holes 841 and the outer reflecting portion cutting holes 851 are arranged in reverse order. Since it is the same as the structure of one Embodiment, below, the same code | symbol is used about the same structure, and the description is abbreviate | omitted.

In the present embodiment, the incision hole 851 for the outer reflection part is provided in a circular shape. The outer reflector cutout 851 is an upper outer reflector cutout 852 provided in the upper region of the outer reflector 850 and a lower outer reflector cutout provided in the lower region of the outer reflector 850. Ball 853.

The upper outer reflecting portion cutting holes 852 are provided in plural and spaced apart along the circumferential direction of the outer reflecting portion 850. The upper outer reflector cutout 852 is formed in a circular shape and is disposed in the longitudinal direction (the center axis direction of the outer reflector of the outer reflector) of the outer reflector 850 for the plurality of unit upper outer reflector cutouts 852. Include.

In the present embodiment, the unit upper outer reflecting portion cutout 852 is provided in three along the longitudinal direction of the outer reflecting portion 850, which is not limited to the scope of the present invention, the unit upper outer reflecting portion cutout The number of 852 may vary.

A plurality of cutout holes 853 for the lower outer reflector are provided to be spaced apart along the circumferential direction of the outer reflector 850. The lower outer reflector cutouts 853 are formed in a circular shape and are arranged to be spaced apart in the longitudinal direction of the outer reflector 850 in the longitudinal direction (the center axis direction of the outer reflector). Include.

In the present embodiment, the unit lower outer reflecting portion 885 is provided with three arranged along the longitudinal direction of the outer reflecting portion 850, which is not limited to the scope of the present invention, the lower portion of the outer reflecting portion for the unit The number of 853 may vary.

In this embodiment, the upper outer reflector cutout 852 and the lower outer reflector cutout 853 are disposed to be offset from each other with respect to the virtual center axis of the outer reflector 850. That is, the upper outer reflecting portion cutting hole 852 and the lower outer reflecting portion cutting hole 853 are virtual straight lines located side by side on the virtual center axis of the outer reflecting portion 850, as shown in FIG. (H) are not arranged together.

In addition, in the present embodiment, at least one of the lower outer reflector cutouts 853 disposed along the circumferential direction of the outer reflector 850 is the outer reflector 850 as shown in detail in FIG. 17. A virtual straight line passing parallel to the imaginary central axis of the shortest distance (c) with the imaginary straight line H passing through the adjacent upper outer reflector incision 852 and passing through the other upper outer reflector incision 852. It is arranged differently from the shortest distance d between (H) and the other lower outer reflecting part cutting hole 853.

On the other hand, in the present embodiment, the incision hole 841 for the inner reflection part is provided in a circular shape. The inner reflector cutout 841 is an upper inner reflector cutout 842 provided in the upper region of the inner reflector 840 and a lower inner reflector cutoff provided in the lower region of the inner reflector 840. Ball 843.

The upper inner reflecting portion cutting holes 842 are provided in plural and spaced apart along the circumferential direction of the inner reflecting portion 840. The upper inner reflector cutout 842 is formed in a circular shape and is disposed in the longitudinal direction of the inner reflector 840 (in the central axis direction of the inner reflector) spaced apart from the plurality of unit upper inner reflector cutouts 842. Include.

In the present embodiment, the unit upper inner reflecting portion cutting holes 842 are provided in three along the longitudinal direction of the inner reflecting portion 840, but the scope of the present invention is not limited thereto, and the unit upper inner reflecting portion cutting holes 842 are not limited thereto. The number of 842 may vary.

A plurality of lower inner reflector cutouts 843 are provided and spaced apart along the circumferential direction of the inner reflector 840. The lower inner reflector cutout 843 has a circular shape and is disposed in the longitudinal direction of the inner reflector 840 spaced apart in the longitudinal direction (the center axis direction of the inner reflector). Include.

In the present embodiment, the lower portion of the inner reflecting portion 843 for the unit is provided along the longitudinal direction of the inner reflecting portion 840, but the scope of the present invention is not limited thereto. The number of 843 may vary.

Meanwhile, at least one of the lower inner reflector cutouts 843 disposed in the circumferential direction of the inner reflector 840 in the present embodiment, as shown in detail in FIG. 17, the inner reflector 840. Are not arranged together on an imaginary straight line G located side by side on the imaginary central axis of the. That is, some of the lower inner reflector cutouts 843 are located side by side on the virtual center axis of the inner reflector 840 and pass through the adjacent upper inner reflector cutouts 842, as shown in FIG. 17. It is not arranged on the imaginary straight line G.

As described in the seventh embodiment, the interaction between the inner reflector 840 and the outer reflector 850 having the above-described structure, that is, the relative rotation with respect to the inner reflector 840 of the outer reflector 850 is performed. The reflection area of the heat reflection unit 130 may be varied.

As described above, the present invention is not limited to the described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the present invention, which will be apparent to those skilled in the art. Therefore, such modifications or variations will have to be belong to the claims of the present invention.

110: crucible unit 111: opening
120: heating unit 130: heat reflection unit
140, 240, 340, 440, 540, 640, 740, 840: inner reflector
141, 241, 341, 441, 541, 641, 741, 841: Incision for inner reflector
341a: a cutting hole for the first inner reflection part of the unit
341b: Incision hole for second unit inner reflection part
142, 242, 742, 842: incision for upper inner reflector
143, 243, 743, 843: Incision for lower medial reflector
150, 250, 350, 450, 550, 650, 750, 850: outer reflector
151, 251, 351, 451, 551, 651, 751, 851: Incision for outer reflector
551a, 651a: a cutting hole for the first outer reflector of the unit
551b and 651b: Incision holes for second unit outer reflector
152, 252, 752, 852: Incision for upper outer reflector
153, 253, 753, 853: Incision for lower outer reflector
155: through hole 160: support portion
161: screw hole 170: rotation limiting portion
171: pressure bolt 171a: bolt body portion
171b: bolt head portion 180: cooling unit
181: cooling line 182: cooling unit body
183: upper communication part 184: lower communication part
M: evaporation material P1: cooling water supply piping
P2: cooling water discharge line

Claims (19)

A crucible unit accommodating a deposition material therein;
A heating unit disposed adjacent to the crucible unit and heating the crucible unit; And
A heat reflection unit disposed adjacent to the heating unit and reflecting heat radiated from the heating unit to the crucible unit,
The heat reflection unit,
It includes a reflective area variable heat reflection unit that can be arranged to vary the reflection area reflecting the heat,
The reflection area variable heat reflection unit,
An inner reflector disposed to be spaced apart from the crucible unit and having a cutout for the inner reflector; And
The outer reflector is disposed farther with respect to the crucible unit than the inner reflector based on the crucible unit, and includes an outer reflector having an incision hole for an outer reflector.
And at least one of the inner reflector and the outer reflector is rotatably connected relative to the other. delete delete The method of claim 1,
The inner reflector,
The inside is hollow, provided in a cylindrical shape having a predetermined inner diameter,
The outer reflector,
The inside is hollow, provided in a cylindrical shape having an inner diameter larger than the inner diameter of the inner reflecting portion,
The crucible unit is disposed inside the inner reflector,
And the inner reflection part is disposed inside the outer reflection part. The method of claim 4, wherein
The inner reflecting portion is provided with a plurality of cutouts, the plurality of inner reflecting portion for the cutting hole is disposed spaced apart by a predetermined interval in the circumferential direction of the inner reflecting portion,
And a plurality of cutout holes for the outer reflector, and a plurality of cutout holes for the outer reflector are spaced apart by a predetermined interval along the circumferential direction of the outer reflector. The method of claim 5,
The cutting hole for the inner reflector,
An upper inner reflector cutout provided in an upper region of the inner reflector; And
Evaporation material deposition apparatus comprising a cutout for the lower inner reflector provided in the lower region of the inner reflector. The method of claim 6,
And at least one of the upper inner reflecting portions cutouts and the lower inner reflecting portion cutoffs is disposed to be offset from a virtual center axis of the inner reflecting portion. The method of claim 7, wherein
The shortest distance between the lower inner reflector cutout of any one of the lower inner reflector cutouts and an imaginary straight line passing parallel to the upper inner reflector cutout located adjacent to the virtual central axis of the inner reflector, And a shortest distance between the lower inner reflecting incision hole and the virtual straight line passing along the other inner inner reflecting incision hole located parallel to the virtual central axis of the inner reflecting part. The method of claim 5,
The cutting hole for the outer reflector,
A cutting hole for the upper outer reflector provided in an upper region of the outer reflector; And
Evaporation material deposition apparatus comprising a cutout for the lower outer reflector provided in the lower region of the outer reflector. The method of claim 9,
And at least one of the cutouts for the upper outer reflector and the cutouts for the lower outer reflector are disposed to be offset from each other with respect to a virtual center axis of the outer reflector. The method of claim 10,
The shortest distance between the lower outer reflector cutout of any one of the lower outer reflector cuts and an imaginary straight line passing along the virtual center axis of the outer reflector and adjacent to the upper outer reflector cutout adjacent to each other, And a shortest distance between the lower outer reflecting incision of the lower outer reflector and an imaginary straight line which is located parallel to the imaginary central axis of the outer reflecting portion and passes through the adjacent upper upper reflecting incision. The method of claim 5,
The cutting hole for the inner reflector,
An incision hole for the first unit inner reflector provided at least one spaced apart along the longitudinal direction of the inner reflector; And
It is provided with at least one spaced apart in the longitudinal direction of the inner reflector for the second unit inner reflector for spaced apart by a predetermined interval in the circumferential direction of the inner reflector with respect to the cutting hole for the first unit inner reflector Including incisions,
The evaporation material deposition apparatus of claim 1, wherein the number of cutout holes for the first inner reflector is different from each other. The method of claim 5,
The cutting hole for the outer reflector,
A cut-out hole for the first unit outer reflector provided at least one spaced apart along the longitudinal direction of the outer reflector; And
It is provided with at least one spaced apart in the longitudinal direction of the outer reflector for the second unit outer reflector for spaced apart by a predetermined interval in the circumferential direction of the outer reflector with respect to the cutting hole for the first unit outer reflector. Including incisions,
And the number of cutouts for the first unit outer reflector and the cutout for the second unit outer reflector is different from each other. The method of claim 4, wherein
The reflection area variable heat reflection unit,
And a support part supporting the inner reflector and the outer reflector, wherein at least one of the inner reflector and the outer reflector is rotatably connected. The method of claim 12,
The reflection area variable heat reflection unit,
And a rotation limiter configured to limit a relative rotation of at least one of the inner reflector and the outer reflector. The method of claim 15,
The rotation limiting portion restricts relative rotation of the support portion of the outer reflecting portion,
The support portion is provided with a screw hole formed in the support portion is recessed in the side wall and a screw thread formed on the inner wall,
The rotation limiter,
And a pressurizing bolt that penetrates the through hole formed in the outer reflecting part and is engaged with the screw hole to press the outer reflecting part to the support part. The method of claim 16,
The through hole is a vapor deposition material evaporator, characterized in that provided in the form of a long hole extending in the circumferential direction of the outer reflector. The method of claim 4, wherein
A cooling unit disposed adjacent to the outer reflecting unit and provided with a cooling line through which cooling water flows,
The cooling unit,
A cooling unit main body having a hollow shape and having a cylindrical shape having an inner diameter larger than an inner diameter of the outer reflecting portion, and supporting the cooling line;
An upper communicating portion disposed in an upper region of the cooling unit body and communicating with the cooling line; And
The vapor deposition material evaporator disposed in the lower region of the cooling unit body, and comprising a lower communication portion in communication with the cooling line. The method of claim 18,
The cooling unit,
And a cooling unit controller for selectively controlling the cooling unit such that the cooling water is supplied to one of the upper communicating part and the lower communicating part and the cooling water is discharged from the other.

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