JPH0351656B2 - - Google Patents
Info
- Publication number
- JPH0351656B2 JPH0351656B2 JP60158009A JP15800985A JPH0351656B2 JP H0351656 B2 JPH0351656 B2 JP H0351656B2 JP 60158009 A JP60158009 A JP 60158009A JP 15800985 A JP15800985 A JP 15800985A JP H0351656 B2 JPH0351656 B2 JP H0351656B2
- Authority
- JP
- Japan
- Prior art keywords
- gallium
- group
- membrane
- solution
- hydrophobic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 37
- 229910052733 gallium Inorganic materials 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 37
- 239000000243 solution Substances 0.000 claims description 12
- 239000012528 membrane Substances 0.000 claims description 11
- 230000002209 hydrophobic effect Effects 0.000 claims description 8
- -1 sodium or potassium Chemical class 0.000 claims description 7
- 238000011084 recovery Methods 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 239000011734 sodium Substances 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 229920001600 hydrophobic polymer Polymers 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 125000004957 naphthylene group Chemical group 0.000 claims description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- 239000000839 emulsion Substances 0.000 claims 1
- 229920005597 polymer membrane Polymers 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 239000013522 chelant Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 229910001570 bauxite Inorganic materials 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 3
- 238000010828 elution Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000003350 kerosene Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910001388 sodium aluminate Inorganic materials 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- 238000004131 Bayer process Methods 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- GXCSNALCLRPEAS-CFYXSCKTSA-N azane (Z)-hydroxyimino-oxido-phenylazanium Chemical compound N.O\N=[N+](/[O-])c1ccccc1 GXCSNALCLRPEAS-CFYXSCKTSA-N 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- SFZULDYEOVSIKM-UHFFFAOYSA-N chembl321317 Chemical compound C1=CC(C(=N)NO)=CC=C1C1=CC=C(C=2C=CC(=CC=2)C(=N)NO)O1 SFZULDYEOVSIKM-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical group OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000004880 oxines Chemical class 0.000 description 2
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229910000497 Amalgam Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 238000000807 solvent casting Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Description
〔産業上の利用分野〕
本発明はガリウムの選択的分離回収法に関する
ものである。
さらに詳しくはキレート形成能を有する特定の
化合物を含む膜を用いて溶液中のガリウムを選択
的に分離回収する方法に関するものである。
〔従来の技術〕
ガリウムは、近年、半導体分野の発展によりそ
の需要は著しく増大しつつある。ガリウムは鉄や
銅などと異なり単独の鉱石を持たない。ガリウム
はアルミニウム原鉱石のボーキサイト、石炭の煙
灰、硫化亜鉛鉱、ゲルマン鉱石などにわずかずつ
広く含まれているため、分離、回収には様々な工
夫がなされ、多くの手間と費用がかられている。
すなわち、単独なプロセスで、弊害が少なく、経
済的に、効率よくガリウムを分離、回収できる技
術の開発は期待され、商業的価値も大きい。さ
て、現在、工業的規模で実施されているガリウム
の製造には、ボーキサイトからバイヤー法によつ
てアルミナを製造する際のバイヤー液と称する多
量のアルミニウムを含むガリウム−アルミニウム
混合液を原料としている場合がほとんどである。
バイヤー法によるボーキサイトの処理は、まず原
鉱石を水酸化ナトリウム水溶液で加熱分解し、ア
ルミン酸ナトリウム溶液を調製する。このとき、
ガリウムは大部分がアルミン酸ナトリウム溶液中
に移る。次いで、アルミン酸ナトリウムを冷却
し、種子として水酸化アルミニウムを加え加水分
解反応を促進させる。アルミニウムの大部分は水
酸化アルミニウムとして析出するためこれを別
する。この際ガリウムの大部分は液中に残る。
液は蒸発濃縮されボーキサイト処理に再利用さ
れる。この液はバイヤー液と称され、実質的に
ガリウム製造の原料となつている。
バイヤー液を用いたガリウムの分離、回収に
は、種々の方法が実施あるいは提案されている。
現行の水銀アマルガムによる方法、炭酸ガスを吹
き込む方法に加えて、最近では、疏水性を高めた
オキシン誘導体からなるキレート抽出剤を用いた
溶媒抽出による方法（特開昭51−324111号公報、
同53−52289号公報、同54−99726号公報等）、イ
ミノジ酢酸基を機能基にもつキレート樹脂を用い
た吸着分離による方法（特開昭58−42737号公報
等）、機能基にアミドキシム、オキシンを有する
キレート樹脂を用いた吸着分離による方法（特開
昭58−49620号公報、同58−96831号公報等）など
が提案されている。
しかしながら、これら諸方法はそれぞれ種々の
欠点を有する。現行法においては、水銀の溶解損
失、水銀による汚染、操作の繋雑さ、低いガリウ
ム回収効率などが欠点として挙げられる。最近提
案されている方法でも、実使用には多くの問題を
含んでいる。疏水性オキシン誘導体による方法は
該試剤のガリウムに対する選択性が低く、回収効
率が悪いことや、該試剤の水溶性への溶出による
機能低下が目立つ点が問題である。また、イミノ
ジ酢酸系キレート樹脂による方法はガリウムに対
する選択性が低い点やガリウムを含む溶液と該キ
レート樹脂が接触する際の速度に細かい制限を加
えねばならないという欠点がある。さらに、アミ
ドキシム、オキシンを機能基に有するキレート樹
脂を用いる方法においても、アルカリ性溶液から
ガリウムを吸着するという利点はあるものの、ガ
リウムの溶離回収には高濃度の強鉱酸あるいは加
熱を必要とするため、通常慣行されている方法に
よつて電解を行い金属ガリウムを回収するには、
再びアルカリ性にもどさねばならずプロセスの複
雑さをまねく。また、該キレート樹脂の一般的な
耐酸性、耐熱性も考慮すると該方法も経済的に充
分満足できるとは言えない。
この様な諸事情により、半導体部門等の電子産
業分野の発展に伴い金属ガリウムの需要が著しく
拡大しているにもかかわらず、未だ工業的規模で
経済的にも充分満足できるガリウムの分離、回収
方法は確立されていない。そこで、本発明者らは
上記不都合を克服した新規なガリウムの分離、回
収方法を確立すべく鋭意検討を重ねた結果、キレ
ート形成能を有する特定の化合物を含む膜がガリ
ウムを選択的に一方の膜面において吸着、移動
し、他方の膜面において脱着することを見出し、
本発明に到達した。
〔問題点を解決する為の手段〕
すなわち、本発明は一般式
[Industrial Application Field] The present invention relates to a method for selectively separating and recovering gallium. More specifically, the present invention relates to a method for selectively separating and recovering gallium in a solution using a membrane containing a specific compound having chelate-forming ability. [Prior Art] Demand for gallium has been increasing significantly in recent years due to the development of the semiconductor field. Unlike iron and copper, gallium does not have a single ore. Gallium is widely contained in small amounts in bauxite, raw aluminum ore, coal smoke, zinc sulfide ore, Germanic ore, etc., so various methods have been used to separate and recover it, which requires a lot of effort and expense. .
In other words, the development of a technology that can economically and efficiently separate and recover gallium with few adverse effects through a single process is expected and has great commercial value. Now, the production of gallium that is currently carried out on an industrial scale uses a gallium-aluminum mixed solution containing a large amount of aluminum, called Bayer liquid, which is used when producing alumina from bauxite by the Bayer process, as a raw material. Most of them are.
To process bauxite using the Bayer process, first, raw ore is thermally decomposed with an aqueous sodium hydroxide solution to prepare a sodium aluminate solution. At this time,
Most of the gallium is transferred into the sodium aluminate solution. Next, the sodium aluminate is cooled and aluminum hydroxide is added as a seed to accelerate the hydrolysis reaction. Most of the aluminum precipitates as aluminum hydroxide, so this is separated. At this time, most of the gallium remains in the liquid.
The liquid is evaporated and concentrated and reused for bauxite treatment. This liquid is called Bayer's liquid and is essentially the raw material for gallium production. Various methods have been implemented or proposed for separating and recovering gallium using Bayer's liquid.
In addition to the current method using mercury amalgam and the method of blowing carbon dioxide gas, recently, a method of solvent extraction using a chelate extractant made of an oxine derivative with increased hydrophobicity (Japanese Patent Application Laid-Open No. 51-324111,
No. 53-52289, No. 54-99726, etc.), a method by adsorption separation using a chelate resin having an iminodiacetic acid group as a functional group (Japanese Patent Application Laid-open No. 58-42737, etc.), amidoxime as a functional group, A method of adsorption separation using a chelate resin containing oxine has been proposed (Japanese Unexamined Patent Publications No. 58-49620, No. 58-96831, etc.). However, each of these methods has various drawbacks. Disadvantages of current methods include mercury dissolution losses, mercury contamination, complicated operations, and low gallium recovery efficiency. Even recently proposed methods have many problems in actual use. The problem with the method using a hydrophobic oxine derivative is that the selectivity of the reagent to gallium is low, the recovery efficiency is poor, and the functional deterioration due to the elution of the reagent to water-solubility is noticeable. Further, the method using an iminodiacetic acid-based chelate resin has the drawbacks of low selectivity for gallium and the necessity of placing strict restrictions on the speed at which the chelate resin comes into contact with a solution containing gallium. Furthermore, methods using chelate resins having amidoxime or oxine as functional groups have the advantage of adsorbing gallium from alkaline solutions, but elution and recovery of gallium requires a high concentration of strong mineral acid or heating. To recover metallic gallium by electrolysis using a commonly used method,
It must be returned to alkalinity again, which complicates the process. Furthermore, considering the general acid resistance and heat resistance of the chelate resin, this method cannot be said to be fully economically satisfactory. Due to these circumstances, although the demand for metallic gallium has increased significantly with the development of the electronic industry such as the semiconductor sector, there is still no method for separating and recovering gallium that is economically satisfactory on an industrial scale. The method has not been established. Therefore, the present inventors conducted intensive studies to establish a new method for separating and recovering gallium that overcomes the above-mentioned disadvantages. As a result, a membrane containing a specific compound with chelate-forming ability selectively separates gallium from one side to the other. We discovered that it adsorbs and moves on one membrane surface, and desorbs on the other membrane surface,
We have arrived at the present invention. [Means for solving the problem] That is, the present invention solves the general formula
【式】（ただし、R1は炭素数３
ないし30の直鎖状、分岐状あるいは脂環状のアル
キル基あるいはアルケニル基を、R2はフエニレ
ン基、ナフチレン基、ヒドロフエニレン基あるい
はヒドロナフチレン基を、Ｘは水素原子、無機あ
るいは有機のアンモニウムイオンあるいはナトリ
ウムあるいはカリウムなどのアルカリ金属を、ｎ
は０、１、２をそれぞれ示す。）で表わされるＮ
−ニトロソヒドロキシアミノ基を有する疏水性化
合物をキヤリアとする膜を用いることを特徴とす
るガリウムを含む溶液からのガリウムの選択的分
離回収法を提供することにある。
本発明で用いられる前記一般式
[Formula] (where R 1 is a linear, branched or alicyclic alkyl group or alkenyl group having 3 to 30 carbon atoms, R 2 is a phenylene group, naphthylene group, hydrophenylene group or hydronaphthylene group, and X is a hydrogen atoms, inorganic or organic ammonium ions, or alkali metals such as sodium or potassium.
represent 0, 1, and 2, respectively. )
An object of the present invention is to provide a method for selectively separating and recovering gallium from a solution containing gallium, which is characterized by using a membrane using a hydrophobic compound having a nitrosohydroxyamino group as a carrier. The above general formula used in the present invention
従つて、このような単純な操作によつてガリウ
ムを含む溶液からガリウムを選択的に分離回収で
き、回収液をそのままあるいは例えばガルミン酸
ナトリウム溶液等を調製し、公知方法によつて電
解することにより金属ガリウムを得ることができ
る。
以上詳述した本発明によれば、現行法あるいは
公知のキレート剤あるいはキレート樹脂を用いて
ガリウムを分離回収する方法に比較して、ガリウ
ムの選択性が高い。また、本発明では膜を用いる
ため、公知のキレート剤あるいはキレート樹脂を
用いる方法ではガリウムの抽出と溶離とを別個の
プロセスとして取り扱わねばならないのに対し、
これを一つのプロセスの中で行えるという利点を
有するなど、効率的なガリウムの分離、回収とい
う点からもその価値は大きい。
以下、本発明を実施例によつてさらに詳しく説
明する。なお、本発明は以下の実施例に限られる
ものではない。
実施例
実施例 １〜５
次の一般式で表わされるＮ−ニトロソヒドロキ
シアミノ基を有する疎水性化合物のケロシン溶液
を多孔質のテフロン製平膜に0.03ml含浸し含浸膜
（表面積３cm2、膜厚100μｍ）を調製した。
Therefore, by such a simple operation, gallium can be selectively separated and recovered from a gallium-containing solution, and the recovered solution can be used as it is or by preparing, for example, a sodium galmate solution, and electrolyzing it by a known method. Metallic gallium can be obtained. According to the present invention described in detail above, the selectivity for gallium is higher than that of the current method or a method of separating and recovering gallium using a known chelating agent or chelate resin. Furthermore, since the present invention uses a membrane, extraction and elution of gallium must be treated as separate processes in methods using known chelating agents or chelate resins, whereas
It has the advantage of being able to perform this in one process, and is of great value from the standpoint of efficient separation and recovery of gallium. Hereinafter, the present invention will be explained in more detail with reference to Examples. Note that the present invention is not limited to the following examples. Examples Examples 1 to 5 A porous Teflon flat membrane was impregnated with 0.03 ml of a kerosene solution of a hydrophobic compound having an N-nitrosohydroxyamino group represented by the following general formula. 100 μm) was prepared.
【表】
膜を介し供給相（左側）にPH3.5に調整したガリ
ウム200ppmおよびアルミニウム40000ppm
（〔Al〕／〔Gα〕＝200）を含む水溶液50ml、透過
相（右側）にPH1.0に調整した水溶液をそれぞれ
仕込み、室温で両相を撹拌した。50時間後の透過
相（右側）のガリウムおよびアルミニウムの濃度
を第１表に示す。
実施例 ６
キレート化合物としてｎ−ドデシル基を疎水性
置換基に有するＮ−ニトロソフエニルヒドロキシ
ルアミンアンモニウム塩を用いた以外は実施例１
と同様に操作した。
実施例 ７
疎水性溶剤としてケロシン／１，１，２，２−
テトラクロロエタン７／３（vol比）を用いた以外
は実施例１と同様に操作した。
実施例 ８
疎水性溶剤としてケロシン／ジフエニルエーテ
ル７／３（vol比）を用いた以外は実施例１と同様
に操作した。
実施例 ９
膜として、ポリエチレンにｎ−オクタデシル基
を疎水性置換基に有するＮ−ニトロソフエニルヒ
ドロキシルアミンアンモニウム塩をブレンドし、
熱プレス成形によつて調製したブレンド膜を用い
た以外は実施例１と同様に操作した。
実施例 10
疎水性高分子としてポリアクリロニトリルを用
い溶媒キヤスト法で製膜した以外は実施例９と同
様に操作した。以上の結果を第２表に示す。[Table] 200ppm of gallium and 40,000ppm of aluminum adjusted to PH3.5 in the supply phase (left side) through the membrane
50 ml of an aqueous solution containing ([Al]/[Gα] = 200) and an aqueous solution adjusted to pH 1.0 were charged into the permeation phase (right side), and both phases were stirred at room temperature. The concentrations of gallium and aluminum in the permeation phase (right side) after 50 hours are shown in Table 1. Example 6 Example 1 except that N-nitrosophenylhydroxylamine ammonium salt having an n-dodecyl group as a hydrophobic substituent was used as the chelate compound.
operated in the same way. Example 7 Kerosene/1,1,2,2- as a hydrophobic solvent
The same procedure as in Example 1 was carried out except that tetrachloroethane 7/3 (vol ratio) was used. Example 8 The same procedure as in Example 1 was carried out except that kerosene/diphenyl ether 7/3 (vol ratio) was used as the hydrophobic solvent. Example 9 As a membrane, N-nitrosophenylhydroxylamine ammonium salt having an n-octadecyl group as a hydrophobic substituent is blended with polyethylene,
The procedure was the same as in Example 1 except that a blend film prepared by hot press molding was used. Example 10 The procedure of Example 9 was repeated except that polyacrylonitrile was used as the hydrophobic polymer and the film was formed by a solvent casting method. The above results are shown in Table 2.
Claims (1)
環状のアルキル基あるいはアルケニル基を、R2
はフエニレン基、ナフチレン基、ヒドロフエニレ
ン基あるいはヒドロナフチレン基を、Ｘは水素原
子、無機あるいは有機のアンモニウムイオンある
いはナトリウムあるいはカリウムのアルカリ金属
を、ｎは０、１、２をそれぞれ示す。）で表わさ
れるＮ−ニトロソヒドロキシアミノ基を有する疏
水性化合物を 疏水性を有する溶剤に溶解し、これを多孔質
高分子膜に含浸させた含浸膜 または 界面活性剤によつて安定された乳化膜 または 疏水性高分子とのブレンド膜 として用い、ガリウムを含む溶液からのガリウム
の分離、回収を同時に行なうことを特徴とする選
択的分離回収法。 ２ ガリウムを含む溶液が酸性の水溶液であるこ
とを特徴とする特許請求の範囲第１項記載のガリ
ウムの選択的分離回収法。[Claims] 1 General formula [Formula] (wherein R 1 is a linear, branched or alicyclic alkyl group or alkenyl group having 3 to 30 carbon atoms, R 2
represents a phenylene group, a naphthylene group, a hydrophenylene group, or a hydronaphthylene group, X represents a hydrogen atom, an inorganic or organic ammonium ion, or an alkali metal such as sodium or potassium, and n represents 0, 1, or 2, respectively. ) is dissolved in a hydrophobic solvent and impregnated into a porous polymer membrane, or an emulsion membrane stabilized by a surfactant. Or A selective separation and recovery method characterized in that it is used as a blend membrane with a hydrophobic polymer to simultaneously separate and recover gallium from a solution containing gallium. 2. The method for selectively separating and recovering gallium according to claim 1, wherein the gallium-containing solution is an acidic aqueous solution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15800985A JPS6221711A (en) | 1985-07-19 | 1985-07-19 | Selective separation and recovery of gallium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15800985A JPS6221711A (en) | 1985-07-19 | 1985-07-19 | Selective separation and recovery of gallium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6221711A JPS6221711A (en) | 1987-01-30 |
| JPH0351656B2 true JPH0351656B2 (en) | 1991-08-07 |
Family
ID=15662263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15800985A Granted JPS6221711A (en) | 1985-07-19 | 1985-07-19 | Selective separation and recovery of gallium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6221711A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02235297A (en) * | 1989-03-08 | 1990-09-18 | Mitsubishi Electric Corp | Semiconductor circuit device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59169932A (en) * | 1983-03-15 | 1984-09-26 | Sumitomo Chem Co Ltd | Collection of gallium |
| JPS61201621A (en) * | 1985-03-01 | 1986-09-06 | Ube Ind Ltd | Selective separation and recovering method for gallium |
-
1985
- 1985-07-19 JP JP15800985A patent/JPS6221711A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59169932A (en) * | 1983-03-15 | 1984-09-26 | Sumitomo Chem Co Ltd | Collection of gallium |
| JPS61201621A (en) * | 1985-03-01 | 1986-09-06 | Ube Ind Ltd | Selective separation and recovering method for gallium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6221711A (en) | 1987-01-30 |
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