JPS6254849B2 - - Google Patents
Info
- Publication number
- JPS6254849B2 JPS6254849B2 JP22759582A JP22759582A JPS6254849B2 JP S6254849 B2 JPS6254849 B2 JP S6254849B2 JP 22759582 A JP22759582 A JP 22759582A JP 22759582 A JP22759582 A JP 22759582A JP S6254849 B2 JPS6254849 B2 JP S6254849B2
- Authority
- JP
- Japan
- Prior art keywords
- iridium
- hydrochloric acid
- added
- solution
- coating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 19
- 229910052741 iridium Inorganic materials 0.000 claims description 17
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 17
- 239000000243 solution Substances 0.000 claims description 14
- 239000011247 coating layer Substances 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 12
- 239000007800 oxidant agent Substances 0.000 claims description 7
- 229910000457 iridium oxide Inorganic materials 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- -1 alkali metal hydroxide salt Chemical class 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 5
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 5
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 claims description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 4
- 239000003729 cation exchange resin Substances 0.000 claims description 4
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 4
- 150000004692 metal hydroxides Chemical class 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 230000003472 neutralizing effect Effects 0.000 claims description 2
- ZSKCYRQOFSOVNM-UHFFFAOYSA-K Cl.Cl[Ir](Cl)Cl Chemical compound Cl.Cl[Ir](Cl)Cl ZSKCYRQOFSOVNM-UHFFFAOYSA-K 0.000 claims 1
- 239000012141 concentrate Substances 0.000 claims 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 229910052707 ruthenium Inorganic materials 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000012286 potassium permanganate Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- YJZATOSJMRIRIW-UHFFFAOYSA-N [Ir]=O Chemical class [Ir]=O YJZATOSJMRIRIW-UHFFFAOYSA-N 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910001963 alkali metal nitrate Inorganic materials 0.000 description 1
- 150000004973 alkali metal peroxides Chemical class 0.000 description 1
- 150000004974 alkaline earth metal peroxides Chemical class 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- OZDHQOIPFFBDPL-UHFFFAOYSA-N iridium hydrochloride Chemical compound Cl.[Ir] OZDHQOIPFFBDPL-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
Description
【発明の詳細な説明】
本発明は、金属電極からイリジウムを回収する
方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for recovering iridium from metal electrodes.
近年、チタン等の弁金属基体上にルテニウムや
イリジウムの酸化物等を含む電極被覆を設けた不
溶性金属電極が、種々の電気化学の分野、特に食
塩電解工業における不溶性電極として多量に使用
されている。 In recent years, insoluble metal electrodes in which an electrode coating containing ruthenium or iridium oxides is provided on a valve metal substrate such as titanium have been widely used as insoluble electrodes in various fields of electrochemistry, especially in the salt electrolysis industry. .
このような金属電極は、かなりの長寿命を有す
るものであるが、使用中に電極被覆が徐々に消耗
或いは低活性化し、一定の性能を維持できなくな
つた際には、新しい電極に取り替える必要があ
る。こうした使用済の金属電極には、尚相当量の
高価なイリジウム等の貴金属成分が被覆中に残存
し、これを回収し、有効利用することは、工業上
重要である。 Such metal electrodes have a fairly long lifespan, but when the electrode coating gradually wears out or becomes less active during use and can no longer maintain a certain level of performance, it is necessary to replace it with a new electrode. There is. In such used metal electrodes, a considerable amount of precious metal components such as expensive iridium still remains in the coating, and it is industrially important to recover and effectively utilize this.
従来、この種の技術に関連するものとして、特
公昭46−26978号及び特公昭48−15144号により、
金属電極被覆を溶融塩を用いて除去する方法が知
られている。 Conventionally, as related to this type of technology, Japanese Patent Publication No. 46-26978 and Japanese Patent Publication No. 48-15144
A method of removing a metal electrode coating using molten salt is known.
また、特開昭51−68493号には、ルテニウム又
はその化合物を含む難溶性物質の可溶化法が、特
開昭51−68498号には、可溶性ルテニウム又はそ
の化合物の酸化蒸留法が記載されている。更に、
特開昭51−68499号にはルテニウム又はその化合
物を含む難溶性物質を処理してルテニウムを回収
する方法が示されている。しかし、これらの方法
は、いずれも金属電極から貴金属を回収する部分
工程か、ルテニウムの回収に関するもので、金属
電極から被覆中のイリジウムを回収する方法は知
られていなかつた。 Furthermore, JP-A-51-68493 describes a method for solubilizing poorly soluble substances containing ruthenium or its compounds, and JP-A-51-68498 describes an oxidative distillation method for soluble ruthenium or its compounds. There is. Furthermore,
JP-A-51-68499 discloses a method for recovering ruthenium by treating a poorly soluble substance containing ruthenium or its compounds. However, all of these methods involve a partial process of recovering noble metals from metal electrodes or recovery of ruthenium, and no method was known for recovering iridium in the coating from metal electrodes.
本発明は、叙上の事情に鑑みてなされたもの
で、その目的は、金属電極から容易に、かつ効率
良くイリジウムを回収する方法を提供することに
ある。 The present invention has been made in view of the above circumstances, and its purpose is to provide a method for easily and efficiently recovering iridium from metal electrodes.
本発明は、金属電極からイリジウムを回収する
方法において、金属電極基体上のイリジウム酸化
物を含む被覆層を、酸化剤を含むアルカリ金属水
酸化物溶融塩に溶解し、冷却後、水を加えて水溶
液とし、塩酸を加えて中和し、生成する弁金属水
酸化物を分離した後、更に塩酸を加えて該溶液を
酸性にし、次いで陽イオン交換樹脂を用いてアル
カリ金属を除去して、イリジウム塩化物の塩酸溶
液を得ることを特徴とするものである。 The present invention provides a method for recovering iridium from a metal electrode, in which a coating layer containing iridium oxide on a metal electrode substrate is dissolved in a molten alkali metal hydroxide salt containing an oxidizing agent, and after cooling, water is added. After making an aqueous solution and neutralizing it by adding hydrochloric acid to separate the produced valve metal hydroxide, further adding hydrochloric acid to make the solution acidic, then removing the alkali metal using a cation exchange resin, iridium This method is characterized by obtaining a hydrochloric acid solution of chloride.
本発明において弁金属とは、電極基体又は電極
被覆成分として通常用いられるチタン、タンタ
ル、ジルコニウム、ニオブを意味する。 In the present invention, the valve metal means titanium, tantalum, zirconium, and niobium that are commonly used as electrode substrates or electrode coating components.
以下、本発明をより詳細に説明する。 The present invention will be explained in more detail below.
先ず、酸化イリジウムを含む被覆層を有する使
用済等の金属電極表面を、酸化剤を含むアルカリ
金属水酸化物溶融塩に浸漬等により接触させて、
被覆層を溶解、剥離する。該酸化剤としては、
NaNO3、KNO3等のアルカリ金属硝酸塩、
Na2O2、K2O2等のアルカリ金属過酸化物、アル
カリ土類金属過酸化物、過マンガン酸カリウム等
が使用でき、その量は、溶融物全量基準で約20％
以下とすることが好ましい。該アルカリ金属水酸
化物としては、KOH、NaOHが好適に用いられ
る。溶融塩溶解工程における溶融塩温度は約350
〜600℃が適当であり処理時間は通常５〜30分程
度で、電極基体を損傷することなく容易に被覆層
を溶解することができる。 First, the surface of a used metal electrode having a coating layer containing iridium oxide is brought into contact with a molten alkali metal hydroxide salt containing an oxidizing agent by immersion or the like.
Dissolve and peel off the coating layer. As the oxidizing agent,
Alkali metal nitrates such as NaNO 3 and KNO 3 ,
Alkali metal peroxides such as Na 2 O 2 and K 2 O 2 , alkaline earth metal peroxides, potassium permanganate, etc. can be used, and the amount thereof is approximately 20% based on the total amount of melt.
The following is preferable. As the alkali metal hydroxide, KOH and NaOH are preferably used. The molten salt temperature in the molten salt dissolution process is approximately 350
A temperature of 600° C. to 600° C. is suitable, and the treatment time is usually about 5 to 30 minutes, and the coating layer can be easily dissolved without damaging the electrode substrate.
次いで、前記溶融塩溶解工程で得られたイリジ
ウムを含む溶融物を冷却し、水を加えて水溶液と
した後、塩酸を加えて中和する。加える水の量
は、溶融物の約２〜10倍量とすることが好適であ
る。溶融物水溶液はアルカリ性であり、これに塩
酸を加えて中性付近に中和して、溶解していた、
被覆層中或は電極基体からの弁金属を水酸化物と
して析出・沈澱させる。そして、該生成した弁金
属水酸化物を別等により分離除去した後、更に
塩酸を加えて酸性にし、次に該溶液を陽イオン交
換樹脂に接触させて、共存しているアルカリ金属
及び残存弁金属イオン等を完全に除去する。 Next, the iridium-containing melt obtained in the molten salt dissolving step is cooled, water is added to form an aqueous solution, and hydrochloric acid is added to neutralize the solution. The amount of water added is preferably about 2 to 10 times the amount of the melt. The aqueous melt solution was alkaline, and by adding hydrochloric acid to it, it was neutralized to near neutrality and dissolved.
The valve metal in the coating layer or from the electrode base is precipitated as a hydroxide. After the generated valve metal hydroxide is separated and removed, hydrochloric acid is added to make it acidic, and the solution is then brought into contact with a cation exchange resin to remove the coexisting alkali metal and the remaining valve metal hydroxide. Completely removes metal ions, etc.
かくして、イリジウムは、純粋な塩酸溶液とし
て得ることができる。該塩酸溶液中でイリジウム
は塩化イリジウム酸イオンの状態で存在している
と考えられる。該イリジウム塩酸溶液は、そのま
ま、又は適度の濃度に調製して金属電極の製造用
等に再び使用することができ、更に１〜650mm
Hg、110℃以下の条件で減圧蒸留し、濃縮固化し
て、塩化イリジウムとして回収することもでき
る。また、塩化イリジウムを還元処理して金属イ
リジウムとして回収することも勿論可能である。
一方、被覆層を除去した金属基体は、そのまま電
極基体として再利用することができる。 Iridium can thus be obtained as a pure hydrochloric acid solution. It is believed that iridium exists in the form of chloroiridate ions in the hydrochloric acid solution. The iridium hydrochloric acid solution can be used again as it is or after being prepared to an appropriate concentration for the production of metal electrodes.
Hg can also be recovered as iridium chloride by distilling under reduced pressure at 110°C or lower, concentrating and solidifying it. Of course, it is also possible to reduce iridium chloride and recover it as metallic iridium.
On the other hand, the metal base from which the coating layer has been removed can be reused as it is as an electrode base.
以上、詳記した通り、本発明の方法により、イ
リジウム酸化物を含む被覆層を有する金属電極よ
り、イリジウムを容易に高純度で回収することが
できる。イリジウムの回収率は、以下の実施例で
示す如く、被覆層イリジウム含有量基準で85％以
上とすることが可能である。 As detailed above, by the method of the present invention, iridium can be easily recovered with high purity from a metal electrode having a coating layer containing iridium oxide. As shown in the examples below, the recovery rate of iridium can be 85% or more based on the iridium content of the coating layer.
実施例 １
溶融塩の溶融剤として水酸化ナトリウム50ｇ、
酸化剤として過マンガン酸カリウム５ｇを用い、
ニツケルルツボ中で500℃に保持して溶融塩を形
成した。これに３×３cmのチタン基体上に酸化イ
リジウムを含む被覆層を有する電極を20分間浸漬
したところ、被覆層は完全に溶融塩中に溶解し
た。チタン基材を除去した該溶融塩を室温に冷却
し、これに150c.c.の水を加え水溶液とした後、塩
酸を加えて中和した。チタン水酸化物等の沈澱が
十分生成する迄、液を放置してから、沈澱物を
過分離し、液に塩酸を等量加えた。得られた液
をＨ型にした陽イオン交換樹脂層（三菱化成工業
(株)製DIAION−SKIB）に通し、ナトリウム、カ
リウム等のアルカリ金属イオンを分離除去し、流
出液としてイリジウム塩化物の塩酸溶液を得た。Example 1 50 g of sodium hydroxide as a melting agent for molten salt,
Using 5g of potassium permanganate as an oxidizing agent,
A molten salt was formed by holding at 500°C in a nickel crucible. When an electrode having a coating layer containing iridium oxide on a 3×3 cm titanium substrate was immersed in this solution for 20 minutes, the coating layer was completely dissolved in the molten salt. The molten salt from which the titanium base material had been removed was cooled to room temperature, 150 c.c. of water was added thereto to form an aqueous solution, and then hydrochloric acid was added to neutralize it. The liquid was allowed to stand until a sufficient amount of precipitate such as titanium hydroxide was formed, and then the precipitate was over-separated, and an equal amount of hydrochloric acid was added to the liquid. A cation exchange resin layer in which the obtained liquid was made into H type (Mitsubishi Chemical Industries, Ltd.)
DIAION-SKIB) (manufactured by Co., Ltd.) to separate and remove alkali metal ions such as sodium and potassium, and a hydrochloric acid solution of iridium chloride was obtained as an effluent.
又、この溶液を15mmHg、40℃で減圧蒸留し塩
化イリジウムの固体を得ることもできた。イリジ
ウムの回収率は87％であつた。 In addition, solid iridium chloride could be obtained by distilling this solution under reduced pressure at 15 mmHg and 40°C. The recovery rate of iridium was 87%.
尚、比較のため、酸化剤KMnO4の量を0.5ｇに
して同様に行つたところ回収率は72％であつた。 For comparison, when the same procedure was carried out using 0.5 g of the oxidizing agent KMnO 4 , the recovery rate was 72%.
実施例 ２
酸化剤としてKNO35ｇを用いた以外は実施例
１と同様にしてイリジウムの回収を行つた。回収
率は86％であつた。Example 2 Iridium was recovered in the same manner as in Example 1 except that 5 g of KNO 3 was used as the oxidizing agent. The recovery rate was 86%.
実施例 ３
溶融塩の溶融剤としてKOH50ｇを用い、他は
実施例１と同様にして、イリジウムの回収を行つ
た。回収率は89％であつた。Example 3 Iridium was recovered in the same manner as in Example 1 except that 50 g of KOH was used as a melting agent for the molten salt. The recovery rate was 89%.
Claims (1)
覆層を、酸化剤を含むアルカリ金属水酸化物溶融
塩に溶解し、冷却後、水を加えて水溶液とし、塩
酸を加えて中和し、生成する弁金属水酸化物を分
離した後、更に塩酸を加えて該溶液を酸性にし、
次いで陽イオン交換樹脂を用いてアルカリ金属を
除去してイリジウム塩化物の塩酸溶液を得ること
を特徴とする、金属電極からイリジウムを回収す
る方法。 ２ 溶融塩による溶解を350〜600℃で行う請求の
範囲第１項の方法。 ３ 被覆層溶解後の溶融塩に、２〜10倍量の水を
加える請求の範囲第１項の方法。 ４ イリジウム塩化物の塩酸溶液を１〜650mm
Hg、110℃以下で減圧蒸留し、濃縮固化する請求
の範囲第１項の方法。[Claims] 1. A coating layer containing iridium oxide on a metal electrode substrate is dissolved in a molten alkali metal hydroxide salt containing an oxidizing agent, and after cooling, water is added to make an aqueous solution, and hydrochloric acid is added to form an aqueous solution. After neutralizing and separating the produced valve metal hydroxide, further hydrochloric acid is added to make the solution acidic,
A method for recovering iridium from a metal electrode, the method comprising: then removing an alkali metal using a cation exchange resin to obtain a hydrochloric acid solution of iridium chloride. 2. The method according to claim 1, wherein the dissolution with the molten salt is carried out at 350 to 600°C. 3. The method according to claim 1, in which 2 to 10 times the amount of water is added to the molten salt after dissolving the coating layer. 4 Add 1 to 650 mm of iridium chloride hydrochloric acid solution.
The method according to claim 1, wherein Hg is distilled under reduced pressure at 110°C or lower to concentrate and solidify.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57227595A JPS59123730A (en) | 1982-12-28 | 1982-12-28 | Method for recovering iridium from metallic electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57227595A JPS59123730A (en) | 1982-12-28 | 1982-12-28 | Method for recovering iridium from metallic electrode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59123730A JPS59123730A (en) | 1984-07-17 |
| JPS6254849B2 true JPS6254849B2 (en) | 1987-11-17 |
Family
ID=16863382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57227595A Granted JPS59123730A (en) | 1982-12-28 | 1982-12-28 | Method for recovering iridium from metallic electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59123730A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0627255U (en) * | 1992-09-16 | 1994-04-12 | 矢崎総業株式会社 | Grommet structure |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63195230A (en) * | 1987-02-10 | 1988-08-12 | Tanaka Kikinzoku Kogyo Kk | Refining method for platinum group metal |
| JP4607303B2 (en) * | 2000-09-13 | 2011-01-05 | 株式会社フルヤ金属 | Method for recovering platinum group metals from metal electrodes |
| JP4700815B2 (en) * | 2001-01-12 | 2011-06-15 | 株式会社フルヤ金属 | Method for recovering platinum group metals from metal electrodes |
| CN103946424A (en) | 2011-11-21 | 2014-07-23 | 培尔梅烈克电极股份有限公司 | Method for exfoliating coating layer of electrode for electrolysis |
| BR112017003437A2 (en) * | 2014-09-03 | 2017-11-28 | Heraeus Deutschland Gmbh & Co Kg | process for the preparation and / or purification of ruthenium chloride (iii) |
| EP2998275B1 (en) * | 2014-09-19 | 2016-11-02 | Heraeus Deutschland GmbH & Co. KG | Process for the preparation and/or purification of ruthenium(III) chloride |
| PL3085796T3 (en) * | 2015-04-21 | 2017-12-29 | Heraeus Deutschland GmbH & Co. KG | Extraction method for a metallic, iridium and/or iridium oxide comprising mixture of solid particles |
-
1982
- 1982-12-28 JP JP57227595A patent/JPS59123730A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0627255U (en) * | 1992-09-16 | 1994-04-12 | 矢崎総業株式会社 | Grommet structure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59123730A (en) | 1984-07-17 |
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