JPH09227697A - Preparation of heat-resistant polyimide film through gel - Google Patents
Preparation of heat-resistant polyimide film through gelInfo
- Publication number
- JPH09227697A JPH09227697A JP5853596A JP5853596A JPH09227697A JP H09227697 A JPH09227697 A JP H09227697A JP 5853596 A JP5853596 A JP 5853596A JP 5853596 A JP5853596 A JP 5853596A JP H09227697 A JPH09227697 A JP H09227697A
- Authority
- JP
- Japan
- Prior art keywords
- polyamic acid
- film
- gel
- heat
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920001646 UPILEX Polymers 0.000 title claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 53
- 108010025899 gelatin film Proteins 0.000 claims abstract description 30
- 239000012298 atmosphere Substances 0.000 claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 claims abstract description 23
- 238000004132 cross linking Methods 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 19
- 239000002253 acid Substances 0.000 claims abstract description 14
- 239000011261 inert gas Substances 0.000 claims abstract description 11
- 229920005575 poly(amic acid) Polymers 0.000 claims description 111
- 238000000034 method Methods 0.000 claims description 25
- 229920000642 polymer Polymers 0.000 claims description 19
- 239000003960 organic solvent Substances 0.000 claims description 12
- 239000007787 solid Substances 0.000 claims description 9
- 239000004952 Polyamide Substances 0.000 claims description 2
- 238000007664 blowing Methods 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 238000000576 coating method Methods 0.000 abstract description 14
- 239000011248 coating agent Substances 0.000 abstract description 13
- 239000002904 solvent Substances 0.000 abstract description 9
- 238000006358 imidation reaction Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 82
- 239000010408 film Substances 0.000 description 65
- 229920001721 polyimide Polymers 0.000 description 44
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 27
- 239000004642 Polyimide Substances 0.000 description 22
- 150000001412 amines Chemical class 0.000 description 19
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 19
- 150000004984 aromatic diamines Chemical class 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 229910001873 dinitrogen Inorganic materials 0.000 description 15
- 239000000178 monomer Substances 0.000 description 15
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000004697 Polyetherimide Substances 0.000 description 11
- 229920001601 polyetherimide Polymers 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 10
- 238000001879 gelation Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000011259 mixed solution Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 6
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 5
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 238000007363 ring formation reaction Methods 0.000 description 5
- -1 tetracarboxylic acid dianhydride Chemical class 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000000805 composite resin Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000007602 hot air drying Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 229920000768 polyamine Polymers 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 238000009864 tensile test Methods 0.000 description 3
- 230000000930 thermomechanical effect Effects 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- JSYBAZQQYCNZJE-UHFFFAOYSA-N benzene-1,2,4-triamine Chemical compound NC1=CC=C(N)C(N)=C1 JSYBAZQQYCNZJE-UHFFFAOYSA-N 0.000 description 2
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004807 desolvation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- IGUXFXNMXMXLCK-UHFFFAOYSA-N (3-aminophenyl)-(3,4-diaminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C(N)=CC=2)=C1 IGUXFXNMXMXLCK-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- YENVMPPRTXICRT-UHFFFAOYSA-N 2-(2,6-dicarboxyphenyl)benzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C1=C(C(O)=O)C=CC=C1C(O)=O YENVMPPRTXICRT-UHFFFAOYSA-N 0.000 description 1
- DZLUPKIRNOCKJB-UHFFFAOYSA-N 2-methoxy-n,n-dimethylacetamide Chemical compound COCC(=O)N(C)C DZLUPKIRNOCKJB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ILYSAKHOYBPSPC-UHFFFAOYSA-N 2-phenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1 ILYSAKHOYBPSPC-UHFFFAOYSA-N 0.000 description 1
- HSTOKWSFWGCZMH-UHFFFAOYSA-N 3,3'-diaminobenzidine Chemical group C1=C(N)C(N)=CC=C1C1=CC=C(N)C(N)=C1 HSTOKWSFWGCZMH-UHFFFAOYSA-N 0.000 description 1
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- NDXGRHCEHPFUSU-UHFFFAOYSA-N 3-(3-aminophenyl)aniline Chemical group NC1=CC=CC(C=2C=C(N)C=CC=2)=C1 NDXGRHCEHPFUSU-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- ZMPZWXKBGSQATE-UHFFFAOYSA-N 3-(4-aminophenyl)sulfonylaniline Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=CC(N)=C1 ZMPZWXKBGSQATE-UHFFFAOYSA-N 0.000 description 1
- MUGUJRSYUSHCBS-UHFFFAOYSA-N 3-(4-propylphenoxy)aniline Chemical compound C1=CC(CCC)=CC=C1OC1=CC=CC(N)=C1 MUGUJRSYUSHCBS-UHFFFAOYSA-N 0.000 description 1
- MFTFTIALAXXIMU-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)C(C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MFTFTIALAXXIMU-UHFFFAOYSA-N 0.000 description 1
- NQZOFDAHZVLQJO-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(OC=3C=CC(OC=4C=C(N)C=CC=4)=CC=3)=CC=2)=C1 NQZOFDAHZVLQJO-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- FYYYKXFEKMGYLZ-UHFFFAOYSA-N 4-(1,3-dioxo-2-benzofuran-5-yl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C1=CC=CC2=C1C(=O)OC2=O FYYYKXFEKMGYLZ-UHFFFAOYSA-N 0.000 description 1
- RQBIGPMJQUKYAH-UHFFFAOYSA-N 4-(3,4-diaminophenoxy)benzene-1,2-diamine Chemical compound C1=C(N)C(N)=CC=C1OC1=CC=C(N)C(N)=C1 RQBIGPMJQUKYAH-UHFFFAOYSA-N 0.000 description 1
- BXIYIGBKSGVJOS-UHFFFAOYSA-N 4-(3,4-diaminophenyl)benzene-1,2-diamine;dihydrate;tetrahydrochloride Chemical compound O.O.Cl.Cl.Cl.Cl.C1=C(N)C(N)=CC=C1C1=CC=C(N)C(N)=C1 BXIYIGBKSGVJOS-UHFFFAOYSA-N 0.000 description 1
- KJDSORYAHBAGPP-UHFFFAOYSA-N 4-(3,4-diaminophenyl)benzene-1,2-diamine;hydron;tetrachloride Chemical compound Cl.Cl.Cl.Cl.C1=C(N)C(N)=CC=C1C1=CC=C(N)C(N)=C1 KJDSORYAHBAGPP-UHFFFAOYSA-N 0.000 description 1
- JKETWUADWJKEKN-UHFFFAOYSA-N 4-(3,4-diaminophenyl)sulfonylbenzene-1,2-diamine Chemical compound C1=C(N)C(N)=CC=C1S(=O)(=O)C1=CC=C(N)C(N)=C1 JKETWUADWJKEKN-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- HOSGAMZDLWSREP-UHFFFAOYSA-N 4-(3-aminophenyl)benzene-1,2-diamine Chemical group NC1=CC=CC(C=2C=C(N)C(N)=CC=2)=C1 HOSGAMZDLWSREP-UHFFFAOYSA-N 0.000 description 1
- KHYXYOGWAIYVBD-UHFFFAOYSA-N 4-(4-propylphenoxy)aniline Chemical compound C1=CC(CCC)=CC=C1OC1=CC=C(N)C=C1 KHYXYOGWAIYVBD-UHFFFAOYSA-N 0.000 description 1
- ILPWTQGYOZFLBN-UHFFFAOYSA-N 4-[(3,4-diaminophenyl)methyl]benzene-1,2-diamine Chemical compound C1=C(N)C(N)=CC=C1CC1=CC=C(N)C(N)=C1 ILPWTQGYOZFLBN-UHFFFAOYSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- LDFYRFKAYFZVNH-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 LDFYRFKAYFZVNH-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical group CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 229920004738 ULTEM® Polymers 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000001266 acyl halides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- OYTKINVCDFNREN-UHFFFAOYSA-N amifampridine Chemical compound NC1=CC=NC=C1N OYTKINVCDFNREN-UHFFFAOYSA-N 0.000 description 1
- 229960004012 amifampridine Drugs 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 1
- ANUAIBBBDSEVKN-UHFFFAOYSA-N benzene-1,2,4,5-tetramine Chemical compound NC1=CC(N)=C(N)C=C1N ANUAIBBBDSEVKN-UHFFFAOYSA-N 0.000 description 1
- UTTHLMXOSUFZCQ-UHFFFAOYSA-N benzene-1,3-dicarbohydrazide Chemical compound NNC(=O)C1=CC=CC(C(=O)NN)=C1 UTTHLMXOSUFZCQ-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- NLNRQJQXCQVDQJ-UHFFFAOYSA-N bis(3,4-diaminophenyl)methanone Chemical compound C1=C(N)C(N)=CC=C1C(=O)C1=CC=C(N)C(N)=C1 NLNRQJQXCQVDQJ-UHFFFAOYSA-N 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- KADGVXXDDWDKBX-UHFFFAOYSA-N naphthalene-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C21 KADGVXXDDWDKBX-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229940075930 picrate Drugs 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-M picrate anion Chemical compound [O-]C1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-M 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- WYVAMUWZEOHJOQ-UHFFFAOYSA-N propionic anhydride Chemical compound CCC(=O)OC(=O)CC WYVAMUWZEOHJOQ-UHFFFAOYSA-N 0.000 description 1
- MIROPXUFDXCYLG-UHFFFAOYSA-N pyridine-2,5-diamine Chemical compound NC1=CC=C(N)N=C1 MIROPXUFDXCYLG-UHFFFAOYSA-N 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Moulding By Coating Moulds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、耐熱性に優れ、エ
レクトロニクス、輸送機器、航空・宇宙分野等に広く使
用されるポリイミドフィルムを主とする耐熱性フィルム
の連続製造方法に関するものである。詳しくは、ポリイ
ミドの前駆体であるポリアミド酸の状態で三次元的な網
目構造、所謂ゲル状の構造を与えるポリアミド酸を経由
してフィルムを調製し、更に熱処理を主とする脱水・環
化反応によりフィルムのイミド化を完結させ、耐熱性に
優れ、且つ機械的特性に優れた新規なポリイミドフィル
ムを製造する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for continuously producing a heat-resistant film mainly having a polyimide film which is excellent in heat resistance and is widely used in the fields of electronics, transportation equipment, aerospace and the like. Specifically, a film is prepared via a polyamic acid that gives a three-dimensional network structure, a so-called gel-like structure, in the state of the polyamic acid that is a precursor of polyimide, and further dehydration / cyclization reaction mainly involving heat treatment. The present invention relates to a method for producing a novel polyimide film having excellent heat resistance and mechanical properties by completing imidization of the film.
【0002】[0002]
【従来の技術】ポリイミドは、その優れた耐熱性、耐摩
耗性、耐薬品性、電気絶縁性、機械的特性から、電気・
電子材料、接着剤、塗料、複合材料、繊維あるいはフィ
ルム材料等に広く使用されている。そのうち、ポリイミ
ドのフィルムは、その優れた特性から、電線、ケーブ
ル、ワイヤー等の被覆材、トランス、プリント配線基盤
等の絶縁材料として用途も多岐にわたっている。2. Description of the Related Art Polyimide has excellent heat resistance, abrasion resistance, chemical resistance, electrical insulation, and mechanical properties,
It is widely used in electronic materials, adhesives, paints, composite materials, fibers and film materials. Among them, the polyimide film has various applications due to its excellent properties as a covering material for electric wires, cables, wires, etc., and an insulating material for transformers, printed wiring boards, etc.
【0003】ポリイミドの調製法は、テトラカルボン酸
二無水物と芳香族ジアミンを有機溶媒中で重縮合させて
得られたポリアミド酸を前駆体とし、加熱脱水あるいは
脱水剤による化学的反応により脱水・環化を進め、ポリ
イミドとするのが一般的であり、この方法に関しては公
知であり、数多くの特許出願がなされている。The polyimide is prepared by using a polyamic acid obtained by polycondensing a tetracarboxylic dianhydride and an aromatic diamine in an organic solvent as a precursor, and dehydrating by heating or by a chemical reaction with a dehydrating agent. It is general to proceed with cyclization to obtain a polyimide, and this method is known and many patent applications have been filed.
【0004】ポリイミドの前駆体であるポリアミド酸の
製造方法は、ポリマー濃度が5〜20重量%となるよう
に有機溶媒中でテトラカルボン酸二無水物と芳香族ジア
ミンを0〜30℃の反応温度で重付加反応させる方法が
一般的である。この方法により有機溶媒に均一に溶解し
た高分子量のポリアミド酸溶液が得られる。このポリア
ミド酸溶液は少なくとも室温以上の温度雰囲気下で基材
などに塗布あるいは口金より吐出され、脱溶媒によりポ
リアミド酸のフィルム・繊維等の成形体となり、ポリイ
ミド成形体の前駆体として用いられる。更に、この成形
体を高温処理あるいは化学的処理により脱水・閉環反応
を進め、ポリイミド成形体を得るのが通常の方法であ
り、例えば、特開昭61−78834号公報、同61−
181828号公報、同61−250031号公報、同
63−25413号公報等に示される通りである。The method for producing a polyamic acid which is a precursor of polyimide is carried out by reacting a tetracarboxylic dianhydride and an aromatic diamine in an organic solvent at a reaction temperature of 0 to 30 ° C. so that the polymer concentration becomes 5 to 20% by weight. The method of polyaddition reaction is generally used. By this method, a high molecular weight polyamic acid solution uniformly dissolved in an organic solvent can be obtained. This polyamic acid solution is applied to a base material or the like under a temperature atmosphere of at least room temperature or discharged from a die, and becomes a molded body of a film or fiber of polyamic acid by desolvation, and is used as a precursor of a polyimide molded body. Further, it is a usual method to carry out dehydration / ring-closing reaction of this molded product by high temperature treatment or chemical treatment to obtain a polyimide molded product. For example, JP-A-61-178834 and JP-A-61-78834.
No. 181828, No. 61-250031, No. 63-25413, etc.
【0005】これらのポリイミドの中には、重縮合させ
るテトラカルボン酸二無水物と芳香族ジアミンの組合せ
種類によって、機械的特性の高いフィルム等の成形体を
得ることが可能であり、代表的なポリイミドとしてピロ
メリット酸二無水物と4,4′−ジアミノジフェニルエ
ーテルの組合せから得られるフィルムは、耐熱性も高く
引張り特性にも優れるタイプである。Among these polyimides, it is possible to obtain a molded product such as a film having high mechanical properties, depending on the combination type of tetracarboxylic dianhydride and aromatic diamine to be polycondensed. The film obtained from a combination of pyromellitic dianhydride and 4,4'-diaminodiphenyl ether as a polyimide is a type having high heat resistance and excellent tensile properties.
【0006】しかしながら、一般に耐熱性を高めようと
するとフィルムが脆性化する傾向があり、耐熱性と機械
的特性は相反する傾向にある。特に、ピロメリット酸二
無水物とパラフェニレンジアミンを組み合わせたポリイ
ミドは、物理化学的な耐熱性において、最高レベルの耐
熱性及び引張り弾性率を示すものであるが、脆性的なた
めフィルム性能に劣り、特に、機械的特性に全く劣るも
のである。このタイプのポリイミドにおいては共重合化
の技術によって、耐熱性を低下させることなくポリイミ
ドフィルムの機械的特性を改善させることが試みられて
いる。However, in general, when trying to increase the heat resistance, the film tends to become brittle, and the heat resistance and the mechanical properties tend to contradict each other. In particular, a polyimide obtained by combining pyromellitic dianhydride and para-phenylenediamine has the highest level of heat resistance and tensile elastic modulus in physicochemical heat resistance, but is poor in film performance due to brittleness. In particular, it is completely inferior in mechanical properties. In this type of polyimide, it has been attempted to improve the mechanical properties of the polyimide film by a copolymerization technique without lowering the heat resistance.
【0007】例えば、特開昭63−254131号公報
に示すように、ピロメリット酸二無水物とパラフェニレ
ンジアミンの組合せ系において、他の芳香族ジアミンと
して4,4′−ジアミノジフェニルエーテルを用いて共
重合させている例もあるが、フィルム形成能を改善させ
るために4,4′−ジアミノジフェニルエーテル成分の
添加量が多くなると、結果的にはフィルムの耐熱性を低
下させることになるように、耐熱性と機械的性質が共に
優れるフィルムを得ることは容易ではなかった。For example, as shown in JP-A-63-254131, in a combination system of pyromellitic dianhydride and paraphenylenediamine, 4,4'-diaminodiphenyl ether is used as another aromatic diamine. Although there are some examples of polymerization, when the amount of 4,4'-diaminodiphenyl ether component added to improve the film-forming ability is increased, the heat resistance of the film may be lowered, resulting in heat resistance. It was not easy to obtain a film having both excellent mechanical properties and mechanical properties.
【0008】近年、テトラカルボン酸二無水物と芳香族
ジアミンの反応系に、特定の配合割合の多価アミンを加
え重付加反応させることで、ポリアミド酸のゲルを経由
させてポリアミド酸の成形体、更にはこれを脱水・閉環
反応させてポリイミドの成形体を得る方法が特開平03
−109424号公報、同03−146524号公報に
提案されている。この方法では、適度な架橋点の存在に
より三次元網目構造を発達させ、最終的にはポリイミド
の優れた耐熱性、機械的性質及び耐薬品性を兼ね備えた
ポリマー系が調製されている。この方法は、ポリアミド
酸のゲルを経由する点でユニークであり、特に、ピロメ
リット酸二無水物とパラフェニレンジアミンを組み合わ
せたポリイミド系の改質に有効な方法のひとつである。In recent years, a polycarboxylic acid having a specific blending ratio is added to a reaction system of tetracarboxylic dianhydride and an aromatic diamine to cause a polyaddition reaction to form a polyamic acid molded article via a polyamic acid gel. Further, there is a method for obtaining a polyimide molded body by subjecting this to dehydration / ring-closing reaction.
-109424 and 03-146524. In this method, a three-dimensional network structure is developed by the presence of appropriate crosslinking points, and finally a polymer system having excellent heat resistance, mechanical properties and chemical resistance of polyimide is prepared. This method is unique in that it passes through a polyamic acid gel, and is one of the methods particularly effective for modifying a polyimide system in which pyromellitic dianhydride and paraphenylenediamine are combined.
【0009】しかしながら、このポリアミド酸のゲルを
経由させてポリアミド酸の成形体、さらにはポリイミド
の成形体を得る方法においては、ゲルの形成が完了した
後ではポリアミド酸溶液がほとんど流動しないため、フ
ィルムや繊維等の複雑形状の成形体を品質良く賦形でき
ないという不都合がある。However, in the method for obtaining a molded product of a polyamic acid and further a molded product of a polyimide via the gel of the polyamic acid, the polyamic acid solution hardly flows after the gel formation is completed, so that the film is not formed. There is an inconvenience that it is not possible to shape a molded product having a complicated shape such as a fiber or a fiber with good quality.
【0010】従って現在は、ゲル化前の粘性のあるアミ
ド酸のオリゴマーあるいはポリマー溶液の状態で基材上
に塗布あるいは口金より押し出し、賦形後にゲル化を完
了させ、引き続き熱風による乾燥を行い最終的にフィル
ム等の成形体とする成形プロセスが主に採用されてい
る。Therefore, at present, the solution of a viscous amic acid oligomer or polymer before gelation is applied onto a substrate or extruded from a die, gelation is completed after shaping, and drying with hot air is subsequently carried out to finally finish. Generally, a molding process for forming a molded body such as a film is mainly adopted.
【0011】しかしながら、この賦形後にゲル化を完了
させる方法においては室温付近の操作が主であり、ポリ
アミド酸のオリゴマーあるいはポリマー溶液から比較的
短い時間でポリマー溶液のゲル化が完了し以降の賦形が
困難となるため、ゲル化までのポリアミド酸溶液粘度の
逐次的な経時変化に対してムラなく品質の安定した成形
体を作製するのが非常に難しかった。また、この反応に
より得られたアミド酸のオリゴマーあるいはポリマー溶
液の貯蔵法、フィルターによるポリアミド酸溶液中の不
純物の除去方法において、既存の装置・技術を改良する
必要がある等の多くの問題があった。However, in the method of completing the gelation after the shaping, the operation at around room temperature is mainly used, and the gelling of the polymer solution from the polyamic acid oligomer or polymer solution is completed in a relatively short time and the subsequent treatment is performed. Since the shape becomes difficult, it was very difficult to produce a molded product having a uniform quality with respect to sequential changes in viscosity of the polyamic acid solution until gelation. In addition, there are many problems such as the need to improve the existing equipment and technology in the method of storing the oligomeric or polymer solution of amic acid obtained by this reaction and the method of removing impurities in the polyamic acid solution by the filter. It was
【0012】[0012]
【発明が解決しようとする課題】そこで本発明は、三次
元架橋反応によるゲル形成能を有するポリアミド酸溶液
の粘度を長時間安定にコントロールすることが可能で、
安定な状態で基材に適用することができるポリアミド酸
溶液を使用する、ゲルを経由した耐熱性ポリイミドフィ
ルムの製造方法を提供することを目的とする。Therefore, according to the present invention, it is possible to stably control the viscosity of a polyamic acid solution having a gel-forming ability by a three-dimensional crosslinking reaction for a long time,
An object of the present invention is to provide a method for producing a heat-resistant polyimide film via a gel, which uses a polyamic acid solution that can be applied to a substrate in a stable state.
【0013】[0013]
【課題を解決するための手段】本発明者らは、テトラカ
ルボン酸二無水物、芳香族ジアミン及び多価アミンを主
成分としたモノマー類を有機溶媒中で反応させて得られ
た反応溶液が、−10℃以下の低温において粘度の経時
変化が小さいことに着目して、高分子ゲル(分子鎖)を
形成する前に反応温度等の重合条件をコントロールする
ことによって、長時間安定して、且つ品質が良好なポリ
イミドフィルムを連続的に製造でき、耐熱性及び機械的
性質に優れたポリイミドフィルムを得る方法に至った。Means for Solving the Problems The present inventors have found that a reaction solution obtained by reacting monomers containing tetracarboxylic dianhydride, aromatic diamine and polyvalent amine as main components in an organic solvent is , Controlling the polymerization conditions such as the reaction temperature before forming the polymer gel (molecular chain) by paying attention to the fact that the change in viscosity with time at a low temperature of −10 ° C. or less is stable, Moreover, a method for obtaining a polyimide film having excellent heat resistance and mechanical properties, which allows continuous production of a good quality polyimide film, has been reached.
【0014】本発明は、前記した問題点を解決する下記
の通りの構成を採用するものである。The present invention adopts the following constitution for solving the above-mentioned problems.
【0015】本発明の耐熱性ポリイミドフィルムの製造
方法は、三次元架橋反応によるゲル形成能を有するポリ
アミド酸溶液を、不活性ガス雰囲気下、−10℃以下の
温度で基材上に適用し、次いで、適用されたポリアミド
酸溶液を加熱して、基材上で自己支持性のあるポリアミ
ド酸ゲルフィルムとし、引き続きポリアミド酸ゲルフィ
ルム中の有機溶媒を除去せしめ、さらに熱処理してイミ
ド化を行うことを特徴とする。In the method for producing a heat-resistant polyimide film of the present invention, a polyamic acid solution having a gel-forming ability by a three-dimensional crosslinking reaction is applied on a substrate at a temperature of -10 ° C or lower in an inert gas atmosphere, Then, the applied polyamic acid solution is heated to form a self-supporting polyamic acid gel film on the substrate, and subsequently the organic solvent in the polyamic acid gel film is removed, and further heat treatment is performed to perform imidization. Is characterized by.
【0016】本発明は、上記耐熱性ポリイミドの製造方
法において、三次元架橋反応による高分子ゲル形成能を
有するポリアミド酸溶液として、−10℃以下の温度で
不活性ガス雰囲気下に保存され且つ固形分濃度5〜30
重量%、見掛け粘度1〜5000ポアズに維持されてい
るものを使用することを特徴とする。According to the present invention, in the above method for producing a heat-resistant polyimide, a polyamic acid solution capable of forming a polymer gel by a three-dimensional cross-linking reaction is stored in an inert gas atmosphere at a temperature of -10 ° C or lower and solid. 5 to 30 minutes
It is characterized by using a resin whose weight% and apparent viscosity are maintained at 1 to 5000 poise.
【0017】本発明は、上記耐熱性ポリイミドの製造方
法において、適用されたポリアミド酸溶液を加熱して、
基材上で自己支持性のあるポリアミド酸ゲルフィルムと
する方法が、不活性ガス雰囲気下で行われることを特徴
とする請求項1記載の耐熱性ポリイミドフィルムの製造
方法。In the present invention, in the method for producing a heat resistant polyimide, the applied polyamic acid solution is heated to
The method for producing a heat-resistant polyimide film according to claim 1, wherein the method of forming a polyamic acid gel film having self-supporting properties on a substrate is performed in an inert gas atmosphere.
【0018】本発明は、上記耐熱性ポリイミドの製造方
法において、ポリアミド酸ゲルフィルム中の有機溶媒を
除去せしめる方法が、基材上のポリアミド酸ゲルフィル
ムに、200℃を超えない温度の熱風を吹きかけること
を特徴とする。According to the present invention, in the above method for producing a heat-resistant polyimide, the method of removing the organic solvent in the polyamic acid gel film is performed by blowing hot air at a temperature not exceeding 200 ° C. onto the polyamic acid gel film on the substrate. It is characterized by
【0019】本発明は、上記耐熱性ポリイミドの製造方
法において、イミド化を行う方法が、ポリアミド酸ゲル
フィルムを基材から引き剥し、ポリアミド酸ゲルフィル
ムの両縁の少なくとも一方を、駆動されているピン付き
ベルトと接触させることにより、ポリアミド酸フィルム
を連続して走行させながらイミド化を行うことを特徴と
する。According to the present invention, in the above method for producing a heat-resistant polyimide, the method for imidizing is to peel off the polyamic acid gel film from the substrate and drive at least one of both edges of the polyamic acid gel film. It is characterized in that the polyamic acid film is imidized while being continuously run by bringing it into contact with a pinned belt.
【0020】本発明は、上記耐熱性ポリイミドの製造方
法において、イミド化を行う熱処理温度が500℃を超
えない範囲であることを特徴とする。The present invention is characterized in that in the above method for producing a heat resistant polyimide, the heat treatment temperature for imidization is within a range not exceeding 500 ° C.
【0021】[0021]
【発明の実施の形態】三次元架橋反応による高分子ゲル
形成能を有するポリアミド酸溶液は、代表的には、テト
ラカルボン酸二無水物、芳香族ジアミン及び多価アミン
を主成分としたモノマー類から製造される。BEST MODE FOR CARRYING OUT THE INVENTION A polyamic acid solution capable of forming a polymer gel by a three-dimensional crosslinking reaction is typically a monomer containing tetracarboxylic dianhydride, aromatic diamine and polyvalent amine as main components. Manufactured from.
【0022】窒素ガスのような不活性雰囲気下で、−1
0℃以下の温度で、芳香族ジアミンと多価アミンを有機
溶媒に溶解させた溶液中で、攪拌させながらテトラカル
ボン酸二無水物を徐々に加えて高分子量化させることに
より、本発明に使用されるポリアミド酸溶液が製造され
る。テトラカルボン酸二無水物は、固形で加えても、溶
媒で溶解させた液状で加えてもよい。テトラカルボン酸
二無水物に、芳香族ジアミンと多価アミンを加える方法
でも構わない。Under an inert atmosphere such as nitrogen gas, -1
Used in the present invention by gradually adding tetracarboxylic acid dianhydride to a high molecular weight while stirring in a solution prepared by dissolving an aromatic diamine and a polyvalent amine in an organic solvent at a temperature of 0 ° C. or lower. A polyamic acid solution is prepared. The tetracarboxylic acid dianhydride may be added in a solid form or in a liquid form dissolved in a solvent. A method in which an aromatic diamine and a polyvalent amine are added to tetracarboxylic dianhydride may be used.
【0023】本発明で用いられるテトラカルボン酸二無
水物の代表例としては、ピロメリット酸二無水物、3,
3’,4,4’−ベンゾフェノンテトラカルボン酸二無
水物、3,3’,4,4’−ビフェニルテトラカルボン
酸二無水物、2,3,3’,4’−ビフェニルテトラカ
ルボン酸二無水物、2,2’,3,3’−ビフェニルテ
トラカルボン酸二無水物、2,2’,6,6’−ビフェ
ニルテトラカルボン酸二無水物、2,3,6,7−ナフ
タレンテトラカルボン酸二無水物、1,2,5,6−ナ
フタレンテトラカルボン酸二無水物、2,2−ビス
(3,4−ジカルボキシフェニル)プロパン二無水物、
ビス(3,4−ジカルボキシフェニル)スルホン二無水
物、ビス(3,4−ジカルボキシフェニル)エーテル二
無水物、3,4,9,10−ペリレンテトラカルボン酸
二無水物、ナフタレン−1,2,4,5−テトラカルボ
ン酸二無水物、ナフタレン−1,4,5,8−テトラカ
ルボン酸二無水物、ベンゼン−1,2,3,4−テトラ
カルボン酸二無水物などである。また、分子中にアミド
基、エステル基、エーテル基、スルホン基、メチレン
基、プロパン基、フェニレン基、イミダゾール基、チア
ゾール基等を任意に組合せた比較的分子量の大きいテト
ラカルボン酸二無水物やフッ素等のハロゲン基を構造中
に含むテトラカルボン酸二無水物等も使用できる。ま
た、テレフタル酸ジクロリド、イソフタル酸ジクロリ
ド、ピフェニルカルボン酸ジクロリド、芳香族トリカル
ボン酸無水物のアシルハライド誘導体を用いることもで
きる。これらは単独または二種以上の混合物で用いるこ
とができる。Typical examples of the tetracarboxylic dianhydride used in the present invention include pyromellitic dianhydride, 3,
3 ', 4,4'-benzophenone tetracarboxylic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic dianhydride, 2,3,3 ', 4'-biphenyltetracarboxylic dianhydride , 2,2 ', 3,3'-biphenyltetracarboxylic dianhydride, 2,2', 6,6'-biphenyltetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic acid Dianhydride, 1,2,5,6-naphthalenetetracarboxylic acid dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride,
Bis (3,4-dicarboxyphenyl) sulfone dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, naphthalene-1, 2,4,5-tetracarboxylic dianhydride, naphthalene-1,4,5,8-tetracarboxylic dianhydride, benzene-1,2,3,4-tetracarboxylic dianhydride and the like. Further, tetracarboxylic dianhydride or fluorine having a relatively large molecular weight in which amide group, ester group, ether group, sulfone group, methylene group, propane group, phenylene group, imidazole group, thiazole group and the like are arbitrarily combined in the molecule. A tetracarboxylic dianhydride containing a halogen group in its structure can also be used. Further, terephthalic acid dichloride, isophthalic acid dichloride, pphenylcarboxylic acid dichloride, and acyl halide derivative of aromatic tricarboxylic acid anhydride can also be used. These can be used alone or as a mixture of two or more kinds.
【0024】テトラカルボン酸二無水物と反応させる芳
香族ジアミンの代表例としては、メタフェニレンジアミ
ン、パラフェニレンジアミン、4,4’−ジアミノジフ
ェニルプロパン、4,4’−ジアミノジフェニルメタ
ン、3,3’−ジアミノジフェニルメタン、4,4’−
ジアミノジフェニルスルフィド、4,4’−ジアミノジ
フェニルスルホン、3,3’−ジアミノジフェニルスル
ホン、3,4’−ジアミノジフェニルスルホン、4,
4’−ジアミノジフェニルエーテル、3,3’−ジアミ
ノジフェニルエーテル、3,4’−ジアミノジフェニル
エーテル、4,4’−ジアミノベンゾフェノン、3,
3’−ジアミノベンゾフェノン、2,2’−ビス(4−
アミノフェニル)プロパン、ベンジジン、3,3’−ジ
アミノビフェニル、2,6−ジアミノピリジン、2,5
−ジアミノピリジン、3,4−ジアミノピリジン、ビス
[4−(4−アミノフェノキシ)フェニル]スルホン、
ビス[4−(3−アミノフェノキシ)フェニル]スルホ
ン、ビス[4−(4−アミノフェノキシ)フェニル]エ
ーテル、ビス[4−(3−アミノフェノキシ)フェニ
ル]エーテル、2,2’−ビス[4−(4−アミノフェ
ノキシ)フェニル]プロパン、2,2’−ビス[4−
(3−アミノフェノキシ)フェニル]プロパン、4,
4’−ビス(4−アミノフェノキシ)ビフェニル、1,
4−ビス(4−アミノフェノキシ)ベンゼン、1,3−
ビス(4−アミノフェノキシ)ベンゼン、2,2’−ビ
ス[4−(3−アミノフェノキシ)フェニル]ヘキサフ
ロロプロパン、1,5−ジアミノナフタレン、2,6−
ジアミノナフタレン及びこれらの誘導体等が挙げられ
る。また、イソフタル酸ジヒドラジド等のジヒドラジド
化合物も使用できる。これらは、単独または二種以上の
混合物で用いることができる。Typical examples of aromatic diamines to be reacted with tetracarboxylic dianhydride include metaphenylenediamine, paraphenylenediamine, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenylmethane, 3,3 '. -Diaminodiphenylmethane, 4,4'-
Diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfone, 4,
4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminobenzophenone, 3,
3'-diaminobenzophenone, 2,2'-bis (4-
Aminophenyl) propane, benzidine, 3,3'-diaminobiphenyl, 2,6-diaminopyridine, 2,5
-Diaminopyridine, 3,4-diaminopyridine, bis [4- (4-aminophenoxy) phenyl] sulfone,
Bis [4- (3-aminophenoxy) phenyl] sulfone, bis [4- (4-aminophenoxy) phenyl] ether, bis [4- (3-aminophenoxy) phenyl] ether, 2,2′-bis [4 -(4-aminophenoxy) phenyl] propane, 2,2'-bis [4-
(3-Aminophenoxy) phenyl] propane, 4,
4'-bis (4-aminophenoxy) biphenyl, 1,
4-bis (4-aminophenoxy) benzene, 1,3-
Bis (4-aminophenoxy) benzene, 2,2′-bis [4- (3-aminophenoxy) phenyl] hexafluoropropane, 1,5-diaminonaphthalene, 2,6-
Examples thereof include diaminonaphthalene and derivatives thereof. Further, dihydrazide compounds such as isophthalic acid dihydrazide can also be used. These can be used alone or as a mixture of two or more.
【0025】本発明で用いられる多価アミンとは、ひと
つの分子構造中に三個以上のアミノ基及び/またはアン
モニウム塩基を有する化合物を示す。The polyvalent amine used in the present invention refers to a compound having three or more amino groups and / or ammonium groups in one molecular structure.
【0026】多価アミンの代表例としては、3,3’,
4,4’−テトラアミノジフェニルエーテル、3,
3’,4,4’−テトラアミノジフェニルメタン、3,
3’,4,4’−テトラアミノベンゾフェノン、3,
3’,4,4’−テトラアミノジフェニルスルホン、
3,3’,4,4’−テトラアミノビフェニル、1,
2,4,5−テトラアミノベンゼン、3,3’,4−ト
リアミノジフェニルエーテル、3,3’,4−トリアミ
ノジフェニルメタン、3,3’,4−トリアミノベンゾ
フェノン、3,3’,4−トリアミノジフェニルスルホ
ン、3,3’,4−トリアミノビフェニル、1,2,4
−トリアミノベンゼン及びこれらの化合物の官能基を第
四アンモニウム塩の形に変えた化合物類、例えば、3,
3’,4,4’−テトラアミノビフェニル・四塩酸塩等
が挙げられる。第四アンモニウム塩としては塩酸塩の他
に、酢酸塩、p−トルエンスルホン酸塩、ピクリン酸塩
等の形で用いることもできる。これらの化合物の中に
は、多価アミンの官能基の全てが第四アンモニウム塩の
形でないものも含まれる。また、上記物質の中には水和
物として存在しているものもあり、これらの多価アミン
類は単独または二種以上の混合物で用いることができ
る。脂肪族類の多価アミンを使用することも可能であ
る。Typical examples of polyamines include 3,3 ',
4,4'-tetraaminodiphenyl ether, 3,
3 ', 4,4'-tetraaminodiphenylmethane, 3,
3 ', 4,4'-tetraaminobenzophenone, 3,
3 ', 4,4'-tetraaminodiphenyl sulfone,
3,3 ', 4,4'-tetraaminobiphenyl, 1,
2,4,5-Tetraaminobenzene, 3,3 ', 4-triaminodiphenyl ether, 3,3', 4-triaminodiphenylmethane, 3,3 ', 4-triaminobenzophenone, 3,3', 4- Triaminodiphenyl sulfone, 3,3 ′, 4-triaminobiphenyl, 1,2,4
-Triaminobenzene and compounds in which the functional groups of these compounds are converted into the form of quaternary ammonium salts, for example 3,
3 ', 4,4'-tetraaminobiphenyl tetrahydrochloride and the like can be mentioned. The quaternary ammonium salt may be used in the form of acetate, p-toluenesulfonate, picrate, etc., in addition to the hydrochloride. Some of these compounds also include those in which all of the polyamine functional groups are not in the quaternary ammonium salt form. Further, some of the above substances exist as hydrates, and these polyvalent amines can be used alone or as a mixture of two or more kinds. It is also possible to use aliphatic polyamines.
【0027】本発明においては、ポリアミド酸分子鎖の
架橋点間分子量と架橋度を調節しゲル化させるため、テ
トラカルボン酸二無水物/芳香族ジアミン/多価アミン
のモル比を、100/50〜100/1〜25の範囲内
に止め、且つテトラカルボン酸二無水物とアミン類(芳
香族ジアミンと多価アミン)の反応基の当量比(酸価/
アミン価の比)を0.95〜1.05の範囲内(±5%
以内)に合わせることが、未反応の末端基が少なく安定
したポリアミド酸のゲルを得る上で好ましい。In the present invention, the molar ratio of tetracarboxylic dianhydride / aromatic diamine / polyvalent amine is set to 100/50 in order to control the molecular weight between crosslinking points of the polyamic acid molecular chain and the degree of crosslinking to cause gelation. To 100/1 to 25, and the equivalent ratio of the reaction groups of tetracarboxylic dianhydride and amines (aromatic diamine and polyvalent amine) (acid value /
Amine ratio) within the range of 0.95 to 1.05 (± 5%
It is preferable to adjust the ratio to the above) in order to obtain a stable polyamic acid gel with few unreacted terminal groups.
【0028】この範囲を外れた組成でモノマーを配合し
反応させた場合、ポリアミド酸の三次元架橋反応が不完
全で、結果的に得られるポリアミド酸がゲルを形成しな
かったり、またポリアミド酸のゲルが得られても不均質
あるいは不安定なものとなり、最終的に目的とするフィ
ルムの性質、例えばフィルムの引張り強さや引張り弾性
率等の物理的性質が異なったものとなり好ましくない。When the monomers are mixed and reacted in a composition outside this range, the three-dimensional cross-linking reaction of the polyamic acid is incomplete, the resulting polyamic acid does not form a gel, and the polyamic acid does not form a gel. Even if a gel is obtained, it becomes inhomogeneous or unstable, and finally the desired properties of the film, for example, physical properties such as tensile strength and tensile elastic modulus of the film are different, which is not preferable.
【0029】反応させるテトラカルボン酸二無水物/多
価アミンのモル比は、100/(1〜25)であること
が好ましく、特に好ましくは、100/(2〜15)の
範囲であるが、用いるモノマーの種類により、その好適
な組成範囲が若干ずれる場合もある。The molar ratio of tetracarboxylic dianhydride / polyvalent amine to be reacted is preferably 100 / (1 to 25), particularly preferably 100 / (2 to 15), Depending on the type of monomer used, the suitable composition range may be slightly shifted.
【0030】多価アミンは、ポリアミド酸のゲルの架橋
点として働き、その配合量によりポリアミド酸のゲル中
に存在する網目濃度(架橋密度)を変化させる。多価ア
ミンの配合モル数が、テトラカルボン酸二無水物100
モルに対し1モルより小さいと溶液中でのポリアミド酸
成分の架橋点が少なくなり、三次元網目構造が不完全に
なり、自己支持性のある高分子ゲル(膨潤体)となりに
くい。多価アミンの配合モル数が25モルより大きい
と、三次元網目構造の架橋点の増加と架橋点間分子量の
低下を招き、ポリアミド酸のゲルの体積膨潤度を低下さ
せ、脆性的な高分子ゲルとなり、最終的に脱溶媒によっ
て得られたフィルムの性能を低下させる。従って、多価
アミンの配合モル数は、テトラカルボン酸二無水物10
0モルに対し1〜25モルの範囲内がよい。The polyvalent amine functions as a cross-linking point of the polyamic acid gel, and changes the network concentration (crosslinking density) existing in the polyamic acid gel depending on the blending amount. The number of moles of the polyvalent amine compounded is 100% of tetracarboxylic dianhydride.
If it is less than 1 mol per mol, the number of cross-linking points of the polyamic acid component in the solution will be small, the three-dimensional network structure will be incomplete, and a self-supporting polymer gel (swollen body) will be difficult to form. If the blending mole number of the polyvalent amine is more than 25 moles, the crosslinking points of the three-dimensional network structure are increased and the molecular weight between the crosslinking points is decreased, and the volume swelling degree of the polyamic acid gel is reduced, resulting in a brittle polymer. It becomes a gel and finally reduces the performance of the film obtained by desolvation. Therefore, the number of moles of the polyvalent amine compounded is 10% of tetracarboxylic dianhydride.
It is preferably in the range of 1 to 25 mol with respect to 0 mol.
【0031】テトラカルボン酸二無水物、芳香族ジアミ
ン及び多価アミンを主成分としたポリアミド酸の重合に
おいて用いられる有機溶媒は、重合反応に対して不活性
であると同時に、使用するモノマー類及び反応により生
成されたオリゴマーを含む高分子量物を溶解または高分
子量物を膨潤させる能力のあるものが使用され、代表的
なものとして、N,N−ジメチルホルムアミド、N,N
−ジメチルアセトアミド、N,N−ジエチルホルムアミ
ド、N,N−ジエチルアセトアミド、ジメチルスルホキ
シド、N−メチル−2−ピロリドン、N,N−ジメチル
メトキシアセトアミド、ヘキサメチルホスホアミド、ピ
リジン、ジメチルスルホン、テトラメチレンスルホン、
クレゾール、フェノール、キシレノール等のフェノール
類や、ベンゼン、トルエン、キシレン、ベンゾニトリ
ル、ジオキサン、シクロヘキサン等が挙げられる。これ
らの溶媒は、単独または二種以上混合して使用される。The organic solvent used in the polymerization of the polyamic acid containing tetracarboxylic dianhydride, aromatic diamine and polyvalent amine as the main components is inert to the polymerization reaction and, at the same time, the monomers and The one having the ability to dissolve the high molecular weight substance containing the oligomer produced by the reaction or swell the high molecular weight substance is used, and representative ones are N, N-dimethylformamide, N, N
-Dimethylacetamide, N, N-diethylformamide, N, N-diethylacetamide, dimethyl sulfoxide, N-methyl-2-pyrrolidone, N, N-dimethylmethoxyacetamide, hexamethylphosphoamide, pyridine, dimethyl sulfone, tetramethylene sulfone ,
Phenols such as cresol, phenol, and xylenol, and benzene, toluene, xylene, benzonitrile, dioxane, cyclohexane, and the like can be given. These solvents are used alone or in combination of two or more.
【0032】ポリアミド酸重合時の全モノマー濃度とし
ては通常、溶媒全体の5〜30重量%、好ましくは10
〜20重量%である。The total monomer concentration during polyamic acid polymerization is usually 5 to 30% by weight, preferably 10% by weight of the total solvent.
-20% by weight.
【0033】モノマー濃度が5重量%未満の場合は、重
合度が低く最終的なフィルムの機械的強度を低下させる
傾向があり好ましくない。また、モノマー濃度が30重
量%を超える場合は、重合度の増加に伴う溶液粘度の上
昇によりフィルムの成形加工性を損ね、品質の良い均一
なフィルムが得られにくい。When the monomer concentration is less than 5% by weight, the degree of polymerization is low and the mechanical strength of the final film tends to be lowered, which is not preferable. When the monomer concentration exceeds 30% by weight, the film forming processability is impaired due to an increase in solution viscosity with an increase in the degree of polymerization, and it is difficult to obtain a uniform film of good quality.
【0034】テトラカルボン酸二無水物、芳香族ジアミ
ン及び多価アミンを主成分としたポリアミド酸の重合
は、有機溶媒中、好ましくは−30〜30℃の温度条件
下、特に好ましくは−20〜20℃の温度範囲で反応さ
せる。反応時間は反応温度によって変化するが、10時
間以内、好ましくは5時間以内である。前記反応温度を
採用する理由は、反応温度が−30℃より低い場合は、
取扱性や反応方法の難しさに加え、温度が低過ぎるため
反応自身が充分に進まない場合があり、好ましくないか
らである。また反応温度が30℃を越える場合は、モノ
マーの分解が早くなるため高分子量化しにくくなる問題
や、あるいはゲル化に至るまでの反応が早すぎて、不均
質な膨潤体を与えるなどの問題があり好ましくない。Polymerization of a polyamic acid containing tetracarboxylic dianhydride, aromatic diamine and polyvalent amine as main components is carried out in an organic solvent, preferably under a temperature condition of -30 to 30 ° C, particularly preferably -20 to 20 ° C. The reaction is carried out in the temperature range of 20 ° C. The reaction time varies depending on the reaction temperature, but is 10 hours or less, preferably 5 hours or less. The reason for adopting the reaction temperature is that when the reaction temperature is lower than -30 ° C,
In addition to the difficulty in handling and the reaction method, the reaction itself may not proceed sufficiently because the temperature is too low, which is not preferable. When the reaction temperature is higher than 30 ° C., the decomposition of the monomer is accelerated, which makes it difficult to form a high molecular weight compound, or the reaction until gelation is too fast, resulting in a non-uniform swollen body. There is not preferable.
【0035】これらのテトラカルボン酸二無水物、芳香
族ジアミン及び多価アミン成分は、それぞれ単独または
二種以上の混合物で用いられるため、得られるポリアミ
ド酸は共重合体のものを含む。また、特定の成分からな
るポリアミド酸と、このポリアミド酸の構成成分の少な
くとも一種類が異なるポリアミド酸を混合した、ポリア
ミド酸の混合物も含まれる。These tetracarboxylic dianhydrides, aromatic diamines and polyvalent amine components are used alone or as a mixture of two or more kinds, and thus the polyamic acid obtained includes those of copolymers. Further, a polyamic acid mixture in which a polyamic acid composed of a specific component and a polyamic acid in which at least one of the constituent components of the polyamic acid is different are mixed is also included.
【0036】テトラカルボン酸二無水物、芳香族ジアミ
ン及び多価アミンを主とする反応溶液には、これ以外の
多種成分を混合させることができる。ポリアミド酸に混
合させる第三成分としては、例えば、低分子有機化合
物、無機物質、金属化合物、高分子化合物等が挙げられ
る。Various other components can be mixed with the reaction solution mainly containing tetracarboxylic dianhydride, aromatic diamine and polyvalent amine. Examples of the third component to be mixed with the polyamic acid include low molecular weight organic compounds, inorganic substances, metal compounds, polymer compounds and the like.
【0037】また、本発明のポリアミド酸溶液から得ら
れた成形体の中には溶媒以外の他の物質、例えば、各種
金属化合物、低分子有機化合物、高分子化合物、無機充
填剤、着色剤、強化繊維等を含ませることができる。In the molded product obtained from the polyamic acid solution of the present invention, substances other than the solvent, such as various metal compounds, low molecular weight organic compounds, polymer compounds, inorganic fillers, colorants, Reinforcing fibers and the like can be included.
【0038】また、テレフタル酸ジクロリド、イソフタ
ル酸ジクロリド、ビフェニルカルボン酸ジクロリド、芳
香族トリカルボン酸無水物のアシルハライド誘導体を用
いた反応系においては、同様に上記の反応条件に準ず
る。Further, in the reaction system using terephthalic acid dichloride, isophthalic acid dichloride, biphenylcarboxylic acid dichloride, and an acyl halide derivative of an aromatic tricarboxylic acid anhydride, the above reaction conditions are similarly applied.
【0039】得られた反応溶液は、溶液の見掛け粘度1
〜5000ポアズの均一な溶液であり、溶液のゲル化を
防ぐために、直ちに冷却し−10℃以下の溶液温度で低
温保存することが望ましい。この温度条件の下に反応溶
液を保存することにより、反応性(ゲル化)を抑え、反
応溶液の固形分濃度5〜30重量%、見掛け粘度1〜5
000ポアズに長期間維持することが可能となる。反応
溶液の保存には、上記温度条件に加えて、不活性ガス雰
囲気とすることが、加水分解等によるモノマーの分解を
防ぐために望ましい。さらに保存時に反応溶液が不均一
となることを防ぐために、撹拌を加えてもよい。The resulting reaction solution had an apparent viscosity of 1
It is a uniform solution of ~ 5000 poise, and it is desirable to cool it immediately and store it at a low temperature of -10 ° C or lower in order to prevent gelation of the solution. By storing the reaction solution under this temperature condition, the reactivity (gelation) is suppressed, the solid content concentration of the reaction solution is 5 to 30% by weight, and the apparent viscosity is 1 to 5
It can be maintained at 000 poise for a long time. For the storage of the reaction solution, in addition to the above temperature conditions, an inert gas atmosphere is desirable in order to prevent decomposition of the monomer due to hydrolysis or the like. Further, stirring may be added in order to prevent the reaction solution from becoming non-uniform during storage.
【0040】反応溶液中には、未反応モノマー、不純
物、攪拌時のエアー等を含むため、反応溶液をフィルム
に加工する前に濾過・脱泡することが必要である。反応
溶液の濾過・脱泡は、通常のポリマー溶液の濾過・脱泡
と同様な方法で、例えば、フィルターやメッシュなどを
用いて行うことができ、その際、ゲル化を抑制するため
に−10℃以下の雰囲気で行うことが望ましい。Since the reaction solution contains unreacted monomers, impurities, air during stirring, etc., it is necessary to filter and defoam the reaction solution before processing it into a film. The reaction solution may be filtered / defoamed in the same manner as the filtration / defoaming of a usual polymer solution, for example, by using a filter or a mesh. At this time, in order to suppress gelation, -10 It is desirable to carry out in an atmosphere of ℃ or less.
【0041】この反応溶液中には、イミド化反応を早め
るための添加剤、例えば三級アミンや酸無水物を、ポリ
アミド酸のアミド基1モルに対して0.5モル以下の添
加量で加えることができる。三級アミンとしてはトリエ
チルアミン、ピリジン、イソキノリン等が挙げられる。
酸無水物には無水酢酸、無水プロピオン酸、無水安息香
酸等が挙げられる。To this reaction solution, an additive for accelerating the imidization reaction, such as a tertiary amine or an acid anhydride, is added in an amount of 0.5 mol or less per 1 mol of the amide group of the polyamic acid. be able to. Examples of the tertiary amine include triethylamine, pyridine, isoquinoline and the like.
Acid anhydrides include acetic anhydride, propionic anhydride, benzoic anhydride and the like.
【0042】このようにして得られた反応溶液を、−1
0℃以下で、窒素ガス等の不活性ガス雰囲気下で、一定
の厚みで基材上にドクターブレード方式等の流延法ある
いは口金よりの押し出し法等の塗布法の適用により、連
続的にフィルムに成形する。反応溶液の基材への適用を
−10℃以下で行うことにより、粘度の変化をコントー
ルすることができ、安定な反応溶液の適用が行える。ま
た、反応溶液の基材への適用を窒素ガス等の不活性雰囲
気下で行うことにより、反応溶液中のモノマーの加水分
解を防ぐことができる。The reaction solution thus obtained was -1
A film is continuously formed by applying a casting method such as a doctor blade method or a coating method such as an extrusion method from a die onto a substrate at a constant thickness in an atmosphere of an inert gas such as nitrogen gas at 0 ° C or less. To mold. By applying the reaction solution to the base material at −10 ° C. or lower, the change in viscosity can be controlled, and a stable reaction solution can be applied. Further, by applying the reaction solution to the base material in an inert atmosphere such as nitrogen gas, hydrolysis of the monomer in the reaction solution can be prevented.
【0043】連続的に基材上にコーティングされた反応
溶液の三次元架橋反応を行わせる雰囲気は、水分の混入
を防いでモノマーの加水分解を防ぐためには、窒素ガス
等の不活性ガス雰囲気下とすることが望ましい。この不
活性ガス雰囲気下で、10〜80℃まで昇温させ反応溶
液の三次元架橋反応を進め、フィルム状の自己支持性の
ある、見掛け粘度が1000〜100000ポアズの高
分子ゲルとする。次いで、乾燥炉内で50〜200℃の
温度の熱風を吹きかけ、高分子ゲル中の有機溶媒を除去
させ固形状のポリアミド酸フィルムとする。乾燥温度が
200℃を超える場合は、ポリアミド酸成分の脱水・閉
環反応によるイミド化が進み易く、収縮に伴う形状変化
を起こし、カール、皺等フィルム外観を損ねる現象が発
生しやすく好ましくない。また、50℃未満では乾燥に
長時間を要し、生産性が低下し好ましくない。The atmosphere in which the three-dimensional cross-linking reaction of the reaction solution coated on the substrate is continuously performed is carried out under an atmosphere of an inert gas such as nitrogen gas in order to prevent mixing of water and hydrolysis of the monomer. Is desirable. Under this inert gas atmosphere, the temperature is raised to 10 to 80 ° C. to promote the three-dimensional crosslinking reaction of the reaction solution to obtain a polymer gel having a film-like self-supporting property and an apparent viscosity of 1,000 to 100,000 poises. Then, hot air having a temperature of 50 to 200 ° C. is blown in the drying furnace to remove the organic solvent in the polymer gel to obtain a solid polyamic acid film. When the drying temperature is higher than 200 ° C., imidization due to dehydration / ring-closing reaction of the polyamic acid component is likely to proceed, a shape change due to shrinkage is caused, and a phenomenon such as curling or wrinkling which impairs the film appearance is unfavorably caused. On the other hand, if the temperature is lower than 50 ° C., it takes a long time to dry and the productivity is lowered, which is not preferable.
【0044】200℃を超えない温度で乾燥させられた
ポリアミド酸フィルムは、揮発性成分がフィルム全体の
50重量%以下にまで減少している。続いてこの乾燥し
たポリアミド酸フィルムを基材より引き剥し、ポリアミ
ド酸ゲルフィルムの両縁の少なくとも一方を、駆動され
ているピン付きベルトと接触させてポリアミド酸フィル
ムを連続して走行させながら、連続的に50〜200℃
で乾燥し更に150〜500℃の温度で熱処理させるこ
とによりイミド化を行い、ポリイミドフィルムとする。
望ましくは、該イミド化処理を、ポリアミド酸ゲルフィ
ルムの両縁において、二連のピン付きベルトでフィルム
の幅方向の寸法安定性をはかるように固定して行うこと
により、品質の一定したポリイミドフィルムを得ること
ができる。The polyamic acid film dried at a temperature not exceeding 200 ° C. has a volatile component reduced to 50% by weight or less based on the whole film. Subsequently, the dried polyamic acid film was peeled off from the base material, and at least one of both edges of the polyamic acid gel film was brought into contact with a belt with a pin being driven to continuously run the polyamic acid film, and continuously. 50-200 ℃
And then heat-treated at a temperature of 150 to 500 ° C. for imidization to obtain a polyimide film.
Desirably, the imidization treatment is performed on both edges of the polyamic acid gel film by fixing them with a belt having two pins so as to obtain dimensional stability in the width direction of the film. Can be obtained.
【0045】前記イミド化工程の乾燥及び熱処理におい
て、ポリアミド酸フィルムをピン付きベルトと接触させ
て走行させることにより、ポリイミドフィルムを連続し
て製造することが可能となる。In the drying and heat treatment in the imidization step, the polyamide acid film is brought into contact with the belt with pins to run the polyimide film, whereby the polyimide film can be continuously produced.
【0046】前記イミド化工程における熱処理時の昇温
速度は、ポリマーの種類、熱処理温度・時間、生産性等
の要因によって変えることができるが、通常は0.2℃
/秒以上、500℃/秒未満である。前記50〜200
℃の乾燥時間は1〜60分が好ましい。前記150℃〜
500℃の熱処理時間は1〜120分が好ましく、さら
に好ましくは2〜60分である。フィルムの製造速度
は、0.1〜20m/分が好ましく、さらに好ましくは
0.2〜10m/分である。The rate of temperature rise during the heat treatment in the imidization step can be changed depending on factors such as the type of polymer, heat treatment temperature / time and productivity, but is usually 0.2 ° C.
/ Sec or more and less than 500 ° C / sec. 50 to 200
The drying time at ° C is preferably 1 to 60 minutes. 150 ℃ ~
The heat treatment time at 500 ° C. is preferably 1 to 120 minutes, more preferably 2 to 60 minutes. The film production rate is preferably 0.1 to 20 m / min, more preferably 0.2 to 10 m / min.
【0047】以上の処理工程により、ポリアミド酸のゲ
ルを経由して得られたポリイミドフィルムは、多官能性
モノマーによる架橋点を有し、三次元網目構造が発達し
た分子構造となっているので、ポリアミド酸のゲルを経
由しないものに比べて、耐熱レベルが高く機械的性質に
優れたものとなる。また、網目構造をコントロールする
ことによりフィルム内の分子鎖凝集状態を制御すること
も可能である。Since the polyimide film obtained through the polyamic acid gel through the above treatment steps has a cross-linking point due to a polyfunctional monomer and has a three-dimensional network structure, it has a molecular structure. The heat resistance is high and the mechanical properties are superior to those of polyamic acid that does not pass through a gel. It is also possible to control the state of molecular chain aggregation in the film by controlling the network structure.
【0048】本発明の耐熱性ポリイミドフィルム中に
は、所望される望ましい特性を付与する目的で他の樹脂
を含んでいてもよい。他の樹脂の混合は、ポリイミドフ
ィルムの製造段階の任意の時期に添加してもよい。The heat-resistant polyimide film of the present invention may contain other resins for the purpose of imparting desired and desired properties. The mixture of other resins may be added at any time during the production stage of the polyimide film.
【0049】本発明の製造方法で得られた耐熱性ポリイ
ミドフィルムは、高い耐熱性且つ機械的特性が要求され
る半導体素子、変換素子等のエレクトロニクス用の素
材、分離膜、絶縁フィルム、感光体等の材料として有用
である。The heat-resistant polyimide film obtained by the production method of the present invention is a material for electronics such as semiconductor elements and conversion elements, which is required to have high heat resistance and mechanical properties, separation film, insulating film, photoconductor, etc. It is useful as a material.
【0050】[0050]
〔実施例1〕500ccの重合容器に、9.080g
(0.084モル)の精製したパラフェニレンジアミン
(略称:PPD)と3.168g(0.008モル)の
3,3’,4,4’−テトラアミノビフェニル・四塩酸
塩・二水和物(略称:TABT)を採取し、50gの蒸
留されたN−メチル−2−ピロリドン(略称:NMP)
を加え、撹拌し溶解させて溶液とした。[Example 1] 9.080 g in a 500 cc polymerization container
(0.084 mol) of purified paraphenylenediamine (abbreviation: PPD) and 3.168 g (0.008 mol) of 3,3 ', 4,4'-tetraaminobiphenyl tetrahydrochloride dihydrate (Abbreviation: TABT) was collected and 50 g of distilled N-methyl-2-pyrrolidone (abbreviation: NMP)
Was added, stirred and dissolved to obtain a solution.
【0051】窒素ガス雰囲気の下、外部水槽の温度を5
℃にコントロールし、上記溶液の温度が上らないように
注意しながら、上記溶液を撹拌し続けた状態で、21.
83g(0.100モル)の精製した無水のピロメリッ
ト酸二無水物(略称:PMDA)を固形のまま徐々に添
加した。全て加え終った後も撹拌を続け均一なポリアミ
ド酸溶液を調製した。Under a nitrogen gas atmosphere, the temperature of the external water tank is set to 5
21. While controlling the temperature to 0 ° C. and being careful to keep the temperature of the solution from rising, 21.
83 g (0.100 mol) of purified anhydrous pyromellitic dianhydride (abbreviation: PMDA) was gradually added as a solid. After all the additions were completed, stirring was continued to prepare a uniform polyamic acid solution.
【0052】ポリアミド酸溶液の濃度は12重量%、回
転粘度計によって測定した−20℃での溶液粘度は30
0ポイズであった。5時間後の−20℃での溶液粘度は
350ポイズで粘度変化は小さかった。The concentration of the polyamic acid solution was 12% by weight, and the solution viscosity at -20 ° C measured by a rotational viscometer was 30.
It was 0 poise. The solution viscosity at −20 ° C. after 5 hours was 350 poise and the change in viscosity was small.
【0053】−20℃に冷却されたポリアミド酸溶液
を、次に窒素ガス雰囲気下−20℃に冷却された塗工装
置(コーター)に連続的に供給し、コーター部より表面
研磨されたステンレスベルト上に連続的に一定厚みでポ
リアミド酸溶液をコーティングした。コーティングの幅
は200mm、厚さを250μmにコントールした。The polyamic acid solution cooled to -20 ° C. was then continuously supplied to a coating apparatus (coater) cooled to -20 ° C. under a nitrogen gas atmosphere, and a stainless belt whose surface was polished from the coater section. The polyamic acid solution was continuously coated on the top to a constant thickness. The width of the coating was 200 mm and the thickness was 250 μm.
【0054】連続的にコーティングされたポリアミド酸
の塗工膜を、100℃まで昇温するまでにポリアミド酸
溶液はゲル化を起こし、寒天状のポリアミド酸ゲルフィ
ルムとなった。このゲルフィルムの一部を取り出し、2
5℃で測定した見掛け粘度は5800ポアズであった。The polyamic acid solution gelled until the temperature of the continuously coated polyamic acid coating film was raised to 100 ° C., resulting in an agar-like polyamic acid gel film. Take out a part of this gel film, 2
The apparent viscosity measured at 5 ° C was 5800 poise.
【0055】このゲルフィルムを、連続的に熱風乾燥炉
に通し、100℃で30分間乾燥させ、脱溶媒を行っ
た。脱溶媒されたゲルフィルムは固化し強いフィルムと
なったので、これを基材より剥離させポリアミド酸の連
続フィルムとした。引き続き、ピン方式のテンターでフ
ィルムの両縁を固定し、熱処理炉を通して、150℃で
20分間、200℃で15分間、300℃で10分間、
400℃で10分間、450℃で20分間の条件で段階
的に熱処理することにより、イミド化を完了し、ポリイ
ミドフィルムを得た。得られたポリイミドフィルムの厚
みは25μmであった。This gel film was continuously passed through a hot air drying oven and dried at 100 ° C. for 30 minutes to remove the solvent. The desolvated gel film solidified and became a strong film, so it was peeled from the substrate to give a polyamic acid continuous film. Then, fix both edges of the film with a pin type tenter, and pass through a heat treatment furnace for 20 minutes at 150 ° C., 15 minutes at 200 ° C., 10 minutes at 300 ° C.
Imidization was completed by heat-treating stepwise at 400 ° C. for 10 minutes and 450 ° C. for 20 minutes to obtain a polyimide film. The thickness of the obtained polyimide film was 25 μm.
【0056】得られたポリイミドフィルムの赤外吸収ス
ペクトルには、1780cm-1、1720cm-1にイミ
ド基の特性吸収体が観測され、ポリイミドフィルムであ
ることが確認された。フィルムの熱機械分析を引張り加
重を加えながら行ったところ、450℃にガラス転移温
度に対応すると思われる熱膨張曲線の変曲点が観測さ
れ、100℃での線膨張係数は1.0×10-6cm/c
m/℃であった。[0056] The infrared absorption spectrum of the resulting polyimide film, 1780 cm -1, characteristic absorption of an imide group in 1720 cm -1 was observed, it is a polyimide film was confirmed. When the film was subjected to thermomechanical analysis while applying a tensile load, an inflection point of the thermal expansion curve which was considered to correspond to the glass transition temperature was observed at 450 ° C., and the linear expansion coefficient at 100 ° C. was 1.0 × 10. -6 cm / c
It was m / ° C.
【0057】ポリイミドフィルムを短冊状に5mm幅で
カットし、フィルムの引張り試験をチャック間距離30
mm、引張り速度5mm/分の条件で23℃にて行っ
た。フィルムの引張り強さは22kgf/mm2 、引張
り弾性率は1080kgf/mm2 、引張り伸度は5.
0%であった。A polyimide film was cut into a strip shape with a width of 5 mm, and a tensile test of the film was performed.
mm and a pulling rate of 5 mm / min at 23 ° C. The tensile strength of the film is 22 kgf / mm 2 , the tensile elastic modulus is 1080 kgf / mm 2 , and the tensile elongation is 5.
It was 0%.
【0058】〔比較例1〕前記実施例1と同じモノマ
ー、溶媒を用い、同一の反応条件にてポリアミド酸の重
合を行い、前記実施例1と同様に均一なポリアミド酸溶
液を調製した。[Comparative Example 1] Polyamic acid was polymerized under the same reaction conditions using the same monomers and solvents as those in Example 1 to prepare a uniform polyamic acid solution as in Example 1.
【0059】このポリアミド酸溶液を0℃に冷却された
容器に密閉系で連続的に移し、窒素ガス雰囲気下で攪拌
しながら保存した。This polyamic acid solution was continuously transferred to a container cooled at 0 ° C. in a closed system and stored under a nitrogen gas atmosphere with stirring.
【0060】このポリアミド酸溶液の濃度は12重量%
であり、容器に保存前の粘度は、回転粘度計で0℃にお
いて230ポイズであった。容器に保存3時間後、この
ポリアミド酸溶液はゲル化を起こし寒天状になった。ポ
リアミド酸のゲルは流動しないため、通常のコーティン
グ装置で基材面にポリアミド酸のゲルを塗工できず、フ
ィルムは作製できなかった。The concentration of this polyamic acid solution is 12% by weight.
The viscosity before storage in the container was 230 poise at 0 ° C. with a rotary viscometer. After storage for 3 hours in a container, this polyamic acid solution gelled and became agar-like. Since the polyamic acid gel did not flow, the polyamic acid gel could not be applied to the surface of the base material by an ordinary coating device, and a film could not be produced.
【0061】〔実施例2〕1000ccの四つ口セパラ
ブルフラスコ中に、6.89(0.06モル)の精製し
たPPDを採取し、300gの蒸留されたN,N−ジメ
チルホルムアミド(略称:DMF)に攪拌し溶解させ
た。Example 2 6.89 (0.06 mol) of purified PPD was collected in a 1000 cc four-necked separable flask, and 300 g of distilled N, N-dimethylformamide (abbreviation: DMF) was stirred and dissolved.
【0062】窒素ガス雰囲気の下、外部水槽の温度を0
℃にコントロールし、上記溶液を攪拌しながら17.6
4g(0.06モル)の精製した3,3’,4,4’−
ビフェニルテトラカルボン酸二無水物(略称:BPD
A)を固形のまま、溶液の温度が上がらないように注意
しながら徐々に添加し、均一なポリアミド酸溶液を調製
した。このフラスコ中のポリアミド酸溶液に400gの
蒸留されたN,N−ジメチルアセトアミド(略称:DM
Ac)を加え、更に10.81g(0.10モル)の精
製したPPDと7.92g(0.02モル)のTABT
を加え、攪拌し溶解させた。Under a nitrogen gas atmosphere, the temperature of the external water tank is set to 0.
The temperature is controlled to be 17.6 ° C., and the solution is stirred for 17.6.
4 g (0.06 mol) of purified 3,3 ', 4,4'-
Biphenyl tetracarboxylic dianhydride (abbreviation: BPD
A) was solidly added gradually while being careful not to raise the temperature of the solution, to prepare a uniform polyamic acid solution. 400 g of distilled N, N-dimethylacetamide (abbreviation: DM) was added to the polyamic acid solution in the flask.
Ac) was added, followed by 10.81 g (0.10 mol) of purified PPD and 7.92 g (0.02 mol) of TABT.
Was added and stirred to dissolve.
【0063】同様に、窒素ガス雰囲気の下、外部水槽の
温度を0℃にコントロールし、攪拌しながら30.56
g(0.14モル)の精製したPMDAを固形のまま、
溶液の温度が上がらないように注意しながら徐々に添加
した。全て加え終わった後、固形分が溶解するまで攪拌
を続けた。Similarly, under a nitrogen gas atmosphere, the temperature of the external water tank is controlled to 0 ° C., and 30.56 while stirring.
g (0.14 mol) of purified PMDA as a solid,
The solution was gradually added, taking care not to raise the temperature of the solution. After all the additions were completed, stirring was continued until the solid content was dissolved.
【0064】この反応させたポリアミド酸溶液を濾過・
脱泡の後、−25℃まで30分かけて冷却し、窒素ガス
雰囲気下で攪拌しながら保存した。The reacted polyamic acid solution was filtered and
After defoaming, the mixture was cooled to -25 ° C over 30 minutes and stored under a nitrogen gas atmosphere with stirring.
【0065】ポリアミド酸溶液の濃度は12重量%、回
転粘度計によって測定した−25℃での溶液粘度は80
0ポイズであった。5時間後の−25℃での溶液粘度は
880ポイズで粘度変化は小さかった。The concentration of the polyamic acid solution was 12% by weight, and the solution viscosity at −25 ° C. measured by a rotational viscometer was 80.
It was 0 poise. The solution viscosity at -25 ° C after 5 hours was 880 poise, and the change in viscosity was small.
【0066】−25℃に冷却されたポリアミド酸溶液
を、次に窒素ガス雰囲気下−25℃に冷却された塗工装
置(コーター)に連続的に供給し、コーター部より表面
研磨されたステンレスベルト上に連続的に一定厚みでポ
リアミド酸溶液をコーティングした。コーティングの幅
は500mm、厚さを500μmにコントロールした。The polyamic acid solution cooled to -25 ° C. was then continuously supplied to a coating device (coater) cooled to -25 ° C. in a nitrogen gas atmosphere, and the stainless belt whose surface was polished from the coater part. The polyamic acid solution was continuously coated on the top to a constant thickness. The width of the coating was controlled to 500 mm and the thickness was controlled to 500 μm.
【0067】連続的にコーティングされたポリアミド酸
の塗工膜を50℃に昇温するまでに、ポリアミド酸溶液
はゲル化を起こし、寒天状のポリアミド酸ゲルフィルム
となった。ゲルフィルムの一部を取り出し、25℃で測
定した見掛け粘度は7500ポアズであった。このゲル
フィルムを連続的に熱風乾燥炉に通し、150℃で20
分間乾燥させ、脱溶媒を行った。脱溶媒されたゲルフィ
ルムは固化し強いフィルムとなり、これを基材より剥離
させポリアミド酸の連続フィルムとした。引き続き、ピ
ン方式のテンターでフィルムの両縁を固定し、熱処理炉
を通し、200℃で20分間、300℃で10分間、4
00℃で10分間、430℃で10分間の条件で段階的
に熱処理することによりイミド化を完了し、ポリイミド
フィルムを得た。得られたポリイミドフィルムの厚みは
45μmであった。By the time the temperature of the continuously coated polyamic acid coating film was raised to 50 ° C., the polyamic acid solution gelled and became an agar-like polyamic acid gel film. A part of the gel film was taken out and the apparent viscosity measured at 25 ° C. was 7500 poise. This gel film is continuously passed through a hot-air drying oven and heated at 150 ° C for 20
After drying for a minute, the solvent was removed. The desolvated gel film solidified and became a strong film, which was peeled from the substrate to obtain a polyamic acid continuous film. Then, fix both edges of the film with a pin type tenter, pass through a heat treatment furnace, 200 ° C. for 20 minutes, 300 ° C. for 10 minutes, 4
Imidization was completed by stepwise heat treatment under conditions of 00 ° C. for 10 minutes and 430 ° C. for 10 minutes to obtain a polyimide film. The thickness of the obtained polyimide film was 45 μm.
【0068】得られたポリイミドフィルムの赤外吸収ス
ペクトルには、1780cm-1、1720cm-1にイミ
ド基の特性吸収体が観測され、ポリイミドフィルムであ
ることが確認された。フィルムの熱機械分析を引張り加
重を加えながら行ったところ、440℃にガラス転移温
度に対応すると思われる熱膨曲線の変曲点が観測され、
100℃での線膨張係数は1.5×10-6cm/cm/
℃であった。[0068] The infrared absorption spectrum of the resulting polyimide film, 1780 cm -1, characteristic absorption of an imide group in 1720 cm -1 was observed, it is a polyimide film was confirmed. When the thermomechanical analysis of the film was performed while applying a tensile load, an inflection point of the thermal expansion curve which is considered to correspond to the glass transition temperature was observed at 440 ° C.,
The linear expansion coefficient at 100 ° C is 1.5 × 10 -6 cm / cm /
° C.
【0069】ポリイミドフィルムを短冊状に5mm幅で
カットし、フィルムの引張り試験をチャック間距離30
mm、引張り速度5mm/分の条件で23℃にて行っ
た。フィルムの引張り強さは28kgf/mm2 、引張
り弾性率は980kgf/mm2 、引張り伸度は15%
であった。A polyimide film was cut into a strip shape with a width of 5 mm, and a tensile test of the film was performed.
mm and a pulling rate of 5 mm / min at 23 ° C. The tensile strength of the film is 28 kgf / mm 2 , the tensile elastic modulus is 980 kgf / mm 2 , and the tensile elongation is 15%.
Met.
【0070】〔実施例3〕1000ccの四つ口セパラ
ブルフラスコ中に、10.81g(0.10モル)の精
製したPPDと12.01g(0.06モル)の精製し
た4,4’−ジアミノジフェニルエーテル(略称:4,
4’−DPE)及び7.92g(0.02モル)のTA
BTを採取し、546gの蒸留されたNMPを加え、撹
拌し溶解させた。Example 3 10.81 g (0.10 mol) of purified PPD and 12.01 g (0.06 mol) of purified 4,4'-in a 1000 cc four-necked separable flask. Diaminodiphenyl ether (abbreviation: 4,
4'-DPE) and 7.92 g (0.02 mol) TA
BT was collected and 546 g of distilled NMP was added and stirred to dissolve.
【0071】窒素ガス雰囲気の下、外部水槽の温度を0
℃にコントロールし、上記溶液を攪拌しながら43.6
6g(0.20モル)の精製したPMDAを固形のま
ま、溶液の温度が上がらないように注意しながら徐々に
添加した。全て加え終った後も撹拌を続け均一なポリア
ミド酸溶液を調製した。このポリアミド酸溶液を−20
℃に冷却された容器に密閉系で連続的に移し、窒素ガス
雰囲気下で攪拌しながら保存した。Under a nitrogen gas atmosphere, the temperature of the external water tank is set to 0.
The temperature was controlled to 4 ° C, and the solution was stirred at 43.6.
6 g (0.20 mol) of purified PMDA was added slowly as a solid, taking care not to raise the temperature of the solution. After all the additions were completed, stirring was continued to prepare a uniform polyamic acid solution. -20 this polyamic acid solution
It was continuously transferred to a container cooled to 0 ° C in a closed system and stored under a nitrogen gas atmosphere with stirring.
【0072】一方、市販のポリエーテルイミド樹脂(G
E社製ウルテム)74.40g採取し、500ccのビ
ーカー中で174gの蒸留されたNMPに溶解させた。
ポリエーテルイミド樹脂が完全に溶解された後、この溶
液をPMDA/PPD/TABTから成る前述のポリア
ミド酸溶液を保存した容器に密閉系で連続的に移し、窒
素ガス雰囲気下で攪拌を続け、均一なポリアミド酸/ポ
リエーテルイミド樹脂混合溶液を得た。On the other hand, a commercially available polyetherimide resin (G
74.40 g of Ultem (manufactured by Company E) was taken and dissolved in 174 g of distilled NMP in a 500 cc beaker.
After the polyetherimide resin was completely dissolved, this solution was continuously transferred to a container in which the above polyamic acid solution consisting of PMDA / PPD / TABT was stored in a closed system, and stirring was continued under a nitrogen gas atmosphere to homogenize the solution. A polyamic acid / polyetherimide resin mixed solution was obtained.
【0073】ポリアミド酸/ポリエーテルイミド樹脂混
合溶液の濃度は17重量%、回転粘度計によって測定し
た−20℃での溶液粘度は1200ポイズであった。5
時間後の−20℃での溶液粘度は1400ポイズで粘度
変化は小さかった。The concentration of the polyamic acid / polyetherimide resin mixed solution was 17% by weight, and the solution viscosity at −20 ° C. measured by a rotary viscometer was 1200 poise. 5
After a lapse of time, the solution viscosity at −20 ° C. was 1400 poise and the change in viscosity was small.
【0074】−20℃に冷却されたポリアミド酸/ポリ
エーテルイミド樹脂混合溶液を、窒素ガス雰囲気下−2
0℃に冷却された塗工装置(コーター)に連続的に供給
し、コーター部より表面研磨されたステンレスベルト上
に連続的に一定厚みでポリアミド酸溶液をコーティング
した。コーティングの幅は300mm、厚さを400μ
mにコントロールした。The polyamic acid / polyetherimide resin mixed solution cooled to -20 ° C. was placed under a nitrogen gas atmosphere-2.
The polyamic acid solution was continuously supplied to a coating device (coater) cooled to 0 ° C., and continuously coated with a uniform thickness on a stainless belt whose surface was polished from the coater section. The width of the coating is 300mm and the thickness is 400μ
Controlled to m.
【0075】連続的にコーティングされた混合溶液の塗
工膜を、平均10℃/分の昇温速度で100℃まで昇温
するまでに混合溶液はゲル化を起こし、寒天状のポリア
ミド酸/ポリエーテルイミド樹脂の複合ゲルフィルムと
なった。このゲルフィルムの一部を取り出し、25℃で
測定した見掛け粘度は7500ポアズであった。The mixed solution gelled until the coating film of the continuously coated mixed solution was heated up to 100 ° C. at an average heating rate of 10 ° C./min. It became a composite gel film of ether imide resin. A part of this gel film was taken out and the apparent viscosity measured at 25 ° C. was 7500 poise.
【0076】このゲルフィルムを、連続的に熱風乾燥炉
に通し、130℃で20分間乾燥させ、脱溶媒を行っ
た。脱溶媒されたゲルフィルムは固化し、強いフィルム
となり、これを基材より剥離させてポリアミド酸/ポリ
エーテルイミド樹脂の複合フィルムとした。引き続き、
ピン方式のテンターでフィルムの両縁を固定し、熱処理
炉を通して200℃で20分間、300℃で10分間、
400℃で20分間の条件で段階的に熱処理してイミド
化を完了し、ポリイミド/ポリエーテルイミド樹脂の複
合フィルムを得た。得られた複合フィルムの厚みは50
μmであった。この複合フィルムは不透明ではあったが
比較的均一で、巨視的には大きな相分離構造が認められ
ず外観良好なものであった。The gel film was continuously passed through a hot air drying oven and dried at 130 ° C. for 20 minutes to remove the solvent. The desolvated gel film solidified and became a strong film, which was peeled off from the substrate to obtain a polyamic acid / polyetherimide resin composite film. Continued
Fix both edges of the film with a pin type tenter, and pass through a heat treatment furnace at 200 ° C for 20 minutes, 300 ° C for 10 minutes,
Heat treatment was carried out stepwise at 400 ° C. for 20 minutes to complete imidization to obtain a polyimide / polyetherimide resin composite film. The thickness of the obtained composite film is 50.
μm. Although this composite film was opaque, it was relatively uniform and had a good appearance without macroscopically showing a large phase separation structure.
【0077】フィルムの熱機械分析を引張り加重を加え
ながら行ったところ、380℃にガラス転移温度に対応
すると思われる熱膨張曲線の変曲点が観測され、100
℃での線膨張係数は2.5×10-5cm/cm/℃であ
った。When the film was subjected to thermomechanical analysis while applying a tensile load, an inflection point of the thermal expansion curve, which is considered to correspond to the glass transition temperature at 380 ° C., was observed.
The coefficient of linear expansion at ° C was 2.5 x 10 -5 cm / cm / ° C.
【0078】ポリイミド/ポリエーテルイミド樹脂の複
合フィルムを短冊状に5mm幅でカットし、フィルムの
引張り試験をチャック間距離30mm、引張り速度5m
m/分の条件で23℃にて行った。フィルムの引張り強
さは18kgf/mm2 、引張り弾性率は380kgf
/mm2 、引張り伸度は25%であった。A composite film of polyimide / polyetherimide resin was cut into a strip shape with a width of 5 mm, and the film was subjected to a tensile test by a chuck distance of 30 mm and a tensile speed of 5 m.
It was performed at 23 ° C. under the condition of m / min. The tensile strength of the film is 18 kgf / mm 2 , and the tensile elastic modulus is 380 kgf.
/ Mm 2 , and the tensile elongation was 25%.
【0079】〔比較例2〕前記実施例3においてTAB
Tを使用せず、精製した4,4’−DPEの量を10.
03g(0.0996モル)に変更する以外は全て前記
実施例3と同様な方法で均一ポリアミド酸/ポリエーテ
ルイミド樹脂混合溶液を得た。Comparative Example 2 TAB in the above Example 3
The amount of purified 4,4′-DPE was adjusted to 10.
A homogeneous polyamic acid / polyetherimide resin mixed solution was obtained in the same manner as in Example 3 except that the amount was changed to 03 g (0.0996 mol).
【0080】ポリアミド酸/ポリエーテルイミド樹脂混
合溶液の濃度は17重量%、回転粘度計によって測定し
た−20℃での溶液粘度は5600ポイズであった。5
時間後の−20℃での溶液粘度は5600ポイズで粘度
変化はなかった。The concentration of the polyamic acid / polyetherimide resin mixed solution was 17% by weight, and the solution viscosity at −20 ° C. measured by a rotary viscometer was 5600 poise. 5
The solution viscosity at −20 ° C. after the lapse of time was 5600 poise and there was no change in viscosity.
【0081】前記実施例3と同様に塗工装置(コータ
ー)で連続的にフィルムを作製した。−20℃で連続的
にコーティングされた混合溶液の塗工膜を、100℃ま
で昇温しても混合溶液はゲル化を起こさなかった。引き
続き、前記実施例3と同様にして乾燥・熱処理によって
得られたポリアミド酸/ポリエーテルイミド樹脂の複合
フィルムには巨視的に大きな相分離構造が表面に認めら
れ、外観不良であった。前記実施例3と同様にして測定
したフィルムの引張り強さは15kgf/mm2、引張
り弾性率は350kgf/mm2 、引張り伸度は25%
であり、前記実施例3と比較して機械的性質は劣ってい
た。Films were continuously produced by a coating apparatus (coater) in the same manner as in Example 3 above. Even if the coating film of the mixed solution continuously coated at -20 ° C was heated to 100 ° C, the mixed solution did not gel. Subsequently, a polyamic acid / polyetherimide resin composite film obtained by drying and heat treatment in the same manner as in Example 3 had a macroscopically large phase-separated structure on the surface and had a poor appearance. The tensile strength of the film measured in the same manner as in Example 3 was 15 kgf / mm 2 , the tensile elastic modulus was 350 kgf / mm 2 , and the tensile elongation was 25%.
And the mechanical properties were inferior to those of Example 3.
【0082】[0082]
【発明の効果】本発明の耐熱性ポリイミドフィルムの製
造方法によれば、三次元架橋反応によるゲル形成能を有
するポリアミド酸溶液を、不活性ガス雰囲気下、−10
℃以下の温度で基材上に適用し、且つ高分子ゲルを経由
してイミド化しているので、粘度が安定にコントロール
された状態でポリアミド酸溶液を適用でき、得られる耐
熱性ポリイミドフィルムは品質の安定したものとなり、
且つ機械的性質の優れたものとなる。According to the method for producing a heat-resistant polyimide film of the present invention, a polyamic acid solution having a gel-forming ability by a three-dimensional crosslinking reaction is treated in an inert gas atmosphere at -10
Since it is applied on the substrate at a temperature of ℃ or less and imidized via the polymer gel, the polyamic acid solution can be applied in a state where the viscosity is stably controlled, and the resulting heat-resistant polyimide film has a high quality. Will be stable,
It also has excellent mechanical properties.
【0083】本発明の耐熱性ポリイミドフィルムの製造
方法におけるイミド化処理は、ポリアミド酸フィルムを
ピン付きベルトと接触させて、連続して走行させながら
イミド化を行っているので、連続的な耐熱性ポリイミド
フィルムの製造方法が可能となる。In the imidization treatment in the method for producing a heat-resistant polyimide film of the present invention, the polyamic acid film is brought into contact with a belt with a pin, and the imidization is carried out while continuously running. A method of manufacturing a polyimide film becomes possible.
Claims (6)
を有するポリアミド酸溶液を、不活性ガス雰囲気下、−
10℃以下の温度で基材上に適用し、 (2)適用されたポリアミド酸溶液を加熱して、基材上
で自己支持性のあるポリアミド酸ゲルフィルムとし、 (3)引き続きポリアミド酸ゲルフィルム中の有機溶媒
を除去せしめ、 (4)さらに熱処理してイミド化を行う、ことを特徴と
する耐熱性ポリイミドフィルムの製造方法。(1) A polyamic acid solution having a gel-forming ability by a three-dimensional cross-linking reaction, under an inert gas atmosphere,
It is applied on a substrate at a temperature of 10 ° C. or lower, and (2) the applied polyamic acid solution is heated to form a polyamic acid gel film having self-supporting properties on the substrate, (3) Sequential polyamic acid gel film A method for producing a heat-resistant polyimide film, characterized in that the organic solvent therein is removed, and (4) further heat treatment is carried out for imidization.
成能を有するポリアミド酸溶液は、−10℃以下の温度
で保存されているものであり、且つ該反応溶液の固形分
濃度5〜30重量%、見掛け粘度1〜5000ポアズに
維持されていることを特徴とする請求項1記載の耐熱性
ポリイミドフィルムの製造方法。2. The polyamic acid solution capable of forming a polymer gel by the three-dimensional crosslinking reaction is stored at a temperature of −10 ° C. or lower, and the solid content concentration of the reaction solution is 5 to 30% by weight. %, The apparent viscosity is maintained at 1 to 5,000 poises, The method for producing a heat-resistant polyimide film according to claim 1, wherein
して、基材上で自己支持性のあるポリアミド酸ゲルフィ
ルムとする方法は、不活性ガス雰囲気下で行うことを特
徴とする請求項1記載の耐熱性ポリイミドフィルムの製
造方法。3. The method of heating the applied polyamic acid solution to form a polyamic acid gel film having self-supporting properties on a substrate is carried out under an inert gas atmosphere. A method for producing the heat-resistant polyimide film described.
溶媒を除去せしめる方法は、基材上のポリアミド酸ゲル
フィルムに、200℃を超えない温度の熱風を吹きかけ
ることを特徴とする請求項1記載の耐熱性ポリイミドフ
ィルムの製造方法。4. The method for removing the organic solvent in the polyamic acid gel film comprises blowing hot air at a temperature not exceeding 200 ° C. onto the polyamic acid gel film on the substrate. Method for producing heat-resistant polyimide film.
酸ゲルフィルムを基材から引き剥し、ポリアミド酸ゲル
フィルムの両縁の少なくとも一方を、駆動されているピ
ン付きベルトと接触させることにより、ポリアミド酸フ
ィルムを連続して走行させながらイミド化を行う請求項
1記載の耐熱性ポリイミドフィルムの製造方法。5. The method of imidization comprises peeling a polyamic acid gel film from a substrate and contacting at least one of both edges of the polyamic acid gel film with a driven belt with a pin to form a polyamide The method for producing a heat-resistant polyimide film according to claim 1, wherein imidization is performed while the acid film is continuously run.
フィルムの製造方法において、イミド化を行う熱処理温
度は500℃を超えない範囲であることを特徴とする耐
熱性フィルムの製造方法。6. The method for producing a heat-resistant polyimide film according to claim 1, wherein the heat treatment temperature for imidization is within the range of 500 ° C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5853596A JPH09227697A (en) | 1996-02-21 | 1996-02-21 | Preparation of heat-resistant polyimide film through gel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5853596A JPH09227697A (en) | 1996-02-21 | 1996-02-21 | Preparation of heat-resistant polyimide film through gel |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09227697A true JPH09227697A (en) | 1997-09-02 |
Family
ID=13087139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP5853596A Pending JPH09227697A (en) | 1996-02-21 | 1996-02-21 | Preparation of heat-resistant polyimide film through gel |
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001162631A (en) * | 1999-12-09 | 2001-06-19 | Du Pont Toray Co Ltd | Polyimide film and method of manufacturing the same |
JP2002121281A (en) * | 2000-10-18 | 2002-04-23 | Kanegafuchi Chem Ind Co Ltd | Method for producing polyamic acid copolymer, polyimide copolymer and polyimide film |
WO2004087793A1 (en) * | 2003-03-28 | 2004-10-14 | Pi R & D Co. Ltd. | Crosslinked polyimide, composition comprising the same and method for producing the same |
JP2009227832A (en) * | 2008-03-24 | 2009-10-08 | Sumitomo Chemical Co Ltd | Method for preserving liquid crystal polymer solution |
US8962790B2 (en) | 2001-02-27 | 2015-02-24 | Kaneka Corporation | Polyimide film and process for producing the same |
JP2017203113A (en) * | 2016-05-12 | 2017-11-16 | 宇部興産株式会社 | Manufacturing method of insulation coating layer |
CN109575286A (en) * | 2017-12-28 | 2019-04-05 | Skc株式会社 | Polyamidoimide film and preparation method thereof |
CN109796593A (en) * | 2018-01-31 | 2019-05-24 | Skc株式会社 | Polyamide-imides film and preparation method thereof |
WO2024154613A1 (en) * | 2023-01-18 | 2024-07-25 | 矢崎総業株式会社 | Insulated electric wire and method for producing same |
-
1996
- 1996-02-21 JP JP5853596A patent/JPH09227697A/en active Pending
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001162631A (en) * | 1999-12-09 | 2001-06-19 | Du Pont Toray Co Ltd | Polyimide film and method of manufacturing the same |
JP2002121281A (en) * | 2000-10-18 | 2002-04-23 | Kanegafuchi Chem Ind Co Ltd | Method for producing polyamic acid copolymer, polyimide copolymer and polyimide film |
US8962790B2 (en) | 2001-02-27 | 2015-02-24 | Kaneka Corporation | Polyimide film and process for producing the same |
US9441082B2 (en) | 2001-02-27 | 2016-09-13 | Kaneka Corporation | Polyimide film and process for producing the same |
WO2004087793A1 (en) * | 2003-03-28 | 2004-10-14 | Pi R & D Co. Ltd. | Crosslinked polyimide, composition comprising the same and method for producing the same |
JPWO2004087793A1 (en) * | 2003-03-28 | 2006-06-29 | 株式会社ピーアイ技術研究所 | Cross-linked polyimide, composition containing the same and method for producing the same |
JP2010248515A (en) * | 2003-03-28 | 2010-11-04 | Pi R & D Co Ltd | Crosslinked polyimide, composition containing the same and method for producing the same |
JP4646804B2 (en) * | 2003-03-28 | 2011-03-09 | 株式会社ピーアイ技術研究所 | Cross-linked polyimide, composition containing the same and method for producing the same |
JP2009227832A (en) * | 2008-03-24 | 2009-10-08 | Sumitomo Chemical Co Ltd | Method for preserving liquid crystal polymer solution |
JP2017203113A (en) * | 2016-05-12 | 2017-11-16 | 宇部興産株式会社 | Manufacturing method of insulation coating layer |
CN109575286A (en) * | 2017-12-28 | 2019-04-05 | Skc株式会社 | Polyamidoimide film and preparation method thereof |
JP2019151818A (en) * | 2017-12-28 | 2019-09-12 | エスケイシー・カンパニー・リミテッドSkc Co., Ltd. | Manufacturing method of poly(amide-imide)film, and poly(amide-imide) film manufactured by the same |
JP2021165399A (en) * | 2017-12-28 | 2021-10-14 | エスケイシー・カンパニー・リミテッドSkc Co., Ltd. | Process for preparing poly(amide-imide) film, and poly(amide-imide) film prepared by the same |
CN109575286B (en) * | 2017-12-28 | 2021-11-09 | Skc株式会社 | Polyamide-imide film and preparation method thereof |
CN113801323A (en) * | 2017-12-28 | 2021-12-17 | Skc株式会社 | Polyamide-imide film and preparation method thereof |
US11365287B2 (en) | 2017-12-28 | 2022-06-21 | Skc Co., Ltd. | Process for preparing a poly(amide-imide) film and a poly(amide-imide) film prepared by the same |
CN113801323B (en) * | 2017-12-28 | 2023-09-01 | 爱思开迈克沃有限公司 | Polyamide imide film and preparation method thereof |
CN109796593A (en) * | 2018-01-31 | 2019-05-24 | Skc株式会社 | Polyamide-imides film and preparation method thereof |
JP2021119214A (en) * | 2018-01-31 | 2021-08-12 | エスケイシー・カンパニー・リミテッドSkc Co., Ltd. | Polyamide-imide film and preparation method thereof |
WO2024154613A1 (en) * | 2023-01-18 | 2024-07-25 | 矢崎総業株式会社 | Insulated electric wire and method for producing same |
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