JPH1022193A - Semiconductor device manufacturing drawing device and drawing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve uniformity of a line width on a substrate by measuring the quantity of light which is split with a semitransparent mirror with a exposure value measuring device so that an actual drawing exposure value is corrected and controlled with an active filter. SOLUTION: The quantity of light which is reflected by a semitransparent mirror 19 just before an objective lens 21 is measured with an exposure value measuring device 20, and, considering control delay time, a light flux shield factor is controlled with an active filter 42 which is provided at a lens 41. Thereby an actual drawing exposure value is controlled. In addition, a change in the exposure value which is caused by scanning a light flux with a catoptric system is measured with the exposure value measuring device 20, and the active filter 42 is controlled while drawing, to control the exposure value. Thereby uniformity of the drawing exposure value is improved and uniformity of a line width on a substrate is improved.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a drawing apparatus.

[0002]

2. Description of the Related Art A conventional optical drawing apparatus has a light (laser) generator, a transmission / reflection optical system, and a lens, and has a structure as shown in FIG. That is, the light 11 required for drawing is generated by the light generating device 10 in the figure, the light 11 passes through the transmission / reflection light optical systems 12 to 19, is condensed by the objective lens 21, and is guided to the drawing stage 23.

[0003]

By the way, in the above-mentioned optical drawing apparatus, the light output apparatus is adjusted immediately before drawing so that the exposure amount after the objective lens becomes a desired exposure amount, and the output of the light output apparatus is adjusted during drawing. Is controlled only to be constant, and the control of the drawing exposure amount after the objective lens is not performed. For this reason, the exposure dose becomes non-uniform, which causes non-uniform line width on the substrate.

[0004] In addition, processing subsequent to drawing may cause non-uniform line width in the substrate surface. In view of the above problems, the present invention eliminates the effects of non-uniformity of the exposure amount caused by the difference in the optical path and the non-uniformity of the line width on the substrate caused by the processing subsequent to the drawing, and realizes the uniform line width drawing. It is intended to provide a device.

[0005]

In order to solve the above problems, in an exposure apparatus according to the present invention, a light generating device, a stage on which a substrate is mounted, and a stage formed between the light generating device and the stage are provided. A first optical path, an active filter installed in the first optical path, and, in the first optical path, disposed between the active filter and the stage, facing the stage, and An objective lens for condensing the output light, and in the first optical path,
A half mirror disposed between the active filter and the objective lens, and facing the objective lens;
A second optical path divided by the half mirror and formed between the half mirror and the active filter; and an exposure measuring device disposed in the second optical path. The exposure light amount is corrected and controlled by the active filter while measuring the divided light amount by the light exposure amount measuring device.

According to the present invention, while controlling the drawing exposure amount during drawing in the optical path immediately before the objective lens by using the exposure amount measuring device (light amount monitor), the control based on the measured value is performed. Therefore, the actual drawing exposure amount is controlled. In other words, if the drawing exposure amount increases during drawing, the luminous flux blocking rate should be increased to reduce the exposure amount, and if the drawing exposure amount decreases, the luminous flux should be increased to increase the exposure amount. The active filter in the optical path is controlled so as to reduce the blocking ratio, and the actual drawing exposure amount is controlled. By performing this operation in consideration of a time delay, the uniformity of the line width on the substrate can be improved.

[0007] Based on the line width distribution data on the substrate in the drawing process and the exposure process, an exposure amount correspondence table (DOSE table) according to the drawing position is created. Correspondence table (DOSE Table)
In reference to the above, by controlling so that the light flux shielding rate by the active filter is reduced in the portion where the exposure amount is insufficient, and by increasing the shielding ratio in the portion where the exposure amount is large, the line width caused by the process is reduced. The uniformity is also controlled, and the uniformity of the line width on the substrate is improved.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A drawing apparatus according to a first embodiment of the present invention will be described below with reference to FIG. The optical drawing apparatus of this embodiment is the same as the conventional light generating apparatus 10 and the reflecting optical system 1.
5, 17, 19, transmission optical system 12, 14, 19, AOM
13, a lens 18, 21, 41, 43 and a zoom system 16. However, the amount of light reflected from the half mirror 19 immediately before the objective lens 21 is measured by an exposure amount measuring device (photodiode) 20, and the liquid crystal optical system 4 provided at the focal point of the lens 41 in consideration of the control delay time.
The actual drawing exposure amount is controlled by controlling the luminous flux shielding rate by the method 2. Incidentally, the convex lenses 31 and 33 and the active filter (liquid crystal optical system) shown in FIG.
The combination of 32 may be installed at any position of a to h in the figure, and it is important to arrange an active filter (liquid crystal optical system) 32 at the focal point of the convex lenses 31 and 33 to control the amount of transmitted light. Further, since the shielding rate must be able to be controlled in the vertical direction, an intermediate value of the shielding area of the liquid crystal optical system is set as a normal setting value.

As described above, in the drawing apparatus of the first embodiment, the change in the exposure amount due to the difference in the optical path caused by the scanning of the light beam by the reflection optical system (polygon mirror) 17 and the difference in the reflection surface (the difference in the reflectance). The change of the exposure amount caused by the difference is measured by the exposure amount measuring device (photodiode) 26 and the exposure amount is controlled by controlling the liquid crystal optical system 42 during the drawing, so that the drawing exposure amount is uniform. The performance is improved. Therefore, the uniformity of the line width on the drawn / exposed substrate is improved.

Next, a drawing apparatus according to a second embodiment of the present invention will be described with reference to FIG. The same parts as those of the embodiment shown in FIG. In this embodiment, drawing and exposure are performed using only the functions of the above-described embodiment,
A correspondence table between the positions on the processed substrate and the line width is created. At this time, non-uniform line width on the substrate may occur due to processing after drawing / exposure. Also, by changing the normal setting value of the liquid crystal optical system 42 and varying the exposure amount, drawing / exposure and processing are performed, and a correspondence table of the line width and the exposure amount is created, and finally a uniform line width on the substrate is realized. Table (DOSE) for exposure position (exposure ratio)
Table) 45 will be created.

As described above, in the second embodiment of the present invention, by controlling the shielding ratio of the liquid crystal optical system 42 based on the position on the substrate and the exposure amount correspondence table 45 to perform the drawing and exposure, The processing enables the line width uniformity to be improved without causing the line width unevenness on the substrate.

[0012]

According to the present invention, the uniformity of the line width on the substrate can be improved by controlling the exposure amount during writing using the active filter.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing a drawing apparatus according to a first embodiment of the present invention.

FIG. 2 is a schematic diagram showing a drawing apparatus according to a second embodiment of the present invention.

FIG. 3 is a diagram for explaining a combination of an active filter and a convex lens in an embodiment of the present invention.

FIG. 4 is a schematic diagram showing a conventional drawing apparatus.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Light generation apparatus 11 Optical path 12, 14 Transmission lens system, 13 Acoustic optical element AOM, 15 Steering mirror 16 Zoom system optical element, 17 Polygon 18 f- lens, 19 Half mirror 20 Exposure amount measuring apparatus 21 Objective lens 22 Substrate 23 Stage 41, 43 Convex lens 42 Active filter 44 OP amplifier 45 Exposure amount correspondence table

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁶ Identification code Agency reference number FI Technical indication H01L 21/30 541E

Claims (4)

[Claims] A light-generating device, a stage on which a substrate is mounted, and a first light-emitting device formed between the light-generating device and the stage.
And an active filter installed in the first optical path; and an optical filter disposed in the first optical path between the active filter and the stage, facing the stage, and outputting the An objective lens for condensing light; a half mirror disposed between the active filter and the objective lens in the first optical path and facing the objective lens; A second optical path formed between a half mirror and the active filter; and an exposure measuring device disposed in the second optical path; A drawing apparatus for manufacturing a semiconductor device, wherein a drawing exposure amount is corrected and controlled by the active filter while being measured by a measuring apparatus. 2. The drawing apparatus according to claim 1, wherein the active filter is a liquid crystal optical element. 3. The drawing apparatus for manufacturing a semiconductor device according to claim 1, wherein drawing is performed while measuring the amount of light reflected from the half mirror disposed immediately before the objective lens by the exposure amount measuring apparatus. A drawing method, wherein an exposure amount is corrected and controlled by the active filter. 4. Based on line width distribution data on a substrate,
4. The drawing method according to claim 3, further comprising a step of creating a table indicating a correspondence between the drawing position and the exposure amount.