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JPH0920072A - Optical recording medium - Google Patents

Optical recording medium

Info

Publication number
JPH0920072A
JPH0920072A JP7169689A JP16968995A JPH0920072A JP H0920072 A JPH0920072 A JP H0920072A JP 7169689 A JP7169689 A JP 7169689A JP 16968995 A JP16968995 A JP 16968995A JP H0920072 A JPH0920072 A JP H0920072A
Authority
JP
Japan
Prior art keywords
phase
recording
recording layer
recording medium
erasing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7169689A
Other languages
Japanese (ja)
Inventor
Tadao Nomura
忠雄 野村
Katsushi Tokunaga
勝志 徳永
Yoshio Tawara
好夫 俵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP7169689A priority Critical patent/JPH0920072A/en
Publication of JPH0920072A publication Critical patent/JPH0920072A/en
Pending legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PROBLEM TO BE SOLVED: To improve the rewriting characteristics of a phase change recording medium by incorporating a precipitation phase made of matrix of Ge and Te elements and specific compound crystal in a recording layer. SOLUTION: The optical recording medium has a recording layer for recording, erasing or reproducing information by varying optical properties by emitting laser onto a board. The recording layer contains a parent phase made of Ge, Sb or Te element, and a precipitation phase represented by a symbol A, and the composition is represented by a formula (GeTe)1- x-(Sb2 Te3 )x }1-y-z Sby A2 (where A is a compound crystal made of Al element and at least element of Sb or Te, x, y, z are the numbers of ranges indicated by 0.3<=x<=0.7, 0<=y<=0.1, 0.01<=z<=0.3). The A is, for example, the compound crystal of AlSb, Al2 Te3 , thereby improving rewriting characteristics, and reducing the initializing times by laser emitting.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明はレーザ光を用いるこ
とにより情報の記録、再生、消去が可能な光記録媒体に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical recording medium capable of recording, reproducing and erasing information by using laser light.

【0002】[0002]

【従来の技術】近年、情報量の増大に伴ってレーザ光の
照射により情報の記録、再生、消去を行う書換型光ディ
スクが注目されている。書換型光ディスクには磁気光学
効果を利用した光磁気記録方式の他に、非晶質と結晶質
間の相転移を利用した相変化記録方式があるが、この相
変化方式は外部磁界を必要とせずレーザ強度のみでオー
バーライトが行える等の長所を有している。
2. Description of the Related Art In recent years, rewritable optical discs for recording, reproducing and erasing information by irradiating laser light have been attracting attention as the amount of information has increased. Rewritable optical discs include a magneto-optical recording method that utilizes the magneto-optical effect and a phase-change recording method that utilizes a phase transition between amorphous and crystalline materials. This phase-change method requires an external magnetic field. Instead, it has the advantage that overwriting can be performed only with the laser intensity.

【0003】相変化記録材料としてはこれまで主として
カルコゲン化物が検討されてきており、例えば1966年の
米国特許第3271591 号、特開昭61−137784号公報などに
記載されている材料が用いられている。なかでもGe−Sb
−Te3元系材料は高速結晶化が可能で書換特性も他の材
料より優れていることから既に工業生産化されている。
この3元系にはGeTe、Sb2Te3の2元系化合物相及び両者
を結ぶ線上にあるGe2Sb2Te5 、GeSb2Te4、GeSb4Te7など
の3元系化合物相が存在するが、特にGe2Sb2Te5 やGeSb
2Te4にSbを3〜5%含んだ組成が記録消去特性に適して
いるとされる。
Chalcogenides have been mainly studied as a phase change recording material. For example, materials described in US Pat. No. 3,217,591 of 1966 and Japanese Patent Laid-Open No. 61-137784 are used. There is. Among them, Ge-Sb
-Te ternary material has already been industrialized because it can be crystallized at high speed and its rewriting property is superior to other materials.
In this ternary system, there exist ternary compound phases such as GeTe and Sb 2 Te 3 and ternary compound phases such as Ge 2 Sb 2 Te 5 , GeSb 2 Te 4 and GeSb 4 Te 7 on the line connecting the two. But especially Ge 2 Sb 2 Te 5 and GeSb
It is said that the composition containing 3 to 5% of Sb in 2 Te 4 is suitable for the recording / erasing characteristics.

【0004】[0004]

【発明が解決しようとする課題】しかし一方において、
相変化記録媒体では記録/消去を何度も繰り返すいわゆ
る書換回数が劣る。そこでこれを向上させるために記録
層や記録層とヒートシンク層間の誘電体層を薄くする媒
体構造などが考案された(T.Ohta et al.,Proc.SPIE,10
78,27 (1989))。これにより書換特性はかなり改善さ
れたものの、長いビットを形成するマークエッジ記録方
式などではまだ十分といえない。
However, on the other hand, on the other hand,
In a phase change recording medium, the so-called number of times of rewriting, in which recording / erasing is repeated many times, is poor. Therefore, in order to improve this, a medium structure was devised in which the recording layer and the dielectric layer between the recording layer and the heat sink layer were thinned (T.Ohta et al., Proc. SPIE, 10
78, 27 (1989)). Although the rewriting characteristics have been improved considerably by this, the mark edge recording method for forming a long bit is not sufficient yet.

【0005】書換特性が劣化する主な原因のひとつとし
て記録膜の流動による膜厚変化が考えられている。これ
は記録膜を非晶質化するときに応力が発生して、融解し
た記録膜を押し出すために生じる。この現象を防止する
ためにさまざまな試みが行われている。例えば、窒化物
の形成(特開平04−10979 号公報)や高融点化合物Cr2T
e3の添加(第6回相変化記録研究会シンポジウム講演予
稿集、(1994)87)が挙げられる。しかしCr2Te3添加に
よる書換回数の向上は確認されたが、この場合予め高パ
ワーで3000回の光照射を行う初期過程が必要となる。こ
れはCrの融点が高くCr2Te3結晶が膜中に析出しにくいた
めと考えられる。
As one of the main causes of the deterioration of the rewriting characteristics, it is considered that the film thickness changes due to the flow of the recording film. This occurs because stress is generated when the recording film is made amorphous, and the melted recording film is pushed out. Various attempts have been made to prevent this phenomenon. For example, formation of a nitride (Japanese Patent Laid-Open No. 04-10979) and a high melting point compound Cr 2 T
The addition of e 3 (Proceedings of the 6th Phase Change Recording Workshop Symposium, (1994) 87) can be mentioned. However, although it was confirmed that the number of rewrites was improved by adding Cr 2 Te 3 , in this case, the initial process of pre-irradiating light with high power 3000 times is required. It is considered that this is because Cr has a high melting point and Cr 2 Te 3 crystals are hard to precipitate in the film.

【0006】[0006]

【課題を解決するための手段】本発明はこのような問題
点を解決した光記録媒体に関するもので、これはGe−Sb
−Te系記録層中にAlSb、Al2Te3などの化合物結晶が微細
に析出していることを特徴とするものである。すなわ
ち、本発明者は従来のGe−Sb−Te系材料を用いた相変化
記録媒体の書換特性について種々検討した結果、基板上
に少なくともレーザ光照射で光学特性を変化させること
によって情報の記録、消去、再生を行う記録層を有し、
その記録層がGe、Sb、Te元素からなる母相と記号Aで表
される析出相とを含み、かつその組成が式{(GeTe)
1-x (Sb2Te3x1-y-z SbyAz (ただし、A はAl元素
と少なくともSbとTeのいずれかの元素とよりなる化合物
結晶で、x、y、zはそれぞれ0.3 ≦x≦0.7 、0≦y
≦ 0.1、0.01≦z≦0.3 で示される範囲の数)で表され
る光記録媒体を要旨とするもので、A をAlSb、Al2Te3
どの化合物結晶とすることによって、マークエッジ記録
方式における書換特性が従来のGe−Sb−Te記録層に比べ
て大きく向上し、またレーザ光照射による初期化の回数
をも大幅に低減できることを見い出して本発明を完成さ
せた。
SUMMARY OF THE INVENTION The present invention relates to an optical recording medium which solves the above-mentioned problems, which is Ge-Sb.
It is characterized in that compound crystals such as AlSb and Al 2 Te 3 are finely precipitated in the Te-based recording layer. That is, the present inventor has variously studied the rewriting characteristics of a phase change recording medium using a conventional Ge-Sb-Te-based material, the recording of information by changing the optical characteristics on the substrate at least by laser light irradiation, Has a recording layer for erasing and reproducing,
The recording layer contains a matrix phase composed of Ge, Sb, and Te elements and a precipitation phase represented by the symbol A, and the composition is represented by the formula {(GeTe)
1-x (Sb 2 Te 3 ) x} 1-yz Sb y A z ( However, A is a more becomes crystalline compound with any of the elements of at least Sb and Te as Al element, x, y, z are respectively 0.3 ≤x≤0.7, 0≤y
The outline is an optical recording medium represented by ≤ 0.1, 0.01 ≤ z ≤ 0.3), and the mark edge recording method is adopted by using A as a compound crystal such as AlSb or Al 2 Te 3. The present invention has been completed by discovering that the rewriting characteristics in 1) are significantly improved as compared with the conventional Ge-Sb-Te recording layer, and the number of initializations by laser light irradiation can be significantly reduced.

【0007】以下にこれをさらに詳述する。本発明は光
記録媒体に関するものであり、これは前記したように基
板上に少なくともレーザ光照射で光学特性を変化させる
ことによって情報の記録、消去、再生を行う記録層薄膜
を有し、その記録層がGe、Sb、Te元素からなる母相と記
号Aで表される析出相とを含み、かつその組成が式{(G
eTe)1-x (Sb2Te3X1-y-z SbyAz (A 、x、y、
zは前記のとうり)で表される光記録媒体において、A
がAl元素とSb、Teのうちから選ばれた少なくとも1種の
元素とからなる化合物結晶よりなるもので、A としては
例えばAlSb、Al2Te3などの2元系化合物結晶もしくはこ
れらの化合物相やSb2Te3間を結ぶ線上に形成されるAlSb
Te3 などの3元系化合物結晶であることを特徴とするも
のである。
This will be described in more detail below. The present invention relates to an optical recording medium, which has a recording layer thin film for recording, erasing and reproducing information by changing the optical characteristics on at least a laser beam on a substrate as described above. The layer contains a matrix phase composed of Ge, Sb, and Te elements and a precipitation phase represented by the symbol A, and its composition is represented by the formula {(G
eTe) 1-x (Sb 2 Te 3) X} 1-yz Sb y A z (A, x, y,
In the optical recording medium represented by z above, z is A
Is a compound crystal consisting of an Al element and at least one element selected from Sb and Te, and A is, for example, a binary compound crystal such as AlSb or Al 2 Te 3 or a compound phase thereof. And AlSb formed on the line connecting Sb 2 Te 3
It is characterized by being a ternary compound crystal such as Te 3 .

【0008】本発明の光記録媒体の構造は図1に示した
ように、基板上に第1の誘電体層、記録層、第2の誘電
体層、反射層を順次成膜してなる構造からなるものであ
る。この光記録媒体を構成する基板、誘電体層、反射層
はいずれも公知のものと同様とすればよく、したがって
この基板としてはガラスまたはポリカーボネート、ポリ
オレフィン、ポリメチルメタクリレートなどの透明樹脂
からなるものとすればよく、誘電体層は記録層の耐久性
やエンハンス効果を考えてZnS 、SiO2、Al2O3、SiN 、A
lN 、SiC などのセラミックスやそれらの混合物を用い
ればよいし、反射層は反射率及び熱伝導率の大きいもの
とすることからAl、Cu、Au、Ag、Ptなどやこれらを含ん
だ合金を使用すればよく、これらの層はスパッタリング
法や真空蒸着法などによって形成される。さらにこの上
に紫外線硬化樹脂などによる有機保護層を形成してもよ
い。
The structure of the optical recording medium of the present invention is, as shown in FIG. 1, a structure in which a first dielectric layer, a recording layer, a second dielectric layer and a reflective layer are sequentially formed on a substrate. It consists of The substrate, the dielectric layer, and the reflective layer constituting this optical recording medium may be the same as known ones, and therefore, the substrate is made of glass or a transparent resin such as polycarbonate, polyolefin, or polymethylmethacrylate. The dielectric layer should be ZnS, SiO 2 , Al 2 O 3 , SiN, A in consideration of the durability and enhancement effect of the recording layer.
AlN, Cu, Au, Ag, Pt or alloys containing these may be used because ceramics such as lN and SiC, or a mixture thereof, may be used, and the reflective layer has high reflectance and thermal conductivity. These layers may be formed by a sputtering method, a vacuum evaporation method, or the like. Furthermore, an organic protective layer made of an ultraviolet curable resin or the like may be formed thereon.

【0009】本発明の記録層を形成する母相には、従来
より相変化材料として用いられているGe−Sb−Te3元系
合金を用いる。この材料はオーバーライトのための必要
条件である高速結晶化と非晶質領域の安定性で優れてい
る材料であるが、より最適な特性を得るためにはその組
成を式{(GeTe)1-x (Sb2Te3X1-y Sby において
x、yをそれぞれ0.3 ≦x≦0.7 、0≦y≦0.1 の範囲
に限定することが必要である。
For the parent phase forming the recording layer of the present invention, a Ge-Sb-Te ternary alloy conventionally used as a phase change material is used. This material is excellent in high-speed crystallization and stability in the amorphous region, which are necessary conditions for overwriting. However, in order to obtain more optimal properties, its composition should be expressed by the formula {(GeTe) 1 -x (Sb 2 Te 3) X } 1-y Sb y in x, y, respectively 0.3 ≦ x ≦ 0.7, it is necessary to limit the range of 0 ≦ y ≦ 0.1.

【0010】本発明ではこの記録層中に析出相A として
AlSb、Al2Te3などの化合物相を微細に分散析出させるも
のであるが、母相が結晶質−非晶質の相変化を起こす際
にも、この析出相A は溶融、変態を起こさず、固相のま
ま保持されることが必要である。この析出相A の比率z
は0.01未満では効果が無く、多いほど融解時の記録層の
流動を防止することが出来るが0.3 を越えると再生信号
振幅が減少し良好な特性が得られなくなるので、この相
の記録層全体に対する比率zは0.01≦z≦0.3 とするこ
とが必要で、好ましくは0.05≦z≦0.2 とするのがよ
い。
In the present invention, as the precipitation phase A in this recording layer
The compound phase such as AlSb and Al 2 Te 3 is finely dispersed and precipitated, but even when the mother phase undergoes a crystalline-amorphous phase change, this precipitated phase A does not melt or transform. , It is necessary to be retained as a solid phase. Ratio z of this precipitation phase A
Is less than 0.01, there is no effect, and the larger the value is, the more the flow of the recording layer at the time of melting can be prevented, but if it exceeds 0.3, the reproduction signal amplitude decreases and good characteristics cannot be obtained. The ratio z needs to be 0.01 ≦ z ≦ 0.3, and preferably 0.05 ≦ z ≦ 0.2.

【0011】上記記録層はスパッタリング法や蒸着法な
どの薄膜形成方法を用いて形成される。スパッタリング
法の場合、ターゲットは上記膜組成と同比率のGe−Sb−
Te−Al合金を用いてもよいし、Ge−Sb−Te合金ターゲッ
ト上にAlSb、Al2Te3など化合物のチップを置いた複合タ
ーゲットとしてもよい。あるいはAl、Sb、Teのチップを
用いることもできる。成膜直後の膜は均一な非晶質状態
であり、化合物A は膜中に析出していないが、これに初
期工程としてレーザ光照射による初期溶融過程を行うこ
とにより、結晶相として化合物A が比較的すみやかにGe
−Sb−Te母相中に分散析出して析出相A を形成する。初
期工程の条件は、ディスクをv=6m/s で回転し、波長
780nm 、NA0.5 でDCパワー10mW以上のレーザ光を数回〜
数十回照射して化合物相を析出させればよい。
The recording layer is formed by a thin film forming method such as a sputtering method or a vapor deposition method. In the case of the sputtering method, the target is Ge-Sb-with the same ratio as the above film composition.
A Te-Al alloy may be used, or a composite target in which a compound chip such as AlSb or Al 2 Te 3 is placed on a Ge-Sb-Te alloy target may be used. Alternatively, Al, Sb, or Te chips can be used. The film immediately after film formation was in a uniform amorphous state, and compound A was not precipitated in the film.However, by performing an initial melting process by laser light irradiation as an initial step, compound A was formed as a crystalline phase. Relatively quickly Ge
-Sb-Te disperse and precipitate in the matrix to form precipitate phase A. The condition of the initial process is that the disk is rotated at v = 6m / s and the wavelength is
Laser light with DC power of 10 mW or more at 780 nm, NA 0.5 several times
The compound phase may be precipitated by irradiating several tens of times.

【0012】本発明のポイントは2点あり、第1の点は
Al元素が母相を構成する元素であるSb、Teに対してほと
んど固溶度を持たず、またGeに対する溶解度も最大1.5
at.%程度であることである。このためAlは母相中に固
溶するより、Sb、Teと結合して析出相を形成する方向に
はたらく。
There are two points of the present invention, and the first point is
Al element has almost no solid solubility in Sb and Te, which are the elements that make up the matrix, and the maximum solubility in Ge is 1.5.
It is about at.%. For this reason, Al acts in the direction of forming a precipitated phase by combining with Sb and Te rather than forming a solid solution in the parent phase.

【0013】第2の点は析出相を形成するAl、Sb、Te元
素の融点が母相の融点に比べ高すぎないことである。Ge
−Sb−Te母相は図2に示すように600 ℃前後の融点を有
する。一方、析出相を形成するAl、Sb、Te等の元素の融
点は各々660 、630 、450 ℃であり、最も高いAl元素で
もGe2Sb2Te5 の融点630 ℃より30℃高いだけである。こ
のため、記録層が溶融したときにこれら元素が化合物を
形成して母相中に析出し、析出相を形成する。
The second point is that the melting points of the Al, Sb and Te elements forming the precipitated phase are not too high as compared with the melting point of the parent phase. Ge
As shown in Fig. 2, the -Sb-Te matrix has a melting point of around 600 ° C. On the other hand, the melting points of the elements such as Al, Sb, and Te that form the precipitation phase are 660, 630, and 450 ° C, respectively, and even the highest Al element is only 30 ° C higher than the melting point of 630 ° C of Ge 2 Sb 2 Te 5. . Therefore, when the recording layer is melted, these elements form a compound and are precipitated in the mother phase to form a precipitated phase.

【0014】このようにして形成された析出相は比較的
高い融点を有する。例えばAlSb、Al2Te3の融点は各々10
50、895 ℃であり、Ge−Sb−Te母相の融点より200 ℃以
上高い。このためレーザ光照射によって母相が結晶−非
晶質間で相変化を起こすときにも、これらの析出相は溶
融せず固相のままで保持される。そしてこの析出相は膜
中に均一に分散しているために、融解した母相が流動す
るのを防止するはたらきをする。
The precipitation phase thus formed has a relatively high melting point. For example, the melting points of AlSb and Al 2 Te 3 are 10
50 and 895 ° C, which is higher than the melting point of the Ge-Sb-Te matrix by 200 ° C or more. Therefore, even when the mother phase undergoes a phase change between the crystal and the amorphous due to the laser light irradiation, these precipitated phases are not melted and are retained as a solid phase. Since this precipitation phase is uniformly dispersed in the film, it serves to prevent the melted mother phase from flowing.

【0015】[0015]

【発明の実施の形態】以下本発明の実施の形態について
実施例と比較例を挙げて説明する。 実施例1 スパッタリング装置を用いて、グループを形成したポリ
カーボネートディスク基板上にZnS とSiO2の混合物から
なる第1誘電体層、Ge−Sb−Te合金にAlSbを添加した記
録層、第1誘電体層と同じ材料からなる第2誘電体層、
Al反射層を順次形成した。雰囲気はAr5×10-3Torr、タ
ーゲットは全て4インチφとし、基板を回転させながら
成膜した。記録層にはGe2Sb2Te5 組成のターゲット上に
AlチップとSbチップを原子比1:1の割合で置いた複合
ターゲットを用い、チップ量を変えることにより記録層
の析出相のAlSb量を調整した。投入電力はRF100 Wで、
膜厚が300 Åとなるように成膜を行った。なおICP分
析の結果、記録層の母相の組成はx=0.33であり、yの
値はチップ量と共に変動したがいずれも0.1 以内であっ
た。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to Examples and Comparative Examples. Example 1 Using a sputtering apparatus, a first dielectric layer made of a mixture of ZnS and SiO 2 , a recording layer obtained by adding AlSb to a Ge—Sb—Te alloy, and a first dielectric on a polycarbonate disk substrate on which a group was formed. A second dielectric layer made of the same material as the layer,
The Al reflective layer was sequentially formed. The atmosphere was Ar 5 × 10 −3 Torr, all targets were 4 inches φ, and the film was formed while rotating the substrate. The recording layer was on a Ge 2 Sb 2 Te 5 composition target.
A composite target in which an Al chip and an Sb chip were placed at an atomic ratio of 1: 1 was used, and the AlSb amount in the precipitation phase of the recording layer was adjusted by changing the chip amount. The input power is RF 100 W,
The film was formed so that the film thickness would be 300 Å. As a result of ICP analysis, the composition of the mother phase of the recording layer was x = 0.33, and the value of y varied with the amount of chips, but was within 0.1 in all cases.

【0016】ディスクをv=6m/s で回転し、波長780n
m 、NA0.5 でDCパワー10mW以上のレーザ光を数回〜数十
回照射して化合物相を析出させる初期工程を行った。次
にDCパワー6mWのレーザ光で記録層全体を結晶化してか
ら、記録パワー10mW、消去パワー5mW、周波数1MHz 、
ディユティ(Duty)50%及び周波数2.7MHz、ディユティ
50%で繰り返し信号記録を行いキャリア値(C)、消去
率を測定した。図3にはAlSb組成比率zによるキャリア
値をz=0におけるキャリア値で規格化した値を示す。
z=0.3 おけるキャリア低下率は約10%程度であるが、
それ以上では急激に低下する。これよりAlSbの比率は0.
01≦z≦0.3 が良い事が分かる。また図4の6にはAlSb
組成比z=0.2 で繰り返し信号記録を行ったときの消去
率を初回の消去率で規格化したときの変化を示す。
The disk is rotated at v = 6 m / s and the wavelength is 780 n.
An initial step of precipitating a compound phase was performed by irradiating a laser beam with a DC power of 10 mW or more at m 2, NA 0.5 several times to several tens of times. Next, after crystallizing the entire recording layer with a laser beam of DC power 6 mW, recording power 10 mW, erase power 5 mW, frequency 1 MHz,
50% Duty and 2.7MHz frequency, Duty
The signal was repeatedly recorded at 50%, and the carrier value (C) and the erasing rate were measured. FIG. 3 shows the carrier value according to the AlSb composition ratio z normalized by the carrier value at z = 0.
The carrier decline rate at z = 0.3 is about 10%,
Above that, it drops sharply. From this, the ratio of AlSb is 0.
It can be seen that 01 ≦ z ≦ 0.3 is good. Also, 6 in FIG. 4 shows AlSb.
The change in the erasure rate when the signal is repeatedly recorded with the composition ratio z = 0.2 is normalized by the first erasure rate.

【0017】実施例2 AlとSbチップの代わりにAlとTeチップを原子比で2:3
の割合で置いた以外は実施例1と同様に行ったところ、
析出相としてAl2Te3を含有した成膜がえられた。この成
膜の消去率の測定結果を図4の7に示す。
Example 2 Instead of Al and Sb chips, Al and Te chips were used in an atomic ratio of 2: 3.
Was carried out in the same manner as in Example 1 except that the proportion of
A film containing Al 2 Te 3 as a precipitation phase was obtained. The measurement result of the erasing rate of this film formation is shown in 7 of FIG.

【0018】実施例3 AlとSbチップの代わりにAl、Sb、Teチップを原子比で
1:1:1の割合で置いて以外は実施例1と同様に行っ
たところ、析出相としてAl、Sb、Teよりなる化合物を含
有した成膜が得られた。この成膜の消去率の測定結果を
図4の8に示した。
Example 3 The same procedure as in Example 1 was carried out except that Al, Sb, and Te chips were placed at an atomic ratio of 1: 1: 1 instead of Al and Sb chips. A film containing a compound of Sb and Te was obtained. The measurement result of the erasing rate of this film formation is shown in 8 of FIG.

【0019】比較例1 AlとSbチップを置かなかった点以外は実施例1と同様に
成膜した。この成膜の消去率の測定結果を図4の9に示
す。
Comparative Example 1 A film was formed in the same manner as in Example 1 except that Al and Sb chips were not placed. The measurement result of the erasing rate of this film formation is shown in 9 of FIG.

【0020】比較例2 実施例1と同条件で成膜した。ただし成膜直後に化合物
相を析出させる初期工程を行わず、AlSb相が十分に析出
しないままとしたところ、この成膜の消去率は比較例1
と同じ結果を示した。
Comparative Example 2 A film was formed under the same conditions as in Example 1. However, when the initial step of precipitating the compound phase immediately after the film formation was not carried out and the AlSb phase was not sufficiently precipitated, the erasing rate of this film formation was found to be comparative example 1.
The same result was shown.

【0021】以上図4の結果より実施例1〜3はいずれ
も比較例1と比べて消去率の低下が生じにくく、書換特
性が向上したことが分かる。
From the results shown in FIG. 4, it can be seen that in Examples 1 to 3, the erasing rate was less likely to decrease than in Comparative Example 1 and the rewriting characteristics were improved.

【0022】[0022]

【発明の効果】本発明によれば、Ge−Sb−Te系記録層中
にAlSb、Al2Te3などの化合物結晶を微細に析出させるこ
とにより、相変化記録媒体の書換特性を著しく向上させ
る効果が上がった。
According to the present invention, the rewriting characteristics of the phase change recording medium are remarkably improved by finely precipitating compound crystals such as AlSb and Al 2 Te 3 in the Ge-Sb-Te recording layer. The effect has improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による光記録媒体の層構造を示す図であ
る。
FIG. 1 is a diagram showing a layer structure of an optical recording medium according to the present invention.

【図2】GeTe−Sb2Te3の擬2元系平衡状態図である。FIG. 2 is a pseudo binary system equilibrium diagram of GeTe—Sb 2 Te 3 .

【図3】記録膜中のAlSbの比率に伴うキャリア値の変化
を示した図である。
FIG. 3 is a diagram showing a change in carrier value according to the ratio of AlSb in a recording film.

【図4】記録・消去繰り返し回数に伴う消去率の変化を
示した図である。
FIG. 4 is a diagram showing a change in erasing rate with the number of recording / erasing repetitions.

【符号の説明】[Explanation of symbols]

1…基板 2…第1誘電体層 3…記録層 4…第2誘電体層 5…反射層 6…実施例1 7…実施例2 8…実施例3 9…比較例1 DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... 1st dielectric material layer 3 ... Recording layer 4 ... 2nd dielectric material layer 5 ... Reflective layer 6 ... Example 1 7 ... Example 2 8 ... Example 3 9 ... Comparative example 1

───────────────────────────────────────────────────── フロントページの続き (72)発明者 俵 好夫 神奈川県川崎市高津区坂戸3丁目2番1号 信越化学工業株式会社コーポレートリサ ーチセンター内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yoshio Tawara 3-2-1 Sakado, Takatsu-ku, Kawasaki-shi, Kanagawa Shin-Etsu Chemical Co., Ltd. Corporate Research Center

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基板上に少なくともレーザ光照射で光学
特性を変化させることによって情報の記録、消去、再生
を行う記録層を有し、その記録層がGe、Sb、Te元素から
なる母相と記号A で表される析出相とを含み、かつその
組成が式{(GeTe)1-x(Sb2Te3)x1-y-zSbyAz(ただ
し、A はAl元素と少なくともSbとTeのいずれかの元素と
よりなる化合物結晶で、x、y、zはそれぞれ0.3 ≦x
≦0.7 、0≦y≦0.1 、0.01≦z≦0.3 で示される範囲
の数)で表されることを特徴とする光記録媒体。
1. A substrate has a recording layer for recording, erasing, and reproducing information at least by changing optical characteristics by laser light irradiation, and the recording layer has a mother phase composed of Ge, Sb, and Te elements. and a precipitation phase represented by the symbol a, and its composition formula {(GeTe) 1-x ( Sb 2 Te 3) x} 1-yz Sb y a z ( However, a is at least Sb and Al element A compound crystal composed of one of Te and x, y, and z are 0.3 ≦ x, respectively.
≤0.7, 0≤y≤0.1, 0.01≤z≤0.3).
【請求項2】 析出相Aの融点が母相の融点より200 ℃
以上高いことよりなる請求項1に記載の光記録媒体。
2. The melting point of the precipitation phase A is 200 ° C. higher than the melting point of the mother phase.
The optical recording medium according to claim 1, which is higher than the above.
【請求項3】 析出相Aはレーザ光照射による情報の記
録、消去、再生に際して、溶融、結晶質−非晶質間の変
態を伴わず、母相のみが結晶質−非晶質間の変態を生ず
ることよりなる請求項1に記載の光記録媒体。
3. The precipitation phase A is not accompanied by melting and transformation between crystalline and amorphous during recording, erasing and reproduction of information by laser light irradiation, and only the parent phase is transformation between crystalline and amorphous. The optical recording medium according to claim 1, which comprises:
JP7169689A 1995-07-05 1995-07-05 Optical recording medium Pending JPH0920072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7169689A JPH0920072A (en) 1995-07-05 1995-07-05 Optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7169689A JPH0920072A (en) 1995-07-05 1995-07-05 Optical recording medium

Publications (1)

Publication Number Publication Date
JPH0920072A true JPH0920072A (en) 1997-01-21

Family

ID=15891075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7169689A Pending JPH0920072A (en) 1995-07-05 1995-07-05 Optical recording medium

Country Status (1)

Country Link
JP (1) JPH0920072A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005219162A (en) * 2004-02-05 2005-08-18 National Institute Of Advanced Industrial & Technology Diamond machining method
CN102142518A (en) * 2010-12-31 2011-08-03 中国科学院上海微系统与信息技术研究所 Phase-change storage material and preparation method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005219162A (en) * 2004-02-05 2005-08-18 National Institute Of Advanced Industrial & Technology Diamond machining method
CN102142518A (en) * 2010-12-31 2011-08-03 中国科学院上海微系统与信息技术研究所 Phase-change storage material and preparation method thereof

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