JPS5536944A - Method and device for washing rectangular substrate - Google Patents
Method and device for washing rectangular substrateInfo
- Publication number
- JPS5536944A JPS5536944A JP10884678A JP10884678A JPS5536944A JP S5536944 A JPS5536944 A JP S5536944A JP 10884678 A JP10884678 A JP 10884678A JP 10884678 A JP10884678 A JP 10884678A JP S5536944 A JPS5536944 A JP S5536944A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- compressed air
- washings
- washing
- chuck head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE: To prevent washings from sticking round to the back of an IC wafer substrate by forming an air current in the direction going away from the center at the back of the substrate.
CONSTITUTION: A member consisting of an inner ring 2 and an outer ring 3, provided with a cylindrical compressed air blowoff port on the top and also provided with a compressed air inlet port 4 is arranged on the outer perimeter of a chuck head 1 of a rectangular substrate 6 in coming near to the bottom of substrate. After fixing the rectangular substrate 6 to wash on the chuck head 1, the chuck head 1 is rotated and thus washing is carried out as discharging washings onto a running brush 8 through washings discharge nozzle 8. From introducing the compressed air 4 to the inlet port 4 in this case, a part of the compressed air blown off the port 5 forms an air current in the direction going away from the center along the back of the substrate 6. Drops of washings dispersed during washing will never stick round the back of the substrate 6.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10884678A JPS5536944A (en) | 1978-09-05 | 1978-09-05 | Method and device for washing rectangular substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10884678A JPS5536944A (en) | 1978-09-05 | 1978-09-05 | Method and device for washing rectangular substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5536944A true JPS5536944A (en) | 1980-03-14 |
Family
ID=14495058
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10884678A Pending JPS5536944A (en) | 1978-09-05 | 1978-09-05 | Method and device for washing rectangular substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5536944A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5759337A (en) * | 1980-09-29 | 1982-04-09 | Nec Kyushu Ltd | Scrubbing device for manufacturing semiconductor device |
JPS5985670U (en) * | 1982-12-01 | 1984-06-09 | 近藤 権士 | Cleaning device for substrate holding claws |
US4685975A (en) * | 1982-08-03 | 1987-08-11 | Texas Instruments Incorporated | Method for edge cleaning |
US4838289A (en) * | 1982-08-03 | 1989-06-13 | Texas Instruments Incorporated | Apparatus and method for edge cleaning |
KR100841501B1 (en) | 2005-12-13 | 2008-06-25 | 다이니폰 스크린 세이조우 가부시키가이샤 | Substrate processing method and substrate processing apparatus |
-
1978
- 1978-09-05 JP JP10884678A patent/JPS5536944A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5759337A (en) * | 1980-09-29 | 1982-04-09 | Nec Kyushu Ltd | Scrubbing device for manufacturing semiconductor device |
US4685975A (en) * | 1982-08-03 | 1987-08-11 | Texas Instruments Incorporated | Method for edge cleaning |
US4838289A (en) * | 1982-08-03 | 1989-06-13 | Texas Instruments Incorporated | Apparatus and method for edge cleaning |
JPS5985670U (en) * | 1982-12-01 | 1984-06-09 | 近藤 権士 | Cleaning device for substrate holding claws |
KR100841501B1 (en) | 2005-12-13 | 2008-06-25 | 다이니폰 스크린 세이조우 가부시키가이샤 | Substrate processing method and substrate processing apparatus |
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