JPH02116736U - - Google Patents
Info
- Publication number
- JPH02116736U JPH02116736U JP2174590U JP2174590U JPH02116736U JP H02116736 U JPH02116736 U JP H02116736U JP 2174590 U JP2174590 U JP 2174590U JP 2174590 U JP2174590 U JP 2174590U JP H02116736 U JPH02116736 U JP H02116736U
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- processing
- section
- wafer transfer
- transport
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004381 surface treatment Methods 0.000 claims description 6
- 235000012431 wafers Nutrition 0.000 claims 14
- 230000032258 transport Effects 0.000 claims 7
- 238000004140 cleaning Methods 0.000 claims 1
Description
第１図は、この考案の１実施例を示し、ウエハ
の表面処理装置の全体を表した斜視図、第２図及
び第３図はそれぞれ、この考案の別の実施例を示
す、第１図と同様の斜視図である。
１……搬入ウエハ移し替え部、１′……搬出ウ
エハ移し替え部、２……カセツト収納棚、３……
表面処理部、４……処理専用カセツト搬送部、５
……カセツト移送装置、１０……搬送専用カセツ
ト載置テーブル、１２……処理専用カセツト載置
テーブル、１０′……洗浄済み搬送専用カセツト
載置テーブル、１２′……処理専用カセツト載置
テーブル、Ｃ１……搬送専用カセツト、Ｃ２……
処理専用カセツト、Ｗ……ウエハ。
FIG. 1 shows one embodiment of this invention, and is a perspective view showing the entire wafer surface treatment apparatus, and FIGS. 2 and 3 each show another embodiment of this invention. It is a perspective view similar to. 1...Incoming wafer transfer section, 1'...Outgoing wafer transfer section, 2...Cassette storage shelf, 3...
Surface treatment section, 4... Processing-dedicated cassette conveyance section, 5
...Cassette transfer device, 10...Cassette mounting table for transport only, 12...Cassette mounting table for processing only, 10'...Cassette mounting table for cleaned transport only, 12'...Cassette mounting table for processing only, C 1 ...Cassette exclusively for transport, C 2 ...
Processing cassette, W...wafer.
Claims (1)
専用カセツトから処理専用カセツトへ複数枚のウ
エハの移し替えを行なう搬入ウエハ移し替え部、
及び表面処理後の複数枚のウエハを収容した処理
専用カセツトから洗浄処理された搬送専用カセツ
トへ複数枚のウエハの移し替えを行なう搬出ウエ
ハ移し替え部からなるウエハ移し替え部と、この
ウエハ移し替え部に一端部において連接し、処理
専用カセツトに収容された複数枚のウエハに対し
て所要の表面処理を施す表面処理部と、この表面
処理部に沿つて配設され、表面処理部の処理開始
位置近傍もしくは処理終了位置近傍と前記ウエハ
移し替え部近傍との間で処理専用カセツトの搬送
を行なう処理専用カセツト搬送部と、前記ウエハ
移し替え部と前記処理専用カセツト搬送部との間
、前記処理専用カセツト搬送部と前記表面処理部
との間、並びに前記表面処理部と前記ウエハ移し
替え部との間でそれぞれ処理専用カセツトの移送
を行なう共通の、もしくは各別のカセツト移送手
段とを備えてなるウエハの表面処理装置。 ２ 搬入ウエハ移し替え部は、搬送専用カセツト
載置テーブルと処理専用カセツト載置テーブルと
を具備し、搬出ウエハ移し替え部は、洗浄済み搬
送専用カセツト載置テーブルと前記とは別の処理
専用カセツト載置テーブルとを具備した実用新案
登録請求の範囲第１項記載のウエハの表面処理装
置。[Scope of Claim for Utility Model Registration] 1. An incoming wafer transfer unit that transfers a plurality of wafers from a transport cassette containing a plurality of wafers before surface treatment to a processing cassette;
and an unloading wafer transfer section that transfers a plurality of wafers from a processing cassette containing a plurality of surface-treated wafers to a cleaning-treated transport cassette; and the wafer transfer section. A surface treatment section is connected at one end of the section and performs the required surface treatment on a plurality of wafers housed in a processing-dedicated cassette. A processing-dedicated cassette transport section that transports a processing-dedicated cassette between the vicinity of the position or the processing end position and the vicinity of the wafer transfer section; Common or separate cassette transfer means are provided for transferring processing-dedicated cassettes between the dedicated cassette transport section and the surface processing section, and between the surface processing section and the wafer transfer section, respectively. Wafer surface treatment equipment. 2 The carry-in wafer transfer section is equipped with a transport-only cassette mounting table and a processing-only cassette mounting table, and the carry-out wafer transfer section is equipped with a cleaned transport-only cassette mounting table and a processing-only cassette different from the above. A wafer surface processing apparatus according to claim 1, comprising a mounting table.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2174590U JP2541887Y2 (en) | 1990-03-02 | 1990-03-02 | Wafer surface treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2174590U JP2541887Y2 (en) | 1990-03-02 | 1990-03-02 | Wafer surface treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02116736U true JPH02116736U (en) | 1990-09-19 |
| JP2541887Y2 JP2541887Y2 (en) | 1997-07-23 |
Family
ID=31239247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2174590U Expired - Lifetime JP2541887Y2 (en) | 1990-03-02 | 1990-03-02 | Wafer surface treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2541887Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06252126A (en) * | 1993-02-26 | 1994-09-09 | Sugai:Kk | Method and system cleaning substrate |
-
1990
- 1990-03-02 JP JP2174590U patent/JP2541887Y2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06252126A (en) * | 1993-02-26 | 1994-09-09 | Sugai:Kk | Method and system cleaning substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2541887Y2 (en) | 1997-07-23 |
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