KR100973121B1 - Excimer lamp - Google Patents

Abstract

The use of chemically stable gases such as sulfur hexafluoride, carbon tetrafluoride, or nitrogen trifluoride also provides an excimer lamp with high illumination and high illumination stability.

In an excimer lamp in which a rare gas and a fluoride are enclosed in the light emitting tube 2 and at least one electrode 10 or 11 is disposed on an outer surface of the light emitting tube 2, the gas pressure in the light emitting tube 2 is total pressure. 13.3 kPa or more, wherein the fluoride is any one of sulfur hexafluoride, carbon tetrafluoride, or nitrogen trifluoride, the molar ratio of the fluoride to the total gas is 0.001% to 10%, and the rare gas is argon, krypton It is an excimer lamp which consists of helium and / or neon with either xenon, and the molar ratio with respect to the whole rare gas of this helium and / or this neon is 90%-99.5%.

Description

Excimer lamp {EXCIMER LAMP}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an excimer lamp, and more particularly to an excimer lamp provided with an electrode on an outer surface of a light emitting tube.

Background Art Conventionally, excimer lamps are known in which a discharge vessel serving as a dielectric is filled with a suitable luminescent gas and a halogen to generate excimer molecules by dielectric excimer discharge in the discharge vessel, and emit excimer light from the excimer molecules. An excimer lamp is used as an ultraviolet light source for photochemical reactions, for example.

Such excimer lamps use a rare gas (argon, krypton, xenon, or the like) or a combination of rare gas and halogen (fluorine, chlorine, bromine, iodine, etc.) depending on the wavelength of excimer light to be obtained as a gas for discharge. For example, 193 nm of light is emitted from a discharge gas made of argon-fluorine, 248 nm of light is emitted from a discharge gas made of krypton-fluorine, and 351 nm of light is discharged from a gas of discharge made of xenon-fluorine. Light is emitted. These lights are used for applications such as surface modification and sterilization. In particular, in the argon-fluorine and krypton-fluorine excimer lamps in which 193 nm and 248 nm radiation, which are widely used in lithography, are used, they are used in a wide range of applications such as resist property testing, peripheral exposure, and mask inspection.

When fluorine is enclosed in the light emitting tube of the excimer lamp, and the light emitting tube is quartz glass (SiO ₂ ), the fluorine during the lamp lighting is high because the reactivity of silica (Si) and fluorine ions contained in the quartz glass (SiO ₂ ) is high. As the material of the light emitting tube in contact with the ions, quartz glass (SiO ₂ ) cannot be used. As a result, the arc tube as, a material the absorption of fluoride ion which does not contain the silica (Si) consisting of a less material is used, examples of the arc tube material, for example, as a main component oxide, aluminum (Al ₂ 0 ₃₎ A metal oxide such as sapphire (single crystal alumina) or alumina (polycrystalline alumina) is used.

Further, as the fluorine source to be introduced in the excimer lamp, F ₂ is not corroded by the fluorine generated at or exhaust, or that do not react requires special equipment and, yet can not be used because the handling is difficult. Therefore, it is proposed to use chemically stable gases such as SF ₆ , CF ₄ , and NF ₃ . Especially, the ultraviolet lamp using SF ₆ is described in patent document 1. As shown in FIG.

[Patent Document 1: Japanese Patent No. 2913294]

However, gases such as SF ₆ , CF ₄ , and NF ₃ are gases with high chemical stability, high electron adhesion (in other words, strong electron trapping properties), and have high probability of trapping electrons generated by ionization. do. Accordingly, the UV lamps described in Patent Document 1, and a high concentration of SF _6, the molar ratio of SF ₆ among the whole gas in the arc tube is 6.6 to 10%, is poor reliability resulting roughness. Moreover, in this ultraviolet lamp, since the pressure of the whole gas is 0.7-7 Pa and low, the amount of ultraviolet light emission is small, As a result, the illuminance on the irradiation surface is low, and it was not usable as a practical lamp.

SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide an excimer lamp having a high illuminance and a high illuminance stability even when chemically stable gases such as sulfur hexafluoride, carbon tetrafluoride, or nitrogen trifluoride are used. .

MEANS TO SOLVE THE PROBLEM This invention employ | adopted the following means in order to solve said subject.

The first means is an excimer lamp in which a rare gas and a fluoride are enclosed in a light emitting tube, and at least one electrode 10, 11 is disposed on an outer surface of the light emitting tube, wherein the gas pressure in the light emitting tube is 13.3 kPa or more at a total pressure. The fluoride is any one of sulfur hexafluoride, carbon tetrafluoride, or nitrogen trifluoride, the molar ratio of the fluoride to the total gas is 0.001% to 10%, and the rare gas is any of argon, krypton, or xenon. It is an excimer lamp which consists of one and helium, neon, or any one of helium and neon, and the molar ratio with respect to the whole rare gas of helium, neon, or any one of helium and neon is 90%-99.5%.

In the second means, in the first means, the material of the light emitting tube includes sapphire (single crystal alumina) or alumina (polycrystalline alumina), magnesium difluoride (MgF ₂ ), mainly composed of aluminum oxide (Al ₂ O ₃ ), It is an excimer lamp characterized by lithium fluoride (LiF), calcium difluoride (CaF ₂ ), barium difluoride (BaF ₂ ), or YAG (yttrium aluminum garnet).

According to the invention of claim 1, roughness of 1 mW / cm 2 or more can be obtained, and roughness stability in which the fluctuation range of the illuminance on the irradiated surface is within ± 10% can be obtained. Can provide excimer lamps.

In addition, according to the invention of claim 2, the light emitting tube is made of a material having light transmittance with respect to light of 150 to 400 nm and a low absorption of fluorine ions, so that the reduction of encapsulated fluoride can be prevented. have.

An embodiment of the present invention will be described with reference to FIGS. 1 to 19.

1: is a perspective view of the excimer lamp which concerns on this invention of this embodiment, FIG. 2A is sectional drawing seen from the cutting surface which passes the tube axis of the excimer lamp shown in FIG. 1, and FIG. 2B is sectional drawing seen from the cutting surface of A-A of FIG. 2A.

As shown in these figures, the light emitting tube 2 of the excimer lamp 1 has a straight tube shape, is made of a material having a light transmittance with respect to light of 150 to 400 nm and a low absorption of fluorine ions. do. As the material of the light emitting tube 2, for example, a metal oxide such as sapphire (single crystal alumina) or alumina (polycrystalline alumina) mainly composed of aluminum oxide (Al ₂ O ₃ ) is used. In addition, as a material used for the light emitting tube 2, magnesium difluoride (MgF ₂ ), lithium fluoride (LiF), calcium difluoride (CaF ₂ ), barium difluoride (BaF ₂ ), YAG (yttrium aluminum garnet) Fluoride, such as) may be used.

It is also conceivable to use quartz glass (SiO ₂ ) as the light transmitting material of the light emitting tube 2, but as described above, silica (Si) contained in the quartz glass (SiO ₂ ) is reactive with fluorine ions. Since this is high, quartz glass (SiO ₂ ) cannot be used because it comes into contact with fluorine ions during lamp lighting. For this reason, the material which does not contain silica (Si) which consists of a material with little absorption of a fluorine ion is used.

Both ends in the longitudinal direction of the light emitting tube 2 are open, and cup-shaped lid members 3 and 4 are provided at both ends thereof. The lid members 3 and 4 are formed of, for example, an alloy in which nickel (Ni) and cobalt (Co) are mixed with iron (Fe), so-called cobar. In addition, since the lid members 3 and 4 are not limited to metal but only have ultraviolet resistance, for example, aluminum oxide (Al ₂ O ₃ ) made of the same material as that of the light emitting tube 2 is a main component. You may use sapphire (single-crystal alumina) etc. which are used.

Between the light emitting tube 2 and the lid members 3 and 4, the encapsulant 5 and 6 are filled, so that the light emitting tube 2 and the lid members 3 and 4 are coupled to the light emitting tube 2 and the lid. The discharge container which consists of the members 3 and 4 and the sealing materials 5 and 6 is formed. As a material of the encapsulation materials 5 and 6, for example, a brazing material made of an alloy of silver and copper (Ag-Cu alloy) is used. When the excimer lamp 1 is turned on, the encapsulants 5 and 6 are irradiated with ultraviolet rays and heated by the heat of illumination from the excimer lamp 1, so that it is necessary to have ultraviolet resistance and heat resistance. In particular, as long as the absorption of fluorine ions such as an alloy of silver and copper (Ag-Cu alloy) is low, it can be suitably used.

The gas pipe 7 is provided in the 2nd cover member 4, The inside 8 of the discharge container is exhausted by the gas pipe 7, and pressure-reduced, and the fluoride which is high in gas and chemical stability as discharge gas is high. This is sealed. After the gas for discharge is sealed, the gas pipe 7 is formed with the sealing portion 9 by pressure welding or the like, whereby the discharge container has a sealed structure.

A rare gas composed of argon (Ar), krypton (Kr) or xenon (Xe), helium (He) and / or neon (Ne), and sulfur hexafluoride as a discharge gas enclosed in the interior 8 of the discharge vessel. SF ₆ ), fluoride consisting of carbon tetrafluorocarbon (CF ₄ ) or nitrogen trifluoride (NF ₃ ) is used.

On the outer surface of the light emitting tube 2, as shown in FIG. 2B, the pair of external electrodes 10 and 11 are arranged to face each other electrically, and as shown in FIG. 2A, the tube axis of the light emitting tube 2 is provided. It is installed to extend along the direction. In addition, the external electrodes 10, 11 are provided away from the encapsulant 5, 6 and the lid members 3, 4. The external electrodes 10, 11 are formed by, for example, coating copper on the outer surface of the light emitting tube 2 to form a paste, or by forming a plate-shaped, for example, aluminum with an adhesive or the like. It is formed by adhering to the outer surface of the). Leads 12 and 13 are electrically connected to each end of the external electrodes 10 and 11 in the longitudinal direction by solders 14 and 15, and a power source (not shown) is connected to the leads 12 and 13 to excimer lamps. Power is supplied at the time of lighting of (1).

When the excimer lamp 1 is turned on, a total pressure is applied between the pair of external electrodes 10, 11, so that discharge occurs between the external electrodes 10, 11 through the light emitting tube 2. When the rare gas of the discharge gas is, for example, argon (Ar) and fluoride, for example sulfur hexafluoride (SF ₆ ), these gases are ionized and argon ions or fluorine ions are formed to form argon-fluorine. The excimer molecule thus formed is formed to emit light in the vicinity of the wavelength of 193 nm, and is emitted outside the light emitting tube 2.

When the excimer lamp 1 is turned on, excimer discharge is performed through the light emitting tube 2 between the external electrodes 11 and 12 extending in the range of the distance L1 in the tube axis direction of the light emitting tube 2. Since the light emitting tube 2 is made of a material which does not contain silica (Si) as a material having little absorption of fluorine ions, the ionized fluorine ions are not absorbed into the light emitting tube 2.

The discharge gas enclosed in the light emitting tube 2 includes either argon, krypton, or xenon as a rare gas, either argon, krypton, or xenon as sulfur, and hexafluoride as fluoride. Fluorine ions of carbon tetrafluoride or nitrogen trifluoride react to form excimer molecules to emit light. In the rare gas, helium and / or neon are buffer gases that do not contribute to light emission.

As the gas for discharge in the light emitting tube 2, the rare gas and the fluoride are encapsulated, a high total pressure is applied between the external electrodes 11 and 12 to induce discharge in the discharge vessel 8, thereby obtaining excimer emission. In this case, the mechanism leading to luminescence is estimated as follows. For example, when argon (Ar) as a rare gas and sulfur hexafluoride (SF ₆ ) as a fluoride are encapsulated, SF ₆ is decomposed into F and SFx by discharge, and Ar and excimers (Eximer (ArF ^* ), And excimer emission (ArF ^* → ArF + hν (193 nm)) can be obtained, and the same emission can be achieved by using krypton, xenon, carbon tetrafluoride, or nitrogen trifluoride as another rare gas. It is assumed that the mechanism is represented.

Considering the practical use of the excimer lamp in various applications, the illuminance is 1 mW / cm 2 or more, and the illuminance stability is a condition that the fluctuation range of the illuminance on the irradiated surface is within ± 10%.

Next, in the excimer lamp which has the structure of the excimer lamp 1 shown in FIG. 1, the experiment performed in order to examine the illuminance and roughness stability by changing various gas component ratios is demonstrated.

FIG. 3 is a diagram showing four types of Experiments 1 to 4, and Experiment 1 uses argon (Ar) as a light emitting gas, neon (Ne) as a buffer gas, and sulfur hexafluoride (SF ₆ ) as a fluoride. In Experiment 2, argon (Ar) as a light emitting gas, helium (He) as a buffer gas, and sulfur hexafluoride (SF ₆ ) as a fluoride, and Experiment 3 as krypton (Kr) as a light emitting gas and a buffer gas Neon (Ne), sulfur hexafluoride (SF ₆ ) as fluoride, Experiment 4 uses xenon (Xe) as luminescent gas, neon (Ne) as buffer gas, and sulfur hexafluoride (SF ₆ ) as fluoride It is an experiment which investigated illuminance and illuminance stability using the excimer lamp 1 shown in FIG. 1, respectively. In addition, good illuminance stability said that the fluctuation | variation range of the illuminance within 1 hour after a lighting start is within 10% of stability.

FIG. 4 shows that in the experiment 1 (1), when SF ₆ / (Ne + Ar + SF ₆ ) is 0.001%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Ar / (Ne + Ar) in 100 to 0.2% of range.

FIG. 5 shows that in experiment 1 (2), when SF ₆ / (Ne + Ar + SF ₆ ) is 0.02%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. Is a table showing initial roughness (mW / cm 2), roughness stability (variation range ± 10%), and comprehensive evaluation when the range of Ar / (Ne + Ar) is changed within a range of 100 to 0.2%. .

FIG. 6 shows that in the experiment 1 (3), when SF ₆ / (Ne + Ar + SF ₆ ) is 0.1%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Ar / (Ne + Ar) in 100 to 0.2% of range.

FIG. 7 shows that in experiment 1 (4), when SF ₆ / (Ne + Ar + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Ar / (Ne + Ar) in 100 to 0.2% of range.

FIG. 8 shows, in Experiment 2 (1), when SF ₆ / (He + Ar + SF ₆ ) is 0.001%, the total pressure is in the range of 90 to 400 Torr, and He / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Ar / (He + Ar) in 100 to 0.2% of range.

FIG. 9 shows that, in Experiment 2 (2), when SF ₆ / (He + Ar + SF ₆ ) is 0.02%, the total pressure is in the range of 90 to 400 Torr, and Ne / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Ar / (He + Ar) in 100 to 0.2% of range.

FIG. 10 shows that when SF ₆ / (He + Ar + SF ₆ ) is 0.1% in Experiment 2 (3), the total pressure is in the range of 90 to 400 Torr, and Ne / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Ar / (He + Ar) in 100 to 0.2% of range.

FIG. 11 shows that in experiment 2 (4), when SF ₆ / (He + Ar + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range of Ar / (He + Ar) is changed to 100 to 0.2% of range.

FIG. 12 shows that, in Experiment 3 (1), when SF ₆ / (He + Ar + SF ₆ ) is 0.001%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Kr) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Kr / (ne + Kr) are changed in 100 to 0.2% of range.

FIG. 13 shows that, in Experiment 3 (2), when SF ₆ / (Ne + Kr + SF ₆ ) is 0.02%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Kr / (Ne + Kr) are changed in 100 to 0.2% of range.

FIG. 14 shows that, in Experiment 3 (3), when SF ₆ / (Ne + Kr + SF ₆ ) is 0.1%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Kr / (ne + Kr) are changed in 100 to 0.2% of range.

FIG. 15 shows that, in Experiment 3 (4), when SF ₆ / (Ne + Kr + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Kr / (Ne + Kr) are changed in 100 to 0.2% of range.

FIG. 16 shows that in SF ₄ / (Ne + Xe + SF ₆ ) in 0.004% in Experiment 4 (1), the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Xe) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Xe / (Ne + Xe) in 100 to 0.2% of range.

FIG. 17 shows a range of 90 to 400 Torr, and Ne / (Ne + Xe) of 0 to 99.8% when the total pressure is in the range of 90 to 400 Torr when SF ₆ / (Ne + Xe + SF ₆ ) is 0.02% in Experiment 4 (2). It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Xe / (Ne + Xe) in 100 to 0.2% of range.

FIG. 18 shows that, in Experiment 4 (3), when SF ₆ / (Ne + Xe + SF ₆ ) is 0.1%, Ne / (Ne + Xe) is 0 to 99.9% in the total pressure range of 90 to 400 Torr. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Xe / (Ne + Xe) in 100 to 0.2% of range.

FIG. 19 shows that in Experiment 4 (4), when SF ₆ / (Ne + Xe + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Xe) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Xe / (Ne + Xe) in 100 to 0.2% of range.

As is clear from these experimental results, when the amount of encapsulation of the luminescent gas is increased to increase the illuminance, the discharge becomes unstable. On the other hand, when the amount of encapsulation of the buffer gas is increased, the discharge is stabilized and the illuminance stability is improved, but when encapsulated too much, the illuminance is lowered. In addition, although it is conceivable to increase the amount of SF ₆ encapsulated, SF ₆ is known as an insulating gas or an arc extinguishing gas, and because of its extremely high trapping property (electron adhesion), its partial pressure The higher the value is, the higher the probability that electrons generated by the discharge are trapped in SF ₆ and the discharge is inhibited. In order to maintain the discharge, a higher total pressure must be applied to generate more electrons. Therefore, the larger the partial pressure of SF _6, the higher the total pressure required to maintain the discharge, which is not practical.

From the above experiment, the illuminance can obtain illuminance of 1 mW / cm 2 or more, and the range of good illuminance stability in which the fluctuation range of illuminance on the irradiated surface is within ± 10% is 100 Torr (13.3 kPa). The molar ratio of fluoride to all the gases in the light emitting tube is 0.001% to 10%, and the molar ratio ((buffer gas) / (buffer gas + light emitting gas)) of the buffer gas to the entire rare gas in the light emitting tube is 90%. It turns out that it is the range of -99.5%.

Here, the mechanism of the roughness stability which is high illuminance is demonstrated. Explaining a model containing Ne and Ar as rare gases, the discharge as rare gas is more stable than that of Ar, and therefore, as shown in Experiment 1 (1) to Experiment 1 (4), the gas ratio of Ne with a high gas ratio is included. Even stable discharge can be obtained. On the other hand, the buffer gas does not contribute to luminescence and becomes an excimer by excitation due to Ne discharge, and then collides with Ar to generate Ar ions, and the Ar ions are argon-fluorine excimers by collision with fluorine ions. It is thought that it forms and contributes to light emission. That is, for example, it is assumed that the reaction during discharge in the excimer lamp in which the light emitting gas Ar, the buffer gas Ne, and the fluoride SF ₆ are encapsulated proceeds as follows.

^{Ne + e - → Ne * +} e - (1)

Ne ^* + Ar → Ne + Ar ⁺ (2)

^{_{SF 6 + e - → SF 5}} + F - (3)

^{Ar + + F - → ArF *} (4)

ArF ^* → ArF + hν (193 nm) (5)

The same result can be obtained when He is used instead of Ne as the buffer gas. That is, for example, it is estimated that the reaction in the discharge in the excimer lamp which encloses the light emission gas Ar, the buffer gas He, and the fluoride SF ₆ proceeds as follows.

^{He + e - → He * +} e - (6)

He ^* + Ar → He + Ar ⁺ (7)

^{_{SF 6 + e - → SF 5}} + F - (8)

^{Ar + + F - → ArF *} (9)

ArF ^* → ArF + hν (193 nm) (10)

In addition, even if Ne and He are mixed and used as a buffer gas, the same result can be obtained without changing the mechanism of light emission. In addition, even if SF ₄ or NF ₃ is used instead of SF ₆ as the fluoride, the light emitting mechanism does not change, and thus the same result can be obtained.

1 is a perspective view of an excimer lamp according to the present invention.

FIG. 2 is a sectional view seen from a cutting plane passing through the tube axis of the excimer lamp shown in FIG. 1 and a sectional view seen from the A-A cutting plane.

3 is a diagram illustrating the modes of four types of experiments 1 to 4. FIG.

FIG. 4 shows that in Experiment 1 (1), when SF ₆ / (Ne + Ar + SF ₆ ) is 0.001%, the total pressure is in the range of 90 to 400 Torr4, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Ar / (Ne + Ar) are changed in 100 to 0.2% of range.

FIG. 5 shows that in Experiment 1 (2), when SF ₆ / (Ne + Ar + SF ₆ ) is 0.02%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Ar / (Ne + Ar) are changed in 100 to 0.2% of range.

FIG. 6 shows that in Experiment 1 (3), when SF ₆ / (Ne + Ar + SF ₆ ) is 0.1%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when it changes the range and Ar / (Ne + Ar) in 100 to 0.2% of range.

FIG. 7 shows that in Experiment 1 (4), when SF ₆ / (Ne + Ar + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range of Ar / (Ne + Ar) is changed to 100 to 0.2% of range.

8 shows experiment 2 (1), when SF ₆ / (He + Ar + SF ₆ ) is 0.001%, the total pressure is in the range of 90 to 400 Torr, and He / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation when the range and Ar / (He + Ar) are changed in 100 to 0.2% of range.

9 shows that in SF 2 (2), when SF ₆ / (He + Ar + SF ₆ ) is 0.02%, the total pressure is in the range of 90 to 400 Torr, and Ne / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation when the range and Ar / (He + Ar) are changed in 100 to 0.2% of range.

FIG. 10 shows that in Experiment 2 (3), when SF ₆ / (He + Ar + SF ₆ ) is 0.1%, the total pressure is in the range of 90 to 400 Torr, and Ne / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation when the range and Ar / (He + Ar) are changed in 100 to 0.2% of range.

FIG. 11 shows that in Experiment 2 (4), when SF ₆ / (He + Ar + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (He + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Ar / (He + Ar) are changed in 100 to 0.2% of range.

FIG. 12 shows that, in Experiment 3 (1), when SF ₆ / (Ne + Kr + SF ₆ ) is 0.001%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Kr) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Kr / (Ne + Kr) are changed in 100 to 0.2% of range.

FIG. 13 shows that in the experiment 3 (2), when SF ₆ / (Ne + Kr + SF ₆ ) is 0.2%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.8. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation at the time of changing the range of% and Kr / (Ne + Kr) in 100 to 0.2% of range.

FIG. 14 shows that, in Experiment 3 (3), when SF ₆ / (Ne + Kr + SF ₆ ) is 0.1%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Kr / (Ne + Kr) are changed in 100 to 0.2% of range.

FIG. 15 shows that in the experiment 3 (4), when SF ₆ / (Ne + Kr + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Ar) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Kr / (Ne + Kr) are changed in 100 to 0.2% of range.

FIG. 16 shows the total pressure in the range of 90 to 400 Torr, and Ne / (Ne + Xe) in the range of 0 to 99.9% when SF ₆ / (Ne + Xe + SF ₆ ) is 0.001% in Experiment 4 (1). It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Xe / (Ne + Xe) are changed in 100 to 0.2% of range.

17 shows experiment 4 (2), in which SF ₆ / (Ne + Xe + SF ₆ ) is 0.02%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Xe) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Xe / (Ne + Xe) are changed in 100 to 0.2% of range.

FIG. 18 shows a range of 90 to 400 Torr of Ne / (Ne + Xe) in the range of 0 to 99.8% when the total pressure is 90 to 400 Torr when SF ₆ / (Ne + Xe + SF ₆ ) is 0.1% in Experiment 4 (3). , A table showing initial roughness (mW / cm 2), roughness stability (variation range ± 10%), and comprehensive evaluation when Xe / (Ne + Xe) is changed in a range of 100 to 0.2%.

FIG. 19 shows that in Experiment 4 (4), when SF ₆ / (Ne + Xe + SF ₆ ) is 10%, the total pressure is in the range of 90 to 400 Torr, and Ne / (Ne + Xe) is 0 to 99.9%. It is a table | surface which shows initial stage roughness (mW / cm <2>), roughness stability (variation range +/- 10%), and comprehensive evaluation, when the range and Xe / (Ne + Xe) are changed in 100 to 0.2% of range.

[Description of Symbols for Main Parts of Drawing]

1 excimer lamp

2 light tubes

3, 4 lid members

5, 6 encapsulation

7 gas pipe

8 Inside of discharge vessel

9 encapsulation

10, 11 external electrodes

12, 13 leads

14, 15 solder

Claims (2)

In an excimer lamp in which a rare gas and a fluoride are enclosed in a light emitting tube, and at least one electrode is arranged on the outer surface of the light emitting tube, The gas pressure in the light emitting tube is 13.3 kPa or more in total pressure, The fluoride is any one of sulfur hexafluoride, carbon tetrafluoride, or nitrogen trifluoride, and the molar ratio of the fluoride to the total gas is 0.001% to 10%, The rare gas is any one of argon, krypton, or xenon and helium, neon, or any one of helium and neon, and the molar ratio of the helium, neon, or any one rare gas of helium and neon is 90% to An excimer lamp, characterized in that 99.5%. The method according to claim 1, The material of the light emitting tube includes sapphire (single crystal alumina) or alumina (polycrystalline alumina), magnesium difluoride (MgF ₂ ), lithium fluoride (LiF), calcium difluoride (CaF ₂ ) containing aluminum oxide (Al ₂ O ₃ ). ), Barium difluoride (BaF ₂ ), or YAG (yttrium aluminum garnet).

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